CN2667532Y - Four-beam light exposure apparatus - Google Patents
Four-beam light exposure apparatus Download PDFInfo
- Publication number
- CN2667532Y CN2667532Y CN 200420001973 CN200420001973U CN2667532Y CN 2667532 Y CN2667532 Y CN 2667532Y CN 200420001973 CN200420001973 CN 200420001973 CN 200420001973 U CN200420001973 U CN 200420001973U CN 2667532 Y CN2667532 Y CN 2667532Y
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- light
- bundle
- grating
- laser
- light exposure
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Abstract
The utility model relates to a device which makes three dimensional photo crystals by making use of four-beam intervening and is provided with a laser, a spreading and a spatial filter, a collimating lens, a raster board and a holographic record plate. The parallel light after undertaking a beam expansion from the raster board forms four-beam interfering. Once a few optics components are adopted, only a single bundle of laser and one raster board can produce four beams which move to the expected direction. The four beams interfere one another in a free space after joining together, thereby producing three dimensional photos of the periodical variation of light intensity. A photo-sensing material records the photos, which produces a three dimensional lattice structure of the refractive index cyclical change in the material. As long as the ratio of two refractive indexes in the lattice structure is large enough, the utility model can produce a photon forbidden region and the material can be used as the photon crystal. If a light-sensitive lacquer board is used as a recording material, the recorded structure is also able to be used as a stencil and a refractive index material can be made into a photon crystal. In addition, the making process is simple.
Description
Technical field
The utility model relates to the device that a kind of usefulness four bundle interference of light prepare three-D photon crystal.
Background technology
Photonic crystal is the artificial crystal that is formed by the dielectric substance periodic arrangement of different refractivity.Different with mineral crystal diffraction X ray, the photonic crystal diffraction be visible light and near infrared ray.Similar semiconductor material has the energy forbidden band to electronics, and photonic crystal has the optical band gap to light wave, and promptly the light wave of frequency in a certain scope can't pass through specific photonic crystal, and be reflected fully.This characteristic makes photonic crystal that many important use be arranged, for example prepare high efficient LED, photonic crystal fiber, photon crystal laser etc., and in systems such as optical communication, all-optical network, fiber laser, semiconductor laser and device, obtain important application.
The method for making of photonic crystal has multiple, as the method that is layering, colloid self-organization method, and various etching, plate-making technology, comprises technology such as the dull and stereotyped etching of X ray, ion beam etching, glancing angle deposition and light modulated electrochemical etching.These methods are the preparation process complexity not only, and is difficult to obtain the three-D photon crystal of multilayer.(seen document M Campbell, D NSharp, M T Harrison what report, et al, Fabrication of photonic crystals for the visible spectrum by holographiclithography, Nature, 2000,404:53-56.) in the holographic technique, the preparation process of four bundle interference of light technology is the fastest, but currently used four bundle laser are with many optical elements beam of laser to be divided into four the tunnel, through half-wave plate the polarization direction of each light path is changed into same direction again, and then each Shu Guang is expanded bundle, collimates.
Summary of the invention
The utility model aims to provide four bundle light exposure devices of a kind of good stability, equipment preparation three-D photon crystal simple, easy and simple to handle.
The utility model is provided with laser instrument, is provided with 1 successively and expands bundle and spatial filter, 1 collimation lens, 1 grating version and 1 holographic recording dry plate on the light path of laser instrument output laser.Said laser is to holographic recording dry plate sensitivity, and for example 442nm and 458nm wavelength are to photoetching hectograph sensitivity.Said grating version forms the 4 bundle interference of light to the directional light that expands after restrainting.
When adopting the utility model to prepare three-D photon crystal, laser is restrainted and spatial filtering through expanding, become the directional light that expands bundle again, the directional light that expands after restrainting is shone on the grating version, after the grating version, produce the 4 bundle interference of light, place the holographic recording dry plate at interference region, behind exposure imaging, promptly get three-D photon crystal.
The utility model adopts optical element seldom, only needs single beam laser and a grating version just can produce four bundle light, and the direction operation to expect.Four bundle light converge the back and interfere with each other at free space, have produced the periodically variable three-dimensional picture of light intensity.With photochromics graphic recording is got off, just in material, produced the three-dimensional lattice structure of refractive index cycle variation.As long as the ratio of two kinds of refractive indexes in the crystalline network is big (as reaching more than 2.1) enough, just can produce forbidden photon band, this material just can be used as photonic crystal.If with photoresist dry plate (the being called for short the photoetching hectograph) material that keeps a record, also the structure of noting can be used as masterplate, turn over high-index material and make photonic crystal.And its preparation process is simple.
Description of drawings
Fig. 1 is the structural representation of four bundle light exposure device embodiment.
Fig. 2 is the structural representation of the grating version of four bundle light exposure device embodiment.
Fig. 3 is 4 beam interferometer light direction synoptic diagram.
Embodiment
As shown in Figure 1, a branch of wavelength of laser instrument 1 output is to the laser of record dry plate 5 sensitivities (as 442nm and 458nm wavelength to photoetching hectograph sensitivity), after expanding bundle wave filter 2 and expanding bundle and spatial filtering, by lens 3 collimations, shines then on the grating version 4.As shown in Figure 2, grating version 4 is provided with three gratings 41.At the center of grating version 4 white space 42 is arranged, shape is fixedly requirement not, can be square, circle or triangle etc.Three gratings 41 differ 120 ° round the central area between each grating.The light that sees through the grating version has formed four bundles (referring to Fig. 3), and a branch of central light beam sees through and propagates along optical axis from the white space 42 at grating version 4 centers (as Fig. 2 square), and traffic direction is without any change; Three-beam is formed by the first-order diffraction light of three gratings 41 respectively in addition, and traffic direction and optical axis form an angle theta, and this angle is the first order angle of diffraction of grating.Because the identical and symmetric offset spread of grating constant of three gratings, the three beams diffraction light departs from original traffic direction with identical angle θ, turns the direction to central light beam.The four bundle light (central light beam and three diffracted beams) that see through the grating version converge after the grating version, produce in confluence area and interfere.Interference figure has the three-dimensional periodic structure, and this structure is relevant with three grating diffration angles (being central light beam and other three angle of beams).Place the holographic recording dry plate 5 (as the photoetching hectograph) of photoresists thicker (more than several microns) in producing the zone of three-dimensional structure pattern, exposure is developed then to dry plate, promptly is made into three-D photon crystal.Exposure is identical with the method for developing with making hologram usually.
The grating version can adopt photochemigraphy material or hologram recording material, and preferably the grating version must have transparency preferably, to allow more light pass through.Grating on the grating version can be made of the method for photochemigraphy, also can make of hologram recording method.When making of holographic method, material therefor is the holographic recording dry plate, record be transmission-type grating.Because crystalline network is relevant with the grating diffration angle, and the grating diffration angle is relevant with the fringe spacing of grating,, make that the first-order diffraction angle of grating is desired angle so when making grating, must select suitable fringe spacing.Area to three gratings 41 and central space zone 42 is not strict with, but preferably the area of the first-order diffraction light of grating is approaching with the area of the light that sees through from the center white space, can make full use of light source like this, make four bundle interference of light zones reach maximum, help making the large-area three-dimensional photonic crystal.
Claims (5)
1, four bundle light exposure devices, it is characterized in that being provided with laser instrument, be provided with 1 successively and expand bundle and spatial filter, 1 collimation lens, 1 grating version and 1 holographic recording dry plate on the light path of laser instrument output laser, said grating version forms the 4 bundle interference of light to the directional light that expands after restrainting.
2, four bundle light exposure devices as claimed in claim 1 is characterized in that laser is to holographic recording dry plate sensitivity.
3, four bundle light exposure devices as claimed in claim 1 is characterized in that said grating version is provided with three gratings, and a white space is arranged at the center of grating version, and three gratings differ 120 ° round the central area between each grating.
4, as claim 1 or 3 described four bundle light exposure devices, it is characterized in that said grating version is photochemigraphy material or hologram recording material.
5, as claim 1 or 3 described four bundle light exposure devices, it is characterized in that said original screen panel white space be shaped as square, circle, triangle or other shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200420001973 CN2667532Y (en) | 2004-01-09 | 2004-01-09 | Four-beam light exposure apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200420001973 CN2667532Y (en) | 2004-01-09 | 2004-01-09 | Four-beam light exposure apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2667532Y true CN2667532Y (en) | 2004-12-29 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200420001973 Expired - Fee Related CN2667532Y (en) | 2004-01-09 | 2004-01-09 | Four-beam light exposure apparatus |
Country Status (1)
| Country | Link |
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| CN (1) | CN2667532Y (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100406931C (en) * | 2004-01-09 | 2008-07-30 | 厦门大学 | Preparation method of three dimensional photon crystal and its device |
-
2004
- 2004-01-09 CN CN 200420001973 patent/CN2667532Y/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100406931C (en) * | 2004-01-09 | 2008-07-30 | 厦门大学 | Preparation method of three dimensional photon crystal and its device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20041229 |