CN221084424U

CN221084424U - Membrane electrode for generating electric field, electrode patch, and tumor treatment system

Info

Publication number: CN221084424U
Application number: CN202322617487.5U
Authority: CN
Inventors: 胡雪丰; 杨泽宇; 郭仪; 薛迎港
Original assignee: Chengdu Rotex Technology Co ltd
Current assignee: Chengdu Rotex Technology Co ltd
Priority date: 2023-09-26
Filing date: 2023-09-26
Publication date: 2024-06-07
Anticipated expiration: 2033-09-26

Abstract

The present application provides a thin film electrode for generating an electric field, an electrode patch, and a tumor treatment system, the thin film electrode for generating an electric field comprising: a first electrode layer; a dielectric layer on the first electrode layer; the drainage piece is positioned at the periphery of the dielectric layer, the drainage piece is in contact with the dielectric layer, and the first electrode layer and the second electrode layer are insulated from the drainage piece; the drainage piece is used for leading out edge current of the dielectric layer. According to the application, the drainage piece is arranged on the periphery of the dielectric layer of the film electrode for generating an electric field, and the edge current of the dielectric layer is dispersed by the drainage piece, so that the phenomenon of skin damage of a patient caused by high edge current density of the film electrode for generating the electric field is prevented.

Description

Membrane electrode for generating electric field, electrode patch, and tumor treatment system

Technical Field

The application relates to the technical field of tumor treatment, in particular to a membrane electrode for generating an electric field, an electrode patch and a tumor treatment system.

Background

At present, various methods for treating tumors exist, such as surgical treatment, radiation treatment, chemical drug treatment, molecular targeting treatment and the like, but the common methods for treating tumors have corresponding disadvantages, such as that the radiation treatment or the chemical drug treatment kills normal cells, and for example, the surgical treatment can cure early tumors, but individual patients are easily damaged due to surgical contraindications.

The tumor is treated by using an alternating electric field, which is one of the current tumor treatment means at the front of research and development, and the tumor electric field treatment is performed by applying an alternating electric field to a human body treatment part, so that the aggregation of tumor tubulin is influenced, the formation of a spindle body is prevented, and the purposes of inhibiting the mitosis process of cancer cells and inducing the apoptosis of the cancer cells are achieved. Specifically, in the existing tumor electric field treatment, electrode patches are mainly attached to two opposite sides of a treatment part of a patient, for example, two sides of the waist of the patient, current is blocked from directly flowing to the patient through membrane electrodes in the electrode patches, and meanwhile, an alternating electric field is applied to the treatment part of the patient through electrode plates of the membrane electrodes at two opposite sides, so that the purpose of tumor treatment is achieved.

Then, the membrane electrode of the electrode patch currently used for tumor treatment has a phenomenon of uneven electric field distribution, which is embodied by gradually increasing current density from the center to the edge of the membrane electrode, which increases the risk of skin burn near the edge of the electrode patch attached to the patient.

Disclosure of Invention

The application provides a film electrode for generating an electric field, an electrode patch and a tumor treatment system, and aims to solve the technical problem that the current density at the edge of the film electrode for generating the electric field is high so as to cause skin burn of a patient.

In a first aspect, the present application provides a thin film electrode for generating an electric field, comprising:

a first electrode layer;

A dielectric layer on the first electrode layer;

The drainage piece is positioned at the periphery of the dielectric layer, the drainage piece is in contact with the dielectric layer, and the first electrode layer is insulated from the drainage piece;

the drainage piece is used for leading out edge current of the dielectric layer.

In some embodiments, the drainage member annularly surrounds the outer periphery of the dielectric layer, and the drainage member conforms to the outer periphery of the dielectric layer.

In some embodiments, further comprising a second electrode layer, the dielectric layer being located between the first electrode layer and the second electrode layer; the first electrode layer and the second electrode layer jointly define a cavity on the outer peripheral surface of the dielectric layer, and the drainage piece is positioned in the cavity.

In some embodiments, a first insulator is disposed between the drain and the first electrode layer.

In some embodiments, a second insulator is disposed between the drain and the second electrode layer.

In some embodiments, the first insulator and the second insulator have a breakdown voltage greater than a breakdown voltage of the dielectric layer.

In some embodiments, a first insulating layer is disposed between the first electrode layer and the dielectric layer.

In some embodiments, a second insulating layer is disposed between the second electrode layer and the dielectric layer;

the insulating strength of the first insulating layer and the second insulating layer is greater than the insulating strength of the dielectric layer.

In some embodiments, the drainage member is located on the first insulating layer; and/or, the second insulating layer covers the drainage member.

