CN220468255U - High safe type wafer annealing equipment of even annealing - Google Patents
High safe type wafer annealing equipment of even annealing Download PDFInfo
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- CN220468255U CN220468255U CN202322084343.8U CN202322084343U CN220468255U CN 220468255 U CN220468255 U CN 220468255U CN 202322084343 U CN202322084343 U CN 202322084343U CN 220468255 U CN220468255 U CN 220468255U
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- 238000000137 annealing Methods 0.000 title claims abstract description 46
- 238000010438 heat treatment Methods 0.000 claims description 56
- 239000006096 absorbing agent Substances 0.000 claims description 13
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 8
- 230000003247 decreasing effect Effects 0.000 claims description 8
- 238000009434 installation Methods 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 6
- 238000007599 discharging Methods 0.000 abstract description 3
- 235000012431 wafers Nutrition 0.000 description 30
- 229910000831 Steel Inorganic materials 0.000 description 10
- 239000010959 steel Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 5
- 238000012423 maintenance Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
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- Heat Treatment Of Strip Materials And Filament Materials (AREA)
Abstract
The utility model discloses a high-safety wafer annealing device for uniform annealing, which relates to the technical field of wafer annealing and aims to solve the problems that the overall working efficiency is reduced due to the time of feeding and discharging of the existing wafer annealing device, and limitation exists when efficient running water operation is carried out. The effect that can realize high-efficient running water formula annealing operation, work efficiency is high is reached.
Description
Technical Field
The utility model relates to the technical field of wafer annealing, in particular to high-safety wafer annealing equipment for uniform annealing.
Background
During the production of the wafer, a large number of integrated circuits are required to be photoetched on the wafer raw material, so that the annealing operation is required to be carried out on the wafer raw material, the surface hardness of the wafer is reduced, the orderly execution of the photoetching operation is ensured, and the wafer is not separated from annealing equipment during the annealing.
The time of feeding and discharging of the existing wafer annealing equipment can cause the overall work efficiency to be reduced, and the limitation exists when efficient running water type operation is carried out.
Disclosure of Invention
The utility model aims to provide high-safety wafer annealing equipment for uniform annealing, which can realize efficient running-water annealing operation and has high working efficiency.
In order to achieve the above purpose, the present utility model provides the following technical solutions:
the utility model provides a high safe type wafer annealing equipment of even annealing, includes first support, a plurality of heating furnaces are installed to the upper end of first support, and a plurality of heating furnaces end to end just is the straight line and distributes, the inside of heating furnace runs through and has the transportation wire rope, the both ends of first support are rotatory respectively to install a linkage wheel, the outside at the linkage wheel is cup jointed respectively at the both ends of transportation wire rope, the support frame has been placed to the outside of transportation wire rope, fixedly connected with second support on the surface of first support, two slide rails of upper end fixedly connected with of second support, the outside sliding connection of slide rail has the movable seat, fixedly connected with electric telescopic handle on the surface of movable seat, electric telescopic handle's telescopic end fixedly connected with mounting panel, be provided with two mounting holes on the surface of mounting panel, and electromagnetic absorber is installed to the inside buckle of mounting hole.
Through adopting above-mentioned technical scheme, can make the inside that passes a plurality of heating furnaces of support bracket and wafer orderly carry out the annealing operation, utilize electromagnetic absorber to place new support bracket in the feed inlet department of heating furnace simultaneously, ensure that wafer annealing operation can run off.
Further, a rotating seat is fixedly connected to the side surface of the second support, a screw rod is rotatably installed between the two rotating seats, the screw rod penetrates through a threaded hole in the outer surface of the movable seat, a first motor is fixedly installed on the side surface of the rotating seat, and one end of a rotating shaft of the first motor is fixedly connected with one end of the screw rod.
Through adopting above-mentioned technical scheme, can utilize first motor drive the lead screw rotation, ensure that the movable seat can stabilize orderly removal.
Further, the symmetrical inner walls of the heating furnace are provided with mounting grooves, and the inside of each mounting groove is fixedly provided with a resistance heating pipe.
By adopting the technical scheme, the temperature inside the heating furnace can be increased by utilizing the motor heating pipe.
Further, the number of the electric resistance heating pipes installed in the heating furnace is gradually decreased from the heating furnace at the middle position to two sides.
By adopting the technical scheme, the temperature difference inside two adjacent heating furnaces is ensured, and the orderly proceeding of annealing operation is ensured.
Further, a second motor is fixedly installed on the side surface of the first support, and one end of a rotating shaft of the second motor is fixedly connected to one end of a rotating shaft of one of the linkage wheels.
Through adopting above-mentioned technical scheme, guaranteed the rotation that the linkage wheel can be stable, and then guaranteed the inside that the wafer can orderly pass a plurality of heating furnaces.
Further, the electromagnetic absorber comprises a shell, an iron core and a coil, wherein the iron core is buckled in a mounting hole on the end face of the shell, and the coil is wound outside the iron core and is positioned inside the shell
Through adopting above-mentioned technical scheme, can utilize electromagnetic absorber to adsorb the support bracket, and then carry out efficient position movement to the support bracket.
1. According to the utility model, the wafers to be annealed can be placed on the support brackets, the linkage wheels are rotated, the conveying steel wire ropes are driven to rotate through the linkage wheels, so that the support brackets placed on the conveying steel wire ropes can orderly pass through the interiors of the heating furnaces, effective annealing operation is realized, after annealing is finished, the wafers can be taken out by using external blanking equipment, meanwhile, the electric telescopic rods are extended, one end of the electromagnetic absorber can be abutted against the outer surface of the support brackets, then the height of the support brackets is raised, meanwhile, the movable seat is moved, the empty support brackets are moved to the feed inlet of the heating furnaces, so that new wafers to be annealed can be placed conveniently, personnel intervention is not needed in the whole annealing process, the safety coefficient is high, meanwhile, running type annealing operation is realized, the working efficiency is effectively improved, the heating furnaces can be conveniently disassembled and assembled, the daily maintenance operation is convenient, and the practicability is effectively improved;
2. according to the utility model, the number distribution of the resistance heating pipes in the heating furnaces is gradually decreased from the heating furnace at the middle position to two sides so that the temperatures in two adjacent heating furnaces are different, the overall temperature distribution is gradually increased in starting temperature, the temperature is highest when the temperature reaches the middle position, and then the temperature is gradually decreased, so that the stable annealing performance is ensured, the wafer can be heated uniformly in the whole annealing process, and the practicability is further improved.
Drawings
FIG. 1 is a schematic perspective view of the present utility model;
fig. 2 is an internal structural view of the present utility model.
In the figure: 1. a first bracket; 2. a linkage wheel; 3. conveying a steel wire rope; 4. a second bracket; 5. a slide rail; 6. a movable seat; 7. an electric telescopic rod; 8. a screw rod; 9. a first motor; 10. a second motor; 11. a support bracket; 12. a heating furnace; 13. a resistance heating tube; 14. a mounting plate; 15. an electromagnetic absorber.
Detailed Description
The process according to the utility model is described in further detail below with reference to the accompanying drawings.
Referring to fig. 1 and 2, a high-safety wafer annealing device for uniform annealing comprises a first bracket 1, wherein a plurality of heating furnaces 12 are installed at the upper end of the first bracket 1, the heating furnaces 12 are connected end to end and distributed in a straight shape, a conveying steel wire rope 3 penetrates through the inside of the heating furnaces 12, two ends of the first bracket 1 are respectively rotatably provided with a linkage wheel 2, two ends of the conveying steel wire rope 3 are respectively sleeved outside the linkage wheel 2, a supporting bracket 11 is placed outside the conveying steel wire rope 3, a second bracket 4 is fixedly connected to the outer surface of the first bracket 1, two sliding rails 5 are fixedly connected to the upper end of the second bracket 4, a movable seat 6 is connected to the outer surface of the movable seat 6 in a sliding manner, an electric telescopic rod 7 is fixedly connected to the telescopic end of the electric telescopic rod 7, two mounting holes are formed in the outer surface of the mounting plate 14, an electromagnetic absorber 15 is installed in an inner buckle of each mounting hole, the electromagnetic absorber 15 comprises a shell and a coil, the iron core is installed in the mounting holes in the end face of the shell in a buckle mode, the coil is wound outside the iron core, a supporting bracket 11 is placed outside the shell, two sliding on the outer surfaces of the shell, two sliding rings are fixedly connected to the inner surfaces of the shell, two sliding rings are fixedly connected to the two sliding rings, two sliding rings are fixedly connected to the inner sliding rings, two sliding rings are sequentially arranged on the inner rings are sequentially, and are sequentially arranged on the inner surfaces of the shell, and extend to the inner rings 11, and extend to the inner rings, respectively, and extend to the inner rings 11, respectively, are sequentially extend to the inner rings, and extend to the inner rings through the inner supporting rings and have a high bearing ring 11, and have a high degree, and can extend through the inner diameter and have a high degree. The empty supporting bracket 11 is moved to the feed inlet of the heating furnace 12, so that a new wafer to be annealed is placed conveniently, personnel intervention is not needed in the whole annealing process, the safety coefficient is high, meanwhile, running water type annealing operation can be performed, feeding and discharging are not needed to be stopped, the working efficiency is effectively improved, the heating furnace 12 can be disassembled and assembled conveniently, daily maintenance operation is convenient, and the practicability is effectively improved.
Referring to fig. 1, a rotary seat is fixedly connected to a side surface of the second bracket 4, a screw rod 8 is rotatably installed between the two rotary seats, the screw rod 8 penetrates through a threaded hole in the outer surface of the movable seat 6, a first motor 9 is fixedly installed on the side surface of the rotary seat, one end of a rotary shaft of the first motor 9 is fixedly connected with one end of the screw rod 8, a second motor 10 is fixedly installed on the side surface of the first bracket 1, one end of the rotary shaft of the second motor 10 is fixedly connected to one end of a rotary shaft of one of the linkage wheels 2, the first motor 9 can be utilized to drive the screw rod 8 to rotate, the movable seat 6 can stably slide on the sliding rail 5, and meanwhile, the second motor 10 can be utilized to drive the linkage wheels 2 to rotate, so that the whole device can stably and orderly work is ensured.
Referring to fig. 1, installation grooves are formed in symmetrical inner walls of the heating furnaces 12, the resistance heating pipes 13 are fixedly installed in the installation grooves, the installation quantity of the resistance heating pipes 13 in the heating furnaces 12 is gradually decreased from the heating furnaces 12 at the middle position to two sides, the quantity distribution of the resistance heating pipes 13 in the heating furnaces 12 is gradually decreased from the heating furnaces 12 at the middle position to two sides, the temperatures in the two adjacent heating furnaces 12 are different, the overall temperature distribution is gradually increased at the beginning temperature, the temperature is highest when reaching the middle position, and then the temperature is gradually decreased, so that stable annealing can be performed, and meanwhile, the wafer can be heated uniformly in the whole annealing process, and the practicability is further improved.
Working principle: when in use, the device is firstly arranged at a designated position, then the supporting bracket 11 is arranged on the conveying steel wire rope 3 at the feed inlet of the heating furnace 12, then the wafer is arranged on the supporting bracket 11, after the arrangement is finished, the second motor 10 is started, the linkage wheel 2 is driven by the second motor 10, the conveying steel wire rope 3 is driven to rotate by the linkage wheel 2, the supporting bracket 11 arranged on the conveying steel wire rope 3 can orderly pass through the interiors of a plurality of heating furnaces 12, when the supporting bracket passes through the interiors of the heating furnaces 12, the second motor 10 is intermittently started and stopped, so that the wafer can be arranged in each heating furnace 12 for a certain time, when the supporting bracket 11 passes through the interiors of the heating furnaces 12, a new supporting bracket 11 and a new wafer are arranged at the feed inlet of the heating furnace 12, as the number distribution of the resistance heating pipes 13 in the interiors of the heating furnaces 12 gradually decreases from the heating furnaces 12 at the middle position to two sides so that the temperatures in the interiors of two adjacent heating furnaces 12 are different, the whole temperature distribution is gradually increased to reach the highest temperature when reaching the middle position, and then gradually decreased, so that the wafer can be subjected to efficient annealing operation when passing through the heating furnace 12, after annealing is finished, the supporting bracket 11 supports the wafer to move out of the heating furnace 12, and continuously moves for a certain distance, so that the wafer can be naturally cooled, after cooling is finished, the wafer is taken down by using external blanking equipment, and meanwhile, the electric telescopic rod 7 is extended, so that one end of the electromagnetic absorber 15 can be abutted against the upper surface of the supporting bracket 11, then the electromagnetic absorber 15 is electrified, the supporting bracket 11 is further absorbed, then the electric telescopic rod 7 is contracted, the first motor 9 is started, the first motor 9 is used for driving the screw rod 8 to rotate, and the movable seat 6 can slide on the sliding rail 5, thereby the adsorbed support bracket 11 is moved to the feed inlet of the heating furnace 12, then the electric telescopic rod 7 is extended, and the electromagnetic absorber 15 is powered off, so that the support bracket 11 can be replaced on the conveying steel wire rope 3, a new wafer to be annealed is conveniently placed, and the wafer annealing operation can be carried out in a running water mode.
The embodiments of the present utility model are all preferred embodiments of the present utility model, and are not intended to limit the scope of the present utility model in this way, therefore: all equivalent changes in structure, shape and principle of the utility model should be covered in the scope of protection of the utility model.
Claims (6)
1. A high safety wafer annealing device for uniform annealing, comprising a first support (1), characterized in that: the utility model discloses a heating furnace, including first support (1), second support (4) are fixed connection, slide rail (5) are fixed connection, fixed connection has electric telescopic handle (7) on the surface of movable seat (6), electric telescopic handle (7) are fixed connection mounting panel (14) on the surface of mounting panel (14), two mounting holes have been cup jointed in the outside of linkage (2) respectively at the both ends of carrying wire rope (3), support bracket (11) have been placed to the outside of carrying wire rope (3), fixedly connected with second support (4) on the surface of first support (1), slide rail (5) are fixed connection to outside movable seat (6), fixed connection has electric telescopic handle (7) on the surface of movable seat (6), electric telescopic handle (7) are fixed connection has electromagnetic absorber (15) in mounting hole.
2. A uniformly annealed, high-safety wafer annealing apparatus as recited in claim 1, wherein: the rotary seat is fixedly connected to the side surface of the second support (4), a screw rod (8) is rotatably installed between the two rotary seats, the screw rod (8) penetrates through a threaded hole in the outer surface of the movable seat (6), a first motor (9) is fixedly installed on the side surface of the rotary seat, and one end of a rotary shaft of the first motor (9) is fixedly connected with one end of the screw rod (8).
3. A uniformly annealed, high-safety wafer annealing apparatus as recited in claim 1, wherein: the symmetrical inner walls of the heating furnace (12) are provided with mounting grooves, and the inside of each mounting groove is fixedly provided with a resistance heating pipe (13).
4. A uniformly annealed, high-safety wafer annealing apparatus according to claim 3, wherein: the installation quantity of the resistance heating pipes (13) in the heating furnace (12) is gradually decreased from the heating furnace (12) at the middle position to two sides.
5. A uniformly annealed, high-safety wafer annealing apparatus as recited in claim 1, wherein: the side surface of the first bracket (1) is fixedly provided with a second motor (10), and one end of a rotating shaft of the second motor (10) is fixedly connected with one end of a rotating shaft of one of the linkage wheels (2).
6. A uniformly annealed, high-safety wafer annealing apparatus as recited in claim 1, wherein: the electromagnetic absorber (15) comprises a shell, an iron core and a coil, wherein the iron core is buckled in a mounting hole on the end face of the shell, and the coil is wound outside the iron core and is positioned inside the shell.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322084343.8U CN220468255U (en) | 2023-08-04 | 2023-08-04 | High safe type wafer annealing equipment of even annealing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322084343.8U CN220468255U (en) | 2023-08-04 | 2023-08-04 | High safe type wafer annealing equipment of even annealing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220468255U true CN220468255U (en) | 2024-02-09 |
Family
ID=89777383
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202322084343.8U Active CN220468255U (en) | 2023-08-04 | 2023-08-04 | High safe type wafer annealing equipment of even annealing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220468255U (en) |
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2023
- 2023-08-04 CN CN202322084343.8U patent/CN220468255U/en active Active
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