DE102018221778A1 - Probe, as well as a method, device and computer program for producing a probe for scanning probe microscopes - Google Patents

Abstract

The present invention relates to a method for producing a probe for a scanning probe microscope with the following steps: particle beam-induced generation and / or processing of a probe tip on a substrate; wherein a time-changing interaction position of a particle beam is controlled in such a way that a lateral surface of a base area of the probe tip produced and / or processed has a negative curvature.

Description

Technical field

The present invention relates to a probe, as well as to methods, a device and a computer program for producing a probe for scanning probe microscopes.

State of the art

Scanning probe microscopes scan a sample or its surface with a probe tip and thus provide measurement data for generating a representation of the topography of the sample surface. Different types of scanning probe microscopes are distinguished depending on the type of interaction between the probe tip and the sample surface. Scanning tunneling microscopes are frequently used in which a voltage is applied between the sample and the probe tip, which do not touch one another, and the resulting tunneling current is measured. In the atomic force microscope, a measuring probe is deflected by atomic forces on the sample surface, typically attractive Van der Waals forces and / or repulsive forces of the exchange interaction.

The manufacture of probe tips for scanning probe microscopes is a difficult and therefore expensive process. This is particularly the case for very thin probe tips with a high aspect ratio, which are used for measuring nanostructured samples. Such probe tips are conventionally produced by particle beam-induced deposition from a material on a substrate.

For example, the publication "Tips for scanning tunneling microscopy produced by electron-beam-induced-deposition" describes B. Huebner et al .; Ultramicrsocopy 42-44 (1992) the production of conical probe tips with a minimum tip diameter of 10 nm and a maximum height of 1200 nm.

So-called cantilevers are usually used as the substrate. Often pyramid-shaped standard tips are arranged on these cantilevers, on which the actual probe tip is deposited.

The wear of such thin probe tips with a large aspect ratio has been a long-known problem. In particular, these probe tips frequently break off, which can lead to a complete exchange of the probe of the scanning probe microscope. In addition to the cost of replacing the probe, replacing the probe often results in prolonged failure of the scanning probe microscope, which can result in follow-up costs such as a production loss due to the unavailability of the scanning probe microscope.

Applications in the field of repairing photomasks for photolithography are particularly critical. Product losses or damage to the photomask due to catastrophic failure of the probe tips are extremely expensive. Therefore, the probe tips not only have to be very hard to minimize wear, but also be robust at the same time to prevent the probe tip from completely breaking off. However, hard materials are often brittle. Probe tips made of hard materials are therefore more susceptible to tip breaks. Weaknesses in the tip structure must therefore be systematically eliminated, since they exacerbate the problems when the probe tips break. Typical weak points are the attachment of the probe tip to the substrate, transitions from one geometry to another or a change of material (see 1 and 2nd below).

Various methods for reducing the wear of probe tips of scanning probe microscopes are known from the prior art. For example, the German patent application describes DE 10 2016 223 659 a method in which a probe tip is hardened by irradiation with charged particles.

In addition, it is known from the prior art not to deposit the actual probe tip directly on the substrate, but in a first step to deposit a base on the substrate and then to produce the actual probe tip on the base (see 1 below). The base and probe tip preferably have the same material, the diameter of the base being substantially larger than the diameter of the probe tip.

It is also from the German patent DE 198 254 04 a method is known in which the actual probe tip is surrounded by a conical support area. In particular, the energy transfer between the electron beam and the substrate or the probe tip to be generated, which is necessary for the deposition of the tip material, takes place in predetermined, raster-shaped course patterns, which can be spiral, for example.

Another method for reducing peak wear is also from the publication "Direct patterning of surface quantum wells with an atomic force microscope", J. Cortes Rosa et al .; Appl. Phys. Lett., Vol. 73, No. 18, p. 2684 (1998) known.

The documents DE 103 22 005 , DE 102 009 022 912 , US 7,232,997 , US 6,593,583 , EP 1662 538 and US 6,521,890 also deal with various aspects of the production of probes for scanning probe microscopes or with various aspects of scanning probe microscopy relevant to the invention.

• J. H. Kindt, G. E. Fantner, J. B. Thompson und P. K. Hansma, „Automaten wafer-scale fabrication of electron beam deposited tipsfor atomic force microscopes using pattern recognition,“ Nanotechnology, Bd. 15, pp. 1131-1134, 2004 .
• D. Freeman, B. Luther-Davies und S. Madden, „Real-Time Drift Correction of a Focused Ion Beam Milling System,“ in NSTI-Nanotech, 2006 .
• C. J. Lobo, A. Martin, M. R. Phillips und M. Toth, „Electron beam induced chemical dry etching and imaging in gaseous NH3 environments,“ Nanotechnology, Nr. 23, pp. 1-7, 2012 .
• Produktdatenblatt: „Supersharp high aspect ratio AFM tipsforfine features, Type: HDC-40 / HDC-30 / HDC-20,“ nanotools GmbH, [Online]. Verfügbar unter: http://www.nanotools.com/cms/upload/productflyer/HDC-Fine-Features_2017-09-R003.pdf.

In addition, reference is made to the following publications:

• JH Kindt, GE Fantner, JB Thompson and PK Hansma, "Automaten wafer-scale fabrication of electron beam deposited tips for atomic force microscopes using pattern recognition," Nanotechnology, Vol. 15, pp. 1131-1134, 2004 .
• D. Freeman, B. Luther-Davies and S. Madden, “Real-Time Drift Correction of a Focused Ion Beam Milling System,” in NSTI-Nanotech, 2006 .
• CJ Lobo, A. Martin, MR Phillips and M. Toth, "Electron beam induced chemical dry etching and imaging in gaseous NH3 environments," Nanotechnology, No. 23, pp. 1-7, 2012 .
• Product data sheet: "Supersharp high aspect ratio AFM tipsforfine features, type: HDC-40 / HDC-30 / HDC-20," nanotools GmbH, [Online]. Available at: http://www.nanotools.com/cms/upload/productflyer/HDC-Fine-Features_2017-09-R003.pdf.

However, reducing wear on thin probe tips remains one of the most pressing problems in improving scanning probe microscopy.

Further problems in the manufacture of probes for scanning probe microscopes with thin probe tips are the reproducibility of the manufacture, the long manufacturing time, the difficult automation of the manufacturing process, and in the design and manufacture of custom-made, application-specific probes.

Consequently, there is an ongoing interest in improving the probes known from the prior art, their production methods and devices for producing such probes and thereby eliminating or at least reducing the disadvantages of the prior art.

Summary of the invention

The above problems are at least partially solved by the subject matter of the independent claims of the present invention. Exemplary embodiments are described in the dependent claims.

In one embodiment, the present invention provides a method for producing a probe for a scanning probe microscope, the method comprising the following steps: particle beam-induced generation and / or processing of a probe tip on a substrate; wherein an interaction position of a particle beam is controlled in such a way that a lateral surface of a base region of the probe tip produced and / or processed has a negative curvature

verknüpft, wobei r₁ und r₂ die sogenannten Hauptkrümmungsradien sind.A negative curvature is to be understood here and in the following as a negative value of the so-called Gaussian curvature K. This is with the two so-called main curvatures k ₁ and k _{2 of} the surface of the base area using the equation $$k={\mathrm{<figure-callout\; id="1"\; label="k"\; filenames="DE102018221778A1\_0006.png"\; state="\{\{state\}\}">k</figure-callout>}}_1\cdot k_{\mathrm{2nd}}=\frac{1}{{\mathrm{<figure-callout\; id="1"\; label="r"\; filenames="DE102018221778A1\_0006.png"\; state="\{\{state\}\}">r</figure-callout>}}_1}\cdot \frac{1}{r_{\mathrm{2nd}}},$$

linked, where r ₁ and r _{2 are} the so-called main radii of curvature.

For example, for a spherical surface k ₁ > 0, k ₂ > 0, K = const> 0 and for the surface of a cone or a cylinder k ₁ > 0, k ₂ = 0, K = 0. An example of a surface with a negative Curvature is the so-called pseudosphere or the tracticoid (ie the rotating body of a tractrix) with k ₁ <0, k ₂ > 0 and K = const <0.

In particular, essentially the entire lateral surface of the base region can have the desired negative curvature. The term “essentially” is to be understood here and in the following as “within typical design, calculation, measurement and / or manufacturing tolerances”.

The generation of the probe tip can include, for example, a particle beam-induced deposition of at least one material and / or a particle beam-induced etching with at least one etching gas.

Through the controlled generation of a negatively curved base area, it can be ensured on the one hand that the connection area between the substrate and base area is large enough to prevent the base area from detaching from the substrate, and on the other hand that the base area continuously and without significant inhomogeneities in the upper area of the base area Probe tip merges. In addition, the negative curvature of the side surface means that the mean diameter of the base area decreases quickly enough, so that despite a large one Connection area of the base area with the substrate, a large aspect ratio of the probe tip is guaranteed (see 3rd below).

• - (Metall-, Übergangselemente-, Hauptgruppen-) Alkyle wie Cyclopentadienyl (Cp)- bzw. Methylcyclopentadienyl (MeCp)- trimethyl-platin (CpPtMe3 bzw. MeCpPtMe3), Tetramethylzinn SnMe4, Trimethylgallium GaMe3, Ferrocen Cp2Fe, bis-aryl-Chrom Ar2Cr und weitere solche Verbindungen;
• - (Metall-, Übergangselemente-, Hauptgruppen-) Carbonyle wie Chromhexacarbonyl Cr(CO)6, Molybdänhexacarbonyl Mo(CO)6, Wolframhexacarbonyl W(CO)6, Dicobaltoctacarbonyl Co2(CO)8, Trirutheniumdodecacarbonyl Ru3(CO)12, Eisenpentacarbonyl Fe(CO)5 und weitere solche Verbindungen;
• - (Metall-, Übergangselemente-, Hauptgruppen-) Alkoxyde wie Tetraethoxysilan Si(OC2H5), Tetraisopropoxytitan Ti(OC3H7)4 und weitere solche Verbindungen;
• - (Metall-, Übergangselemente-, Hauptgruppen-) Halogenide wie WF6, WCl6, TiCl6, BCl3, SiCl4 und weitere solche Verbindungen;
• - (Metall-, Übergangselemente-, Hauptgruppen-) Komplexe wie Kupfer-bishexafluoroacetylacetonat Cu(C5F6HO2)2, Dimethyl-goldtrifluoroacetylacetonat Me2Au(C5F3H4O2) und weitere solche Verbindungen;
• - Organische Verbindungen wie CO, CO2, aliphatische oder aromatische Kohlenwasserstoffe, Bestandteile von Vakuum-Pumpen-Öl, volatile organische Verbindungen und weitere solche Verbindungen.

For example, in some embodiments of the present invention, the deposited material can be obtained from at least one precursor material. For example, one or more of the following substances can be considered as precursor material:

• - (metal, transition elements, main group) alkyls such as cyclopentadienyl (Cp) - or methylcyclopentadienyl (MeCp) - trimethylplatinum (CpPtMe3 or MeCpPtMe3), tetramethyltin SnMe4, trimethylgallium GaMe3, ferrocen Cr2-chromium to Arp-Arp-Arp to and other such compounds;
• - (metal, transition elements, main group) carbonyls such as chromium hexacarbonyl Cr (CO) 6, molybdenum hexacarbonyl Mo (CO) 6, tungsten hexacarbonyl W (CO) 6, dicobaltoctacarbonyl Co2 (CO) 8, triruthenium dodecacarbonyl Ru3 (CO) 12, iron pentacarbonyl Fe (CO) 5 and other such compounds;
• - (Metal, transition elements, main group) alkoxides such as tetraethoxysilane Si (OC2H5), tetraisopropoxytitanium Ti (OC3H7) 4 and other such compounds;
• - (Metal, transition elements, main group) halides such as WF6, WCl6, TiCl6, BCl3, SiCl4 and other such compounds;
• - (metal, transition element, main group) complexes such as copper bishexafluoroacetylacetonate Cu (C5F6HO2) 2, dimethyl gold trifluoroacetylacetonate Me2Au (C5F3H4O2) and other such compounds;
• - Organic compounds such as CO, CO2, aliphatic or aromatic hydrocarbons, components of vacuum pump oil, volatile organic compounds and other such compounds.

• - Oxidationsstoffe wie O2, O3, H2O, H2O2, N2O, NO, NO2, HNO3 und weitere sauerstoffhaltige Gase;
• - Halogenide wie Cl2, HCl, XeF2, HF, I2, HI, Br2, HBr, NOCl, PCl3, PCl5, PF3 und weitere halogenhaltige Gase.
• - Gase mit reduzierender Wirkung wie H2, NH3, CH4 und weitere wasserstoffhaltige Gase.

Furthermore, one or more of the following additional gases can be used during the production or processing of the probe tip on the substrate:

• - Oxidants such as O2, O3, H2O, H2O2, N2O, NO, NO2, HNO3 and other oxygen-containing gases;
• - Halides such as Cl2, HCl, XeF2, HF, I2, HI, Br2, HBr, NOCl, PCl3, PCl5, PF3 and other halogen-containing gases.
• - Gases with a reducing effect such as H2, NH3, CH4 and other gases containing hydrogen.

In further embodiments of the present invention, the method can additionally comprise: particle beam-induced generation and / or processing of a whisker region above the base region of the probe tip; or particle beam-induced generation and / or processing of a whisker area above the base area of the probe tip and a central area between the base area and the whisker area of the probe tip, the lateral surface of the central area not being negatively curved.

For example, the central region can have the shape of a cylinder or a cone or a plurality of cones.

In some embodiments, the interaction position of the particle beam is controlled in such a way that the base region continuously merges into the whisker region or into the central region of the probe tip, without the negative curvature of the lateral surface of the probe tip becoming positive. For example, the probe tip may be essentially in the form of a pseudosphere or the shape of a body of revolution in a circular section (see equation 2 below).