In some embodiments, the drainage member comprises a plurality of conductive wires, one end of which is connected to the outer peripheral surface of the dielectric layer.

In some embodiments, the second electrode layer includes a first conductive layer, a second conductive layer, and a first flexible conductive layer;

The first flexible conductive layer is located between the first conductive layer and the second conductive layer.

In a second aspect, the present application provides an electrode patch comprising a film electrode for electric field generation as described in the first aspect.

In a third aspect, the present application provides a tumour therapy system comprising an electrode patch according to the second aspect.

According to the application, the drainage piece is arranged on the periphery of the dielectric layer of the film electrode for generating an electric field, and the drainage piece is electrically connected with the dielectric layer, so that the drainage piece can lead out the edge current of the dielectric layer, and further the phenomenon of skin burn of a patient caused by larger current density at the edge of the film electrode for generating the electric field can be prevented; meanwhile, the first electrode layer is insulated from the drainage piece, so that the first electrode layer can not lead out current through the drainage piece, and the phenomenon that the first electrode layer current is directly led out by the drainage piece to cause the failure of the film electrode for generating an electric field can be avoided.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the description of the embodiments will be briefly described below, it being obvious that the drawings in the following description are only some embodiments of the present application, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.

FIG. 1 is a schematic view showing a structure of a thin film electrode for electric field generation provided in an embodiment of the present application;

FIG. 2 is a schematic illustration of an arrangement of dielectric layers and drainage members provided in an embodiment of the present application;

FIG. 3 is a schematic illustration of another arrangement of dielectric layers and drainage members provided in an embodiment of the present application;

FIG. 4 is a schematic illustration of another arrangement of dielectric layers and drainage members provided in an embodiment of the present application;

FIG. 5 is a schematic view showing another structure of the thin film electrode for electric field generation provided in the embodiment of the present application;

FIG. 6 is a schematic view showing another structure of the thin film electrode for electric field generation provided in the embodiment of the present application;

FIG. 7 is a schematic view showing another structure of the thin film electrode for electric field generation provided in the embodiment of the present application;

FIG. 8 is a schematic view showing another structure of the thin film electrode for electric field generation provided in the embodiment of the present application;

FIG. 9 is a schematic view showing another structure of the thin film electrode for electric field generation provided in the embodiment of the present application;

FIG. 10 is a schematic view showing another structure of the thin film electrode for electric field generation provided in the embodiment of the present application;

FIG. 11 is a schematic view showing another structure of the thin film electrode for electric field generation provided in the embodiment of the present application;

FIG. 12 is a schematic view showing another structure of the thin film electrode for electric field generation provided in the embodiment of the present application;

Fig. 13 is a schematic view showing another structure of the thin film electrode for electric field generation provided in the embodiment of the present application.

The flexible substrate comprises a first electrode layer 10, a second electrode layer 20, a first conductive layer 21, a second conductive layer 22, a first flexible conductive layer 23, a dielectric layer 30, a cavity 301, a drainage element 40, an insulating element 50, a first insulating element 51, a second insulating element 52, a first insulating layer 60, a second insulating layer 70, a conductive attaching layer 80 and a flexible substrate 90.

Detailed Description

The following description of the embodiments of the present application will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present application, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to fall within the scope of the application.

In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. indicate orientations or positional relationships based on the drawings are merely for convenience in describing the present invention and simplifying the description, and do not indicate or imply that the apparatus or elements referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more of the described features. In the description of the present invention, the meaning of "a plurality" is two or more, unless explicitly defined otherwise.

In the present application, the term "exemplary" is used to mean "serving as an example, instance, or illustration. Any embodiment described as "exemplary" in this disclosure is not necessarily to be construed as preferred or advantageous over other embodiments. The following description is presented to enable any person skilled in the art to make and use the application. In the following description, details are set forth for purposes of explanation. It will be apparent to one of ordinary skill in the art that the present application may be practiced without these specific details. In other instances, well-known structures and processes have not been described in detail so as not to obscure the description of the application with unnecessary detail. Thus, the present application is not intended to be limited to the embodiments shown, but is to be accorded the widest scope consistent with the principles and features disclosed herein.

The embodiment of the application provides a film electrode for generating an electric field, an electrode patch and a tumor treatment system, which are respectively described in detail below.

First, referring to fig. 1, fig. 1 shows a schematic structural diagram of a thin film electrode for generating an electric field according to an embodiment of the present application, wherein the thin film electrode for generating an electric field includes:

a first electrode layer 10;

a dielectric layer 30, the dielectric layer 30 being located on the first electrode layer 10;

A drainage member 40, the drainage member 40 being located at the outer periphery of the dielectric layer 30, the drainage member 40 being in contact with the dielectric layer 30, and the first electrode layer 10 being insulated from the drainage member 40;

Wherein the current drain 40 is used to draw an edge current of the dielectric layer 30.

