DE102016124336A1 - Method and device for coating substrates - Google Patents

Abstract

The invention relates to methods and devices for coating substrates, in which two closure elements for regulating a particle flow are movably supported by a coating device in the direction of a substrate holding device and in each case a first position and a second position are movable, wherein the two closure elements a particle flow of prevent the coating device in the direction of the substrate holding device when both closure elements are arranged together in the respective first position or together in the respective second position.

Description

The invention relates to methods and devices for coating substrates, in particular for ensuring a homogeneous layer thickness distribution.

Many coating processes, such as magnetron sputtering or evaporation processes, require a conditioning time at the beginning of the coating until constant coating conditions are achieved. For many such processes, run-up times or times to shut down the process performance are beneficial. By utilizing such constant coating conditions, coating processes are advantageously carried out continuously, e.g. Tape or foil coatings. Individual substrates such as glass panes or carriers coated with substrates are also continuously coated by passing through the coating process in succession. The tape sections or substrates at the beginning and end of the coating are not yet properly or incompletely coated and so not usable.

For the interruption of coating processes, the use of closure elements such as shutters or diaphragms is known, which prevent the flow of particles to the substrate. The coating source can be conditioned with closed closure element at the beginning of a coating process or continue to operate in a pause. Such devices are particularly used in processes with long conditioning or lag times, or e.g. used on sensitive sensors with limited service life.

For large circular substrates, for example, the mirror or mirrors of reflector telescopes, a reflective coating must be achieved, which meets very high requirements for purity and reflection. For this purpose, the mirror is placed in a vacuum chamber in which the coating is applied by plasma process. In the case of very large diameters of the mirrors, either a relatively smaller coating device, for example a magnetron, is moved in a circular path relative to the substrate surface, or the mirror is set in a circular movement with respect to the coating device. The circular relative movement between the coating device and the substrate can thus be effected differently, either either by the fact that the coating device is at rest and the substrate is moved, or vice versa.

In the case of an arc-shaped relative movement between the coating device and the substrate, a coating zone inevitably results, at which the start of the coating and the leakage of the coating will overlap. A high quality coating is only possible in a limited, optimal parameter window and therefore requires constant coating conditions. If this overlapping coating zone is to be kept as small as possible, the quality of the plasma must be maintained over the 360 ° of the circular movement and released or shaded precisely at the overlapping zone.

The methods and devices described below make it possible to design the beginning and the end of a coating process in such a way that neither substrate-free areas nor the substrate are unintentionally coated. Parasitic coatings can be effectively prevented and, in particular in the case of substrate carriers or individual substrates, the coating of the non-coated back side can be prevented by scattered coating particles. In addition, the proposed methods and apparatus enable uninterrupted operation of a coater without relying on substrate transport. At any given time, the coating of substrates can be interrupted in a defined manner and restarted without leaving the coating specification. In the event of an unplanned interruption of the substrate transport, a coating zone can be rapidly screened when restarting the coating with the lowest possible coating error. The proposed methods and devices make it possible to completely homogeneously coat a bonded substrate surface at the beginning and end of the contour (ring, cylinder, torus, circular surface, closed band), without the overlap region being different from the other coating. Specifically, the proposed methods and apparatus allow the coating to begin from an already initiated uniform circular relative motion and terminate at 360 ° plus a transitional area. The beginning and the end of the coating in the overlap area complement each other exactly to the target layer thickness, which is achieved in the remaining area.

• • Erzeugen einer Relativbewegung zwischen Substrat und Beschichtungseinrichtung;
• • Bereitstellen eines Teilchenstroms mittels der Beschichtungseinrichtung;
• • Bereitstellen des ersten Verschlusselementes und des zweiten Verschlusselementes in jeweils einer ersten Position, in welcher das erste Verschlusselement und das zweite Verschlusselement die Beschichtungseinrichtung gegenüber dem Substrat abschirmen;
• • Bewegen des ersten Verschlusselements in eine zweite Position, wobei die Beschichtungseinrichtung während des Verlagerns gegenüber dem Substrat freigelegt wird;
• • Bewegen des zweiten Verschlusselements in eine zweite Position, wobei die Beschichtungseinrichtung während des Verlagerns gegenüber dem Substrat abgeschirmt wird; und
• • Bewegen des ersten Verschlusselementes und des zweiten Verschlusselementes in die jeweils erste Position.

