CN220831912U - Atomizing core and electron cigarette - Google Patents
Atomizing core and electron cigarette Download PDFInfo
- Publication number
- CN220831912U CN220831912U CN202321971877.6U CN202321971877U CN220831912U CN 220831912 U CN220831912 U CN 220831912U CN 202321971877 U CN202321971877 U CN 202321971877U CN 220831912 U CN220831912 U CN 220831912U
- Authority
- CN
- China
- Prior art keywords
- coating
- layer
- conductive
- substrate
- conductive structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 235000019504 cigarettes Nutrition 0.000 title description 4
- 238000000576 coating method Methods 0.000 claims abstract description 172
- 239000011248 coating agent Substances 0.000 claims abstract description 171
- 239000011247 coating layer Substances 0.000 claims abstract description 71
- 239000000758 substrate Substances 0.000 claims abstract description 47
- 239000010410 layer Substances 0.000 claims abstract description 44
- 239000000463 material Substances 0.000 claims abstract description 22
- 238000000889 atomisation Methods 0.000 claims abstract description 8
- 239000003571 electronic cigarette Substances 0.000 claims abstract description 6
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 11
- 239000011521 glass Substances 0.000 claims description 5
- 239000000919 ceramic Substances 0.000 claims description 3
- 239000005388 borosilicate glass Substances 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 abstract description 10
- 230000002035 prolonged effect Effects 0.000 abstract description 2
- 239000010949 copper Substances 0.000 description 26
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 18
- 229910052804 chromium Inorganic materials 0.000 description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 14
- 229910052802 copper Inorganic materials 0.000 description 14
- 238000000151 deposition Methods 0.000 description 8
- 229910052759 nickel Inorganic materials 0.000 description 8
- 229910052721 tungsten Inorganic materials 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 229920000742 Cotton Polymers 0.000 description 6
- 238000001125 extrusion Methods 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 239000011241 protective layer Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000011261 inert gas Substances 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 241000208125 Nicotiana Species 0.000 description 4
- 235000002637 Nicotiana tabacum Nutrition 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000009210 therapy by ultrasound Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000005373 porous glass Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
Abstract
The utility model relates to the technical field of atomizers, in particular to an atomizing core and an electronic cigarette. The atomization core provided by the utility model comprises a base material and a conductive structure, wherein the base material is provided with a plurality of micropores, and the conductive structure is a conductive coating; the conductive coating comprises a first coating layer, a second coating layer and a third coating layer which are coated on the surface of the substrate, and the first coating layer, the second coating layer and the third coating layer are gradually arranged far away from the surface of the substrate; the first layer of coating is a Cr coating or a Ni coating, the second layer of coating is a Cu coating, and the third layer of coating is a Cr coating or a W coating. The conductive coating of the atomization core provided by the utility model is well combined with the base material, has certain toughness and can release internal stress, so that the thermal fatigue life of the atomization core is greatly prolonged, and meanwhile, the atomization core has higher heating efficiency.
Description
Technical Field
The utility model relates to the technical field of atomizers, in particular to an atomizing core and an electronic cigarette.
Background
The electronic cigarette turns an atomizing medium into steam through an atomizing means for a user to inhale. The atomizing core is the core component of electron cigarette, plays vital roles to performances such as atomizing taste, smog volume of electron cigarette.
The conductive structure in the atomizing core can generate heat through heating, so as to heat tobacco tar and realize the effect of atomizing the tobacco tar. At present, the types of atomizing cores on the market are mainly divided into two main types according to the materials used for the base material of the atomizing cores and the assembly modes of the atomizing cores and the conductive structures: one is to use atomized cotton as the base material of the atomized core, and the conductive structure is wrapped by atomized cotton or the atomized cotton wraps the conductive structure, such as chinese application CN105411007a; another type is to use porous plates (such as porous ceramics and porous glass) as the base material of the atomizing core, and the conductive structure is laid on one surface of the porous plates, which is used for oil production, such as chinese application CN103932401a. In the electronic cigarette using the atomized cotton as the base material of the atomized core, burnt smell of the atomized cotton and metal smell generated by heating of the metal conductive wires are easy to generate in the sucking process, so that the atomized core adopting the porous plate matched with the conductive structure (coating) becomes a mainstream technology.
In the prior art, the conductive structure is usually a single-layer flaky copper-based/nickel-based metal material and the like, and is coated on the porous plate by adopting a screen printing mode. The conductive structure has low heating efficiency and small smoke quantity; and the problem that the conductive structure and the base material are peeled off due to severe temperature change exists, so that the service life of the atomizing core is influenced.
Disclosure of utility model
In order to solve the technical problems, the utility model provides an atomization core which has high heating efficiency and long thermal fatigue life. The specific technical scheme is as follows:
An atomization core comprises a base material and a conductive structure, wherein the base material is provided with a plurality of micropores, and the conductive structure is a conductive coating; the conductive coating comprises a first coating layer, a second coating layer and a third coating layer which are coated on the surface of the substrate, and the first coating layer, the second coating layer and the third coating layer are gradually arranged far away from the surface of the substrate; the first layer of coating is a Cr coating or a Ni coating, the second layer of coating is a Cu coating, and the third layer of coating is a Cr coating or a W coating.
Specifically, the conductive coating is formed by depositing a conductive paste onto the surface of the substrate by magnetron sputtering.
Specifically, the thickness of the first layer of coating is 50nm-1 μm;
Specifically, the thickness of the second layer of coating is 200nm-2 mu m;
Specifically, the thickness of the third layer coating is 200nm-1 μm.
Specifically, the conductive structure is of an S shape; the conductive structures may also be provided in other shapes, as desired.
Specifically, the atomizing core further comprises an electrode, and the conductive structure and the electrode are integrally formed.
Specifically, the width of the conductive structure is smaller than the width of the electrode.
More specifically, the deposition of the conductive paste onto the substrate surface by magnetron sputtering is achieved using a magnetron sputtering apparatus; by controlling the thickness of each layer of coating in the conductive coating, the coatings are mutually matched, the finally obtained conductive coating has high interlayer bonding strength, and the service life of the multi-layer conductive coating is prolonged.
The utility model also provides a preparation method of the atomizing core, which comprises the following steps:
Step 1, placing a substrate and a mask plate in a vacuum chamber of magnetron sputtering equipment, then introducing inert gas, opening a Cr or Ni target power supply, setting discharge current, and depositing Cr or Ni conductive paste on the substrate to obtain a first layer of coating;
Step 2, turning off a Cr or Ni target power supply, turning on a Cu target power supply, setting discharge current, and depositing Cu conductive paste on the substrate to obtain a second layer of coating;
Step 3, turning off a Cu target power supply, turning on a Cr or W target power supply, setting a discharge current, and depositing Cr or W conductive paste on the second layer of coating to obtain a third layer of coating;
And step 4, finally, turning off the power supply of the Cr or W target, stopping introducing inert gas, cooling to room temperature, and taking out.
Specifically, in the step 1, the mask plate has a hollow structure, the conductive structure can have a certain shape through the mask plate, and when the hollow structure of the mask plate is of an S shape, the conductive structure of the S shape can be obtained.
Specifically, in the step 1, the step of placing the substrate and the mask plate in front of the vacuum chamber of the magnetron sputtering device further comprises the steps of cleaning the substrate and drying the substrate.
Specifically, in the step 1, after the substrate and the mask plate are placed in the vacuum chamber of the magnetron sputtering device and before the inert gas is introduced, the method further comprises: and (3) after adjusting the vacuum degree of the vacuum chamber to the magnitude of 10 -3 Pa, opening a chamber heating system to heat to a certain temperature, adjusting the vacuum degree of the vacuum chamber again, and cleaning the substrate by utilizing radio frequency plasma.
More specifically, the substrate and the mask plate are placed in front of a vacuum chamber of a magnetron sputtering device, and ultrasonic treatment is carried out on the substrate in ethanol and deionized water respectively.