It can thereby be achieved that the probe tip has no weak points, such as an inconsistent transition between the base region and the whisker region or a transition region between two cone regions with different base surface diameters. In particular, areas of the probe tip with an increased notch effect can thereby be avoided and / or the notch effect on the entire probe tip or a part thereof can be minimized. For example, the radius of the base area as a function of the height can be selected such that the notch effect in the area of the base point of the base area is minimized. This can generally be achieved by negative curvature of the side base surface.

Furthermore, the whisker area can have a height of at least 10 nm, preferably of at least 50 nm, more preferably of at least 100 nm, even more preferably of at least 500 nm and most preferably of at least 1000 nm.

Furthermore, the whisker region can have an average radius of at most 30 nm, preferably of at most 20 nm, more preferably of at most 10 nm, even more preferably of at most 5 nm and most preferably of at most 3 nm.

Furthermore, the base region can still have a height of at least 20 nm, preferably of at least 100 nm, more preferably of at least 250 nm more preferably at least 500 nm and most preferably at least 1000 nm.

Furthermore, that end of the base region which is arranged on the substrate can have an average radius of at least 25 nm, preferably of at least 100 nm, more preferably of at least 300 nm, even more preferably of at least 750 nm and most preferably of at least 1500 nm exhibit.

Furthermore, in some embodiments, one of the major curvatures of the surface of the base region may be negative and substantially constant. In particular, the main negative curvature of the surface of the base region can be at least 1 / (1000 nm), preferably at least 1 / (500 nm), more preferably 1 / (100 nm) and most preferably at least 1 / (10 nm), but in this case preferably at most the reciprocal of the height of the base area.

The dimensions of the base area and the whisker area specified above can ensure that the wear of the probe tip is significantly reduced without impairing the spatial resolution of the probe. In particular, the diameter of the base area decreases as a function of the height of the base area quickly enough to achieve a high aspect ratio, which is essential, in particular, for the measurement of deep, nanostructured trenches.

In some embodiments of the present invention, the whisker area can have a height of at least 10 nm and at most 1000 nm, preferably of at least 30 nm and at most 700 nm and more preferably of at least 50 nm and at most 400 nm.

In some embodiments of the present invention, the whisker region can have an average radius of at least 3 nm and at most 30 nm, preferably of at least 5 nm and at most 25 nm and more preferably of at least 5 nm and at most 20 nm.

In some embodiments of the present invention, the base region can have a height of at least 20 nm and at most 1000 nm, preferably of at least 50 nm and at most 700 nm and more preferably of at least 100 nm and at most 500 nm.

In some embodiments of the present invention, that end of the base region which is arranged on the substrate can have an average radius of at least 25 nm and at most 1500 nm, preferably of at least 40 nm and at most 1000 nm and more preferably of at least 50 nm and at most 1500 nm.

In some embodiments of the present invention, the major negative curvature of the surface of the base region can be at least 1 / (1500 nm) and at most 1 / (20 nm), preferably at least 1 / (800 nm) and at most 1 / (50 nm) and more preferably at least 1 / (500 nm) and at most 1 / (100 nm), but preferably at most the reciprocal of the height of the base region.

Furthermore, the interaction position of the particle beam can be controlled such that the base region and / or the central region of the probe tip are generated layer by layer, the particle beam per layer being controlled along essentially elliptical, preferably circular, surfaces.

In particular, at least one semiaxis of the elliptical surfaces can be a function of the height difference between the associated layer and the surface of the substrate, the function describing a section of an ellipse, in particular a circle.

wobei H die Gesamthöhe des Sockelbereichs, r_k der Absolutwert des negativen Haupkrümmungsradius der Oberfläche und r_H der Radius der obersten Schicht des Sockelbereichs ist, wobei im Allgemeinen gilt: h ∈ [0, H] und r_k ≥ H. Die obige Gleichung lässt sich für h=0 nach dem Hauptkrümmungsradius r_k auflösen. Man erhält: $$r_k=\frac{\left(r_o-r_H\right)}{2}+\frac{H^2}{2\left(r_o-r_H\right)},$$

wobei r_o=r(o), d.h. r_o ist der Radius der untersten Schicht. Für r_H=o und r_o=H erhält man folglich r_k=H.For example, the radius r of the circular surfaces can be linked to the height h of the associated circular layer using the following equation: $$r\left(H\right)=r_H+r_k-\sqrt{r_k^{\mathrm{2nd}}-\left(H-H^{\mathrm{2nd}}\right),}$$

where H is the total height of the base area, r _{k is} the absolute value of the negative main radius of curvature of the surface and r _{H is} the radius of the top layer of the base area, where in general: h ∈ [0, H] and r _k ≥ H. The above equation leaves dissolve for h = 0 according to the main radius of curvature r _k . You get: $$r_k=\frac{\left(r_O-r_H\right)}{\mathrm{2nd}}+\frac{H^{\mathrm{2nd}}}{\mathrm{2nd}\left(r_O-r_H\right)},$$

where r _o = r (o), ie r _o is the radius of the lowest layer. Hence for r _H = o and r _o = H one obtains r _k = H.

As a further example, with H = 500 nm, r _k = 750 nm and r _H = 10 nm, a negatively curved base region with a lower diameter of approximately 400 nm, a total height of 500 nm and an upper diameter of 20 nm is obtained the diameter of the base area at a height of 300 nm is only approx. 74 nm.

By further depositing material on the uppermost layer of the base area, a whisker area can now be created on the base area. For example, the diameter of the whisker area is 2 × r _H. In the example above, the whisker area then has a diameter of 20 nm. The length of the whisker area can be set almost as desired. For example, whisker areas with a length of 400 nm or even 1000 nm can be generated.

As a result, a probe tip can be produced in which a negatively curved base area continuously changes into a whisker area without the curvature of the probe tip ever becoming positive. Shape-related weak points of the probe tip (see 2nd below) can be completely avoided. Other functional relationships between the semiaxis r and the height h of the layer are of course also conceivable in order to obtain a negatively curved surface of the base region.

In some embodiments of the present invention, the scanning parameters of the particle beam can be selected such that when scanning once with the particle beam, only a fraction of a layer - with a thickness that essentially corresponds to the spacing of the atomic crystal lattice - is deposited. An essentially continuous probe tip can be produced without a discrete layer structure, as can be the case, for example, in processes such as atomic layer epitaxy or atomic layer deposition.

Furthermore, in some embodiments, the particle beam-induced generation and / or processing of the probe tip can be interrupted at least once for a determinable period of time during the manufacture of the probe, preferably for at most 1000 ms, more preferably for at most 500 ms and most preferably for at most.

For example, after a layer of the probe tip has been generated, the particle beam can be moved into a rest position for a predetermined duration.

As a result, during the particle beam-induced deposition of the tip material from the gas phase, it can be achieved, for example, that the concentration of the precursor gas in the relevant interaction volume is kept essentially constant during the generation of the probe tip.

In this way, the desired shape of the probe tip can be generated efficiently and simply and at the same time the most homogeneous density and material composition of the probe tip can be achieved, which additionally reduces the occurrence of structural weak points of the probe tip.

In some embodiments, the method may further include the step of adjusting the particle beam before and / or during manufacture of the probe based on a particle optical measurement of at least a portion of the substrate and / or the probe tip to be generated.

In particular, the adjustment of the particle beam can be based at least in part on at least one marking made on the substrate, in particular deposited thereon.

1. a. Anpassen einer Fokusposition des Teilchenstrahls;
2. b. Korrigieren eines Strahlfehlers des Teilchenstrahls;
3. c. Korrigieren eines Astigmatismus des Teilchenstrahls;
4. d. Anpassen des Teilchenflusses des Teilchenstrahls; und
5. e. Anpassen der mittleren kinetischen Energie der Teilchen des Teilchenstrahls.

For example, the adjustment of the particle beam can comprise at least one of the following steps:

1. a. Adjusting a focus position of the particle beam;
2. b. Correcting a beam error of the particle beam;
3. c. Correcting astigmatism of the particle beam;
4. d. Adjusting the particle flow of the particle beam; and
5. e. Adjusting the average kinetic energy of the particles of the particle beam.

In this way, displacements of the substrate and / or the particle beam that occur during the manufacture of the probe can be actively corrected, thereby improving the quality of the probe tip produced and the reproducibility of the manufacturing process.

In some embodiments, the method may further include the step of electrically discharging the probe, preferably by interacting with ions from a plasma.

This can ensure, for example, that the probe remains electrically neutral during the generation of the probe tip and thus does not influence the trajectories of the particles of the particle beam. In addition, the discharge of the probe also means that the probe remains electrically neutral in subsequent operation in a scanning probe microscope, which can increase the quality of scanning probe microscope measurements.

In addition, as in US 7,232,997 described a grid-shaped shielding element can be used to reduce electrical charging of the probe during the production or processing of the probe tip.

Another embodiment of the present invention relates to a method for producing probes for scanning probe microscopes, comprising the following steps: providing a first and at least a second substrate; Generating a reference image of the first substrate; Generating at least one object image of the at least second substrate; Determining at least one transformation between the reference image and the at least one object image; and particle beam-induced generation and / or processing of at least one probe tip on the at least second substrate based on the at least one specific transformation.

In particular, a method known from the field of image registration can be used when determining the at least one transformation.

With the aid of the method described above, it can be achieved that the probe tip on the at least second substrate is generated essentially at the same position as the probe tip of the first substrate. In particular, the method allows the production of a large number of probe tips to be automated on a large number of substrates.

For example, the method can make it possible that only the position of the probe tip on the first substrate has to be set manually and all further positions of all further probe tips to be generated be determined automatically.

The method can further comprise determining a height difference between the first and the at least second substrate, preferably by means of a light-optical measuring method. For example, an interferometric optical height sensor can be used. Additionally or alternatively, the functioning of the height sensor can also be based on the determination of chromatic aberrations, such as in the DE 10 2016 115 827 A1 described.

The method can further comprise automatically adjusting a particle beam based on at least one particle-optical measurement of the respective substrate.

The method can further comprise the production of at least one, preferably two, markings on the substrate in each case next to the probe tip to be produced. In particular, in addition to the actual probe tips, two further probe tips or whisker areas can be generated on each side, which can serve as markings and / or reference objects for the adjustment of the particle beam optics.

In particular, the automatic adjustment of the particle beam can include an automatic adjustment of a focus and / or an automatic correction of an astigmatism of the particle beam.

In addition, the method can also include the step of generating at least one test tip on the first substrate and / or the at least second substrate.

Such a test tip can be used, for example, to check the correct alignment of the particle beam.

In another embodiment, the present invention provides a method of making a probe for a scanning probe microscope, comprising the steps of: constructing a probe tip design based on a plurality of selectable subunits; and particle beam-induced generation and / or processing of a probe tip on a substrate based at least in part on the constructed probe tip design.

1. a. eine geometrische Form der zumindest einen auswählbaren Untereinheit;
2. b. eine Abmessung der zumindest einen auswählbaren Untereinheit;
3. c. eine Krümmung einer Oberfläche der zumindest einen auswählbaren Untereinheit;
4. d. eine Steigung einer Oberfläche der zumindest einen auswählbaren Untereinheit;
5. e. ein Material der zumindest einen auswählbaren Untereinheit; und
6. f. eine Dichte der zumindest einen auswählbaren Untereinheit.

In particular, the construction of the probe tip design can include the setting of at least one parameter of at least one of the selectable subunits, the at least one parameter comprising at least one of the following:

1. a. a geometric shape of the at least one selectable subunit;
2. b. a dimension of the at least one selectable subunit;
3. c. a curvature of a surface of the at least one selectable subunit;
4. d. a slope of a surface of the at least one selectable subunit;
5. e. a material of the at least one selectable subunit; and
6. f. a density of the at least one selectable subunit.

For example, the plurality of selectable subunits can include at least one base area, at least one whisker area, at least one middle area and at least one cap of the probe tip design.

The method provided makes it possible, for example, to design and manufacture custom, application-specific probes for scanning probe microscopes in a simple and efficient manner.

In particular, the compilation of a probe tip design from a predetermined plurality of subunits (modular principle) also enables a user who may be only rudimentary to manufacture such probe tips to construct a functional and also producible probe tip in just a few steps.

In particular, the method can further comprise: computer-aided checking whether the probe tip design can be produced by particle beam-induced generation and / or processing on a substrate, the checking taking into account at least one boundary condition of the particle beam-induced generation or processing and / or at least one consistency condition of the probe tip design.

For example, such a check can be based on a so-called Design Rule Check (DRC), as is known, for example, from the manufacture of printed circuit boards, CNC components or additive manufacturing.

In this way it can be ensured that the user only selects and combines subunits and construction parameters that are consistent with one another and with which the resulting probe tip can also be manufactured.

The method may further include: controlling an interaction position of a particle beam based on the constructed probe tip design.

In particular, a control trajectory for the interaction position of the particle beam can be determined from the constructed probe tip design, which is then scanned layer by layer during the manufacture of the probe tip.

At this point it should be pointed out that the methods of the different embodiments described above can also be combined with one another. For example, the plurality of subunits can also include curved base areas that are designed such that they can continuously transition into a whisker area.

1. a. einem Anwendungsbereich der Sonde;
2. b. einer für die Sonde spezifischen Messmethode;
3. c. einer für die Sonde spezifischen Art von Messobjekt;
4. d. einem für die Sonde spezifischem Typ von Rastersondenmikroskop; und
5. e. einem Substrattyp.

Furthermore, the subunits in the plurality of subunits can each be associated with at least one of the following parameters:

1. a. a scope of the probe;
2. b. a measurement method specific to the probe;
3. c. a type of measurement object specific to the probe;
4. d. a type of scanning probe microscope specific to the probe; and
5. e. a type of substrate.

In a further embodiment, the present invention provides a probe for a scanning probe microscope, the probe comprising: a substrate and a probe tip arranged on the substrate, wherein a lateral surface of a base region of the probe tip has a substantially negative curvature; and wherein the probe is made by a method according to any one of the preceding embodiments of the present invention.

As already explained in detail above, such probes have a significantly lower probability of termination than conventional probes with a comparable resolution.

In a further embodiment, the present invention provides a device for producing one or a plurality of probes for a scanning probe microscope, the device comprising: means for carrying out a method according to one of the embodiments described above; and means for executing a computer program.

In a further embodiment, the present invention provides a computer program with instructions for carrying out a method according to one of the previously described embodiments with a device as described above.

Such a device and / or such a computer program make it possible, in particular, to manufacture custom-made, application-specific probes with robust and low-wear probe tips in an automated process in large numbers and with constant quality.

Figure list

• 1 ein schematischer Querschnitt durch eine aus dem Stand der Technik bekannte Sonde
• 2 eine teilchenoptische Aufnahme einer aus dem Stand der Technik bekannten Sondenspitze
• 3 eine schematische Darstellung einer Sondenspitze für Rastersondenmikroskope, die mit einem Verfahren nach einer Ausführungsform der vorliegenden Erfindung erzeugt werden kann
• 4 eine schematische Darstellung einer beispielhaften Trajektorie einer Wechselwirkungsposition eines Teilchenstrahls beim Erzeugen einer Sondenspitze für Rastersondenmikroskope gemäß einem Verfahren nach einer Ausführungsform der vorliegenden Erfindung
• 5 eine schematische Darstellung eines Probenhalters einer Teilchenstrahlvorrichtung zur Herstellung von Sonden für Rastersondenmikroskope gemäß einer Ausführungsform der vorliegenden Erfindung
• 6 Block-Ablaufdiagram eines automatisierten Verfahrens zur Herstellung einer Vielzahl von Sonden für Rastersondenmikroskope nach einer Ausführungsform der vorliegenden Erfindung
• 7 eine schematische Seitenansicht und Draufsicht einer Sonde für Rasterkraftmikroskope, die mit einem Verfahren nach einer Ausführungsform der vorliegenden Erfindung erzeugt werden kann
• 8 ein Diagramm zur Darstellung von Transformationen zwischen verschiedenen Koordinatensystemen, die bei der Herstellung von Sonden für Rastersondenmikroskope gemäß einem Verfahren nach einer Ausführungsform der vorliegenden Erfindung verwendet werden
• 9 drei schematische Draufsichten auf einen Teil einer Sonde während des Justierens eines Teilchenstrahls gemäß einem Verfahren nach einer Ausführungsform der vorliegenden Erfindung
• 10 eine schematische Darstellung eines Konstruktionsverfahrens für anwendungsspezifische Sonden für Rastersondenmikroskope nach einer Ausführungsform der vorliegenden Erfindung
• 11 schematische Darstellung eines Sondenspitzendesigns mit modifizierbaren Abmessungen gemäß einem Verfahren nach einer Ausführungsform der vorliegenden Erfindung

Certain aspects of the present invention are described below with reference to the accompanying drawings. These drawings show:

• 1 a schematic cross section through a probe known from the prior art
• 2nd a particle-optical recording of a probe tip known from the prior art
• 3rd is a schematic representation of a probe tip for scanning probe microscopes, which can be generated with a method according to an embodiment of the present invention
• 4th is a schematic representation of an exemplary trajectory of an interaction position of a particle beam when generating a probe tip for scanning probe microscopes according to a method according to an embodiment of the present invention
• 5 is a schematic representation of a sample holder of a particle beam device for producing probes for scanning probe microscopes according to an embodiment of the present invention
• 6 Block flow diagram of an automated method for manufacturing a plurality of probes for scanning probe microscopes according to an embodiment of the present invention
• 7 is a schematic side view and plan view of a probe for atomic force microscopes, which can be generated with a method according to an embodiment of the present invention
• 8th a diagram illustrating transformations between different coordinate systems that are used in the manufacture of probes for scanning probe microscopes according to a method according to an embodiment of the present invention
• 9 three schematic plan views of part of a probe during the adjustment of a particle beam according to a method according to an embodiment of the present invention
• 10th is a schematic representation of a construction method for application-specific probes for scanning probe microscopes according to an embodiment of the present invention
• 11 schematic representation of a probe tip design with modifiable dimensions according to a method according to an embodiment of the present invention

Detailed description of some embodiments

Some exemplary embodiments of the present invention are described below with reference to the attached drawings. However, the claimed methods, apparatus and computer program for the production of probes for scanning probe microscopes are not restricted to such embodiments. Rather, it is to be understood that other combinations of features can also fall within the scope of the invention. In other words, not all features of the described embodiments need to be present in order to implement the present invention. Furthermore, the embodiments may be modified by combining certain features of one embodiment with one or more features of another embodiment without departing from the disclosure and scope of the present invention.

1 shows schematically the structure of a conventional probe for scanning probe microscopes. On a substrate 110 such as a cantilever is a probe tip 120 arranged. This can be generated, for example, by particle beam deposition. The probe tip shown 120 includes a conical base 130 the one on the substrate 110 is deposited. On the base 130 is a so-called whisker 140 deposited, which represents the actual measuring tip. Usually the diameter of the whisker 140 much smaller than the diameter of the base 130 . The dashed arrows show the potential structural weaknesses WP the probe tip shown. In particular the transition between the plinth 130 and whiskers 140 is prone to break the whisker 140 .

2nd shows an electron-optical image of an exemplary probe tip as is known from the prior art. In the probe tip shown, a conical base is used 230 over a short conical transition zone into a conical tip 240 over. The shape of the probe tip shown is generally one compared to that in FIG 1 shape shown improved stability. Nevertheless, the transition region between the base and the tip forms a clearly defined weak point WP (shown by the dashed arrow) of the probe tip, on which it regularly breaks off the tip 240 is coming.

3rd schematically shows a probe 300 for scanning probe microscopes that can be produced with a method according to an embodiment of the present invention. On a substrate 310 such as a cantilever is a probe tip 320 arranged. The probe tip 320 can be generated, for example, by particle beam-induced deposition of material from the gas phase.

The probe tip 320 includes an integrated plinth area 330 and a whisker area 340 . The plinth area 330 is shaped so that its lateral surface has a pronounced negative curvature. This can achieved that the diameter of the base area 330 at the lower end is much larger than the diameter of the whisker area 340 , causing detachment of the probe tip 320 from the substrate 310 can be prevented. The negatively curved surface of the base area 330 also leads to the diameter of the base area 330 decreases fast enough to a large aspect ratio of the probe tip 320 to guarantee. In particular, the base area goes 330 continuously in the whisker area 340 via, without localized and / or pronounced weak points occurring, as is the case with the probe tips known from the prior art.

4th schematically shows a possible trajectory of the interaction position 410 a particle steel with which the probe tip 320 out 2nd can be generated. In the embodiment of the present invention shown, the probe tip is built up layer by layer or on the substrate 310 deposited. The interaction position 410 the particle beam is per layer along concentric circles 420 controlled led. For example, the interaction position 410 of the particle beam by moving the sample holder of the particle beam device used to generate the probe tip and / or by controlling the particle beam. In particular, it can be achieved that the probe tip is produced in one piece in order to obtain a smooth, continuous probe tip without weak points.

In this context it should be mentioned that the wear of probe tips depends directly on their material composition. For applications such as the repair of photolithography masks, for example, so-called DLC tips (DLC: diamond like carbon) are preferable because it is a very hard material. In order to deposit such a DLC tip, it is imperative to use a clean deposition chamber. This can be achieved by regularly cleaning the deposition chamber of the particle beam device before loading the substrates. For example, the deposition chamber can be treated by a plasma cleaning process and / or by etching gas cleaning

5 shows schematically the construction of a sample holder 500 which is suitable for the automated production of a multiplicity of probes for scanning probe microscopes and can be used in a method according to an embodiment of the present invention. The sample holder 500 has a variety of shooting positions 520 for a variety of probe holders 530 on. Additionally are on the sample holder 500 Fiducial markings 510 arranged, which can be used to determine the position. On every probe holder 530 is a probe 535 attached. The probe 535 has a footprint 550 and a cantilever 310 on the as a substrate for the production of the respective probe tip 320 serves. On every probe holder 530 are again fiducial markings 540 arranged together with the fiducial markings 510 the sample holder 500 can be used to determine position. Alternatively, a plurality of probes, such as a probe array, can also be arranged on each probe holder.

6 shows a block diagram of a partially automated manufacturing method for a plurality of probes for scanning probe microscopes, in which a sample holder as in 5 shown can be used. The procedure of 6 can be divided into an interactive phase (interactive, Engl. Interactive) and an automated phase (automated, Engl. Automated).

Here, all processing steps that cannot be automated are combined, so that no operator work is required during the automated processing phase. This enables automated batch production, which significantly reduces the costs for top manufacturing and the production time.

The process begins with all systems of the manufacturing device (e.g. an electron microscope) being brought into an optimized state and all processing parameters set correctly (setup & check SEM state). To do this, predefined process recipes and predefined reference values for measurement parameters (e.g. the particle beam) can be checked or set. Optionally, all parameters can be logged to support various quality assurance measures.

The setup of the manufacturing device also includes particle-optical imaging of the fiducial markings 510 , 540 (please refer 5 above), which are used to determine the required coordinate transformations (see procedural step "Navigation" below). After manual or automatic navigation to the first probe, the process steps autofocus and autostig (short for automated astigmatism correction) are carried out (see below).

Then a reference image (so-called golden image) of the first probe holder 530 with the first probe blank attached to it 535 generated (Acquire golden image; Engl. Acquire golden image).

Recording the reference image serves two purposes: First, the image quality is checked by the operator to ensure that the focus and stigmator are set correctly.

Secondly, the reference image is used for the image registration that will be used later (see process step "Navigation" below), which allows the further probe blanks 535 to start automatically and the large number of probe tips 320 to generate automatically. The interactive phase ends with the creation of the first probe tip 320 on the cantilever 310 of the first probe blank 535 (Create first tip; Engl. Deposit i ^st tip).

For the remaining probes, the system automatically runs through the right next to the dashed line in 6 Process steps shown before the sample holder can be removed from the process chamber of the manufacturing device (Unload Deposition holder). The individual steps in the process chain of the automated phase are described below:

Check the state of the particle beam device (Check SEM state):

In this step, an automatic check of the manufacturing device is carried out. The automated test compares a set of parameter values with the values measured during the interactive phase. Examples are the particle extraction flow, the particle beam flow and vacuum pressure in the process chamber. The gas supply of the precursor gas (e.g. the precursor gas pressure or the reservoir temperature) is also checked. In addition, a contamination test can be carried out before separating each additional probe tip.

Automatic approach to the probe blanks (navigation)

In this step of the process, the respective probe blank 535 on which the probe tip 320 automatically generated should be started automatically. This means, for example, that the sample stage of the electron microscope used for the production is moved in such a way that the next probe blank is centered in the imaging area of the electron microscope.

The automated start-up of the respective probe blank 535 is based on a three-stage method in the present embodiment. The main purpose of this procedure is the positional uncertainty of each newly approached probe blank 535 due to probe holder placement errors 530 relative to the sample holder 500 to eliminate. In addition, there is another position error of the probe blanks 535 , in that the probe blanks 535 not always identical on the associated probe holder 530 are arranged.

In other words, the described navigation method serves to determine the relative position of the probe blanks 535 in relation to the position of the fiducial markings known from the interactive phase 510 the sample holder 500 to determine.

For this, as in 8th shown four coordinate systems (SEM table, sample holder, probe holder, probe; Engl. SEM stage, deposition holder, sample holder, sample) defined, each of the sample table of the particle beam device, the sample holder 500 , the respective probe holder 530 and the respective probe blank 535 assigned.

In order to transform the coordinates of the different coordinate systems, a large number of parameters must be determined. Since particle-optical images are two-dimensional, they can only be used for the assignment of X and Y coordinates.

Through particle-optical recordings of the fiducial markings 510 the sample holder 500 and the probe holder 535 and determining the coordinates of the sample table for each of the recorded images can be the parameters for the XY image between the known and controllable coordinates of the sample table, the sample holder 500 and each of the probe holders 530 being found.

In other words, the position of each of the probe holders 530 (more precisely the fiducial markings 540 ) can be precisely controlled by moving the sample table in the XY plane without the operator having to intervene.

The missing coordinate transformation between the probe holder 530 and the associated probe blank 535 For example, the so-called image registration can be used to determine. Here, each probe holder 530 and the probe blank attached to it 535 a particle-optical image, the so-called object image.

By methods known from image registration, such as a correlation method or a method based on spatial Fourier analysis, an optimal transformation between the respective object image and the reference image of the first probe holder recorded during the interactive phase can be achieved 530 and the first probe blank 535 be determined.

By combining it with the already known XY mapping between the coordinates of the Sample tables and each of the probe holders 530 XY mapping between the known and controllable position of the sample table and the position of the respective probe blank 535 be determined.

The resulting XY map can now be used, for example, around the center of each cantilever 310 each of the sample blanks 535 to move automatically (in the XY plane) with the movable sample table of the particle beam device in order to automate a sample tip there 320 to create. Alternatively or additionally, the probe blanks can also be used 535 be provided with your own fiducial markings to improve the accuracy of the navigation.

The determination of the coordinate transformation in the Z direction is based on the one hand on very well known height differences between the sample table and sample holder 500 , the probe holders 530 and the probe blanks 535 . This can be achieved in particular through very precise manufacturing tolerances of the respective components.

The remaining uncertainty in the difference in height between the surface of the sample holder 500 and the surface of the respective cantilever 310 can be determined with the help of an optical height sensor. Here, for example, an interferometric and / or length measurement based on chromatic aberrations can be used.

Autofocus and automated astigmatism correction (autofocus, autostig)

To get the best possible focus of the particle beam, which is used for the automated generation of the probe tips 320 The focus must be used after each start of the next probe blank 535 be reset. Optionally, the stigmator and / or other beam optics of the particle beam device can also be readjusted.

Numerous methods for automating the focusing and astigmatism correction (auto-stig) of particle microscopes and particle beam devices are known from the prior art, but these do not fully take into account the specific requirements for the particle beam-induced generation and / or processing of probe tips for scanning probe microscopes.

If a probe tip 320 on an existing standard tip 710 a cantilever 310 should be applied (see 7 ) are most areas of a particle optical image of the probe tip 320 unsharp and known autofocus methods and / or autostig methods fail.

• Zuerst werden Markierungen 720 auf beiden Seiten der Zielposition für die zu fertigende Sondenspitze 320 erzeugt. Dann wird mit dem Erzeugen der Sondenspitze 320 begonnen. Die Markierungen 720 können dann exakt von oben abgebildet werden (da sich der Probentisch der Teilchenstrahlvorrichtung noch in der gleichen Position und Ausrichtung wie beim Erzeugen der Sondenspitze befindet). Mit etablierten Bildverarbeitungsverfahren (Konturerfassung, Kreiserkennung durch Hough-Transformation, etc.) kann dann der Durchmesser des Schafts der spitzenähnlichen Markierungen 720 und Abweichungen von der vorgesehenen Kreisform bestimmt werden

For this reason, the following procedure is proposed in one embodiment of the present invention:

• First are marks 720 on both sides of the target position for the probe tip to be manufactured 320 generated. Then with the creation of the probe tip 320 began. The markings 720 can then be imaged exactly from above (since the sample table of the particle beam device is still in the same position and orientation as when the probe tip was generated). The diameter of the shaft of the tip-like markings can then be established using established image processing methods (contour detection, circle recognition by means of Hough transformation, etc.) 720 and deviations from the intended circular shape are determined

Examples of algorithms for calculating contours from a particle-optical image are threshold value formation (e.g. Otsu's method), Canny edge detection, segmentation and watershed algorithms.

Analysis of the size and shape of the contour of the particle optical image of the markings 720 can be used to obtain focus and astigmatism information.

After the outline of each mark 720 is calculated, an ellipse can be fitted to the contour. The ratio of the length of the ellipse half axes is a measure of the deviation from the ideal circular shape and thus of the present astigmatism of the particle steel.

In addition, circles can be attached to the contours of the markings 720 be fitted to check whether the particle beam device was in focus during the deposition.

It is also possible to place a test tip in another position 730 to generate to check the alignment of the particle beam optics.

9 shows schematically as from the contours of the markings 740 a defocusing and / or an astigmatism of the particle beam can be concluded. If, for example, the particle beam is in focus and the astigmatism is corrected, circular contours of the markings are obtained 740 (a). In the event of defocusing, the radius of the contours of the markings 740 larger than in focus (b). If there is astigmatism, contours of the markings 740 no longer circular, but elliptical.

This information can be used to iteratively and automatically focus the particle beam and to correct any astigmatism that may be present. The optimized settings for the stigmator and focus are achieved when the ratio of the semi-axes of the fitted ellipses is as close as possible to 1 and the radius of the circle is as small as possible. Automated methods for optimizing particle beam optics are known from the prior art and can be adapted to the present optimization task. By using two marks 740 For example, the magnification of the particle-optical system and / or the scaling of the particle-optical images recorded with it can be checked.

The described method not only deals with the question of correct focusing and / or astigmatism correction with tapered probe tips, but also has the advantage that it relates directly to frequently specified probe tip parameters (such as the tip diameter). This can be advantageous for probe tips, for example, which should have a specially desired shape. In general, correct focusing and / or astigmatism correction allows the accuracy of the manufacturing process of such probe tips to be improved.

The method described above can also be used on cantilevers without standard tips.

Generation of the probe tip (tip deposition)

Generating the probe tip 320 on the associated cantilever 310 essentially functions as previously described for the other embodiments of the present invention.

In particular, the generation of the probe tip is already possible automatically (see 4th ) and therefore this step of the automated phase is no different from creating the first probe tip during the interactive phase.

After each probe tip has been generated, another particle-optical image can optionally be recorded in order to record the result. The sample holder can optionally be used 500 be tilted so that the length of the probe tip can also be measured.

10th shows a construction method for application-specific probe tips for scanning probe microscopes according to a further embodiment of the present invention. In a first step 1010 a user can select from a plurality of subunits to construct a probe tip design suitable for the desired application of the probe tip. For example, the user can choose from differently shaped base areas, middle areas, whisker areas and caps of the probe tip design. After the selection is complete, the next step 1020 the complete probe tip design is displayed to the user. This step can also be carried out in parallel with the selection of the subunits.

In a next step 1030 The user can modify various design parameters of the probe tip, such as the shape, the dimensions and / or the material type, etc. This step can also be carried out in parallel to the previous steps.

In a next step 1030 the modified and / or fully specified probe tip design is displayed to the user again. This step can also be carried out in parallel to the previous steps.

In a further step 1040 the modified probe tip design can be checked automatically for consistency and / or its manufacturability. In particular, this can be done automatically by a computer program and based on a set of predefined rules. For example, a so-called Design Rule Check (DRC) can be carried out to check the modified probe tip design for consistency and / or manufacturability. This step can also be carried out in parallel to the previous steps.

After the probe tip design review is complete, a file with manufacturing instructions such as a trajectory for the interaction position of the particle beam, a specification for the step size, etc. are created and transmitted to the manufacturing device used for the manufacture of the probe tip.

Essentially, the design and manufacturing process of the probe tip works similar to the process steps known from the additive manufacturing of mechanical components. In particular, the user can create the probe tip design at another location, for example via a web-based application, and send it to any manufacturing facility in the form of a standardized manufacturing file.

The verification of the probe tip design integrated in the construction process ensures that the probe tip can also be manufactured. After a desired number of probes has been completed, they can be packed at the manufacturing facility and sent to the respective user. This enables the mass production of application-specific probes for scanning probe microscopes.

11 shows an example of a modifiable probe tip design consisting of a curved base region 1110 (as discussed above), a cone-shaped central area 1120 , a cylindrical whisker area 1130 and a spherical cap 1140 . The user can modify the relevant dimensions of the individual sub-areas using a large number of input fields. The review of the probe tip design discussed above can ensure that the user can only select or enter subunits and dimensions that can be combined with one another, produced by a given manufacturing device, and are consistent in themselves.

QUOTES INCLUDE IN THE DESCRIPTION

This list of documents listed by the applicant has been generated automatically and is only included for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.

Patent literature cited

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Claims (30)

Method for producing a probe (300) for a scanning probe microscope with the following steps: a. particle beam-induced generation and / or processing of a probe tip (320) on a substrate (310); b. wherein a time-changing interaction position (410) of a particle beam is controlled in such a way that a lateral surface of a base region (330) of the probe tip (320) produced and / or processed has a negative curvature. Procedure according to Claim 1 , wherein substantially the entire lateral surface of the base region (330) has the negative curvature. Method according to one of the preceding claims, wherein the particle beam-induced generation and / or processing of the probe tip (320) comprises a particle beam-induced deposition of at least one material and / or a particle-beam-induced etching with at least one etching gas. The method of any one of the preceding claims, further comprising: particle beam-induced generation and / or processing of a whisker area (340) above the base area (330) of the probe tip (320); or Particle beam-induced generation and / or processing of a whisker area (340) above the base area (330) of the probe tip (320) and a central area between the base area (330) and the whisker area (340) of the probe tip (320), the lateral surface of the central area not being negatively curved is. Method according to the preceding claim, wherein the base region (330) merges continuously into the whisker region (340) or into the central region of the probe tip (320) without the curvature of the lateral surface of the probe tip (320) becoming positive. Method according to one of the preceding Claims 4 - 5 , wherein the whisker region (340) has a height of at least 10 nm, preferably of at least 50 nm, more preferably of at least 100 nm, even more preferably of at least 500 nm and most preferably of at least 1000 nm; and wherein the whisker region (340) has an average radius of at most 30 nm, preferably at most 20 nm, more preferably at most 10 nm, even more preferably at most 5 nm and most preferably at most 3 nm. Method according to one of the preceding claims, wherein the base region (330) has a height of at least 20 nm, preferably of at least 100 nm, more preferably of at least 250 nm, even more preferably of at least 500 nm and most preferably of at least 1000 nm and that end of the base region (330) which is arranged on the substrate (310) having an average radius of at least 25 nm, preferably of at least 100 nm, more preferably of at least 300 nm, even more preferably of at least 750 nm and most preferably of at least 1500nm. Method according to one of the preceding claims, wherein one of the main curvatures of the surface of the base region (330) of the probe tip (320) is negative and substantially constant. The method according to the preceding claim, wherein the main negative curvature of the surface of the base region (330) is at least 1 / (1000 nm), preferably at least 1 / (500 nm), more preferably 1 / (100 nm) and most preferably at least 1 / (10 nm), but preferably at most the reciprocal of the height of the base region. Method according to one of the preceding claims, wherein the interaction position (410) of the particle beam is controlled in such a way that the base region (330) and / or the central region of the probe are generated layer by layer, the particle beam per layer being preferably substantially elliptical circular, surfaces (420) is controlled. Method according to the preceding claim, wherein at least one semi-axis of the elliptical surfaces (420) is a function of the height difference between the associated layer and the surface of the substrate (310), the function describing a section of an ellipse, in particular a circle. Method according to one of the preceding claims, wherein the particle beam-induced generation and / or processing of the probe tip (320) during the manufacture of the probe (300) for a determinable period of time, preferably for at most 1000 ms, more preferably for at most 500 ms and most preferably for is interrupted at least once for a maximum of 50 ms. The method of any preceding claim, further comprising the step of: Adjusting the particle beam before and / or during the manufacture of the probe (300) based on a particle-optical measurement of at least a part of the substrate (310) and / or the probe tip (320). Method according to the preceding claim, wherein the adjustment of the particle beam is based at least in part on at least one marking (720) made on the substrate (310), in particular deposited thereon. Method according to one of the preceding Claims 13 - 14 , wherein adjusting the particle beam comprises at least one of the following steps: a. Adjusting a focus position of the particle beam; b. Correcting a beam error of the particle beam; c. Correcting astigmatism of the particle beam; d. Adjusting the particle flow of the particle beam; e. Adjusting a beam aperture of the particle beam; and f. Adjusting the average kinetic energy of the particles of the particle beam. The method of any preceding claim, further comprising the step of: electrical discharge of the probe (300), preferably by interaction with ions from a plasma. Method for manufacturing probes for scanning probe microscopes comprising the following steps: a. Providing a first and at least a second substrate (535, 310); b. Generating a reference image of the first substrate (535, 310); c. Generating at least one object image of the at least second substrate (535, 310); d. Determining at least one transformation between the reference image and the at least one object image; and e. Particle beam-induced generation and / or processing of at least one probe tip (320) on the at least second substrate (535, 310) based on the at least one specific transformation. Procedure according to Claim 17 , further comprising the step of: f. Determining a height difference between the first and the at least second substrate (535, 310), preferably by means of a light-optical measuring method. Method according to one of the preceding Claims 17 - 18th , further comprising the step of: automatically adjusting a particle beam based on at least one particle-optical measurement of the first and / or the at least second substrate (535, 310). The method of the preceding claim, further comprising the step of: Generating at least one, preferably two, markings (720) on the first and / or at least second substrate (535, 310) in each case next to the probe tip (320). Method according to one of the preceding Claims 19 - 20th , wherein the automatic adjustment comprises an automatic adjustment of a focus and / or an automatic correction of an astigmatism of the particle beam. Method for producing a probe for a scanning probe microscope with the following steps: a. Constructing (1010, 1020, 1030) a probe tip design based on a plurality of selectable subunits (1110, 1120, 1130, 1140); b. Particle beam induced generation and / or processing of a probe tip (320) on a substrate (310) based at least in part on the constructed probe tip design. The method of the preceding claim, wherein constructing the probe tip design comprises setting at least one parameter of at least one of the selectable subunits (1110, 1120, 1130, 1140), the at least one parameter comprising at least one of the following: a. a geometric shape of the at least one selectable subunit; b. a dimension of the at least one selectable subunit; c. a curvature of a surface of the at least one selectable subunit; d. a slope of a surface of the at least one selectable subunit; e. a material of the at least one selectable subunit; and f. a density of the at least one selectable subunit. Method according to one of the preceding Claims 22 - 23 , wherein the plurality of selectable sub-units comprises at least one base area (1110), at least one whisker area (1130), at least one middle area (1120) and at least one cap (1140) of the probe tip design. Method according to one of the preceding Claims 22 - 24th further comprising: computer-aided checking whether the probe tip design can be produced by particle beam-induced generation on a substrate (310), the checking at least one boundary condition of the particle beam-induced generation and / or Editing and / or at least one consistency condition of the probe tip design is taken into account. Method according to one of the preceding Claims 22 - 25th , further comprising: controlling an interaction position (410) of a particle beam based on the constructed probe tip design. Method according to one of the preceding Claims 22 - 26 , wherein the subunits (1110, 1120, 1130, 1140) are each associated with at least one of the following parameters: a. a scope of the probe; b. a measurement method specific to the probe; c. a type of measurement object specific to the probe; d. a scanning microscope specific to the probe; and e. a type of substrate. Having a probe (300) for a scanning probe microscope: a. a substrate (310) and a probe tip (320) arranged on the substrate (310), b. wherein a side surface of a socket portion (330) of the probe tip (320) has a substantially negative curvature; and c. the probe (330) being made according to the method of any one of the preceding claims. Device for producing one or a plurality of probes for a scanning probe microscope comprising: a. Means for performing the method according to one of the Claims 1 - 27th ; and b. Means for executing a computer program. Computer program with instructions for carrying out a method according to one of the Claims 1 - 27th with the device Claim 29 .

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