DE102008041301A1 - Arrangement, particularly for microlithography, has component of optical device, and manipulation element that is formed to produce counter force against operating force by elastic restoring force - Google Patents

Abstract

The arrangement has a component of an optical device, and a manipulation element that is formed to produce a counter force against an operating force by an elastic restoring force in an operating condition. The manipulation force causes the manipulation of the component. The manipulation force is produced as resultant of the operating force and the elastic restoring force. Independent claims are included for the following: (1) a manipulator, particularly for use in microlithography; (2) an optical illustration device, particularly for microlithography; (3) a method for activating manipulation of a component of an optical device; and (4) an optical illustration method, particularly for microlithography.

Description

BACKGROUND OF THE INVENTION

The The present invention relates to an arrangement for a optical device, a manipulator for an optical Device, an optical imaging device, such a Arrangement comprises a method for manipulating a component an optical device and an optical imaging method, which is such a method of manipulating the component of a optical device used. The invention can be in connection with any optical devices or optical Apply imaging method. In particular, she lets herself in connection with in the manufacture of microelectronic Circuits used to use microlithography.

Especially in the field of microlithography, it is in addition to use with as high precision as possible Components required, among other things, the position and geometry the components of the imaging device, so for example the optical elements such as lenses, mirrors or grids but also the used masks and substrates, in operation as possible to set precisely according to predetermined setpoints, to achieve a correspondingly high image quality. The high accuracy requirements, in the microscopic range on the order of a few nanometers or less are not least a consequence of the constant Demand, the dissolution of the microelectronic circuits manufacturing used optical systems to increase the miniaturization to advance the microelectronic circuits to be produced.

In order to achieve the desired position and / or geometry of the components in question, active manipulators are frequently used which exert a corresponding manipulation force on the component. Piezoactuators, Lorentz actuators, pneumatic bellows actuators or the like are frequently used in particular in the field of microlithography. Likewise in the US 2006/018045 A1 ( Moeller et al. ), of the DE 10 2005 044 716 A1 (Münster) as well as in the German patent application no. 10 2007 019 570.4 Applicant (the entire disclosure of each of which is incorporated herein by reference) proposes to use electrostrictive materials to generate a manipulating force. However, these actuator types each have significant disadvantages.

So can be with the known piezo actuators Although simple Way in a wide range variable manipulation forces produce. However, they have the disadvantage that the piezo elements used on the one hand only a comparatively small travel available make, so for larger travel complicated Gear are required. On the other hand, the piezoelectric elements are comparatively brittle and sensitive to shear and tensile stresses, so that it only loads under relatively well-defined directions may be and in particular in shock loads there is a high risk of damage. The comparatively high rigidity of the piezo elements finally brings the drawback that for certain applications, especially in the field of microlithography, an additional mechanical decoupling required to be manipulated component is to initiate parasitic forces and To avoid moments in the component.

Lorentz actuators Although they have the advantage that they have a very low rigidity. The disadvantage, however, is that they are often limited Provide travel and low manipulation forces. In addition, they have a comparatively high power loss, especially in thermally sensitive optical devices leads to problems or a complex heat dissipation require.

pneumatic Although bellows actuators may possibly have high manipulation forces and provide large travel paths. she However, they have the disadvantage that they have a comparatively large amount of space claim and also only loads in comparatively accurate defined direction may be subjected to the To minimize the risk of damage. Similar like the piezo elements have bellows actuators in operation a comparatively high rigidity, which also brings the disadvantage here, that for certain applications, especially in the field microlithography, an additional mechanical decoupling to the component to be manipulated is required to initiate parasitic forces and moments in the component to avoid.

Another type of actuators are the so-called electroactive polymer actuators (EAP), as for example from the publication "Overview and Recent Advances in Polymer Actuators" (P. Sommer-Larsen, R. Kornbluh, ACTUATOR 2006, 10th International Conference on New Actuators, June 14-16, 2006, Bremen, DE) are known (the disclosure of which is incorporated herein by reference). at these are actuators that are manufactured using polymer materials and undergo a change in length in an effective direction when an electrical voltage is applied. In these electroactive polymer actuators, one often distinguishes between so-called electrostrictive polymer actuators, in which the polymer structure is changed by the applied electric field to effect the change in length, and actuators often referred to as dielectric elastomer actuators, depending on the cause of the change in length of the polymer the change in length is effected mechanically by the electrostatic attraction forces of two electrodes, between which the polymer is arranged.

These electroactive polymer actuators are also used in the field of optical devices to affect the position of components of these devices, such as US 2006/0028742 A1 ( Yamashita et al. ) (the disclosure of which is incorporated herein by reference), or geometry of components of these devices, as disclosed in, for example, the publication M. Bergemann, T.Martin, G. Bretthauer, ACTUATOR 2006, 10th International Conference on New Actuators, June 14-16, 2006, Bremen, "Systematic Selection and Design of a Ring Actuator for the Deformation of Elastic Lens" DE), the US 2006/0264015 A1 ( Hyde et al. ) and the US 7,092,138 B2 ( Wang et al .) (the disclosure of which is incorporated herein by reference).

The Electroactive polymer actuators have the advantage of being compatible with Allow them to realize comparatively high travel ranges. Thus, in the known actuators relative changes in length up to 30% possible, wherein in the polymers used even relative length changes of the order of magnitude from 100% up to 300% are possible. In addition, they are comparatively inexpensive and have a low lateral stiffness, so that they already have a mechanical decoupling available which introduce the introduction of parasitic forces and moments in the relevant component in an advantageous manner reduced.

at the known electroactive polymer actuators for optical Applications will contribute to the positive length change Apply a voltage to the actuator immediately to create a manipulation movement or manipulation force, which the desired manipulation of the component in question optical device causes. Especially for precision applications, as required in the field of microlithography is It is problematic here that the positive change in length due to the low lateral stiffness of the polymer no has sufficiently precise direction or effective direction, so either a lower precision of the manipulation is achieved or an elaborate additional lateral guidance is required.

BRIEF SUMMARY OF THE INVENTION

Of the The present invention is therefore based on the object, an arrangement for an optical device, a manipulator for an optical device, an optical imaging device, a method for manipulating a component of an optical Device or an optical imaging method available to provide, which does not have the disadvantages mentioned above or at least to a lesser extent and in particular to simple ones Make a reliable, precise manipulation of components of an optical device.

Of the The present invention is based on the finding that a such reliable and precise manipulation of Components of an optical device is possible, if an electroactive polymer element of the manipulator not immediately is used to generate the manipulation force, but the respective elastic restoring force of the polymer element as a counterforce is used for an otherwise generated restoring force, to arrive at a resulting manipulation force, which the desired manipulation causes. This has the advantage that the elastic restoring force of the polymer element despite its low rigidity, a well-defined effective direction so that manipulation with high precision is possible.

With In other words, the electroactive polymer element according to the invention does not become itself used to generate the manipulation force, but serves rather, as a control for the manipulation force, by talking about its elastic restoring force influences the resulting manipulation force.

In this case, electroactive polymer actuators having an arbitrary active principle and any structure can be used as the electroactive polymer element. The selection of the suitable electroactive polymer element depends in particular on the one hand on the manipulation force to be achieved and / or the manipulation way. On the other hand, it naturally depends on the accuracy to be achieved when setting the manipulation force and / or the manipulation path.

The The present invention can be basically use in conjunction with any optical applications, where a manipulation of the position and / or geometry of a Component of an optical device is required. Especially Advantageously, it can be in the field of microlithography because the electroactive polymer elements because of their low Stiffness already out of itself a mechanical decoupling provide those in the field of microlithography particularly critical introduction of parasitic forces and moments in the components of the optical device already largely turns off, so in this context if sufficient high precision significantly less effort than the known Actuator arrangements is to operate.

One Another advantage of the present invention is that thanks to the high degree of manipulation precision achieved in a simple way particularly simple manipulation arrangements with few components, especially few moving components, can be realized.

One The first object of the present invention is therefore an arrangement especially for microlithography, with one component an optical device and a manipulation device for actively manipulating the component along a direction of action. The manipulation device comprises at least one with the component connected electroactive polymer element as a manipulation element. The manipulation element can be connected to a control device via which the manipulation element for the controlled manipulation of Component with an extension of the manipulation element along the effective direction causing electrical voltage acted upon is. The manipulation element is designed to be in at least an operating condition by an elastic restoring force to generate a counterforce against a force, wherein the Manipulation force, which is the manipulation of the component along the effective direction causes, as a resultant of the force and the elastic restoring force results.

One second subject of the present invention is an arrangement especially for microlithography, with one component an optical device and a manipulation device for actively manipulating the component along a direction of action, wherein the manipulation device at least one with the component connected electroactive polymer element as a manipulation element includes. The manipulation element is provided with a control device connectable, via which the manipulation element to the controlled Manipulation of the component with an extension of the manipulation element acted upon along the direction of action causing electrical voltage is. The manipulation element is in at least one operating state in a direction parallel to the direction of action, subjected to a tensile stress as a mechanical bias.

With the parallel to the direction of action on train pre-tensioned manipulation element can be a particularly favorable constellation achieve, since hereby in the manipulation element an elastic Return force achievable with a precisely defined direction is, whereby a particularly precise manipulation possible becomes.

Of the The inventive concept explained above can be arranged in an arrangement from several different, possibly even far from each other be realized spaced components. But it is also possible to realize them in an optionally integrated unit. It is understood that the component to be manipulated optionally again composed of several elements. In particular, it can be provided that the component to be manipulated in addition to the actual element to be manipulated (for example an optically active element) of any kind gear or the like. This transmission can then between the actually element to be manipulated and the manipulation device be connected and the movements or forces of the manipulation device implement so that they differ in one of the direction of effect Direction transferred to the actually manipulated element become.

According to the first subject of the present invention, therefore, a further, third object of the present invention is a manipulator, in particular for use in microlithography, with an electroactive polymer element. The electroactive polymer element forms an active manipulation element and can be connected to a control device, via which the manipulation element for controlled manipulation can be acted upon by an electrical voltage which causes an expansion of the manipulation element along the direction of action. Furthermore, a biasing means is provided for generating a force acting along the direction of action force, wherein the manipulation element is adapted to, in at least one operating state by an elastic restoring force, a counterforce against the Force to generate.

Corresponding the second subject of the present invention is therefore a Another, fourth subject of the present invention is a manipulator, especially for use in microlithography, with an electroactive polymer element. The electroactive polymer element forms an active manipulation element and is equipped with a control device connectable, via which the manipulation element to the controlled Manipulation with an extension of the manipulation element acted upon along the direction of action causing electrical voltage is. Furthermore, a biasing device is provided, which is the Manipulation element in at least one operating state in one Direction that runs parallel to the direction of action, with a tensile stress applied as a mechanical bias.

One Fifth object of the present invention is a corresponding optical imaging device, in particular for microlithography, with a lighting device, a A mask device for receiving a projection pattern comprising Mask, a projection device with an optical element group and a substrate device for receiving a substrate. The Lighting device is to illuminate the projection pattern formed while the optical element group for imaging of the projection pattern is formed on the substrate. The lighting device and / or the mask device and / or the projection device and / or the substrate device comprises at least one arrangement according to the first or second aspect of the invention described above.

With This optical imaging device can be described above Realize variants and advantages to the same extent, so in this respect to the above statements is referenced.

One Another, sixth subject of the present invention is a Method for actively manipulating a component of an optical Device, in particular a device for microlithography, at the component along a manipulation element along a direction of action is actively manipulated. The manipulation element is an electroactive polymer element used for controlled manipulation the component having an extension of the manipulation element acted upon along the direction of action causing electrical voltage is. The manipulation element generates in at least one operating state an elastic restoring force a counterforce against a Force, whereby the manipulation force, which is the manipulation the component along the effective direction causes, as a resultant the restoring force and the elastic restoring force results. It should be noted that the term "taxes" in the present application is used in a generalized manner and, unless expressly so otherwise defined, both a tax in the regulatory sense as well as a rule in the regulatory sense.

One Another seventh object of the present invention is finally an optical imaging method, in particular for the Microlithography in which a lighting device is a projection pattern a mask device illuminated and the projection pattern means the optical elements of a projection device on a substrate a substrate device is imaged. At least one component of Lighting device and / or the mask device and / or the projection device and / or the substrate device is with a method according to the sixth subject manipulated the invention.

With This method can be the variants described above and Benefits also to the same extent realize so in this regard, reference is made to the above statements becomes.

Further preferred embodiments of the invention will become apparent from the dependent claims or the following description of preferred embodiments, which refers to the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

1 is a schematic representation of a preferred embodiment of the optical imaging device according to the invention, which comprises an inventive arrangement and with which a preferred embodiment of the optical imaging method according to the invention can be carried out;

2A is a generalized schematic representation of part of a preferred embodiment of the inventive arrangement of the imaging device 1 ;

2 B is a schematic representation of the displacement-voltage characteristic of the manipulation the manipulated component of the arrangement 2A ;

2C is a schematic representation of force-deflection characteristic of the arrangement 2A ;

2D shows a flow diagram of a preferred embodiment of the imaging method according to the invention, which with the imaging device from 1 and in which a preferred embodiment of the method for actively manipulating a component of the imaging device 1 is used;

2E is a more concrete schematic representation of a preferred embodiment of the inventive arrangement of the imaging device 1 in an initial state;

2F is a schematic representation of the arrangement 2E in another operating condition;

2G Figure 12 is a schematic representation of the displacement-voltage characteristic of the manipulation of the manipulated component of the device 2E ;

2H is a schematic representation of force-deflection characteristics of the arrangement 2E ;

3 is a more concrete schematic representation of another preferred embodiment of the inventive arrangement of the imaging device 1 ;

4A is a schematic representation of another preferred embodiment of the inventive arrangement of the imaging device 1 ;

4B Figure 12 is a schematic representation of the displacement-voltage characteristic of the manipulation of the manipulated component of the device 4A ;

4C is a schematic representation of force-deflection characteristics of the arrangement 4A ;

5A is a schematic representation of another preferred embodiment of the inventive arrangement of the imaging device 1 ;

5B Figure 12 is a schematic representation of the displacement-voltage characteristic of the manipulation of the manipulated component of the device 5A ;

5C is a schematic representation of force-deflection characteristics of the arrangement 5A ;

6 is a schematic representation of another preferred embodiment of the inventive arrangement of the imaging device 1 ;

7 is a schematic representation of another preferred embodiment of the inventive arrangement of the imaging device 1 ;

8A is a generalized schematic representation of part of a further preferred embodiment of the inventive arrangement of the imaging device 1 ;

8B Figure 12 is a schematic representation of the displacement-voltage characteristic of the manipulation of the manipulated component of the device 8A ;

8C is a schematic representation of force-deflection characteristics of the arrangement 8A ;

9A is a schematic representation of part of a further preferred embodiment of the inventive arrangement of the imaging device 1 ;

9B is a schematic representation of part of a further preferred embodiment of the inventive arrangement of the imaging device 1 ;

10 is a schematic representation of part of a further preferred embodiment of the inventive arrangement of the imaging device 1 ;

11 is a schematic partial section through the arrangement 10 along line XI-XI;

12 is a schematic representation of part of a further preferred embodiment of the inventive arrangement of the imaging device 1 ;

13 is a schematic representation of part of a further preferred embodiment of the inventive arrangement of the imaging device 1 ;

14 is a schematic partial section through the arrangement 13 along line XIV-XIV.