More specifically, the vacuum degree of the vacuum chamber is adjusted to 2×10 -3 pa again.
More specifically, the discharge current in step 1, step 2 and step 3 is set to 0.6A.
The utility model also provides an electronic cigarette comprising the atomization core.
Compared with the prior art, the utility model has the following beneficial effects:
The conductive coating of the atomizing core adopts a composite coating with a three-layer structure, and the coating material and the sequence are designed: the Cr coating or the Ni coating is used as the first layer coating, so that the coating has better bonding effect on the second copper coating and better chemical affinity on the base material; the copper coating is used as the second layer of coating, so that the ductility of the whole coating can be improved and the internal stress of the whole coating can be released due to the good ductility of the copper coating; the third coating layer is a Cr coating layer or a W coating layer, has oxidation resistance and can be used as a protective layer of the whole coating layer, and can further protect the second coating layer from falling off and separating due to extension caused by high temperature, extrusion and the like.
The bonding strength between the conductive coating and the base material and between the conductive coating and each layer of coating in the atomizing core is higher, and the conductive coating has longer service life and higher heating efficiency, so that the thermal fatigue life of the atomizing core is greatly improved.
Drawings
FIG. 1 is a schematic view of an atomizing core according to an embodiment of the present disclosure;
fig. 2 is a structural top view of an atomizing core according to an embodiment of the present disclosure.
Description of the drawings: 1. a substrate, 2. A first coating layer, 3. A second coating layer, 4. A third coating layer, 5. An electrode and 6. A conductive structure.
Detailed Description
The technical solutions in the embodiments of the present utility model will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present utility model.
The inventor of the present application has skillfully designed a three-layer structure of the conductive coating to overcome the above technical problems and simultaneously has high heating efficiency when facing the problems of failure due to severe temperature change and substandard thermal fatigue life of the conductive coating in the atomizing core.
Specifically, the atomizing core of the present application comprises a substrate 1, the substrate 1 having a fixed shape, and the substrate 1 may be ceramic or glass, unlike an atomized cotton having no fixed shape; since the cost of glass is relatively low and post-treatment processing is relatively easy, glass is becoming a mainstream trend as the substrate 1.
The substrate 1 is provided with a plurality of micropores, the number of the micropores, the arrangement of the micropores or the diameters of the micropores can be set according to the requirements, and the purpose of the substrate is to guide tobacco tar to flow from one surface of the substrate 1 to the other surface where the opposite conductive structure 6 is located, so that the tobacco tar supply is ensured to be sufficient in time and oil leakage is avoided.
In the application, the conductive structure 6 is a conductive coating, the conductive coating comprises a first coating 2, a second coating 3 and a third coating 4 coated on the surface of the substrate 1, and the first coating 2, the second coating 3 and the third coating 4 are gradually arranged away from the surface of the substrate 1.
The first coating layer 2 is a Cr coating layer or a Ni coating layer, and the thickness thereof may be set to 50nm to 1 μm, for example, specifically 50nm, 200nm, 400nm, 600nm, 800nm, 1 μm. The Cr or Ni coating is used as the first coating 2, which has better adhesion to the subsequent second coating 3, better chemical affinity to the substrate 1 and enhances the binding force of the whole conductive coating to the substrate 1.
The second coating 3 is a Cu coating and may be provided in a thickness of 200nm-2 μm, for example, specifically 200nm, 600nm, 1000nm, 1400nm, 1800nm, 2 μm. The copper coating has good ductility, can improve the toughness of the whole coating and release the internal stress of the whole coating, and plays a key role in improving the thermal fatigue life of the whole coating. In addition, the copper coating has good conductivity and thicker thickness than other two layers, so that the whole coating has excellent heating efficiency.
The third layer coating 4 is a Cr or W coating, and its thickness may be set to 200nm-1 μm, for example, specifically 200nm, 400nm, 600nm, 800nm, 1 μm. The third coating layer 4 is a Cr or W coating layer, which has oxidation resistance on the one hand, and can be used as a protective layer of the whole coating layer, and on the other hand, can further protect the second coating layer 3 from layer falling and separation caused by extension due to high temperature, extrusion and the like.
