DE102008049175B8 - Process for the treatment of a SiC surface - Google Patents

Process for the treatment of a SiC surface Download PDF

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Publication number
DE102008049175B8
DE102008049175B8 DE200810049175 DE102008049175A DE102008049175B8 DE 102008049175 B8 DE102008049175 B8 DE 102008049175B8 DE 200810049175 DE200810049175 DE 200810049175 DE 102008049175 A DE102008049175 A DE 102008049175A DE 102008049175 B8 DE102008049175 B8 DE 102008049175B8
Authority
DE
Germany
Prior art keywords
treatment
sic surface
sic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE200810049175
Other languages
German (de)
Other versions
DE102008049175B3 (en
Inventor
Gerd Dr. Trachta
Bruno Brütting
Sabine Storm
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sicrystal GmbH
Original Assignee
Sicrystal AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sicrystal AG filed Critical Sicrystal AG
Priority to DE200810049175 priority Critical patent/DE102008049175B8/en
Application granted granted Critical
Publication of DE102008049175B3 publication Critical patent/DE102008049175B3/en
Publication of DE102008049175B8 publication Critical patent/DE102008049175B8/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002—Preparing wafers
    • H01L21/02005—Preparing bulk and homogeneous wafers
    • H01L21/02008—Multistep processes
    • H01L21/0201—Specific process step
    • H01L21/02024—Mirror polishing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic System
    • H01L29/1608—Silicon carbide
DE200810049175 2008-09-26 2008-09-26 Process for the treatment of a SiC surface Active DE102008049175B8 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE200810049175 DE102008049175B8 (en) 2008-09-26 2008-09-26 Process for the treatment of a SiC surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE200810049175 DE102008049175B8 (en) 2008-09-26 2008-09-26 Process for the treatment of a SiC surface

Publications (2)

Publication Number Publication Date
DE102008049175B3 DE102008049175B3 (en) 2010-04-08
DE102008049175B8 true DE102008049175B8 (en) 2010-07-15

Family

ID=41795328

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200810049175 Active DE102008049175B8 (en) 2008-09-26 2008-09-26 Process for the treatment of a SiC surface

Country Status (1)

Country Link
DE (1) DE102008049175B8 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002050204A1 (en) * 2000-12-20 2002-06-27 Bayer Aktiengesellschaft Method for the chemical-mechanical polishing of isolation layers based on sti technology at elevated temperatures
WO2005099388A2 (en) * 2004-04-08 2005-10-27 Ii-Vi Incorporated Chemical-mechanical polishing of sic surfaces using hydrogen peroixde or ozonated water solutions in combination with colloidal abrasive

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002050204A1 (en) * 2000-12-20 2002-06-27 Bayer Aktiengesellschaft Method for the chemical-mechanical polishing of isolation layers based on sti technology at elevated temperatures
WO2005099388A2 (en) * 2004-04-08 2005-10-27 Ii-Vi Incorporated Chemical-mechanical polishing of sic surfaces using hydrogen peroixde or ozonated water solutions in combination with colloidal abrasive

Also Published As

Publication number Publication date
DE102008049175B3 (en) 2010-04-08

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Legal Events

Date Code Title Description
8381 Inventor (new situation)

Inventor name: TRACHTA, GERD, DR., 90427 NUERNBERG, DE

Inventor name: STORM, SABINE, 96135 STEGAURACH, DE

Inventor name: BRUETTING, BRUNO, 91327 GOESSWEINSTEIN, DE

8396 Reprint of erroneous front page
8364 No opposition during term of opposition
R082 Change of representative

Representative=s name: RAU, SCHNECK & HUEBNER PATENT- UND RECHTSANWAE, DE

R081 Change of applicant/patentee

Owner name: SICRYSTAL AG, DE

Free format text: FORMER OWNER: SICRYSTAL AG, 91058 ERLANGEN, DE

Effective date: 20120926

Owner name: SICRYSTAL GMBH, DE

Free format text: FORMER OWNER: SICRYSTAL AG, 91058 ERLANGEN, DE

Effective date: 20120926

R082 Change of representative

Representative=s name: RAU, SCHNECK & HUEBNER PATENT- UND RECHTSANWAE, DE

Effective date: 20120926

Representative=s name: RAU, SCHNECK & HUEBNER PATENTANWAELTE RECHTSAN, DE

Effective date: 20120926

R081 Change of applicant/patentee

Owner name: SICRYSTAL GMBH, DE

Free format text: FORMER OWNER: SICRYSTAL AG, 90411 NUERNBERG, DE

R082 Change of representative

Representative=s name: RAU, SCHNECK & HUEBNER PATENTANWAELTE RECHTSAN, DE