CN220897089U - Pixel defining structure and display panel - Google Patents
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- CN220897089U CN220897089U CN202322373299.2U CN202322373299U CN220897089U CN 220897089 U CN220897089 U CN 220897089U CN 202322373299 U CN202322373299 U CN 202322373299U CN 220897089 U CN220897089 U CN 220897089U
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- 239000000758 substrate Substances 0.000 claims abstract description 49
- 230000002209 hydrophobic effect Effects 0.000 claims description 11
- 230000000694 effects Effects 0.000 abstract description 5
- 239000010408 film Substances 0.000 description 26
- 239000000976 ink Substances 0.000 description 18
- 238000000034 method Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 12
- 229920002120 photoresistant polymer Polymers 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 238000007493 shaping process Methods 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 208000010392 Bone Fractures Diseases 0.000 description 1
- 206010017076 Fracture Diseases 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Abstract
The application provides a pixel defining structure and a display panel. The pixel defining structure comprises a substrate, a first pixel defining layer and a second pixel defining layer, wherein the first pixel defining layer and the second pixel defining layer are sequentially stacked on the front surface of the substrate along the direction away from the substrate; the first pixel defining layer has a first opening, the second pixel defining layer has a second opening corresponding to and communicating with the first opening, the first pixel defining layer has an inclination angle alpha on the front surface of the substrate, the second pixel defining layer has an inclination angle beta on the front surface of the substrate, and 0 DEG < beta < alpha < 180 deg. According to the application, the first pixel defining layer and the second pixel defining layer are sequentially laminated on the front surface of the substrate along the direction far away from the substrate, and the inclination angle of the first pixel defining layer on the front surface of the substrate is larger than that of the second pixel defining layer on the front surface of the substrate, so that the height of the pixel defining layer is increased to improve ink accommodating capacity, and meanwhile, the higher aperture opening ratio is effectively maintained, and the display effect of the display panel is improved.
Description
Technical Field
The application belongs to the technical field of display, and particularly relates to a pixel defining structure and a display panel.
Background
Organic LIGHT EMITTING Diode (OLED) has the advantages of self-luminescence, fast response, wide viewing angle, high brightness, light weight, and the like, and becomes the mainstream of future display. The printing process is an important technical route for realizing mass production of the OLED display panel in the future due to the advantages of low cost, high productivity, easiness in realizing large size and the like.
The printing process has the greatest difficulty in realizing high-resolution display, when designing high-resolution display pixels, the pixel size is greatly reduced due to the improvement of resolution, and the smaller the pixel is, the smaller the ink (ink) accommodating capacity is, and the ink is easy to overflow due to the fact that the ink accommodating capacity is too small; if the ink accommodating capacity is improved by increasing the height of the pixel defining layer, the aperture ratio of the display panel is greatly reduced, the effective light emitting area is smaller, and the display effect of the display panel is affected.
Thus, existing pixel designs are still in need of improvement.
Disclosure of utility model
The embodiment of the application provides a pixel defining structure and a display panel, which are used for solving the problem that the conventional pixel defining structure cannot achieve both large ink accommodating capacity and large aperture opening ratio.
In a first aspect, an embodiment of the present application provides a pixel defining structure, including a substrate, a first pixel defining layer and a second pixel defining layer, where the first pixel defining layer and the second pixel defining layer are sequentially stacked on a front surface of the substrate along a direction away from the substrate; the first pixel defining layer has a first opening, the second pixel defining layer has a second opening corresponding to and communicating with the first opening, the first pixel defining layer has an inclination angle alpha on the front surface of the substrate, the second pixel defining layer has an inclination angle beta on the front surface of the substrate, and 0 DEG < beta < alpha < 180 deg.
Alternatively, alpha is more than or equal to 80 degrees and less than 180 degrees, beta is more than or equal to 30 degrees and less than 180 degrees.
Alternatively, alpha is more than or equal to 80 degrees and less than or equal to 120 degrees, and beta is more than or equal to 30 degrees and less than or equal to 60 degrees.
Optionally, the first pixel defining layer has a height of 0.5 μm to 5 μm, and the second pixel defining layer has a height of 0.1 μm to 1.5 μm.
Optionally, the first pixel defining layer has a height of 1 μm to 3 μm and the second pixel defining layer has a height of 0.5 μm to 1.2 μm.
Optionally, the first pixel defining layer is a hydrophilic pixel defining layer and the second pixel defining layer is a hydrophobic pixel defining layer.
Optionally, in a direction perpendicular to the front surface of the substrate, the cross section of the first pixel defining layer is square, rectangular or diamond, and the cross section of the second pixel defining layer is trapezoidal.
Optionally, the cross section of the second pixel defining layer is isosceles trapezoid; and/or, the front surface of the first pixel defining layer is coincident with the bottom surface of the second pixel defining layer.
Optionally, the first pixel defining layer has a plurality of first openings, the second pixel defining layer has a plurality of second openings corresponding to the first openings one to one, the first openings are the same or different in size, and the second openings are the same or different in size.
In a second aspect, an embodiment of the present application further provides a display panel, where the display panel includes the pixel defining structure described above.
According to the pixel definition structure and the display panel provided by the embodiment of the application, the first pixel definition layer and the second pixel definition layer are sequentially laminated on the front surface of the substrate along the direction far away from the substrate to form the double-layer pixel definition layer structure, and the inclination angle of the first pixel definition layer on the front surface of the substrate is larger than that of the second pixel definition layer on the front surface of the substrate, so that the height of the pixel definition layer is increased to meet the requirement of improving ink containing capacity in a high-resolution display printing process, and meanwhile, the higher aperture ratio is effectively maintained, the display effect of the display panel is improved, and the problem that the prior art cannot consider large ink containing capacity and aperture ratio is solved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings that are required to be used in the description of the embodiments will be briefly described below. It is evident that the figures in the following description are only some embodiments of the application, from which other figures can be obtained without inventive effort for a person skilled in the art. Wherein like reference numerals refer to like parts throughout the following description.
Fig. 1 is a schematic structural diagram of a pixel defining structure according to an embodiment of the application.
Fig. 2 is a schematic diagram illustrating a pixel defining structure according to an embodiment of the present application compared with a pixel defining structure of the prior art.
Fig. 3 is a flowchart of a first method for manufacturing a pixel defining structure according to an embodiment of the present application.
Fig. 4 is a flowchart of a second method for manufacturing a pixel defining structure according to an embodiment of the present application.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application. It will be apparent that the described embodiments are only some, but not all, embodiments of the application. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.
The embodiment of the application provides a pixel defining structure 100, as shown in fig. 1, the pixel defining structure 100 includes a substrate 110, a first pixel defining layer 120 and a second pixel defining layer 130, where the first pixel defining layer 120 and the second pixel defining layer 130 are sequentially stacked on the front surface of the substrate 110 along a direction away from the substrate 110; the first pixel defining layer 120 has a first opening 121, the second pixel defining layer 130 has a second opening 131 corresponding to and communicating with the first opening 121, the first pixel defining layer 120 has an inclination angle (i.e., a tape angle) α on the front surface of the substrate 110, the second pixel defining layer 130 has an inclination angle β on the front surface of the substrate 110, and 0 ° < β < α < 180 °.
According to the pixel defining structure 100 provided by the embodiment of the application, the first pixel defining layer 120 and the second pixel defining layer 130 are sequentially stacked on the front surface of the substrate 110 along the direction far away from the substrate 110 to form a double-layer pixel defining layer structure, and the inclination angle of the first pixel defining layer 120 on the front surface of the substrate 110 is larger than the inclination angle of the second pixel defining layer 130 on the front surface of the substrate 110, so that the high-resolution display printing process can be realized by increasing the height of the pixel defining layer, the ink accommodating capacity can be improved, the higher aperture ratio can be effectively maintained, the display effect of the display panel can be improved, and the problem that the prior art can not achieve both the large ink accommodating capacity and the aperture ratio can be solved.
As shown in fig. 2, fig. 2 is a schematic diagram illustrating a comparison between a pixel defining structure 100 and a pixel defining structure 200 according to an embodiment of the present application. As can be seen from fig. 2, compared with the prior art pixel defining structure 200 in which only a single pixel defining layer 220 is disposed on the substrate 210, the pixel defining structure of the present application adopts the above-mentioned double-layer pixel defining layer structure, so that the effective light emitting width of the pixel can be widened from a to b (b is greater than a) under the same surface width D and the same height of the pixel defining layer, thereby greatly improving the aperture ratio of the display panel, and being beneficial to improving the display effect of the display panel.
Optionally, the inclination angle α of the first pixel defining layer 120 on the front surface of the substrate 110 is in the range of: alpha is more than or equal to 80 degrees and less than or equal to 180 degrees, and preferably alpha is more than or equal to 80 degrees and less than or equal to 120 degrees. If the inclination angle α is too small, the aperture ratio of the display panel is greatly reduced as the height of the first pixel defining layer 120 increases; if the inclination angle α is too large, the functional thin film may be broken or void at the chamfer of the first pixel defining layer 120 during the subsequent printing film forming process, resulting in deterioration of the device.
Optionally, the inclination angle β of the second pixel defining layer 130 on the front surface of the substrate 110 is in the range: beta is more than or equal to 30 degrees and less than or equal to 180 degrees, preferably more than or equal to 30 degrees and less than or equal to 60 degrees. If the tilt angle β is too small, the resolution of the display panel may be reduced under the condition that the surface width D of the second pixel defining layer 130 is fixed; if the inclination angle beta is too large, the electrode height on the side face of the inclination angle beta can be thinned due to the fact that the inclination angle beta is too large when the top transparent electrode is evaporated later, and the electrode fracture risk is increased.
Alternatively, the height of the first pixel defining layer 120 is 0.5 μm to 5 μm, preferably 1 μm to 3 μm, and may be specifically set according to actual needs, for example, to 0.5 μm, 1 μm, 1.5 μm, 2 μm, 2.5 μm, 3 μm, 3.5 μm, 4 μm, 4.5 μm, or 5 μm, etc. If the height of the first pixel defining layer 120 is too small, the height of the entire pixel defining structure 100 cannot be effectively and greatly increased, so as to improve the ink accommodating capability of the printed pixels; if the height of the first pixel defining layer 120 is too large, the process difficulty and the uniformity control difficulty of the subsequent printing film are increased.
Alternatively, the height of the second pixel defining layer 130 is 0.1 μm to 1.5 μm, preferably 0.5 μm to 1.2 μm, and may be specifically set according to actual needs, for example, 0.1 μm, 0.3 μm, 0.5 μm, 0.7 μm, 0.9 μm, 1 μm, 1.2 μm, or 1.5 μm, etc. If the height of the second pixel defining layer 130 is too small, the height of the entire pixel defining structure 100 cannot be effectively and greatly increased, so as to improve the ink accommodating capability of the printing pixel; if the height of the second pixel defining layer 130 is too large, the difficulty of the process and the uniformity of the subsequent printed film are increased.
In some embodiments of the present application, the first pixel defining layer 120 is a hydrophilic pixel defining layer and the second pixel defining layer 130 is a hydrophobic pixel defining layer. By designing the first pixel defining layer 120 at the bottom layer as a hydrophilic pixel defining layer, the ink for printing is more advantageous to spread in the first opening 121, and the ink forms a more uniform film layer after drying; by designing the second pixel defining layer 130 located at the upper layer as a hydrophobic pixel defining layer, ink for printing in the second opening 131 can be prevented from flowing into the adjacent sub-pixels.
Alternatively, the hydrophilic pixel defining layer may be made of a hydrophilic photoresist material, including but not limited to inorganic silicon oxide or silicon nitride, or organic hydrophilic photoresist materials commonly used in the art; the hydrophobic pixel defining layer may be directly made of a hydrophobic photoresist material, for example, or may be made of a hydrophilic photoresist material, and may be hydrophobized by CF4 plasma treatment at a later stage, and the hydrophobic material may be an organic material such as fluorine-containing polyimide.