The conductive structure 6 may be provided in an S-shape, which may be provided in other shapes as desired.
The atomizing core of the application also comprises an electrode 5, and the electrode 5 is communicated with the conductive structure 6 and a power supply; it will be appreciated that the electrodes 5 are located at both ends of the conductive structure 6, respectively, and that the electrodes 5 may be integrally formed with the conductive structure 6, i.e. the electrodes 5 may be formed with the same composition and structure as the conductive structure 6. In order to obtain a better conducting effect, the width of the electrode 5 is preferably larger than the width of the conducting structure 6.
The application further provides an exemplary illustration of the method of preparing an atomizing core as described above, comprising the steps of:
Step 1, placing a prepared base material and a mask plate in a vacuum chamber of a magnetron sputtering device, preparing vacuum, then introducing inert gas, opening a Cr or Ni target power supply, setting discharge current, and depositing Cr or Ni conductive paste on the base material to obtain a first layer of coating;
It should be noted that, in the step 1, the mask plate is preset to a corresponding hollow structure according to the shape of the conductive structure. More preferably, the ultrasonic treatment of ethanol and deionized water can be performed on the surface of the substrate before the substrate is placed in the vacuum chamber of the magnetron sputtering device. In the specific magnetron sputtering process, the vacuum degree of the vacuum chamber is preferably adjusted to be 10 -3 Pa, then the chamber heating system is opened to heat to 300 ℃, the vacuum degree of the vacuum chamber is adjusted to be 2 multiplied by 10 -3 Pa again, and the surface of the substrate is cleaned by utilizing radio frequency plasma.
Step 2, turning off a Cr or Ni target power supply, turning on a Cu target power supply, setting discharge current, and depositing Cu conductive paste on the first layer of coating to obtain a second layer of coating;
Step 3, turning off a Cu target power supply, turning on a Cr or W target power supply, setting a discharge current, and depositing Cr or W conductive paste on the second layer of coating to obtain a third layer of coating;
And step 4, finally, turning off the power supply of the Cr or W target, stopping introducing inert gas, cooling to room temperature, and taking out.
The discharge current in the above steps 1, 2 and 3 was set to 0.6A.
The application will be further illustrated with reference to specific examples.
Example 1
An atomizing core, as shown in fig. 1-2, comprises a high borosilicate glass substrate 1 and a conductive structure 6, wherein the conductive structure 6 is a conductive coating; the conductive coating comprises a first coating 2, a second coating 3 and a third coating 4 which are coated on the surface of the substrate 1, and the first coating 2, the second coating 3 and the third coating 4 are gradually arranged away from the surface of the substrate 1; the first coating layer 2 is a Cr coating layer, the second coating layer 3 is a Cu coating layer, and the third coating layer 4 is a W coating layer. The thickness of the first coating layer 2 was 500nm, the thickness of the second coating layer 3 was 1 μm, and the thickness of the third coating layer 4 was 600nm. The conductive structure 6 is S-shaped, the conductive structure 6 and the electrode 5 are integrally formed, and the width of the conductive structure 6 is smaller than the width of the electrode 5.
The Cr coating is used as the first layer coating, so that the Cr coating has good adhesion effect on the copper coating and good chemical affinity on the base material; in addition, the copper coating is used as a second layer of coating, so that the ductility of the whole coating can be improved and the internal stress of the whole coating can be released due to the good ductility; the third coating is a W coating, has oxidation resistance on one hand, can be used as a protective layer of the whole coating, and on the other hand, can further protect the second coating from falling off and separating due to extension caused by high temperature, extrusion and the like.