Specifically, the first electrode layer 10 is made of a conductive material, which is connected to an ac power source to apply an ac voltage signal. In some embodiments of the present application, the first electrode layer 10 may be a thin and flexible metal layer, such as a metal copper foil, so that the first electrode layer 10 has better flexibility and is convenient to bend, and further the thin film electrode for generating an electric field may be integrally bent and attached to the skin surface of the human body.

It will be appreciated that the first electrode layer 10 may also be made of other metallic or non-metallic conductive materials, such as metallic silver foil or conductive graphite, etc.

The dielectric layer 30 is made of a dielectric material and can isolate the first electrode layer 10 from the human skin to avoid direct electrical connection of the human skin to a power source. In some embodiments of the present application, the dielectric layer 30 may be made of an organic material or an inorganic material, such as ceramic, glass, mica, polypropylene, polystyrene, polyethylene terephthalate, or the like.

Preferably, the material of the dielectric layer 30 may comprise one or more of poly (VDF-TrFE-CTFE), poly (VDF-TrFE-CFE), poly (VDF-TrFECFE-CTFE), poly (VDF-DB), and P (VDF-TS) containing CF ₃C₆H₄, which has a relatively high dielectric constant, and thus helps to enhance the electric field generated by the field generating thin film electrode at a certain thickness and area of the dielectric layer 30, so as to better apply the tumor treatment alternating electric field to the patient treatment site.

The drainage member 40 has good conductivity, and can conduct out charges at the edge of the dielectric layer 30, so that the phenomenon of skin burn of a patient caused by high current density at the edge of the film electrode for generating an electric field is avoided. In some embodiments of the present application, the drainage member 40 can transfer the charges at the edge of the dielectric layer 30 to a larger area of conductor (e.g. a metal plate), so that the charges are dispersed to have weaker electrical properties, thereby avoiding damage to the patient. In some embodiments of the present application, the drain 40 may transfer the charge at the edge of the dielectric layer 30 to a ground (e.g., the ground point of a tumor treatment system), thereby directly transferring the charge at the edge of the dielectric layer 30 to ground.

Illustratively, the material of the flow guide 40 may be a metallic conductive material, such as silver, copper, gold, aluminum, tungsten, etc., or the material of the flow guide 40 may also be a non-metallic conductive material, such as carbon fiber, conductive ceramic, conductive polymer, conductive hydrogel, boron, selenium, siC, etc.

In some embodiments of the present application, the current-guiding member 40 may directly contact the edge of the dielectric layer 30, for example, the current-guiding member 40 may directly contact the outer circumferential surface of the dielectric layer 30, so as to guide out the current at the edge of the dielectric layer 30, and since the outer circumferential surface of the dielectric layer 30 is not in contact with the first electrode layer 10, the phenomenon that the current-guiding member 40 is directly electrically connected to the first electrode layer 10 may be avoided. It will be appreciated that the current drain 40 may also be in contact with the upper/lower surface edges of the dielectric layer 30, so as to conduct current away from the edges of the dielectric layer 30, simply by providing an insulating material between the current drain 40 and the first electrode layer 10.

In the embodiment of the application, the drainage piece 40 is arranged on the periphery of the dielectric layer 30 of the film electrode for generating an electric field, and the drainage piece 40 is electrically connected with the dielectric layer 30, so that the drainage piece 40 can draw out the edge current of the dielectric layer 30, and the phenomenon of skin burn of a patient caused by larger current density at the edge of the film electrode for generating the electric field is prevented; meanwhile, since the first electrode layer 10 is insulated from the current guiding member 40, the first electrode layer 10 does not output current through the current guiding member 40, and the phenomenon that the current guiding member 40 directly draws out the current of the first electrode layer 10 to cause the failure of the film electrode for generating an electric field can be avoided.

