DD62309A - - Google Patents
Info
- Publication number
- DD62309A DD62309A DD62309DA DD62309A DD 62309 A DD62309 A DD 62309A DD 62309D A DD62309D A DD 62309DA DD 62309 A DD62309 A DD 62309A
- Authority
- DD
- German Democratic Republic
Links
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DD62309A true DD62309A (fr) |
Family
ID=255808
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DD62309D DD62309A (fr) |
Country Status (1)
| Country | Link |
|---|---|
| DD (1) | DD62309A (fr) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1988006139A1 (fr) * | 1987-02-12 | 1988-08-25 | Allied-Signal Inc. | Production d'acide fluorhydrique anhydre tres pur a faible teneur en arsenic |
| US4954330A (en) * | 1989-11-30 | 1990-09-04 | E. I. Dupont De Nemours And Company | Process for purifying hydrogen fluoride |
-
0
- DD DD62309D patent/DD62309A/xx unknown
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1988006139A1 (fr) * | 1987-02-12 | 1988-08-25 | Allied-Signal Inc. | Production d'acide fluorhydrique anhydre tres pur a faible teneur en arsenic |
| EP0280439A1 (fr) * | 1987-02-12 | 1988-08-31 | AlliedSignal Inc. | Préparation de fluorure d'hydrogène anhydre de grande pureté et de faible teneur en arsénic |
| US4954330A (en) * | 1989-11-30 | 1990-09-04 | E. I. Dupont De Nemours And Company | Process for purifying hydrogen fluoride |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4756899A (en) | Manufacture of high purity low arsenic anhydrous hydrogen fluoride | |
| US4032621A (en) | Preparation of hydrogen fluoride with low levels of arsenic, iron and sulfite | |
| US6350425B2 (en) | On-site generation of ultra-high-purity buffered-HF and ammonium fluoride | |
| US6346227B1 (en) | Process for preparing pure hydrofluoric acid | |
| US4954330A (en) | Process for purifying hydrogen fluoride | |
| CN1190913A (zh) | 用于半导体加工的超高纯氢氟酸的现场制造 | |
| CN115636429A (zh) | 六氟磷酸锂的制备工艺 | |
| FR1335675A (fr) | Procédé pour l'élimination de composés d'arsenic et d'antimoine de l'acide fluorhdrique moyennant la formation de complexes, facilement séparables, entre l'arsenic et l'antimoine, le fluor et un métal alcalin | |
| WO1997018158A1 (fr) | Production de fluorure d'hydrogene a tres faible teneur en arsenic | |
| DD62309A (fr) |