CN220591475U - Wax matrix preparation mould with penetrate wax buffer function - Google Patents

Wax matrix preparation mould with penetrate wax buffer function Download PDF

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Publication number
CN220591475U
CN220591475U CN202322090400.3U CN202322090400U CN220591475U CN 220591475 U CN220591475 U CN 220591475U CN 202322090400 U CN202322090400 U CN 202322090400U CN 220591475 U CN220591475 U CN 220591475U
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China
Prior art keywords
runner
wax
flow channel
injection
length dimension
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Active
Application number
CN202322090400.3U
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Chinese (zh)
Inventor
邵斌
王卫东
高飞
张延臣
全盛渊
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Qingdao Suntech New Materials Technology Development Co ltd
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Qingdao Suntech New Materials Technology Development Co ltd
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Priority to CN202322090400.3U priority Critical patent/CN220591475U/en
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Abstract

The utility model provides a wax mould preparation mould with a wax injection buffering function, wherein a material injection runner comprises a first runner, a second runner and a third runner, the first runner, the second runner and the third runner are communicated along the conveying direction of wax, the wax enters into a forming runner sequentially through the first runner, the second runner and the third runner, the first runner, the second runner and the third runner which are vertically and alternately distributed are used for buffering the wax in the injection process, the wax is prevented from being directly injected through a single channel to cause excessive internal pressure and flow velocity, the length dimension of the second runner is larger than that of the first runner, the wax after being buffered and depressurized can be sufficiently buffered and stabilized in the second runner, and pressure fluctuation caused when the joint of the first runner and the second runner makes sharp rotation is prevented, so that the wax injection buffering function is realized.

Description

Wax matrix preparation mould with penetrate wax buffer function
Technical Field
The utility model relates to the technical field of wax mould processing, in particular to a wax mould preparation mould with a wax injection buffering function.
Background
In the wax pattern forming process, the wax material is filled into the mold at a stable speed, after the pressure maintaining sum is cooled and formed, the mold is opened to take out the wax pattern, and the subsequent investment casting processing is completed by using the wax pattern. In the process of processing and manufacturing the wax mould by adopting the existing mould, if the injection speed of the wax material in the injection runner is too high, the flow speed and the flow pressure of the wax material in the forming runner are unbalanced, so that the surface forming quality of the wax mould is affected.
Disclosure of Invention
In view of this, the technical problems to be solved by the present utility model are: how to provide a wax mould preparation mould with wax injection buffering function, which is used for reducing the wax injection pressure at the front end by arranging a buffering injection runner, so that the wax flows in a forming runner along stable pressure and flow rate.
In order to achieve the above object, the present utility model provides a wax pattern preparation mold with wax injection buffering function, comprising a body;
the body is provided with a fixed hole site, and the fixed hole site is arranged at the corner end of the body;
the device comprises a body, a wax injection runner, a forming runner and a wax injection runner, wherein the body is provided with the forming runner which is communicated with the wax injection runner, and one end of the wax injection runner is positioned at the side part of the body and used for conveying wax materials;
the wax injection runner comprises a first runner, a second runner and a third runner, the first runner, the second runner and the third runner are communicated along the conveying direction of wax, the first runner is connected to the side part of the body and is close to the outer side of the body, two ends of the second runner are respectively connected to the first runner and the third runner, the other end of the third runner is connected to the forming runner, and the wax enters the forming runner sequentially through the first runner, the second runner and the third runner;
the first flow channel and the second flow channel are vertically arranged, and the second flow channel and the third flow channel are vertically arranged;
the ratio range of the length dimension of the second flow channel to the length dimension of the first flow channel is: 1.5-5.
Further, the ratio of the length dimension of the third flow channel to the length dimension of the first flow channel is in the range of 1-3.
Further, the third flow passage and the first flow passage are arranged in parallel.
Further, the first flow channel, the second flow channel and the third flow channel are cylindrical channels.
Compared with the related art, the wax mould preparation mould with the wax injection buffering function has the beneficial effects that: the wax injection runner is arranged on the body and comprises a first runner, a second runner and a third runner, the first runner, the second runner and the third runner are communicated along the conveying direction of wax, the first runner is connected to the side part of the body and is close to the outer side of the body, two ends of the second runner are respectively connected to the first runner and the third runner, the other end of the third runner is connected to the forming runner, the wax sequentially enters the forming runner through the first runner, the second runner and the third runner, the first runner and the second runner are vertically distributed, the second runner and the third runner are vertically distributed, the ratio range of the length dimension of the second runner to the length dimension of the first runner is 1.5-5, therefore, the first runner, the second runner and the third runner which are vertically and alternately distributed realize the buffering of the wax in the injection process, the wax is prevented from being directly injected through a single channel to cause excessive internal pressure and flow velocity, the length dimension of the second runner is larger than the length dimension of the first runner, the wax after the pressure reduction is sequentially fed into the forming runner, the first runner and the second runner is vertically distributed, the second runner and the second runner is vertically distributed, the length dimension of the second runner is greatly reduced, and the second runner is also is greatly reduced, and the pressure is compared.
Drawings
FIG. 1 is a schematic diagram of a wax pattern preparation mold with wax injection buffering function in an embodiment of the utility model;
fig. 2 is a schematic cross-sectional view of a wax pattern preparation mold with wax injection buffering function in an embodiment of the utility model.
Detailed Description
The utility model is described in further detail below with reference to the drawings and the detailed description.
Referring to fig. 1-2, the present utility model provides a wax pattern preparation mold with wax injection buffering function, which comprises a body 10.
The body 10 is provided with a fixing hole site 11, and the fixing hole site 11 is arranged at the corner end of the body 10. The body 10 is installed and fixed by the fixing hole site 11, so that the wax mould is conveniently manufactured and processed.
The body 10 is provided with a molding runner 20 and a wax injection runner 30, the molding runner 20 is communicated with the wax injection runner 30, and one end of the wax injection runner 30 is positioned at the side part of the body 10 and is used for conveying wax materials. After the wax is filled in the molding runner 20, the molding runner is pressurized and cooled, so that the preparation of the wax mold is completed.
The wax injection runner 30 comprises a first runner 31, a second runner 32 and a third runner 33, the first runner 31, the second runner 32 and the third runner 33 are cylindrical channels, the first runner 31, the second runner 32 and the third runner 33 are communicated along the conveying direction of wax materials, the first runner 31 is connected to the side part of the body 10 and is arranged close to the outer side of the body 10, two ends of the second runner 32 are respectively connected to the first runner 31 and the third runner 33, the other end of the third runner 33 is connected to the forming runner 20, and the wax materials sequentially enter the forming runner 20 through the first runner 31, the second runner 32 and the third runner 33.
The first flow channel 31 and the second flow channel 32 are vertically arranged, the second flow channel 32 and the third flow channel 33 are vertically arranged, the third flow channel 33 and the first flow channel 31 are parallelly arranged, the buffer of wax in the injection process is realized through the vertically crossed first flow channel 31, the second flow channel 32 and the third flow channel 33, and the phenomenon that the internal pressure and the flow velocity are overlarge due to the fact that the wax is directly injected through a single channel is prevented.
The ratio of the length dimension of the second flow channel 32 to the length dimension of the first flow channel 31 ranges from: 1.5-5. The length dimension of the second flow channel 32 is larger than that of the first flow channel 31, so that the wax material after buffer depressurization has enough buffer pressure stabilization process in the second flow channel 32, and pressure fluctuation caused by sharp rotation at the joint of the first flow channel 31 and the second flow channel 32 is prevented.
The ratio of the length dimension of the third flow channel 33 to the length dimension of the first flow channel 31 ranges from 1 to 3. The length dimension of the third flow channel 33 is greater than or equal to the dimension of the first flow channel 31, so that the wax material near one end of the forming flow channel 20 can be stably conveyed, and the better forming processing quality is ensured, and furthermore, after the wax material in the third flow channel 33 is formed, the wax formed in the forming flow channel 20 can be connected with higher strength, so that the wax has better strength in the processing or transferring process.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present utility model, and are not limiting; although the utility model has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present utility model.