In some embodiments of the present application, referring to fig. 2, fig. 2 shows a schematic layout of the dielectric layer 30 and the drainage member 40 according to an embodiment of the present application, wherein the drainage member 40 surrounds the periphery of the dielectric layer 30 in a ring shape, and the drainage member 40 is attached to the periphery of the dielectric layer 30. Specifically, since the current drainage member 40 is sufficiently in contact with the outer peripheral edge of the dielectric layer 30, the current at the annular edge of the dielectric layer 30 can be sufficiently conducted out, thereby avoiding the phenomenon of excessive current density at the edge of the dielectric layer 30. In some embodiments of the present application, referring to fig. 3, fig. 3 shows another arrangement of the dielectric layer 30 and the current-guiding elements 40 in the embodiment of the present application, where the number of the current-guiding elements 40 may also be plural, and the plural current-guiding elements 40 are uniformly distributed on the periphery of the dielectric layer 30 and are in contact with the dielectric layer 30, for example, the dielectric layer 30 is rectangular, and the four current-guiding elements 40 are respectively attached to the peripheral edges of the dielectric layer 30, so that the current at the peripheral edges of the dielectric layer 30 is led out through the plural current-guiding elements 40.

It should be understood that the shape of the dielectric layer 30 may be triangular, circular, regular polygonal, etc., and the shape of the current guiding member 40 may be changed correspondingly, for example, as shown in fig. 4, fig. 4 shows another arrangement of the dielectric layer 30 and the current guiding member 40 according to the embodiment of the present application, and the current at the edge of the dielectric layer 30 may be led out by encircling the circular shaped current guiding member 40 around the circular peripheral edge of the circular dielectric layer 30.

In some embodiments of the present application, as shown in fig. 5, fig. 5 shows another schematic structure of the thin film electrode for generating an electric field in the embodiment of the present application, where the thin film electrode for generating an electric field further includes a second electrode layer 20, and a dielectric layer 30 is located between the first electrode layer 10 and the second electrode layer 20, and since the drainage member 40 is attached to the periphery of the dielectric layer 30, and the width D of the dielectric layer 30 is greater than or equal to the width D1 of the first electrode layer 10 and the width D2 of the second electrode layer 20, the drainage member 40 is not in direct contact with the first electrode layer 10/the second electrode layer 20, so that the phenomenon that the first electrode layer 10 and the second electrode layer 20 are directly electrically connected through the drainage member 40 can be avoided, and finally, the purpose that the drainage member 40 is insulated from the first electrode layer 10 and the second electrode layer 20 simultaneously is achieved.

In other embodiments of the present application, with continued reference to fig. 6, fig. 6 shows another schematic structural diagram of a thin film capacitor according to an embodiment of the present application, where the thin film electrode for generating an electric field further includes a second electrode layer 20, and a dielectric layer 30 is located between the first electrode layer 10 and the second electrode layer 20; the first electrode layer 10 and the second electrode layer 20 together define a cavity 301 on the outer peripheral surface of the dielectric layer 30, and the drainage member 40 is located in the cavity 301 and is insulated from the first electrode layer 10 and the second electrode layer 20. That is, the drainage member 40 may be disposed between the first electrode layer 10 and the second electrode layer 20, so that the drainage member 40 is located inside the thin film electrode for electric field generation, and the drainage member 40 is indirectly or directly limited by the first electrode layer 10 and the second electrode layer 20, for example, by filling an insulating material between the first electrode layer 10 and the drainage member 40, so that the first electrode layer 10 supports the drainage member 40 through the insulating material, thereby being beneficial to improving the overall structural stability of the thin film electrode for electric field generation.

In some embodiments of the present application, the chamber 301 may be located at one side or both sides of the dielectric layer 30, for example, as shown in fig. 6, the width D of the dielectric layer 30 is set smaller than the widths D2 of the first and second electrode layers 10D1 and 20, so that both sides in the width direction of the dielectric layer 30 form the chamber 301. Preferably, the cavity 301 is annularly surrounded by the periphery of the dielectric layer 30, so that the current-guiding element 40 can be annularly arranged in the cavity 301 and fit around the periphery of the dielectric layer 30, so that the edge current is led out from the periphery of the dielectric layer 30 through the current-guiding element 40.

In some embodiments of the present application, for example, for an embodiment in which the drainage member 40 is located in the cavity 301, with continued reference to fig. 7, fig. 7 shows another schematic structural diagram of a thin film electrode for generating an electric field in an embodiment of the present application, where a first insulating member 51 is disposed between the drainage member 40 and the first electrode layer 10, and the first insulating member 51 may electrically insulate the drainage member 40 from the first electrode layer 10, so that on one hand, a phenomenon that an electric current of the first electrode layer 10 directly flows into the drainage member 40 to cause a failure of the thin film electrode may be avoided, and on the other hand, a phenomenon that the first electrode layer 10 and the second electrode layer 20 are directly electrically connected through the drainage member 40 may be avoided.

In some embodiments of the present application, with continued reference to fig. 8, fig. 8 shows another schematic structural diagram of a thin film electrode for generating an electric field in an embodiment of the present application, wherein a first insulating member 51 is disposed between the current guiding member 40 and the first electrode layer 10, and a second insulating member 52 is disposed between the current guiding member 40 and the second electrode layer 20. That is, the current-guiding member 40 is electrically insulated from the first electrode layer 10 and also electrically insulated from the second electrode layer 20, so that the current flowing in the first electrode layer 10 is prevented from directly flowing into the current-guiding member 40, and the edge current of the dielectric layer 30 is prevented from flowing into the second electrode layer 20 through the current-guiding member 40, so that the current-guiding member 40 only guides out the edge current of the dielectric layer 30, which is beneficial to improving the safety of the internal electrical structure of the thin film electrode for generating electric field.

In some embodiments of the present application, for example, for embodiments in which an insulator is disposed between the drain 40 and the first electrode layer 10/second electrode layer 20, the breakdown voltage of the first insulator 51 and the second insulator 52 is greater than the breakdown voltage of the dielectric layer 30.

As an example, the dielectric strength of the first and second insulating members 51 and 52 may be increased by selecting an insulating material having a higher dielectric strength so that the breakdown voltage of the thinner first and second insulating members 51 and 52 is greater than that of the dielectric layer 30.

It should be noted that, since the drainage member 40 needs to be prevented from contacting the first electrode layer 10 and the second electrode layer 20 by the first insulating member 51 and the second insulating member 52, when the drainage member 40 and the first insulating member 51 and the second insulating member 52 are disposed in the cavity 301 in an overlapping manner, the thickness of the dielectric layer 30 is generally greater than that of the first insulating member 51 and the second insulating member 52, so that the thinner first insulating member 51 and the thinner second insulating member 52 are more likely to be broken down to cause the short circuit between the first electrode layer 10 and the second electrode layer 20, while in the above embodiment, by increasing the breakdown voltages of the first insulating member 51 and the second insulating member 52, the breakdown of the first insulating member 51 and the second insulating member 52 is advantageously avoided, and finally the purpose of improving the working stability of the thin film electrode for generating an electric field is achieved.

The material of the insulating material (first insulating material 51, second insulating material 52) may be at least one selected from the group consisting of nonconductive oxides, nitrides, carbides, and insulating polymers. In some embodiments of the present application, the insulating layer material is selected from at least one of silicon dioxide, silicon nitride, zirconium oxide, boron nitride, aluminum nitride, chromium carbide, and aluminum oxide.

In some embodiments of the present application, the insulating high molecular polymer is selected from at least one of silicone polymer, silazane polymer, polymethyl methacrylate (PMMA), polyimide (PI), polyethylene (PE), polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyurethane (PU), fluorinated ethylene propylene copolymer (FEP), fusible Polytetrafluoroethylene (PFA), ethylene-tetrafluoroethylene copolymer (ETFE), polyetheretherketone (PEEK), polysilazane, polycarbonate, silicone, fluoride material, and rubber.

In other embodiments of the present application, the first insulating member 51/the second insulating member 52 may also refer to a certain insulating material layer inside the thin film electrode for generating an electric field, for example, referring to fig. 9, fig. 9 shows another schematic structure of the thin film electrode for generating an electric field in the embodiment of the present application, where the first insulating layer 60 is disposed between the first electrode layer 10 and the dielectric layer 30.

In the prior art, in order to ensure the therapeutic effect of tumor electric field treatment, it is generally necessary to generate a sufficiently large electric field by the electric field generating thin film electrode, and reducing the thickness of the dielectric layer 30 is one of the main ways to increase the electric field strength generated by the electric field generating thin film electrode, however, the thinner dielectric layer 30 is easily broken down and damaged, resulting in the risk of direct conduction between the electrode layer and the human body. In the above embodiment, the first insulating layer 60 is disposed between the first electrode layer 10 and the dielectric layer 30, so that the dielectric layer 30 is effectively prevented from being broken down by the thin film electrode for generating electric field by the first insulating layer 60.

In some embodiments of the present application, with continued reference to fig. 9, the current-guiding element 40 is located on the first insulating layer 60, so that the first insulating layer 60 may also perform an insulating function on the portion of the current-guiding element 40, so that the first electrode layer 10 is insulated from the current-guiding element 40, and further, a short circuit phenomenon between the first electrode layer 10 and the second electrode layer 20 through the current-guiding element 40 may be avoided.

It will be appreciated that the drainage member 40 may not be disposed on the first insulating layer, so that the coverage area of the first insulating layer may be equal to that of the dielectric layer, and the drainage member 40 is still disposed in the thin film electrode by the insulating member or other insulating mounting means, and it is ensured that conduction between the first electrode layer 10 and the second electrode layer 20 does not occur to cause short circuit.

