CN2510960Y - Super-resolution high-density optical disc with non-linear mask sandwich structure - Google Patents

Abstract

Provided is a super-resolution high-density compact disk of the non-linear mask layer structure. The utility model belongs to the photo-induced super-resolution technology field and is characterized in that the disk comprises a mask layer composed of a first spacing layer, a medium layer and a second spacing layer--three medium film layers. The whole mask layer can be placed between the disk base and the recording layer, or between the n-1 recording layer and the n recording layer or between the m-1 recording layer and the m recording layer (the m is larger than 1 and is smaller than n), or between the disk base or the first recording layer, or between the disk base and the reflecting layer in the read-only disk. The total thickness of the mask layer and the recording layer or of the mask layer in the read-only disk and the groove depth of the preloading information on the disk base is smaller than the focal depth of the reading and writing system. Therein, the first spacing layer and the second spacing layer are made of transparent, high temperature resistance, strong light exposure resistance materials. The medium layer gives off non-linear light and is made of non-linear materials. The utility model has the advantages of realizing super-resolution record on common disks through common processing, no special requirements on recording medium and incident light frequency and non-differential and fast response on the whole visible light wave band.

Description

The super resolution high density CD that has non-linear mask sandwich structure

Technical field

A kind of super resolution high density CD that has non-linear mask sandwich structure belongs to photic super resolution technology field, and it relates to a kind of being applied on the CD, can reduce the mask layer super resolution high density CD of read-write light class size on recording layer.

Background technology

The classic method that improves storage density on optical discs is the size that reduces to read and write light class, the main two kinds of methods of numerical aperture that reduce optical maser wavelength and increase objective lens for optical pickup that adopt.The former owing to the difficulty of short wavelength laser development and dish base to reasons such as the short wavelength laser transmitance weaken, the reducing of wavelength is restricted.The latter is because being produced on the technology of the non-spherical lens of the large-numerical aperture in the optical storage system is relatively more difficult, simultaneously according to the aberration analysis, even proofreaied and correct well at object lens under the situation of aberration, the variation of disk thickness also will cause change in optical path length, and the variation of this light path will make the read-write quality descend.At present, employing " super-resolution " mask technique can obtain the light class less than the diffraction limit size.Main mask layer technology has: 1, mangneto super resolution technology.Use the magnetic medium layer in CD, the super-resolution effect when utilizing the external magnetic field to realize read-write can improve the line density and the track density of magneto-optic disk, to realize more highdensity storage.2, the super resolution technology of phase-change material.The different realization super-resolution masks of reflectivity are to improve storage density between the crystalline state that it utilizes phase change medium and amorphous state.3, photic super resolution technology.This imagination is proposed by the people such as Xu Duanyi at Qinhua Univ., Beijing CD national project center.It can realize other reaction of molecular level based on optical effect, and resolution is higher, and wavelength selectivity is arranged.Above-mentioned super-resolution masking method can both be issued to the read-write effect of super diffraction limit in the situation that does not change the read-write system light path, increases the storage density of medium.But the mangneto super resolution technology can only be used for magnet-optical medium.In addition, the optical non-linear effect of above-mentioned these medium super-resolution dishes such as photic its mask layer of super-resolution dish is not obvious, there is not tangible irradiates light power threshold point, that is to say and do not have such performance number: when laser focusing power is lower than this value, mask openings when not perforate of mask, power are higher than this value.Become big thereby photic mask layer aperture size is increased with irradiation time, reduce interception result, on using, be restricted.

Summary of the invention

The purpose of this utility model be to provide a kind of have the mask layer of tangible irradiation power threshold points and utilize it and recording layer between the near field coupling come on conventional optical disk system, to realize the super resolution high density CD that has the non-linear mask interlayer near the read-write of nanoscale super-resolution.

