DE102005012494A1 - Bonding procedure for connecting microwave circuits, involves using bonding wire that has round cross-section, has no loss or low loss, and is covered with electrically non-conductive dielectric - Google Patents

Bonding procedure for connecting microwave circuits, involves using bonding wire that has round cross-section, has no loss or low loss, and is covered with electrically non-conductive dielectric Download PDF

Info

Publication number
DE102005012494A1
DE102005012494A1 DE102005012494A DE102005012494A DE102005012494A1 DE 102005012494 A1 DE102005012494 A1 DE 102005012494A1 DE 102005012494 A DE102005012494 A DE 102005012494A DE 102005012494 A DE102005012494 A DE 102005012494A DE 102005012494 A1 DE102005012494 A1 DE 102005012494A1
Authority
DE
Germany
Prior art keywords
loss
dielectric
lossless
low loss
wire
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102005012494A
Other languages
German (de)
Inventor
Michael Dr. Martin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHF Communication Technologies AG
Original Assignee
SHF Communication Technologies AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHF Communication Technologies AG filed Critical SHF Communication Technologies AG
Priority to DE102005012494A priority Critical patent/DE102005012494A1/en
Publication of DE102005012494A1 publication Critical patent/DE102005012494A1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/66High-frequency adaptations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/58Structural electrical arrangements for semiconductor devices not otherwise provided for
    • H01L2223/64Impedance arrangements
    • H01L2223/66High-frequency adaptations
    • H01L2223/6605High-frequency electrical connections
    • H01L2223/6611Wire connections
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/58Structural electrical arrangements for semiconductor devices not otherwise provided for
    • H01L2223/64Impedance arrangements
    • H01L2223/66High-frequency adaptations
    • H01L2223/6605High-frequency electrical connections
    • H01L2223/6627Waveguides, e.g. microstrip line, strip line, coplanar line
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05552Shape in top view
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/4501Shape
    • H01L2224/45012Cross-sectional shape
    • H01L2224/45014Ribbon connectors, e.g. rectangular cross-section
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45117Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
    • H01L2224/45124Aluminium (Al) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4801Structure
    • H01L2224/48011Length
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/4847Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • H01L2224/48472Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/485Material
    • H01L2224/48505Material at the bonding interface
    • H01L2224/48599Principal constituent of the connecting portion of the wire connector being Gold (Au)
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/485Material
    • H01L2224/48505Material at the bonding interface
    • H01L2224/48699Principal constituent of the connecting portion of the wire connector being Aluminium (Al)
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49175Parallel arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49175Parallel arrangements
    • H01L2224/49176Wire connectors having the same loop shape and height
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L24/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01013Aluminum [Al]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • H01L2924/141Analog devices
    • H01L2924/1423Monolithic Microwave Integrated Circuit [MMIC]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1515Shape
    • H01L2924/15153Shape the die mounting substrate comprising a recess for hosting the device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1901Structure
    • H01L2924/1903Structure including wave guides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/30107Inductance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance

Abstract

The method involves using a bonding wire to connect the surfaces of MMIC (monolithic microwave integrated circuit) and a substrate. The bonding wire has a round cross-section and no loss or low loss, and is covered with electrically non-conductive dielectric. An independent claim is included for the low-loss dielectric used in the bonding wire.

Description

Die Erfindung betrifft eine Anordnung und Verfahren nach den Patentansprüchen 1 bis 6.The The invention relates to an arrangement and method according to claims 1 to 6th

