DE1496691C - Process for producing a ribbon with semiconductor properties from glass fibers containing SiO deep 2, Al deep 2 O deep 3 and CuO - Google Patents
Process for producing a ribbon with semiconductor properties from glass fibers containing SiO deep 2, Al deep 2 O deep 3 and CuOInfo
- Publication number
- DE1496691C DE1496691C DE1496691C DE 1496691 C DE1496691 C DE 1496691C DE 1496691 C DE1496691 C DE 1496691C
- Authority
- DE
- Germany
- Prior art keywords
- deep
- oxide
- glass
- glass fibers
- cuo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- QPLDLSVMHZLSFG-UHFFFAOYSA-N copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 title claims description 7
- 239000003365 glass fiber Substances 0.000 title claims description 7
- 239000004065 semiconductor Substances 0.000 title claims description 5
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 title claims 2
- 238000000034 method Methods 0.000 title description 2
- 239000000156 glass melt Substances 0.000 claims description 7
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium monoxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 6
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 6
- QVQLCTNNEUAWMS-UHFFFAOYSA-N Barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims description 5
- CXKCTMHTOKXKQT-UHFFFAOYSA-N Cadmium oxide Chemical compound [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 4
- GEIAQOFPUVMAGM-UHFFFAOYSA-N oxozirconium Chemical compound [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 claims description 4
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 3
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N Silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 claims 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 2
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 claims 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N al2o3 Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 1
- 229910000460 iron oxide Inorganic materials 0.000 claims 1
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims 1
- 229910001947 lithium oxide Inorganic materials 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 229910001923 silver oxide Inorganic materials 0.000 claims 1
- 238000005507 spraying Methods 0.000 claims 1
- 239000004408 titanium dioxide Substances 0.000 claims 1
- 239000011152 fibreglass Substances 0.000 description 3
- 238000007380 fibre production Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000007669 thermal treatment Methods 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atoms Chemical class [H]* 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 230000001264 neutralization Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 238000009941 weaving Methods 0.000 description 1
Description
Tabelle 1
Zusammensetzung GewichtsprozentTable 1
Composition percent by weight
SiO2 40 bis 60SiO 2 40 to 60
Al2O3 5 bis 16Al 2 O 3 5 to 16
CaO O bis 16CaO O to 16
MgO O bis 10MgO O to 10
Na2O O bis 2Na 2 OO to 2
B2O3 O bis 10B 2 O 3 O to 10
CuO 15 bis 40CuO 15 to 40
Man führt außerdem in die Glasschmelze einzeln oder in Kombinationen Zusätze von Li2O, TiO2, Ag2O, ZnO, BaO, CdO, ZrO2, Fe2O3 ein, insgesamt von 0,1 bis 5,0 Gewichtsprozent. In addition, additions of Li 2 O, TiO 2 , Ag 2 O, ZnO, BaO, CdO, ZrO 2 , Fe 2 O 3 , in total from 0.1 to 5.0 percent by weight, are introduced into the glass melt, individually or in combinations.
Die Glasbestandteile werden sorgfältig vermischt, in einen Tiegel gegeben und in der neutralen Atmosphäre des Ofens geschmolzen.The glass components are carefully mixed, placed in a crucible and placed in the neutral atmosphere of the furnace melted.
Die Beschickung mit Gemenge geschieht bei 1430 ± 10°C in kleinen Portionen. Die Glasschmelze wird bei 1470 ± 100C und die Läuterung bei 1500 ± 1O0C durchgeführt. Die Glasschmelze muß dabei gerührt werden.The batch is charged at 1430 ± 10 ° C in small portions. The glass melt is carried out at 1470 ± 10 0 C and the refining at 1500 ± 1O 0 C. The glass melt must be stirred.
Wenn der Schmelzprozeß des Glases abgeschlossen ist, wird die Glasschmelze bis auf 12500C abgekühlt, und dann werden Glaskugeln zur Glasfaserherstellung erzeugt.When the melting process of the glass is complete, the glass melt is cooled down to 1250 ° C., and then glass spheres for glass fiber production are produced.
Die Faserherstellung wird nach dem Düsenverfahren durchgeführt. Um eine starke Benetzung des Düsenbodens mit kupferhaltigem Glas zu vermeiden, wird eine künstliche Kühlung des Raumes unter dem Düsenboden vorgenommen.The fiber production is carried out according to the jet process. To ensure that the Avoiding the nozzle floor with copper-containing glass is an artificial cooling of the space under the Nozzle bottom made.
Die Verarbeitung des Fasergutes zu Garnen sowie Weben des Bandes wird auf üblichen Textilmaschinen ausgeführt, die bei der Glasfaserherstellung verwendet werden.The processing of the fiber material into yarns as well as the weaving of the tape is carried out on conventional textile machines used in fiber optic manufacturing.
Anschließend wird eine Thermobehandlung des Glasfaserbandes in einem reduzierenden Medium durchgeführt, wozu man Wasserstoff, Kohlenmonoxid, und andere reduzierende Gase benutzen kann.The fiberglass tape is then thermally treated in a reducing medium carried out using hydrogen, carbon monoxide, and other reducing gases.
Die Thermobehandlung des Bandes im reduzierenden Medium kann man in Elektroöfen von verschiedenen Bauarten durchführen. Man kann die Bänder kontinuierlich oder durch periodische Rolleneinführung in die öfen bringen. Beim kontinuierlichen Prozeß der Thermobehandlung vom Band hängt sein elektrischer Widerstand von der Behandlungstemperatur und der Bewegungsgeschwindigkeit des Bandes im Ofen ab.The heat treatment of the strip in the reducing medium can be carried out in various electric furnaces Perform types. You can run the belts continuously or by periodically rolling them bring into the ovens. In the continuous process of thermal treatment from the tape, its electrical power depends Resistance from the treatment temperature and the speed of movement of the belt in the Furnace off.
Das kontinuierliche Verfahren der Thermobehandlung kann folgendermaßen verwirklicht werden. Das Glasfaserband wird auf eine Spule gewickelt und in einen Empfänger (Hülse) eingesetzt, der an einer Öfenwand eingebaut ist. Ein Bandende wird dann durch den Ofen gezogen, umgelenkt und auf die zweite Spule, die sich im gleichen Empfänger befindet, gewickelt.The continuous method of thermal treatment can be realized as follows. The Fiberglass tape is wound onto a spool and inserted into a receiver (sleeve) attached to a furnace wall is built in. One end of the tape is then pulled through the furnace, deflected and placed on the second reel, which is located in the same recipient, wrapped.
Man kann elektrische Widerstandswerte des BandesOne can get electrical resistance values of the tape
e, It. ese, It. it
von 102 bis 1012 Ohm pro Flächenquadrat erreichen, indem man die Bewegungsgeschwindigkeit und Ofentemperatur von 100 bis 8000C ändert. Achieve from 10 2 to 10 12 ohms per square by changing the speed of movement and furnace temperature from 100 to 800 ° C.
In der Tabelle 2 sind die Beispiele für die Herstellung des Glasfaserbandes mit Halbleitereigenschaften angegeben. In Table 2 are the examples for the preparation of the fiberglass tape with semiconductor properties.
Beispiele IIIExamples III
IVIV
Oxyde, GewichtsprozentOxides, weight percent
SiO2. SiO 2 .
Al2O3 Al 2 O 3
CaO CaO
MgO MgO
B2O3 B 2 O 3
Li2O Li 2 O
Na2O... Na 2 O ...
TiO2 TiO 2
Fe2O3 Fe 2 O 3
CuQ CuQ
Ag2O Ag 2 O
Behandlungstemperatur, 0C Treatment temperature , 0 C
Elektrischer Widerstand, Ohm/FlächenquadratElectrical resistance, ohms / square
46,61 15,7046.61 15.70
36,836.8
200 10a 46,1
16,0
5,6
3,0
5,85
1,88200 10 a 46.1
16.0
5.6
3.0
5.85
1.88
0,26
24,00.26
24.0
625
102 625
10 2
45,01
15,80
6,70
2,85
6,01
2,0645.01
15.80
6.70
2.85
6.01
2.06
0,25
0,46
16,6
5,40.25
0.46
16.6
5.4
450
10β 450
10 β
52,08 10,25 5,91 4,09 5,71 1,8252.08 10.25 5.91 4.09 5.71 1.82
0,280.28
0,210.21
21,0021.00
0,980.98
550 10«550 10 «
51,2 15,52 9,51 3,4051.2 15.52 9.51 3.40
2,12.1
0,150.15
0,310.31
16,0316.03
750 104 750 10 4
Die Halbleitereigenschaften des nach dem vorgeschlagenen Verfahren hergestellten Bandes sind durch die Struktur der Glasoberfläche, aber nicht durch Aufbringen auf seine Oberfläche von leichtzerstörbaren Halbleiterüberzügen gewährleistet. Dadurch wird die Stabilität vom elektrischen Widerstand der Isolation unter Bedingungen der erhöhten Temperaturen sowie die Betriebszuverlässigkeit der elektrischen Hochspannungsanlagen gesichert und die Betriebsdauer verlängert.The semiconductor properties of the tape produced by the proposed method are through the structure of the glass surface, but not by applying to its surface of easily destructible Semiconductor coatings guaranteed. This is the stability of the electrical resistance of the insulation under conditions of elevated temperatures, as well as the operational reliability of high-voltage electrical systems secured and the service life extended.
Claims (3)
Family
ID=
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