Therefore, a method for operating a device for coating substrates, which has a coating device as well as a first closure element and a second closure element, is proposed. The method has the following:

• Generating a relative movement between the substrate and the coating device;
• Providing a particle stream by means of the coating device;
• Providing the first closure element and the second closure element in a respective first position, in which the first closure element and the second closure element shield the coating device relative to the substrate;
• Moving the first closure element to a second position, the coating device being exposed to the substrate during displacement;
• Moving the second closure element to a second position, the coating device being shielded from the substrate during displacement; and
• Moving the first closure element and the second closure element in the respective first position.

In other words, a method for coating substrates is proposed in which a relative movement with a relative speed is produced between at least one substrate and at least one coating device, in which a surface of the at least one substrate to be coated gradually forms a particle stream emanating from the coating device Coating material is exposed, wherein between the coating device and the substrate, two closure elements are provided, which are each independently movable between a first position and a second position back and forth to start coating a substrate of one of the two closure elements from its first position in his second position is moved, the end of the coating of a substrate, the other of the two closure elements is moved from its first position to its second position and after the end of the coating be ide closure elements are moved back together in their respective first position.

By virtue of the manner in which the closure elements are proposed to be moved back and forth between a first position and a second position each, the beginning and end of a coating can be designed so that the deposited layer has a uniform thickness. The method makes this possible both for translatory and for rotational relative movements between substrate and coating device. The relative movement between the substrate and the coating device can thus be, for example, a straight-line translation, as it takes place in so-called continuous systems. Alternatively, the relative movement between the substrate and the coating device can be a rotation about a spatially fixed axis of rotation, as used for example in the coating of circular substrates.

According to one embodiment, the closure elements are moved from the respective first position into the respective second position at a speed corresponding to the relative speed between the substrate and the coating device. In this case, the closure elements can be moved from the respective first position into the respective second position with a sense of direction which corresponds to the sense of direction of the relative movement of the substrate relative to the coating device, or the closure elements are moved from the respective first position to the respective second position with a sense of direction , which is opposite to the sense of direction of the relative movement of the substrate relative to the coating device. If the closure elements are moved from the respective first position into the respective second position with a sense of direction which corresponds to the sense of the relative movement of the substrate relative to the coating device, and the closure elements from the respective first position to the respective second position with a relative speed between Substrate and coating device moves corresponding speed, so the currently moving closure element is stationary relative to the substrate.

Furthermore, the proposed method can be configured such that, in addition to the two closure elements, a diaphragm or mask is provided between the coating device and the substrate in a stationary manner relative to the coating device, and ultimately limits a particle flow emanating from the coating device. This feature will be explained in more detail below with reference to the proposed device.

• • einen Rezipienten;
• • eine Beschichtungseinrichtung und eine Substrathalteeinrichtung; wobei
• o die Beschichtungseinrichtung und die Substrathalteeinrichtung in dem Rezipienten angeordnet sind; und wobei
• o die Beschichtungseinrichtung und die Substrathalteeinrichtung relativ zueinander beweglich gelagert sind;
• • zwei Verschlusselemente zur Regulierung eines Teilchenstroms von der Beschichtungseinrichtung in Richtung der Substrathalteeinrichtung, wobei
• o die zwei Verschlusselemente beweglich im Rezipienten gelagert sind; und
• • eine Antriebseinrichtung zum Bewegen der zwei Verschlusselemente; wobei
• o die zwei Verschlusselemente mittels der Antriebseinrichtung in jeweils eine erste Position und jeweils eine zweite Position bewegbar sind; und wobei
• o die zwei Verschlusselemente einen Teilchenstrom von der Beschichtungseinrichtung in Richtung der Substrathalteeinrichtung verhindernd zwischen der Beschichtungseinrichtung und dem Substrat angeordnet sind, wenn beide Verschlusselemente gemeinsam in der jeweils ersten Position oder gemeinsam in der jeweils zweiten Position angeordnet sind.

In addition, a device for coating substrates is proposed, which has the following:

• • a recipient;
• A coating device and a substrate holding device; in which
• o the coating device and the substrate holding device are arranged in the recipient; and where
• the coating device and the substrate holding device are mounted so as to be movable relative to one another;
• Two closure elements for regulating a particle flow from the coating device in the direction of the substrate holding device, wherein
• o the two closure elements are movably mounted in the recipient; and
• A drive device for moving the two closure elements; in which
• o the two closure elements are movable by means of the drive means in each case a first position and a respective second position; and where
• o the two closure elements are arranged a particle flow from the coating device in the direction of the substrate holding means between the coating device and the substrate, when both closure elements are arranged together in the respective first position or together in the respective second position.

