CN220233101U - Etching processing equipment - Google Patents
Etching processing equipment Download PDFInfo
- Publication number
- CN220233101U CN220233101U CN202320803568.1U CN202320803568U CN220233101U CN 220233101 U CN220233101 U CN 220233101U CN 202320803568 U CN202320803568 U CN 202320803568U CN 220233101 U CN220233101 U CN 220233101U
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- fixedly connected
- supporting plate
- etching
- plate
- acid
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- 238000005530 etching Methods 0.000 title claims abstract description 52
- 230000007246 mechanism Effects 0.000 claims abstract description 29
- 239000002253 acid Substances 0.000 claims description 34
- 239000003513 alkali Substances 0.000 claims description 34
- 239000002585 base Substances 0.000 claims description 7
- 239000004065 semiconductor Substances 0.000 abstract description 22
- 239000000463 material Substances 0.000 abstract description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 11
- 238000000034 method Methods 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Weting (AREA)
Abstract
The utility model relates to the technical field of etching processing and discloses etching processing equipment, which comprises a box body and a supporting plate, wherein an etching mechanism is fixedly connected inside the supporting plate, and covering mechanisms are fixedly connected on the surfaces of the front side and the rear side of the box body; the etching mechanism comprises a moving assembly and a rotating assembly, the rotating assembly is arranged on the moving assembly, the moving assembly comprises a first limiting block, the first limiting block is fixedly connected with the left supporting plate and the right supporting plate, the left supporting plate and the right supporting plate are close to one side of the lower end, the left supporting plate and the right supporting plate are close to one side of the upper end of the left supporting plate and the right supporting plate, the second limiting block is fixedly connected with a first motor, the bottom of the first motor is fixedly connected with a first threaded rod, and the surface of the first threaded rod is in rotary connection with the inner portion of the first limiting block. This etching processing equipment through setting up etching mechanism, can place the semiconductor material when carrying out in etching water, no longer need by the people place, also can throw away the etching water on semiconductor material surface simultaneously.
Description
Technical Field
The utility model relates to the technical field of etching processing, in particular to etching processing equipment.
Background
Semiconductors, which are materials having conductivity properties between those of conductors and insulators at ordinary temperatures, are used in integrated circuits, consumer electronics, communication systems, photovoltaic power generation, lighting, high power conversion, etc., and are devices fabricated using semiconductors.
The etching processing equipment for semiconductor production comprises a processing top plate, wherein processing connecting plates are fixedly connected to the bottom of the processing top plate, two processing connecting plates are arranged in number and symmetrically arranged about the central axis of the processing top plate, an exhaust fan is arranged on one side of the inside of the processing connecting plates, an air suction fan is arranged on the other side of the inside of the processing connecting plates, a filter layer is arranged between the air suction fan and the exhaust fan, the filter layer is fixedly connected with the processing connecting plates, and three filter layers are arranged in number.
With respect to the above description, the applicant believes that the following problems exist:
in the using process, the waste gas generated by the semiconductor reaction is treated in the technical scheme, but after the semiconductor material is put into etching solution for etching and taken out, the semiconductor material is moist, the semiconductor material is inconvenient to dry and process continuously, and the semiconductor is inconvenient to take out from the etching solution.
Disclosure of Invention
The present utility model is directed to an etching apparatus for solving the above-mentioned problems.
In order to achieve the above purpose, the present utility model provides the following technical solutions: the etching processing equipment comprises a box body and supporting plates, wherein the supporting plates are arranged on the left side and the right side of the box body, etching mechanisms are fixedly connected inside the supporting plates, and covering mechanisms are fixedly connected on the surfaces of the front side and the rear side of the box body;
the etching mechanism comprises a moving assembly and a rotating assembly, and the rotating assembly is arranged on the moving assembly;
the movable assembly comprises a first limiting block, the first limiting block is fixedly connected to the left supporting plate and the right supporting plate, the two supporting plates are close to one side lower end, the left supporting plate and the right supporting plate are close to one side upper end, the second limiting block is fixedly connected with a second limiting block, the top of the second limiting block is fixedly connected with a first motor, the bottom of the first motor is fixedly connected with a first threaded rod, the surface of the first threaded rod is rotationally connected with the inner portion of the first limiting block, the surfaces of the upper side and the lower side of the first threaded rod are fixedly connected with connecting seats, a first T-shaped groove is formed in the center of the inner portion of the supporting plate, a first T-shaped block is connected with a first T-shaped block in a sliding mode, the first T-shaped block is fixedly connected with a circular ring between the first T-shaped block and the connecting seats, and the circular ring is fixedly connected between the connecting seats.
