DD103819A5 - - Google Patents
Info
- Publication number
- DD103819A5 DD103819A5 DD17120373A DD17120373A DD103819A5 DD 103819 A5 DD103819 A5 DD 103819A5 DD 17120373 A DD17120373 A DD 17120373A DD 17120373 A DD17120373 A DD 17120373A DD 103819 A5 DD103819 A5 DD 103819A5
- Authority
- DD
- German Democratic Republic
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US00258173A US3837873A (en) | 1972-05-31 | 1972-05-31 | Compositions for use in forming a doped oxide film |
Publications (1)
Publication Number | Publication Date |
---|---|
DD103819A5 true DD103819A5 (nl) | 1974-02-12 |
Family
ID=22979414
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DD17120373A DD103819A5 (nl) | 1972-05-31 | 1973-05-30 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS5846845B2 (nl) |
CS (1) | CS172390B2 (nl) |
DD (1) | DD103819A5 (nl) |
HU (1) | HU165458B (nl) |
PL (1) | PL87113B1 (nl) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE429064B (sv) * | 1976-04-02 | 1983-08-08 | Bofors Ab | Slutfaskorrigering av roterande projektil |
JPS5671933A (en) * | 1979-11-19 | 1981-06-15 | Toshiba Corp | Impurity diffusion to semiconductor substrate |
JPH0628171Y2 (ja) * | 1988-07-26 | 1994-08-03 | 株式会社ナブコ | 圧縮空気乾燥装置 |
-
1973
- 1973-05-24 CS CS377273A patent/CS172390B2/cs unknown
- 1973-05-29 JP JP48059432A patent/JPS5846845B2/ja not_active Expired
- 1973-05-30 HU HUTE000718 patent/HU165458B/hu unknown
- 1973-05-30 DD DD17120373A patent/DD103819A5/xx unknown
- 1973-05-31 PL PL16298873A patent/PL87113B1/pl unknown
Also Published As
Publication number | Publication date |
---|---|
PL87113B1 (nl) | 1976-06-30 |
JPS5846845B2 (ja) | 1983-10-19 |
CS172390B2 (nl) | 1976-12-29 |
HU165458B (nl) | 1974-08-28 |
JPS4944667A (nl) | 1974-04-26 |