As shown in fig. 1, in the present embodiment, in a direction perpendicular to the front surface of the substrate 110 (i.e. the height direction of the substrate 110), the cross section of the first pixel defining layer 120 is square, rectangular or diamond, and the cross section of the second pixel defining layer 130 is trapezoid, for example, may be isosceles trapezoid, specifically, the right trapezoid. Further, the front surface of the first pixel defining layer 120 coincides with the bottom surface of the second pixel defining layer 130. Of course, in other embodiments, the cross-section of the first pixel defining layer 120 in the direction perpendicular to the front surface of the substrate 110 may have other shapes, and the cross-section of the second pixel defining layer 130 in the direction perpendicular to the front surface of the substrate 110 may have other shapes.
In some embodiments of the present application, the first pixel defining layer 120 has a plurality of first openings 121, the second pixel defining layer 130 has a plurality of second openings 131 corresponding to the plurality of first openings 121 one by one, the plurality of first openings 121 have the same size, and the plurality of second openings 131 have the same size. The size of the first opening 121 refers to the area occupied by the front projection of the first opening 121 on the front surface of the substrate 110, and the size of the second opening 131 refers to the area occupied by the front projection of the second opening on the front surface of the substrate 110. By designing the sizes of the first openings 121 to be the same and the second openings 131 to be the same, the surface areas of the inks in the different sub-pixels exposed to the air during printing are closer or substantially the same, so that the drying speeds of the inks in the different sub-pixels are substantially uniform, and the film obtained after the inks are dried is more uniform. Of course, in other embodiments, the sizes of the first openings 121 and the second openings 131 may also be different, and may be specifically set according to practical requirements, for example, the sizes of the first openings 121 corresponding to the red pixels, the green pixels, and the blue pixels are different, and the sizes of the second openings 131 are also different.
The embodiments of the present application also provide two methods for fabricating the pixel defining structure 100 described above.
As shown in fig. 3, a first method of fabricating the pixel defining structure 100 includes the steps of:
S11, providing a substrate 110, wherein the substrate 110 is provided with a patterned pixel electrode, and a hydrophilic first pixel definition layer film 122 is manufactured on the substrate 110, and the hydrophilic first pixel definition layer film 122 is prepared from a hydrophilic photoresist material commonly used in the field;
S12, performing patterned exposure on the first pixel defining layer film 122, wherein the positive photoresist material is shown in FIG. 3, and the pixel light-emitting area is subjected to exposure decomposition and removed in the subsequent development process; the first pixel defining layer film 122 in this embodiment may also be made of a negative photoresist material, and when exposed, the pixel light-emitting area is masked, and is dissolved and removed in the subsequent development process due to non-exposure crosslinking;
s13, developing the first pixel defining layer film 122 subjected to the patterned exposure to remove the film of the decomposed part of the pixel light-emitting area, exposing the light-emitting pixel electrode, and then performing high-temperature rake curing and shaping to form a first pixel defining layer 120;
S14, forming a hydrophobic second pixel defining layer film 132 on the first pixel defining layer 120, wherein the hydrophobic second pixel defining layer film 132 is made of a hydrophobic photoresist material;
S15, exposing the second pixel defining layer film 132 with hydrophobicity, wherein the second pixel defining layer film 132 is made of negative photoresist material with hydrophobicity, and the second pixel defining layer film 132 in the scheme can be made of positive photoresist material with hydrophobicity;
And S16, developing the exposed second pixel definition layer film 132 to remove the film at the pixel light-emitting area part to expose the light-emitting pixel electrode, and then performing high-temperature rake curing and shaping to form a second pixel definition layer 130.
As shown in fig. 4, a second method of fabricating the pixel defining structure 100 includes the steps of:
S21, providing a substrate 110, wherein the substrate 110 is provided with a patterned pixel electrode, and a first pixel defining layer film 122 and a second pixel defining layer film 132 are sequentially deposited on the substrate 110, wherein the first pixel defining layer 120 is made of a hydrophilic inorganic film (such as silicon nitride, silicon oxide, etc.), and the second pixel defining layer 130 is made of an organic photoresist material;
s22, performing patterned exposure on the photoresist-type second pixel defining layer film 132;
S23, developing the second pixel defining layer film 132 subjected to the patterned exposure to remove the film of the part of the pixel light-emitting area electrode corresponding to the projection area; then, performing high-temperature rake curing and shaping to form a second pixel defining layer 130;
S24, using fluorine-containing plasma (such as CF 4), etching the first pixel defining layer film 122 by using the second pixel defining layer 130 as a mask, removing the first pixel defining layer film 122 of the pixel light emitting region part, exposing the light emitting pixel electrode, forming the first pixel defining layer 120, and forming a hydrophobic pixel defining layer by the second pixel defining layer 130 due to fluorine-containing plasma treatment.
