DE102015117449A1 - Processing arrangement and method - Google Patents

Abstract

According to various embodiments, a processing assembly (100a, 100b, 200) may include: a wall member (112w, 212w) for closing a vacuum chamber opening, the wall member (112w, 212w) having a mounting region (112b) adapted for mounting a processing source (102 ) of a first processing source type (102a) or a second processing source type (102b) is established on the wall element (112w, 212w); a connection terminal (104) having a plurality of ports for providing a plurality of different types of media; wherein the first processing source type (102a) and the second processing source type (102b) differ in at least one type of media used for operation; a redistribution arrangement (106) coupled to the connection terminal (104) and configured: in a first configuration (1200a), a first selection from the plurality of ports according to the type of media used to operate the first processing source type (102a) with the processing source (102) when attached to the mounting region (112b) and being the first processing source type (102a); and in a second configuration (1200b), coupling a second selection among the plurality of ports according to the type of media used to operate the second processing source type (102b) with the processing source (102) when attached to the mounting area (112b) and the second processing source type (102b).

Description

The invention relates to a processing arrangement and a method.

In general, substrates such as a glass substrate, a metal tape and / or a semiconductor substrate may be processed (treated), e.g. machined, coated, heated, etched and / or structurally altered. For example, a substrate may be provided with a functional layer (eg, a layer that can alter the electrical and / or optical properties of the substrate) or with a decorative layer so that the chemical and / or physical properties of the substrate may be altered or so that, for example, electronic components can be formed on the substrate. For processing of a substrate, various processing sources can be used. For example, a coating apparatus can be used to deposit one or more layers on a substrate or on a plurality of substrates by means of chemical and / or physical vapor deposition. For example, a heater (heating unit) can be used to bring a substrate to a predefined temperature and / or to maintain it at the temperature.

In order to efficiently realize a large-area processing on correspondingly large-area substrates or correspondingly many substrates parallel to one another, a so-called in-line system can be used in which one or more substrates are transported through the entire system, for example In-line system can be carried out in one or more processing sections of the in-line system processing of the substrate or the plurality of substrates.

Each of these processing sections may have a lid to which the processing technique used for processing is attached. Conventionally, a plant is equipped with the required process technology during its construction, setup and configuration, so that the process sequence carried out therein - once defined - is no longer changed. A change in the configuration afterwards is conventionally not provided or readily possible, e.g. because the number of processing sections or their design is determined by the structure of the plant, which makes adding more processes or changing them difficult.

The choice of process technology, such as Magnetrons, heater and cooling units determine the type and design of the lid. In other words, specially made lids are used for the process technology used. In systems with horizontal substrate transport, it is additionally distinguished which side of the substrate is to be coated. Accordingly, the intended mounting of the lids, which are mounted either from below or from above, determines their design. The covers are then removed to operate the system only for the maintenance of the process technology and the replacement of defective process technology.

According to various embodiments, it has been recognized that the conventional design of the lids allows only limited flexibility as they are specifically adapted to the process technology interfaces such as coolant, process gas, process electrical power, process technology mounts, and environmental component mounts. In other words, their flexibility is limited because the lid is configured only for the respective process engineering required assemblies. A change in the process sequence therefore requires additional conversion work in and outside the process section, which is often hampered by the limited space of the installation of the plant. Conventionally, the limited flexibility and the associated effort are accepted, since a change in the process sequence is rarely required.

In various embodiments, it has been appreciated that increasing flexibility in the configuration of the plant offers economic and technological advantages, e.g. in modular vacuum coating systems. Higher flexibility avoids complex remodeling and is limited to the lid when required. According to various embodiments, a conversion of the process technology can be carried out quickly and cost-efficiently. Alternatively or additionally, a plant can largely be preconfigured without having to take into account the specific process sequence. Thus, a cost-effective retrofitting of a system can be done even after the fact and it saves storage costs.

According to various embodiments, a processing arrangement and method are provided which vividly provide high flexibility in the configuration of the plant. Clearly, a section lid (lid) is provided, which is preconfigured for operation with several different process techniques. For example, all assemblies needed to operate the multiple different process techniques from each other are attached directly to the lid and / or all for operating the plurality of each other various process techniques used media types provided by the lid.

According to various embodiments, a processing assembly may include: a wall member for closing a vacuum chamber opening, the wall member having a mounting portion adapted for mounting a processing source of a first processing source type or a second processing source type on the wall member; a connection terminal (also referred to as a first connection terminal) having a plurality of terminals (a plurality of first terminals) for providing a plurality of different types of media; wherein the first processing source type and the second processing source type differ in at least one type of media used for operation (the plurality of different media types) (also referred to as at least one difference media type); a redistribution arrangement coupled to the connection terminal and configured to: in a first configuration, couple a first selection from the plurality of ports (first port selection) with the processing source according to the type of media used to operate the first processing source type, if at the attachment area is attached and is the first processing source type; and in a second configuration, coupling a second selection from the plurality of ports (second port selection) to the processing source according to the type of media used to operate the second processing source type when attached to the attachment area and the second processing source type.

Each type of media of the plurality of different types of media may have a characteristic size that distinguishes it from the other media types of the plurality of different media types, e.g. an electrical quantity (e.g., an electric voltage, an electric current, an electric power, a frequency, etc.), or a substance size (e.g., a mass flow, a chemical composition, a temperature, a pressure, etc.).

For example, a first selection of the plurality of different media types (first media type selection) for operating the first processing source type and a second selection of the plurality of different media types (second media type selection) for operating the second processing source type in at least one type of media ( ie the at least one difference media type). For example, the first media type selection and the second media type selection may differ in at least one of: the use of the at least one media type (ie, the difference of the first media type selection and the second media type selection may have the at least one difference media type), a number of media types ( for example, the first media type selection may also be a subset of the second media type selection or vice versa); a value of the characteristic size of the at least one media type (i.e., the at least one difference media type).

The redistribution arrangement may be configured in the first configuration to couple the first port selection according to the first media type selection with the processing source when attached to the attachment area and being the first processing source type; and in the second configuration, coupling the second port selection according to the second media type selection to the processing source when attached to the attachment area and the second processing source type.

According to various embodiments, the first selection of the plurality of ports may include a port of a first media type (first media type port); and the second selection of the plurality of ports comprises a port of a second media type (second media type port). The first type of media may be used to operate the first type of processing source and the second type of media may be used to operate the second type of processing source and may be different from the first type of media. The at least one difference type of media may, for example, include or be formed from the first type of media and / or the second type of media.

According to various embodiments, the first selection of the plurality of terminals and the second selection of the plurality of terminals may differ by at least one port of the at least one media type (ie, the at least one difference media type) by which the first processing source type and the second Differentiate processing source type for operation.

According to various embodiments, the attachment region may include at least one through-hole (i.e., one or more through-holes).

According to various embodiments, the redistribution arrangement may include: a first redistribution element according to the types of media used to operate the first type of processing source; a second redistribution element according to the type of media used to operate the second type of processing source; and a coupling region (first coupling region) to Coupling the first redistribution element or the second redistribution element between the termination terminal and the processing source (when attached to the attachment area); wherein the redistribution arrangement is in the first configuration when the first redistribution element is coupled into the infeed region, and wherein the redistribution arrangement is in the second configuration when the second redistribution element is coupled into the infeed region.

According to various embodiments, the attachment region may comprise at least one of: at least one through-hole for providing a fluid passage, at least one through-hole for providing an electrical feedthrough; at least one passage opening for providing a gas feedthrough; at least one through-hole for providing a drive bushing; at least one through-hole for providing a signal feedthrough (e.g., electrical, hydraulic, pneumatic and / or optical communication signal). By way of example, the signal feedthrough for transmitting optical signals may comprise or be formed from an optical waveguide.

According to various embodiments, one or more through openings of the attachment area may be electrically and / or thermally insulated.

According to various embodiments, a through-hole may be arranged to provide multiple feedthroughs, i. be visibly large enough to accommodate multiple bushings. In other words, a through-hole may be arranged for providing a plurality of media feedthroughs.

According to various embodiments, the redistribution assembly may include a cover member configured to provide a passageway for more than one medium (multiple media feedthroughs) through a through opening of the mounting area. The cover member may be configured to provide, in the first configuration, a first selection from the feedthroughs according to the type of media used to operate the first processing source type through a through opening of the mounting area; and in the second configuration, providing a second selection from the feedthroughs according to the type of media used to operate the second processing source type through the through hole of the mounting area. Illustratively, the redistribution arrangement may comprise a set of cover elements with the respective media passages, which can be inserted into the passage openings of the attachment area in a respective configuration.

Illustratively, the first configuration may define a first redistribution characteristic, and the second configuration may define a second redistribution characteristic. The first redistribution characteristic and the second redistribution characteristic may differ in at least one media type (e.g., the at least one difference media type), a number of redistributed media types, and / or the characteristic size of the at least one media type (e.g., the at least one difference media type).

According to various embodiments, the port terminal may provide at least the following types of media (in other words, the port terminal may have multiple ports for providing the following media types): at least one liquid media type (in other words, a fluid); an electric power; at least one gaseous type of media (in other words, a gas); a communication signal. For example, the connection terminal may be configured to have or include a corresponding (external) media type supply, e.g. a fluid supply; a communication signal supply; an electric power supply; a gas supply.

According to various embodiments, the communication signal may include or be formed from an electrical communication signal, a hydraulic communication signal, a pneumatic communication signal, and / or an optical communication signal. The communication signal supply may be configured to transmit an electrical communication signal, a hydraulic communication signal, a pneumatic communication signal, and / or an optical communication signal.

The liquid media type may include or be formed from one or more liquid heat transfer media types (illustratively, heat transfer fluid), e.g. a cooling fluid and / or a heating fluid. For example, the plurality of liquid heat transfer media types may differ in at least one temperature. Illustratively, for example, different temperature water circuits can be provided or. The plurality of ports may include at least one port for each liquid heat transfer media type of the plurality of liquid heat transfer media types.

The fluid supply may be configured to provide a supply of a liquid. The electrical power supply may be configured to provide a supply of electrical power (illustratively, several kilowatts). The gas supply may be configured to provide a supply of the gas (eg, an inert gas, a reactive gas, a gas mixture, a heat transfer gas, a purge gas, a precursor gas, and / or a working gas).

The heat transfer gas may include or be formed from one or more gaseous heat transfer media types, e.g. a cooling gas and / or a heating gas. For example, the plurality of gaseous heat transfer media types may differ in at least one temperature. Illustratively, for example, differently tempered gas circuits can be or will be provided. The plurality of ports may include at least one port for each gaseous heat transfer media type of the plurality of gaseous heat transfer media types.

According to various embodiments, a heat transfer fluid and / or a heat transfer gas for transmitting thermal energy to a processing source may be configured (illustratively for heating) and / or may be configured for transferring thermal energy away from a processing source (illustratively for cooling). The inert gas may e.g. a noble gas and / or nitrogen or have formed from it. The reactive gas may e.g. Have hydrogen, oxygen, water vapor, chlorine, ammonia and / or nitrogen or be formed therefrom. The nitrogen can be used to react e.g. be activated by means of a plasma source. The purge gas may include or be formed from gas having a predefined composition and / or a predefined purity, e.g. an easily pumped gas such as argon. A working gas may or may not be defined by the particular process and may be e.g. have or be formed from a noble gas. A precursor gas may e.g. a complex molecule, a halide, a boride, a chloride and / or a carbon-containing molecule or be formed therefrom.