Of the present utility model being characterised in that: it contains: the mutual successively dish base of arranging, mask layer, recording layer, reflection horizon and protective seam, described mask layer are successively by first wall, and the middle dielectric layer and second wall totally three layers of dielectric film are formed; The thickness summation of described mask layer and recording layer is less than the depth of focus of read-write system; In last order, described each layer of CD and thickness thereof are successively according to the dish base: (1) dish base, thickness 0.1mm～10mm; (2) first walls, thickness 5nm～1000nm, (3) middle dielectric layer; thickness 5nm～1000nm, (4) second walls, thickness 5nm～1000nm; (5) recording layer; thickness 5nm～2000nm, (6) reflection horizon, thickness 5nm～1000nm; (7) protective seam, thickness 1um～5mm.Described recording layer is first recording layer, and recording layer has the n layer.

Feature of the present utility model also is: it contains: the mutual successively dish base of arranging, 1～(n-1) layer of recording layer, mask layer, n layer recording layer, reflection horizon and protective seam, n is the number of plies of recording layer, and described mask centre layer is successively by first wall, and the middle dielectric layer and second wall totally three layers of dielectric film are formed; The thickness summation of described mask layer and recording layer is less than the depth of focus of read-write system; Basic according to dish in last order; described each layer of CD and thickness thereof are successively: (1) dish base; thickness is 0.1mm～10mm; (2) the 1st～n～1 layer recording layer; thickness respectively is 5nm～1000nm, and first wall in (3) mask layer, thickness are 5nm～1000nm; (4) middle dielectric layer; thickness is 5nm～1000nm, and (5) second walls, thickness are 5nm～1000nm; (6) n layer recording layer; thickness is 5nm～1000nm, (7) reflection horizon, and thickness is 5nm～1000nm; (8) protective seam, thickness are 1um～5mm.

Feature of the present utility model is again: it contains: the dish base that is arranged in order, the the 1st～(m-1) layer of recording layer, mask layer, the m～n layer recording layer, reflection horizon and protective seam, wherein, 1＜m＜n, n are the number of plies of recording layer, and described mask layer is successively by first wall, middle dielectric layer, second wall totally three layers of dielectric film are formed; The thickness summation of described mask layer and recording layer is less than the depth of focus of read-write system; Basic according to dish in last order; described each layer of CD and thickness thereof are successively: (1) dish base; thickness is 0.1mm～10mm; (2) the 1st～(m-1) layers of recording layer; thickness respectively is 5nm～1000nm; (3) in the mask layer: first space layer is 5nm～1000nm; middle dielectric layer is 5nm～1000nm; second wall is 5nm～1000nm, and (4) the m～n layer recording layer, thickness respectively are 5nm～1000nm; (5) reflection horizon; thickness is 5nm～1000nm, and (6) protective seam, thickness are 1um～5mm.

Feature of the present utility model also can be: it is a kind of read-only optical disc that has mask layer, contain the dish base that is pressed with information pits in advance that is being arranged in order, mask layer, reflection horizon and protective seam, described mask layer is successively by first wall, and the middle dielectric layer and second wall totally three layers of dielectric film are formed; The thickness of described mask layer and above-mentioned summation of giving the indentation hole degree of depth are less than the depth of focus of read-out system; Basic according to dish in last order; described each layer of CD and thickness thereof are successively: (1) dish base, and thickness is 0.1mm～10mm, (2) mask layer; the thickness of first wall is 5nm～1000nm; middle dielectric layer is 5nm～1000nm, and second wall is 5nm～1000nm, (3) reflection horizon; thickness is 5nm～1000nm; (4) protective seam, thickness are 1um～5mm, and the information pits degree of depth is 10nm～2000nm.

Use proof: it has reached intended purposes.

Description of drawings

Fig. 1: the compact disk structure cut-open view when the utility model has only one deck recording layer, mask layer is between dish base and recording layer.

Fig. 2: the compact disk structure cut-open view when the utility model has n layer recording layer, mask layer are positioned between n layer recording layer and (n-1) layer recording layer.

Fig. 3: the compact disk structure cut-open view when the utility model has n layer recording layer, mask layer are positioned between m layer recording layer and (m-1) layer recording layer.

Fig. 4: the compact disk structure cut-open view when the utility model has n layer recording layer, mask layer is between dish base and ground floor recording layer.

Fig. 5: read-only optical disc structure of the present utility model, mask layer is between dish base and reflection horizon.

Fig. 6: the transmission change situation of non-linear mask interlayer when incident laser focusing different capacity on the dish base, transverse axis is represented transmission power (mw), and the longitudinal axis is represented transmissivity.

Fig. 7: when irradiation power is higher than non-linear threshold values, focussed laser beam is passing through mask layer front and back light intensity along radius distribution figure, the triangle representative sees through the experimental data before the mask, and the rhombus representative sees through the experimental data behind the mask, and two smooth curves are respectively the matched curves of the two.

Fig. 8: the record symbol sem photograph that the laser focusing of certain power produces on common no mask CD, white is rectangular to be 1um, down together.

Fig. 9: the laser focusing of certain power is having the record symbol sem photograph that produces on the CD of mask.

Figure 10: the mask layer preparation technology figure of the utility model CD.

Embodiment

Ask for an interview Fig. 1.The 1st, dish base, the 2nd, first wall of mask layer, the 3rd, the middle dielectric layer of mask layer, the 4th, second wall of mask layer, the 5th, recording layer, the 6th, reflection horizon, the 7th, protective seam (down together).It is the CD that has only one deck recording layer 5, and mask layer is between dish base 1 and recording layer 5.Read-write light class sees through mask layer, forms the actual light class that yardstick dwindles on recording layer 5, and the thickness summation of described mask layer and recording layer 5 is less than the depth of focus of read-write system.

Ask for an interview Fig. 2.It is a kind of multilayer multi-wavelength CD structure that has mask layer.It is the longest that the read-write wavelength of n layer recording layer 5n correspondence is gone into n, and mask layer is between n layer recording layer 5n and n-1 layer recording layer 5n-1 layer.The read-write hot spot that only with wavelength is λ n dwindles yardstick, does not influence the read-write hot spot of other wavelength, and the thickness summation of described mask layer and recording layer is less than the depth of focus of read-write system.

Ask for an interview Fig. 3.It is the another kind of structure of the multilayer multi-wavelength CD of mask layer.Mask layer between centre a certain recording layer m layer and m-1 layer, 1＜m＜n.Mask layer only dwindles yardstick with the read-write hot spot of corresponding record layer m～n layer, and its corresponding wavelength is λ m～λ n, does not influence the read-write hot spot of other wavelength, and the thickness summation of described mask layer and recording layer is less than the depth of focus of read-write system.

Ask for an interview Fig. 4.It is the third structure that has in the multilayer multi-wavelength CD of mask layer.Mask layer is between the dish base and first recording layer 5.The a certain component of read-write light beam plays " effect of opening light " makes mask layer produce the scattering microstructure, thereby when making the read-write hot spot see through mask layer, dwindle the read-write spot size of all read-write wavelength X 1～λ n, the thickness summation of described mask layer and recording layer is less than the depth of focus of read-write system.

Ask for an interview Fig. 5.It is a read-only optical disc of the present utility model.Mask layer is between dish base 1 and reflection horizon 6.Read hot spot and form the actual hot spot that yardstick dwindles through mask layer on the dish base 1 that is pressed with information pits in advance, the summation of described mask layer thickness and precompressed pit depth is less than the depth of focus of read-write system.

