DE29815297U1 - Device for recognizing the position of a sample to be examined relative to a detection system - Google Patents
Device for recognizing the position of a sample to be examined relative to a detection systemInfo
- Publication number
- DE29815297U1 DE29815297U1 DE29815297U DE29815297U DE29815297U1 DE 29815297 U1 DE29815297 U1 DE 29815297U1 DE 29815297 U DE29815297 U DE 29815297U DE 29815297 U DE29815297 U DE 29815297U DE 29815297 U1 DE29815297 U1 DE 29815297U1
- Authority
- DE
- Germany
- Prior art keywords
- recognizing
- sample
- detection system
- examined relative
- examined
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001514 detection method Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J4/00—Measuring polarisation of light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE29815297U DE29815297U1 (en) | 1998-04-17 | 1998-08-26 | Device for recognizing the position of a sample to be examined relative to a detection system |
EP99106726A EP0950881A3 (en) | 1998-04-17 | 1999-04-01 | Method and device for automatically positioning samples relative to an ellipsometer |
US09/291,119 US6091499A (en) | 1998-04-17 | 1999-04-14 | Method and device for automatic relative adjustment of samples in relation to an ellipsometer |
JP11116099A JP3247660B2 (en) | 1998-04-17 | 1999-04-19 | Method and apparatus for automatically adjusting a sample for an ellipsometer |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE1998116974 DE19816974C1 (en) | 1998-04-17 | 1998-04-17 | Device to identify relative position of sample to be tested |
DE29815297U DE29815297U1 (en) | 1998-04-17 | 1998-08-26 | Device for recognizing the position of a sample to be examined relative to a detection system |
Publications (1)
Publication Number | Publication Date |
---|---|
DE29815297U1 true DE29815297U1 (en) | 1998-12-17 |
Family
ID=7864782
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1998116974 Expired - Fee Related DE19816974C1 (en) | 1998-04-17 | 1998-04-17 | Device to identify relative position of sample to be tested |
DE29815297U Expired - Lifetime DE29815297U1 (en) | 1998-04-17 | 1998-08-26 | Device for recognizing the position of a sample to be examined relative to a detection system |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1998116974 Expired - Fee Related DE19816974C1 (en) | 1998-04-17 | 1998-04-17 | Device to identify relative position of sample to be tested |
Country Status (1)
Country | Link |
---|---|
DE (2) | DE19816974C1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1114979A1 (en) * | 1999-12-27 | 2001-07-11 | Leica Microsystems Jena GmbH | Uncoupled wafer inclination measurement with an ellipsometer with spectral photometer and measurement of focus by a reflecting objective |
CN113376170A (en) * | 2021-06-16 | 2021-09-10 | 博众精工科技股份有限公司 | Calibration method and calibration block of product appearance detection equipment |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10139645C2 (en) * | 2001-08-11 | 2003-07-10 | Nanofilm Technologie Gmbh | goniometer |
DE10217028C1 (en) * | 2002-04-11 | 2003-11-20 | Nanophotonics Ag | Measuring module for wafer production plants |
DE102012103428A1 (en) | 2012-04-19 | 2013-10-24 | Hseb Dresden Gmbh | inspection arrangement |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3880524A (en) * | 1973-06-25 | 1975-04-29 | Ibm | Automatic ellipsometer |
EP0632256B1 (en) * | 1993-06-28 | 1998-08-26 | International Business Machines Corporation | Micropolarimeter, microsensor system and method of characterizing thin films |
-
1998
- 1998-04-17 DE DE1998116974 patent/DE19816974C1/en not_active Expired - Fee Related
- 1998-08-26 DE DE29815297U patent/DE29815297U1/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1114979A1 (en) * | 1999-12-27 | 2001-07-11 | Leica Microsystems Jena GmbH | Uncoupled wafer inclination measurement with an ellipsometer with spectral photometer and measurement of focus by a reflecting objective |
CN113376170A (en) * | 2021-06-16 | 2021-09-10 | 博众精工科技股份有限公司 | Calibration method and calibration block of product appearance detection equipment |
Also Published As
Publication number | Publication date |
---|---|
DE19816974C1 (en) | 2000-01-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
R207 | Utility model specification |
Effective date: 19990204 |
|
R150 | Term of protection extended to 6 years |
Effective date: 20011218 |
|
R151 | Term of protection extended to 8 years |
Effective date: 20041201 |
|
R158 | Lapse of ip right after 8 years |
Effective date: 20070301 |