CZ2020124A3 - Způsob provozu generátoru paprsků částic a generátor paprsků částic pro provádění způsobu - Google Patents

Způsob provozu generátoru paprsků částic a generátor paprsků částic pro provádění způsobu

Info

Publication number
CZ2020124A3
CZ2020124A3 CZ2020-124A CZ2020124A CZ2020124A3 CZ 2020124 A3 CZ2020124 A3 CZ 2020124A3 CZ 2020124 A CZ2020124 A CZ 2020124A CZ 2020124 A3 CZ2020124 A3 CZ 2020124A3
Authority
CZ
Czechia
Prior art keywords
particle
particle beam
beam generator
tube
particles
Prior art date
Application number
CZ2020-124A
Other languages
English (en)
Other versions
CZ310266B6 (cs
Inventor
Andreas Schmaunz
Wolfgang Berger
Original Assignee
Carl Zeiss Microscopy Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Microscopy Gmbh filed Critical Carl Zeiss Microscopy Gmbh
Publication of CZ2020124A3 publication Critical patent/CZ2020124A3/cs
Publication of CZ310266B6 publication Critical patent/CZ310266B6/cs

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/40—Imaging
    • G01N2223/408—Imaging display on monitor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/50—Detectors
    • G01N2223/507—Detectors secondary-emission detector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

Vynález se týká způsobu provozu generátoru paprsků částic a generátoru paprsků částic pro provádění tohoto způsobu. Generátor paprsků částic vykazuje první částicový tubus pro generování prvního paprsku částic a druhý částicový tubus pro generování druhého paprsku částic. Způsob vykazuje následující kroky: přivedení druhého paprsku částic s druhými nabitými částicemi na objekt s využitím druhého částicového tubusu, načtení hodnoty řídicího parametru z databáze do řídicí jednotky nebo výpočet hodnoty řídicího parametru v řídicí jednotce, nastavení buzení první čočky objektivu prvního částicového tubusu s využitím hodnoty řídicího parametru, detekování druhých interakčních částic detektorem částic, přičemž druhé interakční částice vznikají interakcí druhého paprsku částic s objektem při dopadu druhého paprsku částic na objekt. Detektor částic je umístěn v oblasti mezi první čočkou objektivu a prvním generátorem paprsků prvního částicového tubusu a/nebo detektor částic je umístěn v první čočce objektivu a/nebo na konci první čočky objektivu.
CZ2020-124A 2019-03-15 2020-03-10 Způsob provozu přístroje na vyzařování paprsků částic a přístroj na vyzařování paprsků částic pro provádění způsobu CZ310266B6 (cs)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102019203579.5A DE102019203579A1 (de) 2019-03-15 2019-03-15 Verfahren zum Betrieb eines Teilchenstrahlgeräts sowie Teilchenstrahlgerät zur Durchführung des Verfahrens

Publications (2)

Publication Number Publication Date
CZ2020124A3 true CZ2020124A3 (cs) 2020-09-23
CZ310266B6 CZ310266B6 (cs) 2025-01-15

Family

ID=72241028

Family Applications (1)

Application Number Title Priority Date Filing Date
CZ2020-124A CZ310266B6 (cs) 2019-03-15 2020-03-10 Způsob provozu přístroje na vyzařování paprsků částic a přístroj na vyzařování paprsků částic pro provádění způsobu

Country Status (3)

Country Link
US (1) US11158485B2 (cs)
CZ (1) CZ310266B6 (cs)
DE (1) DE102019203579A1 (cs)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021112503B4 (de) * 2021-05-12 2025-03-27 Carl Zeiss Microscopy Gmbh Teilchenstrahlvorrichtung mit einer Ablenkeinheit
DE102021122388A1 (de) * 2021-08-30 2023-03-02 Carl Zeiss Microscopy Gmbh Teilchenstrahlsäule
US20240153735A1 (en) * 2022-11-09 2024-05-09 Fei Company Pixel elements, particle beam microscopes including the same, and associated methods

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5093572A (en) * 1989-11-02 1992-03-03 Mitsubishi Denki Kabushiki Kaisha Scanning electron microscope for observation of cross section and method of observing cross section employing the same
JP2992688B2 (ja) * 1998-05-19 1999-12-20 セイコーインスツルメンツ株式会社 複合荷電粒子ビーム装置
JP3041600B2 (ja) * 1998-05-19 2000-05-15 セイコーインスツルメンツ株式会社 複合荷電粒子ビーム装置
EP1501115B1 (en) 2003-07-14 2009-07-01 FEI Company Dual beam system
JP4431459B2 (ja) * 2004-07-29 2010-03-17 株式会社日立ハイテクノロジーズ 集束イオン・ビーム装置及び集束イオン・ビーム照射方法
JP5702552B2 (ja) * 2009-05-28 2015-04-15 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ デュアルビームシステムの制御方法
EP2511939B1 (en) * 2011-04-13 2016-03-23 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen
DE112014000306B4 (de) * 2013-01-31 2020-03-26 Hitachi High-Technologies Corporation Kombinierte Ladungsteilchenstrahlvorrichtung
TWI685012B (zh) * 2014-12-22 2020-02-11 美商卡爾蔡司顯微鏡有限責任公司 帶電粒子束系統、用以處理樣品的方法、用以製造約瑟夫接面的方法與用以產生複數個約瑟夫接面的方法
US10446361B2 (en) * 2015-07-01 2019-10-15 Hitachi High-Technologies Corporation Aberration correction method, aberration correction system, and charged particle beam apparatus
DE102016208689B4 (de) 2016-05-20 2018-07-26 Carl Zeiss Microscopy Gmbh Verfahren zum Erzeugen eines Bildes eines Objekts und/oder einer Darstellung von Daten über das Objekt sowie Computerprogrammprodukt und Teilchenstrahlgerät zur Durchführung des Verfahrens
US10103002B1 (en) * 2016-05-20 2018-10-16 Carl Zeiss Microscopy Gmbh Method for generating an image of an object and particle beam device for carrying out the method
CZ309855B6 (cs) 2017-09-20 2023-12-20 Tescan Group, A.S. Zařízení s iontovým tubusem a rastrovacím elektronovým mikroskopem

Also Published As

Publication number Publication date
US11158485B2 (en) 2021-10-26
US20200388463A1 (en) 2020-12-10
CZ310266B6 (cs) 2025-01-15
DE102019203579A1 (de) 2020-09-17

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