Embodiments of the present application also provide a display panel including the pixel defining structure 100, and the specific structure of the pixel defining structure 100 refers to the above embodiments. The display panel adopts all the technical schemes of all the embodiments, so that the display panel has at least all the beneficial effects brought by the technical schemes of the embodiments, and the description is omitted herein.
In the foregoing embodiments, the descriptions of the embodiments are emphasized, and for parts of one embodiment that are not described in detail, reference may be made to related descriptions of other embodiments.
In the description of the present application, the terms "first," "second," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defining "first," "second," etc. may explicitly or implicitly include one or more features. The term "and/or" includes any and all combinations of one or more of the associated listed items.
The above description has been made in detail on the pixel defining structure and the display panel provided by the embodiments of the present application, and specific examples are applied herein to illustrate the principles and embodiments of the present application, the above description of the embodiments is only for helping to understand the method and core ideas of the present application; meanwhile, as those skilled in the art will vary in the specific embodiments and application scope according to the ideas of the present application, the present description should not be construed as limiting the present application in summary.
Claims (10)
1. A pixel defining structure, characterized in that the pixel defining structure (100) comprises a substrate (110), a first pixel defining layer (120) and a second pixel defining layer (130), the first pixel defining layer (120) and the second pixel defining layer (130) being sequentially stacked on the front surface of the substrate (110) in a direction away from the substrate (110); the first pixel defining layer (120) has a first opening (121), the second pixel defining layer (130) has a second opening (131) corresponding to and communicating with the first opening (121), the first pixel defining layer (120) has an inclination angle alpha on the front surface of the substrate (110), and the second pixel defining layer (130) has an inclination angle beta on the front surface of the substrate (110), 0 DEG < beta < alpha < 180 deg.
2. The pixel defining structure according to claim 1, wherein 80 ° - α < 180 °,30 ° - β < 180 °.
3. The pixel defining structure according to claim 2, wherein 80 +.alpha.ltoreq.120°,30 +.beta.ltoreq.60°.
4. A pixel defining structure according to any one of claims 1-3, wherein the first pixel defining layer (120) has a height of 0.5 μm to 5 μm and the second pixel defining layer (130) has a height of 0.1 μm to 1.5 μm.
5. The pixel defining structure according to claim 4, wherein the first pixel defining layer (120) has a height of 1 μm to 3 μm and the second pixel defining layer (130) has a height of 0.5 μm to 1.2 μm.
6. A pixel defining structure according to any one of claims 1-3, wherein the first pixel defining layer (120) is a hydrophilic pixel defining layer and the second pixel defining layer (130) is a hydrophobic pixel defining layer.
7. A pixel defining structure according to any one of claims 1-3, wherein the cross-section of the first pixel defining layer (120) is square, rectangular or diamond-shaped and the cross-section of the second pixel defining layer (130) is trapezoidal in a direction perpendicular to the front side of the substrate (110).
8. The pixel-defining structure according to claim 7, wherein the cross-section of the second pixel-defining layer (130) is isosceles trapezoid;
And/or the front surface of the first pixel defining layer (120) coincides with the bottom surface of the second pixel defining layer (130).
9. A pixel defining structure according to any one of claims 1-3, wherein the first pixel defining layer (120) has a plurality of first openings (121), the second pixel defining layer (130) has a plurality of second openings (131) corresponding to the plurality of first openings (121) one to one, the plurality of first openings (121) are the same or different in size, and the plurality of second openings (131) are the same or different in size.
10. A display panel, characterized in that the display panel comprises a pixel defining structure (100) according to any of claims 1-9.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202322373299.2U CN220897089U (en) | 2023-08-31 | 2023-08-31 | Pixel defining structure and display panel |
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| CN202322373299.2U CN220897089U (en) | 2023-08-31 | 2023-08-31 | Pixel defining structure and display panel |
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| CN220897089U true CN220897089U (en) | 2024-05-03 |
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