Claims (4)

1. The wax mould preparation mould with the wax injection buffering function is characterized by comprising a body;
the body is provided with a fixed hole site, and the fixed hole site is arranged at the corner end of the body;
the device comprises a body, a wax injection runner, a forming runner and a wax injection runner, wherein the body is provided with the forming runner which is communicated with the wax injection runner, and one end of the wax injection runner is positioned at the side part of the body and used for conveying wax materials;
the wax injection runner comprises a first runner, a second runner and a third runner, the first runner, the second runner and the third runner are communicated along the conveying direction of wax, the first runner is connected to the side part of the body and is close to the outer side of the body, two ends of the second runner are respectively connected to the first runner and the third runner, the other end of the third runner is connected to the forming runner, and the wax enters the forming runner sequentially through the first runner, the second runner and the third runner;
the first flow channel and the second flow channel are vertically arranged, and the second flow channel and the third flow channel are vertically arranged;
the ratio range of the length dimension of the second flow channel to the length dimension of the first flow channel is: 1.5-5.
2. The wax pattern producing mold with wax injection buffering function as in claim 1, wherein the ratio of the length dimension of the third runner to the length dimension of the first runner is in the range of 1-3.
3. The wax pattern preparation mold with wax injection buffer function as in claim 1, wherein the third runner is disposed parallel to the first runner.
4. The wax pattern producing mold with wax injection buffering function of claim 1, wherein the first runner, the second runner and the third runner are cylindrical channels.
CN202322090400.3U 2023-08-04 2023-08-04 Wax matrix preparation mould with penetrate wax buffer function Active CN220591475U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202322090400.3U CN220591475U (en) 2023-08-04 2023-08-04 Wax matrix preparation mould with penetrate wax buffer function

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202322090400.3U CN220591475U (en) 2023-08-04 2023-08-04 Wax matrix preparation mould with penetrate wax buffer function

Publications (1)

Publication Number Publication Date
CN220591475U true CN220591475U (en) 2024-03-15

Family

ID=90176629

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202322090400.3U Active CN220591475U (en) 2023-08-04 2023-08-04 Wax matrix preparation mould with penetrate wax buffer function

Country Status (1)

Country Link
CN (1) CN220591475U (en)

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