CN220444530U

CN220444530U - Cleaning device for crystal oscillator wafer processing

Info

Publication number: CN220444530U
Application number: CN202321973655.8U
Authority: CN
Inventors: 袁庆祝; 段洪伟; 马建立; 陈杰
Original assignee: Tangshan Wanshihe Electronic Co ltd
Current assignee: Tangshan Wanshihe Electronic Co ltd
Priority date: 2023-07-25
Filing date: 2023-07-25
Publication date: 2024-02-06
Anticipated expiration: 2033-07-25

Abstract

The utility model relates to the technical field of crystal oscillator wafer processing equipment and provides a crystal oscillator wafer processing cleaning device which comprises a base, a lifting rod and a processor, wherein the top of the base is fixedly connected with a cleaning table through screws, the top of the cleaning table is fixedly connected with a shrinking rod through screws, the top of the lifting rod is fixedly connected with a cross rod through screws, one side of the cross rod is provided with a first power machine, the interior of the cleaning table is provided with a second power machine, the cross rod is movably hinged with a connecting piece, a rotating handle drives a central shaft to rotate with the central bevel gear through the arrangement of structures such as the central bevel gear and blades, a bevel gear meshed and connected with the central bevel gear also rotates with the central bevel gear to drive the driven shaft and the blades on the driven shaft to rotate, and the outer peripheral surface of the blades fixedly nested with the impeller realize special stirring of cleaning liquid in a cleaning tank, so that the problems of easy precipitation and poor practicability of solution in the prior art are solved.

Description

Cleaning device for crystal oscillator wafer processing

Technical Field

The utility model relates to the technical field of crystal oscillator wafer processing equipment, in particular to a cleaning device for crystal oscillator wafer processing.

Background

The crystal oscillator sheet is a thin wafer formed by repeatedly cutting and grinding a quartz rod, the crystal oscillator sheet is cleaned in order to ensure the surface cleaning of the crystal oscillator sheet during production, the crystal oscillator sheet is required to be mounted in a corresponding tray during the process, and the tray is moved into a cleaning tank to be gradually cleaned by ionized water, pickled, dried and the like; adopt vibration formula washing during the washing, in order to prevent that the crystal oscillator piece from droing from the tray, the crystal oscillator piece of general different size specifications needs to use different trays to place at the heart, and tray quantity is many, and the difference is little, and staff distinguishes the difficulty to use the tray of big specification to hold the crystal oscillator piece of little specification, easily cause the crystal oscillator piece to drop when wasing, consequently need improve the promotion to current technique.

The authorized bulletin number in the prior art is: CN218743596U entitled: the utility model provides a crystal oscillator wafer processing is with cleaning machine, includes the cleaning table, has seted up a plurality of washing tank on the cleaning table, is provided with fixture on the cleaning table, and fixture includes horizontal pole, gallows, tray and card strip, and the horizontal pole rotates to set up on the cleaning table, and the gallows sets up on the horizontal pole, and the tray setting is on the gallows, and the quantity of card strip is a plurality of and all removes the setting on the tray, has seted up the draw-in groove that a plurality of interval set up on the card strip, and the draw-in groove is used for joint crystal oscillator.

However, the device needs special solution for cleaning, but the solution is easy to layer or coagulate in the long-time placing process, so that the problem that the solution is easy to precipitate exists, and then after the device cleans the special solution, solid scraps generated in the crystal oscillator wafer processing process need to be separated, and the solid scraps are not separated, so that the environment is easily damaged, the cleaning capability of the device is easily affected, the treatment cost is higher, and the problem of poor practicability exists.

Disclosure of Invention

The utility model provides a cleaning device for crystal oscillator wafer processing, which solves the problems of easy precipitation and poor practicability of cleaning solution in the related technology.

