CS163774B2 - - Google Patents

Info

Publication number
CS163774B2
CS163774B2 CS745670A CS745670A CS163774B2 CS 163774 B2 CS163774 B2 CS 163774B2 CS 745670 A CS745670 A CS 745670A CS 745670 A CS745670 A CS 745670A CS 163774 B2 CS163774 B2 CS 163774B2
Authority
CS
Czechoslovakia
Application number
CS745670A
Other languages
Czech (cs)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of CS163774B2 publication Critical patent/CS163774B2/cs

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
CS745670A 1970-05-05 1970-11-05 CS163774B2 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702022025 DE2022025C3 (de) 1970-05-05 1970-05-05 Vorrichtung zum Herstellen eines Hohlkörpers aus Halbleitermaterial

Publications (1)

Publication Number Publication Date
CS163774B2 true CS163774B2 (https=) 1975-11-07

Family

ID=5770320

Family Applications (1)

Application Number Title Priority Date Filing Date
CS745670A CS163774B2 (https=) 1970-05-05 1970-11-05

Country Status (10)

Country Link
JP (1) JPS4918917B1 (https=)
AT (1) AT306105B (https=)
CH (1) CH561079A5 (https=)
CS (1) CS163774B2 (https=)
DE (1) DE2022025C3 (https=)
FR (1) FR2092930B2 (https=)
GB (1) GB1315167A (https=)
IT (1) IT951574B (https=)
NL (1) NL7017481A (https=)
SE (1) SE368912B (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE789719A (fr) * 1972-05-16 1973-02-01 Siemens Ag Procede et dispositif de fabrication de corps creux en matiere semi-conductrice, en particulier des tubes en silicium
DE2618273C3 (de) * 1976-04-27 1984-04-19 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur Abscheidung von polykristallinem Silicium
JPH0166340U (https=) * 1987-10-21 1989-04-27

Also Published As

Publication number Publication date
FR2092930B2 (https=) 1973-02-02
GB1315167A (en) 1973-04-26
DE2022025B2 (de) 1979-06-28
CH561079A5 (https=) 1975-04-30
DE2022025A1 (de) 1971-11-18
FR2092930A2 (https=) 1972-01-28
IT951574B (it) 1973-07-10
DE2022025C3 (de) 1980-03-20
AT306105B (de) 1973-03-26
SE368912B (https=) 1974-07-29
NL7017481A (https=) 1971-11-09
JPS4918917B1 (https=) 1974-05-14

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