Aus der Fachliteratur ist bekannt, dass die leitenden Verbindungen zwischen MMICs untereinander und zu den umgebenden Signalleitungen meist mit verschweißten Gold oder Aluminium Bonddrähten oder Bondbändchen vorgenommen werden. Dabei hat der Bonddraht die Aufgabe, zusätzlich zur Herstellung der leitenden Verbindung auch den Luftspalt zum nächsten IC oder zum umgebenden Schaltungssubstrat zu überbrücken. Der Luftspalt weist bei üblicher Aufbautechnik eine Breite zwischen 50 und 200 μm auf, so dass sich unter Einbeziehung des Bond-Loops eine Drahtlänge von bis zu 400 μm ergibt. Der in Luft geführte Draht stellt eine störende Serieninduktivität dar, die den Wellenwiderstand im Signalweg erhöht und gleichzeitig die zu übertragende Signalamplitude durch seine Serienimpedanz vermindert. Je höher die betroffenen Signalfrequenzen sind, um so ausgeprägter sind die negativen Auswirkungen der Bondverbindungen.Out The technical literature is known to have the conductive connections between MMICs to each other and to the surrounding signal lines mostly with welded Gold or aluminum bonding wires or bond ribbon be made. The bonding wire has the task in addition to the production the conductive connection also the air gap to the next IC or to the surrounding circuit substrate. The air gap points at more common Construction technique has a width between 50 and 200 μm, so that incorporating the bond loop a wire length of up to 400 μm results. The airborne Wire presents a disturbing series inductance which increases the characteristic impedance in the signal path and at the same time the to be transmitted Signal amplitude is reduced by its series impedance. The higher the affected signal frequencies are, the more pronounced are the negative effects the bonds.

Der Bonddraht verliert seine störenden Eigenschaften, wenn sein Induktivitätswert pro Länge durch einen entsprechenden Kapazitätswert pro Länge dergestalt ergänzt wird, dass für den Leiter ein Wellenwiderstand nahe 50 Ohm erzeugt wird, der mit dem Wellenwiderstand der Signalleitung auf dem Substrat und dem Ein- oder Ausgangswiderstand des MMICs übereinstimmt.Of the Bonding wire loses its disturbing Properties, if its inductance value per length through a corresponding capacity value per length supplemented in this way will that for the conductor is generated a characteristic impedance near 50 ohms, which with the Characteristic impedance of the signal line on the substrate and the input or output resistance of the MMIC matches.

Der Erfindung liegt die Aufgabe zugrunde, den Kapazitätsbelag eines oder mehrerer Bonddrähte soweit zu erhöhen, dass sich die mechanische und elektrische Drahtverbindung in ein Leitungsstück verwandelt, dessen Wellenwiderstand an die Umgebung (Quelle wie Last) angepasst ist. Der durch die Luftumgebung mit der Dielektrizitätskonstante Epsilon relativ = Eins vorgegebene Anfangskapazitätsbelag des Bonddrahtes wird durch seine Einbettung in ein verlustloses oder verlustarmes Dielektrikum (möglichst kleiner Wert von Tangens Delta) mit Epsilon größer Eins entsprechend erhöht. (1)The invention has for its object to increase the capacitance of one or more bonding wires so far that the mechanical and electrical wire connection is transformed into a piece of pipe whose characteristic impedance is adapted to the environment (source and load). The initial capacitance surface of the bond wire given by the air environment with the relative dielectric constant Epsilon = 1 is correspondingly increased by its embedding in a lossless or low-loss dielectric (smallest possible value of tangent delta) with epsilon greater than one. ( 1 )

Das Dielektrikum wird in flüssiger Form per Hand oder mittels Dispenser auf die Bondverbindung aufgetragen und anschließend durch Temperaturbehandlung ausgehärtet.The Dielectric is in liquid Form applied by hand or dispenser on the bond and subsequently cured by thermal treatment.

Bei Schlitz oder Koplanarleitungen (2 und 3) besteht die Bondverbindung zum MMIC aus einer Zwei- oder Dreileiterstruktur, bei der durch zusätzliche Drähte parallel zum Signal führenden Bonddraht die Masseebene des Substrats auf das MMIC mit hinübergezogen wird. Hierbei dient die Aufbringung des Dielektrikums dazu, den Kapazitätsbelag des Signal führenden Leiters gegenüber seinen benachbarten Masseleitern soweit zu erhöhen, dass sich für die Gesamtanordnung eine kontinuierliche Signalführung mit einem nahe bei 50 Ohm liegenden Wellenwiderstand ausbildet.For slot or coplanar lines ( 2 and 3 ), the bond connection to the MMIC consists of a two- or three-wire structure in which the ground plane of the substrate is drawn over to the MMIC by additional wires parallel to the signal-carrying bonding wire. In this case, the application of the dielectric serves to increase the capacitance of the signal-carrying conductor with respect to its adjacent ground conductors to such an extent that a continuous signal routing with a characteristic impedance close to 50 ohms is formed for the overall arrangement.