The technical scheme of the utility model is as follows:

the cleaning device for crystal oscillator wafer processing comprises a base, a lifting rod and a processor, wherein the top of the base is fixedly connected with a cleaning table through a screw, the top of the cleaning table is fixedly connected with a shrinking rod through a screw, the top of the lifting rod is fixedly connected with a cross rod through a screw, one side of the cross rod is provided with a first power machine, the interior of the cleaning table is provided with a second power machine, a connecting piece is movably hinged to the cross rod, and the connecting piece is fixedly connected with a cleaning mechanism through a screw;

the inside of cleaning platform rotates and installs central bevel gear, the one side of central bevel gear is through screw fixedly connected with center pin, one side of center pin is through screw fixedly connected with crank, one side of crank is through screw fixedly connected with handle, the inside of cleaning platform rotates and installs two symmetrical arrangement's helical gear, the helical gear with central bevel gear meshing is connected, one side of helical gear is through screw fixedly connected with driven shaft, one side of driven shaft is through screw fixedly connected with impeller, fixed cover is equipped with the blade of several evenly arranging on the outer peripheral face of impeller.

Preferably, two symmetrically arranged cleaning tanks are arranged in the cleaning table, a filter screen is arranged at the bottom of the cleaning tank, a waste discharge pipe is fixedly connected to one side of the cleaning table through screws, a waste discharge valve is arranged on one side of the waste discharge pipe, and the waste discharge pipe is communicated with the bottom of the cleaning tank through a pipeline.

Preferably, the cleaning table is internally provided with a mounting groove, and the second power machine is mounted in the mounting groove, so that the second power machine can be lifted conveniently.

Preferably, the lifting rod is internally provided with a round groove, and the shrinking rod is slidably connected in the round groove, so that the lifting of the cleaning structure is facilitated.

Preferably, a cavity is formed in the cleaning table, and the central bevel gear and the bevel gear are both rotationally connected in the cavity, so that the impeller is conveniently driven to rotate.

Preferably, the impeller is rotationally connected to the inside of the cleaning tank, and a through hole penetrating through the impeller is formed in the waste discharge pipe, so that the impeller can be rotated conveniently to stir the cleaning solution inside.

Preferably, a round hole is formed in the cleaning tank, and the driven shaft rotates to penetrate through the round hole, so that the impeller can rotate conveniently.

Preferably, a square groove is formed in the top of the cleaning table, and the processor is mounted on the square groove, so that the processor is convenient to mount.

The working principle and the beneficial effects of the utility model are as follows:

1. according to the utility model, through the arrangement of the structures such as the central bevel gear and the blades, the handle is rotated to drive the central shaft and the central bevel gear to rotate, and the bevel gear meshed with the central bevel gear also rotates to drive the driven shaft and the impeller on the driven shaft to rotate, so that the stirring of special cleaning liquid in the cleaning tank is realized through the rotation of the blades fixedly nested on the peripheral surface of the impeller, the problems of setting coagulation layering or sedimentation and easy sedimentation of cleaning solution are prevented.

2. According to the utility model, through the arrangement of the structures such as the filter screen and the waste discharge pipe, after cleaning is finished, the waste scraps solid remains on the filter screen, the waste discharge valve is opened, waste liquid is discharged from the waste discharge pipe, the filter screen is taken out, and the solid and the liquid are separated for treatment, so that the waste liquid treatment cost is reduced, the pollution to the environment is reduced, and the method has good practicability.

Drawings

The utility model will be described in further detail with reference to the drawings and the detailed description.

FIG. 1 is a schematic diagram of the overall structure of the present utility model;

FIG. 2 is a front view of the present utility model;

FIG. 3 is a side view of the present utility model;

FIG. 4 is a front cross-sectional view of the present utility model;

fig. 5 is a pushing structure diagram of the present utility model.

In the figure: 1. a cleaning table; 2. a base; 3. retracting the rod; 4. a lifting rod; 5. a cross bar; 6. a first power machine; 7. a processor; 8. a waste discharge pipe; 9. a waste discharge valve; 10. a cleaning tank; 11. a mounting groove; 12. a second power machine; 13. a crank; 14. a handle; 15. a central shaft; 16. a center bevel gear; 17. bevel gear; 18. a driven shaft; 19. an impeller; 20. a blade; 21. a cavity; 22. a connecting piece; 23. a cleaning mechanism; 24. and (5) a filter screen.

