DE2803277A1 - Illuminating device for photo-lacquer layer on substrate - provides collimating arrangement for light source projecting congruent partial beams onto layer via photomask - Google Patents

Illuminating device for photo-lacquer layer on substrate - provides collimating arrangement for light source projecting congruent partial beams onto layer via photomask

Info

Publication number
DE2803277A1
DE2803277A1 DE19782803277 DE2803277A DE2803277A1 DE 2803277 A1 DE2803277 A1 DE 2803277A1 DE 19782803277 DE19782803277 DE 19782803277 DE 2803277 A DE2803277 A DE 2803277A DE 2803277 A1 DE2803277 A1 DE 2803277A1
Authority
DE
Germany
Prior art keywords
light
collecting device
substrate
light source
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19782803277
Other languages
German (de)
Inventor
Friedrich Dipl Ing Prinzhausen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Priority to DE19782803277 priority Critical patent/DE2803277A1/en
Publication of DE2803277A1 publication Critical patent/DE2803277A1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
    • G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0028—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed refractive and reflective surfaces, e.g. non-imaging catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0025—Machining, e.g. grinding, polishing, diamond turning, manufacturing of mould parts
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
    • G02B3/0068—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between arranged in a single integral body or plate, e.g. laminates or hybrid structures with other optical elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The illumination device is for a photo-lacquer layer formed on a substrate. A light collimating arrangement is placed in the light beam radiated by a light source (1). A photo-mask (3) is positioned on the outlet side of the collimating arrangement. The latter separates the collected beam into partial ray shafts which are congruently projected over each other. The collimating arrangement can be formed from quartz rods (6) placed together without joins. The cross-sectional surfaces of the rods can have a form corresponding to that of the substrate (5) surface (4) to be illuminated.

Description

Stand der TechnikState of the art

Die Erfindung geht aus von einer Belichtungsvorrichtung nach der Gattung des Hauptanspruchs. bine derartige Belichtungsvorrichtung ist aus der DT-OS 1.764 456 bekannt.The invention is based on an exposure device of the type of the main claim. Such an exposure device is from DT-OS 1.764 456 known.

Bei dieser Vorrichtung ist die Justierung sehr umständlich; außerdem weist die zu belichtende Fläche große Ungleichmäßigkeiten in der Beleuchtung auf. Aus dem Aufsatz "Proximity Printing" in der Zeitschrift Llectronic Production, Juni 1963, Seite 17 bis 20 ist ferner eine Prismenoptik bekannt, die aber den nachteil hat, daß die Gleichmäßigkeit nicht beliebig verbessert werden kann, da die Anzahl der Prismen festliegt.With this device, the adjustment is very cumbersome; aside from that if the area to be exposed has large irregularities in the lighting. From the article "Proximity Printing" in Llectronic Production magazine, June 1963, pages 17 to 20, a prism optics is also known, but the disadvantage has that the uniformity cannot be arbitrarily improved because the number the prisms is fixed.

Vorteile der Erfindung Die erfindungsgemäße Belichtungsvorrlchtung mit den kennzeichnenden Merkmalen des Hauptanspruchs hat demgegenüber den Vorteil, daß mit Hilfe der Durchmischung einer Vielzahl von BinzelstrahlengUngen eine gute Gleichmäßigkeit auf der zu belichtenden Fläche erreicht wird, die durch Erhöhung der Anzahl der Stäbe ohne wesenviiche '4irX ngsgradçerri.ngerung verbessert werden kann. Als weiterer Vorteil ist anzusehen, daß die Justage des Belichtungsgerätes nicht mehr nach 8Eriterien der Verteilung im gesamten belichteten Feld, sondern aufgrund einer Messung in der Mitte der Belichtungsebene erfolgt. Durch die in den Unteransprüchen aufgeführten Maßnahmen sind vorteilhafte Weiterbildungen und VerbesSerungen der in dem Hauptanspruch angegebenen Belichtungsvorrichtung möglich. Nach Anspruch 2 bis 7 kann der Querschnitt der Quarzstäbe der Lichtsammelvorrichtung der Form der zu belichtenden Flächen angepaßt werden Durch Anspruch 5 wird eine Lichtsammelvorrichtung angegeben, die auch bei geringer Strahlungsenergie eine gute Abbildung liefert. Besonders vorteilhaft ist, daß nach Anspruch 6 alle Quarzstäbe den gleichen Anschliff und nach Anspruch 8 die Spiegel die gleiche Krümmung haben können. Die geringen Abbildungsfehler, die in der Nähme des Randes auftreten, können durch die in Anspruch 7 und 9 getroffenen aßnahmen verbessert werden.Advantages of the Invention The exposure device according to the invention with the characterizing features of the main claim has the advantage over this that with the help of the mixing of a large number of single beams a good one Uniformity on the area to be exposed is achieved by increasing it the number of rods can be improved without a substantial increase in the degree of graduation can. Another advantage is that the adjustment of the exposure device no longer according to 8 criteria of distribution in the entire exposed field, but is based on a measurement in the middle of the exposure plane. Through the in the The measures listed in the subclaims are advantageous developments and improvements the exposure device specified in the main claim possible. According to claim 2 to 7 can be the cross section of the quartz rods of the light collecting device of the form the areas to be exposed are adapted By claim 5 is a light collecting device indicated, which provides a good image even with low radiation energy. It is particularly advantageous that, according to claim 6, all quartz rods have the same bevel and according to claim 8, the mirror can have the same curvature. The minor aberrations, which occur in the sewing of the edge can be met by those in claims 7 and 9 measures are improved.

Zeichnung Fig. 1 zeigt eine Belichtungseinrichtung einer auf der Oberfläche eines Substrats aufgebrachten Fotolackschicht unter Benutzung einer Lichtsarnilvorrichtung nach der üblichen Art und Weise, Fig. 2, 3, 5, 6 und 7 geben erfindungsgemäße Ausführungsbeispiele der Belichtungseinrichtung wieder, Fig. 4 zeigt eine mögliche Querschnittsform der aneinanergesetzten Quarzstäbe.Drawing Fig. 1 shows an exposure device one on the surface a substrate applied photoresist layer using a light cable device in the usual manner, Figs. 2, 3, 5, 6 and 7 give exemplary embodiments according to the invention of the exposure device again, Fig. 4 shows a possible cross-sectional shape of the adjoining quartz rods.

BessnreibunQ der Erfindung In Fig. 1 Sst ein einfaches bekanntes Belichtungssystem für Fotolackschichten bei der Herstellung von Dünnschiehtschaltungen darcestellt) da aus einer Lichtquelle 1, einer Kondensorlinse 3, einer Fotoma.ke 3 lind der auf ein Substrat 5 aufgebrachtet Fotolackschicht 4 besteht.Description of the invention In Fig. 1 Sst a simple known exposure system for photoresist layers in the manufacture of thin-film circuits) since a light source 1, a condenser lens 3, a Fotoma.ke 3 lind the a substrate 5 applied photoresist layer 4 consists.

In der Fig. 2 wird die Kondensorlinse durch die erfindungsgemäßen Quarzstäbe 6 ersetzt. Die Strahlung gelangt von der Lichtquelle 1 (z.B. Quecksilberdampfhöchstdrucklampe) in die Lichtsammelvorrichtung 2. Diese besteht aus fugenlos aneinanderliegenden Quarzstäben 6, die der Querschnittsform (Fig. 4) der zu bestrahlenden Fläche entsprechen. Die Strahlung wird in der Eintrittsebene 7 der Lichtsammelvorrichtung in fugenlos aneinanderliegende Teilstrahlungsbündel zerlegt, durch den eintrittsseitigen sphärischen Anschliff 9 in den Stäben 6 kanalisiert, und durch den sphärischen Anschliff 10 der Austrittsseite 8 wird eine kongruente übereinanderproj ektion der Teilstrahlungsbündel auf die Fotomaske 3 und die Fotolackschicht 4 erreicht.In Fig. 2, the condenser lens by the invention Quartz rods 6 replaced. The radiation comes from light source 1 (e.g. high pressure mercury vapor lamp) into the light collecting device 2. This consists of seamlessly adjacent Quartz rods 6, which correspond to the cross-sectional shape (Fig. 4) of the surface to be irradiated. The radiation is seamless in the entrance plane 7 of the light collecting device Adjacent partial radiation bundles split up by the spherical one on the inlet side The bevel 9 is channeled in the rods 6, and through the spherical bevel 10 the exit side 8 is a congruent one over the other projection of the partial radiation bundles on the photomask 3 and the photoresist layer 4 reached.

Um eine saubere Kanalisation der einzelnen Teilstrahlungen zu gewährleisten, muß der sphärische Anschliff der Quarzstäbe exzentrisch sein, da sonst unerwünschte brechungen und Reflexionen an den Grenzflächen der Quarzstäbe 6 auftreten würden.To ensure a clean sewage system for the individual partial radiation, the spherical cut of the quartz rods must be eccentric, otherwise undesirable refractions and reflections at the interfaces of the quartz rods 6 would occur.

Wenn ausreichend Strahlungsenergie vorhanden ist, kann die Kanalisation der Strahlung auch durch die in Fig. 3 den Quarzstäben 6 vor- und nachgeschalteten Konvergenzlinsen 11, 12 durchgeführt werden.If there is sufficient radiant energy, the sewer system can the radiation also through the quartz rods 6 upstream and downstream in FIG Convergence lenses 11, 12 are performed.

'Ein weiteres Ausführungsbeispiel der Lichtsanmelvorrichtung wird in Fig. 7 gezeigt. Hie werden die Quarzstäbe durch Parabolspiegel 15, 16 ersetzt. Die Spiegel 15, 16 können alle die gleiche Krümmung haben, die Kanalisation der Strhlung wird durch entsprechende Ausrichtung der Spiegel gewährleistet.'Another embodiment of the light fitting device is shown in fig. Here the quartz rods are replaced by parabolic mirrors 15, 16. The mirrors 15, 16 can all have the same curvature, the drains of the Radiation is guaranteed by aligning the mirrors accordingly.

Wegen des Randabfalls ist eine möglichet große Projektionsentfernung erwünscht. Da die Quarzstablär.ge der Projektionslänge verloren geht, ist es günstig, kurze Stäbe zu wählen. Außerdem kann der Randabfall verringert werden, wenn der bichtsammelvorrichtung eine Kollimationslinse 13 14 (Fig. 5) oder ein Kollimationsspiegel (Fig. 6) nachgeschaltet wird.Because of the drop-off, the projection distance is as great as possible he wishes. Since the quartz rod length of the projection length is lost, it is favorable to choose short rods. In addition, the edge waste can be reduced when the light collection device a collimation lens 13 14 (Fig. 5) or a collimation mirror (Fig. 6) is connected downstream.

Claims (9)

