DE19523132A1 - Liquid crystal element and its manufacture, forming an alignment layer for a liquid crystal element, embossing device for forming an alignment layer and its manufacture and device for embossing irregular patterns on an alignment layer - Google Patents

Abstract

The surface shape of an alignment film 116 for a liquid crystal device is formed by pressing or stamping with a die 110. The surface shape thus produced takes the form of an irregular pattern with the pitch of the irregularities in one direction being different from the pitch of the irregularities in another direction. Such an arrangement results in a plurality of alignment domains differing in pre-tilt angle. The die is produced by two stamping processes imposing two different patterns of irregularities on the die. The die comprises in order a press base body of rigid material, an elastic member and a sheet like die member. <IMAGE>

Description

The present invention relates to a method for Manufacture of a liquid crystal element that has a wider Field of view angle shows, and in particular on a liquid crystal element with an alignment layer to realize a wider one Field of view angle and its manufacture and an embossing device for Forming an alignment layer for a liquid crystal element and its Manufacturing.

The present invention also relates to an apparatus for embossing irregular patterns, preferably for shaping the Alignment layer described above on a Liquid crystal substrate is used.

Thin-film transistor drive type liquid crystal elements have so far been comprehensive as high-quality image displays of the thin type known who are capable of a high response speed and to achieve a full color display. The liquid crystal elements of this Type, however, have the problem that the field of view angle is narrow is.

So far, one has been conventional in the liquid crystal elements of this type Technique of dividing the orientations of the liquid crystal molecules each pixel (pixel) is known to be the field of view angle  expand. In particular, according to that described above Technique each dot of R, G and B that form a picture element domains different from each other in increasing alignment of the liquid crystal molecules when a voltage is applied. At a Such alignment subdivision structure is generally every point in FIG two parts divided and the divided parts are different Alignment treatments suspended.

This alignment division technique is effective for quick and asymmetrical change in contrast in the vertical direction mitigate what's been a problem with the Liquid crystal element of the drive type Thin film transistor was viewed, and a domain too increase in which the inversion of an intermediate tone does not produce becomes. Consequently, this technique has the option of one To deliver liquid crystal element with a wide field of view angle.

An example of a prior art method for Production of a liquid crystal element with a Alignment division structure is described below.

As shown in FIG. 13A, an output layer 2 for an alignment layer is formed on the surface of a substrate 1 , and as shown in FIG. 13B, the output layer 2 for the alignment layer is subjected to a first rubbing treatment.

The rubbing treatment is carried out by a method in which the surface of the starting layer 2 for the aligning layer is rubbed with a roller 6 , in which a rubbing material is attached around its outer peripheral region.

Then, as shown in Fig. 13C, a photoresist 3 is applied to the thus abraded surface of the starting layer 2 for the alignment layer, and as shown in Fig. 13D, a photoresist pattern is developed. As shown in Fig. 13E, is performed on the photoresist 3 is provided with the output of layer 2 for alignment layer, a second abrasion treatment in the reverse direction to the first Abreibebehandlung. Thereafter, the photoresist 3 is removed so as to obtain the substrate 1 with an alignment layer 5 as shown in Fig. 13F.

Fig. 13G shows a structural example of a liquid crystal element using the alignment layer 5 having the foregoing structure. In this structure, liquid crystal molecules 7 are enclosed between a substrate 1 formed with an alignment layer 5 on the color filter side and a substrate 1 'provided with an alignment layer 5 ' on the transistor side. The liquid crystal molecules on the side of the alignment layer 5 (on the color filter side) and the liquid crystal molecules on the side of the alignment layer 5 ', (on the thin film transistor side) are adjusted by the alignment control of the alignment layers 5 and 5 ' so that they have a pretilt angle, so that they are parallel to each other.

However, the prior art method described above has the following disadvantages: In the second rubbing treatment performed by the photoresist 3 after the first rubbing treatment carried out over the entire surface, the rubbing must be carried out in the reverse direction using opening areas each one size have half of a fine dot. In addition, a large-area mask must be used in the second rubbing treatment. As a result, it is difficult to practically carry out such abrasion treatment.

Another problem is that if a photoresist is on the Rubbing surface is applied and developed, the alignment layer tends to be due to alkali components in a developing solution are contained, can be resolved, and in this case it is probably, even if the alignment layer is not completely dissolved that at least part of the surface of the layer has changed, and so the stable alignment condition by the rubbing treatment does not realized.  

Another problem is that since the rest of the photoresist is removed the alignment layer tends to be further removed of the rest of the photoresist is damaged, making it difficult to to maintain the initial rubbing condition, and thus a stable one Alignment subdivision not ensured over a large area can be.

In recent years, a procedure has been proposed which allows practice the disadvantages of the prior art described above Technology can be solved. Such a procedure will described below with reference to the drawings.

First, as shown in FIG. 14A, an alignment layer 11 having a small pretilt angle is formed from an inorganic material on a substrate 10 . An alignment layer 12 having a large pretilt angle is coated thereon as shown in FIG. 14B, and a photoresist 13 is coated thereon as shown in FIG. 14C. Thereafter, as shown in FIG. 14D, the photoresist 13 is developed, and the alignment layer 12 with the large pretilt angle is etched. This is followed by a rubdown treatment using a roller 16 , as shown in FIG. 14E, and an alignment layer is thus produced.

In this way, since only one rub-off treatment is necessary and also the alignment layer 12 having the large pretilt angle is exposed to the rub-off treatment after the photoresist is removed, the alignment state can be stable. In addition, since the alignment layer 11 having the small pretilt angle on the first layer is made of an inorganic material, it becomes possible to reduce the influence of the photoresist on the developing solution, and thus to obtain a stable alignment layer.

Fig. 14F shows a structural example of the liquid crystal element using the alignment layer having such a structure in which the liquid crystal molecules 17 between a substrate 10 and aligning layers 11, 12 with low and high pretilt angle on the color filter side and a substrate 10 'and alignment layers 11', 12 'Included with a low and high pretilt angle on the thin film transistor side. The pretilt angle of the liquid crystal in the alignment layer on the color filter side and the pretilt angle of the liquid crystal molecules in the alignment layer on the thin film transistor side are set differently from one another by the alignment control of the alignment layers 11 , 11 'with a low pretilt angle and the alignment layers 12 , 12 ' with the high pretilt angle.

As described above, a Liquid crystal elements an orientation layer for orienting the Liquid crystal formed in a predetermined direction. The alignment layer was generally by rubbing with an abrasive on the surface a starting layer for the alignment layer (synthetic resin layer) received to give a fixed orientation. In the Rubbing treatment creates dust and therefore the surface the alignment layer tends to be contaminated by the dust, and so on the alignment of the alignment layer is damaged.

To cope with these problems, the inventors have a technique for Forms of an alignment layer examined by an embossing process.

An alignment layer on a substrate of a liquid crystal element is formed on the surface of a substrate main body with a high strength, such as glass, generally with a thickness of 1 µm or less to increase the drive voltage of the liquid crystal element reduce. Consequently, an advantageous irregular pattern cannot only by pressing a shaping device onto it, such as the shaping of an irregular pattern on a soft and thick plastic layer.

In particular, it is used to form an irregular pattern on the Surface of a thin alignment layer needed, one Shaping device precisely with a uniform pressure on the  Press the starting layer for the plastic alignment layer. To This is the case in the event that a press has to be pressed on is used, the flatness and parallelism of a Increase molding plate and press molding set and the pressure distribution in the plane when pressing the Shaping device on the starting layer for the alignment layer to equalize.

The process for producing a liquid crystal element with the Prior art structure requires a photolithographic Process that tends to complicate the whole manufacturing process Productivity deteriorates and manufacturing costs increase. In addition, in the manufacturing process of the prior art residues from the photolithography step in the Alignment layer contain and give rise to fears in terms of reducing the product yield.

In addition, an initial layer for a Alignment layer rubbed with an abrasive and this creates dust generated while masking through photolithography Clean room is necessary, and consequently the handling of the whole The process is complicated and the whole process becomes difficult maintain high quality throughout.

In the prior art method described with reference to Fig. 13, the photoresist 3 is applied after the first rubbing treatment and openings are formed by patterning on the photoresist, after which the initially rubbed alignment layer 2 in the other direction through the Openings of the photoresist 3 in the state in which a part of the initially rubbed alignment layer 2 is protected is partly rubbed off again. As a result, areas of the photoresist 3 near the openings cannot be rubbed with high precision because the domains of the photoresist 3 are rubbed twice in the openings. With this rubbing treatment, the treated size of a picture element is limited to approximately 100 µm × 100 µm.

Fig. 15 is a plan view showing the Abreibrichtung of the alignment films in an example of a liquid crystal element, wherein the Abreibrichtung the alignment layer is different from the color filter side of the Abreibrichtung the alignment layer on the thin film transistor side, said Abreibrichtung A perpendicular to the Abreibrichtung B is.

Incidentally, the liquid crystal element having such a structure has a visual field angle characteristic as shown in Fig. 16 and has a disadvantage that the visual field angle is narrow in a predetermined direction. The field of view angle characteristic shown in FIG. 16 has an area of CR 10.

Here, the term "CR" means "contrast" and is defined in the following equation for a normal white type liquid crystal (white display when no voltage is applied and black display when a voltage is applied).
CR = (transmittance when voltage is not applied) / (transmittance when voltage is applied).

CR is also defined by the following equation for a normal black type liquid crystal (black display when no voltage is applied and white display when voltage is applied).
CR = (transmittance when voltage is applied) / (transmittance when voltage is not applied).

In the liquid crystal element in which the combination of Rubbing direction of an alignment layer on the color filter side and the Rubbing direction of an alignment layer on the thin film transistor side for each picture element each thin film transistor is different, need a substrate that has one alignment layer and another The substrate containing the other alignment layer is correctly positioned and linked together to generate errors in the  To eliminate the order of magnitude of a picture element unit. Liquid crystal is trapped in between. Then when the preceding described positioning accuracy is just a little bad, it will difficult to achieve a desirable alignment of the liquid crystal receive.

Incidentally, the angle of rotation of an STN (Super Twisted Nematic - super-twisted nematic) liquid crystal commonly used in Range from 180 to 240 °, and you can consider that the Field of view angle increased by increasing the angle of rotation can be.

However, by the rotation angle of 240 ° with the STN liquid crystal the angle of inclination of the liquid crystal molecules must be 6 ° or larger. For the alignment layer, which is the rubbing treatment of the Prior art exposed using an abrasive it is difficult to make a pre-tilt angle of 6 ° or more to form stable.

So far, a method is known for projecting areas with a Tilt angle of 6 ° or more to be formed by a special Evaporation, called oblique evaporation and therefore a high Realize pre-tilt angle. This procedure leads to high Manufacturing costs and is not suitable for mass production.

In addition, the inventors have found that even if one highly planar embossing device for forming an alignment layer a starting layer for an alignment layer is pressed, the The shape of the surface of the embossing mold sometimes does not match perfectly Starting layer for the alignment layer is embossed.

The reason for this is that, as shown in Fig. 25A, a transparent substrate 102 made of glass, which is provided with an exit layer 101 for an alignment layer, is generally weak in ripple, unevenness or tilting and is therefore uneven in thickness . As a result, even if it is sufficiently subjected to a surface treatment such as grinding, a slight ripple, unevenness or tilt remains on the surface of the substrate 102 .

Especially when the pressing is carried out using an embossing device having a press base 103 having a high planarity, a sheet-like elastic member 104 attached to the press base 103 and a plate-shaped molding member 105 , domains form where the molding member 105 is not pressed onto the alignment layer starting layer 101 as shown in Fig. 25B. These domains cause misalignment, causing failure to display the liquid crystal display.

Furthermore, in the case in which an irregular pattern is formed on the output layer 101 for alignment with the shaping element 105, and then the shaping element 105 is separated from the output layer 101 for the alignment layer, withdrawing a portion of the output layer 101 for the alignment and remains adhere to the surface of the shaping element 105 if the shaping element 105 and the starting layer for the alignment layer consist of materials which are susceptible to easily binding to one another. This will damage part of the alignment layer and cause unevenness in the display. In addition, the above-described problem of stripping the alignment layer is significantly increased if the shaping element 105 is made of nickel, since the starting layer for the alignment layer generally consists of an aromatic polyamide.

In view of the foregoing, the present invention has been accomplished made, and it is an object of the present invention to provide a Liquid crystal element and its manufacture, the manufacture of a Alignment layer for a liquid crystal and an embossing device for Forming an alignment layer for a liquid crystal element and its To provide manufacture, wherein an alignment layer with a Majority of uniform alignment domains can be manufactured and  thereby a liquid crystal display element with a wide Field of view angle can be obtained.

Another object of the present invention is to provide a To provide embossing device that gently emboss a irregular pattern allows, and parts of a peel Starting layer for the alignment layer when separating from one Prevent embossing device and thereby the occurrence of failure to eliminate by peeling off even when an alignment layer is on a substrate with a slight tilt, bumps or Ripple is formed.

In order to achieve the foregoing goal, according to a first embodiment, as described in claim 1, there is provided a liquid crystal element comprising:
A pair of substrates which are arranged so that they face each other and each have an alignment layer on their facing surface, and
Liquid crystal held between the substrates, a surface shape of the alignment layer being formed in at least one of the substrates by pressing on a shaping device, and
the alignment layer, which is formed by pressing the shaping device with the surface shape, has a plurality of uniform alignment domains which differ from one another in the exit direction or exit size from an angle of inclination of the liquid crystal within an effective display area.

According to a preferred embodiment, as in claim 2 a liquid crystal element according to claim 1 is described provided in which the alignment layer is on one of the substrates is trained and has several of the uniform alignment domains, has two directional alignment domains in which the Exit directions of the pretilt angle of the liquid crystal approximately are parallel to each other, and the alignment layer is on top of the other  Substrate is formed, has a pretilt angle that is smaller than the pre-tilt angle for one of the substrates.

According to a preferred embodiment according to claim 3, a Liquid crystal element according to claim 1 or 2, wherein the surface shape of the alignment layer from a cluster several protruding areas is formed, the inclined surfaces have, the inclined surfaces of the protruding areas as one Device for adjusting the angle of inclination of the liquid crystal to serve.

According to a preferred embodiment, as in claim 4 is described, a liquid crystal element according to one of the claims 1 to 3 proposed, in which a uniform alignment domain with a Exit direction or an exit size from a pre-tilt angle the liquid crystal from a collection of first protruding areas with inclined surfaces that extend at an angle of inclination, trained and the other uniform alignment domain with one Exit direction or an exit size of one Incline angle that is uniform in one Alignment domain is different from a cluster of several second protruding areas is formed, the inclined surfaces have that extend at an angle from that of Tilt areas of the first above areas is different.

According to a preferred embodiment, as in claim 5 is described, a liquid crystal element according to one of the claims 1 to 4 proposed, in which the surface shape of a Alignment layer with a cluster of protruding areas Inclination surfaces is formed, wherein the angle of inclination Inclination surfaces of those formed on the surface of the alignment layer above ranges is set to 6 ° or more.

According to an embodiment described in claim 6, a method for producing a liquid crystal element with liquid crystal held between a pair of substrates is proposed, the substrates being arranged so that they face each other and each having an alignment layer on their facing surfaces, comprising:
a step of manufacturing the alignment layer starting layer to form an alignment layer starting layer on the surface of each of the substrates, and
a shaping step of pressing on a shaping device for shaping a plurality of uniform alignment domains on the surface of at least one of the starting layers for the alignment layers of different uniform alignment domains in an exit direction or exit size from a pretilt angle of the liquid crystal within an effective display area.

According to a preferred embodiment, as described in claim 7, a method for producing a liquid crystal element with liquid crystal held between a pair of substrates is proposed, the substrates being arranged so that they face each other and each having an alignment layer on their facing surfaces , showing:
a step of manufacturing the alignment layer starting layer to form an alignment layer starting layer on the surface of each of the substrates, and
a first shaping step of pressing on a shaping device for shaping uniform alignment domains which are approximately equal to one another in the exit direction or exit size from an angle of inclination of the liquid crystal within an effective display area on the surface of the substrate, on the surface of at least one of the starting layers for the alignment layers, and
a second shaping step of pressing on a shaping device for shaping uniform alignment domains, which are different in the exit direction of the pretilt angles from those obtained in the first shaping step, on the surface of this starting layer for the alignment layer.

According to a preferred embodiment, as described in claim 8, a method for producing a liquid crystal element according to claim 6 or 7 is proposed, which further comprises:
a shaping step of pressing the shaping device onto one of the starting layers for the alignment layers, and
a step of pressing an approximately cylindrical roller, which is provided at least on the surface with an elastic body, onto the other of the starting layers for the alignment layers.

According to a preferred embodiment, as in claim 9 described, a method for producing a liquid crystal element proposed according to one of claims 6 to 8, wherein the uniform alignment domains using an embossing device are formed in which several protruding areas with Inclination surfaces are formed on the surface, the Inclination angle of the inclination surfaces of the protruding areas to 60 or more is set.

According to a preferred embodiment, as in claim 10 described, a method for producing a liquid crystal element proposed according to one of claims 6 to 9, wherein the Shaping step using a shaping device is executed, on the surface of which several first areas each to form a uniform alignment domain and several second ones Areas to shape the other uniform alignment domain are formed, the first areas being a collection of several protruding areas with sloping surfaces, the same Have inclination directions and inclination angles, are formed and the second areas from several above areas with Slope surfaces, one from the direction of the slope and the Tilt angle of the first areas different tilt direction and Have inclination angles.

According to a preferred embodiment, as described in claim 11, an embossing device is proposed, which is pressed on the surface of a starting layer for an alignment layer made of synthetic resin, which was formed on a substrate for a liquid crystal element, by a plurality of protruding regions on the surface of the starting layer to shape for the alignment layer, comprising:
Bumps that are repeatedly formed on the surface of the embossing device in a first direction, and
Bumps that are repeatedly formed on the surface of the embossing device in a second direction that crosses the first direction,
wherein the slope direction of the slope surfaces formed by the asperities is set for each of a plurality of divided domains formed on the surface of the die.

According to a preferred embodiment, as in claim 12 described, an embossing device for forming an alignment layer proposed for a liquid crystal element according to claim 11, wherein the angle of inclination of the inclined surfaces on the surface of the Embosser shaped protruding areas at 6 ° or more is set.

According to a preferred embodiment, as in claim 13 described, an embossing device for forming an alignment layer proposed for a liquid crystal element according to claim 11 or 12, in which the shared domain of the embossing device is equivalent to one of the protruding areas formed on the embossing device.

According to a preferred embodiment, as described in claim 14, a method for producing an embossing mold for forming an alignment layer for a liquid crystal element is proposed, comprising:
a first heating step for heating an embossed layer formed from a thermoplastic resin hardened by ultraviolet rays, formed on a substrate,
a first embossing step in which a single-domain embossing device, on the surface of which several bumps are repeatedly formed in an optional direction, is pressed onto the embossing layer,
an irradiation step with ultraviolet rays, in which a mask formed with opening areas at suitable intervals is arranged and ultraviolet rays are emitted through the mask onto the embossed layer,
a second heating step for heating the embossing layer after the irradiation step with ultraviolet rays,
a second embossing step in which a single-domain embossing device, on the surface of which several bumps are repeatedly formed along a direction different from the selectable direction in the first embossing step, is pressed onto the embossing layer, and
a step in which the embossing device is pressed onto the embossing layer after the second embossing step and thereby the surface shape of the embossing layer is embossed on the embossing device.

According to a preferred embodiment, as described in claim 15, a method for forming an alignment layer for a liquid crystal element is proposed, comprising:
a first heating step for heating an initial layer formed on a substrate for the alignment layer from a thermoplastic resin hardened by ultraviolet rays,
a first embossing step in which a single-domain embossing device, on the surface of which several bumps are repeatedly formed in a selectable direction, is pressed onto the starting layer for the alignment layer,
an irradiation step with ultraviolet rays, in which a mask formed with opening regions at suitable intervals is arranged and ultraviolet rays are emitted through the mask onto the starting layer for the alignment layer,
a second heating step for heating the starting layer for the alignment layer after the irradiation step with the ultraviolet rays, and
a second embossing step, in which a single-domain embossing device, on the surface of which several bumps are repeatedly formed in a direction different from the selectable direction in the first embossing step, is pressed onto the starting layer for the alignment layer.