Detailed Description

The technical solutions of the embodiments of the present utility model will be clearly and completely described below in conjunction with the embodiments of the present utility model, and it is apparent that the described embodiments are only some embodiments of the present utility model, not all embodiments. All other embodiments, which can be made by one of ordinary skill in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.

Example 1

As shown in fig. 1 to 5, the present embodiment provides a cleaning device for crystal oscillator wafer processing, which comprises a base 2, a lifting rod 4 and a processor 7, wherein the top of the base 2 is fixedly connected with a cleaning table 1 through screws, the top of the cleaning table 1 is fixedly connected with a shrinking rod 3 through screws, the top of the lifting rod 4 is fixedly connected with a cross rod 5 through screws, one side of the cross rod 5 is provided with a first power machine 6, the inside of the cleaning table 1 is provided with a second power machine 12, the cross rod 5 is movably hinged with a connecting piece 22, the connecting piece 22 is fixedly connected with a cleaning mechanism 23 through screws, the inside of the cleaning table 1 is rotatably provided with a central bevel gear 16, one side of the central bevel gear 16 is fixedly connected with a central shaft 15 through screws, one side of the central shaft 15 is fixedly connected with a crank 13 through screws, one side of the crank 13 is fixedly connected with a handle 14 through screws, two symmetrically arranged bevel gears 17 are arranged in the cleaning table 1 in a rotating mode, the bevel gears 17 are connected with the central bevel gear 16 in a meshed mode, one side of each bevel gear 17 is fixedly connected with a driven shaft 18 through screws, one side of each driven shaft 18 is fixedly connected with an impeller 19 through screws, a plurality of evenly arranged blades 20 are fixedly sleeved on the outer peripheral surface of each impeller 19, through the arrangement of the central bevel gear 16, the blades 20 and the like, the handle 14 is rotated to drive the central shaft 15 to rotate with the central bevel gear 16, the bevel gears 17 connected with the central bevel gear 16 in a meshed mode also rotate along with the central bevel gear 16, the driven shafts 18 and the impellers 19 on the driven shafts 18 are driven to rotate, the outer peripheral surfaces of the impellers 19 are fixedly nested with the blades 20 to achieve stirring of special cleaning liquid in the cleaning tank 10, and the problems that coagulation layering or precipitation is prevented and cleaning solution is prone to precipitation are prevented.

The cleaning table 1 is provided with an installation groove 11 inside, and the second power machine 12 is installed inside the installation groove 11.

The inside of the lifting rod 4 is provided with a round groove, and the shrinking rod 3 is connected inside the round groove in a sliding way.

The cleaning table 1 is provided with a cavity 21 inside, and the central bevel gear 16 and the bevel gear 17 are both rotatably connected inside the cavity 21.

The top of the cleaning table 1 is provided with a square groove, and the processor 7 is arranged on the square groove.

The specific implementation process of the utility model is as follows: the handle 14 on one side of the crank 13 is rotated to drive the central shaft 15 to rotate with the central bevel gear 16, the bevel gear 17 in the cleaning table 1 is meshed with the central bevel gear 16, the bevel gear 17 also rotates along with the central bevel gear, the driven shaft 18 and the impeller 19 are driven to rotate, the blades 20 on the impeller 19 rotate to realize stirring of cleaning liquid in the cleaning tank 10, and other cleaning actions are all the prior art, and are not repeated herein.

Example 2

As shown in fig. 1 to 5, based on the same concept as that of the above embodiment 1, this embodiment also proposes that two symmetrically arranged cleaning tanks 10 are provided in the cleaning table 1, a filter screen 24 is provided at the bottom of the cleaning tank 10, a waste discharge pipe 8 is fixedly connected to one side of the cleaning table 1 through screws, a waste discharge valve 9 is installed at one side of the waste discharge pipe 8, the waste discharge pipe 8 is communicated with the bottom of the cleaning tank 10 through a pipeline, after the cleaning is completed, waste solids remain on the filter screen 24, the waste discharge valve 9 is opened, waste liquid is discharged from the waste discharge pipe 8, the filter screen 24 is taken out, and the solid and liquid are separately processed, thereby reducing the waste liquid treatment cost and reducing the pollution to the environment.

