CS202849B1 - Primary sample of the footwear uppers - Google Patents

Description

Czechoslovakia SOCIALIST REPUBLIC (19) DESCRIPTION FOLLOWING COPYRIGHT CERTIFICATE 202849 (11) (Bl) (51) Int. Cl.® A 43 B 23/00) (22) Entries 07 12 78 (21) (PV 8105-78) (40) Published 30 05 80 ORDER FOR INVENTIONS AND DISCOVERIES (45) Published 15 03 82 (75)

Author of the invention DUCHOVlC LEOPOLD ing. And JABLONICK ANTON, PARTIZÁNSKE (54) Basic pattern of shoe upper

BACKGROUND OF THE INVENTION The present invention relates to a base pattern of an upper upper, consisting of copies of the outer and inner sides of the last and of the layout pattern of the initial perpendicular to the base line at the intersection of the outer and inner half-lines extending along the sides of the base line under the angles of distribution.

The design of the basic shoe shoe design has a decisive influence on the correct shape of the shoe upper in the shoe manufacturing process and directly affects the consumption of the upper material.

To create new footwear designs and to prepare them for series production, the basic design of the shoe upper has been used to date. In general, the base pattern, as a planar shape, most accurately corresponds to the appropriate portion of the tri-dimensionally curved surface of the hoof. it is known to design a shoe base pattern with copies of the outer and inner sides of the hoof. Characteristic features of the base pattern design of the outer and inner sides of the foot are inconsistencies in their location in the pattern pattern distribution, and thus in the coverage of the hoof surface and in the consumption of materials. All of these basic shoe upper designs therefore, in order to achieve a good tensioning and shaping of the upper on the hoof, are mainly oriented to the best possible distribution of the copies of the outer and inner sides of the base liner, which requires a number of verification tests, and not so many times there is a guarantee that the best distribution will be obtained. Such basic design constructions are largely influenced by a number of practical experience builders, and sometimes lead to very different results for individual workers in terms of shaping the upper and the upper material consumption.

The above drawbacks are eliminated by the construction of the basic pattern of the invention, the principle of which is that the junction points of the outer and inner sides of the hoof lie in the same base line position, and the points of the tip lie in the initial perpendicular, with the point of the hip of the fifth curve of the outer side of the hoof lying outside. the point of the hump curve of the copy of the inside of the hoof lies on the inner half-line. In the direction from the initial round to the instep points, at a distance corresponding to the longitudinal deformation of the material of the entire upper, the correction straight is erected on the basis of which the copies of the outer and inner sides of the coax are displaced. the point of the point, wherein the point of the pointed bumps of the tip are displaced to the base line of the bottom contour in the region of the pear points bound to the backward correction contours. 202849

Claims (2)

The higher technical effect of the invention is that the unambiguous determines the position of copies of the outer and inner sides of the hoof in the base pattern distribution pattern of the top of the footwear to the base line. The correction perpendicular construction determines the contour copy contours with respect to the overall longitudinal deformation of the shoe upper, and simplifies the formation of an extension of the tension tab at the front of the upper shoe. By utilizing the invention, the maximum uniformity of the design results of the shoe upper designs is achieved, with greater precision in the developed shapes and sizes of the upper parts, with respect to the respective three-dimensional shapes of the shoe, resulting in a large amount of footwear. it has a beneficial effect on perfectly forming the upper of the shoe on the hoof while optimally consuming the upper material. The design of the basic pattern of the shoe upper according to the invention is very simple, which has a beneficial effect on reducing the time required for the creation of new shoe designs as well as the time for verifying, bouncing and preparing new patterns of shoe production. This has a beneficial effect on the faster and more numerous variations of the patterned fabrics produced. Examples of embodiments of the base pattern of the invention according to the invention are illustrated in the accompanying drawing, in which FIG. 1 shows a basic pattern for a derby shoe of the male footwear. FIG. Example 1 For a given pattern of the derby men's upper, the layout pattern consists of a basic line z (FIG. 1), in which the cross-section C is indicated, from which the base lines from the angle α1 of the distribution are guided outwardly. polpriamka al. An internal line a2 is guided from the second side of the base line z under the angle α2 of the distribution. The distribution angles 1, 2 and 2 are determined in accordance with known procedures and their values are determined in accordance with known procedures and their values are mainly dependent on the heel height, the hoof shape and the material used. At the intersection C, the initial perpendicular kp is raised to the base line. In the pattern of distribution so constructed, a copy 1 of the outer side of the hoof and copies 1 and 2 of the outer and inner sides of the hoof are predetermined by any of the known methods. For example, a plastic copy of the hoof formed by vacuum molding is used, the point P1 of the copy copy 1 of the outer side of the hoof lies on the base line z, the point Al of the tip lies on the initial perpendicular kp and the point B1 of the bump of the fifth curve lies on the outer half line al . The point P2 of the copy header 2 of the inner side of the hoof lies at the base line z in the same position with the point P1 of the copy 1 copy of the outer side of the hoof, SUBJECT 1. The base pattern of the shoe upper, consisting of copies of the outer and inner sides of the last hoof azo of the layout pattern with the initial perpendicular upward to the base line in the point of intersection A2 lies on the initial perpendicular kp abod B2 of the fifth curve p2 lies on the inner half a2 . On the contours of the copies 1 and 2 of the outer and inner sides of the hoof [in FIG. 1, the contours indicated by dotted lines are further marked with the dot points D1, D2 and the points E1, E2 of the tip curves. In the direction from the initial perpendicular kp to the plots P2, P2 of the instep, the distance d on the base line is from the erected correction perpendicular kk. The distance d corresponds to the value of the longitudinal deformation of the materials of the entire shoe upper. From the pear points D1, D2 towards the root curves p1, the outlines of copies 1 and 2 of the outer and inner sides of the hoof are hinged in a known manner by the total rake h of the materials used in this part of the shoe, thereby forming the backwardly contoured, 2z, which is the final fifth curves of kpl, kp2, also formed in a known manner, bound to the p1, p2 curves. Copies 1 and 2 of the outer and inner sides of the hoof are displaced by the Al, A2 tips of the toe to the rectilinear perpendicular to the points E1, E2 of the tip curvature curves to the base line z. (these, firstly, the correction lines 1k, 2k and the back correction lines 1z, 2z are dotted in FIG. 1). The circumferential contours n1, n2 are indicated at a distance n from the pre-correcting contours 1k, 2k and no correction lines 1z, 2z. The distance n corresponds to the prescribed width of the tension tab. The basic pattern of the shoe upper has further marked the contours of the individual base lines of the derby pattern. Marked contours are made in known ways. transferring them from the hoof, measuring from copies 1 and 2 of the outer and inner sides of the hoof, or transferring them from the design materials in the front part of no parts. Example 2 For a given pattern of the ladies upper, the pattern of layout is produced by Example 1, with the only difference that the outer line a1 (FIG. 2) forms a base line from the angle βΐ of the distribution and the internal half line a2 forms the base line from the angle β2 of the distribution. The angles βΐ, β2 of decomposition with the known methods of their determination have lower values for the heel height compared to the angles α1, α2 of the distribution according to Example 1. The shape and depth of the garment itself have an influence on the angles of the distribution of the U-boat shoes. In the layout diagram, the copies 1 and 2 of the outer and inner sides of the hoof are shown below. Analogously to Example 1, a complete base pattern of the shoe upper is provided. The invention can be utilized in the construction of the base of most of the patterned shoes. EXCEEDING the outer and inner semicircle lines extending along the sides of the base line of the decomposition, characterized in that the sides (P1, P2) of the copy instep (1 and 2) of the outer and outer sides of the hoof lie in the same. position] on the base] line (z) and the points (AI and A2) of the tip lie on the initial (perpendicular) (kp), while the point (B1) bumps badly] curves (pl) of the copy (1) of the outer side the hooves lie on the outer half-line (a1) and the point (b2) on the bare-wrong side (p2) of the copy (2) of the inner side of the hoof lie on the inner-half (a2). 2. The base pattern of the shoe upper according to claim 1, characterized in that in the direction from the initial perpendicular (kp) to the points (P1 and P2) of the instep, at a distance (d) corresponding to the value of the value. ] deformation of the footwear materials,] e on the base line (z) the corrected perpendicular (kk) to which the (1 and 2) copies of the outer] and the inner] sides of the foot are displaced by the points (A1 and A2) of the tip, wherein the points (E1 and E2) of the ridges of the curvilinear point are shifted to the base line (z) and the lower contours of the pear side region (D1 and D2) are bound to the rear correction contours (1z and 2z). 2 drawings