CN220603346U - Micro-focusing and imaging structure of ultraviolet light source - Google Patents
Micro-focusing and imaging structure of ultraviolet light source Download PDFInfo
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- CN220603346U CN220603346U CN202322245356.9U CN202322245356U CN220603346U CN 220603346 U CN220603346 U CN 220603346U CN 202322245356 U CN202322245356 U CN 202322245356U CN 220603346 U CN220603346 U CN 220603346U
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- 238000003384 imaging method Methods 0.000 title claims abstract description 43
- 230000007246 mechanism Effects 0.000 claims description 6
- 239000001307 helium Substances 0.000 claims description 4
- 229910052734 helium Inorganic materials 0.000 claims description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 abstract description 16
- 238000005259 measurement Methods 0.000 description 8
- 238000013461 design Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
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- 230000008569 process Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
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- 239000013078 crystal Substances 0.000 description 1
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- 230000005284 excitation Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 238000005457 optimization Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
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Abstract
The utility model discloses a micro-focusing and imaging structure of an ultraviolet light source, which comprises a plasma ultraviolet light source, an ellipsoidal focusing mirror and a visible light reflecting mirror which are arranged in a vacuum environment, wherein the ultraviolet light source is arranged at one ellipsoidal focus of the ellipsoidal focusing mirror, and a sample measuring point is arranged at the other ellipsoidal focus; the visible light reflector is movably arranged between the ultraviolet light source and the ellipsoidal focusing mirror; the imaging system is arranged opposite to the visible light reflecting mirror and receives the light reflected by the visible light reflecting mirror. In addition, the structure can be combined with the photoelectron spectrometer for use, so that a sample area in the optical axis direction of the ellipsoidal focusing mirror can be directly observed, and the sample can be rapidly positioned by matching with the photoelectron spectrometer.
Description
Technical Field
The utility model relates to the technical field of optical focusing and microscopy, in particular to a micro-focusing and imaging structure of an ultraviolet light source.
Background
The vacuum ultraviolet light source is an important excitation light source of an angle-resolved photoelectron spectrometer (ARPES)/ultraviolet electron spectrometer (UPS). The vacuum ultraviolet light source generally adopts inert gases such as helium and the like to form plasma, and in the plasma state, the vacuum ultraviolet band light source can be continuously emitted. These light sources direct the plasma out of the emitted uv light source to the measurement point by means of a collimator (or capillary tube, or focusing tube) or the like, which has different structures and can intercept, focus or the like the light diverging in each direction, see fig. 1.
Based on the above design of the vacuum ultraviolet light source, three applications are currently common: 1. the plasma ultraviolet light source is provided with an ellipsoidal focusing mirror, and the ellipsoidal focusing mirror is used for focusing to focus light spots to sample points. 2. A tyre mirror type focusing monochromator is added between the vacuum ultraviolet light source and the collimator tube, the focusing monochromator plays a role in screening the light source with multiple wavelengths, and then the restriction of light spots is carried out through the collimator tube or capillary tube. 3. An ellipsoidal focusing mirror is arranged between the monochromator and the focus to focus the ultraviolet light source.
However, the problem that the sample point cannot be directly observed when the ultraviolet light irradiates is common in the application of the vacuum ultraviolet light source, because the wavelength of the plasma ultraviolet light source is vacuum ultraviolet band and is invisible to naked eyes. It is usually necessary to use special fluorescent powder or YAG crystal, etc., and ultraviolet light is excited to emit visible light so as to directly observe the visible light. However, the fluorescent sample and the sample to be measured are not the same sample, and need to be switched repeatedly, which results in time waste. Moreover, for micro-focusing ultraviolet light sources, errors in the position or height of the sample caused by the sample transfer process will directly lead to misalignment of the measurement points. Affecting the measurement results.
Disclosure of Invention
In order to solve the defects in the prior art, the application provides a micro-focusing and imaging structure of an ultraviolet light source, which can directly observe a sample area in the optical axis direction of a focusing lens without sample switching.
The technical scheme adopted by the utility model is as follows:
a micro-focusing and imaging structure of ultraviolet light source comprises a plasma ultraviolet light source, an ellipsoidal focusing mirror and a visible light reflecting mirror which are arranged in a vacuum environment,
the ultraviolet light source is arranged at one ellipsoidal focus of the ellipsoidal focusing mirror, and a sample measuring point is arranged at the other ellipsoidal focus;
the visible light reflecting mirror is movably arranged between the ultraviolet light source and the ellipsoidal focusing mirror;
the imaging system is arranged opposite to the visible light reflecting mirror and receives light rays reflected by the visible light reflecting mirror.
Further, a hemispherical electron energy analyzer is provided towards the sample measurement point, said hemispherical electron energy analyzer being provided with an imaging system.
