CN220214022U - Sewage pool and siliceous wastewater recovery equipment - Google Patents

Abstract

The application provides a effluent water sump, contain silicon wastewater recovery plant relates to the silicon wastewater recovery plant field, and the effluent water sump includes cell body, partition assembly and encloses fender subassembly, the one end and the water conservancy diversion spare of cell body are connected, and the other end is connected with the coagulating basin, partition assembly is in highly being close to in the cell body the direction of water conservancy diversion spare is progressively decreased step by step, so that each overflow mouth in the cell body is risen step by step along with the flow direction of containing silicon waste water, can reduce the flow velocity of containing silicon waste water in the effluent water sump, enclose and keep off the subassembly and be located Chi Tiyuan from partition assembly's one end, enclose keep off the subassembly with partition assembly interval sets up, just enclose the projection face that keeps off the subassembly with partition assembly's projection face at least partially coincides, enclose and keep off the subassembly and can play the effect that the part was blocked to the silicon waste water of containing in overflow mouth department, can further reduce the flow velocity of silicon waste water in the effluent water sump, increased the silicon waste water in sedimentation time in the cell body has improved clean silicon mud's volume.

Description

Sewage pool and siliceous wastewater recovery equipment

Technical Field

The application relates to the field of silicon-containing wastewater recovery equipment, in particular to a sewage tank and silicon-containing wastewater recovery equipment.

Background

In the photoelectric and semiconductor industries, simple substance silicon bodies are required to be cut into silicon wafers meeting requirements, at present, polycrystalline silicon mainly adopts a multi-wire cutting technology, so that old cutting fluid is required to be continuously discharged in the cutting process, and about 50% of silicon materials are mixed into the cutting fluid consisting of polyethylene glycol cutting fluid and silicon carbide powder abrasive materials and new cutting fluid is continuously supplemented in the cutting process, so that a large amount of cutting wastewater is generated.

In the treatment process of the silicon-containing wastewater, the silicon-containing wastewater needs to flow into a sewage tank through gravity-flow ditches, the silicon-containing wastewater is temporarily remained in the sewage tank and then is discharged into a coagulation tank, and is mixed with a reagent in the coagulation tank for precipitation, and the precipitated silicon mud in the coagulation tank contains the reagent and cannot be sold according to clean silicon mud.

Disclosure of Invention

In order to overcome the defects in the prior art, the application provides sewage pool and siliceous wastewater recovery equipment.

In a first aspect, the present application provides a lagoon, comprising: the utility model provides a pool body, separation subassembly and enclose fender subassembly, the one end and the water conservancy diversion spare of cell body are connected, and the other end is connected with the coagulating basin, the diapire of cell body includes two inclined planes of connection at least, separation subassembly set up in the cell body just will the cell body separates into four accommodation space at least, and with Chi Tixing becomes the overflow mouth, separation subassembly is in the height in the cell body is followed to be close to the direction of water conservancy diversion spare is progressively decreased step by step, and two adjacent accommodation space are linked together, enclose and keep off the subassembly set up in the cell body, and be located Chi Tiyuan is away from the one end of separation subassembly, enclose and keep off the subassembly with separation subassembly interval sets up, just enclose the projection face that keeps off the subassembly with the projection face of separation subassembly at least partially coincides.

With reference to the first aspect, in one possible implementation manner, the separation assembly includes: the first division board, second division board and third division board, first division board set up in along first direction in the cell body, and be located the cell body is close to the one end of water conservancy diversion spare, the second division board along first direction set up in the cell body, and be located first division board is kept away from one side of water conservancy diversion spare, the second division board is along first direction's length is greater than first division board is along first direction's length, the third division board is along first direction set up in the cell body, and be located second division board is kept away from one side of first division board, the third division board is along first direction's length is greater than second division board is along first direction's length.

With reference to the first aspect, in one possible implementation manner, the enclosure assembly includes: the first baffle and the second baffle, first baffle along first direction set up in the cell body, and be located first division board is kept away from one side of water conservancy diversion spare, first baffle along the projection face of second direction with first division board is followed there is first projection coincidence face the projection face of second direction, the second direction with first direction is perpendicular, second baffle along first direction set up in the cell body, and be located second division board is kept away from one side of third division board, second baffle is followed the length of first baffle is greater than first baffle is followed the length of first direction, second baffle is followed the projection face of second direction with second baffle is followed there is the second projection coincidence face the projection face of second direction.

With reference to the first aspect, in a possible implementation manner, the first projection overlapping surface is smaller than the second projection overlapping surface, and the inclined surface is located on a bottom wall of the accommodating space surrounded by the first partition plate and the second partition plate.

With reference to the first aspect, in one possible implementation manner, a third baffle is disposed in the flow guiding member, and a filtering hole is disposed on the third baffle.

With reference to the first aspect, in a possible implementation manner, the third baffle is detachably connected to the flow guiding member.

With reference to the first aspect, in a possible implementation manner, a waterproof layer is disposed in the flow guiding member.

With reference to the first aspect, in a possible implementation manner, the flow guiding member is provided with a polishing layer.

In a second aspect, the application provides a silicon-containing wastewater recycling device, including a diversion element, a coagulation tank and the sewage tank, wherein the sewage tank is connected with the diversion element and the coagulation tank.

With reference to the second aspect, in a possible implementation manner, a lifting pump is connected between the sewage tank and the coagulation tank.

Compared with the prior art, the beneficial effect of this application:

the utility model provides a effluent water sump, separation subassembly set up in the cell body, with can with the cell body separates into four accommodation space at least, just separation subassembly is in the height in the cell body is followed and is close to the direction of water conservancy diversion spare is progressively decreased step by step, so that each overflow mouth in the cell body is risen step by step along with the flow direction of containing silicon waste water, thereby can reduce the flow rate of containing silicon waste water in the effluent water sump, with can increase the silicon waste water in the unit volume and be in dwell time in the cell body, enclose the effect that keeps off the subassembly can play partial choked flow to the silicon waste water of overflow mouth department, can further reduce the flow velocity of silicon waste water in the effluent water sump, thereby increased the settling time of silicon waste water in the cell body, improved clean silicon mud's in the cell body quantity.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the embodiments will be briefly described below, it being understood that the following drawings only illustrate some embodiments of the present utility model and therefore should not be considered as limiting the scope, and that other related drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.

Fig. 1 shows a schematic overall structure of a lagoon;

fig. 2 shows a schematic top view of a lagoon;

FIG. 3 is a schematic view showing the overall structure of the lagoon at another angle;

fig. 4 shows a schematic cross-sectional structure of the lagoon.

Description of main reference numerals:

100-a pool body; 110-a first overflow port; 120-a second overflow port; 130-a third overflow port; 200-a separation assembly; 210-a first separator plate; 220-a second divider; 230-a third divider plate; 300-enclosure assembly; 310-a first enclosure; 320-a second enclosure; 400-flow guide piece; 500-coagulation pool; 600-third surrounding baffle plates; 700-cross beam.

Detailed Description

Embodiments of the present application are described in detail below, examples of which are illustrated in the accompanying drawings, wherein the same or similar reference numerals refer to the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the drawings are exemplary only for the purpose of explaining the present application and are not to be construed as limiting the present application.

In the description of the present application, it should be understood that the terms "center," "longitudinal," "transverse," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," etc. indicate orientations or positional relationships based on the orientation or positional relationships shown in the drawings, are merely for convenience in describing the present application and simplifying the description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be configured and operated in a particular orientation, and therefore should not be construed as limiting the present application.

Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more such feature. In the description of the present application, the meaning of "a plurality" is two or more, unless explicitly defined otherwise.

In this application, unless specifically stated and limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the terms in this application will be understood by those of ordinary skill in the art as the case may be.

In this application, unless expressly stated or limited otherwise, a first feature "up" or "down" a second feature may be the first and second features in direct contact, or the first and second features in indirect contact via an intervening medium. Moreover, a first feature being "above," "over" and "on" a second feature may be a first feature being directly above or obliquely above the second feature, or simply indicating that the first feature is level higher than the second feature. The first feature being "under", "below" and "beneath" the second feature may be the first feature being directly under or obliquely below the second feature, or simply indicating that the first feature is less level than the second feature.

Example 1

Referring to fig. 1 and 2, an embodiment of the present application provides a sewage tank, where the sewage tank includes: cell body 100, partition assembly 200 and enclosure assembly 300. One end of the tank body 100 is connected with the flow guide piece 400, the other end of the tank body 100 is connected with the coagulation tank 500, the silicon-containing wastewater flows into the coagulation tank 500 through the flow guide piece 400 and the tank body 100, and the bottom wall of the tank body 100 comprises two connected inclined planes. The separation component 200 is disposed in the tank body 100 and separates the tank body 100 into at least four accommodating spaces, and forms overflow ports with the Chi Tixing, the height of the separation component 200 in the tank body 100 gradually decreases along the direction close to the flow guiding piece 400, and two adjacent accommodating spaces are communicated, so that each overflow port in the tank body 100 gradually increases along with the flow direction of the silicon-containing wastewater, thereby reducing the flow velocity of the silicon-containing wastewater in the sewage tank, and increasing the residence time of the silicon-containing wastewater in the tank body 100 in unit volume. The enclosing and blocking assembly 300 is arranged in the tank body 100 and is positioned at one end of the tank body 100 away from the separation assembly 200, the enclosing and blocking assembly 300 is arranged with the separation assembly 200 at intervals, the projection surface of the enclosing and blocking assembly 300 is at least partially overlapped with the projection surface of the separation assembly 200, the enclosing and blocking assembly 300 can play a part of flow blocking for the silicon-containing wastewater at the overflow port, the flow velocity of the silicon-containing wastewater in the sewage tank can be further reduced, the sedimentation time of the silicon-containing wastewater in the tank body 100 is prolonged, and the amount of clean silicon mud in the tank body 100 is increased.

In other embodiments, the number of the inclined surfaces may be three, four, five, six, etc., which are not illustrated herein.

Referring to fig. 1 and 3, in some embodiments, the separation assembly 200 includes: the first, second and third partition plates 210, 220 and 230 divide the cell body 100 into four receiving spaces. The first partition plate 210 is disposed in the tank body 100 along a first direction, and the first partition plate 210 is located at one end of the tank body 100 near the flow guiding member 400. The second partition plate 220 is disposed in the tank body 100 along the first direction, and the second partition plate 220 is located at a side of the first partition plate 210 away from the flow guide 400. The third separation plate 230 is disposed in the cell body 100 along the first direction, and the third separation plate 230 is located at a side of the second separation plate 220 away from the first separation plate 210.

In other embodiments, the separation assembly 200 may further include a fourth separation plate, a fifth separation plate, a sixth separation plate, a seventh separation plate, etc., which are not described herein.

In some embodiments, the length of the second separator plate 220 in the first direction is greater than the length of the first separator plate 210 in the first direction. The length of the third partition plate 230 in the first direction is longer than the length of the second partition plate 220 in the first direction.

Referring to fig. 4, in some embodiments, the first partition plate 210 forms a first overflow port 110 with the tank 100. The first overflow port 110 is located at an end of the first partition plate 210 near the enclosure assembly 300. The length of the first separation plate 210 along the first direction is 1500 mm, and the length of the first separation plate 210 along the second direction is 200 mm. The second direction is perpendicular to the first direction.

Referring to fig. 4, in some embodiments, the second partition 220 forms a second overflow 120 with the tank 100. The second overflow port 120 is located at an end of the second partition 220 near the enclosure assembly 300, and the second overflow port 120 is higher than the first overflow port 110. The length of the second separator 220 along the first direction is 2800 mm, and the length of the second separator 220 along the second direction is 250 mm.

Referring to fig. 4, in some embodiments, the third separation plate 230 forms a third overflow 130 with the tank 100. The third overflow port 130 is located at an end of the third partition plate 230 near the enclosure assembly 300, and the third overflow port 130 is higher than the second overflow port 120. The length of the first separation plate 210 in the first direction is 3000 mm, and the length of the third separation plate 230 in the second direction is 250 mm.

In some embodiments, a distance between the first partition plate 210 and the end of the tank body 100 near the flow guide 400 in the second direction is 7100 mm, and a distance between the first partition plate 210 and the second partition plate 220 in the second direction is 1100 mm.

In some embodiments, the second separator 220 and the third separator 230 have a distance of 950 mm in the second direction, and the first separator 210 and the end of the tank body 100 near the coagulation tank 500 have a distance of 1150 mm in the second direction.

In some embodiments, the inclined surface is located on a bottom wall of the accommodating space surrounded by the first partition plate 210 and the second partition plate 220.

Referring to fig. 1 and 3, in some embodiments, the enclosure assembly 300 includes: a first enclosure 310 and a second enclosure 320. The first baffle-plates 310 are disposed in the tank body 100 along the first direction, and the first baffle-plates 310 are located at a side of the first partition plate 210 away from the flow guiding member 400. The second baffle 320 is disposed in the tank 100 along the first direction, and the second baffle 320 is located at a side of the second partition plate 220 away from the third partition plate 230.

In some embodiments, the first baffle 310 acts as a partial flow stop for the silicon-containing wastewater at the first overflow outlet 110. The second baffle 320 may have a partial flow blocking effect on the silicon-containing wastewater at the second overflow port 120, and the length of the second baffle 320 along the first direction may be greater than the length of the first baffle 310 along the first direction.

In some embodiments, the length of the first baffle-plate 310 along the first direction is 1100 mm, the length of the first baffle-plate 310 along the second direction is 250 mm, and the distance between the first baffle-plate 310 and the first partition plate 210 in the second direction is 200 mm.

In some embodiments, the length of the second enclosure plate 320 along the first direction is 2300 mm, the length of the second enclosure plate 320 along the second direction is 200 mm, and the distance between the second enclosure plate 320 and the second partition plate 220 in the second direction is 400 mm.

In some embodiments, a first projection overlap surface exists between a projection surface of the first baffle plate 310 along the second direction and a projection surface of the first partition plate 210 along the second direction. A second projection overlapping surface exists between the projection surface of the second surrounding baffle 320 along the second direction and the projection surface of the second partition plate 220 along the second direction. The first projected overlapping surface is smaller than the second projected overlapping surface.

In some embodiments, the length of the tank body 100 along the second direction is 11500 mm, and a cross beam 700 is further disposed in the tank body 100. The cross beam 700 is disposed at one end of the tank body 100 near the first baffle plate 310 and is disposed parallel to the first baffle plate 310, and the cross beam 700 is located between the first baffle plate 310 and the second baffle plate 320.

In some embodiments, the length of the cross member 700 along the first direction is 450 mm, and the length of the cross member 700 along the second direction is 250 mm.

Referring to fig. 2, in some embodiments, a plurality of third baffles 600 are disposed in the baffle 400. Each third baffle 600 is arranged in the flow guiding member 400 along the flow direction of the silicon-containing wastewater, the baffle surface of the third baffle 600 is perpendicular to the flow direction of the silicon-containing wastewater, and the third baffle 600 is provided with a filtering hole, so that on one hand, the silicon-containing wastewater in the flow guiding member 400 can be filtered, and on the other hand, the flow velocity of the silicon-containing wastewater in the flow guiding member 400 can be reduced, so that the flow velocity of the silicon-containing wastewater flowing into the tank body 100 can be slowed down, the residence time of the silicon-containing wastewater in the tank body 100 in unit volume can be increased, the sedimentation time of the silicon-containing wastewater in the tank body 100 can be increased, the sedimentation effect of the silicon-containing wastewater can be improved, and the amount of clean silicon mud in the tank body 100 can be effectively improved.

In some embodiments, the spacing between two adjacent third peripheral baffles 600 is 2000 mm.

In some embodiments, the third baffle 600 is a 200 mesh nonwoven fabric screen.

In some embodiments, a waterproof layer is disposed in the baffle 400. The waterproof layer is coated on the inner surface and the outer surface of the flow guiding member 400, so as to effectively improve the permeation resistance of the flow guiding member 400.

In some embodiments, a polishing layer is disposed in the baffle 400. The polishing layer is disposed on the waterproof layer and is located on the guiding surface of the guiding member 400.

In some embodiments, the polishing layer is a polishing floor tile, and the polishing floor tile has small friction force, so that a worker can conveniently and quickly clean impurities on the guide surface.

In the treatment process of the silicon-containing wastewater, one end of the flow guide member 400 is connected with the output end of the silicon-containing wastewater, the other end of the flow guide member 400 is connected with the tank body 100, the silicon-containing wastewater flows into the tank body 100 through the flow guide member 400, and the silicon-containing wastewater sequentially flows into the tank body 100 through the first overflow port 110, the second overflow port 120 and the third overflow port 130, and flows into the coagulation tank 500 from the tank body 100. The third baffle 600 in the guide 400 can slow down the flow rate of the silicon-containing wastewater flowing into the tank body 100, the heights of the first overflow port 110, the second overflow port 120 and the third overflow port 130 are increased along with the flow direction of the silicon-containing wastewater, the flow rate of the silicon-containing wastewater in the tank body 100 can be slowed down, the first baffle 310 can play a part of a blocking role on the silicon-containing wastewater at the first overflow port 110, the second baffle 320 can play a part of a blocking role on the silicon-containing wastewater at the second overflow port 120, the flow rate of the silicon-containing wastewater in the tank body 100 can be further slowed down, and thus the sedimentation time of the silicon-containing wastewater in the tank body 100 is increased, and the amount of clean silicon mud in the tank body 100 is increased.