Claims (6)

Bonddrahtverbindung zwischen einer oder mehreren auf dem MMIC befindlichen Bond Flächen und dem benachbarten MMIC oder dem in geringer Entfernung befindlichen Signalleitungsende auf dem Umgebungssubstrat, dadurch gekennzeichnet, dass der Draht einen runden Querschnitt hat und von einem verlustlosen oder verlustarmen, elektrisch nicht leitenden Dielektrikum umgeben ist.A bonding wire connection between one or more bonding surfaces on the MMIC and the adjacent MMIC or the closely spaced signal line end on the surrounding substrate, characterized in that the wire has a round cross-section and is surrounded by a lossless or low loss electrically non-conductive dielectric. Bondverbindung nach Anspruch 1 dadurch gekennzeichnet, dass an Stelle des Runddrahtes eine Ausführung als Bändchenbond mit einem rechteckigen Querschnitt, z.B. 12 μm hoch und 50 μm breit, sowie Flachdrähte beliebiger ähnlicher Maße Verwendung finden.Bond connection according to claim 1, characterized that instead of the round wire, a version as a ribbon bond with a rectangular Cross-section, e.g. 12 μm high and 50 μm wide, as well as flat wires any more similar Dimensions use Find. Bondverbindung nach Anspruch 1 und 2 für koplanare oder Schlitz-Signalleitungen, dadurch gekennzeichnet, dass die Signal führende Verbindung von mindestens einer, meist zwei Masseverbindungen parallel begleitet wird und sich somit eine GS oder GSG Struktur (ground, signal, ground) ausbildet.Bond connection according to claim 1 and 2 for coplanar or slot signal lines, characterized in that the signal premier Connection of at least one, usually two ground connections in parallel accompanied by a GS or GSG structure (ground, signal, ground). Verlustloses oder verlustarmes Dielektrikum nach Anspruch 1 dadurch gekennzeichnet, dass die Material-Dielektrizitätskonstante dergestalt gewählt ist, dass sich für die Verbindung zwischen MMICs oder zur Substratsignalleitung ein Wellenwiderstand des Signaldrahtes in der Nähe von 50 Ohm ergibt.Lossless or low loss dielectric after Claim 1, characterized in that the material dielectric constant is chosen in such a way that for himself the connection between MMICs or to the substrate signal line Characteristic impedance of the signal wire near 50 ohms. Verlustloses oder verlustarmes Dielektrikum nach Anspruch 1, dadurch gekennzeichnet, dass es im flüssigen Zustand nach der Herstellung der mechanischen, elektrisch leitenden Bondverbindung mit geeigneter Viskosität von Hand oder mittels Dispenser so appliziert wird, dass der unter und neben dem Bonddraht befindliche Luftraum mit einem nicht leitenden Material mit Epsilon größer Eins ausgefüllt ist.Lossless or low loss dielectric after Claim 1, characterized in that it is in the liquid state after the production of the mechanical, electrically conductive bond with suitable viscosity by hand or by dispenser is applied so that the under and near the bonding wire located airspace with a non-conductive Material with epsilon greater than one filled out is. Verlustloses oder verlustarmes Dielektrikum nach Anspruch 1, dadurch gekennzeichnet, dass durch die Beimischung verlustloser oder verlustarmer Zuschlagsstoffe Werte von Dielektizitätskonstanten zwischen 3 und größer 13 je nach Anwendungsfall herstellbar sind.Lossless or low loss dielectric after Claim 1, characterized in that lossless by the admixture or low-loss aggregates Values of dielectric constants between 3 and more than 13 each can be produced according to application.
DE102005012494A 2005-03-16 2005-03-16 Bonding procedure for connecting microwave circuits, involves using bonding wire that has round cross-section, has no loss or low loss, and is covered with electrically non-conductive dielectric Withdrawn DE102005012494A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE102005012494A DE102005012494A1 (en) 2005-03-16 2005-03-16 Bonding procedure for connecting microwave circuits, involves using bonding wire that has round cross-section, has no loss or low loss, and is covered with electrically non-conductive dielectric