Ansprüche 1.) Vorrichtung zur Belichtung einer auf eine Oberfläche eines Substrats aufgebrachten Fotolackschicht mit einer Lichtquelle, einer im Stra engang des von der bichtqucjle ausgesandten Lichts angeordneten Lichtsammelvorrichtung und mit einer im Strahlengang des aus der Lichtsammelvorrichtung austretenden Lichts angeordnetenf der Fotolackschicht vorgeschalteten Fotomaske, dadurch gekennzeichnet, riaß die Strahlung durch die Lichtsammelvorrichtung in Teilstrahlungsbündel zerlegt wird, die kongruent libereinander projiziert werden.Claims 1.) Device for exposing a on a surface a substrate applied photoresist layer with a light source, one in the Stra entrance of the light emitted by the light source arranged light collecting device and with one in the beam path of the light emerging from the light collecting device photomask arranged upstream of the photoresist layer, characterized in that The radiation was broken down into partial radiation beams by the light-collecting device which are projected congruently with each other. 2. Vorrichtung nach Anspruch 1, dadurch gekennzeichnet, daß die Lichtsammelvorrichtung fugenlos aneinandergesetzte Quarzstäbe (6) enthält.2. Apparatus according to claim 1, characterized in that the light collecting device Contains seamlessly juxtaposed quartz rods (6). 3. Vorrichtung nach Anspruch 2, dadurch gekennzeichnet, daß die Querschnittsflächen der fugenlos aneinandergesetzten Quarzstäbe (6) eine der zu belichtenden Fläche des Substrat (5) entsprechende Form haben.3. Apparatus according to claim 2, characterized in that the cross-sectional areas the seamlessly juxtaposed quartz rods (6) one of the surface to be exposed of the substrate (5) have a corresponding shape. 4. Vorrichtung nach Anspruch 2, dadurch gekennzeichnet, daß die Quarzstäbe (6) der Lichtsammelvorrichtung eingangs-und/oder ausgangsseitig einen sphärischen Anschliff (9, 10) haben.4. Apparatus according to claim 2, characterized in that the quartz rods (6) the light-collecting device is spherical on the input and / or output side Bevel (9, 10). 5. Vorrichtung nach Anspruch 4, dadurch gekennzeichnet, daß die Quarzstäbe (6) der Lichtsammelvorrichtung eingangs-und/oder ausgangsseitig einen exzentrischen sphärischen Anschliff (9, 10) haben.5. Apparatus according to claim 4, characterized in that the quartz rods (6) an eccentric one on the input and / or output side of the light-collecting device spherical bevel (9, 10). 6. Vorrichtung nach einem der Ansprüche 2 bis 4, dadurch gekennzeichnet, daß die Lichtsammelvorrichtung außer den Quarzstäben (6) vor- und/oder n,chgeschaltete Konvergenzlinsen (11, 12) enthält.6. Device according to one of claims 2 to 4, characterized in that that the light-collecting device is connected upstream and / or n, ch-connected in addition to the quartz rods (6) Contains convergence lenses (11, 12). 7. Vorrichtung nach Anspruch 2 oder 5, dadurch gekennzeichnet, daß die Lichtsammelvorrichtung außer den Quarzstan eine vorgeschaltete Konvergenzlinse (11) und eine nachgeschaltete Kollimationslinse (13) oder Kollimationsspiegel (14) enthält.7. Apparatus according to claim 2 or 5, characterized in that the light collecting device has an upstream convergence lens in addition to the quartz rod (11) and a downstream collimation lens (13) or collimation mirror (14) contains. 8. Vorrichtung nach Anspruch 1, dadurch gekennzeichnet, daß die Lichtsammelvorrichtung sphärische Spiegel (15, 16) enthält.8. Apparatus according to claim 1, characterized in that the light collecting device contains spherical mirrors (15, 16). 9. Vorrichtung nach Anspruch 8, dadurch gekennzeichnet, daß der bichtsammelvorrichtung eine Kollimationslinse (13) oder ein Kollimationsspiegel (14) nachgeschaltet ist.9. Apparatus according to claim 8, characterized in that the light collection device a collimation lens (13) or a collimation mirror (14) is connected downstream.
DE19782803277 1978-01-26 1978-01-26 Illuminating device for photo-lacquer layer on substrate - provides collimating arrangement for light source projecting congruent partial beams onto layer via photomask Withdrawn DE2803277A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19782803277 DE2803277A1 (en) 1978-01-26 1978-01-26 Illuminating device for photo-lacquer layer on substrate - provides collimating arrangement for light source projecting congruent partial beams onto layer via photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19782803277 DE2803277A1 (en) 1978-01-26 1978-01-26 Illuminating device for photo-lacquer layer on substrate - provides collimating arrangement for light source projecting congruent partial beams onto layer via photomask

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DE2803277A1 true DE2803277A1 (en) 1979-08-02

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Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0180800A2 (en) * 1984-10-11 1986-05-14 Firma Carl Zeiss Sun simulator
DE3530326A1 (en) * 1985-08-24 1987-02-26 Hell Rudolf Dr Ing Gmbh INTEGRATING CONDENSER
EP0231029A2 (en) * 1986-01-31 1987-08-05 Dainippon Screen Mfg. Co., Ltd. Optical system
EP0250975A2 (en) * 1986-06-13 1988-01-07 Dainippon Screen Mfg. Co., Ltd. Illumination system
EP0267599A2 (en) * 1986-07-24 1988-05-18 Dainippon Screen Mfg. Co., Ltd. Fly eye lens unit for illumination
EP0299475A2 (en) * 1987-07-17 1989-01-18 Dainippon Screen Mfg. Co., Ltd. Optical system for effecting increased irradiance in peripheral area of object
US4939630A (en) * 1986-09-09 1990-07-03 Nikon Corporation Illumination optical apparatus
US7109497B2 (en) 1998-05-05 2006-09-19 Carl Zeiss Smt Ag Illumination system particularly for microlithography
US7911584B2 (en) 2003-07-30 2011-03-22 Carl Zeiss Smt Gmbh Illumination system for microlithography
DE102014210927A1 (en) * 2014-06-06 2015-12-17 Carl Zeiss Smt Gmbh Optical system of a microlithographic projection exposure apparatus
DE102015213698B3 (en) * 2015-07-21 2016-09-08 Carl Zeiss Industrielle Messtechnik Gmbh Illumination system suitable for applications in metrology and coordinate measuring machine with such a lighting system
US10012907B2 (en) 2014-06-06 2018-07-03 Carl Zeiss Smt Gmbh Optical system of a microlithographic projection exposure apparatus

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0180800A3 (en) * 1984-10-11 1987-07-22 Firma Carl Zeiss Sun simulator
EP0180800A2 (en) * 1984-10-11 1986-05-14 Firma Carl Zeiss Sun simulator
DE3530326A1 (en) * 1985-08-24 1987-02-26 Hell Rudolf Dr Ing Gmbh INTEGRATING CONDENSER
EP0219647A1 (en) * 1985-08-24 1987-04-29 DR.-ING. RUDOLF HELL GmbH Integrating optical condensor
EP0231029A3 (en) * 1986-01-31 1989-07-19 Dainippon Screen Mfg. Co., Ltd. Optical system
EP0231029A2 (en) * 1986-01-31 1987-08-05 Dainippon Screen Mfg. Co., Ltd. Optical system
EP0250975A2 (en) * 1986-06-13 1988-01-07 Dainippon Screen Mfg. Co., Ltd. Illumination system
US5005959A (en) * 1986-06-13 1991-04-09 Dainippon Screen Mfg. Co., Ltd. Illumination system
EP0250975A3 (en) * 1986-06-13 1988-03-23 Dainippon Screen Mfg. Co., Ltd. Illumination system
EP0267599A3 (en) * 1986-07-24 1988-08-17 Dainippon Screen Mfg. Co., Ltd. Fly eye lens unit for illumination
EP0267599A2 (en) * 1986-07-24 1988-05-18 Dainippon Screen Mfg. Co., Ltd. Fly eye lens unit for illumination
US4939630A (en) * 1986-09-09 1990-07-03 Nikon Corporation Illumination optical apparatus
EP0299475A2 (en) * 1987-07-17 1989-01-18 Dainippon Screen Mfg. Co., Ltd. Optical system for effecting increased irradiance in peripheral area of object
EP0299475A3 (en) * 1987-07-17 1990-02-28 Dainippon Screen Mfg. Co., Ltd. Optical system for effecting increased irradiance in peripheral area of object
US7109497B2 (en) 1998-05-05 2006-09-19 Carl Zeiss Smt Ag Illumination system particularly for microlithography
US7911584B2 (en) 2003-07-30 2011-03-22 Carl Zeiss Smt Gmbh Illumination system for microlithography
DE102014210927A1 (en) * 2014-06-06 2015-12-17 Carl Zeiss Smt Gmbh Optical system of a microlithographic projection exposure apparatus
DE102014210927B4 (en) * 2014-06-06 2017-10-12 Carl Zeiss Smt Gmbh Optical system of a microlithographic projection exposure apparatus
US10012907B2 (en) 2014-06-06 2018-07-03 Carl Zeiss Smt Gmbh Optical system of a microlithographic projection exposure apparatus
DE102015213698B3 (en) * 2015-07-21 2016-09-08 Carl Zeiss Industrielle Messtechnik Gmbh Illumination system suitable for applications in metrology and coordinate measuring machine with such a lighting system

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