Preferably, the number of the first threaded rods is four, the first threaded rods are two by two, the directions of the threaded lines on the surfaces of the four first threaded rods are identical, the specifications of the four first threaded rods are the same, and when the first threaded rods rotate, the two connecting seats can move to opposite sides on the first threaded rods.
Preferably, the rotating assembly comprises a top plate, the top plate is fixedly connected with the top of the upper side circular ring, the top plate is uniformly and fixedly connected with an acid and alkali resistant cover plate around the bottom of the top plate, the bottom of the circular ring is fixedly connected with a fixing plate, the top of the fixing plate is fixedly connected with a second motor, the bottom of the second motor is fixedly connected with a rotating shaft, the bottom of the rotating shaft is fixedly connected with a long plate, long blocks are uniformly and fixedly connected with the front side and the rear side of the bottom of the long plate, and the bottom of the long block is fixedly connected with an acid and alkali resistant filter plate.
Preferably, the number of the acid and alkali resistant shielding plates is eight, and the eight acid and alkali resistant shielding plates are all arranged around the acid and alkali resistant filter plate.
Preferably, the covering mechanism comprises a placing groove, the placing groove is arranged inside a box body, the top of the placing groove is provided with an opening, mounting seats are fixedly connected to the front side and the rear side of the box body, second T-shaped grooves are fixedly connected to the front side and the rear side of the box body, second T-shaped blocks are slidably connected to the inside of the second T-shaped grooves, mounting plates are fixedly connected to the other sides of the second T-shaped blocks, third motors are fixedly connected to the left side and the right side of the bottom of the mounting plates, second threaded rods are fixedly connected to the top of the third motors, fixing seats are rotatably connected to the top of the second threaded rods, the fixing seats are arranged at the top of the mounting seats, threaded holes are formed in the inside of the mounting seats, acid-base resistant baffles are arranged inside the placing groove, and fixedly connected between the front side and the rear side of the acid-base resistant baffles and the fixing seats.
Preferably, the number of the second threaded rods is four, two of the second threaded rods are in a group, the four threaded lines on the surfaces of the second threaded rods are identical in specification and the directions of the four threaded lines are the same, and when the second threaded rods are in threaded connection with the threaded holes, the four second threaded rods can move to the same side.
Preferably, the number of the mounting plates is two, and the two mounting plates are arranged on the front side and the rear side of the box body.
Compared with the prior art, the utility model provides etching processing equipment, which has the following beneficial effects:
1. according to the etching processing equipment, the etching mechanism is arranged, so that when the etching mechanism operates, the semiconductor material can be placed in the etching water, the semiconductor material does not need to be placed manually, and meanwhile, the etching water on the surface of the semiconductor material can be thrown away.
2. This etching processing equipment through setting up covering mechanism, under covering mechanism operation, can cover through acid and alkali-resistant baffle when handling the etching water on semiconductor material surface, avoids etching water to be got rid of and splashes on the staff on one's body, can protect staff's safety to a certain extent at this moment.
Drawings
For a clearer description of the technical solutions of the embodiments of the present utility model, the drawings that are needed in the description of the embodiments will be briefly described below, it will be apparent that the drawings in the description below are only some embodiments of the present utility model, and that other drawings can be obtained according to these drawings without inventive effort for a person skilled in the art:
FIG. 1 is a front view of the overall structure of the present utility model;
FIG. 2 is a schematic diagram of the structure of the moving assembly;
FIG. 3 is a schematic view illustrating the disassembly of the rotating assembly;
FIG. 4 is a schematic view of the structure of the covering mechanism;
fig. 5 is a partially exploded view of the covering mechanism.