According to a preferred embodiment, as described in claim 16, a method for producing an embossing device for forming an alignment layer for a liquid crystal element is proposed, comprising:
a first heating step for heating an embossed layer formed from a thermoplastic resin hardened by ultraviolet rays, formed on a substrate,
a first embossing step in which a single-domain embossing device, on the surface of which several bumps are repeatedly formed in a selectable direction, is pressed onto the embossing layer,
an irradiation step with ultraviolet rays, in which a mask formed with opening areas at suitable distances is arranged and through the mask ultraviolet rays are emitted onto the embossing layer,
a second heating step for heating the embossing layer after the ultraviolet ray irradiation step, and
a second embossing step in which a single-domain embossing device, on the surface of which a plurality of unevenness is pressed onto the embossing layer in a direction which differs from the direction which can be selected in the first embossing step.

According to a preferred embodiment, as described in claim 17, a method for producing an embossing device for forming an alignment layer for a liquid crystal element is proposed, comprising:
a first heating step for heating an embossed layer formed from a thermoplastic resin hardened by ultraviolet rays, formed on a substrate,
a first embossing step in which a single-domain embossing device, on the surface of which several bumps are repeatedly arranged in a selectable direction, is pressed onto an embossing layer,
an irradiation step with ultraviolet rays, in which a mask formed with opening areas at suitable intervals is arranged and through the mask ultraviolet rays are emitted onto the embossed layer,
a second heating step for heating the embossing layer after the ultraviolet ray irradiation step, and
a second embossing step in which a single-domain embossing device, on the surface of which several bumps are repeatedly formed in a direction that differs from the selectable direction in the first embossing step, is pressed onto the embossing layer,
wherein the surface shape is formed on the embossing device using the electro-casting method using the embossing layer after the embossing step as an original template.

According to a preferred embodiment, as described in claim 18, an embossing device is proposed which is used for pressing a shaping element with an irregular pattern onto an output layer for an alignment layer on a substrate, and thus the irregular pattern onto the surface of the output layer for the alignment layer embossed, showing:
a press body made of a rigid body,
an elastic element which is arranged so that it faces the press base, and
a layer-like shaping element which is provided on the side of the elastic element which does not face the press base.

According to a preferred embodiment, as in claim 19 described, proposed an embossing device according to claim 18, in which the elastic element on the surface of the press Base body is attached and the shaping element on the Surface of the elastic element is attached.  

According to a preferred embodiment, as in claim 20 described an embossing device for shaping an irregular A pattern on an alignment layer according to claim 18 or 19 proposed, in which the press body has a flat shape having.

According to a preferred embodiment, as in claim 21 described an embossing device for shaping an irregular A pattern on an alignment layer according to claim 18 or 19 proposed in which the press base body a role shape having.

According to a preferred embodiment, as in claim 22 described, an embossing device according to one of claims 18 to 21 proposed in which the shaping element with a thickness in Range of 0.001 mm to 0.2 mm is formed.

According to a preferred embodiment, as in claim 23 described, an embossing device according to one of claims 18 to 22 proposed in which a coating layer of gold, gold alloy, Copper or copper alloy on the surface of the Shaping element is formed.

The function of the present invention is described below.

According to the preferred embodiment as set out in claim 1 is described, it is possible to use the dust-generating rubbing step to eliminate, since the surface shape of an alignment layer by the Pressing on a shaping device is transmitted so accurately a selectable surface shape according to the shape of the Transfer shaping device to an alignment layer and also select uniform targeting domains in a selectable number transfer. You can also use any field of view angle characteristic obtained according to each uniform alignment domain, as there are several uniform Alignment domains are formed on an effective display surface, and  one can have a preferred field of view angle characteristic in all Get directions as a whole.

Because the surface shape of an alignment layer depends on the shape the shaping device is fixed, it is possible to even a Surface shape with bumps on the order of a few To form µm × µm and thus a liquid crystal element with high density to provide.

Since the surface of an alignment layer without one at the conventional photoresist is used, it is possible to eliminate the problems such as B. Disruption of Surface shape of the alignment layer and damage to the underlying alignment layer, which changes when the Photo lacquers usually resulted.

In the structure of the prior art, in which a pretilt angle of the liquid crystal through the surface shape of one Rubbing treatment formed alignment layer is controlled Surface shape of the alignment layer at the interface between the the first domain subjected to attrition treatment and the second domain Abrasion treatment disrupted domain if the Rubdown treatment several times using a photoresist as Mask implemented to implement a wide field of view angle was so that the width of the disturbed alignment of liquid crystal is enlarged at the interface. In contrast, the Process of shaping the surface shape of the alignment layer the shaping device aligned the interface in the Direction can be controlled perfectly, so that the width of the disturbed Targeting is made narrow, and so is the quality of the display is improved.

Because it corresponds to the unevenness of a shaping device Surface shape can be transferred to an alignment layer, can be the number of uniform targeting domains that each Image element are formed, compared are significantly enlarged  with the conventional type. For example, for a picture element of 100 µm × 100 µm in the prior art two pieces of Domains are formed in the structure of the surface shape of the Alignment layer, which can be obtained by pressing on one Shaping device receives, however, some up to some 10th or more alignment domains can be easily formed since those on the Surface of the forming device formed unevenness correctly can be embossed down to the µm range. Besides, this one Procedures the need for positioning between the Image elements and the alignment layer eliminated.

According to the preferred embodiment as set out in claim 2 there are two directional uniforms on each picture element Alignment domains are formed, in which aligned directions in the are formed essentially parallel to each other. In addition, the Pre-tilt angle low in another alignment layer so that, if the substrates are stacked, for which Positioning does not require such great accuracy.

According to the preferred embodiment according to claim 3 or 4, it is possible the angle of inclination of the liquid crystal through the Determine the angle of inclination because the surface shape of a Alignment layer from a collection of incline surfaces from protruding areas is formed, and the pretilt angle for each uniform alignment domain due to the inclined surfaces of the above Set areas in each domain.

According to the preferred embodiment according to claim 5, the Rotation angle of the liquid crystal molecules set to 240 ° or more because the angle of inclination of the liquid crystal molecules to 6 ° or more is set. The angle of rotation can be for STN liquid crystal will be realized.

According to the preferred embodiment according to claim 6, one can correctly obtain a selectable surface shape of an alignment layer, because the surface shape of an alignment layer is achieved by pressing on an  Shaping device is transferred and you can Orientation layer with uniform alignment domains desired Number received. Since there are several uniform alignment domains within one effective display area can also be formed Field of view angle corresponding to each uniform alignment domain obtained, and so you can with an excellent liquid crystal element a preferred field of view angle in all directions as a whole receive.

According to the preferred embodiment according to claim 7 in addition to the first shaping step, which is in the preferred Embodiment according to claim 6 has been described, a second Shaping step provided, in which a shaping device to form uniform alignment domains, which are in the Exit direction of the pre-tilt angle from those in the first Shaping step obtained differ on the surface of the Starting layer for the alignment layer is pressed. So can different uniform alignment domains securely on one substrate be formed, and so you can a liquid crystal element with a excellent preferred angle of view in all directions as a whole receive.

According to the preferred embodiment according to claim 8, a Alignment layer with a surface shape with a small Front tilt angle by pressing a roll with a elastic bodies are easily formed on an alignment layer, and therefore, a liquid crystal element having an upper and a lower substrate that is easy to position.

When using an embossing device where the inclination angle of the inclined surfaces of the protruding portions is 6 ° or more, as in the preferred embodiment according to claim 9 is described the pre-tilt angle of the liquid crystal is 6 ° or more and hence you can use a liquid crystal with a rotation angle of 240 ° or received more. So you can have a liquid crystal element with a wide Preserved field of view angle.  

You can also when using an embossing device of the several protruding areas with inclined surfaces, as in the preferred embodiment according to claim 10 have been described, are accumulated, several uniform alignment domains easily on one Form the alignment layer and thus the pretilt angle of Check the liquid crystal easily.

According to the preferred embodiment according to claim 11 or 12 a shaping device is created which is used to shape a irregular surface shape on a starting layer for a Alignment layer is used on a substrate. Here are the Slope surfaces on the starting layer for the alignment layer shaped bumps set for each of multiple domains, so that the alignment of the liquid crystal for each of the previous ones Domains is set. As a result, it is possible to use an alignment layer with multiple domains, with each for each Orientation of liquid crystal is set, and so on Obtain liquid crystal element with alignment for each Domain is set.

The angle of rotation of the liquid crystal can be determined by determining the Angle of rotation of the rotating surfaces of each protruding area on the Surface increased to 6 ° or more.

In the preferred embodiment according to claim 13 can multiple domains are formed on the alignment layer, each have a minimum size on the molding device can be formed as a protruding area as a uniform Targeting domain is viewed, and the different targeting can be transferred to the liquid crystal for any domain. Consequently, it is possible to align the liquid crystal molecules in very fine domains to change compared to the conventional, and such a liquid crystal element with a large field of view angle to provide.  

In the method of manufacturing an embossing device for molding an alignment layer on a liquid crystal element according to the preferred embodiment according to claim 14 can Embossing device for forming an alignment layer, the one Alignment subdivision is made at low cost will. Compared to the process of molding a Alignment layer through the rubbing treatment, the controllability is great, and it is possible to use a stable and highly accurate alignment layer to form a high pretilt angle.

In contrast to the process of forming an alignment layer the shape transfer step in a clean environment without generating dust.

In addition, the method of forming an alignment layer using a forming device, the manufacturing cost can be significantly reduced compared to a method of Create a grid using photolithography.

In the process of forming an alignment layer for a Liquid crystal element according to the preferred embodiment Claim 15 can be an alignment layer without the production of a Embossing device can be shaped in one direction aligned surface shape. It is also compared to the method of forming an alignment layer by the Rubbing treatment is controllable, and it is possible stable and precise alignment layer with a high pre-tilt angle to shape.

In contrast to the process of forming an alignment layer through the rubbing treatment, the shape transfer process in a clean environment without generating dust.

In addition, the manufacturing costs can be significantly reduced compared to the process of making a grid below Use of photolithography.  

In the method of manufacturing an embossing device for molding an alignment layer for a liquid crystal element according to the preferred embodiment according to claim 10, the Embossing device are manufactured without the embossing base device, and so the manufacturing cost can be reduced.

In the method of manufacturing an embossing device for molding an alignment layer for a liquid crystal element according to the preferred embodiment according to claim 17, the The surface shape can be precisely shaped by an embossing Base device on an embossing device using Cast iron.

The invention and developments of the invention are as follows based on partially schematically illustrated embodiments explained in more detail. Show it:

Fig. 1 is a section showing the state in which an output layer for the alignment layer is formed on a substrate,

Fig. 2 is a side view showing the state in which a plurality of projecting portions are formed on an output layer for an alignment layer using a stamping device,

Fig. 3 is an enlarged partial perspective view showing the irregularities of the embossing unit,

Fig. 4 is an enlarged partial view showing a on an output layer for the alignment layer using a stamping device formed irregular pattern,

Fig. 5 is an enlarged partial perspective view showing the shape of the pattern shown in Fig. 4,

Fig. 6 is a section of the irregular pattern shown in Fig. 5,

Fig. 7 is an enlarged partial sectional view showing another on an output layer for an alignment layer formed irregular pattern,

Fig. 8 is an enlarged partial perspective view showing another irregular pattern on an alignment layer according to the invention,

Fig. 9 is a graph with the same contrast for realizing the rotation by 270 ° in STN liquid crystal,

Fig. 10 is a graph with the same contrast for realizing the rotation by 180 ° STN liquid crystal,

FIG. 11A to 11G are step diagrams showing a method of manufacturing an embossing means for forming an alignment layer of a liquid crystal element,

Fig. 12 is a plan view showing an example of a mask that is used for producing a stamping mold for forming an alignment layer for a liquid crystal element

FIG. 13A is a step diagram of a method of the prior art showing an output layer formed on a substrate for an alignment layer,

FIG. 13B is a step diagram of the method of the prior art, showing the state in which the output layer is exposed for the alignment to an aligning treatment by rubbing,

FIG. 13C, an operation diagram of the method of the prior art, showing the state in which a photoresist is formed,

Fig. 13D, an operation diagram of the process are of the prior art, showing the state in the removed parts of the photoresist,

FIG. 13E, an operation diagram of the method of the prior art, showing the state in which the second rubbing is performed on the portions from which the photoresist has been removed,

Fig. 13F, an operation diagram of the method of the prior art, showing the alignment layer obtained,

Fig. 13G is a section showing an essential part of a liquid crystal element, wherein each domain of a Ausrichtteilung is exposed.

FIG. 14A is a step diagram of another method of the prior art, showing an alignment layer formed on a substrate with a small pretilt angle,

FIG. 14B is a step diagram of another method of the prior art, showing an alignment layer having a high pretilt angle, which is formed on the alignment layer with a small pretilt angle,

Fig. 14C is a step diagram of another method of the prior art, showing a photoresist film formed on the alignment layer having a large pretilt angle,

Fig. 14D is a step diagram of another method of the prior art, which shows the state where parts of the photoresist are removed, and also parts of the alignment layer are removed with a large pretilt angle,

FIG. 14E is a step diagram of another method of the prior art, showing the state in which the abrasion is performed on the parts, of which the alignment layer with the high pretilt angle was removed

Fig. 14F is a section showing an essential part of a liquid crystal element in which a domain of an alignment pitch is ausgestetz,

Fig. 15 is a view showing a construction in the prior art, in which the aligning treatment is performed in two mutually perpendicular directions,

Fig. 16 is a view showing a visual field angle characteristics of a liquid crystal element in FIG. 15 alignment shown,

Fig. 17 is a side view showing a first example of an embossing apparatus of the present invention,

Fig. 18 is a side view showing the state in which an irregular pattern on an output layer for an alignment film formed on a substrate using the stamping apparatus shown 17 is marked in Fig.

Fig. 19 is a side view showing a second example of an embossing apparatus of the present invention,

Fig. 20 is a side view showing the state in which an irregular pattern of the embossing device shown 19 is embossed on an output layer for an alignment layer which is formed on a substrate, using in FIG.

Fig. 21 is a side view showing a third example of an embossing apparatus of the present invention,

Fig. 22 is a side view showing the state in which an irregular pattern of the embossing device shown 21 is embossed on an output layer for an alignment layer which is formed on a substrate, using in FIG.

Fig. 23 is a perspective view showing an example of an alignment layer is increased,

FIG. 24A is a view showing the result of an interference light measurement, which was performed in the test sample,

FIG. 24B is a view showing the result of a process performed in the test sample release tests

FIG. 25A is a side view showing an example of an embossing apparatus of the prior art, and

FIG. 25B is a side view showing the state in which the embossing is carried out using the stamping device of the prior art.

Hereinafter, the present invention will be described in detail with reference to FIG the drawings are described.

A liquid crystal element is manufactured by the following method: First, a synthetic resin solution is applied to the surface of a substrate made of glass or the like having a rectangular shape as shown in Fig. 1 by spin coating, screen printing or offset printing, and is dried by heat treatment so as to Form starting layer 21 for an alignment layer.

The starting layer 21 for the alignment layer can be subjected to a preheat treatment and a post-heat treatment if necessary. The preheat treatment and the heat treatment can be carried out by a method in which the resin solution-provided substrate 20 is heat-treated at 80 ° C for about 30 minutes and then heat-treated at about 180 ° C for 1 hour. Alternatively, the substrate 20 can be preheated at approximately 80 ° C, screen printed with a synthetic resin solution, and heat treated.

In the previously described screen printing method, a synthetic resin solution is applied to the substrate 21 in such a way that a screen printing scraper is moved over a screen provided on the substrate 20 in the longitudinal direction, transversely or obliquely to the substrate 20 at a predetermined speed, e.g. B. 20 cm / sec.

The material of the substrate 20 is not limited to glass and may include those materials used for liquid crystal elements of this type, e.g. B. ceramics. The shape of the substrate 20 is also not limited to the rectangular one, and it can be a freely selectable one.

The starting layer 21 of the alignment layer is preferably formed of a thermosetting synthetic resin which has a small influence which it exerts on an embossing device (to be described later), such as, for example, an embossing device. B. epoxy resin, or from a light-curing resin. However, it can also be formed from a thermoplastic synthetic resin. In this case, the thermoplastic resin preferably has a glass transition point in the range of 130 to 280 ° C in order to ensure the heat stability of the liquid crystal element and also to maintain the stability of the resin in the heat treatment that is carried out to emboss the irregular pattern thereon with the (later to be described) embossing device. The starting layer 21 for the alignment layer made of the material meeting these requirements is excellent in heat resistance and can be easily embossed so that it obtains an irregular pattern (to be described later).

Then, a roll-like embossing device 23 shown in FIG. 2 is arranged on the surface of the starting layer 21 for the alignment layer in the direction perpendicular to the longitudinal direction of the substrate 20 . In this state, at least the substrate 20 or the embossing device 23 is heated to a temperature close to the glass transition temperature of the starting layer 21 for the alignment layer, and then the embossing device 23 is pressed onto the starting layer 21 for the alignment layer and simultaneously rolled in the longitudinal direction of the substrate 20 .

The embossing device 23 is composed of a roller main body made of metal or the like, on the surface of which a synthetic resin film is formed. As shown in FIG. 3, on the surface of the resin film of the embosser 23, there is an irregular pattern in which protruding portions 25 and recessed portions 26 are continuously formed in an aligned state. The irregular pattern includes bumps along a first direction and bumps along a second direction crossing the first direction as shown in FIG. 3. In this irregular pattern, a distance P1 of the bumps in the first direction is determined to be smaller than a distance P2 of the bumps in the second direction.

The irregular pattern of the embossing device 23 can thus be embossed on the surface of the starting layer 21 of the alignment layer in order to form an irregular pattern shown in FIGS. 4, 5 and 6 on the surface of the starting layer 21 . In the protruding portions 27 constituting the irregular pattern, as shown in Fig. 5, the distance P1 of the bumps in the first direction is determined to be shorter than the distance P2 of the bumps in the second direction. The inclination angle Θ of a ridge line of the apex region of the protruding region 27 of an inclination surface R2 that extends in the second direction is 20 ° or more, for example.

In this irregular pattern with that shown in the figures Structure, the distance P1 is, for example, 3 µm or less fixed. The distance P2 is 50 µm or less, for example. The Distances P1 and P2 are, however, not limited to this and can for example to 1.2 µm or less or 20 µm or less be fixed.

In this irregular pattern, moreover, as shown in FIG. 6, each protruding area 27 of the bumps in the second direction is formed with an approximately triangular shape that is asymmetrical to the left and right. In particular, the triangular shape of the protruding portion 27 is determined so that the angular ratio r₂ / r₁ is not equal to 1, wherein r₂ and r₁ are the right and left angles, respectively, when the acute angle of the triangle of the protruding portion 27 by divides vertical line A that goes through the top of the triangle. The protruding portion 27 may have a shape similar to a sine wave, a comb shape, or a triangle shape. Of these, the triangular shape is most suitable for improving the alignment of the liquid crystal. With this triangular shape of the projecting region 27 , the region of the tip can be rounded or flattened. Where the protruding region 27 is formed with a triangular shape, the angle ratio r₂ / r₁ described above can be set to 1, 2 or more, as shown in Fig. 6.

Although the term "irregular pattern" is used, it is pointed out that the pattern in the first direction and in the second direction substantially uniform continues. This term is primarily due to the unevenness of the Pattern referenced in the substrate plane.

In the above-described embossing step, it is desirable that after the embossing means is pressed 23 on the output layer 21 for the alignment layer, the layer is heated to a temperature near the glass transition temperature for a certain time 21 and the embossing device 23 then for embossing the irregular pattern is rolled. The applied pressing force of the embossing device 23 is suitably set in accordance with the hardness of the starting layer 21 for the alignment layer and is preferably set to, for example, about 50 kg / cm 2. The speed of movement of the embossing device 23 is preferably set to such a value that the irregular pattern is embossed perfectly, for example approximately 15 mm / sec.

After the embossing device 23 has been rolled toward the central region of the substrate 20 , the substrate 20 and the embossing device 23 are cooled while the embossing device 23 is pressed onto the substrate 20 . Then, when they have cooled to a temperature below the glass transition temperature, the embossing device 23 is removed from the starting layer for the alignment layer. The embosser 23 is then rotated 180 ° and moved to the opposite end of the substrate 20 , after which it is rolled from that end to the central region in the same manner as described above for embossing the irregular pattern. Alternatively, after the embossing is completed at the central region, the embosser is rotated 180 ° above the substrate 20 to change the direction of the irregular pattern and then rolled from the central region in the same manner as described above to remove the irregular To form patterns. Thus, on the remaining part of the substrate 20, a number of protruding portions 28 having inclined surfaces R3 are formed which are different in the direction of the inclined surfaces R2 of the protruding portions 27 of the previously formed irregular pattern, so as to form an alignment layer 29 . The alignment layer 29 has a uniform alignment domain B1 formed from a collection of a number of the protruding areas 27 with the inclined surfaces that incline at the same inclination angle and a uniform alignment domain B2 formed from the accumulation of a number of protruding regions 28 with the inclined surfaces that incline with the inclination angle different from the above-described inclination angle of the inclination surfaces in the uniform alignment domain B1.

Two parts of the substrate 20 with the alignment layer 29 thus obtained are stacked by a spacer or the like at a certain distance, and liquid crystal is sandwiched therebetween so as to form a liquid crystal cell.

By forming a number of the protruding areas on the surface on the starting layer of the alignment layer as described above, the conventional abrasion treatment using an abrasive does not have to be carried out, so that the step in which dust is generated is eliminated, and thus the manufacturing result is improved. In addition, the desired surface shape, which corresponds to the shape on the embossing device 23 , can be transferred to the surface of the alignment layer.

In addition, the liquid crystal molecules corresponding to the corresponding domains formed with the protruding portions 27 , 28 different in the direction of the inclined surfaces have respective inclined angles different from each other in the direction, so that two uniform liquid crystal alignment domains can be formed in one picture element system. As a result, a field of view angle characteristic that is wider than conventional can be obtained as a whole because the field of view angle characteristic corresponding to the respective domains can be obtained.

In this example, the starting layer 21 for the alignment layer is divided into two domains, and a number of protruding regions 27 or 28 with the inclined surfaces that incline in the same direction are formed in each domain. The layer 21 on the substrate 20 may be divided into a plurality of domains, and a number of protruding regions with a specified inclination direction may be formed on each of the plurality of divided domains. In this case, a plurality of domains are set on the surface of the embossing device 23 , and the protruding portions with inclined surfaces inclined in the same direction are formed on each of the plurality of domains. Such an embossing mold is rolled once on the starting layer 21 for the alignment layer, so that a number of domains, each having a plurality of projecting regions with inclined surfaces tending in the same direction, can be formed on the surface of the starting layer 21 for the alignment layer. In addition, since the liquid crystal pretilt angles (to be described later) are determined based on the inclination surfaces R2 and R3 of the protruding portions 27 and 28 , an alignment layer can be obtained with a plurality of domains each having the inclination directions of the slant surfaces R2 and R3 of the protruding portion 27 and 28 have appropriate alignment.

For example, as shown in FIG. 7, three pieces of the protruding portions 27 with the inclined surfaces R2 inclined at an angle are continuously formed in a domain, and on each side of the domain, three pieces of the protruding portions 28 are continuously formed with the inclination surfaces R3 which incline at a different angle to form an alignment layer 29 ', on the surface of which a number of irregular patterns are arranged in order. An embossing device 30 , which is used for this case, has an irregular shape shown in Fig. 7, in which recessed areas 27 'corresponding to the protruding areas 27 and recessed areas 28 ' are formed corresponding to the protruding areas 28 .

Through the one-time pressing of such a stamping device 30 to the output layer 21 for the alignment layer may simply be a number uniform Ausrichtdomänen each be formed with a slant surface that are inclined at the same angle, to the output layer 21 for the alignment layer.

Fig. 8 shows another example of an embossing means for forming an alignment layer. In the embossing device 31 , a number of protruding portions 32 , each with a cross-sectional shape similar to a sine waveform, are formed in an aligned state. In this example, the inclination angle of the ridge lines of the apex portion of the protruding portion 32 of an inclination surface extending in the second direction is made to be larger than that in the embossing device of the previous example. If the embossing device 31 with the protruding areas 32 with such a large angle of inclination is used, an alignment layer with a large angle of inclination can easily be formed.

Adjusting the tilt angle of the tilt surfaces of the protruding areas to a value greater than 20 ° or more, is particularly effective for the STN liquid crystal.

The angle of rotation of the STN liquid crystal is generally in the range of 180 to 240 °. But by increasing the angle of rotation to more than that The range described above can be the visibility range angle be enlarged. By the angle of rotation of the STN liquid crystal To set 240 ° or more, the angle of inclination of the Liquid crystal molecules must be set at 15 ° or more. At a Alignment layer undergoing an abrasion treatment Rubdown stops are exposed, however, a pretilt angle of 15 ° or more cannot be realized.

On the other hand, however, in the method using the embosser having the structure described above, the protruding portions 27 , 28 with inclination angles of 20 ° or more can be easily molded on a large scale, and consequently, the inclination angles of the liquid crystal molecules can easily be set to 20 ° or more can be set. Thus, the STN liquid crystal rotation angle of 270 ° can be realized, and thereby a liquid crystal element with a wide field of view angle can be produced on a large scale.

FIG. 9 is an equal contrast curve of an STN liquid crystal with a rotation angle of 270 °, which shows the dependence of the field of view angle on the viewing angle. The numbers around the concentric circles (0 °, 90 °, 180 ° and 270 °) show the directions in which the liquid crystal element is viewed. The concentric circles indicate the degree of inclination from the surface normal of the display element in 10 ° increments, and the outermost circle shows the inclination state from the normal by 60 °.

Fig. 10 is an equal contrast curve of an STN liquid crystal with a rotation angle of 180 ° in which the hatched areas show reverse domains. From this figure it can be seen that the rotation angle of 270 ° can be realized with the STN liquid crystal and domains with a high contrast can be obtained in a wide range.

The alignment layer with multiple domains, each the same Have alignment is made by the following procedure.

First, a thermoplastic is hardened by ultraviolet rays Synthetic resin flat on a substrate of an embossing base device applied to form an embossed layer.

As the thermoplastic resin hardened by ultraviolet rays can use polyvinyl cinnamate or polyvinyl benzalacetophenol will.

Then, in a first heating step, the embossing base layer is heated to soften the embossing layer. On the other hand, a single-domain embossing device 18 on which a plurality of bumps are repeatedly formed in a selectable direction is prepared separately. Then, as shown in FIG. 11A, the single-domain embossing device 18 is pressed onto the softened embossing layer 15 , so as to emboss the unevenness of the single-domain embossing device 18 onto the embossing layer 15 (first transfer step).

As shown in FIG. 11B, a mask having opening areas 24 arranged at appropriate intervals is placed on the embossing layer 15 , and ultraviolet rays with a wavelength of 220 to 400 nm are emitted over the mask 19 (irradiation step with ultraviolet rays) in order to harden only the regions of the embossing layer 15 which correspond to the opening regions of the mask 19 .

The mask 19 preferably has a striped pattern in which the opening areas 22 and shielding areas 24 are repeated periodically at fixed intervals. The width of the opening areas 22 is determined according to the domains to be formed and is preferably 50 μm or more.

In addition, the opening areas of the mask 19 are designed such that transmission of the ultraviolet rays is possible as a result.

As shown in Fig. 11C, the embossing layer is heated (second heating step). In this case, only a part of that on the substrate 14 of the embossing base device that was irradiated with ultraviolet rays in the previous step is softened.

Thereafter, a single-domain embossing device 33 , in which a plurality of bumps are repeatedly formed in one direction from the direction different from the single-domain embossing device 18 used in the first embossing step, is pressed onto the embossing layer 15 in order to apply the unevenness of the single-domain embossing device 33 to the embossing layer 15 emboss (second embossing step).

The one-domain embosser 33 used in the second embossing step may be different from the one-domain embosser 18 , or it may be the same. In the case where the one-domain embosser 18 is used as the one-domain embosser 33 , the direction relative to the embossing base 34 is changed. The embossing base device 34 or the single-domain embossing device 18 is rotated, for example, by 90 ° or by 180 ° and is pressed onto the embossing layer 15 .

By aligning the domains with ultraviolet rays be irradiated, or the number of embossing by the Domain embosser can have an alignment layer with bumps  are produced, the three or more types of direction or Has angle of inclination.

The entire embossing layer 15 is then cured by irradiating the entire embossing layer 15 with ultraviolet rays, so as to form the embossing base 34 , in which the embossing layer 15 is formed on the substrate 14 with asperities extending in two directions, such as shown in Fig. 11E.

Then, as shown in Fig. 11F, a flat embosser 35 is pressed on the embossing layer 15 of the embossing base 34 to be embossed with the surface shape of the embossing layer 15 and so as to form the embossing means 35 for forming an alignment layer on a liquid crystal element such as shown in Fig. 11G.

An outer layer with bumps that extend in several directions extend, can also without the embossing described above Base device are shaped.

In the method for producing the embossing device for forming an alignment layer of a liquid crystal element, an alignment layer substrate is used for the substrate 14 of the embossing base device 34 and an alignment layer is used for the embossing layer. Again referring to the drawings 11A to 11G, this manufacturing method is described below.

First, a thermoplastic, ultraviolet curing, Synthetic resin applied flat to a substrate the base for an alignment layer is a starting layer for to form the alignment layer. Then in a first Heating step the starting layer for the alignment layer to Softening warmed up.

Incidentally, a single-domain embossing device 18 on which multiple irregularities are repeatedly formed in an optional direction is prepared separately. Then, the A-domain coining device 18, as shown in Fig. 11A is pressed onto the softened output layer 15 for the alignment, and so the unevenness of the input domain embossing device are shaped 18 to the output layer 15 for the alignment layer (first embossing step).

As shown in Fig. 11B, a mask having opening portions 24 arranged at appropriate intervals is placed on the alignment layer output layer 15 , and ultraviolet rays are emitted through the mask 19 (the ultraviolet ray irradiation step) to only the parts of the starting layer 15 for the alignment layer, which correspond to the opening areas of the mask 19 . In addition, the opening areas of the mask 19 are such that the transmission of the ultraviolet rays is possible.

As shown in Fig. 11C, the starting layer 15 for the alignment layer is heated (second heating step). Only the regions of the starting layer 15 for the alignment layer that were not irradiated with ultraviolet rays in the previous step are softened.

As a result, a single-domain embossing device 33, in which a plurality of bumps are repeatedly formed in a direction different from the single-domain embossing device 18 used in the first embossing step, is pressed onto the starting layer 15 for the alignment layer in order to place the unevenness of the single-domain embossing device 33 on the starting layer 15 to be embossed for the alignment layer (second embossing step).

The one-domain embosser 33 used in the second embossing step may be different from or the same as the one-domain embosser 18 . Then, when the single-domain embosser 18 is used as the 1-domain embosser 33 , its direction is changed relative to the embossing base 34 . The embossing base device 34 or the single-domain embossing device 18 is rotated, for example, by 90 or 180 ° and is pressed on for embossing.

By matching the domains with the ultraviolet rays be irradiated, or the number of embossing with the Domain embosser can be a starting layer for a Alignment layer are formed, which has bumps, the three or has several types of direction or angle of inclination.

The entire starting layer 15 for the alignment layer is then cured by irradiating the entire starting layer 15 for the alignment layer with ultraviolet rays, thus forming the alignment layer with bumps extending in two directions on the substrate 14 , as shown in Fig. 11E.

In addition, in the embossing device for embossing irregular pattern according to the present invention Shaping element on a press base over an elastic Element attached. With this embossing device, in the case in an irregular pattern by pressing on the element an initial layer for the alignment layer is embossed even if the starting layer for the alignment layer relative to the press Base body is slightly inclined, the elastic element according to the inclination the starting layer for the alignment layer are deformed with the Result that the irregular pattern of the shaping element sure on the whole surface of the starting layer for that Alignment layer can be pressed.

If a molding element with a thickness of 0.001 to 0.2 mm is used, even if the starting layer for the Alignment layer a slight ripple, bumps or Tilting due to the fine ripple, bumps or Tilting of the substrate, the elastic element and the Shaping element according to the ripple, the irregularities or the tilt can be deformed safely. This can do that irregular pattern of the shaping element safely on the whole Surface of the starting layer for the alignment layer to be pressed. Especially through the use of the shaping device with a  Thickness of 0.2 mm or less can the elastic member and the Shaping element of ripple, irregularities or Tilting the substrate or the starting layer for the Follow the alignment layer sufficiently. If the elastic element also has a thickness of 0.001 mm or more, it causes never also have problems such as breaking the Handling.

By providing a gold or copper plating layer the surface of the molding member can be prevented from the starting layer for the alignment layer on the Shaping element adheres when an irregular pattern on the Starting layer for the alignment layer is embossed and then that Shaping element from the starting layer for the alignment layer Will get removed.

The press body can be a flat plate or with be formed in a roll shape. In the case of the flat plate-like Press base body provided with an elastic element and Shaping element can only have an irregular pattern Pressing process can be shaped. On the other hand, with a roll-like Base body an irregular pattern by pressing the Base body to be embossed while on a starting layer for the alignment layer is rolled on the substrate.

The present invention can be illustrated by the following examples easier to understand. However, it should be noted that the present invention is not limited to these.

example 1

In this example, the present invention is turned to one nematic liquid crystal element applied.  

A rectangular glass substrate for a liquid crystal element, on the Surface an electrode was formed was prepared. On the The surface of the substrate was a solution of γ-butyl lactam with 5 % By weight of polyethersulfan (trademark PES, manufactured by Mitsui Toatsu) screen printed with a thickness of 0.1 µm, to form a solution layer. At the same time, a Screen wipers in the longitudinal direction of the gas substrate with a Speed of approximately 20 cm / sec moves to the solution layer to build.

The substrate provided with the solution layer was at for 30 seconds 30 ° C pre-heat treated and one hour at 180 ° C further heat treated to dry the solution layer and so one Starting layer formed for an alignment layer. Alternatively, the Solution are pressed onto the glass substrate, which is already at 80 ° C was preheated.

A cylindrical embosser made of epoxy resin, on the surface of which an irregular pattern as shown in Fig. 3 was formed, was placed on the starting layer for the alignment layer. In this state, the starting layer for the alignment layer was heated to 240 ° C and held at 240 ° C for five minutes. Then the embossing device was pressed with a pressure of 50 kg / cm² onto the starting layer for the aligning layer 24286 00070 552 001000280000000200012000285912417500040 0002019523132 00004 24167 and at the same time rolled at a movement speed of 15 mm / min to align the embossing device for the aligning layer to shape.

An irregular pattern shown in Fig. 4 was thus embossed on the surface of the alignment layer. The protruding and recessed portions of the irregular pattern, each having an approximately triangular shape, were formed along the direction of movement of the screen printing scraper, that is, in the longitudinal direction of the glass substrate. The height of the protruding portions was 0.2 µm, the length of the inclined surface was 0.2 µm, and the distance between the protruding portions arranged to the right and left was 0.3 µm. In this example, the uniform alignment domain has a size of 30 × 30 µm.

Two parts of the substrate, each with such an alignment film trained, were placed one on top of the other in such a way that they separated from each other a certain distance are separated by a spacer, and TN liquid crystal (trade name: K-15, manufactured by CHISSO CORPORATION) was included in between to create a Manufacture liquid crystal cell.

The field of view angle of the liquid crystal element thus obtained was approximately 40 ° in the transverse direction and approximately 40 ° in the vertical direction.

In contrast, the field of view angle of the liquid crystal element is included the same structure except that there are no uniform alignment domains were intended to be approximately 30 ° in the transverse direction, approximately 10 ° in Direction upwards and approximately 20 ° downwards.

In the foregoing method, it is desirable that the Direction of movement of the screen printing scraper essentially the same is like the arrangement direction of the approximately triangular above areas. As the direction of movement of the Screen printing scraper does not necessarily have to be in the longitudinal direction of the substrate can be selected, it can also be the transverse direction or a Direction to be chosen obliquely.

Example 2

The solution used in Example 1 was replaced by a solution the 2% by weight polyvinyl alcohol (trade name: NM-14, manufactured by The Nippon Synthetic Chemical Industry Co., Ltd.) and the Using pure water as a solvent contained. The solution was applied to a substrate by spin coating. Then the substrate provided with the solution layer became a Pre-heat treated at 50 ° C for one minute and further at 120 ° for one hour  heat-treated to dry the solution, and so one Starting layer for an alignment layer with a thickness similar to that prepared in Example 1.

The substrate and the roll type embosser shown in Fig. 2 were heated to 180 ° and 100 °, respectively, and the embosser was pressed onto the starting layer for the aligning layer and rolled at the same time to form a regular pattern formed on the surface of the embossing device on the starting layer for emboss the alignment layer and thus produce an alignment layer. Two pieces of the substrate thus obtained were stacked in the same manner as in Example 1 to form a liquid crystal cell having a field of view angle similar to that in Example 1.

Example 3

A solution of 1,1,1,3,3,3-hexafluoro-2-propanol containing 5% high molecular liquid crystal (manufactured by Asahi Denka Kogyo) was placed on a rectangular glass substrate similar to that in Example 1 applied to a starting layer for a To form the alignment layer. The starting layer for the alignment layer was predried at 80 ° for 30 seconds and at 180 ° for one hour continued drying.

A roll type embosser heated to 230 ° C was pressed onto the alignment layer starting layer and simultaneously rolled along the longitudinal direction of the substrate to emboss the embossing pattern irregularly on the alignment layer starting layer. The embossing device was manufactured by a method in which a fluorine rubber (trade name: Bytone manufactured by SUMITOMO 3 M LTD.) With a thickness of 3 mm was manually wrapped around the surface of a cylindrical core material with a diameter of 300 mm made of stainless steel . The width of the roller area of the embossing device was chosen to be wider than the width of the substrate. The peripheral speed of the embossing device was 1 mm / sec and the pressing force of the embossing device on the substrate was 5 kg / cm².

In the glass substrate with the alignment layer thus formed, the refractive index nA relative to the polarization in the longitudinal direction was different from the refractive index nB relative to the polarization in the transverse direction. The in-plane refractive index nA was maximized and the refractive index nB perpendicular to the refractive index nA was minimized. The difference between Δn was 2.86 × 10 ^-2 .

The anisotropy of the refractive indices means that the main chains of the the alignment layer formed on the surface of the substrate forming molecules are aligned in the longitudinal direction of the glass substrate.

Example 4

An embossing device used to form an alignment layer multiple domains are used, each of which is a fixed one Alignment has been created.

First, polyvinyl cinnamate was considered a thermoplastic ultraviolet radiation-curing synthetic resin on a substrate of an embossing Base device applied flat to form an embossing layer. The The embossing base was heated to 130 ° C around the embossing layer to soften. The thickness of the embossing layer was 200 nm (100 nm even at the thinnest point).

A single-domain embossing device, in which on the surface in a optional direction several bumps were repeatedly formed was applied to the softened embossing layer with a pressure of 100kg / cm² pressed on for 5 minutes to remove the unevenness of the Domain embossing device to emboss on the embossing layer.

Then, a mask shown in Fig. 12 in which the distance of the opening portions was set to 50 µm was applied to the embosser to split a picture element in two, and ultraviolet rays of 100 mW / cm² were applied to the embossing layer through the mask Emitted for 5 minutes using an ultraviolet ray lamp with a power of 4.5 kW and a wavelength of 375 nm to harden only a part of the embossing layer that corresponds to the opening areas of the mask.

The mask was made of a quartz glass substrate with a Thickness of 3 mm, on which the shielding areas are made of a Cr layer were formed with a thickness of 140 nm.

The embossing layer was reheated to the parts of the To soften the embossing layer that does not use the ultraviolet rays had been irradiated, and the previously described input Domain embossing device was rotated by 180 ° and on the Embossing device pressed. Then the embossing layer came with irradiated with ultraviolet rays to harden the entire embossing layer. After that, the embossing base device was placed on a flat one Embossing device pressed to the surface shape of the embossing To emboss the basic device onto the flat embossing device and thus the Embossing device for forming an alignment layer for a To produce liquid crystal element.

In contrast to the method for Manufacture of an embossing device for forming an alignment layer via the embossing base device, which uses a single Domain embossing device was manufactured, an embossing device for forming an alignment layer directly from a single Domain embossing device manufactured without an embossing base device will.

Example 5

An alignment layer with a plurality of domains, each of which has a fixed orientation. First was a  Polyvinyl cinnamate as a thermoplastic ultraviolet ray curing resin applied flat to a substrate to form a To form the starting layer for an alignment layer. The starting layer for the alignment layer was warmed up to 130 ° C. Soften the starting layer for the alignment layer. The fat the embossing layer was 200 nm (100 nm even at the thinnest point).

A single-domain embossing device, in which on the surface in a optional direction several bumps were repeatedly formed was applied to the soft for 5 minutes at a pressure of 100 kg / cm² Starting layer for the alignment layer pressed to the unevenness the single-domain embosser on the starting layer for the Emboss alignment layer.

A mask shown in Fig. 12, in which the distance of the opening areas was set to 50 µm to divide a picture element in two, was placed on the starting layer for the alignment layer, and ultraviolet rays of 100 mW / cm² were exposed for 5 minutes Use of an ultraviolet ray lamp with a power of 4.5 kW and a wavelength of 375 nm is emitted through the mask onto the output layer for the alignment layer in order to harden only those parts of the output layer for the alignment layer which correspond to the opening areas of the mask.

The mask was made of a quartz glass substrate with a thickness of 3 mm formed on the shielding areas from a Cr layer with a Thickness of 140 nm were formed.

The starting layer for the alignment layer was reheated to to soften the parts of the starting layer for the alignment layer, that had not been exposed to ultraviolet rays, and the A single-domain embossing device described above was turned through 180 ° rotated and pressed onto the starting layer for the alignment layer. After that, the starting layer was used for the alignment layer Ultraviolet rays are irradiated to cover the whole of the starting layer  Alignment layer to harden and so the alignment layer for one Form liquid crystal element.

Example 6

Fig. 17 shows an example of an embossing apparatus of the present invention. An embossing device 110 includes a press substrate 111 , a sheet-like elastic member 112 attached to the lower surface of the press substrate 111 , and a sheet-like molding member 113 attached to the lower surface of the elastic member 112 .

The press substrate 111 is made of a metal material with high rigidity and its lower surface is carefully ground with a grinder. The surface roughness of the press substrate 111 is preferably on z. B. set about ± 10 microns.

The elastic element 112 is formed from a synthetic resin layer with a thickness of 0.8 to a few millimeters. The synthetic resin layer preferably consists of a silicone rubber.

The shaping element 113 is made of nickel, gold or copper and preferably has a thickness in the range from 0.01 to 0.2 mm. In the shaping element 113 , an irregular pattern is formed on the surface of the flat base body. The part of the irregular pattern on the surface of the molding member 113 is covered with a film layer of gold, gold alloy, copper or copper alloy. The film layer formed on the irregular pattern with a thickness of 0.1 to 0.5 µm by vapor deposition or sputtering.

In FIG. 17, reference numeral 115 designates a transparent substrate made of glass, and 116 is a starting layer for an alignment layer made of aromatic polyamide, which covers the substrate 110 . In the drawing, the ripple of the substrate 115 is exaggerated.

However, the curvatures and unevenness of the substrate 115 are set to be on the order of µm or less.

The irregular pattern is embossed onto the starting layer 116 for the alignment layer in the subsequent process. The shaping element 113 of the embossing device 110 is placed on the starting layer 116 for the alignment layer and, as shown in FIG. 18, pressed on.

In this case, even if a ripple or irregularity is somehow formed on the substrate 115 , it can be absorbed by the deformation of the molding member 113 and the elastic member 112 as shown in FIG. 18. This is because the molding member 113 is thin and has excellent flexibility, and the elastic member 112 can be elastically deformed. As a result, the molding member 113 can be securely pressed onto the starting layer 116 of the alignment layer. The pressing temperature is preferably in the range of 100 to 200 ° C and the pressing force is preferably in the range of 50 to 100 kg / cm².

The irregular pattern, which corresponds to that of the shaping element 113 , is embossed on the starting layer 116 for the alignment layer. The starting layer 116 for the alignment layer is thus taken as the alignment layer.

After embossing the irregular pattern, the shaping element 113 is separated from the alignment layer. It is unlikely that parts of the alignment of the forming member stay 113 adhere and be pulled off to the side of the molding member 113, because the top layer of gold, gold alloy, copper or copper alloy on the surface of the forming member is present 113th

The irregular pattern can thus be embossed safely. In particular, the alignment layer exit layer 116 is unlikely to adhere to the gold or copper plating layer formed on the surface of the molding member 113 because of a difference in surface energy between the aromatic polyamide that the exit layer 116 forms Alignment layer forms, and gold or copper. It is thus possible to produce an alignment layer on which an irregular pattern is embossed, without damaging parts of the starting layer for the alignment layer.

As previously described, gold or copper scarcely adhere to the alignment layer starting layer 116 due to the difference in surface energy between the alignment layer starting layer and gold or copper. The same effect can be achieved if gold or copper is replaced by a gold alloy or a copper alloy provided with another element such as nickel.

Example 7

FIGS. 19 and 20 show another embossing apparatus of the present invention. A transfer device 120 includes a roller (press base) 121 and a flat elastic body 122 provided separately from the roller 121 , and a molding member 123 integrally attached to the lower surface of the elastic member 122 . The elastic member 122 has the same construction as the elastic member 112 of the previous example, and the molding member 123 has the same construction as the molding member 113 in the previous example.

In this example, as shown in FIG. 19, the molding member 123 is placed on a starting layer 116 for the alignment layer of the substrate 115 , and in this state, the roller 121 is pressed on the elastic member 122 and simultaneously from one side of the substrate 115 the other side rolled. In this process, the irregular pattern of the shaping device 123 is embossed onto the starting layer 116 of the alignment layer, while the elastic element 122 or the shaping element 123 are deformed in accordance with the waviness and the unevenness of the substrate 115 .

When the transmission device 120 is used, the same effect as in Example 6 can be obtained.

Example 8

The Figs. 21 and 22 show a further embossing apparatus of the present invention. An embossing device 130 has a roller (press base) 131 , a sheet-like elastic member 122 adhered to the surface of the roller 131 , and a molding member 133 attached to the surface of the elastic member 132 . The elastic member 132 has the same structure as the elastic member 112 of the previous example, and the molding member 133 has the same structure as the molding member 113 of the previous example.

In this device, as shown in Fig. 22, the roller 131 is placed on an exit layer 116 for an alignment layer from the substrate 115 , and in this state, the elastic member 132 on the surface of the roller is pressed on the exit layer 116 for the alignment layer at a fixed pressure and is simultaneously rolled from one side of the substrate 115 to the other side. In this process, the irregular pattern of the shaping device 133 is embossed onto the starting layer 116 for the alignment layer, the elastic element 132 and the shaping element 133 being deformed in accordance with the curvatures and the unevenness of the substrate 115 .

In the case that an embossing device 130 is used, the same effect as in Example 6 can be obtained.

Fig. 23 shows an example of an alignment layer with an irregular pattern using each of the embossing devices of Examples 6, 7 and 8 was formed. The alignment layer 140 has an irregular pattern, as is desirable to establish a pretilt angle of a liquid crystal.

The irregular pattern in this example is formed from a collection of a number of triangular protrusion portions 114 in a first and a second direction, as shown by arrows in the figure. A distance P1 of the bumps in the first direction is set to be shorter than the distance P2 of the bumps in the second direction. The distance P1 is z. B. 3.0 microns or less and the distance P2 is z. B. 50 microns or less. The height (depth) d₁ of the protruding areas 141 is z. B. 0.5 microns or less.

Test sample 1

An embossing device as used in this test sample has a structure shown in Fig. 17, that is, it is integrally provided with a flat substrate made of tool steel (specified by JIS SK4), a sheet-like elastic member made of silicone rubber with a thickness of 0, 8 mm and a shaping element made of nickel. An embossing test for an irregular pattern was carried out using this embossing device. An irregular pattern was embossed on a starting layer for an alignment layer made of aromatic polyamide with a thickness of 0.2 µm on a glass substrate with a thickness of 1.1 mm. The embossing pressure was 100 kg / cm². The irregular pattern was as shown in Fig. 23, with the distance in the first direction being 0.3 µm, the distance in the second direction being 2 µm, and the height of the protruding portions being 0.2 µm.

Eight types of embossing devices were made experimentally using eight types of shaping elements with Thicknesses of 3 mm, 1 mm, 0.5 mm, 0.2 mm, 0.05 mm, 0.015 mm, 0.005 mm and 0.001 mm. Using each of these Embossing devices was an embossing test with an irregular Pattern executed. A vapor deposition layer made of gold with a thickness of 0.1 µm was on the surface with the irregular pattern educated. In addition, a shaping element with a thickness of 0.001 mm or less can be manufactured. However, it couldn't be made because of its low strength.

An interference light measurement and an embossing ratio measurement were carried out on the alignment layer thus obtained. The results are shown in Table 1. In the interference light measurement, the presence or absence of interference light that is generated when the alignment layer is irradiated with light is visually observed. The results are shown in terms of area. A typical example is shown in Fig. 24A. In Fig. 24A to detect the interference light in a domain A where embossing has been performed and the interference light can not recognize a domain B where the embossing is not carried out.

In the transmission ratio measurement, the ratio of depth a groove of the recessed area in the irregular pattern of a shaping element to the depth of a groove of the irregular Pattern of the alignment pattern measured as the embossing ratio. The The depth of the groove is measured by a method in which the Mean in one plane as the depth of the groove by AFM (Atomic Force Microscope) is measured.  

Table 1

From Table 1 it can be seen that when using a Shaping element with a thickness of 0.2 mm the interference light generating domain is approximately 100%, i. H. embossing becomes perfect carried out, and in this case the embossing ratio is up to approximately 90%. In addition, when using a shaping element a thickness of 0.015 mm or less, the stamping ratio is 95%.

Test sample 2

Three types of embossing devices were experimented below made, with each the shaping element a thickness of Had 0.05 mm and the coating layer on the surface of the Shaping element consisted of either gold, copper or nickel.  

The embossing of the irregular pattern was carried out, each the molding equipment was used. It was determined, whether or not a detached starting layer for an alignment layer attached to the surface of the molding member.

The result was that, in the nickel plating layer, as shown in Fig. 24B, peeled areas with diameters of 0.5 to 3 mm adhered punctually. It was determined that the tack area at the alignment layer was 30% or less. In addition, in the embosser using the molding member provided with a gold plating layer or a copper plating layer, the phenomenon that the starting layer for the alignment layer adhered to the molding member was not found.

Claims (23)

1. comprising liquid crystal element:
a pair of substrates arranged so that they face each other and each have an alignment layer on their facing surface, and
Liquid crystal held between the substrates, a surface shape of the alignment layer being formed in at least one of the substrates by pressing on a shaping device, and
the alignment layer, which is formed by pressing the shaping device with the surface shape, has a plurality of uniform alignment domains which differ from one another in the exit direction or exit size from an angle of inclination of the liquid crystal within an effective display area. 2. A liquid crystal element according to claim 1, wherein the Alignment layer formed on one of the substrates and has several of the uniform alignment domains, two has directionally uniform alignment domains in which the Direction of exit of the pre-tilt angle of the liquid crystal are approximately parallel to each other, and the alignment layer that is on the other substrate is formed, has a pretilt angle, which is smaller than the pre-tilt angle for one of the Substrates. 3. Liquid crystal element according to claim 1 or 2, wherein the Surface shape of the alignment layer from a cluster several protruding areas is formed, the inclined surfaces have, the inclined surfaces of the above areas as a device for adjusting the angle of inclination of the Serve liquid crystal.   4. Liquid crystal element according to one of claims 1 to 3, in which a uniform alignment domain with an exit direction or one Exit size from a pretilt angle of the liquid crystal from a collection of the first areas above Incline surfaces that extend at an angle of inclination trained and the other uniform alignment domain with one Exit direction or an exit size of one Incline angle that is uniform in one Registration domain is different from a cluster of a plurality of second protruding areas is formed which Have inclined surfaces that extend at an angle, that of the inclined surfaces of the first protruding portions is different. 5. Liquid crystal element according to one of claims 1 to 4, in which the surface shape of an alignment layer from a cluster is formed by protruding areas with inclined surfaces, wherein the angle of inclination of the inclined surfaces on the surface of the Alignment layer formed protruding areas at 6 ° or more is set. 6. A process for producing a liquid crystal element with liquid crystal held between a pair of substrates, the substrates being arranged so that they face each other and each having an alignment layer on their facing surfaces, comprising:
a step of manufacturing the alignment layer starting layer to form an alignment layer starting layer on the surface of each of the substrates, and
a shaping step of pressing on a shaping device for shaping a plurality of uniform alignment domains on the surface of at least one of the starting layers for the alignment layers of different uniform alignment domains in an exit direction or exit size from a pretilt angle of the liquid crystal within an effective display area. 7. A method for producing a liquid crystal element with liquid crystal held between a pair of substrates, the substrates being arranged so that they face each other and each having an alignment layer on their facing surfaces, comprising:
a step of manufacturing the alignment layer starting layer to form an alignment layer starting layer on the surface of each of the substrates, and
a first shaping step of pressing on a shaping device for shaping uniform alignment domains which are approximately equal to one another in the exit direction or exit size from an angle of inclination of the liquid crystal within an effective display area on the surface of the substrate, on the surface of at least one of the starting layers for the alignment layers, and
a second shaping step of pressing on a shaping device for shaping uniform alignment domains, which are different in the exit direction of the pretilt angles from those obtained in the first shaping step, on the surface of this starting layer for the alignment layer. 8. A method of manufacturing a liquid crystal element according to claim 6 or 7, further comprising:
a shaping step of pressing the shaping device onto one of the starting layers for the alignment layers, and
a step of pressing an approximately cylindrical roller, which is provided at least on the surface with an elastic body, onto the other of the starting layers for the alignment layers. 9. A method for producing a liquid crystal element according to a of claims 6 to 8, wherein the uniform alignment domains are formed using an embossing device in which several protruding areas with inclined surfaces on the Surface are formed, the angle of inclination of the Tilt areas of the above areas to 6 ° or more is set. 10. A method for producing a liquid crystal element according to a of claims 6 to 9, wherein the shaping step under Use of a shaping device is carried out whose surface several first areas each to form a uniform alignment domain and several second areas each are formed to shape the other uniform alignment domain, the first areas being a collection of several protruding areas with sloping surfaces, the same Have inclination directions and inclination angles are formed and the second areas from several above areas with Slope surfaces, one from the direction of the slope and the Tilt angle of the first areas different tilt direction and have angles of inclination. 11. Embossing device for forming an alignment layer for a liquid crystal element, which is pressed on the surface of a starting layer for an alignment layer made of synthetic resin, which was formed on a substrate for a liquid crystal element, to form a plurality of protruding regions on the surface of the starting layer for the alignment layer , showing:
Bumps that are repeatedly formed on the surface of the embossing device in a first direction, and
Bumps that are repeatedly formed on the surface of the embossing device in a second direction that crosses the first direction,
wherein the slope direction of the slope surfaces formed by the asperities is set for each of a plurality of divided domains formed on the surface of the die. 12. Embossing device for forming an alignment layer for a A liquid crystal element according to claim 11, wherein the Inclination angle of the inclination surfaces on the surface of the Embosser shaped protruding areas at 6 ° or more is set. 13. Embossing device for forming an alignment layer for a A liquid crystal element according to claim 11 or 12, wherein the divided domain of the embossing device equivalent to one of the the embossing device formed protruding areas. 14. A method of manufacturing an embossing die for forming an alignment layer for a liquid crystal element, comprising:
a first heating step for heating an embossed layer formed from a thermoplastic resin hardened by ultraviolet rays, formed on a substrate,
a first embossing step in which a single-domain embossing device, on the surface of which several bumps are repeatedly formed in an optional direction, is pressed onto the embossing layer,
an irradiation step with ultraviolet rays, in which a mask formed with opening areas at suitable intervals is arranged and ultraviolet rays are emitted through the mask onto the embossed layer,
a second heating step for heating the embossing layer after the irradiation step with ultraviolet rays, a second embossing step in which a single-domain embossing device, on the surface of which several bumps are repeatedly formed along a direction different from the selectable direction in the first embossing step, is pressed onto the embossing layer will, and
a step in which the embossing device is pressed onto the embossing layer after the second embossing step and thereby the surface shape of the embossing layer is embossed on the embossing device. 15. A method of forming an alignment layer for a liquid crystal element, comprising:
a first heating step for heating an initial layer formed on a substrate for the alignment layer from a thermoplastic resin hardened by ultraviolet rays,
a first embossing step in which a single-domain embossing device, on the surface of which several bumps are repeatedly formed in a selectable direction, is pressed onto the starting layer for the alignment layer,
an irradiation step with ultraviolet rays, in which a mask formed with opening regions at suitable intervals is arranged and ultraviolet rays are emitted through the mask onto the starting layer for the alignment layer,
a second heating step for heating the starting layer for the alignment layer after the irradiation step with the ultraviolet rays, and
a second embossing step, in which a single-domain embossing device, on the surface of which several bumps are repeatedly formed in a direction different from the selectable direction in the first embossing step, is pressed onto the starting layer for the alignment layer. 16. A method for producing an embossing device for forming an alignment layer for a liquid crystal element, comprising:
a first heating step for heating an embossed layer formed from a thermoplastic resin hardened by ultraviolet rays, formed on a substrate,
a first embossing step in which a single-domain embossing device, on the surface of which several bumps are repeatedly formed in a selectable direction, is pressed onto the embossing layer,
an irradiation step with ultraviolet rays, in which a mask formed with opening areas at suitable distances is arranged and through the mask ultraviolet rays are emitted onto the embossing layer,
a second heating step for heating the embossing layer after the ultraviolet ray irradiation step, and
a second embossing step, in which a single-domain embossing device, on the surface of which a plurality of unevenness is pressed onto the embossing layer in a direction that differs from the selectable direction in the first embossing step. 17. A method for producing an embossing device for forming an alignment layer for a liquid crystal element, comprising:
a first heating step for heating an embossed layer formed from a thermoplastic resin hardened by ultraviolet rays, formed on a substrate,
a first embossing step in which a single-domain embossing device, on the surface of which several bumps are repeatedly arranged in a selectable direction, is pressed onto an embossing layer,
an irradiation step with ultraviolet rays, in which a mask formed with opening areas at suitable intervals is arranged and through the mask ultraviolet rays are emitted onto the embossed layer,
a second heating step for heating the embossing layer after the ultraviolet ray irradiation step, and
a second embossing step in which a single-domain embossing device, on the surface of which several bumps are repeatedly formed in a direction that differs from the selectable direction in the first embossing step, is pressed onto the embossing layer,
wherein the surface shape is formed on the embossing device using the electro-casting method using the embossing layer after the embossing step as an original template. 18. An embossing device used to press a shaping element having an irregular pattern onto an exit layer for an alignment layer on a substrate, and thus embossing the irregular pattern onto the surface of the exit layer for the alignment layer, comprising:
a press body made of a rigid body,
an elastic element which is arranged so that it faces the press base, and
a layer-like shaping element which is provided on the side of the elastic element which does not face the press base. 19. Embossing device according to claim 18, wherein the elastic element is attached to the surface of the press body and that Shaping element on the surface of the elastic element is attached. 20. Embossing device for forming an irregular pattern an alignment layer according to claim 18 or 19, wherein the pressing Basic body has a flat shape. 21. Embossing device for forming an irregular pattern an alignment layer according to claim 18 or 19, wherein the pressing Basic body has a role shape. 22. Embossing device according to one of claims 18 to 21, in which the Shaping element with a thickness in the range of 0.001 mm to 0.2 mm is formed. 23. Embossing device according to one of claims 18 to 22, in which one Gold, gold alloy, copper or plating layer Copper alloy on the surface of the molding element is formed.