It should be understood that the first insulating layer 60 and the second insulating layer 70 may be disposed at the same time, for example, referring to fig. 10, fig. 10 shows another schematic structural diagram of the thin film electrode for generating an electric field in the embodiment of the present application, wherein the first insulating layer 60 is disposed between the first electrode layer 10 and the dielectric layer 30, the second insulating layer 70 is disposed between the second electrode layer 20 and the dielectric layer 30, and the first insulating layer 60 and the second insulating layer 70 are used to improve the breakdown preventing performance of the dielectric layer 30 of the thin film electrode for generating an electric field and ensure the insulation between the first electrode layer 10 and the second electrode layer 20 and the drainage member 40.

In some embodiments of the present application, the first insulating layer 60 and the second insulating layer 70 are simultaneously provided, and the insulating strength of the first insulating layer 60 and the second insulating layer 70 is greater than that of the dielectric layer 30, so that the breakdown preventing performance of the thin film electrode for electric field generation is improved by the first insulating layer 60/the second insulating layer 70 having higher insulating strength.

Illustratively, the materials of the first insulating layer 60 and the second insulating layer 70 may be selected from at least one of nonconductive oxides, nitrides, carbides, and insulating high molecular polymers. In some embodiments of the present application, the insulating layer material is selected from at least one of silicon dioxide, silicon nitride, zirconium oxide, boron nitride, aluminum nitride, chromium carbide, and aluminum oxide.

In some embodiments of the present application, with continued reference to fig. 11, fig. 11 shows another schematic structure of the thin film electrode for generating an electric field in the embodiment of the present application, where the drainage member 40 includes a plurality of conductive wires, and one ends of the plurality of conductive wires are connected to the outer peripheral surface of the dielectric layer 30. Specifically, the plurality of conductive wires can be uniformly distributed on the outer peripheral surface of the dielectric layer 30, and the conductive wires are connected with the dielectric layer 30, so that the edge current of the dielectric layer 30 is directly led out through the conductive wires, and the phenomenon of skin burn of a patient caused by larger current density at the edge of the film electrode for generating an electric field is avoided.

It will be appreciated that other conductive structures may be used to conduct the edge current of the dielectric layer 30, for example, conductive bars may be disposed around the dielectric layer 30 in contact therewith, with the conductive bars being used to conduct the edge current of the dielectric layer 30.

In some embodiments of the present application, with continued reference to fig. 12, fig. 12 shows another schematic structural diagram of a thin film electrode for generating an electric field in an embodiment of the present application, where the second electrode layer 20 includes a first conductive layer 21, a second conductive layer 22, and a first flexible conductive layer 23; the first flexible conductive layer 23 is located between the first conductive layer 21 and the second conductive layer 22.

Since the thin film electrode for generating an electric field is often bent when attached to the skin surface of a human body, the electrode layer is likely to be cracked when the thin film electrode for generating an electric field is bent. In the above embodiment, by making the second electrode layer 20 include the first conductive layer 21 and the second conductive layer 22 overlapped, when the thin film electrode for electric field generation is bent and the first conductive layer 21 or the second conductive layer 22 is cracked, the phenomenon that such cracks are transferred between the first conductive layer 21 and the second conductive layer 22 can be avoided, so that the occurrence of the through crack phenomenon of the whole second electrode layer 20 can be avoided as much as possible; meanwhile, the first flexible conductive layer 23 is filled between the first conductive layer 21 and the second conductive layer 22, and the thickness of the first flexible conductive layer 23 can be changed along with the distance between the corresponding positions of the first conductive layer 21 and the second conductive layer 22, so that the electrical connectivity of the first conductive layer 21 and the second conductive layer 22 can be ensured, and the tip ionization phenomenon caused by the interlayer gap between the first conductive layer 21 and the second conductive layer 22 is avoided.

It will be appreciated that the second electrode layer 20 may also be provided with a first conductive layer 21, a second conductive layer 22 and a first flexible conductive layer 23 structure, so as to prevent the second electrode layer 20 from having a through crack phenomenon.

Specifically, the material of the first conductive layer 21 may be one or a combination of several of Al, ti, au, ag, zn, cu, pt, cr, fe, sn or Ni, for example, the first conductive layer 21 sequentially includes a magnetron sputtered Al material layer, a Zn material layer, and an Ag material layer, and for example, the first conductive layer 21 includes a magnetron sputtered Al material layer or an Au material layer. In some embodiments of the present application, the first conductive layer 21 may be formed by spin coating or spraying a non-metallic material such as graphite, conductive silicon, or the like. The second conductive layer 22 is a thin and flexible metal layer, for example, a metal copper foil with a thickness of 0.1mm to 1mm, so that the second conductive layer 22 has flexibility and is convenient to bend, and further the whole thin film electrode for generating an electric field is bent and is better attached to the skin surface of a human body. It will be appreciated that the second conductive layer 22 may also be made of other metallic materials, such as a metallic silver foil.