In other words, a device for coating substrates is proposed, which comprises a recipient and a coating device and a substrate holding device, which are arranged in the recipient, wherein the coating device and the substrate holding device are movable relative to each other, and arranged between the coating device and substrate holding device two closure elements are each independently reciprocable between a first position and a second position, wherein the closure elements prevent a particle flow of a coating material from the coating device to the substrate when both are in their respective first position and when they are both are in their respective second position.

In one embodiment of the device, the coating device is arranged stationary in the recipient and the substrate holding device is movably mounted, i. The substrate holding device is designed to move a surface of the substrate to be coated past the coating device. In another embodiment of the device, the substrate holding device is arranged stationary in the recipient and the coating device is movably mounted, i. the coating device is designed to move across a surface of the substrate to be coated. In both cases, the relative movement between coating device and substrate thus produced achieves that a surface of the substrate to be coated is progressively exposed to the coating action of a particle stream of a coating material emanating from the coating device.

Furthermore, in the proposed device between the coating device and the substrate in addition to the two closure elements fixed to the coating device, a diaphragm or mask can be arranged, which can serve to limit an emanating from the coating device particle flow ultimally. This means that this additional mask defines the area in which a particle stream strikes the substrate, even if the area delimited by the two closure elements, in which a particle stream could strike the substrate, would actually be larger. For example, the area bounded by the shutter members may be rectangular. However, if in such a case additionally a mask is provided which has a mask opening in the form of a circle segment, the substrate is coated in this circular segment-shaped area.

According to one embodiment of the device, the two closure elements are pivotally mounted about the same pivot axis. This results in a particularly simple design, which may be advantageous in particular in connection with measures for cooling the closure elements, as will be explained below in detail with reference to exemplary embodiments.

Alternatively or additionally, it can be provided in the device that the two closure elements each have two opposite ends and are pivotally mounted at each of these two ends. This feature results in a particularly high torsional rigidity of the closure elements, in particular in very extensive coating devices, such as sputter magnetrons with a length of several meters, whereby deformation-induced errors can be avoided.

In a further embodiment of the device, the closure elements may each comprise at least one shaft, wherein at least one shaft of a closure element is designed as a hollow shaft and rotatably supported and at least one shaft of the other closure element is mounted concentrically and rotatably in the hollow shaft. This results in comparison to a separate storage of the waves of both closure elements, a simpler structure of the device, which also has particular advantages in terms of a possibly desired cooling of the closure elements further advantages, as will also be explained in detail below with reference to embodiments.

It can further be provided that the at least one shaft of the other closure element is also designed as a hollow shaft. This means that an outer hollow shaft forms the bearing for an inner hollow shaft, which in turn offers advantageous applications. This feature is also particular in view of a possibly desirable cooling of the closure elements advantageous because a hollow shaft can basically be used simultaneously for the supply or removal of coolant.

According to further embodiments of the proposed device, at least one hollow shaft for introducing coolant into at least one coolant channel extending in the interior of a closure element and / or for discharging coolant from the coolant channel. It can further be provided that a lance tube is arranged in at least one hollow shaft and coolant is introduced through the hollow shaft and discharged through the lance tube or vice versa.

Finally, it can be provided in the proposed device that opposite ends of a closure element or arranged at opposite ends of a closure element shafts are operatively connected to a common drive means. It can thereby be achieved that the drive device acts on both ends of a closure element, whereby undesired twisting of the closure element can be prevented.

• 1-9 ein erstes Ausführungsbeispiel einer Vorrichtung zum translatorischen Transport von Substrate tragenden Carriern an einer Beschichtungseinrichtung vorbei,
• 10-21 ein zweites Ausführungsbeispiel einer Vorrichtung zum rotatorischen Transport eines kreisrunden Substrats, bei der eine zu beschichtende Oberfläche des Substrats nach und nach durch eine feststehende Beschichtungseinrichtung beschichtet wird, und
• 22-24 drei verschiedene Ansichten einer beispielhaften Anordnung einer Beschichtungseinrichtung und zweier Verschlusselemente in einer vorgeschlagenen Vorrichtung.

Embodiments of the proposed device will be explained in more detail with reference to drawing figures. Show

• 1 - 9 a first embodiment of a device for the translational transport of substrates carrying carriers past a coating device,
• 10 - 21 a second embodiment of a device for rotational transport of a circular substrate, wherein a surface of the substrate to be coated is coated gradually by a fixed coating device, and
• 22 - 24 three different views of an exemplary arrangement of a coating device and two closure elements in a proposed device.

The 1 to 9 show a device for coating substrates such as semiconductor wafers or the like, in which in a recipient 1 a coating device 2 , For example, an evaporator crucible, is arranged stationary. The coating device 2 generates a particle stream 3 a coating material. This is directed to a (not shown here) substrate holding device, such as a roller conveyor, the one or an array of carriers 6 , ie substrate holders, each having a matrix-like arrangement of substrates 5 hold in a substrate plane and in a transport direction (relative movement 7 opposite the coating device 2 ) by the recipient 1 move. The substrate 5 and the coating device 2 thus move relative to each other. Alternatively, the coating device 2 straight across the carrier 6 with the substrates 5 be moved away while the carrier 6 stationary.

Between the coating device 2 and the substrates 5 are arranged two independently movable closure elements 8,9, wherein hereinafter the closure elements 8,9 a resting reference system of the coating device 2 be assigned.

A conditioning process of the coating device 2 takes place with closed closure elements 8,9, the closure elements 8,9, are on the entry side of the carrier 6 positioned in the process space, ie on the left, ie both closure elements 8.9 are in their respective first position. Carrier 6 are formed into a carrier belt and move into the coating chamber of the recipient 1 into it.

The movements of the closure elements 8, 9 between their respective first and second positions have a component in the transport direction 7 the substrates 5 on. In the exemplary embodiment shown, the closure elements 8, 9 move parallel to the substrate plane in the transport direction 7 from the first to the second position and, conversely, from the second to the first position. Through the opening edge of a closure element 8,9 a shadow edge of the vapor stream is generated on the substrate. The movement of the shadow edge can be seen as a projection of the opening edge on the substrate 5 from the coating device 2 out.

The first closure element 8th opens in the transport direction 7 ie from left to right to its second position. Its shadow edge moves synchronously with the first row of on the carrier 6 arranged substrates 5 , As a result, an undesired coating of the substrate rear side and the space behind the substrate plane is prevented. Since the closure elements 8, 9 are not located in the substrate plane, the speed of the closure elements 8, 9 must be adapted to the corresponding angular relationships following the substrate speed. There must be no dummies in front of the carrier 6 with the substrates to be coated 5 be driven. The first closure element 8th remains in the open state, ie in its second position, as long as a closed substrate strip is present.

Once the substrate end of the last carrier 6 the shadow edge of the second closure element 9 reached, the second closure element follows 9 of the last row of substrates on the carrier 6 with appropriately adjusted speed, until the second closure element 9 arrived in its second position and thus the coating window is closed. The process space can be further conditioned during this time. To re-substrates 5 To coat, both fasteners 8,9 together again on the entrance side of the carrier 6 positioned in the process space, ie in their respective first position. Then a new coating can begin.

The correct interaction of these shadow edges thus formed enables the solutions of the problems described above:

Start and stop of a carrier coating

The opening edges of both closing elements 8, 9 are located on the inlet side of the coating window closed in this way, ie on the left. The speed of the shadow edge of the first shutter element 8th is adjusted by adjusting the speed of movement of the first closure element 8th adjusted to the speed of the carrier 6 equivalent. The actual movement of the first closure element 8th may be an adapted parallel movement to the substrate movement or a pivoting movement with a pivot arm about a suitable pivot axis. The movements of both closure elements 8, 9 differ in this particular embodiment in order to realize a suitable movement of the shadow edge, since the opening edges of the closure elements 8, 9 are chamfered so that they overlap in the closed state, and therefore in different planes to the substrate 5 lie.

At the beginning of the coating, ie when the leading edge of the carrier 6 in the sphere of action of the coating device 2 enters, is the left, ie located in its first position first closure element 8th at the same speed as the carrier 6 moved from left to right, leaving the shadow edge of the first shutter element 8th with the leading edge of the incoming carrier 6 moved synchronously until the first closure element 9 has arrived in its second position, ie until full opening of the coating window formed between the closure elements 8,9. The second closure element 9 remains in its first position during this process, ie left. This process is in the 1 to 3 shown.

4 and 5 show how the carrier 6 then move across the fully opened coating window until the trailing edge of the carrier 6 the shadow edge of the second closure element located in its first position 9 reached.

The 6 and 7 show how from this point on the shadow edge of the second closure element 9 synchronous, ie at the same speed as the rear edge of the carrier 6 , is moved from left to right to the second position until the second closure element 9 completely closes the coating window. This is the coating process for that of this carrier 6 held substrates 5 completed and the carrier 6 gets out of the recipient 1 away.

To realize the initial state for a restart, both closing elements 8, 9, the opening edges of which overlap, are moved back together from their respective second position on the right side to their first position on the left side. This process is in 8th shown, and then, like 9 shows another carrier 6 with substrates to be coated 5 in the same way as with reference to the 1 to 8th described on the coating device 2 to be moved over.

Sudden stop of a coating and restart

If a sudden stop of the coating is required, the first closure element becomes 8th with the highest possible speed of its shadow edge against the substrate transport direction 7 closed, ie moved back to its first position, while the substrate transport stopped. In this case, the coating window on the incoming side of the substrate 5 (left) last closed, ie both closure elements 8.9 are in their respective first position. For a restart at exactly the same substrate position, the opening edges of both closing elements 8, 9 are positioned in the respective second position, ie on the outgoing side of the substrate movement (right), ie both closing elements 8, 9 are moved together into their respective second position. In the case of continued operation of the coating device 2 If the closing elements 8, 9 should advantageously overlap so that there is no coating of the stationary substrate 5 he follows. Upon a restart, the first shutter element is now simultaneously with the start of the substrate transport 8th to the left, to the incoming side of the substrate 5 , against the substrate transport direction 7 opened, that is, moved from the second position to its first position, the speed of its shadow edge corresponds to that of the previous closing.

The 10 to 21 show a device for coating a circular substrate 5 such as a mirror for a reflecting telescope or the like, in which a (here not shown) 1 a (not shown here) coating device, for example, a sputtering magnetron, is arranged. The coating device generates a particle stream of a coating material. This is directed to a (not shown here) substrate holding device, which is the substrate 5 holds. The coating device and the surface of the substrate to be coated 5 move relative to each other in the form of a circular path, for example by the substrate 5 stands still and the coating device is moved over it. Alternatively, the substrate 5 For example, be arranged on a turntable, which is the substrate 5 set in a rotational movement while the coating device is stationary.

In the area of the coating device, two independently movable closure elements 8, 9 are arranged, and the coating device, together with the closure elements 8, 9, moves uniformly and at a constant speed over the substrate in a circular manner 5 time. First, the plasma 4 assembled, while both closure elements 8,9 are in their respective first position and thus the particle flow from the coating device to the substrate 5 prevent, ie shadow the coating device against the surface to be coated. The coating of the substrate 5 begins when the coating device by movement of the first closure element 8th is released from its first to its second position.

In this case, in the embodiment shown, the front in the direction of movement of the coating device closing element is moved first, thereby by definition the first closure element 8th whereby, at the beginning of the coating, a region with a layer thickness gradient of increasing layer thickness is obtained, which at the end of the coating is overlapped by a region with a layer thickness gradient of decreasing layer thickness, so that, as a result, the overlap region has a constant layer thickness which corresponds to the layer thickness between the beginning - and end area is identical.

This means that in the case of the longest possible transition region (if possible, no local deviations) in the relative direction of movement of the coating device front closure element (which in this case as the first closure element 8th is defined) moved first from its first to its second position and after a rotation of the substrate 5 the coating opening is closed by that in the relative direction of movement of the coating device rear closure element (which in this case as the second closure element 9 is defined) is moved from its first to its second position.

If, on the other hand, the smallest possible transition area (narrow area in which deviations are still tolerable, or limited range of rotation) is aimed for between the beginning and the end of the coating, (as in the exemplary embodiment of FIG 1 to 9 shown) in the relative direction of movement of the coating device rear closure element (which is defined in this case as the first closure element) first moves from its first to its second position, and after a rotation of the substrate 5 closing the coating opening by moving the closure element (which is defined as the second closure element in this case) in the direction of movement of the coating device from its first to its second position.

In the 10 to 21 this is between the coating device and the substrate 5 in its coordinate system in plan view (ie, although the coating device on a stationary substrate 5 moved, the situation after the drawing figures seems to be opposite). By way of example, equidistant movement steps and the associated coating sections are shown. In the overlap area, the coating sections passing through the first closure element 8th be released, after one revolution exactly through the second closure element 9 covered. After a nominal 360 ° movement angle, the second closure element is used 9 the plasma is hidden.

The coating device is moved relative to the substrate so that the surface to be coated moves past the coating device shielded by the closure elements 8, 9. The coating device is conditioned. The relative speed between coating device and substrate 5 is set for the coating and at a certain substrate position (eg at a certain angle of rotation) becomes a first closure element 8th opened, wherein advantageously the opening speed of its shadow edge can be set or detected accurately. This opening speed does not have to be constant and can have any course according to the circumstances.

Until the complete opening of the coating window, in addition by a between the closure elements 8,9 and the substrate 5 arranged, ie near the substrate fixed aperture can have defined shape and dimensions (in the case of a circular substrate 5 for example in shape a circle segment or annulus segment), the substrate moves 5 relative to the coating device on the coating window over. Such a diaphragm ultimately defines the shape and size of the effective coating window in relation to the area delimited by the closure elements 8, 9. Reaches the initially coated area of the surface of the substrate to be coated 5 again the coating window, so now the other, ie the second closure element 9 moved to its second position and thus closed the coating window, wherein the shadow edge of the second closure element 9 is closed at the same speed with which the coating window at the beginning by movement of the first closure element 8th opened from the first to the second position. Errors and tolerances during the opening and closing process are less pronounced when this overlap area extends over a wide substrate area. It is also possible to perform several additional complete coating runs between opening and closing. Also, the transition region may, if permissible, comprise multiple substrate cycles.

The 22 to 24 show three different views of a coating device 2 with two closure elements 8,9, wherein the 22 and 23 are relatively highly schematized to explain the underlying principle, and 24 a very concrete exemplary execution shows.

In the area of a coating device 2 For example, two shutter members 8, 9 are arranged to be one of the coating apparatus 2 selectively generate or impede generated and emitted particle flow. In the exemplary embodiment, the coating device 2 a sputtering magnetron comprising a so-called target of coating material. In operation of the coating device 2 a plasma 4 is generated in front of this target, whose ions bombard the target and thus beat particles of the coating material out of the target, which subsequently move as a particle flow in the direction of a substrate arranged in front of the target and deposit on the side of the substrate facing the target.

The two closure elements 8,9 have at each of its two ends holder 10 which, in turn, are secured to shafts 12, 13, which are mounted concentrically about a common pivot axis about which the closure elements 8, 9 can be pivoted back and forth between a respective first position and a second position. In this case, the shafts 12, 13 are each designed as hollow shafts, wherein each closure element 8, 9 is a hollow shaft of larger diameter 12 and a hollow shaft of smaller diameter 13 having. The respective shaft of larger diameter 12 is rotatably mounted stationary. In this hollow shaft of larger diameter 12 of a closure element 8.9 is the hollow shaft of smaller diameter 13 of the other closure element 8,9 rotatably mounted.

The two closure elements 8,9 have coolant channels in their interior 11 on. These coolant channels 11 are in communicating connection with a smaller diameter in the hollow shaft 13 arranged lance tube 14 , which serves the supply of coolant, and that between the lance tube 14 and the inner wall of the hollow shaft of smaller diameter 13 formed cavity which serves to dissipate the coolant. Each closure element 8,9 is therefore supplied with coolant from one of its two ends, and at this end the coolant is also discharged.

The ends of both hollow shafts 12, 13 of each closure element 8, 9 are each provided with a drive device 15 in operative connection, so that each closure element 8, 9 is movable independently of the other closure element 8, 9 between a first position and a second position, wherein each of the two drive devices 15 each uniformly act on both ends of the associated closure element 8,9, so that twisting of the closure element 8,9 are avoided.