In the figure: 1. a case; 2. a support plate; 3. an etching mechanism; 31. a moving assembly; 311. a first limiting block; 312. a first threaded rod; 313. a first T-block; 314. a first motor; 315. a first T-shaped slot; 316. a second limiting block; 317. a connecting seat; 318. a circular ring; 32. a rotating assembly; 321. acid and alkali resistant filter plates; 322. a long block; 323. a long plate; 324. a fixing plate; 325. a rotating shaft; 326. a second motor; 327. acid and alkali resistant cover plate; 328. a top plate; 4. a covering mechanism; 41. a placement groove; 42. acid and alkali resistant baffle plates; 43. a threaded hole; 44. a second T-shaped slot; 45. a second T-block; 46. a mounting plate; 401. a third motor; 402. a second threaded rod; 403. a mounting base; 404. a fixing seat.
Detailed Description
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
In the present utility model, unless explicitly specified and limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the above terms in the present utility model can be understood by those of ordinary skill in the art according to the specific circumstances.
The utility model provides the following technical scheme:
example 1
Referring to fig. 1 to 3, an etching apparatus includes a case 1 and a support plate 2, wherein the support plate 2 is disposed on both sides of the case 1, an etching mechanism 3 is fixedly connected to the inside of the support plate 2, and covering mechanisms 4 are fixedly connected to surfaces of both sides of the case 1;
the etching mechanism 3 comprises a moving component 31 and a rotating component 32, the rotating component 32 is arranged on the moving component 31, the moving component 31 comprises a first limiting block 311, the first limiting block 311 is fixedly connected with the lower ends of the left and right supporting plates 2 which are close to one side, the upper ends of the left and right supporting plates 2 which are close to one side are fixedly connected with a second limiting block 316, the top of the second limiting block 316 is fixedly connected with a first motor 314, the bottom of the first motor 314 is fixedly connected with a first threaded rod 312, the surface of the first threaded rod 312 is rotationally connected with the inner part of the first limiting block 311, the surfaces of the upper side and the lower side of the first threaded rod 312 are both in threaded connection with a connecting seat 317, the inner center of the inner part of the supporting plates 2 is provided with a first T-shaped groove 315, a first T-shaped block 313 is fixedly connected with the inner part of the first T-shaped groove 315, the left connecting seat 317 and the right connecting seat 317 are fixedly connected with a circular ring 318, the number of the first threaded rods 312 is four, the two threaded rods are in a group, the directions of the thread lines on the surfaces of the four first threaded rods 312 are identical, the specifications are the same, the rotating assembly 32 comprises a top plate 328, the top plate 328 is fixedly connected to the top of the upper circular ring 318, the periphery of the bottom of the top plate 328 is fixedly connected with an acid and alkali resistant cover plate 327, the bottom of the lower circular ring 318 is fixedly connected with a fixing plate 324, the top of the fixing plate 324 is fixedly connected with a second motor 326, the bottom of the second motor 326 is fixedly connected with a rotating shaft 325, the bottom of the rotating shaft 325 is fixedly connected with a long plate 323, the front side and the rear side of the bottom of the long plate 323 are fixedly connected with long blocks 322, the bottom of the long blocks 322 is fixedly connected with acid and alkali resistant filter plates 321, the number of the acid and alkali resistant cover plates 327 is eight, and the eight acid and alkali resistant cover plates 327 are all arranged around the acid and alkali resistant filter plates 321.
Furthermore, by arranging the etching mechanism 3, when the etching mechanism 3 operates, the semiconductor material can be placed in the etching water, the semiconductor material does not need to be placed manually, and meanwhile, the etching water on the surface of the semiconductor material can be thrown away.