Below be embodiment:

1, is applicable to Fig. 1～Fig. 4.The thickness of first wall 2 is 200nm in the mask layer, and the thickness of middle dielectric layer 3 is 20nm, and the thickness of second wall 4 is 22nm; the thickness of every layer of recording layer 5 is 60nm; the thickness in reflection horizon 6 is 50nm, and the thickness of protective seam 7 is 20 μ m, and the thickness of dish base 1 is 1mm.First wall 2 is used silicon nitride in the mask layer, and middle dielectric layer 3 is used antimony, and second wall 4 is used silicon nitride.Mask layer does not have specific (special) requirements to recording medium, can be used for comprising read-only, magneto-optic, phase transformation, various storage mediums such as look change (down with).In the utility model, recording layer 5 is used Ge2Sb2Te5, and reflection horizon 6 usefulness Al protective seams 7 are used UV glue, down together.

2, be applicable to Fig. 1～Fig. 4.The thickness of first wall 2 is 150nm in the mask layer, and the thickness of middle dielectric layer 3 is 16nm, and the thickness of second wall 4 is 20nm; the thickness of every layer of recording layer 5 is 60nm; the thickness in reflection horizon 6 is 40nm, and the thickness of protective seam 7 is 30 μ m, and the thickness of dish base 1 is 1.1mm.First wall 2 is used monox in the mask layer, and middle dielectric layer 3 is used antimony, and second wall 4 is used monox.All the other are with embodiment 1.

3. be applicable to Fig. 1～Fig. 4.The thickness of first wall 2 is 100nm in the mask layer, and the thickness of middle dielectric layer 3 is 16nm, and the thickness of second wall 4 is 20nm; the thickness of every layer of recording layer 5 is 40nm; the thickness in reflection horizon 6 is 60nm, and the thickness of protective seam 7 is 40 μ m, and the thickness of dish base 1 is 1mm.First wall 2 is used zinc sulphide in the mask layer: monox=1: 1, and middle dielectric layer 3 is used silver oxide, and second wall 4 is used zinc sulphide: monox=1: 1.All the other are with embodiment 1.

4, be applicable to Fig. 5.The thickness of first wall 2 is 100nm in the mask layer, and the thickness of middle dielectric layer 3 is 18nm, and the thickness of second wall 4 is 20nm, and the thickness in reflection horizon 6 is 50nm, and the thickness of protective seam 7 is 20 μ m, and the thickness of dish base 1 is 1mm.First wall 2 is used silicon nitride in the mask layer, and middle dielectric layer 3 is used antimony, and second wall 4 is used silicon nitride.Reflection horizon 6, protective seam 7 are with embodiment 1.

5, be applicable to Fig. 5.The thickness of first wall 2 is 170nm in the mask layer, and the thickness of middle dielectric layer 3 is 21nm, and the thickness of second wall 4 is 18nm, and the thickness in reflection horizon 6 is 60nm, and the thickness of protective seam 7 is 30 μ m, and the thickness of dish base 1 is 1mm.First wall 2 is used monox in the mask layer, and middle dielectric layer 3 is used antimony, and second wall 4 is used monox.

6, be applicable to Fig. 5.The thickness of first wall 2 is 100nm in the mask layer, and the thickness of middle dielectric layer 3 is 16nm, and the thickness of second wall 4 is 22nm, and the thickness in reflection horizon 6 is 70nm, and the thickness of protective seam 7 is 40 μ m, and the thickness of dish base 1 is 1.1mm.First wall 2 is used zinc sulphide in the mask layer: monox=1: 1, and middle dielectric layer 3 is used silver oxide, and second wall 4 is used zinc sulphide: silver oxide=1: 1.

Above-mentioned monox, silicon nitride be transparent, high temperature resistant, under high light stable material.Antimony, silver oxide are nonlinear optical materials.Micropore scattering mask CD is generally used antimony,, can obtain littler super-resolution record symbol, but it is low to the energy coupling efficiency of recording layer to see through mask under certain condition; Particulate scattering mask CD is generally used silver oxide, and under identical record condition, the super-resolution record symbol that obtains is big than the former, but it is higher to the energy coupling efficiency of recording layer to see through mask.