The gas may, according to various embodiments, comprise at least one of the following gaseous media types: an inert gas; a reactive gas; a gas mixture; a purge gas; a heat transfer gas; a precursor gas; a working gas. In other words, the plurality of different media types may further comprise at least one of the following types of media: an inert gas; a heat transfer gas; a reactive gas; a gas mixture; a purge gas; a precursor gas; a working gas.

According to various embodiments, the terminal may provide at least one of the following gaseous media types (and / or may be configured to connect to a corresponding media type supply): an inert gas (or an inert gas supply); a heat transfer gas (or a heat transfer gas supply); a reactive gas (or a reactive gas supply); a gas mixture (or gas mixture supply); a purge gas (or purge gas supply); a precursor orgasm (or a precursor gas supply); a working gas (or a working gas supply).

According to various embodiments, the connection terminal may provide (or be configured to connect to) a corresponding media type supply with at least one of the following types of electrical media: a low voltage electrical supply (or a low voltage electrical supply, for example); for electrically supplying a control unit; a low voltage electrical supply (or a low voltage electrical supply, respectively); an electrical high voltage (or a high voltage electrical supply). The high voltage electrical supply may be configured to provide a supply of high voltage electrical power.

According to various embodiments, the processing arrangement may further comprise a control unit which in at least the first configuration and / or the second configuration is connected between the connection terminal (eg its communication signal terminal) and the processing source when the processing source is attached to the attachment area process the electrical communication signals and control the processing source (eg, attached to the mounting area) based on the electrical communication signals.

According to various embodiments, the processing arrangement may further comprise the processing source, which is a first processing source type or a second processing source type. Optionally, the first processing source type may be different from the second processing source type.

According to various embodiments, the first processing source type and / or the second processing source type may be one of the following processing source types: a coating device (coating type); a cooling device (cooling type); a heater (heater type); an implantation device (implantation type); a cleaning device (cleaning type); an etching device (etching type); a gas separation device (gas separation type); an evacuation device (evacuation type).

Further, according to various embodiments, the processing arrangement may at least a cantilever beam (ie, one or more cantilever beams) extending away from the wall member for supporting a processing source attached to the attachment portion, respectively.

According to various embodiments, the processing assembly (e.g., the attachment portion and / or the cantilever beam) may include at least one attachment member configured to secure the first processing source type and the second processing source type.

According to various embodiments, each type of processing source may include at least one mating fastener (e.g., each configured the same) that may be connected to the fastener of the processing assembly. For example, a standardized fastener may be provided on the cantilever, to which any type of processing source can be mounted. For example, the fastener is arranged to accommodate any type of processing source without being modified.

According to various embodiments, the processing assembly may include a mounting structure having a plurality of fasteners (e.g., holes, threads, bolts, screws, hooks, eyelets), e.g. provided on a cantilever and / or on a mounting area. For example, the attachment structure may be an integral part of the conversion element.

According to various embodiments, the redistribution arrangement may extend (at least partially) into the at least one cantilever beam.

According to various embodiments, the processing arrangement may further comprise a further connection terminal (second connection terminal) having a plurality of further terminals for providing at least a part (i.e., a part or all) of the plurality of different types of media; the wall element having a further attachment area (second attachment area) which is set equal to the attachment area (first attachment area) (e.g., at a plane therebetween, e.g., lying in the transport area, mirrored); wherein the redistribution arrangement is arranged to be uncoupled from the connection terminal and to be coupled to the further connection terminal and further configured: in a further first configuration, the first selection from at least a part of the plurality of further connections (ie from a part of the several further connections or from the plurality of further terminals), according to the type of media used to operate the first type of processing source, to couple with the processing source when attached to the further mounting area and being the first type of processing source; and in a further second configuration, coupling the second selection from at least a portion of the plurality of further ports (ie, from a portion of the plurality of further ports or from the plurality of further ports) to the processing source in accordance with the type of media used to operate the second processing source type; if it is attached to the other attachment area and the second processing source type.

According to various embodiments, at least a first media type (first common media type) of the media types used to operate the first processing source type in the further first configuration and / or a second media type (second common media type) may be those used to operate the second processing source type Media types are provided in the further second configuration by means of the first connection terminal or be. Then, in the further first configuration, the redistribution arrangement may be configured to couple a port of the plurality of ports according to the first common media type with the processing source when attached to the further attachment area and being the first processing source type; and / or in the further second configuration to couple a port of the plurality of ports according to the second common media type with the processing source when attached to the further attachment area and the second processing source type. For example, the first common media type and the second common media type may be the same media type. The redistribution arrangement may then optionally include an internal manifold which distributes the first common media type and / or the second common media type between the mounting area and the further mounting area.

Illustratively, the further first configuration may be similar to or similar to the first configuration, except that the redistribution arrangement is at least partially coupled between the further connection terminal and the processing source attached to the further attachment region. Illustratively, the further second configuration may be similar to or identical to the second configuration, except that the redistribution arrangement is at least partially coupled between the further connection terminal and the processing source attached to the further attachment region.

In other words, the redistribution arrangement can be set up such that it can be connected between the first connection terminal and the first connection terminal second connection terminal can be exchanged, so that the processing source can be operated at both attachment areas, without the redistribution arrangement must be reconfigured. For this purpose, the connection terminal can be set up equal to the other connection terminal.

According to various embodiments, the processing arrangement may further comprise a further redistribution arrangement (second redistribution arrangement); wherein the further redistribution arrangement is arranged for coupling to the connection terminal or to the further connection terminal and is arranged to be brought into the first, second, further first or further second configuration. The further redistribution arrangement can be set up equal to the redistribution arrangement.

Analogously, the processing arrangement may comprise a further processing source (second processing source) of the first processing source type or of the second processing source type, which may or may be attached to the attachment area or to the further attachment area. The processing source (first processing source) and the second processing source may be the same or different.

Alternatively, the processing source and / or the second processing source may also be a third processing source type, wherein the third processing source type and the first processing source type differ in at least one other type of media used for operation and / or wherein the third processing source type and the second processing source type differ in at least one other type of media used for operation or the other media type.

The redistribution arrangement (first redistribution arrangement) and / or the further redistribution arrangement (second redistribution arrangement) can be set up in a third (or further third) configuration from the plurality of terminals of the connection terminal (or the further connection terminal) according to the operation of the third Processor source type used media types with the processing source to couple when it is attached to the mounting area (or the other mounting area) and this is the third processing source type.

Analogously, even further processing source types and even further configurations of the redistribution arrangement and / or further redistribution arrangement may or may not be provided.

According to various embodiments, a method may include: providing a port terminal having a plurality of ports for providing a plurality of different types of media; Providing a processing source of a first processing source type or a second processing source type, wherein the first processing source type and the second processing source type differ in at least one type of media used for operation; Reconfiguring a redistribution arrangement whereby the redistribution arrangement is brought into a first configuration or a second configuration, wherein the redistribution arrangement: in the first configuration couples a first selection from the plurality of ports according to the type of media used to operate the first processing source type with the processing source; and in the second configuration, coupling a second selection from the plurality of ports to the processing source according to the type of media used to operate the second processing source type.

According to various embodiments, reconfiguring may include replacing a first redistribution element of the redistribution arrangement with a second redistribution element of the redistribution arrangement.

According to various embodiments, the first processing source type and the second processing source type and / or the first processing source and the second processing source may differ in at least one of: a heat source (e.g., a heat radiation source); a working gas source, an inert gas source; a reactive gas source; a purge gas source; a precursor gas source; a material vapor source; a heat sink (e.g., a heat radiation sink); a light source; a plasma source; a particle beam source; an etching gas source; an arc source; a glow discharge source; a heat shield; a dark field shield; a gas guide.

Alternatively or additionally, the third processing source type and the first processing source type and / or the third processing source type and the second processing source type may be different in at least one of: a heat source (e.g., a heat radiation source); a working gas source, an inert gas source; a reactive gas source; a purge gas source; a precursor gas source; a material vapor source; a heat sink (e.g., a heat radiation sink); a light source; a plasma source; a particle beam source; an etching gas source; an arc source; a glow discharge source; a heat shield; a dark field shield; a gas guide.

According to various embodiments, the first redistribution arrangement and / or the second redistribution arrangement may extend through the wall element (at least partially).

According to various embodiments, each type of media of the plurality of different media types may be associated with at least one port of each of the first port terminal and / or the second port terminal, which is then a media type port (port type) according to the assigned media type.

The first media type selection and the second media type selection may differ in at least one media type (i.e., in its use and / or a value of its characteristic size). Optionally, the first media type selection and the second media type selection may coincide (i.e., have a non-empty intersection) in at least one media type.

Alternatively or additionally, the first connection selection and the second connection selection may differ in at least one media type connection and / or at least one connection. Optionally, the first port selection and the second port selection may coincide in at least one media type port and / or at least one port.

The low voltage electrical medium type may have an AC voltage less than or equal to about 50 volts and / or a DC voltage less than or equal to 120 volts. The low voltage electrical medium type may have an AC voltage less than or equal to about 1000 volts (V) and / or a DC voltage less than or equal to about 1500 volts, e.g. greater than that of the medium type electrical low voltage. The medium type of electrical high voltage may have an AC voltage and / or DC voltages greater than that of the medium type of low voltage electrical, e.g. greater than about 2000 V, e.g. greater than about 5000 V. An electrical voltage media type (ie, the low voltage electrical, low voltage, and / or high voltage electrical) may have an electrical current (in amperes) that is more than an order of magnitude smaller (ie, less than 10%). is as its electrical voltage (in volts), ie a current-to-voltage ratio less than 0.1.

A type of electrical power may be arranged to supply a processing source with a distinctly large power requirement (of several kilowatts), e.g. with an electrical power greater than about 5 kW (kilowatts), e.g. greater than about 10 kW, e.g. greater than about 15 kW, e.g. greater than about 20 kW, e.g. greater than about 50 kW, e.g. in a range of about 10 kW to about 100 kW, e.g. in a range of about 20 kW to about 50 kW. A type of power media (i.e., electrical power) may have an electrical current (in amperes) greater than about 10% of its electrical voltage (in volts), i. a current-to-voltage ratio greater than 0.1 (10%), e.g. greater than about 20%, e.g. greater than about 30%, e.g. greater than about 50%. The type of electrical power can be transmitted by means of a low voltage electrical, a low voltage electrical and / or a high voltage electrical according to various embodiments. The electrical power may or may not be defined by the product of electrical current and voltage.

According to various embodiments, a processing assembly may include: a wall member for closing a vacuum chamber opening, the wall member having a mounting area; a first processing source of the first processing source type; a second processing source of the second processing source type; a connector terminal having at least a first media type port and a second media type port, wherein the first media type port is configured to provide a first media type and wherein the second media type port is configured to provide a second media type different from the first media type; a redistribution arrangement, which in a first configuration couples the first media type port to the first processing source when the first processing source is attached to the mounting portion of the wall member, for operating the first processing source; and in a second configuration, coupling the second media type port to the second processing source when the second processing source is attached to the mounting region of the wall member for operating the second processing source.

According to various embodiments, at least the first type of media may be used to operate the first processing source and may be used to operate the second processing source of at least the second type of media different from the first media type.

According to various embodiments, the first attachment area and the second attachment area may be the same. It can thus be achieved that the processing sources fastened in the attachment areas can be exchanged for one another. Illustratively, the first attachment area and a second mounting area for free configuration equal to each other.

According to various embodiments, the multiple ports of the first port terminal (multiple first ports) may include at least one port for each type of media of the plurality of different media types for servicing the first attachment region. According to various embodiments, the multiple ports of the second port terminal (multiple second ports) may include at least one port for each media type of the plurality of different media types for servicing the second attachment region.

The first redistribution arrangement and / or the second redistribution arrangement may in each case have a plurality of first redistribution connections for connection to a processing source, which is or will be attached to the first attachment area and / or to the second attachment area. The plurality of first ports and the plurality of second ports may be e.g. for connection to an external supply (media type supply), i. be clearly external connections.

Alternatively, the plurality of first terminals may be configured to connect the first redistribution arrangement and the second redistribution arrangement, respectively, and the plurality of second terminals may be configured to connect the second redistribution arrangement and the first redistribution arrangement, respectively. Illustratively, the plurality of first connections or the plurality of second connections can then be internal connections of the processing arrangement. Then, the first connection terminal and / or the second connection terminal may have a plurality of external terminals for connection to an external supply. Each port of the plurality of external ports may be associated with at least one port of the plurality of first ports and at least one port of the plurality of second ports, and e.g. be coupled with this.

Optionally, the first redistribution arrangement and / or the second redistribution arrangement can be configured with a plurality of second redistribution connections for connection to the internal connections of the first connection terminal and / or second connection terminal. For example, each port of the second redistribution ports may or may not be coupled to a port of the internal ports.

According to various embodiments, the wall element may have a process side (also referred to as vacuum side) and a connection side (also referred to as atmosphere side) opposite the process side. The first processing source and / or the second processing source may, for example, be attached to the process side of the wall element and / or extend away from the wall element in the direction of the process side.

The first processing source and / or the second processing source, when attached to the wall element, e.g. partially extend through the wall element, e.g. with their connection area. The first redistribution arrangement may be or may be coupled to the connection area of the processing source (first processing source) and / or the second redistribution arrangement may be coupled to the connection area of the further processing source (second processing source).

The connection region of the first processing source and / or of the second processing source can be designed to connect at least one liquid supply, at least one electrical power supply, at least one high-voltage electrical supply and / or at least one gas supply.

According to various embodiments, the first redistribution arrangement and / or the second redistribution arrangement may comprise a plurality of redistribution elements for redistributing the multiple different types of media. For example, each redistribution element may be configured (e.g., preconfigured) to redistribute one or more media types of the first media type selection and / or the second media type selection. For example, the redistribution elements may differ in pairs in at least one (distributed) media type.

According to various embodiments, the second redistribution arrangement may include: another first redistribution element according to the types of media used to operate the first type of processing source; another second redistribution element according to the types of media used to operate the second processing source type; and a further coupling region for coupling the further first redistribution element or the further second redistribution element between the second connection terminal and the second processing source (if it is attached to the second attachment region); wherein the second redistribution arrangement is in the further first configuration when the further first redistribution element is coupled into the further coupling region, and wherein the second redistribution arrangement is in the further second Configuration is when the further second redistribution element is coupled into the coupling region.

According to various embodiments, the first coupling region and the further first coupling region can be set up the same so that the first redistribution element and the further first redistribution element can be interchanged and / or so that the second redistribution element and the further second redistribution element can be interchanged.

Optionally, the first redistribution arrangement can have at least one second coupling-in region for coupling in corresponding redistribution elements of the plurality of redistribution elements between the first connection terminal and the first processing source. Alternatively or additionally, the second redistribution arrangement may each have at least one further second coupling-in region for coupling in corresponding redistribution elements of the plurality of redistribution elements between the second connection terminal and the second processing source. Optionally, the second coupling region and the further second coupling region can be set up the same, so that the redistribution elements provided for this purpose can be exchanged for one another.

The first redistribution arrangement may comprise a first set of redistribution elements which, in their first configuration, are coupled into the inlets of the first redistribution arrangement (i.e., connected between the first connection terminal and the first processing source). Furthermore, the first redistribution arrangement can have a second set of redistribution elements, which in its second configuration is coupled into the coupling-in areas of the first redistribution arrangement. The first set of redistribution elements and the second set of redistribution elements may differ from each other in at least one redistribution element.

The second redistribution arrangement may comprise a further first set of redistribution elements, which in its further first configuration is coupled into the further coupling-in areas of the second redistribution arrangement (i.e., connected between the second connection terminal and the second processing source). Furthermore, the second redistribution arrangement can have a further second set of redistribution elements, which in its further second configuration is coupled into the further coupling regions of the second redistribution arrangement. The further first set of redistribution elements and the further second set of redistribution elements may differ from one another in at least one redistribution element.

Analogously, the first redistribution arrangement and / or the second redistribution arrangement can each have a third (or further third) set of redistribution elements.

Optionally, the coupling-in areas of the first redistribution arrangement can be set up equal to the further coupling-in areas of the second redistribution arrangement so that at least two sets of redistribution elements can be exchanged for one another.

Optionally, the first redistribution arrangement and / or the second redistribution arrangement may share several redistribution elements, i. use together. For example, the first redistribution element and the further first redistribution element may be the same redistribution element. Alternatively or additionally, the second redistribution element and the further second redistribution element may be the same redistribution element.

According to various embodiments, a processing arrangement may comprise a vacuum chamber in which is provided one or more processing sections (also referred to as a compartment), each of which processing section (eg, exactly) has a vacuum chamber opening (chamber opening) which is closable with the wall element (eg vacuum-tight) and which the processing section exposes (makes accessible).

According to various embodiments, a processing unit may comprise the wall element, the connection terminal (e.g., optionally the further connection terminal) and the redistribution arrangement (e.g., optionally the further redistribution arrangement). Illustratively, the processing unit can form a functional and coherent unit which can be decoupled from and / or removable from the vacuum chamber, e.g. to move them away from the vacuum chamber and / or exchange them with another processing unit. According to various embodiments, a separate media supply may or may not be provided for each processing unit.

According to various embodiments, a processing arrangement may comprise a plurality of processing units, each of which processing unit may be introduced into a processing section, wherein each processing unit of the plurality of processing units may each comprise a wall element, at least one connection terminal and at least one redistribution arrangement.

According to various embodiments, the processing arrangement may further comprise: a transport arrangement for transporting a substrate through the processing section, eg along a transport surface. The transport surface can run between two processing sources, if they are attached to the wall element. Thus, can be processed on both sides. The transport surface can be oriented vertically or horizontally (ie transversely to the transport direction). Alternatively, the transport surface may have any angle to the vertical.

A processing source type (e.g., the first processing source type and / or the second processing source type) may be configured to process substrates, e.g. at least for coating, irradiation, ablation, cleaning, heating, cooling, transformation (e.g., chemical and / or structural), doping (e.g., chemical), and / or polishing.

A coating apparatus may be configured to coat and, for example, comprise or be formed from at least one of: a physical material vapor source (for physical vapor deposition coating), such as e.g. a magnetron (also referred to as a sputter source, optionally in conjunction with a reactive gas source for reactive sputtering and / or optionally with two magnetron cathodes in the form of a dual magnetron), a laser beam evaporator, an arc evaporator, an electron beam evaporator and / or a thermal evaporator; or a source of chemical vapor (for chemical vapor deposition), e.g. a precursor gas source optionally in conjunction with a plasma source (for plasma enhanced chemical vapor deposition). The coating apparatus may optionally include at least one gas guide structure, at least one gas distributor structure, at least one anode (e.g., a single anode or a dual anode), and / or an aperture assembly to regulate coating (e.g., to control layer thickness homogeneity).

Depending on the type of processing source, e.g. In the coating apparatus and its components, the types of media used to operate the processing source may differ. For example, precursor gas can be used to operate a chemical material vapor source. The precursor gas may provide one or more layer-forming precursors which are separated from the precursor gas by a chemical reaction. For the operation of a physical material vapor source, however, an electrical power can be used, which clearly provides the power required for the evaporation of material. For operating a plasma source, however, at least one working gas and / or one reactive gas can be used. The working gas can be used, for example, as a plasma-forming gas. For example, the reactive gas may be incorporated into the formed layer (e.g., under a chemical reaction with the vaporized material).

A cleaning device may be configured to remove contaminants (e.g., adsorbates) and include, for example, at least one of: a glow discharge device, a heater, a plasma source, an ion beam source, a reactive gas source, a gas routing structure. For the operation of the glow discharge device, for example, a high electric voltage, which is used for generating and / or obtaining a glow discharge, and a working gas can be used, through which the glow discharge takes place. For operation of the ion beam source, for example, an inert gas may be used, which is used as an ion-forming gas. For operation of the plasma source, for example, a working gas can be used, which is used as a plasma-forming gas. For the operation of the reactive gas source, a reactive gas can be used, which reacts to remove impurities with these to a volatile material. For operating the ion beam source and / or the plasma source can also be used a high voltage electrical.

An exposure apparatus may be configured to be exposed to light and may include, or be formed of, for example, at least one light source (e.g., a flashlamp and / or a laser). For operation of the exposure device, the electric power can be used. The light source may include an electricity-light converter configured to convert the electrical power into light (with a corresponding power).

A heating device may be configured to be heated, and include, for example, or formed from at least one of: a heat radiation source, a gas source, a gas routing structure. For operation of the gas source, an inert gas may be used, e.g. provides convection heat transfer away from the heater. For operation of the heat radiation source, an electric power can be used and optionally a cooling liquid. The heat radiation source may include an electricity-heat radiation converter configured to convert the electric power into heat radiation.

A cooling device (cooling unit) may be adapted to be cooled and, for example, comprise or be formed from at least one of: a heat radiation sink, a gas source, a gas routing structure, a heat exchanger. For the operation of the gas source, an inert gas can be used which, for example, by means of convection provides a heat transfer to the cooling device. The heat radiation sink may be configured to absorb more heat radiation than to emit. For the operation of the heat exchanger, a cooling liquid can be used, which receives thermal energy from the cooling device and transported away from it. The heat exchanger can be configured, for example, for transmitting thermal energy (heat) between two streams (eg inert gas and cooling liquid) or between the heat radiation sink and the cooling liquid.

A heating device and / or a cooling device may be arranged to bring a substrate to a predefined temperature and / or to maintain it at the temperature (for example, to control its temperature).

An etching apparatus may be configured to remove material and may comprise or be formed from, for example, at least one of: a plasma source, an ion beam source, an etch gas source, a gas routing structure. For operation of the ion beam source, for example, an inert gas may be used, which is used as an ion-forming gas. For operation of the plasma source, a high voltage electric and an inert gas may be used. For the operation of the etching gas source, an etching gas may be used which is arranged to etch (i.e., chemically react) a material of the substrate (substrate material). The etching device may be configured similar to a cleaning device, wherein an etching device for removing substrate material itself is set up, whereas the cleaning device leaves the substrate undamaged.

An implantation device may be configured to implant a dopant and, for example, comprise or be formed from at least one of: a chemical dopant source, a physical dopant source. For operation of the chemical dopant source, a reactive gas and / or precursor gas may be used which provide the atomic species to be doped (in other words, the dopants), i. the type of atom which is incorporated into the layer. For example, the reactive gas may be formed from the dopant (e.g., nitrogen). A physical dopant source may provide an ion beam having the dopant. For the operation of the physical dopant source, a gas may be used, wherein ions of the dopant are formed from the gas.

An evacuation device (illustratively a gas gate) may be used to form a vacuum, e.g. a vacuum, be configured (eg, with a predetermined pressure and / or a predetermined composition) and, for example, at least one of the following or formed from: a cold trap, a high vacuum pump (eg, a turbomolecular pump, a sublimation pump, a sorption pump and / or a cryopump ), a rough vacuum pump. For operating the evacuation device, a low-voltage electrical and / or a low-voltage electrical voltage can be used.

A vacuum may have a pressure from the rough vacuum (rough vacuum range), ie in a range from about 10 mbar to about 1 mbar, a pressure from the fine vacuum (fine vacuum range), ie in a range from about 1 mbar to about 10 ^-3 mbar , or have a pressure from the high vacuum (high vacuum range), ie in a range from about 10 ^-3 mbar to about 10 ^-7 mbar. For example, the vacuum may or may not be provided in the vacuum chamber.

A processing source type may optionally include a gas separation device, which may include one or more gas separation plates and / or a purge gas source (gas separation gas source). For the operation of the purge gas source, a purge gas (gas separation gas) may be used.

Alternatively or in addition to one or more processing sources, one or more gas separation devices may also be attached to the wall element (e.g., at one or both attachment areas). A gas separation device may be configured to provide a gas separation effect. A gas separation device may include one or more gas separation plates, a gas routing structure, a gas distributor, and / or a purge gas source (gas separation gas source). For the operation of the purge gas source, a purge gas (gas separation gas) may be used.

The plurality of different types of media may have at least two different types of media, e.g. at least three different types of media, e.g. at least four different types of media, e.g. at least five different types of media, e.g. at least six different types of media.

According to various embodiments, the first connection terminal and / or the second connection terminal may be fastened to the wall element, eg opposite the connection side. Then, when the wall member covers the chamber opening, the first connection terminal and / or the second connection terminal may be disposed above the vacuum chamber. This can make it possible for the first connection terminal and / or the second connection terminal to be reached from a position on the vacuum chamber, which saves space and effort.

According to various embodiments, the processing arrangement may include a media type channel configured to receive a plurality of media type lines. The plurality of media type lines may include at least one media type line for each type of media of the plurality of different media types for transmitting the media type to the first port terminal and / or the second port terminal via the media type line. Clearly, the first connection terminal and / or the second connection terminal can be connected and maintained from above the vacuum chamber, which saves space and effort.

According to various embodiments, the processing arrangement may comprise a generator which may be e.g. is supported by the wall element. Clearly, the generator can be integrated in the processing unit or. The generator may be for providing a high voltage electrical; a low voltage electrical; and / or an electrical extra-low voltage. This makes it possible to provide all other types of electrical media (high voltage electrical, low voltage electrical, low voltage electrical) within the processing arrangement by means of a (vividly uniform) electrical power supply. Thus, at least one port for providing an electrical media type, e.g. on the connection for providing the electrical high voltage, on the connection for providing the electrical low voltage and / or on the connection for providing the electrical extra-low voltage.

According to various embodiments, the generator may be configured to: in the first configuration, provide a first selection of the plurality of electrical media types according to the type of electrical media used to operate the first processing source type when attached to the mounting area and being the first processing source type; and in the second configuration, providing a second selection among the plurality of electrical media types according to the type of electrical media used to operate the second processing source type when attached to the mounting area and the second type of processing source.

Thus, space for further bays and / or connections can be created. For example, plug-in modules can be integrated into the connection terminal (eg 19 ") so that the terminal not only includes a connection and distribution function, but also permits modification of the electrical energy For example, additional generator cabinets can be dispensed with, which results in a smaller footprint, or alternatively, better configurability when switching between AC power and DC power (eg, when switching between DC magnetron and DC power) AC magnetron) may be provided by replacement of the generator.

According to various embodiments, an electrical media type (eg, the high voltage electrical, the low voltage electrical, the low voltage electrical and / or the electric power) may include at least two types of electrical media that differ in electrical frequency and / or polarization change (illustratively AC voltage or voltage) DC).

Two types of processing sources can be used e.g. differ their electrical power supply (AC, DC, three-phase). Then, a terminal providing power supply may have an adapter that allows connection of the respective power supply to match the configuration.

Embodiments of the invention are illustrated in the figures and are explained in more detail below.

Show it

1A a processing arrangement according to various embodiments in a schematic view;

1B a processing arrangement according to various embodiments in a schematic cross-sectional view

2 a processing arrangement according to various embodiments in a schematic perspective view;

3 a processing arrangement according to various embodiments in a schematic perspective view;

4A and 4B each a processing arrangement according to various embodiments in a schematic side view;

5 a processing arrangement according to various embodiments in a schematic front view;

6 a processing arrangement according to various embodiments in a schematic perspective view;

7 a processing arrangement according to various embodiments in a schematic perspective view;

8th a processing arrangement according to various embodiments in a schematic perspective view;

9 a processing arrangement according to various embodiments in a schematic perspective view;

10 a processing arrangement according to various embodiments in a schematic perspective view;

11 a processing arrangement according to various embodiments in a schematic perspective view;

12A and 12B each a processing arrangement according to various embodiments in a schematic view; and

13 a processing arrangement according to various embodiments in a schematic cross-sectional view.

In the following detailed description, reference is made to the accompanying drawings, which form a part hereof, and in which is shown by way of illustration specific embodiments in which the invention may be practiced. In this regard, directional terminology such as "top", "bottom", "front", "back", "front", "rear", etc. is used with reference to the orientation of the described figure (s). Because components of embodiments can be positioned in a number of different orientations, the directional terminology is illustrative and is in no way limiting. It should be understood that other embodiments may be utilized and structural or logical changes may be made without departing from the scope of the present invention. It should be understood that the features of the various exemplary embodiments described herein may be combined with each other unless specifically stated otherwise. The following detailed description is therefore not to be taken in a limiting sense, and the scope of the present invention is defined by the appended claims.

As used herein, the terms "connected," "connected," and "coupled" are used to describe both direct and indirect connection, direct or indirect connection, and direct or indirect coupling. In the figures, identical or similar elements are provided with identical reference numerals, as appropriate.

According to various embodiments, a universal concept for a lid flange is provided. The cover flange can be used to close a vacuum chamber. In other words, the wall element may be e.g. be adapted to a vacuum chamber, so that the wall element covers a chamber opening of the vacuum chamber and / or closes vacuum-tight, i. can be used as a lid. Illustratively, at least one processing source may be attached to the lid flange (wall element) (i.e., one processing source or multiple processing sources may or may not be attached thereto.

According to various embodiments, it is possible to install (and / or connect) and / or retrofit different processing source types (process technology) with the least possible conversion effort. Alternatively or additionally, it is possible to arrange the processing source in such a way that processing (a treatment) of substrate bottom as well as top side is possible. For this, according to various embodiments, the assemblies (e.g., controller, electrical, drive, etc.) used to operate the processing source may be disposed on the lid flange, e.g. be attached to this. Thus, the cover flange as a whole can be replaced without having to replace the assemblies used to operate the processing source types.

A type of processing source may include a heat source and / or heat sink that are commonly and / or individually configured to control the temperature of the substrate (ie, to control and / or regulate the substrate temperature). Alternatively or additionally, a processing source type can also include components for substrate pretreatment, such as, for example, a glow discharge source and / or a Have ion source, but also components for substrate coating, such as a sputtering source (eg with a planar target or a tubular target).

1A illustrates a processing arrangement 100a according to various embodiments in a schematic view.

The processing arrangement 100a can be a connection terminal 104 comprising a plurality of terminals for providing a plurality of different types of media. The connection terminal 104 For example, at least a first connection 104a of a first media type (first media type port 104a ) for providing the first type of media (eg, a gas), and may include at least one second port 104b a second media type (second media type port 104b ) for providing the second type of media (eg, a liquid). The first connection 104a For example, it may include or be formed from a gas port (gaseous media type port) and the second port 104b For example, it may have or be formed from a fluid port (liquid-media type port).

The processing arrangement 100a can be used to operate a processing source 102 be furnished. The processing source 102 may be a first type of processing source 102 or a second type of processing source 102b which differ from each other in at least one type of media used for operation. In other words, you can get a first choice 108a of several different types of media (first media type selection 108a ) for operation of the first processing source type 102 and a second selection 108b of several different media types (second media type selection 108b ) for operating the second processing source type 102b differ from each other in at least one media type. For example, the first media type selection 108a have the gas which in the second media type selection 108b is missing. Alternatively or additionally, the second media type selection 108b have the liquid, which in the first media type selection 108a is missing.

The first media type selection 108a and / or the second media type selection 108b may have at least one other type of media, eg at least two other media types, eg at least three other media types, eg at least four other media types, eg at least five other media types, eg at least six other media types. The plurality of different media types may at least combine the media types of the first media type selection 108a and the media types of the second media type selection 108b have or be formed from it.

According to various embodiments, the first media type selection 108a and the second media type selection 108b be equally powerful (ie have the same number of media types) as in 1A is illustrated. Alternatively, the first media type selection 108a be more powerful than the second media type selection 108b or the other way around. For example, the first media type selection 108a have a larger number of media types than the second media type selection 108b or the other way around.

The processing arrangement 100a may also be a redistribution arrangement 106 having, which with the connection terminal 104 is coupled.

The redistribution arrangement 106 can be set up in a first configuration 1200a (Configuration 1, compare also 12A ) a first selection from the plurality of ports (first port selection), eg at least the first port 104a according to the types of media used for operation of the first processing source type (the first type of media selection 108a ) with the processing source 102 to couple 110 if this is the first type of processing source 102 is.

The redistribution arrangement 106 may be further configured in a second configuration 1200b (Configuration 2, compare also 12B ) a second selection from the plurality of ports (second port selection), eg at least the second port 104b according to the type of media used for operation of the second processing source type (the second type of media selection 108b ) with the processing source 102 to couple 110 if this is the second processing source type 102b is.

The processing arrangement 100a may have multiple areas in which the processing arrangement 100a clearly set up for various functions. In a first area 101 the several areas (compare also 2 ) may be the processing arrangement 100a a transition between the connection terminal 104 (or its multiple connections 104a . 104b ) and the redistribution order 106 (eg a coupling to these) provide. For example, the connection terminal 104 in the first area 101 the multiple connections 104a . 104b exhibit.

Other portions of the plurality of areas may be configured according to a configuration of the redistribution arrangement 106 be furnished.

In a second area 103 of the several areas (cf. 2 ) can the redistribution arrangement 106 , eg in the first configuration 1200a , At least for distributing the first type of media (eg, the gas, graphically a Gasumverteilungsbereich 103 ).

In a third area 105 the several areas (compare also 2 ) can the redistribution arrangement 106 , eg in the second configuration 1200b at least for distributing the second type of media (eg the liquid, illustratively a liquid redistribution area) 105 ).

In a fourth area 107 the plurality of areas may be the processing arrangement 100a , eg the redistribution order 106 , for coupling and / or decoupling to the processing source 102 be furnished.

