CN2356042Y - Vacuum ion film coating machine for preparing metal and ceramic composite film - Google Patents
Vacuum ion film coating machine for preparing metal and ceramic composite film Download PDFInfo
- Publication number
- CN2356042Y CN2356042Y CN 98249501 CN98249501U CN2356042Y CN 2356042 Y CN2356042 Y CN 2356042Y CN 98249501 CN98249501 CN 98249501 CN 98249501 U CN98249501 U CN 98249501U CN 2356042 Y CN2356042 Y CN 2356042Y
- Authority
- CN
- China
- Prior art keywords
- magnetron sputtering
- sputtering target
- target
- radio frequency
- ceramic composite
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Abstract
The utility model relates to a vacuum ion film coating machine for preparing metal and ceramic composite film, which is used for the treatment of metal surfaces. The utility model is provided with a radio frequency (R. F) magnetron sputtering target on the basis of the conventional vacuum ion film coating machine, and is organically combined with a plurality of voltaic arc evaporation targets and a plurality of various direct current (D. C) magnetron sputtering targets in a vacuum chamber. The utility model can prepare various multi-layer composite films with both metallic phase and ceramic phase, and is especially capable of preparing transparent ceramic protective film. The vacuum ion film coating machine achieves the aims of high wear resistance and strong anticorrosion of metal surface modification.
Description
The utility model relates to the vacuum ion membrane plating equipment that is used for metal finishing.
At present, routine is applied to the vaccum ion coater of metallic surface ion film plating, generally is made up of several arc evaporation targets and direct current (D.C) magnetron sputtering target, can only form metal composite film, thereby its wear-resistant degree and erosion resistance are difficult to also increase significantly; Also have plenty of by a plurality of continous vacuums chamber and finish multiple multilayer complex films but the cost height, difficult quality control especially can't prepare the crystalline ceramics protective membrane.
The purpose of this utility model provides a kind of vaccum ion coater for preparing metal and ceramic composite membrane, makes it not only to realize multiple multiwalled metal composite film, but also can realize metal and stupalith (quartz crystal SiO for example
2, sapphire Al
2O
3) the ion disperse compound, new high abrasion decreases to form, the multiple multilayer complex films with metallographic phase and ceramic phase of strong corrosion resistant, especially can also prepare transparent ceramic protective membrane on its top layer.
The purpose of this utility model is achieved in that arc evaporation target, direct current (D.C) magnetron sputtering target and radio frequency (R.F) magnetron sputtering target organically is combined in the independent vacuum chamber; start respectively electric arc target, direct current that different metal material respectively is housed consult control sputtering target and the rf magnetron sputtering target that stupalith is housed carry out the ionic disperse compound, make it to form the composite membrane that existing metallographic phase has ceramic phase again, until form transparent ceramic protective membrane on the top layer.
Adopt technique scheme, the film system design according to different just can make multiple metal (or precious metal) and stupalith realize high-quality multiple composite membrane, and with low cost, and non-environmental-pollution can be saved a large amount of precious metal materials.
The utility model is described in further detail below in conjunction with drawings and Examples.
Accompanying drawing one is the unitized construction side-view of each arc target of first embodiment of the utility model vaccum ion coater.
Accompanying drawing two is unitized construction side-views of second each arc target of embodiment of the utility model vaccum ion coater.
Among the figure: 1. workpiece
2. electric arc target
3. coating chamber
4. planar shaped magnetically controlled DC sputtering target
5. work rest
6. frame
7. the planar shaped radio frequency control sputtering target of consulting
8. cylindrical direct current magnetron sputtering target
9. radio frequency adaptation
Accompanying drawing one is that the former is four or more circular flat magnetically controlled DC sputtering target of type distribution in the shape of a spiral with the difference of accompanying drawing two; The latter is a rectangle plane magnetically controlled DC sputtering target.Major advantage with the circular flat magnetron sputtering target is that target is chosen than being easier to, and be convenient to little sample testing, but the uniformity coefficient of plated film is good not as rectangle plane magnetically controlled DC sputtering target, in addition, Rectangular Planar Magnetron Sputtering Target in the accompanying drawing two also can make cylindrical (hollow) magnetically controlled DC sputtering target into, the utilization ratio height of good evenness but also target so not only, but in the single vacuum chamber if install two tubular magnetron sputtering targets, its vacuum chamber is generally non-circle shape.
