DE112019002724A5 - VENTILATION DEVICE AND VACUUM PRODUCTION SYSTEM - Google Patents

VENTILATION DEVICE AND VACUUM PRODUCTION SYSTEM Download PDF

Info

Publication number
DE112019002724A5
DE112019002724A5 DE112019002724.7T DE112019002724T DE112019002724A5 DE 112019002724 A5 DE112019002724 A5 DE 112019002724A5 DE 112019002724 T DE112019002724 T DE 112019002724T DE 112019002724 A5 DE112019002724 A5 DE 112019002724A5
Authority
DE
Germany
Prior art keywords
production system
ventilation device
vacuum production
vacuum
ventilation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE112019002724.7T
Other languages
German (de)
Inventor
Marco Fröhner
Alexander Böddicker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Meyer Burger Germany GmbH
Original Assignee
Meyer Burger Germany GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Meyer Burger Germany GmbH filed Critical Meyer Burger Germany GmbH
Publication of DE112019002724A5 publication Critical patent/DE112019002724A5/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE112019002724.7T 2018-05-29 2019-05-27 VENTILATION DEVICE AND VACUUM PRODUCTION SYSTEM Pending DE112019002724A5 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102018112853.3 2018-05-29
DE102018112853.3A DE102018112853A1 (en) 2018-05-29 2018-05-29 Ventilation device and vacuum production plant
PCT/DE2019/100467 WO2019228592A1 (en) 2018-05-29 2019-05-27 Ventilation device and vacuum production plant

Publications (1)

Publication Number Publication Date
DE112019002724A5 true DE112019002724A5 (en) 2021-04-22

Family

ID=66912491

Family Applications (2)

Application Number Title Priority Date Filing Date
DE102018112853.3A Withdrawn DE102018112853A1 (en) 2018-05-29 2018-05-29 Ventilation device and vacuum production plant
DE112019002724.7T Pending DE112019002724A5 (en) 2018-05-29 2019-05-27 VENTILATION DEVICE AND VACUUM PRODUCTION SYSTEM

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE102018112853.3A Withdrawn DE102018112853A1 (en) 2018-05-29 2018-05-29 Ventilation device and vacuum production plant

Country Status (3)

Country Link
CN (2) CN210886214U (en)
DE (2) DE102018112853A1 (en)
WO (1) WO2019228592A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018112853A1 (en) * 2018-05-29 2019-12-05 Meyer Burger (Germany) Gmbh Ventilation device and vacuum production plant
CN114939445B (en) * 2022-03-29 2023-12-22 合肥通用机械研究院有限公司 Large vacuum degree change test device and test method using same

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4739787A (en) * 1986-11-10 1988-04-26 Stoltenberg Kevin J Method and apparatus for improving the yield of integrated circuit devices
JP3525039B2 (en) * 1997-10-06 2004-05-10 東京応化工業株式会社 Decompression processing equipment
US6228773B1 (en) * 1998-04-14 2001-05-08 Matrix Integrated Systems, Inc. Synchronous multiplexed near zero overhead architecture for vacuum processes
EP1582607B2 (en) * 2004-03-31 2016-07-06 Applied Materials GmbH & Co. KG Loadlock arrangement for a vacuum treatment apparatus and method of operating it
KR100855582B1 (en) * 2007-01-12 2008-09-03 삼성전자주식회사 Liquid supplying unit and method, facility for treating substrates with the unit, and method for treating substrates
DE102011011279A1 (en) 2011-02-15 2012-08-16 Von Ardenne Anlagentechnik Gmbh Device for conducting gas stream when venting within a vacuum housing, comprises a transport unit located in a transport direction for transporting flat substrates provided on a transport plane
CN203333739U (en) * 2013-05-27 2013-12-11 深圳市生波尔机电设备有限公司 Vacuum box body inflating buffer and vacuum film coating box
JP5940199B1 (en) * 2015-06-26 2016-06-29 株式会社日立国際電気 Semiconductor device manufacturing method, substrate processing apparatus, and program
DE102015117753A1 (en) 2015-10-19 2017-04-20 Von Ardenne Gmbh Vacuum lock assembly, vacuum assembly and method
DE102016107830B4 (en) 2016-04-27 2022-02-03 VON ARDENNE Asset GmbH & Co. KG Vacuum chamber assembly and method of operating a vacuum chamber assembly
DE102018112853A1 (en) * 2018-05-29 2019-12-05 Meyer Burger (Germany) Gmbh Ventilation device and vacuum production plant

Also Published As

Publication number Publication date
CN210886214U (en) 2020-06-30
CN110541154A (en) 2019-12-06
DE102018112853A1 (en) 2019-12-05
WO2019228592A1 (en) 2019-12-05

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