DETAILED DESCRIPTION THE INVENTION

First embodiment

With reference to the 1 to 2H In the following, a preferred embodiment of the arrangement according to the invention is described which is used in an optical imaging device according to the invention for microlithography.

1 shows a schematic representation of a preferred embodiment of the optical imaging device according to the invention in the form of a microlithography device 101 , which works with light in the UV range with a wavelength of 193 nm.

The microlithography device 101 includes a lighting system 102 , a mask device in the form of a mask table 103 , an optical projection system in the form of a lens 104 with an optical axis 104.1 and a substrate means in the form of a wafer table 105 , The lighting system 102 one lights up on the mask table 103 arranged mask 103.1 with a - not shown - projection light beam of wavelength 193 nm. On the mask 103.1 There is a projection pattern, which with the projection light bundle on the in the lens 104 arranged optical elements on a substrate in the form of a wafer 105.1 projected on the wafer table 105 is arranged.

The lighting system 102 includes next to a - not shown - light source a first group 106 of optically active components, including an optical element 106.1 includes. Because of the working wavelength of 193 nm, it is the optical element 106.1 a refractive optical element, ie a lens or the like.

The objective 104 includes a second group 107 of optically active components which, inter alia, a number of optical elements, such as the optical element 107.1 , and a diaphragm device 107.2 includes. The optically active components of the second group 107 be in the case 104.2 of the lens 104 held. Because of the working wavelength of 193 nm, it is the optical element 107.1 a refractive optical element, ie a lens or the like. It is understood, however, that in other variants of the invention, any other optical elements, such as reflective or diffractive optical elements can be used. Likewise, of course, any combination of such optical elements can be used.

The 2A shows a generalized and highly schematic view of an arrangement according to the invention 108 , with which a first component of the imaging device 101 , here the lens 107.1 , can be manipulated in terms of their position.

The order 108 includes a manipulation device for this purpose 109 with a manipulation element 109.1 and an associated control device 109.2 , The manipulation element 109.1 is mechanically on the one hand with the lens 107.1 and secondly with a second component 110 in the form of a first holding device of the imaging device 101 connected. The holding device 110 is in turn with the case 104.2 of the lens 104 connected.

The manipulation element 109.1 is an electroactive polymer element (EAP), which is supplied by the control device 109.2 With an electrical voltage U can be applied, resulting in at least one dimension of the manipulation element 109.1 changes. The mechanisms of the change in the dimensions of such an electroactive polymer element caused by the applied electric field are well known, for example, from the publications cited at the outset, so that they will not be discussed further here.

The manipulation element 109.1 is in 2A in its initial state without voltage applied (ie U = 0) shown. The manipulation element 109.1 is arranged so that when applying a voltage U in one in the direction of the axis of action 109.3 extended effective direction compared to the initial state extended.

The manipulation element 109.1 is in its initial state, inter alia, by the direction of the axis of action 109.3 acting weight G of the lens 107.1 loaded so that the manipulation element 109.1 an elastic strain in the direction of the axis of action 109.3 experiences. Accordingly, the manipulation element exercises 109.1 in the direction of the axis of action 109.3 a directed against the weight G elastic restoring force F ₁ on the lens 107.1 out, like this 2A can be seen.

In the electroactive polymer element (EAP) 109.1 it may be, for example, a so-called electrostrictive polymer element in which the polymer structure is changed by the applied electric field and thus causes the change in length. Likewise, it may be a so-called dielectric elastomer element, in which the change in length is effected mechanically by the electrostatic attraction forces of two electrodes, between which the polymer is arranged. Optionally, combinations of these types of elements are possible.

The order 108 also includes a device 111 on the one hand also with the lens 107.1 and on the other hand with a second holding device 112 the imaging device 101 connected is. The second holding device 112 is in turn the one with the case 104.2 of the lens 104 connected. The device 111 exercises in the direction of the axis of action 109.31 further force F ₂ on the lens 107.1 out.

Depending on their design, it may be in the device 111 to act a biasing device whose force F ₂ acts in the direction of the weight G and thus the manipulation element 109.1 additionally pretensions (the in 2A shown force F ₂ then has a positive amount). Similarly, it may be at the device 111 to act a support means whose force F ₂ acts against the weight G and thus at least a part of the weight of the lens 107.1 compensates and thus the manipulation element 109.1 relieved (the in 2A shown force F ₂ then has a negative amount).

In any case, the device is 111 designed so that the manipulation element 109.1 in normal operation of the imaging device 101 in each operating state in the direction of the axis of action 109.3 is subjected to a tensile stress as a mechanical bias. It is understood, however, that such a device 111 may be absent in other variants of the invention. In this case, the mechanical tension bias of the manipulation element is then achieved solely by the weight G of the component to be manipulated.

Due to the tensile stress as a mechanical bias is the manipulation element 109.1 of the manipulator 109 not directly used according to the invention, the manipulation force for manipulating the lens 107.1 to produce, but it will be the respective elastic restoring force F ₁ of the manipulation member 109.1 used as a counterforce for the force S, extending along the axis of action 109.3 as a resultant of the weight G of the lens 107.1 and the force F _{2 of} the device 111 results. S = G + F 2 , (1)

The resulting manipulation force F _M which the desired manipulation of the lens 107.1 along the axis of action 109.3 causes, then results from the restoring force F _{1 of} the manipulation element 109.1 and the force S to: F M = S - F 1 , (2)

In other words, the manipulation element becomes 109.1 not used according to the invention for generating the manipulation force F _M , but rather serves as a control element for the manipulation force F _M , in that it influences the resulting manipulation force F _M via its elastic restoring force F ₁ .

The solution according to the invention has the advantage that acting as a tensile elastic restoring force F _{1 of} the manipulation element 109.1 despite its low lateral stiffness has a well-defined effective direction, so that a manipulation with high precision is possible.

In the static state (manipulation force F _M = 0), the balance of forces results from those at the lens 107.1 forces acting as the first component in each case: G = F 1 - F 2 , (3)

In the following, it will initially be simplified assuming that without an applied electrical voltage U there is a linear relationship between a tensile force applied to the respective manipulation element and the resulting change in length of the manipulation element, ie the manipulation element behaves like a spring with a spring constant c ₁ . Such a linear relationship only approximates the behavior of electroactive polymers, but for purposes of the present description this is sufficient.

In the initial state (U = 0), the spring constant c _{1 of} the manipulation element applies 109.1 , resulting from the elastic strain static change in length Δs _{0 of} the manipulation element 109.1 and the force F ₂ (Δs ₀ ) of the device 111 : G = c 1 · .DELTA.s 0 - F 2 (.DELTA.s 0 ). (4)

In a further operating state, the control device sets 109.2 to the manipulation element 109.1 a voltage U ≠ 0, so that a further deflection Δs of the manipulation element 109.1 is achieved. Here, the spring constant of the manipulation element changes 109.1 and thus the restoring force resulting from its expansion, which should be taken into account here by a correction value K. For the restoring force applies here F 1 = c 1 · (.DELTA.s 0 + Δs) - K. (5)

The correction value K is calculated as follows: K = V (s) * U, (6) where V (s) is the sensitivity of the manipulation element that is known or easily determinable for the respective manipulation element and is dependent on the current length s of the manipulation element 109.1 (in NN) and U denotes the applied voltage (in V).

Furthermore, on the one hand, due to the applied voltage U, there is a change in length ΔI _{U1 of} the manipulation element 109.1 , On the other hand, in turn results in a load resulting from the elastic elastic change ΔI _{F1 of} the manipulation element 109.1 , wherein for the total deflection s of the manipulation element 109.1 applies: s = Δl U1 + Δl F1 = Δs 0 + Δs. (7)

From the equilibrium of forces in the static state then results with the force F ₂ (Δs ₀ + Δs) of the device 111 in turn: G = c 1 · (.DELTA.s 0 + Δs) - K - F 2 (.DELTA.s 0 + Δs). (8th)

wobei ΔF₂(Δs) die aus der Längenänderung Δs resultierende Änderung der Kraft der Einrichtung 111 ist, d. h. ΔF₂(Δs) = F₂(Δs₀ + Δs) – F₂(Δs₀). Hieraus ergibt sich wiederum

Substituting the equation (8) now in the equation (4) and solves this after the change in length Δs, we obtain:

wherein .DELTA.F ₂ (.DELTA.s) resulting from the change in length .DELTA.s change in the power of the device 111 is, ie, ΔF ₂ (Δs) = F ₂ (Δs ₀ + Δs) - F ₂ (Δs ₀ ). This in turn results

In other words, depending on the characteristic of the force F ₂ and the sensitivity V (s) for a given deflection .DELTA.s, a required force is applied to the manipulation element 109.1 determine voltage U to be applied, with which the balance of power can be established.

To a well-defined manipulation of the component 107.1 To achieve, one can use the control device 109.2 connected detection device 109.4 be provided, which is the actual manipulation of the component 107.1 detected and a corresponding signal to the controller 109.2 supplies, which this information then in the control of the manipulation element 109.1 uses.

Furthermore, it can be provided that the device 111 has a controllable characteristic of the force F ₂ . To control this characteristic of the force F ₂ , the device can 111 also with the control device 109.2 be connected.

The 2 B shows for a case with acting as a biasing device mechanical spring means 111 (in the 2A shown force F ₂ then has a positive amount) in the form of the characteristic 113 schematically the relationship between the voltage U, which the control device 109.2 to the manipulation element 109.1 applies, and the deflection Δs of the manipulation element 109.1 and with it the lens 107.1 ,

The 2C shows for this case the relationship between the elastic restoring force F ₁ and the actuating force S = G + F ₂ and the deflection s of the manipulation element 109.1 , It is in 2C the respective restoring force F ₁ for three different electrical voltages U shown, namely the restoring force F ₁ (U = 0) for a voltage U = 0 (solid line), the restoring force F ₁ (U ₁ ) for a voltage U ₁ > 0 ( dot-dash line) and the restoring force F ₁ (U ₂ ) for a voltage U ₂ > U ₁ (two-dot chain line).

Again 2C can be seen, has acting as a biasing device 111 (similar to the manipulation element 109.1 ) the characteristic F _{2 of} a simple elastic spring with a spring constant c ₂ , wherein the spring force F ₂ decreases with increasing deflection s, thus therefore: F 2 (.DELTA.s 0 + Δs) = F 2 (0) - c 2 · (.DELTA.s 0 + Δ s ), (11) where F ₂ (0) is the biasing force of the device 111 in the unloaded state of the manipulation element 109.1 (Deflection s = 0), respectively: .DELTA.F 2 (Δs) = -c 2 · Δs, (12)

For the deflection .DELTA.s then results from the equation (9) and (12):

On the right side of the point of intersection P (U = 0) between the characteristic of the actuating force S and the characteristic of the restoring force F ₁ (U = 0) at the electrical voltage U = 0 is the operating range B of the arrangement 108 , Here lie on the characteristic of the force S, the operating points in which the arrangement 108 for manipulation of the lens 107.1 can be operated. Again 2C can be seen, can be in this operating range B for each operating point P (U) of the actuating force S with a deflection s = Δs ₀ + Δs a characteristic of the restoring force F ₁ (U) of the manipulation device 109.1 determine at an electrical voltage U ≠ 0, which intersects the characteristic of the force S in this operating point, so that equilibrium of forces S = F ₁ (U) prevails. In 2C this is illustrated by the example of the operating points P (U ₁ ) for the electrical voltage U ₁ and P (U ₂ ) for the electrical voltage U ₂ .

It is understood in this context that the arrangement of the manipulation element 109.1 in other variants of the invention, it is not necessary for it to be so that the direction of its axis of action 109.3 with the direction of the first component 107.1 acting gravitational force G and / or the direction of the force F ₂ of the device 111 must coincide. Rather, these directions can each be oriented to each other as desired. This may be the case, in particular, if between the manipulation element 109.1 and the element actually to be manipulated is connected to a corresponding transmission. Likewise, it is not mandatory that the axis of action 109.3 as in the example shown, parallel to the optical axis 104.1 of the lens 104 runs. Rather, also any other orientation of the axis of action 109.3 with respect to the optical axis 104.1 of the lens 104 be provided.

2D shows a flow diagram of a preferred embodiment of the imaging method according to the invention, which with the imaging device 101 and in which a preferred embodiment of the method for actively manipulating a component of the imaging device 101 is used.

First, in one step 114.1 started the procedure of the microlithography process. In one step 114.2 then becomes the microlithography device 101 out 1 made available.

In a picture step 114.3 takes place first in one step 114.4 according to certain specifications, a manipulation of the component 107.1 , For this purpose, the control device acts on 109.2 as described above, the manipulation element 109.1 with a corresponding voltage U, so as to achieve the desired manipulation of the component 107.1 to achieve.

