DE10083396T1 - Energy control for an excimer or molecular fluorine laser - Google Patents

Energy control for an excimer or molecular fluorine laser

Info

Publication number
DE10083396T1
DE10083396T1 DE10083396T DE10083396T DE10083396T1 DE 10083396 T1 DE10083396 T1 DE 10083396T1 DE 10083396 T DE10083396 T DE 10083396T DE 10083396 T DE10083396 T DE 10083396T DE 10083396 T1 DE10083396 T1 DE 10083396T1
Authority
DE
Germany
Prior art keywords
excimer
energy control
molecular fluorine
fluorine laser
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE10083396T
Other languages
German (de)
Inventor
Ulrich Rebhan
Gunter Nowinsky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lambda Physik AG
Original Assignee
Lambda Physik AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/418,052 external-priority patent/US6243406B1/en
Priority claimed from US09/447,882 external-priority patent/US6490307B1/en
Priority claimed from US09/484,818 external-priority patent/US6243405B1/en
Application filed by Lambda Physik AG filed Critical Lambda Physik AG
Publication of DE10083396T1 publication Critical patent/DE10083396T1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2258—F2, i.e. molecular fluoride is comprised for lasing around 157 nm

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
DE10083396T 1999-10-14 2000-10-13 Energy control for an excimer or molecular fluorine laser Withdrawn DE10083396T1 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US09/418,052 US6243406B1 (en) 1999-03-12 1999-10-14 Gas performance control system for gas discharge lasers
US15952599P 1999-10-15 1999-10-15
US09/447,882 US6490307B1 (en) 1999-03-17 1999-11-23 Method and procedure to automatically stabilize excimer laser output parameters
US17171799P 1999-12-22 1999-12-22
US09/484,818 US6243405B1 (en) 1999-03-17 2000-01-18 Very stable excimer or molecular fluorine laser
PCT/IB2000/001657 WO2001028048A2 (en) 1999-10-14 2000-10-13 Energy control for an excimer or molecular fluorine laser

Publications (1)

Publication Number Publication Date
DE10083396T1 true DE10083396T1 (en) 2002-01-24

Family

ID=27538593

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10083396T Withdrawn DE10083396T1 (en) 1999-10-14 2000-10-13 Energy control for an excimer or molecular fluorine laser

Country Status (3)

Country Link
JP (1) JP2003511865A (en)
DE (1) DE10083396T1 (en)
WO (1) WO2001028048A2 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10244105B3 (en) * 2002-02-26 2004-09-16 Xtreme Technologies Gmbh Process for energy stabilization of gas discharge pumped radiation sources operated in defined pulse sequences
US6914920B2 (en) 2002-02-26 2005-07-05 Xtreme Technologies Gmbh Method for energy stabilization of gas discharged pumped in selected impulse following driven beam sources
EP1361479B1 (en) * 2002-05-10 2006-03-15 ASML Netherlands B.V. Control of a lithographic apparatus
KR100545294B1 (en) 2002-05-10 2006-01-24 에이에스엠엘 네델란즈 비.브이. Lithographic Apparatus, Device Manufacturing Method, Performance Measuring Method, Calibration Method and Computer Program
US7852889B2 (en) 2006-02-17 2010-12-14 Cymer, Inc. Active spectral control of DUV light source
JP6568311B2 (en) 2016-05-09 2019-08-28 ギガフォトン株式会社 Laser equipment
WO2021178091A1 (en) * 2020-03-03 2021-09-10 Cymer, Llc Control system for a light source
CN115347447B (en) * 2022-08-23 2024-06-11 西北核技术研究所 Method and device for stably outputting pulse laser energy by adopting voltage regulation

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5097291A (en) * 1991-04-22 1992-03-17 Nikon Corporation Energy amount control device
US5450436A (en) * 1992-11-20 1995-09-12 Kabushiki Kaisha Komatsu Seisakusho Laser gas replenishing apparatus and method in excimer laser system
US5887014A (en) * 1997-08-20 1999-03-23 Cymer, Inc. Process for selecting operating range for narrow band excimer laser

Also Published As

Publication number Publication date
JP2003511865A (en) 2003-03-25
WO2001028048A2 (en) 2001-04-19
WO2001028048A3 (en) 2001-11-22

Similar Documents

Publication Publication Date Title
DE60015631D1 (en) Particularly stable excimer or molecular fluorine laser
DE60300824D1 (en) Laser projection system
DE69907594D1 (en) WAVELENGTH SYSTEM FOR AN EXCIMER LASER
DE50313541D1 (en) Laser transmission system
DE60236779D1 (en) Laser projection system
DK199901463A (en) Heterocyclic alkoxyamines as regulators in controlled radical polymerization processes
DE69819547D1 (en) NARROW-BAND EXCIMER LASER
DE69933224D1 (en) CONTROLLING LASER POLARIZATION
DE60017514D1 (en) Laser treatment apparatus
IT1307666B1 (en) PORTABLE SELF-LEVELING LASER BEAM DEVICE, PERFECTED
DE60215451D1 (en) Laser alignment system
DE60226803D1 (en) Laser beam hardening device
DE60336956D1 (en) laser beam machine
DE60020069D1 (en) Tunable laser source
DE60032017D1 (en) NARROW-BAND LASER WITH BIDIRECTIONAL BEAM EXPANSION
DE50109560D1 (en) LASER MODULE WITH CONTROLLER
DE60017273D1 (en) LASER WELDING SYSTEM
ITBO980072A0 (en) OPTICAL ATTENDANCE CONTROL DEVICE.
DE50002091D1 (en) SOLID STATE LASER
DE10196134T1 (en) Distance mode control for laser welding
DE60040256D1 (en) Excimer laser device
DE10083396T1 (en) Energy control for an excimer or molecular fluorine laser
DE60202683D1 (en) TUNABLE LASER
DE60017076D1 (en) LASER SYSTEM
DE60100100D1 (en) Laser tuning

Legal Events

Date Code Title Description
8141 Disposal/no request for examination