The general vacuum sputtering coating technology that adopts of CD film system preparation is asked for an interview Figure 10.It is the process diagram that adopts sputtering technology plated film on optical disk substrate 1.The 8th, target, the 9th, the aura district, the 1st, the dish base, the 10th, carriage, the 11st, the sputter gas that injects, the 12nd, be connected the gas that extract out from sputtering chamber the back with vacuum equipment.According to the concrete condition of each embodiment, the scope of sputtering parameter is: air pressure 10 ^-1～10Pa, target negative bias: 10 ²～10 ³V, the positive ion energy of bombardment target: 10 ²～10 ³EV, sputter the energy of particle: ≈ 10 ¹EV.Its preparation technology and existing CD-R/W, CD-RAM, DVD-R/W, the DVD-RAM process is identical.Therefore, no matter still all compatible fully with existing CD on manufacture craft at read-write system this CD is, but great raising is arranged on storage density.

Non-linear mask interlayer on Fig. 6 indicating panel base, the transmission change situation of mask layer when incident laser focusing different capacity, as can be seen: there is a tangible power threshold point in mask layer, when incident laser focusing power was lower than this threshold values, the transmissivity that mask layer is measured in experiment was consistent with the transmissivity of Film Optics Theoretical Calculation gained; When incident laser focusing power was higher than this threshold values, transmissivity increased suddenly, and there is a non-linear step in transmission curve.This is when being subjected to the focussed laser beam irradiation of certain power owing to mask layer, the optical physics character sudden change of middle dielectric layer 3, be subjected to the effect of multiple physical fields such as in the stress field of upper and lower wall 2,4 and interlayer local thermal field simultaneously, thereby corresponding power density is higher than certain threshold values place and forms a light scattering microstructured area at middle dielectric layer 3 focussed laser beam centers.It can be microcellular structure or microgranular texture, and drops to threshold points when following when laser power, and microstructure can disappear, and medium is replied normal state of aggregation.

The longitudinal axis of Fig. 7 is the normalization light intensity, and transverse axis is the normalization radius.As can be seen: because the effect of scatterer in the interlayer, changed the energy distribution of focused beam, concentrate to the center by the edge and to have worked to reduce hot spot, experiment and calculate all shows in interlayer in the fringe area near field range, can keep this concentrated energy distribution preferably, therefore recording layer 5 is particularly crucial with the distance of mask layer, and distance of near field control is to be realized by second wall 4 in the mask layer.

Comparison diagram 8 and Fig. 9 be as can be seen: the size that mask layer has obviously reduced effective record symbol, realized the super-resolution record.

This shows, the utlity model has: can on conventional CD, use with sampling technology and realize that super-resolution record, mask layer all do not have specific (special) requirements to recording medium and incident light frequency, all respond at whole visible light wave range, and do not have significant difference and advantage such as the response that can be exceedingly fast to incident light again.

Claims (8)

1. super resolution high density CD that has non-linear mask sandwich structure, contain the dish base, recording layer, mask layer, reflection horizon and protective seam, it is characterized in that it contains: the mutual successively dish base of arranging, mask layer, recording layer, reflection horizon and protective seam, described mask layer are successively by first wall, and the middle dielectric layer and second wall totally three layers of dielectric film are formed; The thickness summation of described mask layer and recording layer is less than the depth of focus of read-write system; In last order, described each layer of CD and thickness thereof are successively according to the dish base: (1) dish base, thickness 0.1mm～10mm; (2) first walls, thickness 5nm～1000nm, (3) middle dielectric layer; thickness 5nm～1000nm, (4) second walls, thickness 5nm～1000nm; (5) recording layer; thickness 5nm～2000nm, (6) reflection horizon, thickness 5nm～1000nm; (7) protective seam, thickness 1um～5mm.

2. the super resolution high density CD that has non-linear mask sandwich structure according to claim 1 is characterized in that: described recording layer is first recording layer, and recording layer has the n layer.