In a further step 114.5 then becomes the substrate 105.1 positioned and exposed. The following will be in one step 114.6 checks whether another imaging step is yet to be performed. If this is not the case, the procedure in the step 114.7 completed. Otherwise it will go back to the step 114.3 jumped.

It is understood that in the imaging step 114.3 a continuous regulation of the manipulation of the component 107.1 parallel to the positioning and exposure of the substrate 105.1 can take place, thus during the regulation of the manipulation of the component 107.1 and the position of the substrate 105.1 constantly an exposure takes place. The steps 114.4 and 114.5 can thus run simultaneously.

The 2E shows a more detailed schematic representation of the arrangement according to the invention 108 in their initial state. As 2E can be seen, includes the manipulation device 109 three evenly outside the circumference of the lens 107.1 Distributed, identically structured manipulation elements 109.1 , About the manipulation elements 109.1 is the lens 107.1 on a retaining ring 110 suspended, in turn, with the (not shown) housing 104.2 of the lens 104 connected is.

It It should be understood that in other variants of the invention It can also be provided that the manipulation elements are not evenly arranged on the circumference of the optical element are and / or not constructed identically. Likewise, of course Also be provided a different number of manipulation elements.

The device 111 is formed in this example as a support means and also includes three identically constructed elastic spring assemblies 111.1 , Each one of the spring arrangements 111.1 is one of the manipulation elements 109.1 assigned and arranged kinematically parallel to this. The spring arrangements 111.1 are arranged and designed so that their axes of action 111.2 essentially collinear to the axis of action 109.3 of the respective manipulation element 109.1 runs. As a result, on the one hand a particularly compact arrangement is achieved, which occupies little space. On the other hand, you can realize it with an arrangement in which the forces on the lens 107.1 attack in the manner of an advantageous three-point storage at three defined points.

The spring arrangements 111.1 are designed to be in the in 2E illustrated initial state (U = 0) a part of the weight G of the lens 107.1 compensate. These are the spring arrangements 111.1 each deflected relative to their load-free state by the amount Δs ₀ , so that each spring assembly 111.1 a partial support force in the form of an elastic restoring force F 2i (.DELTA.s 0 ) = -C 2 · .DELTA.s 0 , (14) on the lens 107.1 exercises.

The remaining part of the weight G of the lens 107.1 is characterized by from an elastic deformation of the manipulation elements 109.1 resulting restoring force F ₁ recorded so that the manipulation elements 109.1 in the initial state (U = 0) are each subjected to a tensile stress as mechanical bias. It exercises every manipulation element 109.1 a restoring force F 1i (.DELTA.s 0 ) = -C 1 · .DELTA.l F1 (.DELTA.s 0 ). (15) on the lens 107.1 out.

The control device 109.2 is with the manipulation elements 109.1 connected and can each apply a predetermined voltage U. If this is the case, the respective learns the manipulation element 109.1 as a function of the respectively applied voltage U a change in length .DELTA.I _U1 , so that there is a shift of the lens 107.1 comes. This is a manipulation of the position of the lens 107.1 with three degrees of freedom (translation along the z-axis, rotation about the x- and y-axis) possible.

The 2F shows the arrangement 108 in another operating state, in which the lens 107.1 opposite to the 2E shown output state (U = 0, s = Δs ₀ ) is lowered by the amount Δs.

The 2G shows for the arrangement 108 out 2E in the form of the characteristic 113 schematically the relationship between the voltage U, which the control device 109.2 to the respective manipulation element 109.1 applies, and the deflection Δs of the manipulation element 109.1 and with it the lens 107.1 ,

The 2H shows for this case the relationship between the sum F ₁ = ΣF _{1i of} the elastic restoring _forces F _{1i of} the manipulation _elements 109.1 or the force S = G + F ₂ = G + ΣF _2i and the deflection s. It is in 2H the respective restoring force F ₁ for three different electrical voltages U shown, namely the restoring force F ₁ (U = 0) for a voltage U = 0 (solid line), the restoring force F ₁ (U ₁ ) for a voltage U ₁ > 0 ( dot-dash line) and the restoring force F ₁ (U ₂ ) for a voltage U ₂ > U ₁ (two-dot chain line).

Again 2H can be seen, has the acting as a support device 111 (similar to the manipulation element 109.1 ) the characteristic ΣF _{2i of} a simple elastic spring with a spring constant Σc _2i , wherein the amount of the spring force ΣF _{2i increases} with increasing deflection s, so that at a certain deflection the weight G of the lens 107 is completely compensated (S = 0). It is therefore also here according to equation (11): ΣF 2i (.DELTA.s 0 + Δs) = ΣF 2i (0) - Σc 2i · (.DELTA.s 0 + Δ s (16) where ΣF _2i (0) is the biasing force of the device 111 in the unloaded state of the manipulation element 109.1 (Deflection s = 0) (and usually also has a negative value), or according to equation (12): ΔΣF 2 (Δs) = -Σc 2 · Δs, (17)

For the deflection .DELTA.s then results from the equation (9) and (17):

On the right side of the point of intersection P (U = 0) between the characteristic of the actuating force S and the characteristic of the restoring force F ₁ (U = 0) at the electrical voltage U = 0 is again the operating range B of the arrangement 108 , Here lie on the characteristic of the force S, the operating points in which the arrangement 108 for manipulation of the lens 107.1 can be operated. Again 2H can be seen, can be in this operating range B for each operating point P (U) of the actuating force S with a deflection s = Δs ₀ + Δs a characteristic of the restoring force F ₁ (U) of the manipulation device 109.1 determine at an electrical voltage U ≠ 0, which intersects the characteristic of the force S in this operating point, so that equilibrium of forces S = F ₁ (U) prevails. In 2H this is illustrated by the example of the operating points P (U ₁ ) for the electrical voltage U ₁ and P (U ₂ ) for the electrical voltage U ₂ .

The control device 109.2 controls the manipulation elements 109.1 in accordance with corresponding specifications, for example for correcting detected aberrations of the objective 104 at. In this case, the control device uses 109.2 the signals of the detection device 109.4 which is the actual manipulation of the lens 107.1 detected. It is understood that in other variants of the invention, for example, can also be provided that the detection device 109.4 For example, directly a aberration of the lens 104 detected and the control of the manipulation elements takes place directly in response to this detected aberration.

Second embodiment

The following is with reference to the 1 and 3 a further preferred embodiment of the inventive arrangement 208 described which in place of the arrangement 108 in the lens 104 can be used to the lens 107.1 to manipulate. The order 208 corresponds in its basic structure and its operation of the arrangement 108 from the 2A to 2H , so that only the differences should be discussed here.

The difference to the arrangement 108 exists only in the design of the device designed as a support means 211 , This support device 211 includes in the arrangement 208 six identical, outside at the periphery of the lens 107.1 distributed support elements in the form of simple spring devices 211.1 , The axes of action 211.2 the support elements 211.1 are essentially parallel to the axes of action 109.3 the manipulation elements 109.1 , In this case are in the circumferential direction of the lens 107.1 two spring devices each 211.1 between two adjacent manipulation elements 109.1 arranged evenly distributed.

This will give a more even support of the lens 107.1 scores, with regard to a by the weight of the lens 107.1 conditional deformation of the lens 107.1 is beneficial. It is understood that in other variants of the invention, any other number of support elements may be provided. In particular, the number of support elements can be increased even further to even out the support of the lens. In particular, it can be provided that in addition to the spring devices 211.1 further spring devices are provided whose axes of action as in the arrangement 108 essentially collinear with the axes of action 109.3 the manipulation elements 109.1 run.

The control of the manipulation elements 109.1 by the control device 109.2 and the behavior of the arrangement 208 is similar to the control and the behavior of the arrangement 108 In this regard, the above statements in connection with the 2F to 2H is referenced.

It should be mentioned only that, as for example from the 2H and equation (3), a deviation between (substantially uniformly across the support members 211.1 distributing) supporting force F ₂ through the support elements 211.1 and the (substantially uniformly over the manipulation elements 109.1 distributing) restoring force F _{1 of} the manipulation elements 109.1 is present. At the periphery of the lens 107.1 therefore act in the area of the support elements 211.1 and the manipulation elements 109.1 different forces, which is an uneven deformation of the lens 107.1 have as a consequence. It is understood that this deformation may optionally be exploited to avoid aberrations of the lens 104 or other components of the imaging device 101 to correct.

Depending on the number of force application points, a so-called multi-wave deformation of the lens results accordingly 107.1 , This results, for example, in an arrangement with n support elements 211.1 and n manipulation elements 109.1 a so-called n-wave deformation of the lens 107.1 ,

Furthermore, it is understood that the support means may be constructed in other variants of the invention in any other suitable manner. So can the support elements 211.1 For example, not be designed as tension springs, but in a known manner as radially to the lens 107.1 be designed aligned bending springs. Furthermore, for example, a prestressed parallel guidance of the lens 107.1 be provided as they are in 3 through the dashed outline 215 is indicated. Likewise, instead of the parallel guide 215 For example, a membrane-like support of the lens 107.1 be provided at its periphery.

As well it is understood that in other variants of the invention, of course also any other principles of action individually or in any Combination for the support elements used can come. For example, pneumatic Springs, magnetic springs or the like are used.

there it is understood that the respective support element not necessarily have a linear force-deflection characteristic got to. Rather, support elements with a arbitrarily designed force-deflection characteristic are used. In particular, it is possible, as the following even closer is explained by an example, this characteristic to the adapted manipulation elements to a favorable to achieve dynamic behavior.

It is understood in this context that also with this embodiment in connection with the 2D described method can be performed so that here only on the The above statements should be referred to.

Third embodiment

The following is with reference to the 1 and 4A to 4C a further preferred embodiment of the inventive arrangement 308 described which in place of the arrangement 108 in the lens 104 can be used to the lens 107.1 to manipulate. The order 308 corresponds in its basic structure and its operation of the arrangement 108 from the 2A to 2H , so that only the differences should be discussed here.

The difference to the arrangement 108 exists only in the design of the device designed as a biasing device 311 , This pretensioner 311 includes in the arrangement 308 three identical, outside on the perimeter of the lens 107.1 distributed biasing elements 311.1 , Each biasing element 311.1 comprises a first magnetic element 311.3 , which is on the circumference of the lens 107.1 is fixed, and one at a certain distance along the axis of action 311.2 oppositely disposed second magnetic element 311.4 , which on the second holding device 112 is attached. The polarity of the first magnetic elements 311.3 and the second magnetic elements 311.4 is chosen so that they attract each other, so each biasing element 311.1 a partial force F _2i on the lens 107.1 exercises.

The axes of action 311.2 the biasing elements 311.1 are essentially collinear to the axes of action 109.3 the manipulation elements 109.1 , It is understood, however, that in other variants of the invention similar to the second embodiment can also be provided that the effective axes 311.2 not with the effective axes 109.3 the manipulation elements 109.1 coincide. As described above in connection with the second embodiment, it may then be due to the different points on the circumference of the lens 107.1 acting forces to a deformation of the lens 107.1 which, if appropriate, can also be used specifically for the correction of aberrations.

It is understood that in other variants of the invention, any other number of biasing elements may be provided. In particular, the number of biasing elements can be increased to equalize the force applied to the lens. In particular, it may be provided that in addition to the biasing elements 311.1 further biasing elements are provided whose axes of action are similar to the arrangement 208 essentially parallel to the axes of action 109.3 the manipulation elements 109.1 run.

The 4B shows for the arrangement 308 out 4A in the form of the characteristic 313 schematically the relationship between the voltage U, which the control device 109.2 to the respective manipulation element 109.1 applies, and the deflection Δs of the manipulation element 109.1 and with it the lens 107.1 ,

The 4C shows for this case the relationship between the sum F ₁ = ΣF _{1i of} the elastic restoring _forces F _{1i of} the manipulation _elements 109.1 or the force S = G + F ₂ = G + ΣF _2i and the deflection s. It is in 4C the respective restoring force F ₁ for three different electrical voltages U shown, namely the restoring force F ₁ (U = 0) for a voltage U = 0 (solid line), the restoring force F ₁ (U ₁ ) for a voltage U ₁ > 0 ( dot-dash line) and the restoring force F ₁ (U ₂ ) for a voltage U ₂ > U ₁ (two-dot chain line).

Again 4C can be seen, has the biasing device 311 by reducing the distance between the first and second magnetic elements 311.3 . 311.4 disproportionately increasing attraction a strong non-linear characteristic F ₂ and thus a strong nonlinear characteristic of the force S.

On the right side of the point of intersection P (U = 0) between the characteristic of the actuating force S and the characteristic of the restoring force F ₁ (U = 0) at the electrical voltage U = 0 is again the operating range B of the arrangement 308 , Here lie on the characteristic of the force S, the operating points in which the arrangement 308 for manipulation of the lens 107.1 can be operated. Again 4C can be seen, can be in this operating range B for each operating point P (U) of the actuating force S with a deflection s = Δs ₀ + Δs a characteristic of the restoring force F ₁ (U) of the manipulation device 109.1 determine at an electrical voltage U ≠ 0, which intersects the characteristic of the force S in this operating point, so that equilibrium of forces S = F ₁ (U) prevails. In 4C this is illustrated by the example of the operating points P (U ₁ ) for the electrical voltage U ₁ and P (U ₂ ) for the electrical voltage U ₂ .

Again 4C can be seen, runs the characteristic of the restoring force F ₁ (U ₂ ) of the manipulation device 109.1 at the electrical voltage U ₂ tangential to the characteristic of the actuating force S. If the electrical voltage increased to a value U ₃ > U ₂ , no intersection between the characteristic of the restoring force F ₁ (U ₃ ) of the manipulation device 109.1 at the electrical voltage U ₂ (dashed line) and the force S and thus no balance of power more result. Rather, at such an electrical voltage U ₃ > U _{2 would be} the lens 107.1 so long deflected until the first and second magnetic elements 311.3 . 311.4 strike each other or another mechanical stop is reached.