Further, the visible light mirror is provided with a movable mechanism.
Further, the visible light reflecting mirror is obliquely arranged on the ellipsoidal focusing mirror.
Further, the imaging system is disposed outside the vacuum environment.
Further, the plasma ultraviolet light source adopts helium plasma excited by microwaves 433 MHz.
Further, the plasma ultraviolet light source is also provided with a capillary, collimator or focusing monochromator.
Further, the imaging system is in signal connection with a computer.
The utility model has the beneficial effects that:
1) According to the method, the reflecting mirror capable of moving in or out of the optical axis is additionally arranged on the optical path, and the reflecting mirror is matched with the imaging system, so that a sample area in the optical axis direction of the ellipsoidal focusing mirror can be directly observed without sample switching.
2) The structure designed by the application can be rapidly switched between a focusing working state and a micro working state, and is convenient to operate;
3) And the rapid sample visualization can be realized by combining the rapid sample position adjusting device with an imaging system on the optical axis of the analyzer, and the rapid sample position adjustment to the light source focus and the analysis focus position can be realized.
Drawings
Fig. 1 is a schematic view of a vacuum ultraviolet light source.
FIG. 2 is a schematic diagram of the micro-focusing and micro-structure of the UV light source according to the present utility model.
FIG. 3 is a schematic diagram illustrating the operation of the micro-focusing and micro-structuring of the UV light source according to the present utility model.
FIG. 4 is a schematic diagram of the micro-focusing and microstructure optimization of the UV light source of the present utility model.
In the figure, 1, an ellipsoidal focusing mirror, 2, a visible light reflecting mirror, 3, a first imaging system, 4, a plasma ultraviolet light source, 5, a sample measuring point, 6, ultraviolet light source rays, 7, an optical axis, 8, visible light, 9, a sample, 10, a hemispherical electronic energy analyzer, 11 and a second imaging system.
Detailed Description
The present utility model will be described in further detail with reference to the drawings and examples, in order to make the objects, technical solutions and advantages of the present utility model more apparent. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the utility model.
Example 1
The application designs a micro-focusing and imaging structure of ultraviolet light source, includes: a plasma ultraviolet light source 4, an ellipsoidal focusing mirror 1, a visible light reflecting mirror 2 and a first imaging system 3; the plasma ultraviolet light source 4, the ellipsoidal focusing mirror 1 and the visible light reflecting mirror 2 are positioned in a vacuum environment; the imaging system 3 is placed outside the vacuum environment.
The plasma ultraviolet light source 4 is for emitting ultraviolet light. In the embodiment, the plasma ultraviolet light source 4 adopts helium plasma excited by microwave 433MHz to emit ultraviolet light with various wavelengths of 21.2eV, 42eV and the like.
The plasma ultraviolet light source 4 and the sample measuring point 5 are respectively arranged at the focuses on the two sides of the ellipsoidal focusing mirror 1, so that the plasma ultraviolet light source 4 and the sample measuring point 5 are positioned on the optical axis 7 of the ellipsoidal focusing mirror 1; and after the ultraviolet light emitted by the plasma ultraviolet light source 4 positioned at the focus on one side of the ellipsoidal focusing mirror 1 is reflected on the surface of the ellipsoidal focusing mirror 1, the other focus, namely the measuring point 5, is focused. In the embodiment, the ellipsoidal focusing mirror 1 has a length of 102mm, the distance from the plasma ultraviolet light source 4 to the focal point 5 is 600mm, and the working distance is 31.6 mm. The center position of the visible mirror 2 is 300mm from the focal point 5. The angle between the visible light mirror 2 and the optical axis 7 is 45 deg..
In order to realize direct observation of a sample area in the optical axis direction of a focusing mirror, the design is that a movable visible light reflecting mirror 2 is arranged between a plasma ultraviolet light source 4 and an ellipsoidal focusing mirror 1 without sample switching, and a first imaging system 3 is arranged opposite to the visible light reflecting mirror 2; the visible light reflecting mirror 2 is provided with a movable mechanism, and the visible light reflecting mirror 2 can be moved into the optical axis 7 or deviate from the optical axis 7 under the drive of the movable mechanism. In this embodiment, the first imaging system 3 adopts a camera system, and the first imaging system 3 is in signal connection with a computer, so that the acquired image can be transferred to the computer. The movable mechanism selects the existing action mechanism according to actual needs, and can clamp and fix the visible light reflecting mirror 2 on one hand and realize that the visible light reflecting mirror 2 can move relative to the optical axis 7 on the other hand.
