DE102009027338A1 - Hall-Sensorelement und Verfahren zur Messung eines Magnetfelds - Google Patents
Hall-Sensorelement und Verfahren zur Messung eines Magnetfelds Download PDFInfo
- Publication number
- DE102009027338A1 DE102009027338A1 DE102009027338A DE102009027338A DE102009027338A1 DE 102009027338 A1 DE102009027338 A1 DE 102009027338A1 DE 102009027338 A DE102009027338 A DE 102009027338A DE 102009027338 A DE102009027338 A DE 102009027338A DE 102009027338 A1 DE102009027338 A1 DE 102009027338A1
- Authority
- DE
- Germany
- Prior art keywords
- sensor element
- hall sensor
- active area
- upper contact
- lower contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 36
- 238000000034 method Methods 0.000 title claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 46
- 239000004065 semiconductor Substances 0.000 claims description 28
- 238000005259 measurement Methods 0.000 claims description 16
- 238000010079 rubber tapping Methods 0.000 claims description 6
- 230000004907 flux Effects 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000000926 separation method Methods 0.000 description 7
- 238000009987 spinning Methods 0.000 description 5
- 239000013598 vector Substances 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005294 ferromagnetic effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 230000005355 Hall effect Effects 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/07—Hall effect devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/07—Hall effect devices
- G01R33/072—Constructional adaptation of the sensor to specific applications
- G01R33/075—Hall devices configured for spinning current measurements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N52/00—Hall-effect devices
- H10N52/101—Semiconductor Hall-effect devices
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Hall/Mr Elements (AREA)
- Measuring Magnetic Variables (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102009027338A DE102009027338A1 (de) | 2009-06-30 | 2009-06-30 | Hall-Sensorelement und Verfahren zur Messung eines Magnetfelds |
| EP10715871.9A EP2449394B1 (de) | 2009-06-30 | 2010-04-30 | Hall-sensorelement und verfahren zur messung eines magnetfelds |
| PCT/EP2010/055904 WO2011000601A1 (de) | 2009-06-30 | 2010-04-30 | Hall-sensorelement und verfahren zur messung eines magnetfelds |
| US13/381,505 US9063187B2 (en) | 2009-06-30 | 2010-04-30 | Hall sensor element and method for measuring a magnetic field |
| JP2012518052A JP5496329B2 (ja) | 2009-06-30 | 2010-04-30 | ホールセンサ素子および磁界を測定する方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102009027338A DE102009027338A1 (de) | 2009-06-30 | 2009-06-30 | Hall-Sensorelement und Verfahren zur Messung eines Magnetfelds |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102009027338A1 true DE102009027338A1 (de) | 2011-01-05 |
Family
ID=42236350
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102009027338A Withdrawn DE102009027338A1 (de) | 2009-06-30 | 2009-06-30 | Hall-Sensorelement und Verfahren zur Messung eines Magnetfelds |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9063187B2 (https=) |
| EP (1) | EP2449394B1 (https=) |
| JP (1) | JP5496329B2 (https=) |
| DE (1) | DE102009027338A1 (https=) |
| WO (1) | WO2011000601A1 (https=) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102011017096A1 (de) * | 2011-04-14 | 2012-10-18 | Austriamicrosystems Ag | Hall-Sensor-Halbleiterbauelement und Verfahren zum Betrieb des Hall-Sensor-Halbleiterbauelementes |
| EP2806283A2 (de) | 2013-05-22 | 2014-11-26 | Micronas GmbH | Dreidimensionaler hallsensor zum detektieren eines räumlichen magnetfeldes |
| DE102018009110A1 (de) * | 2018-11-21 | 2020-05-28 | Tdk-Micronas Gmbh | SCI-Halbleiterstruktur und Verfahren zur Herstellung einer SOI-Halbleiterstruktur |
| WO2020104998A1 (en) * | 2018-11-21 | 2020-05-28 | Lfoundry S.R.L. | Hall integrated circuit and corresponding method of manufacturing of a hall integrated circuit using wafer stacking |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5815986B2 (ja) * | 2010-07-05 | 2015-11-17 | セイコーインスツル株式会社 | ホールセンサ |
| US9103868B2 (en) | 2011-09-15 | 2015-08-11 | Infineon Technologies Ag | Vertical hall sensors |
| DE102012216388A1 (de) | 2011-09-16 | 2013-03-21 | Infineon Technologies Ag | Hall-sensoren mit erfassungsknoten mit signaleinprägung |
| US9484525B2 (en) * | 2012-05-15 | 2016-11-01 | Infineon Technologies Ag | Hall effect device |
| US9018948B2 (en) | 2012-07-26 | 2015-04-28 | Infineon Technologies Ag | Hall sensors and sensing methods |
| US9170307B2 (en) | 2012-09-26 | 2015-10-27 | Infineon Technologies Ag | Hall sensors and sensing methods |
| US9164155B2 (en) | 2013-01-29 | 2015-10-20 | Infineon Technologies Ag | Systems and methods for offset reduction in sensor devices and systems |
| US9252354B2 (en) | 2013-01-29 | 2016-02-02 | Infineon Technologies Ag | Vertical hall device with highly conductive opposite face node for electrically connecting first and second hall effect regions |
| US9605983B2 (en) | 2014-06-09 | 2017-03-28 | Infineon Technologies Ag | Sensor device and sensor arrangement |
| US9823168B2 (en) | 2014-06-27 | 2017-11-21 | Infineon Technologies Ag | Auto tire localization systems and methods utilizing a TPMS angular position index |
| EP2966462B1 (en) * | 2014-07-11 | 2022-04-20 | Senis AG | Vertical hall device |
| US10693057B2 (en) | 2016-05-04 | 2020-06-23 | Tdk-Micronas Gmbh | Sensor component with cap over trench and sensor elements |
| US10103320B2 (en) * | 2016-05-04 | 2018-10-16 | Tdk-Micronas Gmbh | Component with reduced stress forces in the substrate |
| US10534045B2 (en) * | 2017-09-20 | 2020-01-14 | Texas Instruments Incorporated | Vertical hall-effect sensor for detecting two-dimensional in-plane magnetic fields |
| CN107966669B (zh) * | 2017-12-19 | 2019-11-08 | 大连理工大学 | 适用于高温工作环境的半导体三维霍尔传感器及其制作方法 |
| WO2019219941A1 (en) * | 2018-05-18 | 2019-11-21 | Lfoundry S.R.L. | Vertical hall elements having reduced offset and method of manufacturing thereof |
| US10424616B1 (en) * | 2018-06-20 | 2019-09-24 | Globalfoundries Singapore Pte. Ltd. | Integrated circuit devices including vertical and lateral hall elements, and methods for fabricating the same |
| DE102019000165B4 (de) * | 2019-01-14 | 2024-06-27 | Tdk-Micronas Gmbh | Halbleitersensorstruktur |
| US12356869B2 (en) | 2019-07-08 | 2025-07-08 | Lfoundry S.R.L. | Hall integrated sensor and corresponding manufacturing process |
| US12578361B2 (en) * | 2024-02-07 | 2026-03-17 | Semiconductor Components Industries, Llc | Integrated multi-component hall effect sensor |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102006017910A1 (de) | 2006-04-18 | 2007-10-25 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vertikales Hall-Sensorelement |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH669068A5 (de) * | 1986-04-29 | 1989-02-15 | Landis & Gyr Ag | Integrierbares hallelement. |
| JPH01251763A (ja) * | 1988-03-31 | 1989-10-06 | Res Dev Corp Of Japan | 縦型ホール素子と集積化磁気センサ |