In a further deflection of the lens 107.1 In addition to the operating point P (U ₂ ), intersections between the characteristic of the restoring force F ₁ (U) of the manipulation device are obtained when the electrical voltage U is reduced 109.1 and the force S (see also Characteristic 313 in 4B ). However, the problem here is the running over of the operating point P (U ₂ ), which (without other aids) only taking advantage of the inertia of the moving components, in particular the lens 107.1 , is possible. In other words, a close approach to the operating point P (U ₂ ) results in a bistability zone in which the static deflection s actually assumed (after a decay process) depends on the mass, the velocity and the acceleration of the moving components during the approach. If this operating range should also be used, is in the control device 109.2 to realize a corresponding control taking into account the mass, the speed and the acceleration of the moving components in the approach.

The actual usable operating range B is limited in the present example by a maximum deflection s _max (or a maximum relative deflection Δs _max relative to the initial state), which results in the operating point P (U ₂ ). To prevent the arrangement 308 enters this operating range can, on the one hand in the control device 109.2 a limiting circuit for limiting the electrical voltage to the value U ₂ = U _{max be} provided (see also 4B ). But it can also be provided simple stops or the like, as in 4A through the dashed outline 316 are indicated. These have stops have the advantage that they prevent in any case a mass inertia-related over driving the maximum deflection s _max .

On the right side of the operating point P (U ₂ ) is located above a deflection it (ie right of the second intersection of the characteristic of the restoring force F ₁ (U = 0) with the force S) an irreversible operating range, from which the arrangement 308 could no longer return on its own power to a lower deflection, since the biasing force of the biasing elements 311.1 gets too big. It is in any case to prevent the arrangement 308 enters this operating area. This could be done by using the operating range between s _max and s _ir, for example, by a too rapid lowering of the voltage U to the value zero and a resulting mass inertial due to the deflection s _ir . In order to prevent such overrunning of the deflection s _ir , in turn, a corresponding control of the voltage U or simply mechanical stops or the like may be provided.

The control device 109.2 controls the manipulation elements 109.1 according to appropriate specifications, for example, for the targeted adjustment of the optical characteristics of the lens 104 at. In this case, the control device uses 109.2 the signals of the detection device 109.4 which is the actual manipulation of the lens 107.1 detected. It is understood that in other variants of the invention, for example, can also be provided that the detection device 109.4 For example, directly the optical characteristics of the lens 104 detected and the control of the manipulation elements takes place directly in response to this detected optical characteristic.

Again 4B can be seen, if necessary, with comparatively low voltages U large travel paths Δs can be achieved. In other words, the arrangement 308 be operated with relatively little energy. This is among other things in connection with a minimization of the loss of energy of advantage, which as disturbing heat in the lens 104 is registered.

It is understood that in other variants of the invention also in addition to the biasing device 311 a support device similar to the support device 111 respectively. 211 may be provided, which as described above in connection with the first and second embodiments, a compensation of a part of the weight G of the lens 107.1 causes, so that the manipulation elements are subjected to a lower tensile stress than mechanical bias.

It is understood in this context that even in this embodiment, the co with the 2D described method can be carried out, so that reference should be made only to the above statements.

Fourth embodiment

The following is with reference to the 1 and 5A to 5C a further preferred embodiment of the inventive arrangement 408 described which in place of the arrangement 108 in the lens 104 can be used to the lens 107.1 to manipulate. The order 408 corresponds in its basic structure and its operation of the arrangement 108 from the 2A to 2H , so that only the differences should be discussed here.

The difference to the arrangement 108 exists only in the design of the device designed as a biasing device 411 , This pretensioner 411 includes in the arrangement 408 three identical, outside on the perimeter of the lens 107.1 distributed biasing elements 411.1 , Each biasing element 411.1 comprises a first magnetic element 411.3 , which is on the circumference of the lens 107.1 is fixed, and at a certain distance along the axis of action 411.2 spaced second magnetic element 411.4 , which on the second holding device 112 is attached. The polarity and design of the first magnetic elements 411.3 and the second magnetic elements 411.4 is similar to a magnetic gravitation compensator chosen so that there is a predetermined force-deflection characteristic F ₂ .

The axes of action 411.2 the biasing elements 411.1 are essentially collinear to the axes of action 109.3 the manipulation elements 109.1 , It is understood, however, that in other variants of the invention similar to the second embodiment can also be provided that the effective axes 411.2 not with the effective axes 109.3 the manipulation elements 109.1 coincide. As described above in connection with the second embodiment, it may then be due to the different points on the circumference of the lens 107.1 acting forces to a deformation of the lens 107.1 which, if appropriate, can also be used specifically for the correction of aberrations.

It is understood that in other variants of the invention, any other number of biasing elements may be provided. In particular, the number of biasing elements can be increased to equalize the force applied to the lens. In particular, it may be provided that in addition to the biasing elements 411.1 further biasing elements are provided whose axes of action are similar to the arrangement 208 essentially parallel to the axes of action 109.3 the manipulation elements 109.1 run.

The 5B shows for the arrangement 408 out 5A in the form of the characteristic 413 schematically the relationship between the voltage U, which the control device 109.2 to the respective manipulation element 109.1 applies, and the deflection Δs of the manipulation element 109.1 and with it the lens 107.1 ,

The 5C shows for this case the relationship between the sum F ₁ = ΣF _{1i of} the elastic restoring _forces F _{1i of} the manipulation _elements 109.1 or the force S = G + F ₂ = G + ΣF _1i and the deflection s. It is in 5C the respective restoring force F ₁ for three different electrical voltages U shown, namely the restoring force F ₁ (U = 0) for a voltage U = 0 (solid line), the restoring force F ₁ (U ₁ ) for a voltage U ₁ > 0 ( dot-dash line) and the restoring force F ₁ (U ₂ ) for a voltage U ₂ > U ₁ (two-dot chain line).

Again 5C can be seen, has the biasing device 411 thanks to an appropriate design, polarity and assignment of the first and second magnetic elements 411.3 . 411.4 a characteristic F ₂ , whose course to the characteristic F _{1 of} the manipulation elements 109.1 adapted or approximated, so that the characteristic of the adjusting force S. to the characteristic F _{1 of} the manipulation elements 109.1 adapted or approximated.

On the right side of the point of intersection P (U = 0) between the characteristic of the actuating force S and the characteristic of the restoring force F ₁ (U = 0) at the electrical voltage U = 0 is again the operating range B of the arrangement 408 , Here lie on the characteristic of the force S, the operating points in which the arrangement 408 for manipulation of the lens 107.1 can be operated. Again 5C can be seen, can be in this operating range B for each operating point P (U) of the actuating force S with a deflection s = Δs ₀ + Δs a characteristic of the restoring force F ₁ (U) of the manipulation device 109.1 determine at an electrical voltage U ≠ 0, which is the characteristic of the force S in this operating point cuts, so that equilibrium of forces S = F ₁ (U) prevails. In 5C this is illustrated by the example of the operating points P (U ₁ ) for the electrical voltage U ₁ and P (U ₂ ) for the electrical voltage U ₂ .

Again 5C can be seen, runs the characteristic of the restoring force F ₁ (U ₂ ) of the manipulation device 109.1 at the electrical voltage U ₂ tangential to the characteristic of the actuating force S. If the electrical voltage increased to a value U ₃ > U ₂ , no intersection between the characteristic of the restoring force F ₁ (U ₃ ) of the manipulation device 109.1 at the electrical voltage U ₂ (dashed line) and the force S and thus no balance of power more result. Rather, at such an electrical voltage U ₃ > U _{2 would be} the lens 107.1 so long deflected until the first and second magnetic elements 311.3 . 311.4 strike each other or another mechanical stop is reached.

In a further deflection of the lens 107.1 In addition to the operating point P (U ₂ ), intersections between the characteristic of the restoring force F ₁ (U) of the manipulation device are obtained when the electrical voltage U is reduced 109.1 and the force S (see also Characteristic 313 in 5B ). However, the problem here is the running over of the operating point P (U ₂ ), which (without other aids) only taking advantage of the inertia of the moving components, in particular the lens 107.1 , is possible. In other words, a close approach to the operating point P (U ₂ ) results in a bistability zone in which the static deflection s actually assumed (after a decay process) depends on the mass, the velocity and the acceleration of the moving components during the approach. If this operating range should also be used, is in the control device 109.2 to realize a corresponding control taking into account the mass, the speed and the acceleration of the moving components in the approach.

The actual usable operating range B is limited in the present example by a maximum deflection s _max (or a maximum relative deflection Δs _max relative to the initial state), which results in the operating point P (U ₂ ). To prevent the arrangement 408 leaves this operating range, on the one hand in the control device 109.2 a limiting circuit for limiting the electrical voltage to the value U ₂ = U _{max be} provided (see also 5B ). But it can also be provided simple stops or the like, as in 5A through the dashed outline 416 are indicated. These stops have the advantage that they prevent in any case a mass inertia-related driving over the maximum deflection s _max .

On the right side of the operating point P (U ₂ ) is located above a deflection it (ie right of the second intersection of the characteristic of the restoring force F ₁ (U = 0) with the force S) an irreversible operating range, the arrangement 408 can no longer rely on its own strength, because the biasing force of the biasing elements 411.1 gets too big. It is in any case to prevent the arrangement 408 enters this irreversible operating area. This could be done with a use of the operating range between s _max and they, for example, by a too rapid lowering of the voltage U to the value zero and a resulting inertia caused by overriding the deflection s _ir . In order to prevent such overrunning of the deflection s _ir , in turn, a corresponding control of the voltage U or simply mechanical stops or the like may be provided.

The control device 109.2 controls the manipulation elements 109.1 according to appropriate specifications, for example, for the targeted adjustment of the optical characteristics of the lens 104 at. In this case, the control device uses 109.2 the signals of the detection device 109.4 which is the actual manipulation of the lens 107.1 detected. It is understood that in other variants of the invention, for example, can also be provided that the detection device 109.4 For example, directly the optical characteristics of the lens 104 detected and the control of the manipulation elements takes place directly in response to this detected optical characteristic.

Again 5B (In particular in comparison to the dashed curve shown 313 out 4B ) can be seen, thanks to the adaptation of the characteristic F ₂ or S to the characteristic F ₁ with very low voltages U large travel paths Δs can be achieved. In other words, the arrangement 408 be operated with very little energy. This is among other things in connection with a minimization of the loss of energy of advantage, which as disturbing heat in the lens 104 is registered. It goes without saying that a suitable design of the pretensioning device may even allow an almost complete adaptation of the characteristic curve F ₂ or S to the characteristic curve F ₁ . It is only necessary to ensure that in the desired operating range, the characteristic S is at no deflection above the characteristic F ₁ (U = 0), otherwise an irreversible operating state would occur in this area, from which the An could no longer return to less deflection.

It is understood that in other variants of the invention also in addition to the biasing device 411 a support device similar to the support device 111 respectively. 211 may be provided, which as described above in connection with the first and second embodiments, a compensation of a part of the weight G of the lens 107.1 causes, so that the manipulation elements are subjected to a lower tensile stress than mechanical bias.

It is understood in this context that also with this embodiment in connection with the 2D described method can be carried out, so that reference should be made only to the above statements.

Fifth embodiment

The following is with reference to the 1 and 6 a further preferred embodiment of the inventive arrangement 508 described which in place of the arrangement 108 in the lens 104 can be used to the lens 107.1 to manipulate. The components of the arrangement 508 corresponding in their basic structure and functioning those of the arrangement 108 from the 2A to 2H , so that only the differences should be discussed here.

The difference to the arrangement 108 consists in the arrangement of the manipulation elements 109.1 and the components of the device configured as a support device 511 ,

In the arrangement 508 are six manipulation elements 109.1 provided, each with two manipulation elements 109.1 each other in the manner of a bipod 109.5 with intersecting axes of action 109.3 assigned. This results in three bipodes 109.5 that are even around the circumference of the lens 107.1 attack distributed (being in the 6 for clarity, only one of the bipods 109.5 is completely shown while the other two bipodes 109.5 only represented by their axes of action).

As in the execution 2E is every manipulation element 109.1 a support element 511.1 the support device 511 assigned such that the axis of action 511.2 of the support element 511.1 essentially collinear with the axis of action 109.3 of the manipulation element 109.1 runs. The support elements 511.1 are again designed as simple spring elements. As with the execution 2E In turn, they compensate for a part of the weight G of the lens via their force components acting in the direction of the weight force 107.1 , so the ones on the lens 107.1 acting actuating force S as a resultant of the supporting force F ₂ = ΣF _{2i of} the support elements 511.1 and the weight G yields (S = G + F ₂ = G + ΣF _2i ).

The manipulation elements 109.1 are applied in any operating condition by the force S with a tensile stress as a mechanical bias. Accordingly, the respective elastic restoring force F _{1i of} the respective manipulation _element also serves here 109.1 as a counterforce to the actuating force S. By the action of the respective restoring force F _1i as a tensile force a well-defined force direction is ensured, which is a precise manipulation of the lens 107.1 allows. It is understood here that the support means 511 in other variants of the invention may also be missing, so that the manipulation elements 109.1 then by the full weight G of the lens 107.1 are biased.

The control device 109.2 controls via the loading of the manipulation elements 109.1 with a voltage U, the respective counterforce F _1i to the force S and hereby the manipulation of the lens 107.1 , About the three on the circumference of the lens 107.1 distributed attacking bipods 109.5 In this case, a parallel kinematic is achieved with which the lens 107.1 can be positioned in all six degrees of freedom.

With the arrangement 508 In turn, with relatively low energy consumption and thus less heat generation in a cost effective manner larger travel ranges can be achieved than with conventional operating principles used for such manipulators.

It goes without saying that the in the 6 shown arrangement 508 optionally also combined with the support means and / or biasing means described in the previous and subsequent embodiments. For example, to even out the introduction of force into the lens 107.1 a support device with a plurality of circumference of the lens 107.1 be provided to attacking support elements, as in connection with the execution of 3 has been described.

It is understood in this context that also with this embodiment in connection with the 2D described method can be carried out, so that reference should be made only to the above statements.

Sixth embodiment

The following is with reference to the 1 and 7 a further preferred embodiment of the inventive arrangement 608 described which in place of the arrangement 108 in the lens 104 can be used to the lens 107.1 to manipulate. The order 608 corresponds in its basic structure and its operation of the arrangement 108 from the 2A to 2H , so that only the differences should be discussed here.

The difference to the arrangement 108 consists only in the number of manipulation elements 109.1 and the design of the biasing device 611 ,

Unlike the arrangement 108 engages in the arrangement 608 a large number of manipulation elements 109.1 evenly around the circumference of the lens 107.1 on (as in 7 indicated by the dotted lines). In any case, more than three manipulation elements, preferably more than six manipulation elements are provided.

Every manipulation element 109.1 is on the opposite side of the lens 107.1 a biasing element 611.1 the pretensioner 611 assigned such that the axis of action 109.3 of the manipulation element 109.1 essentially collinear with the axis of action 611.2 of the biasing element 611.1 is arranged. The pretensioning elements 611.1 are there with the lens 107.1 and the second holding device 112 connected.

Each biasing element 611.1 is also an electroactive polymer element (EAP) connected to the control device 109.2 is connected, and can be acted upon by this with a voltage U, so as to extend its length along its axis of action 611.2 to change.

The manipulation elements 109.1 and the biasing elements 611.1 are arranged and designed so that the manipulation elements 109.1 are applied in their initial state without voltage applied (U = 0) with a tensile stress as mechanical bias. Furthermore, the control device controls 109.2 the manipulation elements 109.1 and the biasing elements 611.1 each so on, that the manipulation elements 109.1 in normal operation of the imaging device 101 in any operating condition in the direction of its axis of action 109.3 are subjected to a tensile stress as a mechanical bias. By using the existing at any time elastic restoring force of the manipulation elements 109.1 can be a precise manipulation of the lens 107.1 be ensured.

With this arrangement 608 Not only is it possible to use the lens 107.1 in terms of their position in a similar manner in three degrees of freedom, as described in connection with the above first to fourth embodiments. Become the effective axes 109.3 and / or the axes of action 611.2 arranged so that they are not parallel to the optical axis 104.1 are arranged, but a slight tendency to have her, a manipulation in up to six degrees of freedom is possible. The axes of action must 109.3 and the axes of action 611.2 also not necessarily parallel to each other.

Another advantage of the arrangement 608 lies in the controllability of the characteristic of the pretensioner 611 , Thus, an almost arbitrary course of the characteristic F _{2 of} the biasing device 611 be achieved. In addition to the simulation of the characteristics F _{2 of} the preceding embodiments (with the advantages described therein), it is possible in particular, the characteristic F _{1 of} the manipulation device 109 Imitate any precise, so similar to the embodiment of 5A to 5C With very low voltages U high travel can be achieved.

By suitable coordinated control of the characteristic F _{1 of} the manipulation device 109 and characteristic F _{2 of} the pretensioner 611 It is also possible to change the global position of the lens 107.1 constant and only over the circumference of the lens 107.1 distributes different forces into the lens 107.1 initiate so that this is a desired deformation of the lens 107.1 results. It goes without saying that this manipulation of the lens 107.1 in the form of a defined deformation of the lens 107.1 possibly also with a manipulation of the lens 107.1 in the form of a change in the position of the lens 107.1 be minus the optical axis 104.1 of the lens 104 can be combined.

The control device 109.2 controls the manipulation elements 109.1 according to appropriate specifications, for example, for the targeted adjustment of the optical characteristics of the lens 104 at. In this case, the control device uses 109.2 the signals of the detection device 109.4 which is the actual manipulation of the lens 107.1 detected. It is understood that in other variants of the invention, for example, can also be provided that the detection device 109.4 For example, directly the optical characteristics of the lens 104 detected and the control of the manipulation elements takes place directly in response to this detected optical characteristic.

As 7 it can be seen, is the manipulation device 109 in the embodiment shown with a support means 111 combined, their supporting elements 111.1 each a manipulation element 109.1 are assigned such that their axes of action 111.2 collinear to the axes of action 109.3 the manipulation elements 109.1 run. Such a configuration has already been described in connection with the first embodiment, so that reference is made here only to the above statements. It is understood, however, that in other variants of the invention, such a support device may also be missing.

Likewise, it is of course possible that in other variants of the invention also in addition to the biasing device 611 another support means and / or a further biasing means may be provided, as described above in connection with the other embodiments. In particular, it is possible for each biasing element 611.1 to assign another biasing element with Kollinearer effective axis.

It goes on to be understood in this context that, with this embodiment, the in connection with the 2D described method can be carried out, so that reference should be made only to the above statements.

Seventh embodiment

The following is with reference to the 1 and 8A to 8C a further preferred embodiment of the inventive arrangement 708 described in the imaging device 101 can be used to one of their components 101.3 to manipulate.

The 8A shows a generalized and highly schematic view of an arrangement according to the invention 708 , with a first component 101.3 the imaging device 101 in terms of their position and / or geometry can be manipulated.

The order 708 includes for this purpose a manipulation device in the form of a manipulator 709 with a manipulation element 709.1 and an associated control device 709.2 , The manipulation element 709.1 is mechanically on the one hand with the component 101.3 and secondly with a second component 710 in the form of a first holding device of the imaging device 101 connected. The holding device 710 is in turn with the case 104.2 of the lens 104 connected.

At the first component 101.3 it is any component of the imaging device 101 , Like in the 8A shown, includes the component 101.3 in the present example, a highly schematized illustrated element to be manipulated 101.4 , which has a likewise highly schematized illustrated transmission 101.5 (with arbitrarily designed translation) with the element to be manipulated with regard to its position and / or geometry 101.4 connected is. In particular, it may be in the element to be manipulated 101.4 to act an optically active element, such as an optical element. However, it may also be any other mechanical component of the imaging device 101 act.

The manipulation element 709.1 is an electroactive polymer element (EAP), which is supplied by the control device 709.2 With an electrical voltage U can be applied, resulting in at least one dimension of the manipulation element 709.1 changes. The mechanisms of the change in the dimensions of such an electroactive polymer element caused by the applied electric field are well known, for example, from the publications cited at the outset, so that they will not be discussed further here.

The manipulation element 709.1 is in 8A in its initial state without applied chip tion (ie U = 0). The manipulation element 709.1 is arranged so that when applying a voltage U in one in the direction of the axis of action 709.3 extended effective direction compared to the initial state extended.

The manipulation element 709.1 can in its initial state, inter alia, by one in the direction of the axis of action 709.3 acting component of the weight G of the element 101.4 be loaded so that the manipulation element 709.1 already because of this load in the direction of its axis of action 709.3 is subjected to a tensile stress as a mechanical bias.

Likewise, however, it can also be provided that the arrangement 708 is oriented such that from the weight G, which on the parts 101.4 and 101.5 the component 101.3 acts, no such bias of the manipulation element 709.1 results. This may for example be the case when the weight G of the component 101.3 is supported by a corresponding support means and a manipulation is to be made in a plane which is perpendicular to the direction of the weight.

For this case, the manipulation device comprises 709 a pretensioner 711 with a biasing element 711.1 , which with the manipulation element 709.1 connected is. The biasing element 711.1 is designed to be on the manipulation element 709.1 in normal operation of the imaging device 101 in its respective operating state exerts a biasing force F ₂ , so that it is acted upon by a tensile stress as a mechanical bias.

The manipulation element 709.1 thus experiences an elastic strain in the direction of the axis of action 709.3 , Accordingly, the manipulation element exercises 709.1 in the direction of the axis of action 709.3 a directed against the biasing force F ₂ elastic restoring force F ₁ on the component 101.3 out, like this 8A can be seen.

In the electroactive polymer element (EAP) 709.1 it may be, for example, a so-called electrostrictive polymer element in which the polymer structure is changed by the applied electric field and thus causes the change in length. Likewise, it may be a so-called dielectric elastomer element, in which the change in length is effected mechanically by the electrostatic attraction forces of two electrodes, between which the polymer is arranged. Optionally, combinations of these types of elements are possible.

Due to the tensile stress as a mechanical bias is the manipulation element 709.1 of the manipulator 709 not directly used according to the invention, the manipulation force for manipulating the component 101.3 to produce, but it will be the respective elastic restoring force F ₁ of the manipulation member 709.1 as a counterforce for the biasing device 711 resulting force S = F ₁ used.

The resulting manipulation force F _M , which is the desired manipulation of the component 101.3 along the axis of action 709.3 causes, then results from the restoring force F _{1 of} the manipulation element 709.1 and the force S to: F M = S - F 1 = F 2 - F 1 , (19)

In other words, the manipulation element becomes 709.1 According to the invention, it does not itself use for generating the manipulation force F _M , but rather serves as a control element for the manipulation force F _M , in that it influences the resulting manipulation force F _M via its elastic restoring force F ₁ .

The solution according to the invention has the advantage that acting as a tensile elastic restoring force F _{1 of} the manipulation element 709.1 despite its low lateral stiffness has a well-defined effective direction, so that a manipulation with high precision is possible.

In the static state (manipulation force F _M = 0), the equilibrium of forces results from that at the component 101.3 forces acting as the first component in each case: F 1 = F 2 , (20) For the sake of simplification, it will initially be assumed that, without an applied electrical voltage U, a linear relationship between a tensile force applied to the respective manipulation element and the Resulting change in length of the manipulation element, the manipulation element therefore behaves like a spring with a spring constant c ₁ . Such a linear relationship only approximates the behavior of electroactive polymers, but for purposes of the present description this is sufficient.

In the initial state (U = 0), the spring constant c _{1 of} the manipulation element applies 709.1 , resulting from the elastic strain static change in length Δs _{0 of} the manipulation element 709.1 and the force F ₂ (Δs ₀ ) of the pretensioner 711 : c 1 · .DELTA.s 0 = F 2 (.DELTA.s 0 ). (21)

In a further operating state, the control device sets 709.2 to the manipulation element 709.1 a voltage U ≠ 0, so that a further deflection Δs of the manipulation element 709.1 is achieved. Here, the spring constant of the manipulation element changes 109.1 and thus the restoring force resulting from its expansion, which should be taken into account here by a correction value K. For the restoring force here according to equation (5) F 1 = c 1 · (.DELTA.s 0 + Δs) - K.

The correction value K is calculated in accordance with equation (6) as follows: K = V (s) · U, where V (s) is the sensitivity of the manipulation element that is known or easily determinable for the respective manipulation element and is dependent on the current length s of the manipulation element 109.1 (in NN) and U denotes the applied voltage (in V).

Furthermore, on the one hand, due to the applied voltage U, there is a change in length ΔI _{U1 of} the manipulation element 709.1 , On the other hand, in turn, results from the load resulting elastic change in length .DELTA.I _F , the manipulation element 709.1 where the above equations ( 7 ), ie s = Δl U1 + ΔI F1 = Δs 0 + Δs.

From the equilibrium of forces in the static state is then obtained with the force F ₂ (Δs ₀ + Δs) of the biasing device 711 in turn: c 1 · (.DELTA.s 0 + Δs) - K = F 2 (.DELTA.s 0 + Δs). (22)

Substituting the equations (6) and (22) into the equation (19) and resolving them after the change in length Δs, we again obtain according to equation (9):

In other words, equation (10) also applies here, and it is thus possible, depending on the characteristic of the force F ₂ and the sensitivity V (s) for a given deflection Δs, to have the manipulation element required 109.1 determine voltage U to be applied, with which the balance of power can be established.

To a well-defined manipulation of the component 707.1 To achieve, one can use the control device 709.2 connected detection device 709.4 be provided, which is the actual manipulation of the component 707.1 detected and a corresponding signal to the controller 709.2 supplies, which this information then in the control of the manipulation element 709.1 uses.

Furthermore, it can be provided that the device 711 has a controllable characteristic of the force F ₂ . To control this characteristic of the force F ₂ , the device can 711 also with the control device 709.2 be connected, as in 8th through the dashed outline 709.5 is indicated.

It can be provided that the biasing element 711.1 is also an electroactive polymer element (EAP), which is when acted upon by an electrical voltage U in the direction of its axis of action 711.2 expands, but always with a compressive stress as a mechanical bias is charged.

The biasing element 711.1 and the manipulation element 709.1 can be arranged coaxially. Here, for example, one of the two elements 709.1 and 711.1 be designed as a simple hollow cylindrical element, which then in its interior the other of the two elements 709.1 and 711.1 receives. It is understood, however, that in other variants of the invention, a different arrangement of the biasing member and the manipulation element may be provided. For example, only parallel axes of action can be provided. Furthermore, of course, a plurality of manipulation elements and / or a plurality of biasing elements can be combined.

The use of electroactive polymer elements for the manipulation device 709 and the pretensioner 711 has the already described in connection with the sixth embodiment advantage that the characteristic of the biasing force F ₂ and thus the restoring force S can be set arbitrarily. Thus, not only is it possible to control the manipulation movement, but also to adjust the manipulation force M in the desired manner.

A further advantage of this solution is that the electroactive polymer elements (EAP) have a low lateral rigidity, so that they themselves already provide a lateral mechanical decoupling which allows the introduction of parasitic forces and moments into the component 101.3 reduced in an advantageous manner.

The 8B shows in the case of a simple mechanical spring device as a biasing device 711 in the form of the characteristic 713 schematically the relationship between the voltage U, which the control device 709.2 to the manipulation element 709.1 applies, and the deflection Δs of the manipulation element 709.1 pointing to the component 101.3 is transmitted.

The 8C shows for this case the relationship between the elastic restoring force F ₁ and the actuating force S = F ₂ and the deflection s. It is in 2C the respective restoring force F ₁ for three different electrical voltages U shown, namely the restoring force F ₁ (U = 0) for a voltage U = 0 (solid line), the restoring force F ₁ (U ₁ ) for a voltage U ₁ > 0 ( dot-dash line) and the restoring force F ₁ (U ₂ ) for a voltage U ₂ > U ₁ (two-dot chain line).

Again 8C can be seen, has the biasing device 711 the characteristic F _{2 of} a simple elastic compression spring with a spring constant c ₂ , wherein the spring force F ₂ thus decreases with increasing deflection s, thus therefore according to equation (11): F 2 (.DELTA.s 0 + Δs) = F 2 (0) - c 2 · (.DELTA.s 0 + Δs), where F ₂ (0) is the biasing force of the device 111 in the unloaded state of the manipulation element 109.1 (Displacement s = 0), or in accordance with equation (12): .DELTA.F 2 (Δs) = -c 2 · .DELTA.s,

For the deflection .DELTA.s then results according to equation (13):

On the right side of the point of intersection P (U = 0) between the characteristic of the actuating force S and the characteristic of the restoring force F ₁ (U = 0) at the electrical voltage U = 0 is the operating range B of the arrangement 708 , Here lie on the characteristic of the force S, the operating points in which the arrangement 708 for manipulating the component 101.3 can be operated. Again 8C can be seen, can be in this operating range B for each operating point P (U) of the actuating force S with a deflection s = Δs ₀ + Δs a characteristic of the restoring force F ₁ (U) of the manipulation device 709.1 determine at an electrical voltage U ≠ 0, which intersects the characteristic of the force S in this operating point, so that equilibrium of forces S = F ₁ (U) prevails. In 8C this is illustrated by the example of the operating points P (U ₁ ) for the electrical voltage U ₁ and P (U ₂ ) for the electrical voltage U ₂ .

It goes on to be understood in this context that, with this embodiment, the in connection with the 2D described method can be carried out, so that reference should be made only to the above statements.

Eighth embodiment

The following is with reference to the 1 . 9A and 9B a further preferred embodiment of the inventive arrangement 808 described which in the imaging device 101 can be used to manipulate one of their components.

The order 808 includes a manipulation device for this purpose 809 with a manipulation element 809.1 and an associated control device 809.2 , The manipulating component comprises the lens 106.1 the lighting device 102 and a coupling element connected thereto 817 ,

The coupling element 817 has the shape of a ring opened in one place and lies outside on the circumference of the lens 106.1 at. On both sides of the opening 817.1 of the coupling element 817 has the coupling element 817 each an actuating arm 817.2 on. At these operating arms 817.2 is again the manipulation element 809.1 attached so that it is the opening 817.1 bridged, with its axis of action 809.3 in the tangential direction of the coupling element 817 or the lens 106.1 is arranged.

The Lens 106.1 can via a (not shown) separate holding device with the housing of the lighting device 102 be connected. Likewise, however, it can also be provided that the lens 106.1 via a (also not shown) with the coupling element 817 connected holding device with the housing of the lighting device 102 connected is.

The manipulation element 809.1 is an electroactive polymer element (EAP), which is supplied by the control device 809.2 With an electrical voltage U can be applied, resulting in at least one dimension of the manipulation element 809.1 changes. The mechanisms of the change in the dimensions of such an electroactive polymer element caused by the applied electric field are well known, for example, from the publications cited at the outset, so that they will not be discussed further here.

The manipulation element 809.1 is in 9A in its initial state without voltage applied (ie U = 0) shown. The manipulation element 809.1 is arranged so that when applying a voltage U in one in the direction of the axis of action 809.3 extended effective direction compared to the initial state extended.

The coupling element 817 and the manipulation element 809.1 are arranged so that the lens having a certain elasticity 106.1 in the initial state by the coupling element 817 in its radial direction R is compressed. Accordingly, the manipulation element 809.1 via the coupling element acting as force deflection 817 in its initial state by the elastic restoring force of the compressed lens 106.1 in the direction of its axis of action 809.3 loaded by a force FR, so that the manipulation element 809.1 an elastic strain in the direction of its axis of action 809.3 experiences. Accordingly, the manipulation element exercises 809.1 in the direction of the axis of action 809.3 one against the force FR of the compressed lens 106.1 directed elastic restoring force F ₁ , via the coupling element 817 on the lens 106.1 is transmitted.

In the electroactive polymer element (EAP) 809.1 it may be, for example, a so-called electrostrictive polymer element in which the polymer structure is changed by the applied electric field and thus causes the change in length. Likewise, it may be a so-called dielectric elastomer element, in which the change in length is effected mechanically by the electrostatic attraction forces of two electrodes, between which the polymer is arranged. Optionally, combinations of these types of elements are possible.

The order 808 also includes a device 811 in the form of an element 811.1 , which also with the two operating arms 817.2 is connected in such a way that it is kinematically parallel to the manipulation element 809.1 is arranged. The element 811.1 exercises in the direction of its (collinear to the axis of action 809.3 arranged) axis of action 811.2 another force F ₂ , via the coupling element 817 on the lens 106.1 is transmitted.

Depending on their design, it may be in the device 811 to act a biasing device whose force F ₂ acts in the direction of the force FR and thus the manipulation element 809.1 additionally pretensions (the in 9A shown force F ₂ then has a positive amount). Similarly, it may be at the device 811 act to a support means whose force F ₂ acts against the force FR and thus at least one Part of the elastic restoring force of the lens 106.1 compensates and thus the manipulation element 809.1 relieved (the in 9A shown force F ₂ then has a negative amount).

In any case, the device is 811 designed so that the manipulation element 809.1 in normal operation of the imaging device 801 in each operating state in the direction of the axis of action 809.3 is subjected to a tensile stress as a mechanical bias. It is understood, however, that such a device 811 may be absent in other variants of the invention. In this case, the mechanical tensile bias of the manipulation element is then achieved solely by the elastic restoring force of the lens.

Due to the tensile stress as a mechanical bias is the manipulation element 809.1 of the manipulator 809 not directly used according to the invention, the manipulation force for manipulating the lens 106.1 to produce, but it will be the respective elastic restoring force F ₁ of the manipulation member 809.1 used as a counterforce for the force S, extending along the axis of action 809.3 as the result of the (from the elastic restoring force of the lens 106.1 resulting) force FR and force F _{2 of} the device 811 results. S = F R + F 2 , (23)

The resulting manipulation force F _M , which the desired manipulation along the axis of action 809.3 causes, then results from the restoring force F _{1 of} the manipulation element 809.1 and the force S to: F M = S - F 1 , (24)

In other words, the manipulation element becomes 809.1 According to the invention, it does not itself use for generating the manipulation force F _M , but rather serves as a control element for the manipulation force F _M , in that it influences the resulting manipulation force F _M via its elastic restoring force F ₁ .

Becomes the manipulation element 809.1 by the control device 809.2 subjected to an electrical voltage U, so it extends in the direction of its axis of action 809.3 , Due to the resulting manipulation force F _M , the actuating arms move 817.2 as long away from each other until an equilibrium of forces has been achieved and the manipulation force F _M has dropped to the value zero. This expands the lens 106.1 radially out, as in 9A through the dashed outline 818 is indicated. Due to this radial expansion, the curvature of the lens surfaces and thus the optical characteristics of the lens changes 106.1 and thus the lighting device 102 ,

The solution according to the invention has the advantage that acting as a tensile elastic restoring force F _{1 of} the manipulation element 809.1 despite its low rigidity has a well-defined effective direction, so that a manipulation with high precision is possible.

To get a well-defined manipulation of the lens 106.1 To achieve, one can use the control device 809.2 connected detection device 809.4 be provided, which is the actual manipulation of the lens 106.1 detected and a corresponding signal to the controller 809.2 supplies, which this information then in the control of the manipulation element 809.1 uses.

Furthermore, it can be provided that the device 811 has a controllable characteristic of the force F ₂ . To control this characteristic of the force F ₂ , the device can 811 also with the control device 809.2 be connected. It can be provided that the element 811.1 is also an electroactive polymer element (EAP), which is when acted upon by an electrical voltage U in the direction of its axis of action 811.2 expands.

It is understood in this context that the wrap angle of the coupling element 817 (ie the circumferential angle over which the coupling element 817 at the lens 106.1 depending on the required uniformity of the lens 106.1 introduced voltages and thus the deformation of the lens 106.1 can be chosen. In the present example, the wrap angle in the initial state is about 355 °. It is understood, however, that in other variants of the invention, in which lower demands are placed on this uniformity, even smaller angles of wrap can be selected. Depending on the deformation properties of the optical element to be deformed, a wrap angle of just over 180 ° may be sufficient. Usually, however, a wrap angle of more than 270 ° will have to be selected.

The 9B shows a variant of this embodiment, in which a wrap angle of more than 360 ° is present. To do this, overlap the two ends 817.3 each other in the circumferential direction of the lens 106.1 , In this variant, two further manipulation elements 809.1 provided, on the one hand on the outside of the operating arms 817.2 attack and on the other hand on a holding device 810 the housing of the lighting device 102 are attached to the above related to the 9A described deformation of the lens 106.1 to achieve.

It goes on to be understood in this context that, with this embodiment, the in connection with the 2D described method can be carried out, so that reference should be made only to the above statements.

Ninth embodiment

The following is with reference to the 1 . 10 and 11 a further preferred embodiment of the inventive arrangement 908 described which in place of the arrangement 808 in the lighting device 102 can be used to the lens 106.1 to manipulate. The components of the arrangement 908 corresponding in their basic structure and functioning those of the arrangement 808 out 9 , so that only the differences should be discussed here.

The difference to the arrangement 808 consists in the design and arrangement of the manipulation device 908 that is a manipulation element 909.1 and an associated controller 909.2 includes.

The manipulation element 909.1 has the shape of a closed ring and lies outside on the circumference of the lens 106.1 at. The Lens 106.1 can thereby via a (not shown) separate holding device with the housing of the lighting device 102 be connected. Likewise, however, it can also be provided that the lens 106.1 about one in 10 and 11 through the dashed outline 919.1 indicated, with the manipulation element 909.1 connected holding device with the housing of the lighting device 102 connected is.

The manipulation element 909.1 is an electroactive polymer element (EAP), which is supplied by the control device 909.2 With an electrical voltage U can be applied, resulting in at least one dimension of the manipulation element 909.1 changes. The mechanisms of the change in the dimensions of such an electroactive polymer element caused by the applied electric field are well known, for example, from the publications cited at the outset, so that they will not be discussed further here.

The manipulation element 909.1 is in 10 and 11 shown in an operating state that differs from its initial state without applied voltage (ie U = 0), the initial state in 10 and 11 through the dashed outline 920 is indicated. The manipulation element 909.1 is arranged such that, when a voltage U is applied, the axis of action is in the direction of the (at any point in the tangential direction) axis of action 909.3 extended effective direction compared to the initial state extended.

The manipulation element 909.1 is arranged so that the lens having a certain elasticity 106.1 in the initial state by the coupling element 917 in its radial direction R is compressed. Accordingly, the manipulation element 909.1 in its initial state by the elastic restoring force of the compressed lens 106.1 in the direction of its axis of action 909.3 loaded by a force FR, so that the manipulation element 909.1 an elastic strain in the direction of its axis of action 909.3 experiences. Accordingly, the manipulation element exercises 909.1 in the direction of the axis of action 909.3 one against the force FR of the compressed lens 106.1 directed elastic restoring force F ₁ , the shear forces on the lens 106.1 is transmitted.

In the electroactive polymer element (EAP) 909.1 it may be, for example, a so-called electrostrictive polymer element in which the polymer structure is changed by the applied electric field and thus causes the change in length. Likewise, it may be a so-called dielectric elastomer element, in which the change in length is effected mechanically by the electrostatic attraction forces of two electrodes, between which the polymer is arranged. Optionally, combinations of these types of elements are possible.

The manipulation element 909.1 is further designed so that it is in normal operation of the imaging device 101 in each operating state in the direction of the axis of action 909.3 is subjected to a tensile stress as a mechanical bias. It goes without saying here that, if necessary, in turn a pretensioning device and / or support device can be provided, which can be the manipulation element 909.1 additionally biased and / or relieved and optionally also has a variable characteristics described in connection with the other embodiments.

Due to the tensile stress as a mechanical bias is the manipulation element 909.1 of the manipulator 909 not directly used according to the invention, the manipulation force for manipulating the lens 106.1 to produce, but it will be the respective elastic restoring force F ₁ of the manipulation member 909.1 used as a counterforce for the force S, extending along the axis of action 909.3 as from the elastic restoring force of the lens 106.1 results.

In other words, the manipulation element also becomes here 909.1 According to the invention, it does not itself use for generating the manipulation force F _M , but rather serves as a control element for the manipulation force F _M , in that it influences the resulting manipulation force F _M via its elastic restoring force F ₁ .

Becomes the manipulation element 909.1 by the control device 909.2 subjected to an electrical voltage U, so it extends in the direction of its axis of action 909.3 in its circumferential direction. This increases its inner diameter and the lens 106.1 expands radially to a degree, as in 10 and 11 is shown. Again 11 can be seen, changes due to this radial extent, the curvature of the lens surfaces and thus the optical characteristics of the lens 106.1 and thus the lighting device 102 ,

The solution according to the invention has the advantage that acting as a tensile elastic restoring force F _{1 of} the manipulation element 909.1 despite its low rigidity has a well-defined effective direction, so that a manipulation with high precision is possible.

To get a well-defined manipulation of the lens 106.1 To achieve, one can use the control device 909.2 connected detection device 909.4 be provided, which is the actual manipulation of the lens 106.1 detected and a corresponding signal to the controller 909.2 supplies, which this information then in the control of the manipulation element 909.1 uses.

It is understood that the manipulation element does not necessarily have to be a closed ring. Rather, it can also be provided in other variants of the invention that the manipulation element similar to the coupling element 817 from the eighth embodiment has two ends, which are then to be fixed accordingly, as in 10 through the dashed outline 919.2 is indicated. It can be provided that the manipulation element, the lens 106.1 wraps around several times.

It goes on to be understood in this context that, with this embodiment, the in connection with the 2D described method can be carried out, so that reference should be made only to the above statements.

Tenth embodiment

The following is with reference to the 1 and 12 a further preferred embodiment of the inventive arrangement 1008 described in the imaging device 101 can be used to manipulate one of their components.

The order 1008 In its basic structure and its fundamental function, it resembles that of the arrangement 608 out 7 , It includes a manipulation device 1009 with a manipulation element 1009.1 and an associated control device 1009.2 ,

The component to be manipulated is the aperture device 107.2 of the lens 104 , the aperture device 107.2 includes one with the housing 104.2 of the lens connected fixed first ring 107.3 , on which the individual aperture elements pivot 107.4 are arranged, of which in 12 for reasons of clarity, only one is shown. The aperture elements 107.4 are designed in a well-known manner, so that will not be discussed further here.

Furthermore, the diaphragm device comprises 107.2 one rotatable in the housing 104.2 stored second ring 107.5 coaxial with the first ring 107.3 is arranged. The second ring 107.5 is articulated with the respective panel element 107.4 connected so that upon rotation of the second ring 107.5 the aperture can be adjusted as shown in 12 through the dashed outline 1020 and the dotted contour 1021 is indicated.

About a gearbox 1022 is the second ring 107.5 with the manipulation element 1009.1 connected, which in turn with a holding device 1010 of the housing 104.2 connected is. Similar to the arrangement 608 engages in the arrangement 1008 the manipulation element 1009.1 on the gearbox 1022 while on the opposite side of the transmission 1022 a biasing element 1011.1 the pretensioner 1011 is assigned such that the axis of action 1009.3 of the manipulation element 1009.1 essentially collinear with the axis of action 1011.2 of the biasing element 1011.1 is arranged. The biasing element 1011.1 is on the one hand with the gearbox 1022 and on the other hand with the holding device 1010 connected.

The biasing element 1011.1 is also an electroactive polymer element (EAP) connected to the control device 1009.2 is connected, and can be acted upon by this with a voltage U, so as to extend its length along its axis of action 1011.2 to change.

The manipulation element 1009.1 and the biasing element 1011.1 are arranged and designed so that the manipulation element 1009.1 in its initial state without applied voltage (U = 0) is subjected to a tensile stress as a mechanical bias. Furthermore, the control device controls 1009.2 the manipulation element 1009.1 and the biasing element 1011.1 each so on, that the manipulation element 1009.1 in normal operation of the imaging device 101 in any operating condition in the direction of its axis of action 1009.3 is subjected to a tensile stress as a mechanical bias. By using the existing at any time elastic restoring force of the manipulation elements 1009.1 can be a precise manipulation of the aperture device 107.2 be ensured.

The control device 1009.2 controls the manipulation element 1009.1 and the biasing element 1011.1 according to appropriate specifications, for example, for the targeted adjustment of the optical characteristics of the lens 104 at. In this case, the control device uses 1009.2 the signals of the detection device 1009.4 indicating the actual manipulation of the aperture device 107.1 detected. It is understood that in other variants of the invention, for example, can also be provided that the detection device 1009.4 For example, directly the optical characteristics of the lens 104 detected and the control takes place directly in response to this detected optical characteristic.

As with the previous embodiments, it is of course possible that in other variants of the invention in addition to the biasing device 1011 a support means and / or a further biasing means may be provided, as described above in connection with the other embodiments. In particular, it is possible for each biasing element 1011.1 to assign another biasing element with Kollinearer effective axis.

It goes on to be understood in this context that, with this embodiment, the in connection with the 2D described method can be carried out, so that reference should be made only to the above statements.

Eleventh embodiment

The following is with reference to the 1 . 13 and 14 a further preferred embodiment of the inventive arrangement 1108 described which in the imaging device 101 can be used to manipulate one of their components.

The order 1108 includes a manipulation device 1109 with a manipulation element 1109.1 and an associated control device 1109.2 ,

The component to be manipulated is not a physical component but a functional component of the imaging device 101 namely, the aperture 107.6 the aperture device 107.2 of the lens 104 , which continues with the case 104.2 of the lens connected fixed first ring 107.3 includes, on which the manipulation element 1109.1 is attached.

The manipulation element 1109.1 is annular, with its inner circumference Blendenö opening 107.6 forms so that the aperture 107.6 as a component to be manipulated in the sense of the present invention with the manipulation element 1109.1 connected is. The manipulation element 1109.1 is thus therefore an immediate part of the aperture device 107.2 ,

The manipulation element 1109.1 is an electroactive polymer element (EAP), which is supplied by the control device 1109.2 With an electrical voltage U can be applied, resulting in at least one dimension of the manipulation element 1109.1 changes. The mechanisms of the change in the dimensions of such an electroactive polymer element caused by the applied electric field are well known, for example, from the publications cited at the outset, so that they will not be discussed further here.

The manipulation element 1109.1 is in 13 and 14 in its initial state without voltage applied (ie U = 0) shown. The manipulation element 1109.1 is arranged so that when applying a voltage U in one in the direction of its axis of action 1109.3 extends extending effective direction relative to the initial state, said axis of action 1109.3 at any point in the radial direction of the manipulation element 1109.1 runs. This reduces the aperture, as in 13 and 14 through the dashed outline 1123 is indicated.

In the manipulation element 1109.1 is an annular biasing element 1111.1 a pretensioner 1111 so embedded that the axis of action 1109.3 of the manipulation element 1109.1 essentially collinear with the axis of action also extending radially at each point 1111.2 of the biasing element 1111.1 is arranged.

The biasing element 1111.1 is a radially resilient element, which in normal operation of the imaging device 101 in any operating condition, a radially inwardly directed biasing force on the manipulation element 1109.1 exercises. It is understood, however, that in other variants of the invention, such a biasing device may also be missing.

The manipulation element 1109.1 is so on the retaining ring 107.3 attached and formed, that the manipulation element 1109.1 is acted upon in its initial state without voltage applied (U = 0) with a tensile stress acting in the radial direction as a mechanical bias. Furthermore, the control device controls 1109.2 the manipulation element 1109.1 so on, that the manipulation element 1109.1 in normal operation of the imaging device 111 in any operating condition in the direction of its axis of action 1109.3 is subjected to a tensile stress as a mechanical bias. By using the existing at any time elastic restoring force of the manipulation element 1109.1 can be a precise manipulation of the aperture 107.6 be ensured.

The control device 1109.2 controls the manipulation element 1109.1 and the biasing element 1111.1 according to appropriate specifications, for example, for the targeted adjustment of the optical characteristics of the lens 104 at. In this case, the control device uses 1109.2 the signals of the detection device 1109.4 indicating the actual manipulation of the aperture device 107.1 detected. It is understood that in other variants of the invention, for example, can also be provided that the detection device 1109.4 For example, directly the optical characteristics of the lens 104 detected and the control takes place directly in response to this detected optical characteristic.

The Surface of the manipulation element may optionally be provided with a corresponding cover to the electroactive Polymer from being affected by the used To protect light. For example, this cover comes a correspondingly elastic coating in question. The cover can simultaneously also the electrodes for the application with the electrical voltage U form.

The present embodiment has the advantage that the manipulation element 1109.1 even the only moving component of the arrangement 1108 is so that with very few components, a particularly simple and low-loss configuration without further complex mechanical drives results. Thanks to the high strains described above (up to 300%) which can be achieved with electroactive polymers, a sufficiently large adjustment range of the aperture can also be achieved 107.6 be achieved.

It should be mentioned at this point that the use of the electroactive polymer comprehensive manipulating element for the formation and manipulation of a functional component of the imaging device, such as here a diaphragm opening of the imaging device, a self-protectable Erfin represents thoughts of thought, which can be used without the provision of an elastic restoring force or a tensile stress as a mechanical bias in the manipulation element.

It goes on to be understood in this context that, with this embodiment, the in connection with the 2D described method can be carried out, so that reference should be made only to the above statements.

The The present invention has been described above by means of examples, which uses only refractive optical elements were. It should be noted again at this point that Of course, the invention also, in particular for the case of mapping at other wavelengths, in context with optical element groups can find application alone or in any combination refractive, reflective or diffractive include optical elements.

Farther For example, the present invention has been described above by way of example described in which only optically effective Elements of a lens or a lighting device were manipulated. It should be noted at this point, however, again that the invention of course also for the manipulation of other components of the Imaging device, in particular of components of the mask device and / or the substrate device may find application.

Farther the present invention has been exclusive described by way of examples, in each case a plurality identical manipulation or support or biasing elements provided are. It is understood, however, that depending on the type of achievable Manipulation possibly also arrangement differently designed Manipulation or support or biasing elements may be provided You can do this alone with a specific desired To achieve manipulation.

After all It should be noted that the present invention with reference to above of examples from the field of microlithography described has been. It will be understood, however, that the present invention is the same also for any other applications or imaging methods, in particular at arbitrary wavelengths (for example at 248 nm or in the EUV range at wavelengths in the range 13 nm) of the light used for imaging can.

QUOTES INCLUDE IN THE DESCRIPTION

This list The documents listed by the applicant have been automated generated and is solely for better information recorded by the reader. The list is not part of the German Patent or utility model application. The DPMA takes over no liability for any errors or omissions.

Cited patent literature

• US 2006/018045 A1 [0003]
• DE 102005044716 A1 [0003]
• - DE 102007019570 [0003]
• US 2006/0028742 A1 [0008]
• US 2006/0264015 A1 [0008]
• US 7092138 B2 [0008]

Cited non-patent literature

• Moeller et al. [0003]
• "Overview and Recent Advances in Polymer Actuators" (P. Sommer-Larsen, R. Kornbluh, ACTUATOR 2006, 10th International Conference on New Actuators, June 14-16, 2006, Bremen, DE) [0007]
• - Yamashita et al. [0008]
• Bergemann, T.Martin, G. Bretthauer, ACTUATOR 2006, 10th International Conference to New Actuators, June 14-16, 2006, Bremen, Germany - "Systematic Selection and Design of a Ring Actuator for the Deformation of Elastic Lens" , [0008]
• Hyde et al. [0008]
• Wang et al [0008]

Claims (96)

Arrangement, in particular for microlithography, with - a component of an optical device and - a manipulation device for actively manipulating the component along a direction of action, wherein - the manipulation device comprises at least one connected to the component electroactive polymer element as a manipulation element and - the manipulation element with a control device connectable is, via which the manipulation element for controlled manipulation of the component with an extension of the manipulation element along the effective direction causing electrical voltage can be acted upon, characterized in that - the manipulation element is adapted to at least one operating state by an elastic restoring force a counter force against a force to generate, where - the manipulation force, which causes the manipulation of the component along the direction of action, as a resultant of the force and the elastic restoring force results. Arrangement according to claim 1, characterized that the component and the manipulation element arranged such and that are connected together, that the weight of the component generates at least part of the force. Arrangement according to claim 1, characterized that - A supporting device connected to the component is provided, wherein - The support device exerts a supporting force on the component, which compensates at least part of the weight of the component, and - from the support force and the weight the component resulting force at least a portion of the force generated. Arrangement according to claim 3, characterized that - The support means at least one having the component connected to the support member, the at least a partial support force on the component exercises in which - The support element is arranged so that the partial support force acts in a direction that is in the Substantially parallel to the direction of action. Arrangement according to claim 4, characterized that the partial support force acts in a direction that is in the Essentially collinear to the direction of action. Arrangement according to claim 4, characterized that the support element kinematically parallel to the manipulation element is arranged. Arrangement according to claim 4, characterized that the support element with a second component of optical device is connected. Arrangement according to claim 4, characterized that - The support element is an elastic element includes and - The partial support force of the support element a restoring force caused by elastic deformation of the elastic element is. Arrangement according to claim 4, characterized that - The support element at least one with the component connected first magnetic element and a second includes magnetic element and - the first magnetic Element and the second magnetic element associated with each other so are that the partial support force of the support element by magnetic attraction or repulsion between the first magnetic element and the second magnetic element is conditional. Arrangement according to claim 1, characterized that - The manipulation device with the manipulation element connected biasing device, wherein - the Biasing device is designed such that it at least one Part of the force generated. Arrangement according to claim 10, characterized in that - The biasing means comprises at least one component connected to the biasing member, which exerts at least one Teilstellkraft on the component, wherein - the biasing member is arranged so that the Teilstellkraft acts in a direction which is substantially parallel to the direction of action. Arrangement according to claim 11, characterized that the Teilstellkraft acts in a direction that is essentially collinear to the direction of action. Arrangement according to claim 10, characterized that - The biasing element is an elastic element includes and - The partial force of the biasing element a restoring force caused by elastic deformation of the elastic element is. Arrangement according to claim 10, characterized that - The biasing element at least one with the Component connected first magnetic element and at least comprises a second magnetic element and - the first magnetic element and the second magnetic element each other are assigned such that the partial force of the biasing element by magnetic attraction or repulsion between the at least one first magnetic element and the at least a second magnetic element is conditional. Arrangement according to claim 10, characterized that the biasing element is formed so that the partial actuating force with increasing elongation of the manipulation element parallel to the direction of action increases. Arrangement according to claim 14 and 15, characterized that - The partial force of the biasing element by magnetic attraction between the first magnetic element and is due to the second magnetic element and - the first magnetic element and the second magnetic element in such a way are arranged so that the distance between the first magnetic Element and the second magnetic element with increasing strain reduced the manipulation element. Arrangement according to claim 10, characterized that - The manipulation element, a first force-deflection characteristic and - The biasing element a second force-deflection characteristic having, - The biasing element is formed is that the course of the second force-deflection characteristic at least approximated to the course of the first force-deflection characteristic is - In particular, the second force-deflection characteristic essentially the course of the first force-deflection characteristic replicates. Arrangement according to claims 14 and 17, characterized that the at least one first magnetic element and the at least a second magnetic element are associated with each other in such a way that the course of the second force-deflection characteristic at least approximated to the course of the first force-deflection characteristic is. Arrangement according to claim 10, characterized that - The biasing device another elektroaktiv Element comprises as a biasing element and - The biasing element can be connected to the control device via which the Biasing element for the controlled generation of at least one part the force can be acted upon by an electrical voltage. Arrangement according to claim 1, characterized that the manipulation device for manipulating the position the component is formed in at least one degree of freedom. Arrangement according to claim 1, characterized that the manipulation device for manipulating the geometry the component is formed. Arrangement according to claim 1, characterized the component is an optically active component. Arrangement according to claim 22, characterized in that the optically active component a comprises optical element, in particular a refractive, reflective or diffractive element comprises. Arrangement according to claim 22, characterized the optically active component is an aperture device. Arrangement according to claim 1, characterized that - The component is a first component of the optical Facility is and, - The optical device a second component includes, connected to the manipulation element is. Arrangement according to claim 25, characterized the second component comprises a holding device for holding the first component is. Arrangement according to claim 1, characterized that - The manipulation device at least one Coupling device comprises, via which the manipulation element coupled with the component, wherein - The coupling device has at least a first portion and a second portion, which are movable to each other, - the manipulation element connected to the first section and the second section and - The manipulation element for manipulating the Component about a change in the relative position formed between the first portion and the second portion is. Arrangement according to claim 27, characterized that The component is an optical element with a Outer circumference is and - The coupling device a clamping element comprises, wherein - The clamping element a clamping portion extending over more than Half of the outer periphery of the optical element extends and on the outer periphery of the optical element is present and - At one end of the clamping portion of first section of the coupling device connects while at the other end of the clamping portion, the second portion of Coupling device connects. Arrangement according to claim 1, characterized that The component is an optical element with a Outer circumference is and - the manipulation element wraps around more than half of the outer circumference, that the effective direction is in the circumferential direction. Arrangement according to claim 1, characterized that the at least one operating state is an initial state, in which the manipulation element is not connected to an electrical voltage is charged. Arrangement, in particular for microlithography, With A component of an optical device and - A manipulation device for active manipulation the component along a direction of action, wherein - the Manipulation device at least one connected to the component electroactive polymer element comprises as a manipulation element and - the Manipulation element is connectable to a control device, via which the manipulation element for the controlled manipulation of Component with an extension of the manipulation element along the Acting direction causing electrical voltage can be acted upon, thereby marked that - the manipulation element in at least one operating condition in a direction parallel to the direction of action, with a tensile stress as mechanical bias is applied. Arrangement according to claim 31, characterized that the at least one operating state is an initial state, in which the manipulation element is not connected to an electrical voltage is charged. Arrangement according to claim 31, characterized that the component and the manipulation element arranged such and that are connected together, that the weight of the component generates at least part of the mechanical bias. Arrangement according to claim 31, characterized in that - a support means connected to the component is provided, wherein - The support means exerts a supporting force on the component, which compensates at least part of the weight of the component, and - generates the force resulting from the supporting force and the weight of the component at least part of the mechanical bias. Arrangement according to claim 34, characterized that - The support means at least one having the component connected to the support member, the at least a partial support force on the component exercises in which - The support element is arranged so that the partial support force acts in a direction that is in the Substantially parallel to the direction of action. Arrangement according to claim 35, characterized that the partial support force acts in a direction that is in the Essentially collinear to the direction of action. Arrangement according to claim 35, characterized that the support element kinematically parallel to the manipulation element is arranged. Arrangement according to claim 35, characterized that the support element with a second component of optical device is connected. Arrangement according to claim 35, characterized that - The support element is an elastic element includes and - The partial support force of the support element a restoring force caused by elastic deformation of the elastic element is. Arrangement according to claim 35, characterized that - The support element at least one with the component connected first magnetic element and a second includes magnetic element and - the first magnetic Element and the second magnetic element associated with each other so are that the partial support force of the support element by magnetic attraction or repulsion between the first magnetic element and the second magnetic element is conditional. Arrangement according to claim 31, characterized that - The manipulation device with the manipulation element connected biasing device, wherein - the Biasing device is designed such that it at least one Part of the mechanical preload generated. Arrangement according to claim 41, characterized that - The biasing means at least one with the component has associated biasing element, the at least exerts a partial biasing force on the component, wherein - the Biasing element is arranged so that the partial prestressing force in a direction that is substantially parallel to the direction of action runs. Arrangement according to claim 42, characterized that the partial biasing force acts in a direction that is substantially collinear to the direction of action. Arrangement according to claim 41, characterized that - The biasing element is an elastic element includes and - The partial biasing force of the biasing member a conditional by elastic deformation of the elastic element Restoring force is. Arrangement according to claim 41, characterized that - The biasing element at least one with the Component connected first magnetic element and at least comprises a second magnetic element and - the first magnetic element and the second magnetic element each other are assigned such that the partial biasing force of the biasing member by magnetic attraction or repulsion between the at least a first magnetic element and the at least one second magnetic element is conditional. Arrangement according to claim 41, characterized that the biasing element is formed so that the partial biasing force increases with increasing elongation of the manipulation element parallel to the direction of action. Arrangement according to claims 45 and 46, characterized that - The partial biasing force of the biasing member by magnetic attraction between the first magnetic element and the second magnetic element is conditional and - the first magnetic element and the second magnetic element in such a way are arranged so that the distance between the first magnetic Element and the second magnetic element with increasing strain reduced the manipulation element. Arrangement according to claim 41, characterized that - The manipulation element, a first force-deflection characteristic and - The biasing element a second force-deflection characteristic having, - The biasing element is formed is that the course of the second force-deflection characteristic at least approximated to the course of the first force-deflection characteristic is - In particular, the second force-deflection characteristic essentially the course of the first force-deflection characteristic replicates. Arrangement according to claims 45 and 48, characterized that the at least one first magnetic element and the at least a second magnetic element are associated with each other in such a way that the course of the second force-deflection characteristic at least approximated to the course of the first force-deflection characteristic is. Arrangement according to claim 41, characterized that - The biasing device another elektroaktiv Element comprises as a biasing element and - The biasing element can be connected to the control device via which the Biasing element for controlled generation of the bias voltage with a electrical voltage can be acted upon. Arrangement according to claim 31, characterized that the manipulation device for manipulating the position the component is formed in at least one degree of freedom. Arrangement according to claim 31, characterized that the manipulation device for manipulating the geometry the component is formed. Arrangement according to claim 31, characterized the component is an optically active component. Arrangement according to claim 53, characterized that the optically active component is an optical element, in particular a refractive, reflective or diffractive element is. Arrangement according to claim 53, characterized the optically active component is an aperture device. Arrangement according to claim 31, characterized that - The component is a first component of the optical Facility is and, - The optical device a second component includes, connected to the manipulation element is. Arrangement according to claim 56, characterized the second component comprises a holding device for holding the first component is. Arrangement according to claim 31, characterized that - The manipulation device at least one Coupling device comprises, via which the manipulation element coupled with the component, wherein - The coupling device has at least a first portion and a second portion, which are movable to each other, - the manipulation element connected to the first section and the second section and - The manipulation element for manipulating the Component about a change in the relative position formed between the first portion and the second portion is. Arrangement according to claim 58, characterized that The component is an optical element with a changeable outer circumference is and - the Coupling device comprises a clamping element, wherein - the Clamping element has a clamping portion which extends over more than half of the outer circumference of the optical Elements extends and on the outer periphery of the optical Elements rests and - At one end of the clamping portion the first section of the coupling device connects while at the other end of the clamping portion, the second portion of Coupling device connects. Arrangement according to claim 31, characterized that The component is an optical element with a changeable outer circumference is and - the Manipulation element more than half of the outer circumference so wraps around that the direction of action in the circumferential direction runs. Manipulator, especially for the application in microlithography, with - an electroactive Polymer element, wherein - The electroactive polymer element forms an active manipulation element and - the Manipulation element is connectable to a control device, via which the manipulation element for controlled manipulation with one causing an expansion of the manipulation element along the direction of action electrical voltage can be applied, characterized, that - A biasing means for generating a is provided along the effective direction acting force, wherein - the Manipulation element is designed to, in at least one operating condition by an elastic restoring force a counter force against to generate the force. Manipulator according to Claim 61, characterized that the at least one operating state is an initial state, in which the manipulation element is not connected to an electrical voltage is charged. Manipulator according to Claim 61, characterized that - The biasing means an elastic element includes and - The biasing means a biasing force on the manipulation element, the one by elastic deformation the elastic element conditional restoring force. Manipulator according to Claim 61, characterized that - The biasing means at least a first magnetic element and at least one second magnetic element includes and - The at least one first magnetic Element and the at least one second magnetic element each other are assigned such that they have a biasing force on the manipulation element exert by magnetic attraction or repulsion between the at least one first magnetic element and the at least a second magnetic element is conditional. Manipulator according to Claim 61, characterized in that the pretensioning device is designed such that it has a pretensioning force on the manipulation element, which increases with increasing Expansion of the manipulation element increases parallel to the direction of action. Manipulator according to Claim 61, characterized that - The manipulation element, a first force-deflection characteristic and - The biasing means a second Having force-deflection characteristic, wherein - the Biasing device is designed so that the course of the second Force-deflection characteristic at least to the course of the first Force-displacement characteristic is approximated, - especially the second force-deflection characteristic essentially the course the first force-deflection characteristic simulates. Manipulator according to Claim 61, characterized that - The biasing device another elektroaktiv Element comprises as a biasing element and - The biasing element can be connected to the control device via which the Biasing element for the controlled generation of the biasing force with an electrical voltage can be acted upon. Manipulator, especially for use in microlithography, with - An electroactive polymer element, wherein - the electroactive polymer element forms an active manipulation element and - the manipulation element is connectable to a control device on which the manipulation element for controlled manipulation with an extension of the manipulation element along the direction of action causing electrical voltage can be acted upon, characterized in that - A biasing means is provided, wherein - the biasing means acts on the manipulation element in at least one operating state in a direction which is parallel to the direction of action, with a tensile stress as a mechanical bias. Manipulator according to claim 68, characterized that the at least one operating state is an initial state, in which the manipulation element is not connected to an electrical voltage is charged. Manipulator according to claim 68, characterized that - The biasing means an elastic element includes and - The biasing means a biasing force on the manipulation element, the one by elastic deformation the elastic element conditional restoring force. Manipulator according to claim 68, characterized that - The biasing means at least a first magnetic element and at least one second magnetic element includes and - The at least one first magnetic Element and the at least one second magnetic element each other are assigned such that they have a biasing force on the manipulation element exert by magnetic attraction or repulsion between the at least one first magnetic element and the at least a second magnetic element is conditional. Manipulator according to claim 68, characterized in that the pretensioning device is designed such that it has a pretensioning force on the manipulation element, which increases with increasing Expansion of the manipulation element increases parallel to the direction of action. Manipulator according to claims 71 and 72, characterized that - The biasing force by magnetic attraction between the at least one first magnetic element and the at least one second magnetic element is conditional and - the first magnetic element and the at least one second magnetic Element are arranged such that the distance between the at least one first magnetic element and the at least a second magnetic element with increasing elongation of the manipulation element reduced. Manipulator according to claim 68, characterized that - The manipulation element, a first force-deflection characteristic and - The biasing means a second Having force-deflection characteristic, wherein - the Biasing device is designed so that the course of the second Force-deflection characteristic at least to the course of the first Force-displacement characteristic is approximated, - especially the second force-deflection characteristic essentially the course the first force-deflection characteristic simulates. Manipulator according to claims 71 and 74, characterized that the at least one first magnetic element and the at least a second magnetic element are associated with each other such that the course of the second force-deflection characteristic at least approximated the course of the first force-deflection characteristic is. Manipulator according to claim 68, characterized that - The biasing device another elektroaktiv Element comprises as a biasing element and - The biasing element can be connected to the control device via which the Biasing element for controlled generation of the bias voltage with a electrical voltage can be acted upon. Optical imaging device, in particular for microlithography, with - a lighting device, - a mask device for receiving a mask comprising a projection pattern, - a projection device with an optical element group and A substrate device for receiving a substrate, wherein the illumination device is designed to illuminate the projection pattern, the optical element group is designed to image the projection pattern on the substrate, characterized in that the illumination device and / or the mask device and / or the projection device and / or the substrate device comprises at least one arrangement according to claim 1 or 31. Method for actively manipulating a component an optical device, in particular a device for microlithography, in which - the component over a manipulation element actively manipulated along a direction of action being, being - The manipulation element is an electroactive Polymer element is that for controlled manipulation of the component with an extension of the manipulation element along the Acting direction causing electrical voltage can be acted upon, characterized in that - the manipulation element in at least one operating state by an elastic restoring force generates a counterforce against a force, wherein - yourself the manipulative force, which is the manipulation of the component along the effective direction causes, as a resultant of the force and the elastic restoring force results. Method according to claim 78, characterized in that that the manipulation element in the at least one operating state in a direction parallel to the direction of action, is subjected to a tensile stress as a mechanical bias. Method according to claim 78, characterized in that that the at least one operating state is an initial state, in which the manipulation element is not connected to an electrical voltage is charged. Method according to claim 78, characterized in that that at least a part of the actuating force by the weight of the Component is generated. Method according to claim 78, characterized in that that at least a part of the weight of the component by a Support device is compensated. Method according to claim 82, characterized in that that - Via a support element of Support device at least a partial support force is exercised on the component, wherein - the Part support force acts in one direction, which is essentially parallel, in particular collinear, extends to the direction of action. Method according to claim 83, characterized that the partial supporting force by a by elastic deformation generates the restoring element conditional restoring force becomes. Method according to claim 83, characterized that the partial support force by magnetic attraction and / or Repulsion is generated. Method according to claim 78, characterized in that that at least a part of the actuating force by a biasing device is produced. A method according to claim 86, characterized that - The manipulation element, a first force-deflection characteristic and - The biasing means a second Force-deflection characteristic whose course at least to approximated the course of the first force-deflection characteristic is, in particular substantially the course of the first force-deflection characteristic replicates. Method according to claim 78, characterized in that that at least part of the actuating force by an elastic restoring force an elastic element is generated. Method according to claim 78, characterized in that that at least part of the force due to magnetic attraction and / or repulsion is generated. A method according to claim 78, characterized in that at least a part of the actuating force with increasing stretching of the manipulation element increases parallel to the direction of action. Method according to claim 78, characterized in that that - At least a part of the force by a another electroactive element is produced as a biasing element, wherein - the Biasing element for the controlled generation of at least one part the force can be acted upon by an electrical voltage. Method according to claim 78, characterized in that that manipulates the position and / or geometry of the component becomes. Method according to claim 78, characterized in that the component is an optically active component. Method according to claim 93, characterized that the optically active component is an optical element, in particular a refractive, reflective or diffractive element is. Method according to claim 93, characterized the optically active component is an aperture device. Optical imaging method, in particular for microlithography, in which - a lighting device illuminated a projection pattern of a mask device and - the Projection pattern by means of the optical elements of a projection device is imaged onto a substrate of a substrate device, thereby marked that - at least one component the illumination device and / or the mask device and / or the projection device and / or the substrate device with a method according to claim 78 is manipulated.