In some embodiments of the present application, the second conductive layer 22 is preferably a stainless steel metal layer or a titanium metal layer, and since sweat or water vapor of hydrogel exuded from the skin of the human body may infiltrate into the inside of the thin film electrode for electric field generation when the electrode patch is attached to the skin surface of the human body, the second conductive layer 22 is preferably a stainless steel metal layer or a titanium metal layer, on one hand, corrosion phenomenon of the second conductive layer 22 can be prevented, and on the other hand, the sweat or water vapor of hydrogel may be blocked from immersing into the dielectric layer 30 inside the thin film electrode for electric field generation, so that breakdown damage of the dielectric layer 30 due to moisture of the thin film electrode for electric field generation can be avoided.

The first flexible conductive layer 23 has conductivity and smaller elastic modulus, so that the first flexible conductive layer 23 electrically connects the second conductive layer 22 with the first conductive layer 21, electrical connectivity between the second conductive layer 22 and the first conductive layer 21 is ensured, and meanwhile, the smaller elastic modulus of the first flexible conductive layer 23 can avoid a phenomenon of tiny gaps between the second conductive layer 22 and the first conductive layer 21, thereby preventing a phenomenon of tip discharge between the second conductive layer 22 and the first conductive layer 21.

Preferably, the first flexible conductive layer 23 may include conductive paper, so that the first flexible conductive layer 23 further has higher tensile and tearing strength, and a crack phenomenon that the first flexible conductive layer 23 tears due to the fact that the thin film electrode is attached to the surface of the human body and bent in the electric field is avoided. In some embodiments of the present application, the first flexible conductive layer 23 may further include conductive rubber or conductive silicone.

It will be appreciated that the first flexible conductive layer 23 may also be formed by stacking at least two of conductive paper, conductive rubber, and conductive silicone, for example, the conductive paper and conductive rubber are stacked to form the first flexible conductive layer 23, the conductive paper ensures the tensile property of the first flexible conductive layer 23, and the conductive rubber ensures the elasticity of the first flexible conductive layer 23.

In some embodiments of the present application, with continued reference to fig. 13, fig. 13 shows another schematic structure of an electric field generating thin film electrode according to an embodiment of the present application, where the electric field generating thin film electrode further includes a flexible substrate 90, and the first electrode layer 10 is attached to the flexible substrate 90. Preferably, the flexible substrate 90 is a polyimide film, PET, PP, PMMA, or the like having insulation properties so as to make the film electrode for electric field generation flexible and bend. In some embodiments of the present application, the flexible substrate 90 and the first electrode layer 10 constitute a flexible circuit board.

In some embodiments of the present application, with continued reference to fig. 13, the electric field generating thin film electrode further includes a conductive adhesive layer 80 adhered to the second conductive layer 22, the conductive adhesive layer 80 having flexibility and adhesiveness so as to adhere to the skin surface of the human body through the conductive adhesive layer 80, and minimize contact damage caused by mismatch between the electric field generating thin film electrode and soft tissues. Illustratively, the conductive attachment layer 80 may be a conductive hydrogel or a conductive silicone gel.

Further, in order to better implement the thin film electrode for electric field generation in the embodiment of the present application, the present application further provides an electrode patch, which includes the thin film electrode for electric field generation in any of the above embodiments. The electrode patch in the embodiment of the present application has all the beneficial effects of the thin film electrode for generating an electric field due to the thin film electrode for generating an electric field in the embodiment, and is not described herein.

Further, in order to better implement the electrode patch according to the embodiment of the present application, the present application further provides a tumor treatment system based on the electrode patch, where the tumor treatment system includes the electrode patch according to any one of the embodiments described above. Because the tumor treatment system in the embodiment of the present application is provided with the electric field generating thin film electrode in the above embodiment, all the beneficial effects of the electric field generating thin film electrode are provided, and will not be described herein.

In the foregoing embodiments, the descriptions of the embodiments are focused on, and the portions of one embodiment that are not described in detail in the foregoing embodiments may be referred to in the foregoing detailed description of other embodiments, which are not described herein again.

While the basic concepts have been described above, it will be apparent to those skilled in the art that the foregoing detailed disclosure is by way of example only and is not intended to be limiting. Although not explicitly described herein, various modifications, improvements and adaptations of the application may occur to one skilled in the art. Such modifications, improvements, and modifications are intended to be suggested within the present disclosure, and therefore, such modifications, improvements, and adaptations are intended to be within the spirit and scope of the exemplary embodiments of the present disclosure.