Example two

Referring to fig. 1 to 4, the embodiment of the present application provides a silicon-containing wastewater recycling apparatus, which includes a flow guiding member 400, a coagulation tank 500, a lifting pump, and the sewage tank in any one of the above embodiments, so that the apparatus has all the beneficial effects of the sewage tank in any one of the above embodiments, and will not be described in detail herein.

In some embodiments, the lagoon connects the baffle 400 with the coagulation basin 500. The lift pump connects the sewage tank with the coagulation tank 500, and is located at one end of the sewage tank far away from the flow guide 400. The silicon-containing wastewater flows into the sewage tank through the guide 400, and the lift pump pumps the upper wastewater in the sewage tank into the coagulation tank 500.

In the description of the present specification, a description referring to terms "one embodiment," "some embodiments," "examples," "specific examples," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present application. In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, the different embodiments or examples described in this specification and the features of the different embodiments or examples may be combined and combined by those skilled in the art without contradiction.

Although embodiments of the present application have been shown and described above, it will be understood that the above embodiments are illustrative and not to be construed as limiting the application, and that variations, modifications, alternatives, and variations may be made to the above embodiments by one of ordinary skill in the art within the scope of the application.

Claims (10)

1. A lagoon, comprising:

the device comprises a tank body, wherein one end of the tank body is connected with a flow guiding piece, the other end of the tank body is connected with a coagulation tank, and the bottom wall of the tank body at least comprises two connected inclined planes;

the separation component is arranged in the tank body, at least separates the tank body into four accommodating spaces and forms an overflow port with the Chi Tixing, the height of the separation component in the tank body gradually decreases along the direction close to the flow guide piece, and two adjacent accommodating spaces are communicated;

enclose and keep off the subassembly, enclose keep off the subassembly set up in the cell body, and be located Chi Tiyuan is from the one end of separating the subassembly, enclose and keep off the subassembly with separate the subassembly interval setting, just enclose the projection face that keeps off the subassembly with separate the projection face of subassembly at least partial coincidence.

2. The lagoon of claim 1, wherein the separation assembly comprises:

the first separation plate is arranged in the tank body along the first direction and is positioned at one end of the tank body, which is close to the flow guide piece;

the second partition plate is arranged in the tank body along the first direction and is positioned at one side of the first partition plate away from the flow guide piece, and the length of the second partition plate along the first direction is longer than that of the first partition plate along the first direction;

the third division plate is arranged in the pool body along the first direction and is positioned on one side, far away from the first division plate, of the second division plate, and the length of the third division plate along the first direction is larger than that of the second division plate along the first direction.

3. The lagoon of claim 2, wherein the containment assembly comprises:

the first surrounding baffle plate is arranged in the tank body along the first direction and is positioned at one side of the first separation plate far away from the flow guide piece, a first projection superposition surface exists between a projection surface of the first surrounding baffle plate along the second direction and a projection surface of the first separation plate along the second direction, and the second direction is perpendicular to the first direction;

the second surrounding baffle plate is arranged in the pool body along the first direction and is positioned on one side, far away from the third partition plate, of the second separating plate, the length of the second surrounding baffle plate along the first direction is larger than that of the first surrounding baffle plate along the first direction, and a second projection overlapping surface exists between a projection surface of the second surrounding baffle plate along the second direction and a projection surface of the second separating plate along the second direction.

4. A lagoon according to claim 3, wherein the first projected overlapping surface is smaller than the second projected overlapping surface, and the inclined surface is located on a bottom wall of the accommodation space surrounded by the first partition plate and the second partition plate.

5. The lagoon according to claim 1, wherein a third baffle is arranged in the diversion piece, and filtering holes are arranged on the third baffle.

6. The lagoon of claim 5, wherein the third baffle is removably coupled to the deflector.

7. A lagoon according to any of claims 1 to 6, wherein a waterproof layer is provided in the baffle.

8. A lagoon according to any of claims 1 to 6, wherein a polishing layer is provided in the flow guide.

9. A silicon-containing wastewater recovery device, comprising a diversion element, a coagulation tank and a wastewater tank according to any one of claims 1-8, wherein the wastewater tank connects the diversion element and the coagulation tank.

10. The silicon-containing wastewater reclamation apparatus as recited in claim 9, wherein a lift pump is connected between the wastewater tank and the coagulation tank.