DD114316A1 - - Google Patents

Info

Publication number
DD114316A1
DD114316A1 DD16287372A DD16287372A DD114316A1 DD 114316 A1 DD114316 A1 DD 114316A1 DD 16287372 A DD16287372 A DD 16287372A DD 16287372 A DD16287372 A DD 16287372A DD 114316 A1 DD114316 A1 DD 114316A1
Authority
DD
German Democratic Republic
Application number
DD16287372A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to DD16287372A priority Critical patent/DD114316A1/xx
Publication of DD114316A1 publication Critical patent/DD114316A1/xx

Links

DD16287372A 1972-05-10 1972-05-10 DD114316A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DD16287372A DD114316A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-05-10 1972-05-10

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD16287372A DD114316A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-05-10 1972-05-10

Publications (1)

Publication Number Publication Date
DD114316A1 true DD114316A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1975-07-20

Family

ID=5486510

Family Applications (1)

Application Number Title Priority Date Filing Date
DD16287372A DD114316A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-05-10 1972-05-10

Country Status (1)

Country Link
DD (1) DD114316A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0033138A1 (en) * 1980-01-23 1981-08-05 Hitachi, Ltd. A method for correcting deflection distortions in an apparatus for charged particle lithography

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0033138A1 (en) * 1980-01-23 1981-08-05 Hitachi, Ltd. A method for correcting deflection distortions in an apparatus for charged particle lithography

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