Example two
Referring to fig. 1-5, and further obtaining the covering mechanism 4 based on the first embodiment, the covering mechanism comprises a placement groove 41, the placement groove 41 is arranged inside the box body 1, the top of the placement groove 41 is provided with an opening, both sides of the front and back of the box body 1 are fixedly connected with mounting seats 403, both sides of the front and back of the box body 1 are fixedly connected with second T-shaped grooves 44, the inside of the second T-shaped grooves 44 is slidably connected with second T-shaped blocks 45, the other side of the second T-shaped blocks 45 is fixedly connected with a mounting plate 46, both sides of the bottom of the mounting plate 46 are fixedly connected with third motors 401, the top of the third motors 401 is fixedly connected with second threaded rods 402, the top of the second threaded rod 402 is rotationally connected with a fixing seat 404, the fixing seat 404 is arranged at the top of the mounting seat 403, a threaded hole 43 is formed in the mounting seat 403, the surface of the second threaded rod 402 is in threaded connection with the threaded hole 43, an acid and alkali resistant baffle 42 is arranged in the placing groove 41, the front side and the rear side of the acid and alkali resistant baffle 42 are fixedly connected with the fixing seat 404, the number of the second threaded rods 402 is four and two are a group, the thread line specifications of the surfaces of the four second threaded rods 402 are identical and the directions are the same, the number of the mounting plates 46 is two, and the two mounting plates 46 are arranged on the front side and the rear side of the box body 1.
Further, through setting up cover mechanism 4, under cover mechanism 4 operation, can be when handling the etching water on semiconductor material surface, can cover through acid and alkali resistant baffle 42, avoid etching water to be got rid of and splash on the staff, can protect staff's safety to a certain extent at this moment.
In the actual operation process, when the device is used, the semiconductor material is placed on the acid and alkali resistant filter plate 321, the first motor 314 is started, the first motor 314 drives the first threaded rod 312 to rotate in the first limiting block 311, under the condition that the first threaded rod 312 rotates in the first limiting block 311, the two connecting seats 317 can move on the opposite sides on the first threaded rod 312, meanwhile, the first T-shaped block 313 can be driven to slide in the first T-shaped groove 315, the connecting seats 317 can drive the circular ring 318, the semiconductor material can be driven to be placed in etching water of the box 1 by the acid and alkali resistant filter plate 321 for etching, after etching, the first motor 314 is only required to be started reversely, the acid and alkali resistant filter plate 321 is driven to move out of the box 1, at the moment, the circular ring 318 on the upper side drives the top plate 328, the top plate 328 drives the acid and alkali resistant filter plate 321 to be arranged around, the second motor 326 drives the rotating shaft 325, the rotating shaft 325 drives the long block 322, and the long block 322 drives the acid and alkali resistant filter plate 321 to rotate, and the acid and alkali resistant filter plate 321 cannot be blocked by the acid and alkali resistant filter plate 327;
the third motor 401 is started, the third motor 401 drives the second threaded rod 402 to rotate, and because the second threaded rod 402 is in threaded connection with the threaded hole 43, the second threaded rod 402 moves to drive the fixing seat 404, the fixing seat 404 drives the acid and alkali resistant baffle 42 to move from the placing groove 41, the acid and alkali resistant filter plate 321 can rotate, and after the semiconductor materials placed on the acid and alkali resistant filter plate 321 are subjected to surface etching, the semiconductor materials can not be thrown outside under the cover of the acid and alkali resistant baffle 42.
It is noted that relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising one does not exclude the presence of other like elements in a process, method, article, or apparatus that comprises an element.
Claims (7)
1. Etching processing equipment, including box (1) and backup pad (2), its characterized in that: the support plates (2) are arranged on the left side and the right side of the box body (1), etching mechanisms (3) are fixedly connected inside the support plates (2), and covering mechanisms (4) are fixedly connected on the surfaces of the front side and the rear side of the box body (1);
the etching mechanism (3) comprises a moving component (31) and a rotating component (32), wherein the rotating component (32) is arranged on the moving component (31);
the movable assembly (31) comprises a first limiting block (311), the first limiting block (311) is fixedly connected with the left supporting plate (2) and the right supporting plate (2) to be close to one side lower end, the left supporting plate and the right supporting plate (2) are fixedly connected with a second limiting block (316) to be close to one side upper end, the top of the second limiting block (316) is fixedly connected with a first motor (314), the bottom of the first motor (314) is fixedly connected with a first threaded rod (312), the surface of the first threaded rod (312) is connected with the inner portion of the first limiting block (311) in a rotating mode, connecting seats (317) are connected with the surfaces of the upper side and the lower side of the first threaded rod (312) in a threaded mode, a first T-shaped groove (315) is formed in the inner center of the supporting plate (2), the first T-shaped groove (313) is fixedly connected with a first T-shaped block (313), the first T-shaped block (313) is fixedly connected with the connecting seats (317), and a circular ring (318) is fixedly connected between the connecting seats (317) in the left side and the right sides.
