DE102005037764A1 - Field illumination device for micro-lithography projection exposure system, has field homogenization unit and lens provided between laser and reflecting unit, which is designed so that position of optical axis is not changed by rotation - Google Patents
Field illumination device for micro-lithography projection exposure system, has field homogenization unit and lens provided between laser and reflecting unit, which is designed so that position of optical axis is not changed by rotation Download PDFInfo
- Publication number
- DE102005037764A1 DE102005037764A1 DE200510037764 DE102005037764A DE102005037764A1 DE 102005037764 A1 DE102005037764 A1 DE 102005037764A1 DE 200510037764 DE200510037764 DE 200510037764 DE 102005037764 A DE102005037764 A DE 102005037764A DE 102005037764 A1 DE102005037764 A1 DE 102005037764A1
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- Germany
- Prior art keywords
- field
- laser
- optical axis
- arrangement according
- rotatably mounted
- Prior art date
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
- G02B26/0883—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements the refracting element being a prism
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
- G02B26/108—Scanning systems having one or more prisms as scanning elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0972—Prisms
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
Abstract
Description
Die Erfindung betrifft eine Anordnung zur homogenen Beleuchtung eines Feldes, bei der ein Laser einen Rohstrahl aussendet, welcher ein drehbares optisches Bauelement durchstrahlt und in Lichtbündel aufgeteilt wird, die durch eine Linse umgeformt werden und ein Feld ausleuchten.The The invention relates to an arrangement for homogeneous illumination of a Field in which a laser emits a raw beam, which a rotatable optical component irradiated and divided into light bundles which are reshaped by a lens and illuminate a field.
Bei der Anwendung teilkohärenter Lichtquellen, zum Beispiel einem Excimer Laser, wird ein erheblicher Aufwand betrieben, das rechteckige Strahlprofil in eine homogene strukturarme Pupillen- und Feldverteilung umzuwandeln.at the application more coherent Light sources, for example, an excimer laser, becomes a significant Effort operated, the rectangular beam profile into a homogeneous to transform poor-pupil and field distribution.
In WO 2005/006079 A1 wird eine Beleuchtungseinrichtung für eine mikrolithographische Projektionsbelichtungsanlage beschrieben, bei der eine in der Intensität rotationssymmetrische Beleuchtungspupille dadurch erzeugt wird, dass ein Amplitudenfilter in Kombination mit einem Lichtmischstab verwendet wird. Der Amplitudenfilter besteht aus 4 Segmenten um die optische Achse, wobei die jeweils gegenüberliegenden Segmente die gleiche Transmission aufweisen. Durch Verdrehung dieses Filters zum Lichtmischstab ist eine Symmetrisierung der Beleuchtungspupille möglich. Es findet also eine statische Symmetrisierung statt.In WO 2005/006079 A1 discloses a lighting device for a microlithographic Projection exposure system described in which a rotationally symmetrical in intensity Illuminating pupil is generated by having an amplitude filter used in combination with a light mixing rod. The amplitude filter consists of 4 segments around the optical axis, with the opposite ones Segments have the same transmission. By twisting this Filters to the light mixing rod is a symmetrization of the illumination pupil possible. So there is a static symmetrization instead.
Da jedoch Mikroskopsysteme einen geringeren Lichtleitwert haben, werden dort andere Lösungen verwendet. In WO 01/23940 A1 wird ein Mikroskop beschrieben, welches einen Laser als Lichtquelle verwendet, bei dem die Rohstrahlung des Lasers durch bewegte Streuscheiben homogenisiert wird. Für die Mikroskopie wurde bisher auf eine gleichmäßige Verteilung geachtet, d.h. „Top hat". Ein perfekter „Top hat" erfüllt auch die Rotationssymmetrie, kann jedoch aufgrund von Fertigungstoleranzen nur näherungsweise eingehalten werden. Die Abweichungen liegen bei einigen Prozent, wenn die Beleuchtungsbereiche, die man miteinander vergleicht, groß sind, d.h. wenn ausreichende Mittelung stattfindet. Verkleinert man jedoch diese Bereich steigen die Abweichungen in den zweistelligen % Bereich.There However, microscope systems have a lower optical conductivity, be there other solutions used. WO 01/23940 A1 describes a microscope which a laser used as a light source, where the raw radiation of the laser is homogenized by moving lenses. For microscopy has been on an even distribution respected, i. "Top has "a perfect" top has met "too the rotational symmetry, but can due to manufacturing tolerances only approximately be respected. The deviations are a few percent, when the lighting areas that are compared with each other are large, i. if sufficient averaging takes place. However, you reduce it these ranges increase the deviations in the double-digit% range.
Die Erfindung soll eine bessere rotationssymmetrische Intensitätsverteilung in der Pupillenebene einer Beleuchtungsanordnung erzeugen. Dabei steht die Aufgabe, eine möglichst gleichmäßige Winkel-Ausleuchtung des Feldes zu erreichen, wobei eine große Homogenität der Intensitätsverteilung im Feld erhalten bleiben muss.The The invention aims for a better rotationally symmetrical intensity distribution generate in the pupil plane of a lighting arrangement. It stands the task, one as possible uniform angle illumination to achieve the field, with a large homogeneity of the intensity distribution must be preserved in the field.
Die Lösung der Aufgabe gelingt erfindungsgemäß mit den kennzeichnenden Merkmalen des Anspruchs 1.The solution the object succeeds according to the invention with the characterizing features of claim 1.
Die Unteransprüche 2 bis 7 sind vorteilhafte Ausgestaltungen der kennzeichnenden Merkmale des Hauptanspruches.The under claims 2 to 7 are advantageous embodiments of the characterizing features of Main claim.
Die Erfindung ist dadurch gekennzeichnet, dass zwischen dem Laser und einer Pupillenebene der Beleuchtung ein drehbar gelagertes spiegelndes Element angeordnet ist, welches sich um eine optische Achse der Lichtbündel dreht und so gestaltet ist, dass sich die Lage der optischen Achse durch diese Drehung nicht ändert.The Invention is characterized in that between the laser and a pupil plane of the illumination a rotatably mounted reflective element is arranged, which rotates about an optical axis of the light beam and is designed so that the position of the optical axis through this rotation does not change.
Somit wird das aus dem drehbar gelagerten Element austretende Licht im Bezug zum einfallenden Licht ebenfalls um die eine optische Achse gedreht.Consequently is the emerging from the rotatably mounted element light in Reference to the incident light also around the one optical axis turned.
Dabei kann der Drehsinn des Lichtbündels gleich oder entgegen dem des optischen Elementes gerichtet sein. Der Umlauf des Lichtbündels kann ein Vielfaches oder ein Bruchteil des Umlaufs des optischen Elementes sein.there the direction of rotation of the light beam can be the same or directed opposite to the optical element. The circulation of the light beam can be a multiple or fraction of the circulation of the optical Be element.
Bei dieser Lösung wird eine statistische Mittelung genutzt. Die Symmetrisierung erfolgt dynamisch durch zeitliche Mittelung rotierter Pupillenbilder. Die Drehgeschwindigkeit des die Pupille formenden Lichtbündels und die Belichtungszeit bestimmen die Homogenität der Intensitätsverteilung in der Beleuchtungspupille.at this solution a statistical averaging is used. Symmetrization takes place dynamically by temporal averaging of rotated pupil images. The Rotational speed of the pupil forming light beam and the exposure time determines the homogeneity of the intensity distribution in the lighting pupil.
Mit der Erfindung gelingt es, eine rotationssymmetrische Pupille zu erzeugen, deren Inhomogenität kleiner 1 % ist. Dies führt in der Feldebene zu einer sehr guten Winkel-Homogenität der Beleuchtung, die mit den Lösungen, die aus dem Stand der Technik bekannt sind, nicht erreichbar ist.With The invention succeeds in providing a rotationally symmetrical pupil generate their inhomogeneity less than 1%. this leads to in the field level to a very good angle homogeneity of lighting, the with the solutions, which are known from the prior art, is not available.
Die Lage der optischen Achse muss jedoch nicht völlig starr sein, sondern kann sich auch geringfügig ändern, wobei ein Winkelversatz kleiner 1° und/oder ein Parallelversatz kleiner 1/10 der Größe des beleuchteten Feldes vorgesehen sind. Diese Maßnahme verbessert die Homogenität weiter, insbesondere auch hinsichtlich störender Speckle in der Beleuchtung des Feldes. Jedoch ist auch ein noch größerer Winkel-Versatz und/oder Parallelversatz zulässig, der bis zum 5-fachen der angegebenen Werte betragen kann.The However, the position of the optical axis does not have to be completely rigid but can also change slightly, with an angular offset of less than 1 ° and / or a parallel offset smaller than 1/10 of the size of the illuminated field are provided. This measure improves homogeneity continue, especially with regard to disturbing speckle in the lighting of the field. However, an even larger angle offset and / or Parallel offset allowed, which can be up to 5 times the specified values.
Das drehbar gelagerte optische Element wird vorzugsweise in einer pupillennahen Position in dem Beleuchtungsstrahlengang angeordnet. Eine pupillennahe Position bedeutet im optischen Sinne, dass die Pupillenebene näher am drehbar gelagerten spiegelnden Element liegt als die Feldebene.The rotatably mounted optical element is preferably in a pupil near Position disposed in the illumination beam path. A pupil-close Position means in the optical sense that the pupil plane is closer to the rotatable stored reflective element lies as the field level.
Um die Lichtbündel auf ein Feld zu konzentrieren steht in der Pupillenebene ein Element zur Feldhomogenisierung und nachfolgend ist eine Kollimator-Optik fest angeordnet. Im einfachsten Fall ist die Kollimator-Optik eine sammelnde refraktive Linse.To concentrate the light bundles on a field In the pupil plane there is an element for field homogenization and subsequently a collimator optic is fixedly arranged. In the simplest case, the collimator optics is a collecting refractive lens.
Das drehbar gelagerte optische Element mit der Eigenschaft Lichtbündel in sich zu drehen sind zum Beispiel drehbar gelagerte Spiegelanordnungen mindestens dreier fest zugeordneter Spiegelflächen, ein Abbe-König-Prisma oder ein Dove-Prisma. Es muss immer eine ungerade Anzahl von Reflexionen vorliegen. Ein besonderer Vorteil bei der Anwendung in einem Mikroskop ist der geringe Lichtleitwert, so dass nur geringe Winkelbelastungen der Prismen auftreten.The rotatably mounted optical element with the property light beam in To turn, for example, rotatably mounted mirror assemblies at least of three dedicated mirror surfaces, an Abbe-King prism or a dove prism. There must always be an odd number of reflections. One particular advantage of using in a microscope is the low light conductance, so that only small angular loads of the Prisms occur.
Zwischen dem Laser und dem drehbar gelagerten spiegelnden Element sind zur Optimierung ein weiteres Element zur Feldhomogenisierung und eine strahl bündelnde refraktive Linse vorgesehen. Diese verbessern die Homogenität der Ausleuchtung weiter.Between the laser and the rotatably mounted reflective element are for Optimizing another element for field homogenization and a beam bundling refractive lens provided. These improve the homogeneity of the illumination further.
Die Elemente zur Feldhomogenisierung sind diffraktive optische Elemente oder Wabenkondensoren. Es ist jedoch auch vorgesehen, jeweils ein diffraktives optisches Element und ein Wabenkondensor in einer Anordnung einzusetzen.The Elements for field homogenization are diffractive optical elements or honeycomb condensers. However, it is also intended, one each diffractive optical element and a honeycomb condenser in an array use.
Die Erfindung wird nachfolgend an Hand von Ausführungsbeispielen beschrieben. Es zeigen:The The invention will be described below with reference to exemplary embodiments. Show it:
Die
aufgeweiteten Lichtbündel
- 11
- Laserlaser
- 22
- Rohstrahlraw beam
- 33
- Lichtbündellight beam
- 44
- erstes diffraktives optisches Elementfirst diffractive optical element
- 55
- refraktive Linserefractive lens
- 66
- drehbar gelagertes spiegelndes Elementswiveling stored reflective element
- 77
- Pupille (-nebene)pupil (-Nlevel)
- 88th
- Kollimator-OptikCollimator optics
- 99
- Feld (-ebene)field (-level)
- 1010
- Element zur Feldhomogenisierungelement for field homogenization
- 1111
- zweites diffraktives optisches Elementsecond diffractive optical element
- 1212
- erster Wabenkondensorfirst honeycomb condenser
- 1313
- zweiter Wabenkondensorsecond honeycomb condenser
- 1414
- Spiegelanordnungmirror arrangement
- 1515
- Abbe-König-PrismaAbbe-Koenig prism
- 1616
- Dove-PrismaDove prism
- 1717
- optische Achseoptical axis
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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DE200510037764 DE102005037764B4 (en) | 2005-08-10 | 2005-08-10 | Arrangement for the homogeneous illumination of a field |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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DE200510037764 DE102005037764B4 (en) | 2005-08-10 | 2005-08-10 | Arrangement for the homogeneous illumination of a field |
Publications (2)
Publication Number | Publication Date |
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DE102005037764A1 true DE102005037764A1 (en) | 2007-02-22 |
DE102005037764B4 DE102005037764B4 (en) | 2008-07-03 |
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DE200510037764 Expired - Fee Related DE102005037764B4 (en) | 2005-08-10 | 2005-08-10 | Arrangement for the homogeneous illumination of a field |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007027083A1 (en) * | 2007-06-12 | 2008-12-18 | Carl Zeiss Sms Gmbh | microscope illumination |
EP2209135A1 (en) * | 2007-11-06 | 2010-07-21 | Nikon Corporation | Illumination optical device and exposure device |
US8593618B2 (en) * | 2008-06-20 | 2013-11-26 | Carl Zeiss Smt Gmbh | Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method |
EP2894086A4 (en) * | 2012-09-07 | 2016-12-07 | Mitsubishi Electric Corp | Vehicle headlight device |
Citations (4)
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DE19636472A1 (en) * | 1996-09-07 | 1998-03-12 | Zeiss Carl Jena Gmbh | Ophthalmometer for measuring eye cornea curvature |
EP0890862A2 (en) * | 1997-07-10 | 1999-01-13 | Bayer Corporation | Scanning system with error-correcting deflector |
US5923359A (en) * | 1997-03-14 | 1999-07-13 | Cymbolic Sciences International Inc. | Internal drum scophony raster recording device |
US20050170572A1 (en) * | 2004-01-30 | 2005-08-04 | Mikio Hongo | Laser annealing apparatus and annealing method of semiconductor thin film using the same |
-
2005
- 2005-08-10 DE DE200510037764 patent/DE102005037764B4/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19636472A1 (en) * | 1996-09-07 | 1998-03-12 | Zeiss Carl Jena Gmbh | Ophthalmometer for measuring eye cornea curvature |
US5923359A (en) * | 1997-03-14 | 1999-07-13 | Cymbolic Sciences International Inc. | Internal drum scophony raster recording device |
EP0890862A2 (en) * | 1997-07-10 | 1999-01-13 | Bayer Corporation | Scanning system with error-correcting deflector |
US20050170572A1 (en) * | 2004-01-30 | 2005-08-04 | Mikio Hongo | Laser annealing apparatus and annealing method of semiconductor thin film using the same |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007027083A1 (en) * | 2007-06-12 | 2008-12-18 | Carl Zeiss Sms Gmbh | microscope illumination |
US20100195198A1 (en) * | 2007-06-12 | 2010-08-05 | Laengle Mario | Microscope illumination |
KR101486102B1 (en) * | 2007-06-12 | 2015-01-23 | 칼 짜이스 에스엠에스 게엠베하 | Microscope illumination system |
US9097911B2 (en) * | 2007-06-12 | 2015-08-04 | Carl Zeiss Sms Gmbh | Microscope illumination |
EP2209135A1 (en) * | 2007-11-06 | 2010-07-21 | Nikon Corporation | Illumination optical device and exposure device |
EP2209135A4 (en) * | 2007-11-06 | 2011-06-08 | Nikon Corp | Illumination optical device and exposure device |
US8094290B2 (en) | 2007-11-06 | 2012-01-10 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and device manufacturing method |
US8593618B2 (en) * | 2008-06-20 | 2013-11-26 | Carl Zeiss Smt Gmbh | Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method |
EP2894086A4 (en) * | 2012-09-07 | 2016-12-07 | Mitsubishi Electric Corp | Vehicle headlight device |
US9689549B2 (en) | 2012-09-07 | 2017-06-27 | Mitsubishi Electric Corporation | Vehicle headlight device |
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