3. a super resolution high density CD that has non-linear mask sandwich structure contains the dish base, recording layer, mask layer, reflection horizon and protective seam is characterized in that, it contains: the mutual successively dish base of arranging, 1～(n-1) layer of recording layer, mask layer, n layer recording layer, reflection horizon and protective seam, n is the number of plies of recording layer, and described mask layer is successively by first wall, and the middle dielectric layer and second wall totally three layers of dielectric film are formed; The thickness summation of described mask layer and recording layer is less than the depth of focus of read-write system; Basic according to dish in last order; described each layer of CD and thickness thereof are successively: (1) dish base; thickness is 0.1mm～10mm; (2) the 1st～(n-1) layers of recording layer; thickness respectively is 5nm～1000nm, and first wall in (3) mask layer, thickness are 5nm～1000nm; (4) middle dielectric layer; thickness is 5nm～1000nm, and (5) second walls, thickness are 5nm～1000nm; (6) n layer recording layer; thickness is 5nm～1000nm, (7) reflection horizon, and thickness is 5nm～1000nm; (8) protective seam, thickness are 1um～5mm.

4. a super resolution high density CD that has non-linear mask sandwich structure contains the dish base, recording layer, mask layer, reflection horizon and protective seam is characterized in that, it contains: the dish base that is arranged in order, the 1st～(m-1) layer of recording layer, mask layer, the m～n layer recording layer, reflection horizon and protective seam, wherein, 1＜m＜n, n are the number of plies of recording layer, and described mask layer is successively by first wall, middle dielectric layer, second wall totally three layers of dielectric film are formed; The thickness summation of described mask layer and recording layer is less than the depth of focus of read-write system; Basic according to dish in last order; described each layer of CD and thickness thereof are successively: (1) dish base; thickness is 0.1mm～10mm; (2) the 1st～(m-1) layers of recording layer; thickness respectively is 5nm～1000nm; (3) in the mask layer: first space layer is 5nm～1000nm; middle dielectric layer is 5nm～1000nm; second wall is 5nm～1000nm, and (4) the m～n layer recording layer, thickness respectively are 5nm～1000nm; (5) reflection horizon; thickness is 5nm～1000nm, and (6) protective seam, thickness are 1um～5mm.

5. super resolution high density CD that has non-linear mask sandwich structure, contain the dish base, mask layer, reflection horizon and protective seam is characterized in that: it is a kind of read-only optical disc that has mask layer, contains the dish base that is pressed with information pits that gives that is being arranged in order, mask layer, reflection horizon and protective seam, described mask layer are successively by first wall, and the middle dielectric layer and second wall totally three layers of dielectric film are formed; The thickness of described mask layer and above-mentioned summation of giving the indentation hole degree of depth are less than the depth of focus of read-out system; Basic according to dish in last order; described each layer of CD and thickness thereof are successively: (1) dish base, and thickness is 0.1mm～10mm, (2) mask layer; the thickness of first wall is 5nm～1000nm; middle dielectric layer is 5nm～1000nm, and second wall is 5nm～1000nm, (3) reflection horizon; thickness is 5nm～1000nm; (4) protective seam, thickness are 1um～5mm, and the information pits degree of depth is 10nm～2000nm.

6. according to any super resolution high density CD that has non-linear mask sandwich structure in the claim 1～5, it is characterized in that: in mask layer, the employing of first wall is transparent, high temperature resistant, the material oxidation silicon of anti-high light, middle dielectric layer adopts nonlinear optical material antimony, and second wall adopts monox.

7. according to any super resolution high density CD that has non-linear mask sandwich structure in the claim 1～5, it is characterized in that: in mask layer, the employing of first wall is transparent, high temperature resistant, the material silicon nitride of anti-high light, and middle dielectric layer adopts antimony, and second wall adopts silicon nitride.

8. according to any super resolution high density CD that has non-linear mask sandwich structure in the claim 1～5, it is characterized in that: in mask layer, first wall adopts zinc sulphide: monox, middle dielectric layer adopts silver oxide, second wall adopts zinc sulphide: monox, wherein, zinc sulphide: monox=1: (1～5).

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