DD95332A1 - - Google Patents
Info
- Publication number
- DD95332A1 DD95332A1 DD160866A DD16086672A DD95332A1 DD 95332 A1 DD95332 A1 DD 95332A1 DD 160866 A DD160866 A DD 160866A DD 16086672 A DD16086672 A DD 16086672A DD 95332 A1 DD95332 A1 DD 95332A1
- Authority
- DD
- German Democratic Republic
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD160866A DD95332A1 (en) | 1972-02-14 | 1972-02-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD160866A DD95332A1 (en) | 1972-02-14 | 1972-02-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DD95332A1 true DD95332A1 (en) | 1973-01-20 |
Family
ID=5485326
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DD160866A DD95332A1 (en) | 1972-02-14 | 1972-02-14 |
Country Status (1)
| Country | Link |
|---|---|
| DD (1) | DD95332A1 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3021244A1 (en) * | 1979-06-06 | 1980-12-11 | American Optical Corp | POLISHING HEAD TO PROCESS LENSES |
| DE19629286A1 (en) * | 1995-07-21 | 1997-01-23 | Toshiba Kawasaki Kk | Polishing pad device for chemical mechanical polishing of semiconductor wafer |
| DE102006047454B3 (en) * | 2006-10-07 | 2008-03-13 | Rau, Hermann, Prof. Dr. | Sanding tool for flat, concave and convex surfaces which automatically adapts to their contours has support pad filled with gas or liquid which has intermeshing ribs on its surface |
| WO2015186076A3 (en) * | 2014-06-04 | 2016-02-04 | Paolo Baratti | Abrasive tool for machining surfaces |
-
1972
- 1972-02-14 DD DD160866A patent/DD95332A1/xx unknown
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3021244A1 (en) * | 1979-06-06 | 1980-12-11 | American Optical Corp | POLISHING HEAD TO PROCESS LENSES |
| DE19629286A1 (en) * | 1995-07-21 | 1997-01-23 | Toshiba Kawasaki Kk | Polishing pad device for chemical mechanical polishing of semiconductor wafer |
| DE19629286B4 (en) * | 1995-07-21 | 2005-03-31 | Kabushiki Kaisha Toshiba, Kawasaki | Polishing pad and polishing device |
| DE102006047454B3 (en) * | 2006-10-07 | 2008-03-13 | Rau, Hermann, Prof. Dr. | Sanding tool for flat, concave and convex surfaces which automatically adapts to their contours has support pad filled with gas or liquid which has intermeshing ribs on its surface |
| WO2015186076A3 (en) * | 2014-06-04 | 2016-02-04 | Paolo Baratti | Abrasive tool for machining surfaces |
| US10150204B2 (en) | 2014-06-04 | 2018-12-11 | Paolo Baratti | Abrasive tool for machining surfaces |