In accompanying drawing one or accompanying drawing two, open the rf magnetron sputtering target (7) that pottery nonmetal targets such as (Ceramies) is housed, and open the electric arc target (2) that metal targets is housed and to realize that its ceramic phase and the disperse of metallographic phase ionic are compound; In like manner, open rf magnetron sputtering target (7) and magnetically controlled DC sputtering target (4) or (8) (or open simultaneously (4) and (8)) simultaneously and can realize that too the ion disperse of ceramic phase and metallographic phase is compound.Because this composite membrane has the characteristic of ceramic phase and metallographic phase simultaneously concurrently, so have good characteristics such as more heat-resisting, wear-resisting, anti-corrosion, this machine is equipped with one group of electric arc target, organizes a plurality of magnetically controlled DC sputtering targets and radio frequency target more in addition, thereby tolerance is bigger, choice more equipment condition for the design of the film of metal base surface Processing of Preparation multilayer complex films system provides.
Claims (4)
1. vaccum ion coater for preparing metal and ceramic composite membrane, in independent vacuum chamber, direct current (D.C) magnetron sputtering target of the electric arc target and the two or more forms of metal targets is equipped with in configuration, it is characterized in that: combined to carry out the ion disperse compound with radio frequency (R.F) magnetron sputtering target that nonmetal targets such as pottery are housed respectively, prepares the composite membrane that existing metallographic phase has ceramic phase again.
2. the vaccum ion coater of preparation metal according to claim 1 and ceramic composite membrane is characterized in that: the rf magnetron sputtering target be device on door for vacuum chamber, radio frequency adaptation is close on the radio frequency target.
3. the vaccum ion coater of preparation metal according to claim 1 and ceramic composite membrane is characterized in that: in same vacuum chamber, with combined the having of radio frequency (R.F) magnetron sputtering target a plurality of arc targets of circular flat (or rectangle plane) direct current (D.C) magnetron sputtering target, right cylinder direct current (D.C) magnetron sputtering target and the three kinds of forms such as electric arc target more than four of different metal target are housed.
4. the vaccum ion coater of preparation metal according to claim 1 and ceramic composite membrane is characterized in that: radio frequency (R.F) magnetron sputtering target can transform direct current (D.C) magnetron sputtering target again into by the displacement attaching plug.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 98249501 CN2356042Y (en) | 1998-11-19 | 1998-11-19 | Vacuum ion film coating machine for preparing metal and ceramic composite film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 98249501 CN2356042Y (en) | 1998-11-19 | 1998-11-19 | Vacuum ion film coating machine for preparing metal and ceramic composite film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2356042Y true CN2356042Y (en) | 1999-12-29 |
Family
ID=33994241
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 98249501 Expired - Fee Related CN2356042Y (en) | 1998-11-19 | 1998-11-19 | Vacuum ion film coating machine for preparing metal and ceramic composite film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2356042Y (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108973485A (en) * | 2018-07-27 | 2018-12-11 | 南昌印钞有限公司 | A kind of preparation method of noble metal on the substrate |
-
1998
- 1998-11-19 CN CN 98249501 patent/CN2356042Y/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108973485A (en) * | 2018-07-27 | 2018-12-11 | 南昌印钞有限公司 | A kind of preparation method of noble metal on the substrate |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C57 | Notification of unclear or unknown address | ||
| DD01 | Delivery of document by public notice |
Addressee: Hu Xianqi Document name: Notification of Termination of Patent Right |
|
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |