DE10345390A1 - Abdeckvorrichtung für Bauteile einer Halbleiter-Bearbeitungskammer - Google Patents

Abdeckvorrichtung für Bauteile einer Halbleiter-Bearbeitungskammer Download PDF

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Publication number
DE10345390A1
DE10345390A1 DE2003145390 DE10345390A DE10345390A1 DE 10345390 A1 DE10345390 A1 DE 10345390A1 DE 2003145390 DE2003145390 DE 2003145390 DE 10345390 A DE10345390 A DE 10345390A DE 10345390 A1 DE10345390 A1 DE 10345390A1
Authority
DE
Germany
Prior art keywords
semiconductor
cover device
peripheral edge
outer peripheral
processed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE2003145390
Other languages
English (en)
Inventor
Uwe Rudolph
Uwe Koeckritz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Qimonda AG
Original Assignee
Infineon Technologies AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies AG filed Critical Infineon Technologies AG
Priority to DE2003145390 priority Critical patent/DE10345390A1/de
Publication of DE10345390A1 publication Critical patent/DE10345390A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32633—Baffles

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

Die vorliegende Erfindung betrifft eine Abdeckvorrichtung (1) für Bauteile einer Halbleiter-Bearbeitungskammer (4), wobei die Abdeckvorrichtung (1) den Umfangsrand des zu bearbeitenden Halbleiters (3) umgibt und die Oberfläche (2; 20, 21) der Abdeckvorrichtung (1) im wesentlichen in Richtung des äußeren Umfangsrandes (25) der Abdeckvorrichtung (1) abfallend geneigt ausgebildet ist.
DE2003145390 2003-09-30 2003-09-30 Abdeckvorrichtung für Bauteile einer Halbleiter-Bearbeitungskammer Withdrawn DE10345390A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE2003145390 DE10345390A1 (de) 2003-09-30 2003-09-30 Abdeckvorrichtung für Bauteile einer Halbleiter-Bearbeitungskammer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2003145390 DE10345390A1 (de) 2003-09-30 2003-09-30 Abdeckvorrichtung für Bauteile einer Halbleiter-Bearbeitungskammer

Publications (1)

Publication Number Publication Date
DE10345390A1 true DE10345390A1 (de) 2005-05-04

Family

ID=34399071

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2003145390 Withdrawn DE10345390A1 (de) 2003-09-30 2003-09-30 Abdeckvorrichtung für Bauteile einer Halbleiter-Bearbeitungskammer

Country Status (1)

Country Link
DE (1) DE10345390A1 (de)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5868847A (en) * 1994-12-16 1999-02-09 Applied Materials, Inc. Clamp ring for shielding a substrate during film layer deposition
US5942039A (en) * 1997-05-01 1999-08-24 Applied Materials, Inc. Self-cleaning focus ring
US6258219B1 (en) * 1993-09-09 2001-07-10 Applied Materials, Inc. Two-step deposition process for preventing arcs
US6364957B1 (en) * 1997-10-09 2002-04-02 Applied Materials, Inc. Support assembly with thermal expansion compensation
JP2003243366A (ja) * 2001-12-13 2003-08-29 Tokyo Electron Ltd プラズマ処理装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6258219B1 (en) * 1993-09-09 2001-07-10 Applied Materials, Inc. Two-step deposition process for preventing arcs
US5868847A (en) * 1994-12-16 1999-02-09 Applied Materials, Inc. Clamp ring for shielding a substrate during film layer deposition
US5942039A (en) * 1997-05-01 1999-08-24 Applied Materials, Inc. Self-cleaning focus ring
US6364957B1 (en) * 1997-10-09 2002-04-02 Applied Materials, Inc. Support assembly with thermal expansion compensation
JP2003243366A (ja) * 2001-12-13 2003-08-29 Tokyo Electron Ltd プラズマ処理装置

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8127 New person/name/address of the applicant

Owner name: QIMONDA AG, 81739 MUENCHEN, DE

8139 Disposal/non-payment of the annual fee