Example 2
An atomizing core, as shown in fig. 1-2, comprises a substrate 1 and a conductive structure 6, wherein the conductive structure 6 is a conductive coating; the conductive coating comprises a first coating 2, a second coating 3 and a third coating 4 which are coated on the surface of the substrate 1, and the first coating 2, the second coating 3 and the third coating 4 are gradually arranged away from the surface of the substrate 1; the first coating layer 2 is a Ni coating layer, the second coating layer 3 is a Cu coating layer, and the third coating layer 4 is a W coating layer. The thickness of the first coating layer 2 was 500nm, the thickness of the second coating layer 3 was 1 μm, and the thickness of the third coating layer 4 was 600nm. The conductive structure 6 is S-shaped, the conductive structure 6 and the electrode 5 are integrally formed, and the width of the conductive structure 6 is smaller than the width of the electrode 5.
In the embodiment, the Ni coating is used as the first layer coating, so that the Ni coating has better adhesion effect on the copper coating and better chemical affinity on the base material; in addition, the copper coating is used as a second layer of coating, so that the ductility of the whole coating can be improved and the internal stress of the whole coating can be released due to the good ductility; the third coating is a W coating, has oxidation resistance on one hand, can be used as a protective layer of the whole coating, and on the other hand, can further protect the second coating from falling off and separating due to extension caused by high temperature, extrusion and the like.
Example 3
An atomizing core, as shown in fig. 1-2, comprises a substrate 1 and a conductive structure 6, wherein the conductive structure 6 is a conductive coating; the conductive coating comprises a first coating 2, a second coating 3 and a third coating 4 which are coated on the surface of the substrate 1, and the first coating 2, the second coating 3 and the third coating 4 are gradually arranged away from the surface of the substrate 1; the first coating layer 2 is a Ni coating layer, the second coating layer 3 is a Cu coating layer, and the third coating layer 4 is a Cr coating layer. The thickness of the first coating layer 2 was 500nm, the thickness of the second coating layer 3 was 1 μm, and the thickness of the third coating layer 4 was 600nm. The conductive structure 6 is S-shaped, the conductive structure 6 and the electrode 5 are integrally formed, and the width of the conductive structure 6 is smaller than the width of the electrode 5.
In the embodiment, the Ni coating is used as the first layer coating, so that the Ni coating has better adhesion effect on the copper coating and better chemical affinity on the base material; in addition, the copper coating is used as a second layer of coating, so that the ductility of the whole coating can be improved and the internal stress of the whole coating can be released due to the good ductility; the third layer of coating is Cr coating, which has oxidation resistance and can be used as a protective layer of the whole coating, and can further protect the second layer of coating from falling off and separating due to expansion caused by high temperature, extrusion and the like.
Example 4
An atomizing core, as shown in fig. 1-2, comprises a substrate 1 and a conductive structure 6, wherein the conductive structure 6 is a conductive coating; the conductive coating comprises a first coating 2, a second coating 3 and a third coating 4 which are coated on the surface of the substrate 1, and the first coating 2, the second coating 3 and the third coating 4 are gradually arranged away from the surface of the substrate 1; the first coating layer 2 is a Cr coating layer, the second coating layer 3 is a Cu coating layer, and the third coating layer 4 is a Cr coating layer. The thickness of the first coating layer 2 was 500nm, the thickness of the second coating layer 3 was 1 μm, and the thickness of the third coating layer 4 was 600nm. The conductive structure 6 is S-shaped, the conductive structure 6 and the electrode 5 are integrally formed, and the width of the conductive structure 6 is smaller than the width of the electrode 5.
The Cr coating is used as the first layer coating, so that the Cr coating has good adhesion effect on the copper coating and good chemical affinity on the base material; in addition, the copper coating is used as a second layer of coating, so that the ductility of the whole coating can be improved and the internal stress of the whole coating can be released due to the good ductility; the third layer of coating is Cr coating, which has oxidation resistance and can be used as a protective layer of the whole coating, and can further protect the second layer of coating from falling off and separating due to expansion caused by high temperature, extrusion and the like.
It should be apparent that the embodiments described above are only some, but not all, embodiments of the present utility model. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
Claims (10)
1. An atomization core comprises a base material and a conductive structure, wherein the base material is provided with a plurality of micropores; the conductive coating comprises a first coating layer, a second coating layer and a third coating layer which are coated on the surface of the substrate, and the first coating layer, the second coating layer and the third coating layer are gradually arranged far away from the surface of the substrate; the first layer of coating is a Cr coating or a Ni coating, the second layer of coating is a Cu coating, and the third layer of coating is a Cr coating or a W coating.
2. The atomizing core of claim 1, wherein the conductive coating is a conductive paste deposited onto the substrate surface by magnetron sputtering.
3. The atomizing core of claim 1, wherein the first coating layer has a thickness of 50nm to 1.0 μm.
4. The atomizing core of claim 1, wherein the second coating layer has a thickness of 200nm to 2 μm.
5. The atomizing core of claim 1, wherein the third layer coating has a thickness of 200nm to 1 μm.
6. The atomizing core of any of claims 1-5, wherein the substrate is glass or ceramic, and the glass comprises borosilicate glass.
7. The atomizing core of claim 1, wherein the conductive structure is S-shaped.
8. The atomizing core of claim 1, further comprising an electrode, wherein the conductive structure and the electrode are integrally formed.
9. The atomizing core of claim 8, wherein a width of the conductive structure is less than a width of the electrode.
10. An electronic cigarette comprising an atomizing wick according to any one of claims 1-9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321971877.6U CN220831912U (en) | 2023-07-26 | 2023-07-26 | Atomizing core and electron cigarette |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321971877.6U CN220831912U (en) | 2023-07-26 | 2023-07-26 | Atomizing core and electron cigarette |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220831912U true CN220831912U (en) | 2024-04-26 |
Family
ID=90744142
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202321971877.6U Active CN220831912U (en) | 2023-07-26 | 2023-07-26 | Atomizing core and electron cigarette |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220831912U (en) |
-
2023
- 2023-07-26 CN CN202321971877.6U patent/CN220831912U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US11969013B2 (en) | Electronic cigarette, atomizing assembly, and atomizing component for same | |
| CN111053298B (en) | Flexible heating element and manufacturing method thereof, flexible heating assembly and aerosol generator | |
| WO2021047357A1 (en) | Electronic baking cigarette utensil and heat generating device thereof | |
| WO2020238607A1 (en) | Atomization member and electronic cigarette | |
| CN105755434B (en) | The manufacturing method and equipment of conductive layer in a kind of novel electronic cigarette atomizer device based on ion beam technology | |
| CN115153112B (en) | High-efficiency electronic cigarette double-sided heating sheet and preparation method thereof | |
| WO2021000806A1 (en) | Heating body and manufacturing method therefor, and electronic cigarette utensil | |
| CN220831912U (en) | Atomizing core and electron cigarette | |
| CN1794376B (en) | Inductance framework having sputtering film electrode and its production method | |
| GB2359234A (en) | Resistive heating elements composed of binary metal oxides, the metals having different valencies | |
| JPH1131577A (en) | Thin-film type exothermic heater and its manufacture | |
| CN105161159B (en) | A kind of conductive paste and its manufactured ceramic substrate | |
| JPH0920580A (en) | Method of metallization of ferrite using surface reduction | |
| CN112641134A (en) | Heating tube, method for manufacturing the same, and aerosol generating apparatus | |
| CN105845299A (en) | Preparation method of zinc oxide pressure-sensitive resistor | |
| CN210248394U (en) | Heating wire, atomizing device and electron cigarette | |
| CN117223919A (en) | Atomizing core, preparation method of atomizing core and electronic cigarette | |
| CN206256157U (en) | A kind of plasma spraying stainless steel tube electrothermal device | |
| CN114788586A (en) | Ceramic, atomizing core and atomizer | |
| CN108538573A (en) | Metallized film blank isolation strip applies oil baffle | |
| CN220211949U (en) | Atomizing core, atomizer and aerosol generating device | |
| JP2004131302A (en) | Conductive ceramic and its manufacturing process | |
| JP2021160947A (en) | Method for manufacturing electrode, and method for manufacturing laminated electronic component | |
| CN218960074U (en) | Glass heating sheet | |
| CN220293063U (en) | Aluminum-based thick film electronic cigarette heating cup capable of heating at high speed |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |