DE19715151A1 - Loading and unloading an evacuable treatment chamber - Google Patents
Loading and unloading an evacuable treatment chamberInfo
- Publication number
- DE19715151A1 DE19715151A1 DE1997115151 DE19715151A DE19715151A1 DE 19715151 A1 DE19715151 A1 DE 19715151A1 DE 1997115151 DE1997115151 DE 1997115151 DE 19715151 A DE19715151 A DE 19715151A DE 19715151 A1 DE19715151 A1 DE 19715151A1
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- Germany
- Prior art keywords
- vacuum chamber
- axis
- workpieces
- loading
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/03—Pressure vessels, or vacuum vessels, having closure members or seals specially adapted therefor
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67751—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Robotics (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Die Erfindung bezieht sich auf eine Be- und Entla devorrichtung für eine evakuierbare Kammer nach dem Oberbegriff des Patentanspruchs 1 und auf ein Verfahren zum Be- und Entladen einer derartigen Behandlungskammer gemäß Patentanspruch 4.The invention relates to loading and unloading device for an evacuable chamber the preamble of claim 1 and on Method for loading and unloading such Treatment chamber according to claim 4.
Derartige Be- und Entladevorrichtungen dienen da zu, zu bearbeitende Werkstücke, z. B. zu beschich tende Formteile einer Vakuumbeschichtungsanlage zuzuführen bzw. die beschichteten Formteile der Beschichtungsanlage zu entnehmen. Hierzu weisen derartige Beschichtungsanlagen eine Ein-/Aus schleusstation auf, in bzw. aus welcher die Werk stücke transportierbar sind. Der Ein- bzw. Aus schleusvorgang selbst erfordert, daß die Schleu senstation zu belüften bzw. zur Bearbeitung der Werkstücke in der Vakuumkammer zu evakuieren ist.Such loading and unloading devices serve there workpieces to be machined, e.g. B. to coat moldings of a vacuum coating system feed or the coated molded parts of the To remove coating system. To do this such coating systems an on / off station, in or from which the plant pieces are transportable. The on or off Lock process itself requires that the lock to ventilate or to process the Workpieces must be evacuated in the vacuum chamber.
Bei den bekannten gattungsgemäßen Be-/Entladevor richtungen (Handlingsvorrichtungen) ist vorgese hen, daß zum Entladen der bereits belüfteten Schleusenstation zunächst die Schleusentür durch seitliches Auffahren geöffnet wird, danach fährt ein Handlingsarm in die Schleusenstation und greift einen die Formteile aufnehmenden Substrat träger. Dieser erste Handlingsarm fährt nun aus der Schleusenstation soweit heraus, daß ein zwei ter Handlingsarm mit einem unbeschichtete Formtei le tragenden Substratträger in die Schleusenstati on verfahrbar ist. Der zweite Handlingsarm über gibt danach den Substratträger auf eine Haltevor richtung in der Schleusenstation. Nach dieser Übergabe wird der zweite Handlingsarm aus der Schleusenstation herausgefahren und diese mit der seitlich verfahrenden Schleusentür geschlossen. Anschließend werden die in die Vakuumkammer einge brachten Werkstücke innerhalb der Vakuumkammer an eine Bearbeitungsstation übergeben.In the known generic loading / unloading directions (handling devices) is provided hen that to unload the already ventilated Lock station first through the lock door side opening is opened, then drives a handling arm in the lock station and grips a substrate receiving the molded parts carrier. This first handling arm now extends the lock station so far that a two ter handling arm with an uncoated molded part le carrying substrate carrier in the lock states one is movable. The second handling arm over then places the substrate carrier on a holder direction in the lock station. After this The second handling arm is transferred from the Sluice station moved out and this with the Lock door moving to the side closed. Then they are inserted into the vacuum chamber placed workpieces inside the vacuum chamber hand over a processing station.
Ein Nachteil dieser bekannten Be-/Entladevor richtung ist, daß die Zeitdauer zum Beschicken bzw. zum Entladen der Schleusenstation im Verhält nis zur gesamten für den Beschichtungsprozeß er forderlichen Bearbeitungszeit groß ist. Insbeson dere bei sogenannten Kurztakt-Beschichtungsanlagen ist es wünschenswert, die Zykluszeit, d. h. die insgesamt zwischen zwei Beschickungsvorgängen ver streichende Zeit, möglichst gering zu halten. A disadvantage of this known loading / unloading direction is that the time period for loading or to unload the lock station in the ratio nis to the whole for the coating process required processing time is large. In particular with so-called short-cycle coating systems it is desirable to adjust the cycle time, i.e. H. the a total of two loading processes elapsing time to keep as low as possible.
Der Erfindung liegt die Aufgabe zugrunde, eine Be-/Ent ladevorrichtung bereitzustellen, mittels wel cher die Zykluszeit des in einer Vakuumanlage durchzuführenden Beschichtungsprozesses unter Ver wendung einfacher Mittel minimal gehalten werden kann.The invention has for its object a loading / Ent to provide charging device, by means of wel cher the cycle time of in a vacuum system coating process to be carried out under Ver using simple means can be kept to a minimum can.
Diese Aufgabe wird erfindungsgemäß durch die im kennzeichnenden Teil des Patenanspruchs 1 angege benen Mittel gelöst. Weiterhin wird ein erfin dungsgemäßes Verfahren gemäß Anspruch 4 zum Be-/Ent laden einer Vakuumkammer angegeben, mit wel chem unter Einsatz der erfindungsgemäßen Mittel die Be- und/oder Entladezeit einer , Vakuumkammer mit dieser zu bearbeitenden Werkstücken minimiert wird.This object is achieved by the im characterizing part of claim 1 means resolved. Furthermore, an invented method according to claim 4 for loading / Ent load a vacuum chamber indicated with wel chem using the agents according to the invention the loading and / or unloading time of a vacuum chamber minimized with these workpieces to be machined becomes.
Nach Anspruch 1 besteht eine erfindungsgemäße Be-/Ent ladevorrichtung im wesentlichen aus mindestens einem um eine raumfeste Achse drehbar gelagerten Schubteil, welches in einer beliebig vorgewählten Rotationsposition radial in Bezug zur Drehachse zwischen einer Offen-Position und einer Geschlos sen-Position verschiebbar ist. An dem Schubteil ist der die Be-/Entladeöffnung der Ein-/Aus schleusstation verschließende Deckel angeord net. Zur Aufnahme und zum Transport der in die Ein-/Ausschleusstation zu transportierenden Werk stücke weist der Deckel eine die zu bearbeitenden, vorzugsweise zu beschichtenden Werkstücke aufneh mende Haltevorrichtung auf. Durch die Ausbildung des Schubteils sowohl als Deckelteil und als die Werkstücke transportierende Haltevorrichtung, be sitzt das Schubteil eine Doppelfunktion, die die für die Be- bzw. Entladung der Vakuumkammer erfor derliche Zeitdauer vorteilhaft verkürzt und die damit den automatischen Be-/Entladevorgang bei ei ner Kurztakt-Beschichtungsanlage vorteilhaft erst ermöglicht.According to claim 1 there is a loading / unloading loading device essentially from at least one rotatably mounted around a fixed axis Thrust part, which in a pre-selected Rotation position radial with respect to the axis of rotation between an open position and a lock sen position is displaceable. On the push part is the loading / unloading opening of the on / off Locking station arranged lock station net. To accommodate and transport the in the Plant to be transported in / out pieces, the lid has one of the preferably workpieces to be coated opening holding device. Through training of the push part both as a cover part and as the Workpiece transporting holding device, be the push part sits a double function, which the for loading and unloading the vacuum chamber advantageous duration shortened and the thus the automatic loading / unloading process at ei ner short-cycle coating system advantageous first enables.
Ein weiterer Vorteil ergibt sich erfindungsgemäß mit den in Anspruch 2 angegebenen Merkmalen. Da nach sind mindestens zwei Schubteile vorgesehen, welche vorzugsweise diametral in Bezug zur Dreh achse einander gegenüberliegend angeordnet sind. Dies hat den Vorteil, daß die Beladung der Schleu senstation durch das erste Schubteil parallel zur Beladung der Haltevorrichtung des zweiten Schub teils mit in der Vakuumkammer zu behandelnden Werkstücken erfolgen kann. Zum Entladen bzw. neuen Beladen der Schleusenstation wird dann das zweite Schubteil, vorzugsweise fest gekoppelt zum ersten Schubteil synchron mit diesem um die Achse vor die geöffnete Schleusenstation gedreht und die unbe schichteten Werkstücke in die Schleusenstation eingebracht, wobei die Vakuumkammer gleichzeitig evakuierbar verschlossen wird. Durch die Verwen dung mehrerer, vorzugsweise synchron betätigter Schubteile erfolgen mehrere Bewegungsabläufe zeit lich parallel zueinander, wodurch eine weitere Senkung der Zyklus zeit des Beschichtungsprozesses erreicht wird. Ein weiterer Vorteil hierbei ist, daß die manuelle Beladung der Beschichtungsanlage ohne Zykluszeitvergrößerung möglich ist, da die Werkstückträger nicht mehr in der Schleusenstati on, sondern außerhalb an der Be-/Entladevor richtung gewechselt werden.Another advantage results according to the invention with the features specified in claim 2. There according to at least two push parts are provided, which is preferably diametrically related to the rotation axis are arranged opposite each other. This has the advantage that the loading of the sluice senstation through the first slide parallel to Loading the holding device of the second batch partly to be treated in the vacuum chamber Workpieces can be made. For unloading or new The second is then loaded into the lock station Push part, preferably firmly coupled to the first Push part synchronously with this around the axis in front of the opened lock station rotated and the unbe layered workpieces in the lock station introduced, the vacuum chamber at the same time is closed in an evacuable manner. By use of several, preferably synchronously operated Push parts take several movements at a time Lich parallel to each other, creating another Reduction of the cycle time of the coating process is achieved. Another advantage is that the manual loading of the coating system is possible without increasing the cycle time because the Workpiece carriers no longer in the lock status on, but outside at the loading / unloading direction to be changed.
Ein weiterer Vorteil ergibt dadurch, daß der am Schubteil ausgebildete Deckel einen Verdrängungs körper (siehe Anspruch 3) aufweist, welcher ge meinsam mit den zu beschichtenden Werkstücken in die Ein-/Ausschleusstation einbringbar ist, wo durch das insgesamt zu evakuierende Volumen der Vakuumkammer verringert wird. Hierdurch verringert sich vorteilhaft die zum Erreichen des Arbeitsva kuums erforderliche Abpumpzeit, wodurch eine wei tere Verringerung der Zykluszeit bewirkt wird.Another advantage is that the am Thrust-trained cover a displacement body (see claim 3), which ge together with the workpieces to be coated in the in / out station can be brought in where by the total volume to be evacuated Vacuum chamber is reduced. This reduces advantageous to achieve the work va kum required pumping time, whereby a white tere reduction of the cycle time is effected.
Die Erfindung wird im folgenden anhand eines in Zeichnungen dargestellten, besonders bevorzugten Ausführungsbeispiels näher erläutert. Es zeigen:The invention is based on an in Drawings shown, particularly preferred Embodiment explained in more detail. Show it:
Fig. 1 eine erfindungsgemäße Be-/Entladevorrich tung in Seitenansicht sowie eine mit Werk stücken zu beschickende, zugeordnete Vaku umkammer; Figure 1 is a loading / unloading device according to the invention in side view and a piece to be loaded with work, assigned vacuum umkammer.
Fig. 2 einen horizontalen Querschnitt durch eine Be-/Entladevorrichtung mit einem 2armigen Hebelgetriebe in der Geschlossen-Position; Fig. 2 is a horizontal cross-section through a loading / unloading apparatus with a 2armigen lever mechanism in the closed position;
Fig. 3 eine Querschnittsansicht gemäß Fig. 2 in der Offen-Position der Be-/Entladevorrich tung; Fig. 3 is a cross-sectional view of FIG 2 in the open position of the loading / unloading device.
Fig. 4 eine Querschnittsansicht einer Be-/Entla devorrichtung mit zwei um eine vertikale Achse verschwenkbaren Schubteilen und Fig. 4 is a cross-sectional view of a loading / unloading device with two pusher parts pivotable about a vertical axis and
Fig. 5 eine Querschnittsansicht der in Fig. 4 dargestellten Be-/Entladevorrichtung nach Verschwenken der Schubteile um 180° um ei ne vertikal Achse. Fig. 5 is a cross-sectional view of the loading / unloading device shown in Fig. 4 after pivoting the thrust parts by 180 ° about egg ne vertical axis.
In der Fig. 1 ist eine einer mit Werkstücken zu beschickenden Vakuumkammer 2 zugeordneten Be-/Ent ladevorrichtung 30 dargestellt. Die Vakuumkam mer 2 weist mehrere Kammern, nämlich z. B. eine Behandlungsstation, eine Schleusenstation sowie sogenannte Substratkammern auf, von denen jedoch in den Fig. 2 bis 5 lediglich die Ein-/Aus schleusstation 22 dargestellt ist. Zum Be schicken der Schleusenstation 22 mit in der Vaku umkammer 2 zu bearbeitenden Werkstücken 8, 8' ist die Be-/Entladevorrichtung 30 gegenüber der in der Vakuumkammerwand 3, 3', 3'', 3''' eingelassenen Öff nung 24 angeordnet. Die Be-/Entladevorrichtung 30 umfaßt ein Gestell 32, 32', 32'', welches von recht eckig zueinander angeordneten Gestellbeinen 33, 33', welche auf Rollen 35, 35' lagern, in seiner flächenmäßigen Ausdehnung begrenzt wird. Mit den Rollen 35, 35' ist die Be-/Entladevorrichtung vor der Vakuumkammer 2 verfahrbar, um z. B. den Zugang für Wartungsarbeiten an der Vakuumkammer 2 zu er möglichen. Während der Be- und Entladevorgänge ist das Gestell 32, 32', 32'' mit der in diesem inte grierten Be-/Entladevorrichtung 30 ortsfest vor der Vakuumkammer 2 positioniert. In Fig. 1 is a one with workpieces to be loaded associated vacuum chamber 2 loading / unloading loader 30 is shown. The vacuum chamber 2 has several chambers, namely z. B. a treatment station, a lock station and so-called substrate chambers, of which, however, only the on / off lock station 22 is shown in FIGS . 2 to 5. Send for loading the lock station 22 in the Vaku umkammer 2 to be machined workpieces 8, 8 ', the loading / unloading device 30 is compared with the in the vacuum chamber wall 3, 3' arranged 3 '', 3 '''recessed Publ voltage 24th The loading / unloading device 30 comprises a frame 32 , 32 ', 32 '', which is delimited in terms of area by frame legs 33 , 33 ' which are arranged at right angles to one another and which are mounted on rollers 35 , 35 '. With the rollers 35 , 35 ', the loading / unloading device can be moved in front of the vacuum chamber 2 , in order to B. access for maintenance work on the vacuum chamber 2 to he possible. During the loading and unloading processes, the frame 32 , 32 ', 32 ''with the loading / unloading device 30 integrated therein is fixed in position in front of the vacuum chamber 2 .
Die Be-/Entladevorrichtung 30 umfaßt zwei um 180° rotationssymmetrisch zu einer Vertikalachse 42 an geordnete Schubteile 26, 26', welche mit in einer oberen Führungsschiene 47, 48 eingreifenden Schlit tenkörpern 49, 50 sowie in untere Führungsschienen 47', 48' eingreifenden Schlittenkörpern 49', 50' in dem Gestell 32, 32', 32''; 34, 34', 34'' verschiebbar gelagert sind. Mit der von einem Motor 45 betätig ten Antriebsachse 42 ist ein Arm 38 als Teil eines Hebelgetriebes 23 fest verbunden, welcher an sei nen beiden Enden über je ein Gelenk 41, 41' mit ei ner Schub-/Zugstange 40, 40' verschwenkbar verbun den ist, wobei die Schub-/Zugstange 40, 40' jeweils mit einem Gelenkkörper 43, 43' an den einander in Bezug zur Achse 42 spiegelsymmetrisch zueinander angeordneten Schubteilen 14, 14' angelenkt sind. Die Schubteile 14, 14' sind als Deckel zum Ver schließen der Öffnung 24 ausgebildet. Hierzu wei sen die Deckel 14, 14' auf den der Vakuumkammer 2 in der Geschlossen-Position P1 zugewandten Seite jeweils Dichtflächen auf, welche in Zusammenwirken mit der Öffnung 24 seitlich zugeordneten Dichtung selementen 16 die Vakuumkammer 2 evakuierbar ab dichten. An den Deckeln 14, 14' sind Greifarme 10', 11' bzw. 10'', 11'' paarig (siehe Fig. 3) ange ordnet. Die paarig vorhandenen Greifarme 10', 11' bzw. 10'', 11'' sind jeweils über in einem Vor sprung 19, 19' des Deckels 14 gelagerte Stangen 17, 17' endseitig an diesem befestigt, wodurch die Greifarme 10' und 11' bzw. 10'' und 11'' jeweils über die Stange 17 bzw. 17' schwenkbar miteinander gekoppelt sind. The loading / unloading device 30 comprises two by 180 ° rotationally symmetrical to a vertical axis 42 to ordered thrust parts 26 , 26 ', which with an upper guide rail 47 , 48 engaging slide bodies 49 , 50 and in lower guide rails 47 ', 48 'engaging slide bodies 49 ', 50 ' in the frame 32 , 32 ', 32 ''; 34 , 34 ', 34 ''are slidably mounted. With the actuated by a motor 45 th drive shaft 42 , an arm 38 is firmly connected as part of a lever mechanism 23 , which is pivotally connected at both ends via a joint 41 , 41 'with a push / pull rod 40 , 40 ' is, the push / pull rod 40 , 40 'are each articulated with a joint body 43 , 43 ' to each other with respect to the axis 42 arranged mirror-symmetrically to each other push parts 14 , 14 '. The thrust parts 14 , 14 'are formed as a lid for closing the opening 24 Ver. For this purpose, the covers 14 , 14 'on the side facing the vacuum chamber 2 in the closed position P 1 each have sealing surfaces which, in cooperation with the opening 24 laterally assigned sealing elements 16 , seal the vacuum chamber 2 in an evacuable manner. On the lids 14 , 14 'gripping arms 10 ', 11 'and 10 '', 11 ''in pairs (see Fig. 3) is arranged. The pair of gripping arms 10 ', 11 ' and 10 '', 11 '' are each attached to the end by means of rods 17 , 17 'mounted in a projection 19 , 19 ' of the cover 14 , whereby the gripping arms 10 'and 11 'or 10 ''and 11 ''are pivotally coupled to each other via the rod 17 or 17 '.
Zum Entladen von in der Vakuumkammer 2 z. B. zu beschichtenden Werkstücken 8 wird die Ein-/Aus schleusstation 22 in ihre Entnahmeposition, wie in Fig. 2 bis 5 dargestellt, durch Drehung des Innen zylinders 4 durch Rotation des angetriebenen Arms 18 von einer in den Zeichnungen nicht dargestell ten Welle gefahren. Durch betätigen der Achse 13' werden die Greifarme 10, 11 heraufgeschwenkt und greifen den Substratträger 12 an seitlich an die sen dafür vorgesehenen Halteelementen 7, 7' auf. Während dieser Übergabe des Substratträgers 12 an die Greifarme 10, 11 wird die Ein-/Ausschleus station 22 zeitgleich auf Atmosphärendruck durch Einlassen eines Gases über einen in der Zeichnung nicht dargestellten Gaseinlaß belüftet. Nachdem der Druckausgleich in der Ein-/Ausschleusstation 22 hergestellt ist, wird durch Drehung der von der Antriebsvorrichtung 45 (siehe Fig. 1) angetriebe nen Welle 42 in die Drehrichtung r' die Schub-/Zug stange 40, 40' in dem Gelenk 41, 41' ver schwenkt, wobei das Schubteil 26 und 26' bewe gungssynchron über das Gelenk 43 bzw. 43' auf die Antriebswelle 42 zu verschoben werden. Hierdurch wird der Deckel 14 von der äußeren Vakuumkammer wand 3', 3'' abgehoben und zusammen mit den auf dem Substratträger 12 lagernden, beschichteten Werk stücken 8' aus der Ein-/Ausschleusstation 22 ent nommen.For unloading in the vacuum chamber 2 z. B. to be coated workpieces 8 , the on / off lock station 22 in its removal position, as shown in Fig. 2 to 5, by rotation of the inner cylinder 4 by rotation of the driven arm 18 driven by a shaft not shown in the drawings. By actuating the axis 13 ', the gripping arms 10 , 11 are pivoted up and grip the substrate carrier 12 on the side on the holding elements 7 , 7 ' provided therefor. During this transfer of the substrate carrier 12 to the gripping arms 10 , 11 , the inlet / outlet station 22 is simultaneously ventilated to atmospheric pressure by admitting a gas through a gas inlet, not shown in the drawing. After the pressure equalization in the input / ejection station 22 is established, the push / pull rod 40 , 40 'in the joint 41 is rotated by rotation of the shaft 42 driven by the drive device 45 (see FIG. 1) in the direction of rotation r' , 41 'ver pivots, the thrust member 26 and 26 ' movement synchronously via the joint 43 and 43 'to be moved to the drive shaft 42 . As a result, the cover 14 is lifted off the outer vacuum chamber wall 3 ', 3 ''and, together with the coated work pieces 8 ' on the substrate carrier 12 , is removed from the infeed / outfeed station 22 .
Zur Entnahme der beschichteten Werkstücke 8 von dem Subtratträger 12 werden die Schubteile 26, 26' gemeinsam mit dem zweiarmigen Hebelgetriebe 23 um die Antriebswelle 42 in Drehrichtung R' um 180° verschwenkt. Das Schleusenhandling 30 wird an schließend durch Betätigen des Hebelgetriebes 23, wobei die Antriebswelle 42 um 180° in Drehrichtung r (siehe Fig. 2) gedreht wird, aus der Offen- Position P2 in die in Fig. 2 dargestellte Geschlos sen-Position P1 überführt. Alternativ ist auch eine um 180°-fortgesetzte Drehung in Drehrichtung r' möglich. Hierbei wird der von den Greifarmen 10', 11' gehaltene Substratträger 12' mit den auf diesem lagernden, zu beschichtenden Substraten 8' vor die Öffnung 24 positioniert in die Ein-/Aus schleusstation 22 durch Betätigen des Hebelge triebes 23 überführt und die Öffnung 24 mit der Schleusenklappe 14' sowie von den in der Vakuum kammerwand 3', 3'' eingelassenen Dichtungsvorrich tungen 16 vakuumdicht verschlossen.To remove the coated workpieces 8 from the substrate carrier 12 , the thrust parts 26 , 26 'together with the two-armed lever mechanism 23 are pivoted about the drive shaft 42 in the direction of rotation R' by 180 °. The lock handling 30 is then closed by actuating the lever gear 23 , the drive shaft 42 being rotated through 180 ° in the direction of rotation r (see FIG. 2), from the open position P 2 to the closed position P shown in FIG. 2 1 transferred. Alternatively, a rotation in the direction of rotation r 'continued by 180 ° is also possible. Here, the substrate carrier 12 'held by the gripping arms 10 ', 11 'with the substrates 8 ' supported thereon and to be coated is positioned in front of the opening 24 in the on / off lock station 22 by actuating the lever mechanism 23 and the opening 24 is transferred with the lock flap 14 'and from the vacuum chamber wall 3 ', 3 '' recessed sealing devices 16 sealed vacuum-tight.
Anschließend wird der Substratträger 12' durch Verschwenken der Greifarme 10', 11' zum Weiter transport durch Drehung des Innenzylinders 4 (siehe Fig. 5) an die Einschleus-/Ausschleus station 22 übergeben. Parallel zu dem Übergabevor gang wird die Vakuumkammer 2 mittels einer in den Zeichnungen nicht dargestellten Pumpvorrichtung über den Saugstutzen 20 (siehe Fig. 2 bis 5) auf ihren Arbeitsenddruck evakuiert.The substrate carrier 12 'is then transferred to the infeed / outfeed station 22 by pivoting the gripping arms 10 ', 11 'for further transport by rotating the inner cylinder 4 (see FIG. 5). In parallel to the transfer process, the vacuum chamber 2 is evacuated to its final working pressure by means of a pump device, not shown in the drawings, via the suction port 20 (see FIGS . 2 to 5).
Die zuvor beschichteten, außerhalb der Vakuumkam mer befindlichen Substrate 8 können nunmehr ge meinsam mit ihrem Substratträger 12 oder substrat weise von dem Substratträger 12 z. B. durch ein Roboterhandling entnommen werden. Das in der Ge schlossen-Position P1 befindliche Schubteil 26' steht danach zum Wiederbeladen mit von zu be schichtenden Substraten zur Verfügung. The previously coated, located outside of the vacuum chamber mer 8 can now ge together with their substrate carrier 12 or substrate, from the substrate carrier 12 z. B. can be removed by a robot handling. The pusher part 26 'located in the closed position P 1 is then available for reloading with substrates to be coated.
22nd
Vakuumkammer, Behandlungskammer
Vacuum chamber, treatment chamber
33rd
, ,
33rd
', ',
33rd
'', '',
33rd
''' Vakuumkammerwand, Außenwand
'''Vacuum chamber wall, outer wall
44th
Innenzylinder
Inner cylinder
66
Substratkammer
Substrate chamber
77
, ,
77
' Halteelement
'' Holding element
88th
, ,
88th
' Substrat, Werkstück
'' Substrate, workpiece
1010th
, ,
1010th
', ',
1010th
'' Greifarm
'' Gripper arm
1111
, ,
1111
', ',
1111
'' Greifarm
'' Gripper arm
1212th
, ,
1212th
' Substratträger, Werkstückträger
'' Substrate carrier, workpiece carrier
1313
Verbindungsachse
Connecting axis
1414
, ,
1414
' Schleusenklappe, Deckel
'' Lock flap, cover
1515
Verdrängungskörper
Displacement body
1616
Dichtungsvorrichtung, Dichtungselement
Sealing device, sealing element
1717th
, ,
1717th
' Halteelement
'' Holding element
1818th
Arm
poor
1919th
, ,
1919th
' Vorsprung
' Head Start
2020th
Saugstutzen
Suction port
2121
Verdrängungskörper
Displacement body
2222
Ein-/Ausschleusstation
Entry / exit station
2323
Hebelgetriebe
Lever gear
2424th
Öffnung
opening
2626
, ,
2626
' Schubteil
'Push part
3030th
Schleusenhandling, Be-/Entladevorrichtung
Lock handling, loading / unloading device
3232
, ,
3232
', ',
3232
'' Gestell
'' Frame
3333
, ,
3333
' Gestellbein
'Leg
3434
, ,
3434
', ',
3434
'' Gestell
'' Frame
3535
, ,
3535
' Rolle
'Role
3636
Plattform
platform
3838
Arm
poor
4040
, ,
4040
' Schub-/Zugstange
'' Push / pull rod
4141
, ,
4141
' Gelenk
'Joint
4242
Antriebsachse, Welle, Drehachse
Drive axis, shaft, axis of rotation
4343
, ,
4343
' Gelenk
'Joint
4444
Saugstutzen
Suction port
4545
Antriebsvorrichtung, Motor
Drive device, motor
4747
, ,
4747
' Führungsschiene
'' Guide rail
4848
, ,
4848
' Führungsschiene
'' Guide rail
4949
, ,
4949
' Schlittenkörper
'' Sledge body
5050
, ,
5050
' Schlittenkörper
'' Sledge body
5151
Welle
wave
5252
Kulisse
A, B, C, D Schubrichtung
R, R'Drehrichtung des Schubteils Backdrop
A, B, C, D thrust direction
R, R 'direction of rotation of the thrust part
2626
, ,
2626
'
r, r' Drehrichtung der Welle '
r, r 'direction of rotation of the shaft
4242
P1 P 1
Geschlossen-Position
P2 Closed position
P 2
Offen-Position
P3 Open position
P 3
Wechsel-Position
Exchange position
Claims (7)
- a. Beladen der an einem Schubteil (26, 26') der Be-/Entladevorrichtung (30) angeordne ten Substratträger (12) mit zu bearbeiten den Werkstücken (8);
- b. Drehung des beladenen Schubteils (26, 26') um eine in Bezug zur Vakuumkammer (2) raumfeste Achse (42) vor die Öffnung (24);
- c. Einbringen des Werkstückträgers (12) in die Vakuumkammer (2) durch Vortrieb des Schubteils (26, 26') entlang einer in Bezug zur Achse (42) radialen Bewegungsrichtung, wodurch die Öffnung (24) mit einem mit dem Schubteil (26, 26') verbundenen Deckel (14, 14') verschlossen wird.
- a. Loading the substrate carrier ( 12 ) arranged on a push part ( 26 , 26 ') of the loading / unloading device ( 30 ) with the workpieces ( 8 );
- b. Rotation of the loaded push part ( 26 , 26 ') about an axis ( 42 ) which is fixed in space with respect to the vacuum chamber ( 2 ) in front of the opening ( 24 );
- c. Introducing the workpiece carrier ( 12 ) into the vacuum chamber ( 2 ) by propelling the thrust part ( 26 , 26 ') along a radial direction of movement with respect to the axis ( 42 ), whereby the opening ( 24 ) is connected to the thrust part ( 26 , 26 ' ) connected lid ( 14 , 14 ') is closed.
- a) Belüften der Vakuumkammer (2) durch Ein lassen eines Gases;
- b) Ausbringen des mit den Werkstücken (8') beladenen Werkstückträgers (12') durch ra diales Verschieben des Schubteils (26) entlang einer in Bezug zur Achse (42) von der Vakuumkammer (2) wegweisenden Bewe gungsrichtung;
- c) Drehung des Schubteils (26, 26') um die Achse (4) in eine Entnahmeposition zum ma schinellen und/oder manuellen Entladen der bearbeiteten Werkstücke (8').
- a) venting the vacuum chamber ( 2 ) by a gas;
- b) bringing out the workpiece carrier ( 12 ') loaded with the workpieces ( 8 ') by ra diales displacement of the thrust part ( 26 ) along a direction of movement pointing away from the vacuum chamber ( 2 ) with respect to the axis ( 42 );
- c) Rotation of the thrust part ( 26 , 26 ') about the axis ( 4 ) in a removal position for ma and / or manual unloading of the machined workpieces ( 8 ').
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE1997115151 DE19715151A1 (en) | 1997-04-11 | 1997-04-11 | Loading and unloading an evacuable treatment chamber |
| DE59805566T DE59805566D1 (en) | 1997-04-11 | 1998-02-24 | Method and device for loading and unloading an evacuable treatment chamber |
| EP98103207A EP0870850B1 (en) | 1997-04-11 | 1998-02-24 | Method and apparatus for loading and unloading an evacuable treatment chamber |
| JP10096118A JPH10280144A (en) | 1997-04-11 | 1998-04-08 | Loading/unloading of evacuatable process chamber and apparatus for executing the same |
| US09/057,973 US6123494A (en) | 1997-04-11 | 1998-04-10 | Process for the loading and unloading of an evacuatable treatment chamber and handling device for carrying out the process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE1997115151 DE19715151A1 (en) | 1997-04-11 | 1997-04-11 | Loading and unloading an evacuable treatment chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE19715151A1 true DE19715151A1 (en) | 1998-10-15 |
Family
ID=7826226
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE1997115151 Withdrawn DE19715151A1 (en) | 1997-04-11 | 1997-04-11 | Loading and unloading an evacuable treatment chamber |
Country Status (1)
| Country | Link |
|---|---|
| DE (1) | DE19715151A1 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002027060A2 (en) * | 2000-09-26 | 2002-04-04 | Applied Materials, Inc. | Process chamber lid service system |
| DE10205167C5 (en) * | 2002-02-07 | 2007-01-18 | Von Ardenne Anlagentechnik Gmbh | In-line vacuum coating system for the intermediate treatment of substrates |
| DE102008059794B3 (en) * | 2008-12-01 | 2010-04-01 | Grenzebach Maschinenbau Gmbh | Method and apparatus for reversing the feeding of sputter coating equipment in clean rooms, and computer program for performing the method and machine-readable carrier with the program code |
| DE102007048758B4 (en) * | 2006-10-10 | 2010-07-01 | Von Ardenne Anlagentechnik Gmbh | Transport device for elongated substrates, loading and unloading device and method for loading and unloading of the transport device |
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|---|---|---|---|---|
| US3874525A (en) * | 1973-06-29 | 1975-04-01 | Ibm | Method and apparatus for handling workpieces |
| US3968885A (en) * | 1973-06-29 | 1976-07-13 | International Business Machines Corporation | Method and apparatus for handling workpieces |
| GB2143494A (en) * | 1981-02-13 | 1985-02-13 | Lam Res Corp | Improvements in or relating to workpiece transfer means for loadlocks |
| US4699554A (en) * | 1984-09-14 | 1987-10-13 | Hitachi, Ltd. | Vacuum processing apparatus |
| DE4116554A1 (en) * | 1990-10-22 | 1992-04-23 | Tdk Corp | TRANSPORT METHOD AND SYSTEM FOR CLEANROOM CONDITIONS |
| DE4117969A1 (en) * | 1991-05-31 | 1992-12-03 | Balzers Hochvakuum | VACUUM TREATMENT SYSTEM |
| DE4235676A1 (en) * | 1992-10-22 | 1994-06-09 | Balzers Hochvakuum | Chamber and chamber combination for transfer of at least one component - with a component holding element swivelled through a chamber opening |
| WO1996026874A1 (en) * | 1995-02-27 | 1996-09-06 | Asyst Technologies, Inc. | Standard mechanical interface integrated vacuum loadlock chamber |
| US5590994A (en) * | 1992-10-06 | 1997-01-07 | Balzers Aktiengesellschaft | Chamber, at least for the transport of workpieces, a chamber combination, a vacuum treatment facility as well as a transport method |
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1997
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| US3874525A (en) * | 1973-06-29 | 1975-04-01 | Ibm | Method and apparatus for handling workpieces |
| US3968885A (en) * | 1973-06-29 | 1976-07-13 | International Business Machines Corporation | Method and apparatus for handling workpieces |
| GB2143494A (en) * | 1981-02-13 | 1985-02-13 | Lam Res Corp | Improvements in or relating to workpiece transfer means for loadlocks |
| US4699554A (en) * | 1984-09-14 | 1987-10-13 | Hitachi, Ltd. | Vacuum processing apparatus |
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| DE4235676A1 (en) * | 1992-10-22 | 1994-06-09 | Balzers Hochvakuum | Chamber and chamber combination for transfer of at least one component - with a component holding element swivelled through a chamber opening |
| WO1996026874A1 (en) * | 1995-02-27 | 1996-09-06 | Asyst Technologies, Inc. | Standard mechanical interface integrated vacuum loadlock chamber |
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| JP 5-279852 A,. In: Patent Abstracts of Japan, C-1161, Feb. 4, 1994, Vol. 18, No. 68 * |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002027060A2 (en) * | 2000-09-26 | 2002-04-04 | Applied Materials, Inc. | Process chamber lid service system |
| WO2002027060A3 (en) * | 2000-09-26 | 2002-12-05 | Applied Materials Inc | Process chamber lid service system |
| DE10205167C5 (en) * | 2002-02-07 | 2007-01-18 | Von Ardenne Anlagentechnik Gmbh | In-line vacuum coating system for the intermediate treatment of substrates |
| DE102007048758B4 (en) * | 2006-10-10 | 2010-07-01 | Von Ardenne Anlagentechnik Gmbh | Transport device for elongated substrates, loading and unloading device and method for loading and unloading of the transport device |
| US8007223B2 (en) | 2006-10-10 | 2011-08-30 | Von Ardenne Anlagentechnik Gmbh | Transport device, loading device and method for loading and unloading the transport device |
| US8033781B2 (en) | 2006-10-10 | 2011-10-11 | Von Ardenne Anlagentechnik Gmbh | Method for loading and unloading a transport device |
| DE102008059794B3 (en) * | 2008-12-01 | 2010-04-01 | Grenzebach Maschinenbau Gmbh | Method and apparatus for reversing the feeding of sputter coating equipment in clean rooms, and computer program for performing the method and machine-readable carrier with the program code |
| WO2010063264A1 (en) | 2008-12-01 | 2010-06-10 | Grenzebach Maschinenbau Gmbh | Method and device for reversing the feeding of sputter coating systems in clean rooms |
| US8747627B2 (en) | 2008-12-01 | 2014-06-10 | Grenzebach Maschinenbau Gmbh | Method and device for reversing the feeding of sputter coating systems in clean rooms |
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| 8127 | New person/name/address of the applicant |
Owner name: LEYBOLD OPTICS GMBH, 63755 ALZENAU, DE |
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| 8141 | Disposal/no request for examination |