DE2353936A1 - Promoting chemical reactions in liquids - by blowing in gas to agitate the liquid - Google Patents

Promoting chemical reactions in liquids - by blowing in gas to agitate the liquid

Info

Publication number
DE2353936A1
DE2353936A1 DE19732353936 DE2353936A DE2353936A1 DE 2353936 A1 DE2353936 A1 DE 2353936A1 DE 19732353936 DE19732353936 DE 19732353936 DE 2353936 A DE2353936 A DE 2353936A DE 2353936 A1 DE2353936 A1 DE 2353936A1
Authority
DE
Germany
Prior art keywords
gas
liquids
gas mixture
liquid
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19732353936
Other languages
German (de)
Inventor
Rudolf Schmidt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to DE19732353936 priority Critical patent/DE2353936A1/en
Publication of DE2353936A1 publication Critical patent/DE2353936A1/en
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F33/00—Other mixers; Mixing plants; Combinations of mixers
    • B01F33/40—Mixers using gas or liquid agitation, e.g. with air supply tubes
    • B01F33/405—Mixers using gas or liquid agitation, e.g. with air supply tubes in receptacles having guiding conduits therein, e.g. for feeding the gas to the bottom of the receptacle
    • B01F33/4051—Mixers using gas or liquid agitation, e.g. with air supply tubes in receptacles having guiding conduits therein, e.g. for feeding the gas to the bottom of the receptacle with vertical conduits through which the material is being moved upwardly driven by the fluid
    • B01F33/40512—Mixers using gas or liquid agitation, e.g. with air supply tubes in receptacles having guiding conduits therein, e.g. for feeding the gas to the bottom of the receptacle with vertical conduits through which the material is being moved upwardly driven by the fluid involving gas diffusers at the bottom
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/04—Feed or outlet devices; Feed or outlet control devices using osmotic pressure using membranes, porous plates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
    • B01F23/23105—Arrangement or manipulation of the gas bubbling devices
    • B01F23/2312—Diffusers
    • B01F23/23123—Diffusers consisting of rigid porous or perforated material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
    • B01F23/23105—Arrangement or manipulation of the gas bubbling devices
    • B01F23/2312—Diffusers
    • B01F23/23126—Diffusers characterised by the shape of the diffuser element
    • B01F23/231261—Diffusers characterised by the shape of the diffuser element having a box- or block-shape, being in the form of aeration stones
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/003—Electroplating using gases, e.g. pressure influence
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D3/00—Liquid processing apparatus involving immersion; Washing apparatus involving immersion
    • G03D3/02—Details of liquid circulation
    • G03D3/04—Liquid agitators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

Abstract

Chemical processes, such as etching, developing and photoplating, carried out in liquid baths are improved and/or accelerated by blowing a gas into the liquid. Gas mixtures may also be used and a foam layer may be formed which can be used to support workpieces to be treated. Simple means of agitating liquids without using mechanical devices. It can be used in small plants and, in certain cases, workpiece holders can be dispensd with. Esp. for etching, developing and electroplating processes.

Description

Int. Cl.2:Int. Cl. 2 :

BUNDESREPUBLIK DEUTSCHLANDFEDERAL REPUBLIC OF GERMANY

DEUTSCHESGERMAN

PATENTAMTPATENT OFFICE

B Ol J 1-00 B Ol J 1-00

C 23 Cj 1 -02 G 03 D 3-02 C 25 D 5-00 C 23 Cj 1 -02 G 03 D 3-02 C 25 D 5-00

Offenlegungsschrift 23 53 936Offenlegungsschrift 23 53 936

Unionspriorität:Union priority:

Aktenzeichen: P 23 53 936.8File number: P 23 53 936.8

. Anmeldetag: 27.10. 73. Registration date: 27.10. 73

Offenlegungstäg: 7. 5. 75Disclosure date: May 7, 75

Bezeichnung:Description:

Verfahren und Vorrichtung zur Verbesserung und/oder Beschleunigung chemischer Vorgänge in Flüssigkeiten und BädernMethod and device for improvement and / or acceleration chemical processes in liquids and baths

Anmelder:
Erfinder:Applicant:
Inventor:

Schmidt, Rudolf, 8901 KissingSchmidt, Rudolf, 8901 Kissing

gleich Anmeldersame applicant

ORIGINAL iNSPECTED ©4.75 50.9 819/1130ORIGINAL iNSPECTED © 4.75 50.9 819/1130

Dipi.-Ing.Dipi.-Ing.

Rudolf BusselmeierRudolf Busselmeier

D i ρ 1, -1 η g.D i ρ 1, -1 η g.

Rolf ChanterRolf Chanter

Patentanwälte
jiJ-900 Augsburg 31· Postfach 242Patent attorneys
jiJ-900 Augsburg 31 P.O. Box 242

Rehlingenstraße 8
*o, Postscheckkonto: München Nr. 745 39Rehlingenstrasse 8
* o, postal check account: Munich No. 745 39

" 6529/Ol/UO/gn"6529 / Ol / UO / gn

Augsburg, 25, Oktober 1973Augsburg, October 25, 1973

Rudolf SchmidtRudolf Schmidt

8901 Kissing
Fichtenstraße 12 8901 Kissing
Fichtenstrasse 12

Verfahren und Vorrichtung zur Verbesserung und/oder Beschleunigung chemischer Vorgänge in'FlüssigkeitenMethod and device for improvement and / or Acceleration of chemical processes in liquids

und Bädern.and baths.

Die Erfindung betrifft ein Verfahren zur Verbesserung und/oder Beschleunigung chemischer Vorgänge in Flüssigkeiten und Bädern, insbesondere für Ätz-, Entwicklungs- und Galvanikbäder. Die Erfindung betrifft außerdem eine. Vorrichtung zur Durchführung des Verfahrens.The invention relates to a method for improvement and / or acceleration of chemical processes in liquids and baths, especially for etching, development and Electroplating baths. The invention also relates to a. Device for carrying out the method.

Bei derartigen Bädern ist eine ständige Bewegung der Flüssigkeit und/oder des zu bearbeitenden Teiles notwendig, um die Zufuhr von reaktionsfähigem Material zu gewährleisten. Insbesondere die gleichmäßige Zufuhr reaktionsfähigem Materials und gleichzeitige Abfuhr verbrauchten Materials bewirkt eine gleichmäßige, rasche und definierte Bearbeitung, was bei der chemischen Veränderung von Schichten vorteilhaft ist, beispielsweise bei der Herstellung' geätzter Schaltungen für die Elektrotechnik.In such baths a constant movement is the Liquid and / or the part to be processed is necessary to ensure the supply of reactive material. In particular, the even supply of reactive material and the simultaneous discharge used up Material causes a uniform, rapid and defined Machining, which is advantageous when changing layers chemically, for example during manufacture ' etched circuits for electrical engineering.

509819/1130509819/1130

6529/01/Dü/gn - I - 25. Okt. 19736529/01 / Dü / gn - I - Oct. 25, 1973

-A.-A.

Die bekannten Maßnahmen zur Verbesserung und/oder Beschleunigung chemischer Vorgänge ,in Flüssigkeiten : und Bädern beruhen auf:The known measures to improve and / or accelerate chemical processes in liquids : and baths are based on:

1. mechanischer Bewegung der zu bearbeitenden Teile (z.B. Tauehen, Schwenken)1. mechanical movement of the parts to be processed (e.g. rope, swiveling)

2. Bewegen der Flüssigkeiten2. Moving the liquids

a) durch Schwingklappen, Membranen, Rührwerke usw.a) by swing flaps, membranes, agitators, etc.

b) durch Umwälzpumpenb) by circulating pumps

c) durch Versprühen, Verspritzen.c) by spraying, spraying.

Nachteilig sind die of% aufwendigen Konstruktionen.' zum mechanischen Bewegen der zu bearbeitenden Teile und die in jedem Fall erforderlichen Haltevorrichtungen für die Werkstücke. Beides ist für Klein- und Kleinstanlagen (Laborbetriebe) kaum geeignet.The often% complex constructions are disadvantageous. ' to the mechanical movement of the parts to be processed and the holding devices required in each case for the workpieces. Both are hardly suitable for small and micro systems (laboratory operations).

Zur mechanischen Bewegung der meist aggresiven Flüssigkeiten läßt sich der direkte Kontakt mit der bewegenden Vorrichtung nicht vermeiden. Die dadurch erforderlichen Schutzmaßnahmen, Durchführungen und Spezialmaterialien ergeben aufwendige und oft teuere Konstruktionen .For the mechanical movement of mostly aggressive liquids direct contact with the moving device cannot be avoided. The necessary Protective measures, bushings and special materials result in complex and often expensive constructions.

Die gewünschte Gleichmäßigkeit des Vorganges ist mit den genannten Verfahren nur schwierig und oft nur durch Kombination mehrerer Maßnahmen möglich.The desired uniformity of the process is difficult and often only through with the methods mentioned Combination of several measures possible.

509819/1130509819/1130

6529/Ol/üö/gn - 3 - 25. Okt. 19736529 / Ol / üö / gn - 3 - Oct. 25, 1973

Der Erfindiing liegt die Aufgabe zugrunde, ein einfaches preiswertes, in der Handhabung problemloses Verfahren anzuwenden, das auch für Kleinanlagen geeignet ist, und die bisher notwendigen mechanisch bewegten Teile zu vermeiden.The invention is based on the task of a simple, inexpensive, problem-free process to use, also for small systems is suitable, and to avoid the previously necessary mechanically moving parts.

Diese Aufgabe wird erfindungsgemäß dadurch gelöst, daß die Flüssigkeit durch Einblasen oder Einblasen und Feinverteilung eines Gases oder Gasgemisches mechanisch bewegt wird. Das Wort "Gas" wird in dieser Anmeldung nicht im strengen physikalischen Sinne verwendet. Auch geeignete Dämpfe sind darin eingeschlossen. ■· ;According to the invention, this object is achieved by that the liquid by blowing or blowing and fine distribution of a gas or gas mixture is moved mechanically. The word "gas" is used not used in the strict physical sense in this application. There are also suitable vapors in it locked in. ■ ·;

Die Erfindung wird dahingehand ausgestaltet, daß neben der: mechanischen Bewegung der Flüssigkeit durch dosiertes Einblasen des Gases bei verschiedenen Flüssigkeiten (z.B. Eisen-SChlorid) eine tragfähige Schaumschicht entsteht, auf welche geeignete zu bearbeitende Teile ohne zusätzliche Halterung aufgelegt werden können. : . ...The invention is designed to the effect that besides the: mechanical movement of the liquid by dosed injection of the gas in the case of various liquids (e.g. iron chloride) a stable foam layer arises on which suitable parts to be machined can be placed without an additional holder. :. ...

Die mit der Erfindung erzielten Vorteile liegen in der Ersparnis der mechanischen Vorrichtungen zürn Bewegen der Flüssigkeit und/oder der zu bearbeitenden Teile.The advantages achieved by the invention are in the Saving of mechanical devices for moving the liquid and / or the parts to be processed.

Bei aufschäumenden Flüssigkeiten und geeigneten zu bearbeitenden Teilen entfällt jegliche mechanische Halterung,1 sowie dar sonst notwendigeIn the case of foaming liquids and suitable parts to be machined, any mechanical mounting is not required, 1 and otherwise necessary

- 4- 4th

5098 19/11305098 19/1130

65 29/ül/UO/gn - Hf - 25. Okt. 197365 29 / ül / UO / gn - Hf - Oct. 25, 1973

Die Anwendung der Erfindung gestattet somit die Herstellung problemlos zu bedienender, preiswerter Anlagen zur chemischen. Bearbeitung in Flüssigkeiten, und Bädern. Wegen der Einfachheit des Verfahrens eignet es sich besonders zur Anwendung bei Kleinanlagen.The application of the invention thus allows the production of inexpensive systems that are easy to operate to chemical. Machining in liquids, and baths. Because of the simplicity of the process, it is particularly suitable for use in small systems.

Entsprechend zeichnet sich die Vorrichtung zur Durchführung des erfindungsgemäßen Verfahrens dadurch aus, daß sie ein Gebläse zum Einbringen eines Gases oder Gasgemisches in das Ätzbad besitzt. Zweckmäßigerweise befindet sich im oder am Ätzbad ein poröses Material, in welches das zu verteilende Gas oder Gasgemisch über eine Zuführleitung einleitbar ist. Als poröses Material kann beispielsweise ein poröser Stein verwendet werden.The implementation device is characterized accordingly of the method according to the invention in that they have a blower for introducing a gas or Has gas mixture in the etching bath. A porous material is expediently located in or on the etching bath, into which the gas or gas mixture to be distributed can be introduced via a feed line. As a porous material For example, a porous stone can be used.

Als ein Anwendungsbeispiel der Erfindung wird eine Kleinätzanlage zur Herstellung von gedruckten Schaltungen aus kupferkaschiertem Trägermaterial anhand der Zeichnung beschrieben,.As an application example of the invention, a small etching machine for the production of printed circuits is used from copper-clad carrier material described with reference to the drawing.

Durch die Zuführungsleitung 1 wird Luft in den mit Eisen-3Chlorid-Lösung 2 gefüllten Behälter 3 geblasen, Zur Feinverteilung wird die Luft durch einen porösen Belüftungsstein geleitet, der in der Mitte am Grund des Bades befestigt ist. Die Eisen-3Chlorid-Lösung wird durch die aufsteigenden, feinen Luftbläschen aufgeschäumt. Es bildet sich eine Schaumschicht 5 aus, auf welche die vorbereitete Platine 6 mit der Kupferseite aufgelegt wird.Air is blown through the supply line 1 into the container 3 filled with iron-3-chloride solution 2. For fine distribution, the air is passed through a porous aeration stone which is attached in the middle to the base of the bath. The iron-3-chloride solution is foamed by the rising, fine air bubbles. A foam layer 5 is formed on which the prepared circuit board 6 is placed with the copper side.

Die Ätzzeit entspricht den üblichen Werten für nicht beheizte Ätzvorrichtungen. Das Abtragen derThe etching time corresponds to the usual values for non-heated etching devices. The removal of the

509819/11 3-0509819/11 3-0

6529/Ol/UO/gn - i · 25. Okt. 19736529 / Ol / UO / gn - i · October 25, 1973

Kupferschicht erfolgt sehr gleichmäßig. Es wird eine Ätzqualität erreicht, die den aufwendigen, industriellen Anlagen ohne weiteres gleichkommt.'The copper layer is very even. It will reached an etching quality that is equal to the complex, industrial systems without further ado. '

. - 6 - . Ansprüche. - 6 -. Expectations

509819/1130509819/1130

Claims (7)

6529/01/OO/gu - « - 25. Okt. 1973 ANSPRÜCHE6529/01 / OO / gu - «- Oct. 25, 1973 CLAIMS 1. Verfahren zur Verbesserung und/oder Beschleunigung chemischer Vorgänge in Flüssigkeiten und Bädern, insb**«*dere für Ätz-, Entvricklungs- und Galvanikbäder, dadurch gekennzeic h'-n e t, daß die Flüssigkeit durch Einblasen oder Einblasen und Feinverteilen eines Gases oder Gasgemisches mechanisch bewegt wird.1. Process for improving and / or accelerating chemical processes in liquids and Baths, especially for etching, developing and Electroplating baths, characterized in that the liquid is blown in or Injection and fine distribution of a gas or gas mixture is moved mechanically. 2. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß durch dosiertes Einblasen des Gases oder Gasgemisches in eine geeignete Flüssigkeit eine tragfähige Schaumschicht entsteht, auf welche zu bearbeitende Teile ohne zusätzliche Halterung aufgelegt werden können.2. The method according to claim 1, characterized in that that by metered injection of the gas or gas mixture into a suitable Liquid creates a stable foam layer on which parts to be processed without additional Bracket can be placed. 3. Verfahren nach Anspruch 1.oder 2, dadurch g e ■ kennze ichne t, daß das Gas oder Gasgemisch zur Peinverteilung durch ein poröses Material geleitet wird.3. The method according to claim 1. or 2, characterized in that g e ■ I know that the gas or gas mixture is used to distribute the particles through a porous material is directed. Verfahren nach Anspruch 3» dadurch g e k e η nze i chne t, daß das Gas oder Gasgemisch durch einen porösen Stein geleitet wird.Method according to claim 3 »thereby g e k e η nze I do not want the gas or gas mixture to pass through a porous stone. 5. Vorrichtung zur Durchführung des Verfahrens nach Anspruch 1, dadurch gekennzeichnet,5. Device for performing the method according to claim 1, characterized in that - 7 - ■ V>; \ ^ %09819/1130 / - ■-'.· .-- 7 - ■ V >; \ ^% 09819/1130 / - ■ - '. · .- 6529/Oi/UO/gn -4 - ■/ ■'-.;' .25. Okt. 19736529 / Oi / UO / gn -4 - ■ / ■ '- .;' .25. Oct 1973 daß sie ein Gebläse zürn Einbringen eines Gases oder Gasgemisches in das Ätzbad (2) besitzt.that they use a blower to introduce a gas or gas mixture in the etching bath (2). 6. Vorrichtung, nach Anspruch 5i dadurch g e — k e η η ζ e i c Ii η e tj daß sie im. oder am Ätzbad (2) ein poröses Material umfaßt, in welches das zu verteilende Gas oder Gasgemisch über eine Zuführleitung (l) einleitbar ist. .6. Apparatus according to claim 5i thereby g e - ke η η ζ eic Ii η e tj that it is in. or on the etching bath (2) comprises a porous material into which the gas or gas mixture to be distributed can be introduced via a feed line (1). . 7. Vorrichtung nach Anspruch 6, dadurch g e k e η η.ζ ei c-h η e t, daß das poröse Material ein poröser Stein (Λ) ist.7. Apparatus according to claim 6, characterized in that g e k e η η.ζ ei c-h η e t that the porous material is a porous stone (Λ). 50 98 13/113050 98 13/1130 LeerseiteBlank page
DE19732353936 1973-10-27 1973-10-27 Promoting chemical reactions in liquids - by blowing in gas to agitate the liquid Pending DE2353936A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19732353936 DE2353936A1 (en) 1973-10-27 1973-10-27 Promoting chemical reactions in liquids - by blowing in gas to agitate the liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732353936 DE2353936A1 (en) 1973-10-27 1973-10-27 Promoting chemical reactions in liquids - by blowing in gas to agitate the liquid

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DE2353936A1 true DE2353936A1 (en) 1975-05-07

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2418026A1 (en) * 1978-02-28 1979-09-21 Ngk Insulators Ltd ELECTROCHEMICAL ANODIZATION, ELECTROLYTIC PRECIPITATION AND ELECTROLYTIC DISSOLUTION TREATMENT PROCESS
FR2501244A1 (en) * 1981-03-06 1982-09-10 Western Electric Co GALVANOPLASTY PROCESS USING FOAM-TYPE ELECTROLYTE
FR2610848A1 (en) * 1987-02-13 1988-08-19 Quinquet Jean Paul Device for the chemical treatment of articles such as printed circuits or etchings
EP0352721A2 (en) * 1988-07-29 1990-01-31 Nokia Unterhaltungselektronik (Deutschland) GmbH Process for galvanically metallizing a substrate
WO2010151471A1 (en) * 2009-06-25 2010-12-29 3M Innovative Properties Company Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2418026A1 (en) * 1978-02-28 1979-09-21 Ngk Insulators Ltd ELECTROCHEMICAL ANODIZATION, ELECTROLYTIC PRECIPITATION AND ELECTROLYTIC DISSOLUTION TREATMENT PROCESS
FR2501244A1 (en) * 1981-03-06 1982-09-10 Western Electric Co GALVANOPLASTY PROCESS USING FOAM-TYPE ELECTROLYTE
FR2610848A1 (en) * 1987-02-13 1988-08-19 Quinquet Jean Paul Device for the chemical treatment of articles such as printed circuits or etchings
EP0352721A2 (en) * 1988-07-29 1990-01-31 Nokia Unterhaltungselektronik (Deutschland) GmbH Process for galvanically metallizing a substrate
EP0352721A3 (en) * 1988-07-29 1991-02-06 Nokia Unterhaltungselektronik (Deutschland) GmbH Process for galvanically metallizing a substrate
WO2010151471A1 (en) * 2009-06-25 2010-12-29 3M Innovative Properties Company Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles
CN102803562A (en) * 2009-06-25 2012-11-28 3M创新有限公司 Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles
US8647522B2 (en) 2009-06-25 2014-02-11 3M Innovative Properties Company Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles
CN102803562B (en) * 2009-06-25 2015-09-30 3M创新有限公司 The method of Wet-type etching self-assembled monolayer patterned substrate and metal pattern goods

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