Meanwhile, the present application uses specific words to describe embodiments of the present application. Reference to "one embodiment," "an embodiment," and/or "some embodiments" means that a particular feature, structure, or characteristic is associated with at least one embodiment of the application. Thus, it should be emphasized and should be appreciated that two or more references to "an embodiment" or "one embodiment" or "an alternative embodiment" in various positions in this specification are not necessarily referring to the same embodiment. Furthermore, certain features, structures, or characteristics of one or more embodiments of the application may be combined as suitable.

Similarly, it should be noted that in order to simplify the description of the present disclosure and thereby aid in understanding one or more inventive embodiments, various features are sometimes grouped together in a single embodiment, figure, or description thereof. This method of disclosure does not imply that the subject application requires more features than are set forth in the claims. Indeed, less than all of the features of a single embodiment disclosed above.

In some embodiments, numbers describing the components, number of attributes are used, it being understood that such numbers being used in the description of embodiments are modified in some examples by the modifier "about," approximately, "or" substantially. Unless otherwise indicated, "about," "approximately," or "substantially" indicate that the number allows for a 20% variation. Accordingly, in some embodiments, numerical parameters set forth in the specification and claims are approximations that may vary depending upon the desired properties sought to be obtained by the individual embodiments. In some embodiments, the numerical parameters should take into account the specified significant digits and employ a method for preserving the general number of digits. Although the numerical ranges and parameters set forth herein are approximations in some embodiments for use in determining the breadth of the range, in particular embodiments, the numerical values set forth herein are as precisely as possible.

Each patent, patent application publication, and other material, such as articles, books, specifications, publications, documents, etc., cited herein is hereby incorporated by reference in its entirety except for any application history file that is inconsistent or otherwise conflict with the present disclosure, which places the broadest scope of the claims in this application (whether presently or after it is attached to this application). It is noted that the description, definition, and/or use of the term in the appended claims controls the description, definition, and/or use of the term in this application if there is a discrepancy or conflict between the description, definition, and/or use of the term in the appended claims.

The above description of the thin film electrode, the electrode patch and the tumor treatment system for generating an electric field provided by the embodiment of the present application has been provided in detail, and specific examples are applied herein to illustrate the principles and embodiments of the present application, and the above description of the embodiments is only for helping to understand the method and core idea of the present application; meanwhile, as those skilled in the art will have variations in the specific embodiments and application scope in light of the ideas of the present application, the present description should not be construed as limiting the present application.

Claims

1. A thin film electrode for generating an electric field, comprising:

a first electrode layer;

a dielectric layer on the first electrode layer;

The drainage piece is positioned on the periphery of the dielectric layer, is in contact with the dielectric layer, and is insulated from the first electrode layer;

2. The thin film electrode for electric field generation according to claim 1, wherein the drainage member is annular around the outer periphery of the dielectric layer, and the drainage member is attached to the outer peripheral surface of the dielectric layer.

3. The thin film electrode for electric field generation according to claim 1, further comprising a second electrode layer, the dielectric layer being located between the first electrode layer and the second electrode layer;

The first electrode layer and the second electrode layer together define a chamber on the outer peripheral surface of the dielectric layer, and the drainage piece is positioned in the chamber.

4. The thin film electrode for electric field generation according to claim 3, wherein a first insulating member is provided between the drainage member and the first electrode layer.

5. The thin film electrode for electric field generation according to claim 4, wherein a second insulating member is provided between the drainage member and the second electrode layer.

6. The thin film electrode for electric field generation according to claim 5, wherein a breakdown voltage of the first insulating member and the second insulating member is larger than a breakdown voltage of the dielectric layer.

7. The thin film electrode for electric field generation according to claim 3, wherein a first insulating layer is provided between the first electrode layer and the dielectric layer.

8. The thin film electrode for electric field generation according to claim 7, wherein a second insulating layer is provided between the second electrode layer and the dielectric layer;

9. The thin film electrode for electric field generation according to claim 8, wherein the drainage member is located on the first insulating layer; and/or, the second insulating layer covers the drainage piece.

10. The thin film electrode for electric field generation according to claim 1, wherein the drainage member comprises a plurality of conductive wires, and one ends of the plurality of conductive wires are connected to an outer peripheral surface of the dielectric layer.

11. An electrode patch comprising the film electrode for electric field generation according to any one of claims 1 to 10.

12. A tumor treatment system comprising the electrode patch of claim 11.