LIST OF REFERENCE NUMBERS

1

recipient

2

coater

3

particle

4

plasma

5

substratum

6

Carrier

7

relative movement

8th

First closure element

9

Second closure element

10

holder

11

Coolant channel

12

Hollow shaft of larger diameter

13

Hollow shaft of smaller diameter

14

lance tube

15

driving means

Claims (18)

Method for operating a device for coating substrates (5), which has a coating device (2) as well as a first closure element (8) and a second closure element (9), the method comprising: Generating a relative movement between substrate (5) and coating device (2); Providing a particle stream (3) by means of the coating device (2); Providing the first closure element (8) and the second closure element (9) in each case in a first position, in which the first closure element (8) and the second closure element (9) shield the coating device (2) from the substrate (5); Moving the first closure element (8) to a second position, wherein the coating device (2) is exposed to the substrate (5) during the displacement; Moving the second closure element (9) to a second position, wherein the coating device (2) is shielded from the substrate (5) during the movement; and • Moving the first closure element (8) and the second closure element (9) in the respective first position. Method according to Claim 1 in which the closure elements (8, 9) are moved from the respective first position into the respective second position at a speed corresponding to the relative speed between the substrate (5) and the coating device (2). Method according to Claim 1 or 2 in which the closure elements (8, 9) are moved from the respective first position into the respective second position with a sense of direction which corresponds to the sense of direction of the relative movement (7) of the substrate (5) relative to the coating device (2). Method according to Claim 1 or 2 in which the closure elements (8, 9) are moved from the respective first position into the respective second position with a sense of direction which is opposite to the sense of direction of the relative movement of the substrate (5) relative to the coating device (2). Method according to one of Claims 1 to 4 in which the relative movement (7) between substrate (5) and coating device (2) is a straight-line translation. Method according to one of Claims 1 to 4 in which the relative movement (7) between substrate (5) and coating device (2) is a rotation about a spatially fixed axis of rotation. Method according to one of Claims 1 to 6 in which an aperture is provided between the coating device (2) and the substrate (5) in addition to the two closure elements (8, 9) fixed relative to the coating device (2). Device for coating substrates (5), comprising: • a recipient (1); A coating device (2) and a substrate holding device; in which o the coating device (2) and the substrate holding device are arranged in the recipient (1); and where o the coating device (2) and the substrate holding device are mounted so as to be movable relative to one another; Two closure elements (8,9) for regulating a particle flow (3) from the coating device (2) in the direction of the substrate holding device, wherein o the two closure elements (8,9) are movably mounted in the recipient (1); and • at least one drive device (15) for moving the two closure elements (8, 9); in which the two closure elements (8, 9) can be moved by means of the at least one drive device (15) into a respective first position and in each case a second position; and where o the two closure elements (8,9) a particle flow (3) of the coating device (2) in the direction of the substrate holding means are arranged between the coating device (2) and the substrate (5), when both closure elements (8,9) together in the first position or are arranged together in the respective second position. Device after Claim 8 in which the coating device (2) in the recipient (1) is arranged stationary and the substrate holding device is movably mounted. Device after Claim 8 in which the substrate holding device is arranged stationarily in the recipient (1) and the coating device (2) is movably mounted. Device according to one of Claims 8 to 10 in which a diaphragm is arranged between the coating device (2) and the substrate (5) in addition to the two closure elements (8, 9) fixed relative to the coating device (2). Device according to one of Claims 8 to 11 in which the two closure elements (8,9) are pivotally mounted about the same pivot axis. Device according to one of Claims 8 to 12 in which the two closure elements (8,9) each having two opposite ends and are pivotally mounted at each of these two ends. Device according to one of Claims 8 to 13 in which the closure elements (8, 9) each have at least one shaft (12, 13), at least one shaft (12, 13) of a closure element (8, 9) is designed as a hollow shaft and rotatably supported, and at least one shaft (12, 13) of the other closure element (8,9) is mounted concentrically and rotatably in the hollow shaft. Device after Claim 14 in which the at least one shaft (12, 13) of the other closure element (8, 9) is likewise designed as a hollow shaft. Device after Claim 14 or 15 in which at least one hollow shaft (12, 13) for introducing coolant into at least one coolant channel (11) running inside a closure element (8, 9) and / or for discharging coolant from the coolant channel (11) is formed. Device after Claim 16 in which a lance tube (14) is arranged in at least one hollow shaft (12, 13) and coolant is introduced through the hollow shaft (12, 13) and discharged through the lance tube (14) or vice versa. Device according to one of Claims 8 to 17 in that opposite ends of a closure element (8, 9) or shafts (12, 13) arranged at opposite ends of a closure element (8, 9) are operatively connected to a common drive device (15).

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