2. An etching processing apparatus according to claim 1, wherein: the number of the first threaded rods (312) is four, the first threaded rods are two by two in a group, and the directions of the thread lines on the surfaces of the four first threaded rods (312) are consistent and the specifications are the same.
3. An etching processing apparatus according to claim 1, wherein: the rotating assembly (32) comprises a top plate (328), the top plate (328) is fixedly connected to the top of an upper circular ring (318), acid and alkali resistant cover plates (327) are fixedly connected to the periphery of the bottom of the top plate (328), the bottom of the circular ring (318) is fixedly connected with a fixing plate (324), the top of the fixing plate (324) is fixedly connected with a second motor (326), the bottom of the second motor (326) is fixedly connected with a rotating shaft (325), the bottom of the rotating shaft (325) is fixedly connected with a long plate (323), long blocks (322) are fixedly connected to the front side and the rear side of the bottom of the long plate (323), and acid and alkali resistant filter plates (321) are fixedly connected to the bottom of the long blocks (322).
4. An etching processing apparatus according to claim 3, wherein: the number of the acid and alkali resistant shielding plates (327) is eight, and the eight acid and alkali resistant shielding plates (327) are all arranged around the acid and alkali resistant filter plate (321).
5. An etching processing apparatus according to claim 1, wherein: the utility model provides a cover mechanism (4) is including standing groove (41), inside standing groove (41) are seted up in box (1), standing groove (41) top sets up to the opening, equal fixedly connected with mount pad (403) in both sides around box (1), equal fixedly connected with second T type groove (44) in both sides around box (1), inside sliding connection in second T type groove (44) has second T type piece (45), second T type piece (45) opposite side fixedly connected with mounting panel (46), mounting panel (46) bottom left and right sides equal fixedly connected with third motor (401), third motor (401) top fixedly connected with second threaded rod (402), second threaded rod (402) top rotation is connected with fixing base (404), fixing base (404) set up in mount pad (403) top, threaded rod (43) have been seted up to inside in mount pad (403), second (402) surface and threaded hole (43) internal thread connection, inside setting up of standing groove (46) has acid and alkali-resistant baffle (42) and before the fixing base (42) and between fixing base (42).
6. An etching processing apparatus according to claim 5, wherein: the number of the second threaded rods (402) is four, two by two is a group, and the thread line specifications of the surfaces of the four second threaded rods (402) are identical and the directions are the same.
7. An etching processing apparatus according to claim 5, wherein: the number of the mounting plates (46) is two, and the two mounting plates (46) are arranged on the front side and the rear side of the box body (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320803568.1U CN220233101U (en) | 2023-04-12 | 2023-04-12 | Etching processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320803568.1U CN220233101U (en) | 2023-04-12 | 2023-04-12 | Etching processing equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220233101U true CN220233101U (en) | 2023-12-22 |
Family
ID=89172509
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202320803568.1U Active CN220233101U (en) | 2023-04-12 | 2023-04-12 | Etching processing equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220233101U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117961747A (en) * | 2024-02-02 | 2024-05-03 | 无锡恩丰科技有限公司 | Glaze polishing device for high-heat-conductivity ceramic processing |
-
2023
- 2023-04-12 CN CN202320803568.1U patent/CN220233101U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117961747A (en) * | 2024-02-02 | 2024-05-03 | 无锡恩丰科技有限公司 | Glaze polishing device for high-heat-conductivity ceramic processing |
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