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102005012494A DE102005012494A1 (en) 2005-03-16 2005-03-16 Bonding procedure for connecting microwave circuits, involves using bonding wire that has round cross-section, has no loss or low loss, and is covered with electrically non-conductive dielectric

Publications (1)

Publication Number Publication Date
DE102005012494A1 true DE102005012494A1 (en) 2006-09-28

Family

ID=36973489

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102005012494A Withdrawn DE102005012494A1 (en) 2005-03-16 2005-03-16 Bonding procedure for connecting microwave circuits, involves using bonding wire that has round cross-section, has no loss or low loss, and is covered with electrically non-conductive dielectric

Country Status (1)

Country Link
DE (1) DE102005012494A1 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0438855A (en) * 1990-06-04 1992-02-10 Mitsubishi Electric Corp Package for microwave band ic
EP0563969A2 (en) * 1992-04-03 1993-10-06 Mitsubishi Denki Kabushiki Kaisha High frequency signal transmission tape and apparatus for bonding the high frequency signal transmission tape
JPH09148524A (en) * 1995-11-28 1997-06-06 Mitsubishi Electric Corp High frequency circuit device
US20010015490A1 (en) * 1997-05-22 2001-08-23 Hai Young Lee High speed digital and microwave device package

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0438855A (en) * 1990-06-04 1992-02-10 Mitsubishi Electric Corp Package for microwave band ic
EP0563969A2 (en) * 1992-04-03 1993-10-06 Mitsubishi Denki Kabushiki Kaisha High frequency signal transmission tape and apparatus for bonding the high frequency signal transmission tape
JPH09148524A (en) * 1995-11-28 1997-06-06 Mitsubishi Electric Corp High frequency circuit device
US20010015490A1 (en) * 1997-05-22 2001-08-23 Hai Young Lee High speed digital and microwave device package

Similar Documents

Publication Publication Date Title
DE60005342T2 (en) METHOD AND DEVICE FOR REDUCING RESONANCES AND NOISE TRANSFER IN POWER DISTRIBUTION CIRCUITS USING FLAT LADDERS
DE102010030704A1 (en) Coil Transducer Isolator Assembly
DE102005036834A1 (en) Circuit board and method of fabricating a circuit board
DE102010002430A1 (en) Minimization of electromagnetic interference in coil transducers
DE102005002707A1 (en) Semiconductor component, has micro connecting unit to provide high frequency coupling of components and including three ply structure with two layers extending along common middle line and fixed on contact surface pairs of components
DE10392306T5 (en) Contact structure with silicon key contactor
EP0459179A1 (en) IC-housing made of three coated dielectric plates
DE102006002472A1 (en) Signal probe and probe assembly
DE10130517C2 (en) High-voltage module and method for its production
DE102006057332A1 (en) Assembly comprising a substrate and a die mounted on the substrate and a method of making the same
DE112018001784T5 (en) Current sensing resistor
DE60131485T2 (en) circuit board
DE10144704A1 (en) Chip components connecting method, involves producing electrically conductive and flexible microparticles on any of two terminal regions and detachably connecting the regions via microparticles
DE102017210901B4 (en) Semiconductor device and method of manufacturing the same
DE102013223500B4 (en) high frequency device
DE102007001191B4 (en) Semiconductor device having a resistor for balancing the current distribution
DE60308148T2 (en) POWER MODULE WITH PARTITIONED GATE AND METHOD FOR SUPPRESSING VIBRATIONS THEREIN
DE102005012494A1 (en) Bonding procedure for connecting microwave circuits, involves using bonding wire that has round cross-section, has no loss or low loss, and is covered with electrically non-conductive dielectric
DE102012206362B4 (en) Circuit arrangement for thermally conductive chip assembly and manufacturing process
DE102013214730A1 (en) Electronic circuit, manufacturing method therefor and electronic component
DE4238438A1 (en) Semiconductor component - comprises chip with bonding sites, base with hollow to house chip and lid on upper surface of chip
DE102007032074A1 (en) Electronic components encapsulating electronic housing therein
WO2004006382A1 (en) Electrical system, especially a microelectronic or microelectromechanical high frequency system
DE102015120647B4 (en) Electrical device with thin solder stop layer and method of manufacture
DE1914173C3 (en) Directional coupler

Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8130 Withdrawal