The redistribution arrangement 106 can be set up from the connection terminal 104 at least partially decoupled and / or coupled (coupled) to be or become (eg in the first area 101 ). Alternatively or additionally, the redistribution arrangement 106 be set up by the processing source 102 at least partially decoupled and / or coupled or (eg in the fourth area 107 ). Thus, an exchange and / or a reconfiguration of the redistribution arrangement 106 respectively.

1B illustrates a processing arrangement 100b according to various embodiments in a schematic cross-sectional view (eg, cut transversely to a transport direction).

The processing arrangement 100b can be a wall element 112w having a fastening area 112b having, for fixing a processing source 102 is set up. The attachment area 112b may have one or more attachment structures, such as holes, threads, bolts, screws, hooks, eyelets, etc.

According to various embodiments, the processing arrangement 100b a vacuum chamber 114 exhibit. The vacuum chamber 114 can be a vacuum chamber opening 114O which match the wall element 112w is set up. The wall element 112w can if the wall element 112w on the vacuum chamber opening 114O rests, the vacuum chamber 114 close vacuum-tight.

The on the wall element 112w fixed processing source 102 can in the vacuum chamber 114 protrude. The processing source 102 can on a process page 114p (also as a vacuum side 114p designated) of the wall element 112w be arranged. The process page 114p can vividly to the vacuum chamber 114 show when the wall element 112w on the vacuum chamber opening 114O rests. On one of the process page 114p opposite side 114a (also as Atmosphärenseite 114a designated) of the wall element 112w can the redistribution arrangement 106 be arranged. For example, the redistribution arrangement 106 on the wall element 112w be attached.

On the atmosphere side 114a of the wall element 112w can the connection terminal 104 be arranged. For example, the connection terminal 104 on the wall element 112w be attached.

The connection terminal 104 can with the redistribution arrangement 106 coupled 116 be. The redistribution arrangement 106 can with the processing source 102 coupled 118 be, for example, if the processing source 102 at the attachment area 114b is attached.

For this purpose, the processing arrangement 100b , eg the redistribution order 106 in the fourth area 107 the multiple areas (eg in the attachment area 112b ), eg on the vacuum side 114p and / or on the atmosphere side 114a for coupling and / or decoupling to the processing source 102 be furnished.

2 illustrates a processing arrangement 200 according to various embodiments in a schematic perspective view

According to various embodiments, the processing arrangement 200 two attachment areas 112b . 212b (first mounting area 112b and second attachment area 212b ), each of which attachment area 112b . 212b for fastening in each case one processing source 102 is set up. Between the two attachment areas 112b . 212b can the transport area 111f be arranged along which substrates can be transported.

The two attachment areas 112b . 212b can be set up equal to each other. The two attachment areas 112b . 212b each can have at least one passage opening 112o . 212o (Execution), ie a through hole 112o . 212o or more through holes 112o . 212o , exhibit. For example, the wall element 112w have several standardized bushings. For example, on both sides of the transport surface 111f in each case at least one passage opening 112o . 212o be arranged in a mirrored position and / or shape, for example, at a lying between these level, for example in the transport surface 111f lying, mirrored.

According to various embodiments, the processing arrangement 200 two cantilevers 120 . 220 (first cantilever beam 120 and second cantilever beam 220 ), which on the wall element 112w are attached and away from the wall element 112w extend away. The two cantilever beams 120 . 220 (Support arms) can be worn on each of the two attachment areas 112b . 212b be attached processing sources. The first cantilever 120 (illustratively upper support arm) may be configured to support (hold) the first processing source (eg, this may be on the first Kragträger 120 hang). The second cantilever 220 (illustratively lower arm) may be configured to carry the second processing source (eg, this may from the second Kragträger 220 be supported). Between the two cantilevers 120 . 220 can the transport area 111f be arranged along which substrates can be transported.

According to various embodiments, the processing arrangement 200 two connection terminals 104 . 204 (first connection terminal 104 and second connection terminal 204 ), each having a plurality of terminals for providing the plurality of different types of media. The first connection terminal 104 may be the first attachment area 112b be assigned, ie illustratively for supplying one to the first attachment area 112b fixed first processing source (not shown) to be set up. The second connection terminal 204 can the second attachment area 212b be assigned, ie illustratively for supplying one to the second attachment area 212b fixed second processing source (not shown) to be set up.

In each case at least one connection of a type of media of the second connection terminal 204 and at least one terminal of the one media type of the first connection terminal 104 For example, they may constitute a terminal set of one type of media for providing the one type of media of the plurality of different media types. The connection kit can also have two ports of the first connection terminal 104 and / or two terminals of the second connection terminal 204 , each of the one type of media.

In other words, the processing arrangement 200 have multiple connection sets for providing the several different types of media. Illustratively, the processing arrangement 200 for each type of media of the several different types of media have a connection set.

For example, the processing arrangement 200 a first connection set 104a . 204a for providing a first type of media (eg, a gas, eg, a working gas). The first connection set 104a . 204a can make a first connection 104a and a second connection 204a exhibit. For example, the processing arrangement 200 a second connection set 104b . 204b for providing a second type of media (eg, a liquid). The second connection set 104b . 204b can make a first connection 104b and a second connection 204b exhibit. For example, the processing arrangement 200 a third connection set 104c . 204c for providing a third type of media (eg electrical power). The third connection set 104c . 204c can make a first connection 104c and a second connection 204c exhibit. For example, the processing arrangement 200 a fourth connection set 104d . 204d for providing a fourth type of media (eg, a high voltage electrical). The fourth connection set 104d . 204d can make a first connection 104d and a second connection 204d exhibit.

The first connection 104a . 104b . 104c . 104d each terminal set of the plurality of terminal sets may be the same as the second terminal 204a . 204b . 204c . 204d each connection set of the plurality of connection sets to be established (eg standardized).

According to various embodiments, the processing arrangement 200 two redistribution arrangements (first redistribution arrangement and second redistribution arrangement). The first redistribution arrangement may be configured in accordance with the method of operating a processing source type at the first mounting area 112b be brought to be fastened processing source (not shown) used media types or be. The second redistribution arrangement may be configured to operate a processing source type at the second mounting area 212b be brought to be fastened processing source (not shown) used media types or be.

The processing arrangement 200 may have the multiple areas. In the first area 101 (Media terminal area 101 ) of the several areas (compare also 1A ), eg on the atmosphere side 114a of the wall element 112w , can the processing arrangement 200 , eg the first connection terminal 104 , a transition between the multiple terminals 104a . 104b . 104c . 104d of the first connection terminal 104 and the first redistribution arrangement. Furthermore, the processing arrangement 200 , eg the second connection terminal 204 in the first area 101 a transition between the multiple ports 204a . 204b . 204c . 204d of the second connection terminal 204 and the second redistribution arrangement 106 provide.

For example, the first connection terminal 104 and / or the second connection terminal 204 in the first area 101 each having the multiple ports. Illustratively, the first area 101 used as the transition region of the uniform external (external) media type connections (media connections, eg signal connections) to the individual cover areas.

In a second area 103 the several areas (compare also 1A ), the first redistribution arrangement for distributing a first type of media (eg a gas, illustratively a gas redistribution area 103 ). In another second area 203 Of the plurality of areas, the second redistribution arrangement for distributing the first type of media (eg, a gas, illustratively another gas redistribution area 203 ).

In a third area 105 the several areas (compare also 1A ), the first redistribution arrangement and / or the second redistribution arrangement for distributing the second type of media (eg a liquid, illustratively liquid redistribution area) 105 ).

The processing arrangement 200 For example, the first redistribution arrangement may be in a fourth area 107 the plurality of areas (eg in the first attachment area 112b ), eg on the vacuum side 114p and / or on the atmosphere side 114a for coupling and / or decoupling to one at the first attachment area 112b fixed processing source (eg, a first processing source) to be set up. The processing arrangement 200 For example, the second redistribution arrangement may be in another fourth area 207 the plurality of areas (eg, in the second attachment area 212b ), eg on the vacuum side 114p and / or on the atmosphere side 114a for coupling and / or decoupling to one at the second attachment area 212b fixed processing source (eg to a second processing source) to be set up.

3 illustrates a processing arrangement 300 according to various embodiments in a schematic perspective view, eg similar to the processing arrangement 200 with mounted processing sources 102 . 202 ,

According to various embodiments, the processing arrangement 300 two processing sources 102 . 202 have, for example, a first processing source 102 of a first processing source type 102 and a second processing source 202 a second type of processing source 102b , The first processing source 102 may be at the first attachment area 112b be attached and the second processing source 202 can at the second attachment area 212b be attached.

The first type of processing source 102 may be a coating device and have two magnetrons, a so-called dual magnetron. The dual magnetron can have two rotatably mounted magnetron cathodes 302 each having a target material or formed therefrom and are tubular. The magnetron cathodes 302 can each by means of a warehouse 302l be rotatably mounted, the bearings 302l from the first cantilever 120 can be kept. Alternatively, the first type of processing source may be exactly one magnetron, a so-called single magnetron, with a magnetron cathode 302 exhibit.

The first media selection may comprise at least one working gas which may be used as a plasma-forming gas. Further, the first media selection may include electrical power that may be used to form and / or maintain the plasma. The dual magnetron can be operated, for example, with direct current and / or alternating current. Optionally, the first media selection may comprise a liquid which is for cooling at least one magnetron cathode 302 can be used.

By the at least one passage opening (hidden in the view) of the first attachment area 112b Through this, a supply of the first processing source 102 done with the first media selection. Optionally, by the first cantilever 120 through a supply of the first processing source 102 with at least some media types of the first media selection. This can be the first cantilever 120 have at least one connection region, to which the first processing source 102 be connected or can be. The first redistribution arrangement may be at least partially in the first cantilever 120 extend into and / or be coupled to the connection area. For example, a gaseous type of media (eg, a gas separation gas, a purge gas, or water vapor) may pass through the first cantilever 120 be guided through, for example, to its connection region, to which at least one gas inlet can be coupled.

Optionally, by the at least one passage opening of the first attachment region 112b through a supply of the first processing source 102 done with drive power. This can be the first processing source 102 have at least one drive (one drive or two drives), which at least one magnetron cathode 302 the first processing source 102 drives. To the Operating the at least one drive, the first media selection may further comprise a low-voltage electrical and / or a low-voltage electrical. The at least one drive can be used together with a media feedthrough (through the wall element 112w ) may be provided by means of an end block (also referred to as a candle end block) located on the atmosphere side 114a can be arranged.

Alternatively, the drive can be omitted or be, for example, if instead of the at least one rotatably mounted magnetron cathode 302 a flat magnetron cathode (a so-called planar magnetron) is used.

Optionally, the first processing source 102 have a diaphragm arrangement, which, for example, on the first Kragträger 120 and / or at the first attachment area 112b can be attached.

Optionally, the first processing source 102 at least one gas inlet (not shown), which, for example, on the first Kragträger 120 and / or at the first attachment area 112b can be attached. The at least one gas inlet may, for example, have two gas inlets respectively arranged on opposite sides of the dual magnetron (or single magnetron). Alternatively or additionally, the at least one gas inlet, for example, one between the two magnetron cathodes 302 having the dual magnetron arranged gas inlet. The at least one gas inlet may have a plurality of segments and / or may have a plurality of gas inlet openings (eg in each segment). For operation of the at least one gas inlet, the first media selection may comprise a gas, eg a process gas. The process gas can have a working gas and optionally a reactive gas for reactive sputtering (eg in the form of a gas mixture). Optionally, the first media selection may comprise two cooling liquids (each for a magnetron cathode 302 ).

Optionally, the first processing source 102 have an anode assembly which, for example, on the first Kragträger 120 and / or at the first attachment area 112b be attached or can be. Between the anode arrangement and at least one magnetron cathode 302 the electrical power can be applied.

The anode assembly may include at least one of the first cantilever 120 coupled anode structure (not shown), which on both sides of at least one magnetron cathode 302 the first processing source 102 in the direction of the transport surface 111f extends. Will be two magnetron cathodes 302 used, the anode assembly can two on the first Kragträger 120 coupled anode structures (not shown), each of which is on both sides of one of the two magnetron cathodes 302 in the direction of the transport surface 111f extends. Between the two anode structures, a gas inlet may be arranged. In this case, the anode structures can supply the gas provided by the gas inlet in the direction of the transport surface 111f lead, ie act as a gas guide structure.

The second processing source type 102b may be a heater and at least one heat radiation source 304 exhibit. The at least one heat radiation source 304 can from the second Kragträger 220 being held. For example, the at least one heat radiation source 304 a heat radiation source 304 or two heat radiation sources 304 exhibit.

The second media selection may have at least one electrical power that can be converted to thermal radiation. The heating device can be operated, for example, with direct current and / or alternating current. A heater and / or a cooling device does not necessarily require a gaseous type of media for operation.

The second media selection may optionally include a liquid which may be used as the cooling liquid. By means of the cooling liquid, a cooling of heat-sensitive components of the second processing source 202 respectively.

By the at least one passage opening (hidden in the view) of the second attachment area 212b a supply of the second processing source can be passed through 202 done with the second media selection. Optionally, by the second cantilever 220 through a supply of the second processing source 202 with at least some media types of the second media selection. This can be the second cantilever 220 have at least one connection region, to which the second processing source 202 be connected or can be. The second redistribution arrangement may be at least partially in the second cantilever 220 extend into and / or be coupled to the connection area. For example, a gaseous type of media (eg, a gas separation gas, a purge gas, or water vapor) may pass through the second cantilever 220 be guided through, for example, to its connection region, to which at least one gas inlet can be coupled.

Optionally, the second processing source 202 at least one gas inlet (not shown), which, for example, to the second Kragträger 220 and / or at the second attachment area 212b can be attached. The at least one gas inlet can, for example, two each on opposite sides of the at least one heat radiation source 304 have arranged gas inlets. Alternatively or additionally, the at least one gas inlet, for example, one between the two heat radiation source 304 the second processing source 202 have arranged gas inlet. The at least one gas inlet may have a plurality of segments and / or may have a plurality of gas inlet openings (eg in each segment). For operating the at least one gas inlet, the second media selection may comprise a gas, for example an inert gas and / or a purge gas.

The first cantilever 120 and the second cantilever 220 can be set up the same way (eg at a level between them, eg in the transport area 111f lying, mirrored). This allows the first processing source 102 and the second processing source 202 be exchanged for each other. For example, the first cantilever beam 120 and the second cantilever 220 have at least one connection region or at least one mounting region, on the components of the first processing source 102 or the second processing source 202 can be connected or attached. The first cantilever 120 and the second cantilever 220 For example, at least one connection region and / or the at least one assembly region can have their position and / or orientation, for example, at one between the two cantilever beams 120 . 220 lying plane, eg in the transport area 111f lying, mirrored.

To supply the first processing source 102 with the first media selection, the first redistribution arrangement may be in the first configuration 1200a be. To supply the second processing source 202 with the second media selection, the second redistribution arrangement in the further second configuration 1200b be. In the second area 103 For example, a coating device redistribution element, for example a magnetron redistribution element, can be coupled in. In the other second area 203 For example, a heater redistribution element, eg a heat radiation source redistribution element, may be or may be coupled.

The first processing source 102 and the second processing source 202 can also be swapped or mounted. Then, the first redistribution arrangement in the second configuration 1200b and the second redistribution arrangement may be in the further first configuration 1200a be. Then in the second area 103 the heating device redistribution element, eg the heat radiation source redistribution element, may or may be coupled in and in the further second region 203 For example, the coating device redistribution element, for example the magnetron redistribution element, can be or are coupled in.

Analog can be optional in the third area 105 (or another third area 205 , compare 12A and 12B ) a corresponding redistribution element according to the respective configuration of the first redistribution arrangement 106 (or the second redistribution arrangement) be coupled. Analog can be optional in the fifth range 109 (or another fifth area 209 , compare 12A and 12B ) a corresponding redistribution element according to the respective configuration of the first redistribution arrangement 106 (or the second redistribution arrangement) be coupled.

The first media selection and the second media selection may differ in at least one of the following: the working gas, the reactive gas, the inert gas, the purge gas, the value of the electric power, a liquid (at least one cooling liquid).

According to various embodiments, each redistribution element of the plurality of redistribution elements may be associated with a processing source type and / or a media selection.

The first cantilever 120 and / or the second cantilever beam 220 can each from the vacuum side 114p be assembled from. Thus, further passage opening in the wall element 112w be saved.

4A and 4B illustrate a processing arrangement 400 according to various embodiments in a schematic side view, eg the processing arrangement 300 ,

According to various embodiments, the wall element 112w be or be vertically aligned. In other words, the vacuum chamber 114 a chamber opening (obscured in the view) which encloses the interior of the vacuum chamber, eg a processing section provided therein 130 , exposing along a horizontal direction. The wall element 112w can from one side (eg along the horizontal direction) to a horizontally extending transport surface 111f (Eg substrate transport plane) are approached. In this case, the transport surface 111f approximately centrally (ie in the middle) on the wall element 112w be arranged, for example, in the middle between the two Kragarmen 120 . 220 ,

The two cantilevers 120 . 220 can along the transport surface 111f (eg along the horizontal direction), and above or below the transport surface 111f be arranged. The two cantilevers 120 . 220 can thereby extend along the transport surface 111f have, which is greater than that of the transport surface 111f , The two cantilevers can be clearly illustrated 120 . 220 in their longitudinal extension, span the entire substrate width.

According to various embodiments, the first cantilever 120 hold the process technique for the substrate top (eg complete) and the second cantilever 120 Keep the process technique for the substrate underside (eg complete).

5 illustrates a processing arrangement 500 According to various embodiments in a schematic front view (ie from the direction of the atmosphere side 114a ), eg the processing arrangement 300 ,

The first attachment area 112b and / or the second attachment area 212b can be on the atmosphere side 114a at least partially (ie partially or completely). Alternatively, on the atmosphere side 114a Components of the first processing source 102 or second processing source 202 be arranged or, for example, used for operation electrical.

6 and 7 illustrate a processing arrangement 600 According to various embodiments, each in a schematic perspective view from different directions, eg the processing arrangement 300 ,

The processing arrangement 600 can be a case 602 comprise for receiving components of the first processing source 102 and / or the second processing source 202 , The housing 602 can on the wall element 112w be fastened, eg on the atmosphere side 114a ,

The housing 602 can at least one through hole 606 which show the interior of the housing 602 connects to at least one of the multiple areas. Thus, at least one area (eg, one, two or all areas) of the plurality of areas outside the housing 602 be arranged.

The first processing source 102 can at least partially through at least one through hole 112o of the first attachment area 112b extends through, for example, in the interior of the housing 602 into it. Alternatively or additionally, the second processing source 202 at least partially through at least one passage opening 212o of the second attachment area 212b extends through, for example, in the interior of the housing 602 into it.

The housing 602 can at least one movably mounted plate 602p (Eg a mounting plate) for closing the housing 602 , The plate 602p can optionally have several plate segments, eg two plate segments, as in 6 is illustrated.

In the second area 103 the several areas (compare also 1A ), the first redistribution arrangement may comprise a first media type distributor for distributing the first type of media (eg, the gas). For example, the first media type manifold may include or be formed from a gas manifold. Optionally, the first redistribution arrangement in the second area 103 the plurality of regions comprise a first media type feed control or first media type feed control for controlled feeding of the first media type, for example one or more first mass flow controllers.

For example, a section may have a plurality of gas supply regions, each of which gas supply region can be supplied by means of a mass flow controller with a regulated and / or controlled gas flow into the gas supply region, e.g. through a segmented gas channel. For example, a multi-part gas distributor can be used, which is set up to supply the several gas supply areas. In other words, each gas supply area may be associated with a mass flow controller configured to supply the gas supply area with a (e.g., gaseous) type of media (e.g., a process gas).

Clearly, a controller may have a forward-looking control path and thus illustratively implement a flow control which converts an input variable into an output variable. The control path can also be part of a control loop, so that a control is implemented. The control has, in contrast to the pure forward control on a continuous influence of the output variable on the input variable, which is effected by the control loop (feedback).

In the other second area 203 the several areas (compare also 1A ), the second redistribution arrangement may comprise a further first type of media distributor for distributing the first type of media (eg, the gas). For example, the further first type of media distributor may have or be formed by a gas distributor. Optionally, the second redistribution arrangement in the further second area 203 of the several areas a further first type of media Supply control or further first media type supply control for controlled supply of the first type of media, for example, a further first mass flow controller (mass flow controller).

In the third area 105 the several areas (compare also 1A ), the first redistribution arrangement and / or the second redistribution arrangement can be set up for distributing the second type of medium (eg the liquid). For this purpose, the first redistribution arrangement and / or the second redistribution arrangement (analogous to that described above) in the third area 105 each having a second media type distributor for distributing the second type of media. For example, the second media type manifold may include or be formed from a liquid manifold. Optionally, the first redistribution arrangement and / or the second redistribution arrangement may be in the third area 105 the plurality of regions each having a second media type feed control or second media type feed control for controlled feeding of the first media type, for example, a second liquid flow controller and / or a flow control switch (eg, providing a minimum flow). For the second redistribution arrangement can also be another third area 205 be used (see 12A and 12B ).

A media type delivery control or media type delivery control may include delivery monitoring (e.g., flow monitoring) and / or delivery restriction (e.g., flow restriction) according to various embodiments.

In the interior of the case 602 can the fourth area 107 the multiple areas and another fourth area 207 be arranged. In the fourth area 107 the plurality of areas (eg the first attachment area 112b ), eg on the atmosphere side 114a , can the processing arrangement 600 for coupling (eg for connection) and / or decoupling (eg for disconnecting) the first redistribution arrangement to the first processing source 102 be furnished. In the fourth area 207 the plurality of areas (eg the second attachment area 212b ), eg on the atmosphere side 114a , can the processing arrangement 600 for coupling and / or decoupling the second redistribution arrangement to the second processing source 202 be furnished. The fourth area 107 and / or the further fourth area 207 can be electromagnetically shielded, for example by means of the housing 602 ,

The first media selection or the second media selection may include an electrical communication signal, a hydraulic communication signal, a pneumatic communication signal, and / or an optical communication signal (eg, transmitted via an optical fiber) according to various embodiments. For example, for the first processing source 102 a first electrical communication signal may or may not be provided. Alternatively or additionally, for the second processing source 202 a second electrical communication signal may or may not be provided. Thus, with the two processing sources 102 . 202 be or will be provided for independent communication.

According to various embodiments, an electrical communication signal may include a digital signal and / or an analog signal. For example, the communication signal control commands for controlling the first processing source 102 and / or the second processing source 202 exhibit. Alternatively or additionally, the communication signal measurement data and / or status data of the first processing source 102 and / or the second processing source 202 exhibit.

In a fifth area 109 the plurality of areas may be the processing arrangement 600 be configured for electrical control and / or processing of the first electrical communication signal. For example, in the fifth area 109 a control unit (not shown) arranged in a configuration of the first redistribution arrangement according to the processing source type of the first processing source 102 between the first connection terminal (hidden in the view) and the first processing source 102 is switched. The control unit may be configured to process the first electrical communication signals and the first processing source 102 to control based on the first electrical communication signals. Alternatively or additionally, the control unit can be set up a status and / or measured data of the first processing source 102 to be determined and provided for reading and / or to send.

Alternatively or additionally, the processing arrangement 600 In another fifth area 209 of the plurality of areas for electrically controlling and / or processing the second electrical communication signal. For example, in the other fifth area 209 a further control unit (not shown) may be arranged, which in a configuration of the second redistribution arrangement according to the processing source type of the second processing source 202 between the second connection terminal (hidden in the view) and the second processing source 202 is switched. The further control unit can be set up the second Process communication signals and the second processing source 102 based on the communication signals to control. Alternatively or additionally, the further control unit can be set up a status and / or measured data of the second processing source 202 to be determined and provided for reading and / or to send.

Along the transport area 111f can be a substrate 604 between the first processing source 102 and the second processing source 202 be transported through.

8th illustrates a processing arrangement 800 according to various embodiments in a schematic perspective view, eg similar to the processing arrangement 200 with mounted processing sources 102 . 202 ,

According to various embodiments, the processing source type may be the first processing source 102 a cooling device and at least one heat radiation sink 804 exhibit. The at least one heat radiation sink 804 can from the first cantilever 120 be or be held. For example, the at least one heat radiation sink 804 a heat radiation sink 804 or two heat radiation sinks 804 exhibit.

A third media selection may be used to operate the cooling device. The third media selection may comprise or be formed from at least one liquid which may be used as the cooling liquid.

Optionally, the first processing source 102 at least one gas inlet (not shown), which, for example, on the first Kragträger 120 and / or at the second attachment area 112b can be attached. The at least one gas inlet may, for example, two each on opposite sides of the at least one heat radiation sink 804 have arranged gas inlets. Alternatively or additionally, the at least one gas inlet, for example, one between the two heat radiation sinks 804 the first processing source 102 have arranged gas inlet. The at least one gas inlet may have a plurality of segments and / or may have a plurality of gas inlet openings (eg in each segment). For operating the at least one gas inlet, the third media selection may optionally comprise a gas, for example an inert gas and / or a purge gas.

According to various embodiments, the processing source type may be the second processing source 202 a coating device and at least one magnetron cathode 302 have, as described above, for example, at least one rotatably mounted magnetron cathode 302 (may also be referred to as tube cathode) or alternatively (not shown) a planar magnetron cathode 302 ,

For operation of the coating apparatus, the first media selection may be used, as described above. The first media selection may include at least one working gas, which may be used as a plasma-forming gas, and an electric power for forming and / or maintaining the plasma. Optionally, the first media selection may include a cooling fluid for cooling the at least one magnetron cathode 302 and / or have a reactive gas.

To supply the first processing source 102 with the third media selection, the first redistribution arrangement may be in the third configuration. To supply the second processing source 202 with the first media selection, the second redistribution arrangement in the further first configuration 1200a be.

In the second area 103 For example, a coating device redistribution element, for example a magnetron redistribution element, may or may be coupled in. In the other second area 203 For example, a cooling device redistribution element, eg, a heat radiation sink redistribution element, may be or may be coupled.

Analog can be optional in the third area 105 (or another third area 205 , compare 12A and 12B ) a corresponding redistribution element according to the respective configuration of the first redistribution arrangement 106 (or the second redistribution arrangement) be coupled. Analog can be optional in the fifth range 109 (or another fifth area 209 , compare 12A and 12B ) a corresponding redistribution element according to the respective configuration of the first redistribution arrangement 106 (or the second redistribution arrangement) be coupled.

The first processing source 102 and the second processing source 202 can also be swapped or mounted. Then, the first redistribution arrangement in the first configuration 1200a and the second redistribution arrangement may be in the further third configuration. Then in the second area 103 the cooling device redistribution element, eg, a heat radiation sink redistribution element, may be coupled in and in the further second region 203 For example, the coating apparatus redistribution element, for example a magnetron redistribution element, can be or are coupled in.

Analog can be optional in the third area 105 (or another third area 205 , compare 12A and 12B ) a corresponding redistribution element according to the respective configuration of the first redistribution arrangement 106 (or the second redistribution arrangement) be coupled. Analog can be optional in the fifth range 109 (or another fifth area 209 , compare 12A and 12B ) a corresponding redistribution element according to the respective configuration of the first redistribution arrangement 106 (or the second redistribution arrangement) be coupled.

The first media selection and the third media selection may differ in at least one of the following: the working gas, the reactive gas, the inert gas, the purge gas, the electric power, a liquid.

9 illustrates a processing arrangement 900 according to various embodiments in a schematic perspective view, eg similar to the processing arrangement 200 with mounted processing sources 102 . 202 ,

According to various embodiments, the first processing source type and the second processing source type may be the same. For example, the first processing source type and the second processing source type may be a cooling device, as in FIG 9 is illustrated. It should be understood that the first type of processing source and the second type of processing source may also be another type of processing source (compare 10 or 11 ).

For operation of the first processing source 102 and the second processing source 102 In each case the third media selection can be used. The first redistribution arrangement and the second redistribution arrangement may each be in the third and further third configurations, respectively.

In the second area 103 and in the further second area 203 In each case, a cooling device redistribution element, for example, a heat radiation sink redistribution element, be or be coupled.

Analog can be optional in the third area 105 (or another third area 205 , compare 12A and 12B ) a corresponding redistribution element according to the respective configuration of the first redistribution arrangement 106 (or the second redistribution arrangement) be coupled. Analog can be optional in the fifth range 109 (or another fifth area 209 , compare 12A and 12B ) a corresponding redistribution element according to the respective configuration of the first redistribution arrangement 106 (or the second redistribution arrangement) be coupled.

10 illustrates a processing arrangement 1000 according to various embodiments in a schematic perspective view, eg similar to the processing arrangement 200 with mounted processing sources 102 . 202 ,

According to various embodiments, the first processing source type and the second processing source type may be a heating device. For operation of the first processing source 102 and the second processing source 102 In each case the second media selection can be used. The first redistribution arrangement and the second redistribution arrangement can each be in the second or further second configuration 1200b be.

In the second area 103 and in the further second area 203 For example, a heating device redistribution element, for example a heat radiation source redistribution element, may be or may be coupled in.

Analog can be optional in the third area 105 (or another third area 205 , compare 12A and 12B ) a corresponding redistribution element according to the respective configuration of the first redistribution arrangement 106 (or the second redistribution arrangement) be coupled. Analog can be optional in the fifth range 109 (or another fifth area 209 , compare 12A and 12B ) a corresponding redistribution element according to the respective configuration of the first redistribution arrangement 106 (or the second redistribution arrangement) be coupled.

11 illustrates a processing arrangement 1100 according to various embodiments in a schematic perspective view, eg similar to the processing arrangement 200 with mounted processing sources 102 . 202 ,

According to various embodiments, the first processing source type and the second processing source type may be a coating apparatus. For operation of the first processing source 102 and the second processing source 102 In each case the first media selection can be used. The first redistribution arrangement and the second redistribution arrangement may each be in the first or further first configuration 1200a be.

In the second area 103 and in the further second area 203 can each have a coating device redistribution element, eg a magnetron redistribution element, or be coupled.

Analog can be optional in the third area 105 (or another third area 205 , compare 12A and 12B ) a corresponding redistribution element according to the respective configuration of the first redistribution arrangement 106 (or the second redistribution arrangement) be coupled. Analog can be optional in the fifth range 109 (or another fifth area 209 , compare 12A and 12B ) a corresponding redistribution element according to the respective configuration of the first redistribution arrangement 106 (or the second redistribution arrangement) be coupled.

12A and 12B each illustrate a processing arrangement according to various embodiments in a schematic view, wherein the first redistribution arrangement 106 and / or the second redistribution arrangement 206 in 12A in a first configuration 1200a (or further first configuration 1200a ) and in 12B in a second configuration 1200b (or another second configuration 1200b ) is illustrated.

The plurality of different media types may have at least two different media types, eg, at least three different types of media, eg, at least four different types of media, as in 12 is illustrated.

For example, the first connection terminal 104 and / or the second connection terminal 204 in each case at least one connection 104t of a media type according to a media type for each of the four different types of media.

At least one region of the plurality of regions can be set up such that it is a redistribution element of the first redistribution arrangement 106 can pick up and between the first processing source 102 and the first connection terminal 104 can engage (also referred to as Einkoppelbereich).

For example, the second area 103 be set up as a coupling area. The second area 103 can for receiving and coupling a first redistribution element 106a the first redistribution order 106 according to the first configuration 1200a (for example, a coating device redistribution element). Furthermore, the second area 103 for receiving and coupling a second redistribution element 106b the first redistribution order 106 according to the second configuration 1200b (For example, a heater redistribution element), for example, if the first processing source 102 the second type of processing source is. In other words, in the first configuration 1200a the first redistribution element 106a between the first processing source 102 and the first connection terminal 104 be engaged and in the second configuration 1200b can the second redistribution element 106b between the first processing source 102 and the first connection terminal 104 be engaged. For example, the first redistribution element 106a against the second redistribution element 106b exchanged to the first redistribution arrangement 106 from the first configuration 1200a in the second configuration 1200b to bring or vice versa (also called reconfigure).

Alternatively or additionally, at least one region of the plurality of regions can be set up such that it is a redistribution element of the second redistribution arrangement 206 and between and between the second processing source 202 and the second connection terminal 204 can engage.

For example, the further second area 203 be set up as a coupling area. The second second area 203 can for receiving and coupling another first redistribution element 206b the second redistribution arrangement 206 according to the further first configuration 1200a (For example, a further coating device redistribution element) to be set up. Furthermore, the further second area 203 for receiving and coupling a further second redistribution element 206b the second redistribution arrangement 206 according to the further second configuration 1200b be set up (for example, another heater redistribution element). In other words, in the further first configuration 1200a the further first redistribution element 206a between the second processing source 202 and the second connection terminal 204 be engaged and in the other second configuration 1200b can the further second redistribution element 206b between the second processing source 202 and the second connection terminal 204 be engaged. For example, the further first redistribution element 206a against the further second redistribution element 206b exchanged to the second redistribution arrangement 206 from the further first configuration 1200a in the second configuration 1200b to bring or vice versa (also called reconfigure).

Alternatively or additionally, the second area 103 and the other second area 203 be set up the same way, so be the first one redistribution element 106a , the other first redistribution element 206a , the second redistribution element 106b and the further second redistribution element 206b each in both the second area 103 as well as in the further second area 203 fit. In other words, the interfaces can each be the second area 103 and the second area 203 be set up the same. In addition, the interfaces of the first redistribution element 106a , the further first redistribution element 206a , the second redistribution element 106b and further second redistribution element 206b be set up the same and matching the interfaces of each of the second area 103 and the second area 203 be furnished. Thus, the number of mutually different redistribution elements can be reduced.

For example, the first redistribution element 106a and the other first redistribution element 206a be set up the same. Alternatively or additionally, the second redistribution element 106b and the further second redistribution element 206b be set up the same. For example, the first redistribution arrangement 106 and the second redistribution arrangement 206 be set up the same.

Optionally, the third area 105 and / or the other third area 205 be set up analogously, or the corresponding redistribution elements of the first redistribution arrangement 106 or the second redistribution arrangement 206 so that this in the third area 105 or another third area 205 coupled a corresponding configuration of the first redistribution arrangement 106 or the second redistribution arrangement 206 provide.

Optionally, the fifth range 109 and / or the other fifth area 209 be set up analogously, or the corresponding redistribution elements of the first redistribution arrangement 106 or the second redistribution arrangement 206 so that this in the third area 105 or another third area 205 coupled a corresponding configuration of the first redistribution arrangement 106 or the second redistribution arrangement 206 provide.

Optionally, the fifth range 109 or the other fifth area 209 be set up each distribute at least two types of media. For example, the fifth range 109 or the other fifth area 209 be configured to distribute at least one of the following types of media: an electrical power, a high voltage electrical, an electrical communication signal, a low voltage electrical, a low voltage electrical.

For example, the first redistribution arrangement 106 and / or the second redistribution arrangement 206 each have a redistribution element associated with each type of media of the plurality of different types of media, which can be exchanged, for example, for reconfiguring.

13 illustrates a processing arrangement 1300 according to various embodiments in a schematic view.

The processing arrangement 1300 can have multiple processing sections 130 . 230 each of which has a chamber opening 114O having. For example, a processing section 130 . 230 from her chamber opening 114O be defined or become. Furthermore, the processing arrangement 1300 several wall elements 112w . 212w have, each of which wall element of a chamber opening 114O is assigned, which its associated chamber opening 114O , applied to this, closes (eg vacuum-tight). Furthermore, the processing arrangement 1300 have multiple processing sources, of which at least two processing sources 102 . 202 in at least one type of media used for operation (ie at least in the use of the at least one media type and / or a characteristic size of the at least one media type); wherein at least a first processing source 102 the at least two processing sources 102 . 202 on a first wall element 112w the several wall elements 112w . 212w is attached and at least a second processing source 202 the at least two processing sources 102 . 202 on a second wall element 212w the several wall elements 112w . 212w is attached; wherein the first wall element 112w and the second wall element 212w are set up the same. For example, the at least one first processing source 102 and the at least one second processing source 202 distinguished from each other in their processing source type. According to various embodiments, for each processing section 130 . 230 the processing arrangement 1300 a separate media interface for the at least one processing source employed therein 102 . 202 be or be provided.

Optionally, the processing arrangement 1300 several first processing sources 102 , which on the first wall element 112w are attached, and / or multiple second processing sources 202 , which on the second wall element 212w are fastened. Optionally, at least two processing sources can 102 . 202 of the first multiple processing sources 102 differ in at least one type of media used for operation and / or their processing source type. Alternatively or additionally, at least two processing sources can be used 102 . 202 the multiple second processing sources 202 differ in at least one type of media used for operation and / or their processing source type.

The first wall element 112w and the second wall element 212w in each case at least one connection terminal (not shown, cf. 1B ) for providing a plurality of different types of media, wherein the at least one connection terminal (not shown) of the first wall element 112w and the at least one connection terminal (not shown) of the second wall element 212w are set up the same.

According to various embodiments, reconfiguring the first redistribution arrangement 106 and / or the second redistribution arrangement 206 done so that this in the first configuration 1200a (or further first configuration 1200a ) or in the second configuration 1200b (or further second configuration 1200b ) to be brought.

At least one redistributing element of the plurality of redistributing elements may include at least one of: a media type manifold (e.g., a gas manifold, liquid manifold, electrical manifold); a media type feed control; a media type feed control; a media type supply line assembly (e.g., electrical conductors, liquid pipes, gas pipes, liquid hoses, etc.); an input interface (for recording the media type); an output interface (for outputting the media type); a feed limit (for limiting feed); a feed monitor (for monitoring the feeder); a sensor array (e.g., to determine a characteristic size of the media type).

Two redistribution elements of the plurality of redistribution elements may differ in at least one of: a media type manifold (e.g., a gas manifold, liquid manifold, electrical manifold); a media type feed control; a media type feed control; a media type feeder assembly (e.g., electrical conductors, liquid pipes, gas pipes, liquid hoses, etc.); an input interface (for recording the media type); an output interface (for outputting the media type); a feed limit (for limiting the type of media); a feeder monitor; a sensor array (e.g., to determine a characteristic size of the media type); a configuration of at least one of the aforementioned parts.

Claims (14)

Processing arrangement ( 100a . 100b . 200 ), comprising: a wall element ( 112w . 212w ) for closing a vacuum chamber opening, wherein the wall element ( 112w . 212w ) a fastening area ( 112b ), which is used to fasten a processing source ( 102 ) of a first processing source type ( 102 ) or a second processing source type ( 102b ) on the wall element ( 112w . 212w ) is set up; where the first type of processing source ( 102 ) and the second processing source type ( 102b ) in at least one type of media used for operation; a connection terminal ( 104 ) having a plurality of ports for providing a plurality of different types of media; a redistribution order ( 106 ) connected to the connection terminal ( 104 ) and is set up: • in a first configuration ( 1200a ) a first selection from the plurality of ports according to the method of operating the first processing source type ( 102 ) used with the processing source ( 102 ) when they are attached to the attachment area ( 112b ) and the first processing source type ( 102 ); and in a second configuration ( 1200b ) a second selection from the plurality of ports according to the operation of the second processing source type ( 102b ) used with the processing source ( 102 ) when they are attached to the attachment area ( 112b ) and the second processing source type ( 102b ). Processing arrangement ( 100a . 100b . 200 ) according to claim 1, wherein the first selection of the plurality of terminals and the second selection of the plurality of terminals differ by at least one terminal of the at least one type of media to which the first processing source type ( 102 ) and the second processing source type ( 102b ) to operate. Processing arrangement ( 100a . 100b . 200 ) according to claim 1 or 2, wherein the attachment area ( 112b ) a passage opening ( 112o ) or multiple passage openings ( 112o ) having. Processing arrangement ( 100a . 100b . 200 ) according to one of claims 1 to 3, the redistribution arrangement ( 106 ) comprising: • a first redistribution element ( 106a ) according to the operation of the first processing source type ( 102 ) used media types; A second redistribution element ( 106b ) according to the operation of the second processing source type ( 102b ) used media types; A coupling-in area for coupling in the first redistribution element ( 106a ) or the second redistribution element ( 106b ) between the connection terminal ( 104 ) and the processing source ( 102 ); • where the redistribution order ( 106 ) in the first configuration ( 1200a ), when the first redistribution element ( 106a ) is coupled into the coupling region, and wherein the redistribution arrangement ( 106 ) in the second configuration ( 1200b ), if the second redistribution element ( 106b ) is coupled into the coupling region. Processing arrangement ( 100a . 100b . 200 ) according to one of claims 1 to 4, wherein the connection terminal ( 104 ) provides at least the following types of media: at least one liquid media type; an electric power; at least one gaseous type of media; a communication signal. Processing arrangement ( 100a . 100b . 200 ) according to one of claims 1 to 5, wherein the connection terminal ( 104 ) provides at least one of the following gaseous media types: an inert gas; a heat transfer gas; a reactive gas; a gas mixture; a purge gas; a working gas; a precursor org. Processing arrangement ( 100a . 100b . 200 ) according to one of claims 1 to 6, wherein the connection terminal ( 104 ) provides at least one of the following electrical media types: a high voltage electrical; a low voltage electrical; a low electrical voltage. Processing arrangement ( 100a . 100b . 200 ) according to claim 7, further comprising: a control unit which in at least the first configuration ( 1200a ) and / or the second configuration ( 1200b ) between the connection terminal ( 104 ) and the processing source ( 102 ), if the processing source ( 102 ) at the attachment area ( 112b ) and which is set up to process the electrical communication signals and the processing source ( 102 ) based on the electrical communication signals. Processing arrangement ( 100a . 100b . 200 ) according to one of claims 1 to 8, further comprising: the processing source ( 102 ), which is a first type of processing source ( 102 ) or a second processing source type ( 102b ), wherein a first selection from the plurality of different media types for the operation of the first processing source type ( 102 ) and a second selection of the plurality of different media types for operating the second processing source type ( 102b ) in at least one type of media. Processing arrangement ( 100a . 100b . 200 ) according to claim 9, wherein the first processing source type ( 102 ) and / or the second processing source type ( 102b ) one of the following are: a coating device; a cooling device; a heater; an implantation device; a cleaning device; an exposure device; an etching device; a gas separation device; an evacuation device. Processing arrangement ( 100a . 100b . 200 ) according to one of claims 1 to 10, further comprising: at least one cantilever beam ( 120 . 220 ) extending from the wall element ( 112w . 212w ) extends for supporting one at the attachment area ( 112b ) attached processing source ( 102 ). Processing arrangement ( 100a . 100b . 200 ) according to claim 11, wherein the redistribution arrangement ( 106 ) in the at least one Kragträger ( 120 . 220 ) extends into it. Processing arrangement ( 100a . 100b . 200 ) according to one of claims 1 to 12, further comprising: a further connection terminal ( 204 ) having a plurality of further ports for providing at least a portion of the plurality of different media types; the wall element ( 112w . 212w ) another attachment area ( 212b ), which is equal to the mounting area ( 112b ) is set up; the redistribution arrangement ( 106 ) for uncoupling from the connection terminal ( 104 ) and domes with the further connection terminal ( 204 ) and is also set up: • in a further first configuration ( 1200a ) the first selection from at least a part of the several further connections according to the method of operation of the first processing source type ( 102 ) used with the processing source ( 102 ) when they are connected to the further attachment area ( 212b ) and the first processing source type ( 102 ); and in a further second configuration ( 1200b ) the second selection from at least a part of the plurality of further terminals according to the operation of the second processing source type ( 102b ) used with the processing source ( 102 ) when they are connected to the further attachment area ( 212b ) and the second processing source type ( 102b ). A method, comprising: providing a connection terminal ( 104 ) having a plurality of ports for providing a plurality of different types of media; • Provision of a processing source ( 102 ) of a first processing source type ( 102 ) or a second processing source type ( 102b ), the first type of processing source ( 102 ) and the second processing source type ( 102 ) in at least one type of media used for operation; • reconfiguring a redistribution arrangement ( 106 ), whereby the redistribution order ( 106 ) is brought into a first configuration or brought into a second configuration, wherein the redistribution arrangement ( 106 ): in the first configuration ( 1200a ) a first selection from the plurality of ports according to the method of operating the first processing source type ( 102 ) used with the processing source ( 102 ) couples; and in the second configuration ( 1200b ) a second selection from the plurality of ports according to the operation of the second processing source type ( 102b ) used with the processing source ( 102 ) couples.

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