| JPH02192781A (ja) * | 1989-01-20 | 1990-07-30 | Mitsubishi Electric Corp | ホール素子および磁気センサシステム |
| US5572058A (en) * | 1995-07-17 | 1996-11-05 | Honeywell Inc. | Hall effect device formed in an epitaxial layer of silicon for sensing magnetic fields parallel to the epitaxial layer |
| ATE308761T1 (de) * | 1998-03-30 | 2005-11-15 | Sentron Ag | Magnetfeldsensor |
| JP2006147710A (ja) * | 2004-11-17 | 2006-06-08 | Denso Corp | 縦型ホール素子 |
| JP2006210731A (ja) | 2005-01-28 | 2006-08-10 | Denso Corp | ホール素子およびその製造方法 |
| JP4784186B2 (ja) * | 2005-07-19 | 2011-10-05 | 株式会社デンソー | 縦型ホール素子およびその磁気検出感度調整方法 |
| JP4940965B2 (ja) * | 2007-01-29 | 2012-05-30 | 株式会社デンソー | 回転センサ及び回転センサ装置 |
| US7782050B2 (en) * | 2008-04-11 | 2010-08-24 | Infineon Technologies Ag | Hall effect device and method |
| US8159219B2 (en) * | 2008-10-20 | 2012-04-17 | University Of North Carolina At Charlotte | MEMS 2D and 3D magnetic field sensors and associated manufacturing method |
| US8093891B2 (en) * | 2009-03-02 | 2012-01-10 | Robert Bosch Gmbh | Vertical Hall Effect sensor |
-
2009
- 2009-06-30 DE DE102009027338A patent/DE102009027338A1/de not_active Withdrawn
-
2010
- 2010-04-30 US US13/381,505 patent/US9063187B2/en active Active
- 2010-04-30 WO PCT/EP2010/055904 patent/WO2011000601A1/de not_active Ceased
- 2010-04-30 JP JP2012518052A patent/JP5496329B2/ja not_active Expired - Fee Related
- 2010-04-30 EP EP10715871.9A patent/EP2449394B1/de not_active Not-in-force
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102006017910A1 (de) | 2006-04-18 | 2007-10-25 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vertikales Hall-Sensorelement |
Non-Patent Citations (1)
| Title |
|---|
| C. Schott et al., CMOS Single-Chip Electronic Compass with Microcontroller, in: H. Casier et al. [Hrsg.], Analog Circuit Design: Sensors, Actuators and Power Drivers; Integrated Power Amplifiers from Wireline to RF; Very High Frequency Front Ends, S. 55-69, Springer Science + Business Media B. V., 2008 |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102011017096A1 (de) * | 2011-04-14 | 2012-10-18 | Austriamicrosystems Ag | Hall-Sensor-Halbleiterbauelement und Verfahren zum Betrieb des Hall-Sensor-Halbleiterbauelementes |
| US9349943B2 (en) | 2011-04-14 | 2016-05-24 | Ams Ag | Hall sensor semiconductor component and method for operating the hall sensor semiconductor component |
| EP2806283A2 (de) | 2013-05-22 | 2014-11-26 | Micronas GmbH | Dreidimensionaler hallsensor zum detektieren eines räumlichen magnetfeldes |
| DE102013209514A1 (de) | 2013-05-22 | 2014-11-27 | Micronas Gmbh | Dreidimensionaler Hallsensor zum Detektieren eines räumlichen Magnetfeldes |
| EP2806283A3 (de) * | 2013-05-22 | 2015-03-25 | Micronas GmbH | Dreidimensionaler hallsensor zum detektieren eines räumlichen magnetfeldes |
| US9494661B2 (en) | 2013-05-22 | 2016-11-15 | Micronas Gmbh | Three-dimensional hall sensor for detecting a spatial magnetic field |
| DE102018009110A1 (de) * | 2018-11-21 | 2020-05-28 | Tdk-Micronas Gmbh | SCI-Halbleiterstruktur und Verfahren zur Herstellung einer SOI-Halbleiterstruktur |
| WO2020104998A1 (en) * | 2018-11-21 | 2020-05-28 | Lfoundry S.R.L. | Hall integrated circuit and corresponding method of manufacturing of a hall integrated circuit using wafer stacking |
| CN113169270A (zh) * | 2018-11-21 | 2021-07-23 | 拉芳德利责任有限公司 | 霍尔集成电路以及使用晶片堆叠制造霍尔集成电路的对应方法 |
| US11114501B2 (en) | 2018-11-21 | 2021-09-07 | Tdk-Micronas Gmbh | SOI semiconductor structure and method for manufacturing an SOI semiconductor structure |