The impeller 19 is rotatably connected to the inside of the cleaning tank 10, and a through hole penetrating the inside of the waste pipe 8 is formed.

A round hole is formed in the cleaning tank 10, and a driven shaft 18 rotates to penetrate through the inside of the round hole.

In this embodiment, after cleaning, the waste solids remain on the filter screen 24, the waste discharge valve 9 is opened, the waste liquid is discharged from the waste discharge pipe 8, the filter screen 24 is taken out, and the solid-liquid separation treatment is performed, so that the pollution to the environment is reduced, and the waste liquid treatment cost is reduced.

The foregoing description of the preferred embodiments of the utility model is not intended to be limiting, but rather is intended to cover all modifications, equivalents, alternatives, and improvements that fall within the spirit and scope of the utility model.

Claims

1. The utility model provides a crystal oscillator wafer processing is with belt cleaning device, its characterized in that includes base (2), lift bar (4) and treater (7), the top of base (2) is through screw fixedly connected with cleaning platform (1), the top of cleaning platform (1) is through screw fixedly connected with pole (3) that contracts, the top of lift bar (4) is through screw fixedly connected with horizontal pole (5), first power machine (6) are installed to one side of horizontal pole (5), the internally mounted of cleaning platform (1) has second power machine (12) movable hinge has connecting piece (22) on horizontal pole (5), be connected with wiper mechanism (23) through screw fixedly on connecting piece (22);

the inside rotation of clean bench (1) is installed central bevel gear (16), screw fixedly connected with center pin (15) are passed through to one side of central bevel gear (16), screw fixedly connected with crank (13) are passed through to one side of center pin (15), screw fixedly connected with handle (14) are passed through to one side of crank (13), two symmetrical arrangement's helical gear (17) are installed in the inside rotation of clean bench (1), helical gear (17) with central bevel gear (16) meshing is connected, screw fixedly connected with driven shaft (18) are passed through to one side of helical gear (17), screw fixedly connected with impeller (19) are passed through to one side of driven shaft (18), fixed cover is equipped with blade (20) of several evenly arranged on the outer peripheral face of impeller (19).

2. The cleaning device for crystal oscillator wafer processing according to claim 1, wherein two symmetrically arranged cleaning tanks (10) are arranged in the cleaning table (1), a filter screen (24) is arranged at the bottom of each cleaning tank (10), a waste discharge pipe (8) is fixedly connected to one side of each cleaning table (1) through screws, a waste discharge valve (9) is arranged on one side of each waste discharge pipe (8), and each waste discharge pipe (8) is communicated with the bottom of each cleaning tank (10) through a pipeline.

3. The cleaning device for wafer processing according to claim 1, wherein an installation groove (11) is provided in the cleaning table (1), and the second power machine (12) is installed in the installation groove (11).

4. The cleaning device for wafer processing according to claim 1, wherein a circular groove is formed in the lifting rod (4), and the shrinking rod (3) is slidably connected to the inner part of the circular groove.

5. The cleaning device for wafer processing according to claim 1, wherein a cavity (21) is formed in the cleaning table (1), and the central bevel gear (16) and the bevel gear (17) are both rotatably connected in the cavity (21).

6. The cleaning device for wafer processing according to claim 2, wherein the impeller (19) is rotatably connected to the inside of the cleaning tank (10), and the inside of the waste discharge pipe (8) is provided with a through hole penetrating through itself.

7. The cleaning device for wafer processing according to claim 6, wherein a circular hole is formed in the cleaning tank (10), and the driven shaft (18) rotates through the inside of the circular hole.

8. The cleaning device for wafer processing according to claim 1, wherein a square groove is provided at the top of the cleaning table (1), and the processor (7) is mounted on the square groove.