DD97673A1 - - Google Patents
Info
- Publication number
- DD97673A1 DD97673A1 DD16480172A DD16480172A DD97673A1 DD 97673 A1 DD97673 A1 DD 97673A1 DD 16480172 A DD16480172 A DD 16480172A DD 16480172 A DD16480172 A DD 16480172A DD 97673 A1 DD97673 A1 DD 97673A1
- Authority
- DD
- German Democratic Republic
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DD16480172A DD97673A1 (ko) | 1972-08-01 | 1972-08-01 | |
DE19732324719 DE2324719A1 (de) | 1972-08-01 | 1973-05-16 | Verfahren zur nachbehandlung dielektrischer anorganischer filme auf unterlagen |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DD16480172A DD97673A1 (ko) | 1972-08-01 | 1972-08-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
DD97673A1 true DD97673A1 (ko) | 1973-05-14 |
Family
ID=5487706
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DD16480172A DD97673A1 (ko) | 1972-08-01 | 1972-08-01 |
Country Status (2)
Country | Link |
---|---|
DD (1) | DD97673A1 (ko) |
DE (1) | DE2324719A1 (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2461359A1 (fr) * | 1979-07-06 | 1981-01-30 | Commissariat Energie Atomique | Procede et appareil d'hydrogenation de dispositifs a semi-conducteurs |
JP2934456B2 (ja) * | 1989-07-14 | 1999-08-16 | 株式会社日立製作所 | 表面処理方法及びその装置 |
EP0572704B1 (en) * | 1992-06-05 | 2000-04-19 | Semiconductor Process Laboratory Co., Ltd. | Method for manufacturing a semiconductor device including method of reforming an insulating film formed by low temperature CVD |
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1972
- 1972-08-01 DD DD16480172A patent/DD97673A1/xx unknown
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1973
- 1973-05-16 DE DE19732324719 patent/DE2324719A1/de active Pending
Also Published As
Publication number | Publication date |
---|---|
DE2324719A1 (de) | 1974-02-07 |