The working process comprises the following steps: when the visible mirror 2 is offset from the optical axis 7, it appears that the plasma ultraviolet light source 4 is focused to the sample measurement point 5 as shown in fig. 1. When the visible light mirror 2 is moved to the optical axis 7, the focusing system does not operate. At this time, the visible light 8 emitted from the sample measurement point 5 is directly irradiated to the visible light mirror 2, reflected by the visible light mirror 2, and received by the imaging system 3. At this time, the center of the first imaging system 3 is the sample measurement point 5 formed by the ellipsoidal focusing mirror 1.
Example 2
Based on the micro-focusing and imaging structure of the ultraviolet light source designed in the embodiment 1, the application also uses the structure in combination with an optoelectronic spectrometer, as shown in fig. 4. Sample 9 is located at sample measurement point 5; the hemispherical electron energy analyzer 10 is provided on the front side of the sample 9 at an angle to the vacuum ultraviolet light source system. A second imaging system 11 is provided on top of the hemispherical electron energy analyzer 10.
With this configuration, the reflected light of the sample 9 may pass directly through the hemispherical electron energy analyzer 10 and be received by the second imaging system 11. Furthermore, the first imaging system 3 observes the area of the sample 9 on the axis of the light source and the second imaging system 11 observes the area of the sample on the axis of the hemispherical electron energy analyzer 10. When the two areas are exactly coincident, the area is both the point illuminated by the light source and the point measured by the analyzer. If the two areas do not coincide, the coincidence of the two areas can be achieved by moving the position of the sample 9, whereby the sample positioning can be performed quickly.
Example 3:
the plasma ultraviolet light source point 4 may be the actual plasma generation point of the ultraviolet light source, or may be the exit point through a capillary or collimator, or may be the focal point after monochromatization and focusing by a focusing monochromator.
The first imaging system 3 and the second imaging system 11 may be cameras, microscopes or eyes.
The above embodiments are merely for illustrating the design concept and features of the present utility model, and are intended to enable those skilled in the art to understand the content of the present utility model and implement the same, the scope of the present utility model is not limited to the above embodiments. Therefore, all equivalent changes or modifications according to the principles and design ideas of the present utility model are within the scope of the present utility model.
Claims (8)
1. A micro-focusing and imaging structure of an ultraviolet light source is characterized by comprising a plasma ultraviolet light source (4), an ellipsoidal focusing mirror (1) and a visible light reflecting mirror (2) which are arranged in a vacuum environment,
the ultraviolet light source (4) is arranged at one ellipsoidal focus of the ellipsoidal focusing mirror (1), and a sample measuring point (5) is arranged at the other ellipsoidal focus;
the visible light reflecting mirror (2) is movably arranged between the ultraviolet light source (4) and the ellipsoidal focusing mirror (1);
an imaging system (3) is arranged opposite to the visible light reflecting mirror (2), and the imaging system (3) receives light rays reflected by the visible light reflecting mirror (2).
2. A micro-focusing and imaging structure of an ultraviolet light source according to claim 1, characterized in that towards the sample measuring point (5) a hemispherical electron energy analyzer (10) is provided, said hemispherical electron energy analyzer (10) being equipped with an imaging system.
3. A micro-focus and imaging arrangement of an ultraviolet light source according to claim 1 or 2, characterized in that the visible light mirror (2) is provided with a movable mechanism.
4. A micro-focusing and imaging structure of an ultraviolet light source according to claim 3, characterized in that the visible light mirror (2) is arranged obliquely to the ellipsoidal focusing mirror (1).
5. A micro-focus and imaging arrangement of an ultraviolet light source according to claim 1, characterized in that the imaging system (3) is arranged outside the vacuum environment.
6. A micro-focus and imaging arrangement of an ultraviolet light source according to claim 1, 2, 4 or 5, characterized in that the plasma ultraviolet light source (4) employs a helium plasma excited by microwaves 433 MHz.
7. A micro-focus and imaging arrangement of an ultraviolet light source according to claim 6, characterized in that the plasma ultraviolet light source (4) is further provided with a capillary, collimator or focusing monochromator.
8. A micro-focus and imaging arrangement for an ultraviolet light source according to claim 6, characterized in that the imaging system (3) is signally connected to a computer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322245356.9U CN220603346U (en) | 2023-08-21 | 2023-08-21 | Micro-focusing and imaging structure of ultraviolet light source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322245356.9U CN220603346U (en) | 2023-08-21 | 2023-08-21 | Micro-focusing and imaging structure of ultraviolet light source |
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| Publication Number | Publication Date |
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| CN220603346U true CN220603346U (en) | 2024-03-15 |
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| CN202322245356.9U Active CN220603346U (en) | 2023-08-21 | 2023-08-21 | Micro-focusing and imaging structure of ultraviolet light source |
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- 2023-08-21 CN CN202322245356.9U patent/CN220603346U/en active Active
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