DE10336328A1 - Device for processing a silicon substrate comprises evacuating stations, a silicon deep etching chamber, a plasma chamber and a chlorine trifluoride etching chamber - Google Patents
Device for processing a silicon substrate comprises evacuating stations, a silicon deep etching chamber, a plasma chamber and a chlorine trifluoride etching chamber Download PDFInfo
- Publication number
- DE10336328A1 DE10336328A1 DE2003136328 DE10336328A DE10336328A1 DE 10336328 A1 DE10336328 A1 DE 10336328A1 DE 2003136328 DE2003136328 DE 2003136328 DE 10336328 A DE10336328 A DE 10336328A DE 10336328 A1 DE10336328 A1 DE 10336328A1
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- Prior art keywords
- chamber
- silicon
- etching
- substrates
- station
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67167—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers surrounding a central transfer chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/308—Chemical or electrical treatment, e.g. electrolytic etching using masks
- H01L21/3081—Chemical or electrical treatment, e.g. electrolytic etching using masks characterised by their composition, e.g. multilayer masks, materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
Abstract
Description
Die
Erfindung betrifft eine Vorrichtung zur Bearbeitung eines Siliziumssubstrats
nach dem Oberbegriff des Anspruchs 1. Hierzu ist aus der
Der Erfindung liegt die Aufgabe zugrunde, eine Vorrichtung zur Bearbeitung eines Siliziumsubstrates in mehreren Prozessstationen anzugeben, welche hinsichtlich des Fertigungsablaufes, der Fertigungskosten und der Qualität des Fertigungsproduktes verbessert ist. Hierzu zählt insbesondere die Einsparung oder Beschleunigung von zeitraubenden Prozessschritten, ein möglichst geringer Platzbedarf der Vorrichtung in Form von teurer Reinraumfläche, welche minimiert werden soll, und eine Verbesserung der Erzeugnisqualität hinsichtlich Kontaminationsschäden. Dies wird erreicht durch die kennzeichnenden Merkmale des Anspruches 1, welche es durch die Zusammenfassung der für den Gasphasenätzprozess wichtigen Prozesskammern zu einer Einheit ermöglichen, die genannten Vorteile zu realisieren. Hinsichtlich der Prozesskosten und der Prozessdauer macht sich insbesondere der Wegfall zeitraubender Abpump- und Einschleusvorgänge zwischen einzelnen Prozessschritten bemerkbar, wie sie für getrennt aufgestellte Prozesskammern typisch sind. Bezüglich der Qualitätsverbesserung der Erzeugnisse ist der Wegfall von Kontaminationsmöglichkeiten durch die Aufbewahrung der Siliziumsubstrate unter Vakuum zwischen den einzelnen Prozessstationen wichtig. Dies gilt insbesondere hinsichtlich der Weiterbearbeitung nach dem Entfernen von Oxid- und/oder Teflon-Passivierungen, wobei die zuvor freigelegten Substratflächen nicht erneut der Atmosphäre und der hierbei bestehenden Kontaminations- oder Oxidationsgefahr ausgesetzt werden.Of the Invention is based on the object, a device for processing specify a silicon substrate in several process stations, which with regard to the production process, the production costs and the quality of the finished product is improved. This includes in particular the saving or acceleration of time-consuming process steps, one possible small footprint of the device in the form of expensive clean room area, which should be minimized, and an improvement in the quality of the product Contamination damage. This is achieved by the characterizing features of the claim 1, which it by the summary of the gas phase etching process important process chambers to make a unit, the advantages mentioned to realize. With regard to the process costs and the duration of the process In particular, the elimination of time-consuming pump-down and smuggling operations intervenes individual process steps noticeable, as they are for separately set up process chambers typical. In terms of the quality improvement the products is the elimination of contamination by the storage of the silicon substrates under vacuum between the important to individual process stations. This applies in particular with regard to further processing after removal of oxide and / or Teflon passivations, wherein the previously exposed substrate surfaces do not re-atmosphere and the exposed to existing contamination or oxidation risk become.
Als vorteilhaft hat es sich erwiesen, neben einer Kombination von Kernvorrichtungen wenigstens eine evakuierbare Parkstation als Pufferstation in die Clusteranlage zu integrieren. Hierdurch ergeben sich Vorteile im logistischen Ablauf der Prozesse, wenn die Siliziumsubstrate für gewisse Zeiten unter kontrollierten Bedingungen, zum Beispiel unter Vakuumatmospäre, aufbewahrt werden können. Dies ist zum Beispiel dann vorteilhaft, wenn einzelne Prozessschritte innerhalb der Clusteranlage besonders schnell gehen, zum Beispiel das Öffnen von Teflon- oder Oxidpassivierungen, und wenn sich daran ein längerer Prozessschritt anschließt, zum Beispiel das Ätzen einer Silizium-Opferschicht in einer Chlortrifluorid-Atmosphäre. Die in schnellem Takt von der dünnen Oxid- oder Teflonpassivierung befreiten Substrate können vorteilhaft auf mehrere Chlortrifluorid-Ätzkammern der Clusteranlage verteilt werden, wenn sie zuvor in einer Parkstation zwischengeparkt und von dort aus den einzelnen ClF3-Prozessstationen zugeführt werden. Danach können sie bei Bedarf von verschiedenen ClF3-Prozessstationen vor der Weiterbearbeitung wieder in einer Parkstation gesammelt werden. Solche Puffer gestatten eine hohe Flexibilität des Prozessablaufes in der Clusteranlage, da die Verteilung von aus schnellen Schritten kommenden Wafern auf mehrere Kammern mit langsameren Schritten und die anschließende erneute Bündelung der Substrate aus einer Mehrzahl von „langsameren" Prozesskammern zu einem einheitlichen Los in einfacher Weise ermöglicht wird. Diese Bündelung erfolgt vorzugsweise in Kassetten, welche insbesondere beim Ein- und/oder Ausschleusen aus der Clusteranlage sowie in den Parkstationen mit Vorteil eingesetzt werden.It has proved to be advantageous, in addition to a combination of core devices, to integrate at least one evacuable parking station as a buffer station in the cluster system. This results in advantages in the logistical flow of the processes when the silicon substrates can be stored for certain times under controlled conditions, for example under a vacuum atmosphere. This is advantageous, for example, when individual process steps within the cluster system are particularly fast, for example opening of Teflon or oxide passivations, and if this is followed by a longer process step, for example the etching of a silicon sacrificial layer in a chlorotrifluoride atmosphere. The substrates which have been freed from the thin oxide or Teflon passivation at high speed can advantageously be distributed to a plurality of chlorine trifluoride etching chambers of the cluster plant if they are previously parked in a parking station and fed from there to the individual ClF 3 process stations. Afterwards, they can be collected again from a number of ClF 3 process stations in a parking station before further processing if required. Such buffers allow for high process flexibility in the cluster plant, as the distribution of rapidly moving wafers to multiple chambers with slower steps and the subsequent regrouping of the substrates from a plurality of "slower" process chambers to a single batch in a simple manner This bundling is preferably carried out in cassettes, which are advantageously used in particular when entering and / or discharging from the cluster system and in the parking stations.
Weiterhin hat es sich als zweckmässig erwiesen, wenn wenigsten die Handhabungsstation und/oder die Parkstation(en) Mittel zur Temperaturerfassung und/oder Mittel zum Heizen oder Kühlen der Siliziumsubstrate aufweisen, um die Substrate zwischen verschiedenen Prozesskammern auf eine gewünschte Temperatur zu bringen. Zum Heizen der Substrate dienen vorzugsweise Strahlungsheizungen oder Kontaktheizungen. Eine Kühlung der Substrate ist möglich durch die Zufuhr von Kältemittel, zum Beispiel in Form von Helium, zur Rückseite der Substrate in die Substrathalterungen. Als Mittel zum Erfassen der Substrattemperatur werden vorzugsweise Bolometer, Thermooptik-Strahlungsmesser oder berührende Thermometer verwendet.Farther it has to be useful proven, if at least the handling station and / or the parking station (s) Means for detecting temperature and / or means for heating or cooling the silicon substrates exhibit the substrates between different process chambers to a desired To bring temperature. For heating the substrates are preferably used Radiant heaters or contact heaters. A cooling of Substrates is possible by the supply of refrigerant, for example in the form of helium, to the back of the substrates in the Substrate holders. As means for detecting the substrate temperature are preferably bolometers, thermo-optic radiation meters or touching thermometers uses.
Zur Beschleunigung des Prozessablaufes können weiterhin Plasma- oder Ozon-Stripkammern an die Clusteranlage angekoppelt werden. Diese dienen zum Beispiel zum Entfernen von Fotolackmasken oder von teflonartigen Seitenwandpassivierschichten innerhalb der Clusteranlage, wobei vorzugsweise ein O2-Plasmastripper oder ein Ozonmodul zum Einsatz kommt.Plasma or ozone stripping chambers can also be used to speed up the process be coupled to the cluster system. These serve, for example, for removing photoresist masks or Teflon-like sidewall passivation layers within the cluster system, wherein preferably an O 2 plasma stripper or an ozone module is used.
Die Gesamtsteuerung der Clusteranlage erfolgt durch eine Rechnersteuerung, vorzugsweise durch eine speicherprogrammierbare Steuerung, mittels einer Software, welche sowohl den Austausch der Siliziumsubstrate zwischen den einzelnen Prozessstationen durch die evakuierbare Handhabungsstation als auch den Ablauf der Prozesse innerhalb der einzelnen Stationen steuert.The Overall control of the cluster system is done by a computer control, preferably by a programmable logic controller, by means of a software that allows both the replacement of silicon substrates between the individual process stations through the evacuable handling station as well as the sequence of processes within the individual stations controls.
Weitere Einzelheiten und vorteilhafte Weiterbildungen der Erfindung ergeben sich aus den Unteransprüchen und der Beschreibung der Ausführungsbeispiele der Erfindung.Further Details and advantageous developments of the invention result from the dependent claims and the description of the embodiments the invention.
Die Zeichnung zeigt eine Prinzipdarstellung der erfindungsgemäßen Vorrichtung zur Bearbeitung eines Siliziumsubstrats in mehreren Prozessstationen.The Drawing shows a schematic diagram of the device according to the invention for processing a silicon substrate in several process stations.
Zu
den Kernelementen einer Clusteranlage
Weitere,
jedoch nicht zu den Kernelementen der Clusteranlage
Die
Parkstation
In
der Zeichnung sind weiterhin bei der Parkstation
Ein
möglicher
Aufbau der erfindungsgemäßen Vorrichtung
soll zunächst
am Beispiel eines Ätzverfahrens
mit Fotolackmaskentechnik und Teflonpassivierung der Strukturen
in den Siliziumsubstraten erläutert
werden. Hierbei werden bereits maskierte Substrate
An
die DRIE-Ätzkammer
Die
Abscheidekammer
Nach
der Teflonabscheidung in der Kammer
Im
nächsten
Schritt erfolgt in einer ClF3-Ätzkammer
Nach
dem ClF3-Ätzen der Opferschicht in dem
Siliziumsubstrat
Die
Parkstationen
Beim
Ausführungsbeispiel
sind weiterhin Vorrichtungen
Ein
etwas veränderter
Prozessablauf und somit eine geänderte
Anordnung oder Nutzung der verschiedenen Teile der Clusteranlage
Im Anschluss an die Erstellung der Oxidmaske entsprechen die Prozessschritte und die verwendeten Prozesskammern zunächst denjenigen des zuvor beschriebenen Verfahrens mit einer Fotolackmaske und einer Passivierung durch eine Teflonschicht.in the Following the creation of the oxide mask correspond to the process steps and the process chambers used first those of the previously described Process with a photoresist mask and a passivation by a teflon layer.
Die
Siliziumsubstrate
Die Ätzung der
Struktur in einer oberen Siliziumschicht des Substrates
Die
Substrate
Im
Anschluss an die Ätzkammer
An
die Stelle der Teflonabscheidung beim vorher beschriebenen Verfahren
tritt also nun eine Passivierung durch eine Oxidschicht, welche
ebenfalls in der Plasma-Abscheidekammer
Nach
der Oxidabscheidung wandern die Substrate
Die
weiteren Prozessschritte des Verfahrens mit einer Oxidpassivierung
entsprechen wiederum denjenigen mit einer Teflonpassivierung. Die
Substrate werden also nacheinander wieder in eine ClF3-Ätzkammer
Neben
getrennten Stationen
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2003136328 DE10336328B4 (en) | 2003-08-07 | 2003-08-07 | Device for processing a silicon substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2003136328 DE10336328B4 (en) | 2003-08-07 | 2003-08-07 | Device for processing a silicon substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
DE10336328A1 true DE10336328A1 (en) | 2005-03-03 |
DE10336328B4 DE10336328B4 (en) | 2013-04-25 |
Family
ID=34112017
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE2003136328 Expired - Fee Related DE10336328B4 (en) | 2003-08-07 | 2003-08-07 | Device for processing a silicon substrate |
Country Status (1)
Country | Link |
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DE (1) | DE10336328B4 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007003473A1 (en) * | 2005-07-06 | 2007-01-11 | Robert Bosch Gmbh | Reactor for carrying out an etching method for a stack of masked wafers and an etching method |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4241045C1 (en) * | 1992-12-05 | 1994-05-26 | Bosch Gmbh Robert | Process for anisotropic etching of silicon |
US6065481A (en) * | 1997-03-26 | 2000-05-23 | Fsi International, Inc. | Direct vapor delivery of enabling chemical for enhanced HF etch process performance |
DE19847455A1 (en) * | 1998-10-15 | 2000-04-27 | Bosch Gmbh Robert | Silicon multi-layer etching, especially for micromechanical sensor production, comprises etching trenches down to buried separation layer, etching exposed separation layer and etching underlying silicon layer |
DE29915696U1 (en) * | 1999-09-07 | 2001-01-18 | Bosch Gmbh Robert | Etching system for HF steam etching |
-
2003
- 2003-08-07 DE DE2003136328 patent/DE10336328B4/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007003473A1 (en) * | 2005-07-06 | 2007-01-11 | Robert Bosch Gmbh | Reactor for carrying out an etching method for a stack of masked wafers and an etching method |
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Publication number | Publication date |
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DE10336328B4 (en) | 2013-04-25 |
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