CN2273314Y - Quartz active gas generating device for vacuum system - Google Patents
Quartz active gas generating device for vacuum system Download PDFInfo
- Publication number
- CN2273314Y CN2273314Y CN 96229301 CN96229301U CN2273314Y CN 2273314 Y CN2273314 Y CN 2273314Y CN 96229301 CN96229301 CN 96229301 CN 96229301 U CN96229301 U CN 96229301U CN 2273314 Y CN2273314 Y CN 2273314Y
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- China
- Prior art keywords
- reaction chamber
- quartzy
- vacuum system
- tubulose reaction
- gas
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- Expired - Fee Related
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Abstract
The utility model provides a novel generating device of gaseous activated atoms and molecules, which is suitable for ultra-high vacuum and is made of quartz materials. After the utility model is depressurized, working gas can be input to a quartz reaction chamber through a vacuum relief valve. In the reaction chamber, a molecular composite body of the activated atoms generated by coupling of the gas and a radio-frequency electric field can be discharged to an ultra-high vacuum system through an effusion hole. The plasma reaction chamber of the novel generating device of gaseous activated atoms and molecules is made of high-purity quartz materials. The quartz structure can simultaneously play functions of sealing of the plasma reaction chamber and a vacuum chamber, and supporting of a gas path. The utility model not only can simplify plasma generator structures, but also can reduce preparation cost.
Description
The utility model relates to plasma technique and crystal technique, and particularly a kind of vacuum system is with quartzy reactive gas generating unit.
Aggregate (or plasma body) generating unit of the atom that is in excited state (activity) of working under ultra-high vacuum environment, molecule has been widely used in fields such as growing semiconductor crystal and semiconductor surface processing.All use nitrogen (N) active atomic, molecule beam source and dopant source in mixing as P type as the material principal element at the molecular beam epitaxial growth of the semi-conductor GaN of III-V family based material and the semi-conductor ZnSe of II-VI family based material.In semiconductor surface treatment process such as Si, GaAs, utilize active hydrogen atom to clean and can remove oxide on surface effectively, realize the low temperature clean of material surface.
The existing active atomic of working under ultra-high vacuum environment of Britain, molecule generating unit are to use stainless material as main support and vacuum seal structure, the plasma body generation cavity is made with boron nitride material, and the boron nitride Reaktionsofen partly is connected comparatively complicated with stainless steel casing, cause product price very expensive, make many applying units be difficult to bear.And because this device must determine during fabrication that with the interface specification of vacuum system the user is difficult to the vacuum system interface flexible change according to oneself afterwards.
The purpose of this utility model is to provide a kind of vacuum system simple in structure, easy to use, with low cost with quartzy gaseous state active atomic, molecule generating unit.
The purpose of this utility model is finished by following technical solution: this reactive gas generating unit comprises that part, interface, gas circuit and valve take place plasma body.Connect source of the gas by reducing valve one end, the other end is by gas circuit be linked in sequence angle valve and vacuum relief valve; Vacuum relief valve connects quartzy tubular reactor chamber by corrugated tube, and the end face sintering of the other end of quartzy tubulose reaction chamber has spill cascading water hole; Quartzy tubulose reaction chamber is connected with ultra-high vacuum system by interface.Form trim by stainless steel sleeve and the flange thread combined pressure viton ring that contracts.Be sealing joint by fluorine rubber ring by stainless steel sleeve with split shape crushing block and quartz reaction chamber side three and push the back sealing.Be provided with water jacket with the junction of stainless steel gas circuit and ultra-high vacuum system respectively at quartzy tubulose reaction chamber two ends, be filled with indium metal in the gap of water jacket and quartzy tubulose reaction chamber.Coupled outside at quartzy tubulose reaction chamber has the radio-frequency radiation coil.The radio-frequency radiation coil is made with hollow copper material, the winding wire water cooling.The radio-frequency radiation coil uses the fluoroplastics shore supports on frame, and is contactless between maintenance and the quartzy tubulose reaction chamber.
The utlity model has following beneficial effect:
1. the main part of active atomic of the present utility model, molecule generating unit is used comparatively cheap high purity quartz material, quartz construction plays the effect of plasm reaction cavity, vacuum-sealing, gas circuit and support simultaneously, simplify the structure and the preparation cost of plasma generator greatly, made it to become a kind of common equipment of cheapness.Device of the present utility model is on probation on the molecular beam epitaxy ultra-high vacuum system.The nitrogen plasma that utilizes this device to produce has successfully obtained the P type heavy doping of II-VI family semi-conductor material such as ZnSe, ZnTe.
2. the diameter dimension of quartzy tubulose reaction chamber of the present utility model can be decided according to the requirement and the application target of different vacuum systems.
3. quartzy tubulose reaction chamber of the present utility model has convenient disassembly with the interface of ultra-high vacuum system, be easy to the advantage that is connected with all kinds of different vacuum systems.
4. the utility model is used the indium calking between water jacket and silica tube reaction chamber, has strengthened effective conduction of heat.
5. the utility model can and leak the opening of valves size by control spill cascading water hole size and reach the requirement of regulating active particle line and background vacuum.
The utility model description of drawings is as follows:
Fig. 1 is a plasma producing apparatus structural representation of the present utility model.
Fig. 2 is the cascading water hole sectional view of quartzy tubulose reaction chamber end face of the present utility model, and Fig. 2 is the local amplification view of mark 12 among Fig. 1.
Fig. 3 is the sectional view of quartzy tubulose reaction chamber of the present utility model to the interface of ultra-high vacuum system.
Fig. 4 is the sectional view of gas source gas circuit of the present utility model to the interface of quartzy tubulose reaction chamber.
Below in conjunction with accompanying drawing the utility model is further elaborated:
Gas ions generating unit of the present utility model sees also Fig. 1.The gas that source of the gas 1 provides at first is decompressed to 0.1～0.2MPa through reducing valve 2, and then by angle valve 7, vacuum relief valve 8 body gas is leaked to quartzy tubulose reaction chamber 4 by gas circuit 3 and order micro-ly.Gas in quartzy tubulose reaction chamber is through the coupling excitation of radio-frequency radiation coil, and formation is in the gas atom of various excited states and the mixture of molecule under suitable gas pressure intensity.The cascading water hole 12 of reactant gases on quartzy tubulose reaction chamber front end face leaks into supervacuum chamber 13.
According to the discharging condition of gas, the geseous discharge pressure in the quartzy tubulose reaction cavity should be 1.3～1.3 * 10
-2The Pa magnitude.This gas pressure intensity is coordinated control by the free air delivery of off-gas pump in the gas leak rate of vacuum relief valve 8, the size in cascading water hole 12 on the quartzy tubulose reaction chamber front end face and the vacuum chamber and is reached.In use, the free air delivery of off-gas pump group is the amount of determining in the size in the cascading water hole 12 on the quartzy tubulose reaction chamber front end face and the vacuum chamber, can be adjusted to suitable geseous discharge pressure by vacuum relief valve 8.
The different gas flux and the sphere of action of adjustable size joint of the size in the cascading water hole 12 on the quartzy tubulose reaction chamber front end face can be determined according to different application targets.But because the decision of gas pressure intensity in the quartzy tubulose reaction chamber in this cascading water hole, so diameter is generally selected between 0.1～0.4mm.
In order to improve the efficient of releasing of reactant gases activeconstituents, the processing of the geometrical shape in the cascading water hole 12 on the quartzy tubulose reaction chamber front end face is key issues.The shape in cascading water hole should be concave structure, sees also Fig. 2, makes the decay probability of the excited state that reactant gases causes at cascading water hole place because with contacting of pore wall reduce to minimum.
The preparation method in spill cascading water hole: at first on quartz plate surface with bigger pit of agglomerating method processing, be that the tungsten pin (diameter should decide according to the size in required cascading water hole) of 0.05mm is injected in the pit and with its shake and broken with ultrasonic wave with the needle point diameter then.The tungsten pin that to stay in the quartz plate with the laser beam that focuses on is vaporized again, can obtain the about 0.1mm thin-walled of diameter cascading water hole like this.At last this quartz plate is sintered to the port in English tubular reactor chamber.
The connecting interface of quartzy tubulose reaction chamber and ultra-high vacuum system 13 forms trim by stainless steel sleeve 15 and the flange 16 thread combined pressures viton ring 14 that contracts.The sealing joint structure by fluorine rubber ring 14 by stainless steel sleeve 15 and flange 16 split the shape crushing block and quartz reaction chamber side three pushes the back sealing.Its structure sees also Fig. 3 and Fig. 4.The vacuum system of this kind mode of connection sealing can reach and be better than 1.3 * 10
-6The vacuum tightness of Pa can satisfy the requirement of general vacuum system.And have convenient disassembly and be easy to the advantage that is connected with all kinds of vacuum systems.
Quartzy tubulose reaction chamber and gas source gas circuit connection portion see also Fig. 1 and Fig. 4.Because quartz is a hard brittle material, adopting stainless steel ripple flexible pipe 9 with the junction of stainless steel hard tube pipeline.Can improve the shock resistance of system like this, also therefore have bigger degree of freedom, be easy to install and position correction.
Because the working temperature of quartzy tubulose reaction chamber cavity is very high, is provided with water jacket 10 and 11 in the junction of its two ends and stainless steel gas circuit and vacuum system.By this structure, take away the heat that part takes place plasma body, play protection vaccum seal ring and the effect that prevents vacuum leak.Water jacket 10 and 11 structures see also Fig. 3 and Fig. 4.Between the water jacket of quartzy tubulose reaction chamber two coupling ends and quartzy tubulose reaction chamber, use the indium calking, strengthen effective conduction of heat.
The hollow copper material of radio-frequency radiation pickup coil 5 usefulness is made.Winding wire can be used water quench.Coil is supported on the outside frame with fluoroplastics pillar 6, make it and quartzy tubulose reaction chamber between contactless, avoid the stressed breakage of quartzy tubulose reaction chamber.