| US11538855B2 (en) | 2018-11-21 | 2022-12-27 | Tdk-Micronas Gmbh | SOI semiconductor structure and method for manufacturing an SOI semiconductor structure |
| US12048166B2 (en) | 2018-11-21 | 2024-07-23 | Lfoundry S.R.L. | Hall integrated circuit and corresponding method of manufacturing of a hall integrated circuit using wafer stacking |
| DE102018009110B4 (de) | 2018-11-21 | 2025-04-03 | Tdk-Micronas Gmbh | SOI-Halbleiterstruktur und Verfahren zur Herstellung einer SOI-Halbleiterstruktur |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012531757A (ja) | 2012-12-10 |
| WO2011000601A1 (de) | 2011-01-06 |
| US9063187B2 (en) | 2015-06-23 |
| EP2449394B1 (de) | 2013-08-21 |
| US20120169329A1 (en) | 2012-07-05 |
| JP5496329B2 (ja) | 2014-05-21 |
| EP2449394A1 (de) | 2012-05-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2449394B1 (de) | Hall-sensorelement und verfahren zur messung eines magnetfelds | |
| DE102012212606B4 (de) | Vorrichtung zur Erfassung eines Magnetfelds, vertikaler Hall-Sensor und Magneterfasssungsverfahren | |
| EP3224639B1 (de) | Magnetoresistive wheatstone-messbrücke und winkelsensor mit zumindest zwei derartigen messbrücken | |
| DE19933209C2 (de) | Magnetfeldsensor mit Riesenmagnetoresistenzeffekt-Elementen sowie Verfahren und Vorrichtung zu seiner Herstellung | |
| DE102009061277B3 (de) | Hall-Effekt-Bauelement, Betriebsverfahren hierfür und Magnetfelderfassungsverfahren | |
| DE102008054314B4 (de) | Integrierter lateraler Kurzschluss für eine vorteilhafte Modifizierung einer Stromverteilungsstruktur für magnetoresistive XMR-Sensoren und Verfahren zur Herstellung | |
| DE10150955C1 (de) | Vertikaler Hall-Sensor | |
| DE112010006149B4 (de) | Dreiachsen-Magnetfeldsensor | |
| EP1540748B2 (de) | Magnetfeldsensor mit einem hallelement | |
| DE102012025777B3 (de) | Elektronikbauelement, das ein Hall-Effekt-Gebiet mit drei Kontakten umfasst, und Erfassungsverfahren | |
| DE102013202595B4 (de) | Vorrichtung mit vertikaler Hall-Vorrichtung | |
| DE102020130454B4 (de) | Magnetsensor | |
| EP2806283A2 (de) | Dreidimensionaler hallsensor zum detektieren eines räumlichen magnetfeldes | |
| DE102015117547B4 (de) | Magnetoresistive Vorrichtung | |
| DE102012212594A1 (de) | Elektronische vorrichtung mit ringverbundenen hall-effekt-regionen | |
| WO2000004555A2 (de) | Speicherzellenanordnung, bei der ein elektrischer widerstand eines speicherelements eine information darstellt und durch ein magnetfeld beeinflussbar ist, und verfahren zu deren herstellung | |
| DE102011017096A1 (de) | Hall-Sensor-Halbleiterbauelement und Verfahren zum Betrieb des Hall-Sensor-Halbleiterbauelementes | |
| DE102021105660A1 (de) | Magnetischer sensor und sein herstellungsverfahren | |
| DE112016000720T5 (de) | Sensoranordnung zur Positionserfassung | |
| DE102015219002A1 (de) | In einem Ring verbundene Elemente eines vertikalen Hall-Effekt-Sensors mit drei Kontakten und verwandte Vorrichtungen, Systeme und Verfahren | |
| DE10011176C2 (de) | Zweidimensionaler Lagesensor mit magnetischem Widerstand | |
| DE102016111995A1 (de) | Magnetsensorbauelement und umdrehungszähler | |
| DE112013003351T5 (de) | Magnetsensor | |
| DE102018120192A1 (de) | Magnetsensor | |
| DE102018201724B4 (de) | Hall-Sensor-Vorrichtung und Verfahren zum Erfassen eines Magnetfelds |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R005 | Application deemed withdrawn due to failure to request examination |