Quartzy tubulose reaction chamber 4 and radio-frequency radiation pickup coil 5 place (not shown) in the metallic substance protection framework, prevent the destruction of extraneous factor to quartzy tubulose reaction chamber.Metallic substance bearer bar loam cake metallizing shielding net (not shown) avoids quantity of radiant energy to leak to the external world.
Claims (1)
1. a vacuum system comprises plasma body generation part, interface and gas circuit with quartzy reactive gas generating unit, it is characterized in that:
A. connect source of the gas 1 by reducing valve 2 one ends, the other end is by gas circuit 3 sequentially connect angle valves 7 and leak valve 8; Vacuum relief valve 8 connects quartzy tubulose reaction chamber 4 by corrugated tube 9, and the other end sintering of quartzy tubulose reaction chamber 4 has spill cascading water hole 12; Quartzy tubulose reaction chamber 4 connects with ultra-high vacuum system 13 mutually by interface;
The connecting interface sealed structure of b. quartzy tubulose reaction chamber 4 and ultra-high vacuum system 13 by fluorine rubber ring 14 by stainless steel sleeve 15 and flange 16 split shape crushing block and quartzy tubulose reaction chamber side three extruding after constitute;
C. be provided with water jacket 10 and 11 with the junction of stainless steel gas circuit and ultra-high vacuum system respectively at quartzy tubulose reaction chamber 4 two ends, be filled with indium metal in the gap between water jacket 10,11 and the quartzy tubulose reaction chamber 4;
D. the coupled outside at quartzy tubulose reaction chamber 4 has radio-frequency radiation coil 5, the hollow copper material of radio-frequency radiation coil 5 usefulness is made, the winding wire water cooling, radio-frequency radiation coil 5 usefulness fluoroplastics pillars 6 are supported on the frame, and are contactless between maintenance and the quartzy tubulose reaction chamber 4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 96229301 CN2273314Y (en) | 1996-02-13 | 1996-02-13 | Quartz active gas generating device for vacuum system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 96229301 CN2273314Y (en) | 1996-02-13 | 1996-02-13 | Quartz active gas generating device for vacuum system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2273314Y true CN2273314Y (en) | 1998-01-28 |
Family
ID=33906987
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 96229301 Expired - Fee Related CN2273314Y (en) | 1996-02-13 | 1996-02-13 | Quartz active gas generating device for vacuum system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2273314Y (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101915337A (en) * | 2010-07-27 | 2010-12-15 | 中国科学院等离子体物理研究所 | Device and method for online sealing vacuum leakage holes of pipeline cavity |
| CN102309364A (en) * | 2010-07-01 | 2012-01-11 | 上海导向医疗系统有限公司 | Gas flow control device for assisting radiofrequency ablation and method for implementing cooling by same |
| CN104534220A (en) * | 2014-12-16 | 2015-04-22 | 中国科学院等离子体物理研究所 | Method for remotely blocking high-vacuum leaking hole in all-position pipeline inner cavity online |
| CN104797072A (en) * | 2015-04-16 | 2015-07-22 | 大连交通大学 | Inductive coupling type radio frequency plasma source |
| CN106304596A (en) * | 2016-10-24 | 2017-01-04 | 大连理工大学 | A kind of elongated tubular radio frequency induction coupled plasma source reactor |
| CN107030416A (en) * | 2017-04-26 | 2017-08-11 | 六安六八航空航天精密器件有限公司 | It is a kind of to carry the sealing air supply system of vacuum and positive/negative-pressure |
-
1996
- 1996-02-13 CN CN 96229301 patent/CN2273314Y/en not_active Expired - Fee Related
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102309364A (en) * | 2010-07-01 | 2012-01-11 | 上海导向医疗系统有限公司 | Gas flow control device for assisting radiofrequency ablation and method for implementing cooling by same |
| CN101915337A (en) * | 2010-07-27 | 2010-12-15 | 中国科学院等离子体物理研究所 | Device and method for online sealing vacuum leakage holes of pipeline cavity |
| CN104534220A (en) * | 2014-12-16 | 2015-04-22 | 中国科学院等离子体物理研究所 | Method for remotely blocking high-vacuum leaking hole in all-position pipeline inner cavity online |
| CN104534220B (en) * | 2014-12-16 | 2016-07-06 | 中国科学院等离子体物理研究所 | A kind of online method remotely blocking all positon inner cavity of pipe high vacuum small opening |
| CN104797072A (en) * | 2015-04-16 | 2015-07-22 | 大连交通大学 | Inductive coupling type radio frequency plasma source |
| CN104797072B (en) * | 2015-04-16 | 2018-06-19 | 大连交通大学 | A kind of inductive coupling radio frequency plasma source |
| CN106304596A (en) * | 2016-10-24 | 2017-01-04 | 大连理工大学 | A kind of elongated tubular radio frequency induction coupled plasma source reactor |
| CN106304596B (en) * | 2016-10-24 | 2018-11-20 | 大连理工大学 | A kind of elongated tubular radio frequency induction coupled plasma source reactor |
| CN107030416A (en) * | 2017-04-26 | 2017-08-11 | 六安六八航空航天精密器件有限公司 | It is a kind of to carry the sealing air supply system of vacuum and positive/negative-pressure |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |