CN220143265U - Barrel is prepared to indium phosphide wafer coarse polishing liquid - Google Patents
Barrel is prepared to indium phosphide wafer coarse polishing liquid Download PDFInfo
- Publication number
- CN220143265U CN220143265U CN202321473579.4U CN202321473579U CN220143265U CN 220143265 U CN220143265 U CN 220143265U CN 202321473579 U CN202321473579 U CN 202321473579U CN 220143265 U CN220143265 U CN 220143265U
- Authority
- CN
- China
- Prior art keywords
- barrel
- barrel body
- indium phosphide
- preparation
- stirring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 50
- 239000007788 liquid Substances 0.000 title claims abstract description 42
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 title claims abstract description 17
- 238000003756 stirring Methods 0.000 claims abstract description 30
- 238000002360 preparation method Methods 0.000 claims abstract description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 9
- 230000000149 penetrating effect Effects 0.000 claims abstract description 4
- 239000002002 slurry Substances 0.000 claims description 6
- 238000005260 corrosion Methods 0.000 claims description 3
- 230000007797 corrosion Effects 0.000 claims description 3
- 239000004033 plastic Substances 0.000 claims description 3
- 229920003023 plastic Polymers 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 10
- 238000001556 precipitation Methods 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 16
- 238000004140 cleaning Methods 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
An indium phosphide wafer rough polishing liquid preparation barrel belongs to the technical field of single wafer processing. The preparation barrel comprises a barrel body, a barrel cover, a liquid level meter and a stirring part, wherein the barrel cover is fixedly arranged at the top of the barrel body, a bracket is arranged in the middle of the barrel cover, a movable window is formed through a hinge, the barrel cover is also provided with a hole and connected with a water inlet pipe, and the stirring part penetrating through the barrel cover and extending into the barrel body is arranged on the bracket; the liquid level meter is arranged outside the side wall of the barrel body, and the bottom of the liquid level meter is communicated with the inside of the barrel body; the bottom of the side face of the barrel body is communicated with a liquid outlet pipe, the bottom of the barrel body is conical, the center of the bottom of the barrel body is communicated with a drain pipe, and a supporting frame is arranged at the bottom of the barrel body. The stirring part is used for enabling the stirring process of the polishing solution to be semi-automatic, guaranteeing the stability and consistency of the polishing solution in the preparation process every time, preparing a large amount of polishing solution according to requirements every time, directly storing the polishing solution in the barrel after the preparation and stirring of the polishing solution are finished, and continuously stirring in the use process to prevent precipitation, so that manual timing and manual stirring is avoided, the efficiency is improved, and manpower and material resources are saved.
Description
Technical Field
The utility model belongs to the technical field of single-wafer processing, and particularly relates to a preparation barrel of an indium phosphide wafer rough polishing liquid.
Background
The existing preparation of the wafer rough polishing liquid is mainly carried out by manual operation, an operator mixes the wafer rough polishing liquid according to a certain proportion and then uses a stirring tool to stir for a certain time to finish the liquid preparation process, the polishing liquid is required to be manually transferred to a liquid storage barrel after stirring is finished, and in the use process, the polishing liquid is required to be stirred at regular time to prevent precipitation. The polishing solution is large in dosage in the production process, a large amount of manpower and material resources are needed, and the preparation efficiency is low; and the quality of the prepared polishing solution is differentiated due to different operators, so that consistency of finished products prepared by the polishing solution is difficult to ensure.
Disclosure of Invention
The utility model provides a preparation barrel of polishing solution for rough polishing of an indium phosphide wafer, which aims to improve the preparation quality and the preparation efficiency of the polishing solution and reduce manpower and material resources.
An indium phosphide wafer rough polishing liquid preparation barrel is characterized in that: the device comprises a barrel body, a barrel cover, a liquid level meter and a stirring part, wherein the barrel cover is fixedly arranged at the top of the barrel body, a bracket is arranged in the middle of the barrel cover, a movable window is formed through a hinge, the barrel cover is also provided with a hole and connected with a water inlet pipe, and the stirring part penetrating through the barrel cover and extending into the barrel body is arranged on the bracket; the liquid level meter is arranged outside the side wall of the barrel body, and the bottom of the liquid level meter is communicated with the inside of the barrel body; the bottom of the side face of the barrel body is communicated with a liquid outlet pipe, the bottom of the barrel body is conical, the center of the bottom of the barrel body is communicated with a drain pipe, and a supporting frame is arranged at the bottom of the barrel body.
Further, the movable window is arranged on one side of the bracket, and the opening area of the movable window is smaller than the half area of the barrel cover.
Further, a handle is arranged on the movable window.
Further, the stirring part comprises a motor, a fan blade rod and a fan blade, wherein the motor is installed at the center of the top surface of the barrel cover through a bracket, the fan blade rod is connected with the motor and stretches into the barrel body, and the fan blade is installed on the fan blade rod through a reverse rotation thread.
Preferably, the fan blade rod and the fan blade material are made of corrosion-resistant plastics, and the fan blades are arranged in two groups and are respectively arranged at the middle part and the bottom of the fan blade rod.
Further, the barrel body is a cylinder, the bottom of the barrel body is conical, and the support frame is provided with three support foot frames.
Further, valves are arranged on the drain pipe and the drain pipe side.
Further, the liquid level gauge is a transparent pipe, and scale marks are arranged on the pipe wall.
The utility model has the beneficial effects that: the stirring part is used for enabling the stirring process of the polishing solution to be semi-automatic, guaranteeing the stability and consistency of the polishing solution in the preparation process every time, preparing a large amount of polishing solution according to requirements every time, directly storing the polishing solution in the barrel after the preparation and stirring of the polishing solution are finished, and continuously stirring in the use process to prevent precipitation, so that manual timing and manual stirring is avoided, the efficiency is improved, and manpower and material resources are saved.
Drawings
FIG. 1 is a schematic diagram showing the overall structure of a rough polishing slurry preparation tank for an indium phosphide wafer.
FIG. 2 is a front view of an indium phosphide wafer rough polishing slurry preparation barrel.
FIG. 3 is a cross-sectional view of an indium phosphide wafer rough polishing slurry preparation tank.
Wherein: 1. a tub body; 2. a barrel cover; 3. a motor; 4. a liquid level gauge; 5. a movable window; 6. a water inlet pipe; 7. a liquid outlet pipe; 8. a drain pipe; 9. a valve; 10. a fan blade lever; 11. a fan blade; 12. a support foot rest; 13. and (3) a bracket.
Detailed Description
Example 1: the preparation barrel of the polishing solution for rough polishing of the indium phosphide wafer comprises a barrel body 1, a barrel cover 2, a liquid level meter 4 and a stirring part, wherein the actual shape of the barrel body 1 is not limited, and the barrel body 1 is a cylinder in the embodiment shown in fig. 1 to 3. The bottom of the side surface of the barrel body 1 is communicated with a liquid outlet pipe 7, and the stirred polishing liquid is output by the liquid outlet pipe 7 and is supplied to equipment of the next working procedure. The bottom of the barrel body 1 is a conical surface, the center of the barrel body is communicated with a drain pipe 8, and the drain pipe 8 is used for draining waste liquid and cleaning water in the barrel. And valves 9 are arranged on the tube passes of the liquid outlet tube 7 and the water outlet tube 8 and are used for control. A drain pipe 7 and a drain pipe 8. Three supporting foot frames 12 are uniformly arranged at the bottom of the barrel body 1, the three supporting foot frames 12 can improve the bearing capacity of the barrel bottom to prevent deformation, and water drainage is facilitated.
The barrel cover 2 is fixedly arranged at the top of the barrel body 1, the barrel cover 2 is provided with a bracket 13 along the central axis, the barrel cover 2 ensures that the interior of the barrel body 1 is effectively isolated from the external environment, so that the polishing solution is prevented from being polluted, and peculiar smell and powder particles are prevented from entering the workshop environment; a movable window 5 is arranged on one side of the bracket 13 through a hinge, a handle is arranged on the movable window 5, and the movable window 5 is opened through the handle and is used for adding polishing agent and polishing paste into the barrel. The barrel cover 2 is also provided with an opening and is connected with a water inlet pipe 6 for injecting deionized water into the barrel. The stirring part penetrating through the barrel cover 2 and extending into the barrel body 1 is arranged in the center of the bracket 13, the stirring part comprises a motor 3, a fan blade rod 10 and fan blades 11, the motor 3 is arranged in the center of the top surface of the barrel cover 2 through the bracket 13, the fan blade rod 10 is connected with the motor 3 and extends into the barrel body 1, the fan blades 11 are arranged on the fan blade rod 10 through reverse threads, and the reverse threads can prevent loosening and falling in the stirring process; the fan blades 11 are arranged in two groups, are respectively arranged in the middle and at the bottom of the fan blade rod 10, and the upper and lower groups of fan blades 11 are matched for stirring, so that the stirring is more uniform. The blade bar 10 and the blade 11 are not limited in material, but are made of corrosion-resistant opaque plastic in this embodiment.
The liquid level meter 4 is a transparent pipe, the actual material and shape of the liquid level meter 4 are not limited, in this embodiment, the liquid level meter 4 is a cylinder made of transparent acrylic material, scale marks are arranged on the pipe wall, the liquid level meter 4 is installed outside the side wall of the barrel body 1, and the bottom of the liquid level meter 4 is communicated with the inside of the barrel body.
The application process of the utility model is as follows: firstly, a certain amount of deionized water is injected into the barrel through the water inlet pipe 6 according to the preparation amount, the motor 3 is turned on, the movable window 5 is turned on, polishing agent and polishing paste are sequentially added, the water injection amount can be observed and controlled through the liquid level meter 4 in the stirring process, and the motor 3 is turned off after the preparation and stirring are completed. And in the using process of the polishing solution, the motor 3 is turned on for continuous stirring, the polishing solution in the barrel is supplied to the equipment through the liquid outlet pipe 7, deionized water is injected into the barrel after the polishing solution is used up for washing cleanly to prevent the residual polishing solution from crystallizing, and the drain pipe 8 is opened to empty the cleaning water after the cleaning is finished.
Claims (7)
1. An indium phosphide wafer rough polishing liquid preparation barrel is characterized in that: the device comprises a barrel body, a barrel cover, a liquid level meter and a stirring part, wherein the barrel cover is fixedly arranged at the top of the barrel body, a bracket is arranged in the middle of the barrel cover, a movable window is formed through a hinge, the barrel cover is also provided with a hole and connected with a water inlet pipe, and the stirring part penetrating through the barrel cover and extending into the barrel body is arranged on the bracket; the liquid level meter is arranged outside the side wall of the barrel body, and the bottom of the liquid level meter is communicated with the inside of the barrel body; the bottom of the side face of the barrel body is communicated with a liquid outlet pipe, the bottom of the barrel body is conical, the center of the bottom of the barrel body is communicated with a drain pipe, and a supporting frame is arranged at the bottom of the barrel body.
2. The preparation barrel of the polishing solution for rough polishing of the indium phosphide wafer according to claim 1, wherein the movable window is arranged on one side of the bracket, the opening area of the movable window is smaller than the half area of the barrel cover, and a handle is arranged on the movable window.
3. The indium phosphide wafer rough polishing slurry preparation barrel as claimed in claim 1, wherein the stirring component comprises a motor, a blade rod and blades, the motor is arranged in the center of the top surface of the barrel cover through a bracket, the blade rod is connected with the motor and stretches into the barrel body, and the blades are arranged on the blade rod through anti-rotation threads.
4. The indium phosphide wafer rough polishing slurry preparation barrel as recited in claim 3, wherein said blade bars and blade materials are made of corrosion-resistant plastics, and said blades are arranged in two groups, respectively at the middle and bottom of the blade bars.
5. The preparation barrel of the polishing solution for rough polishing of the indium phosphide wafer according to claim 1, wherein the barrel body is a cylinder, the bottom of the barrel body is conical, and the supporting frame is three supporting foot frames.
6. The preparation barrel of the polishing solution for rough polishing of the indium phosphide wafer according to claim 1, wherein valves are arranged on the liquid outlet pipe and the water outlet pipe.
7. An indium phosphide wafer rough polishing slurry preparation tank as claimed in claim 1, wherein the liquid level gauge is a transparent tube and graduation lines are provided on the tube wall.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321473579.4U CN220143265U (en) | 2023-06-09 | 2023-06-09 | Barrel is prepared to indium phosphide wafer coarse polishing liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321473579.4U CN220143265U (en) | 2023-06-09 | 2023-06-09 | Barrel is prepared to indium phosphide wafer coarse polishing liquid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220143265U true CN220143265U (en) | 2023-12-08 |
Family
ID=89006139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202321473579.4U Active CN220143265U (en) | 2023-06-09 | 2023-06-09 | Barrel is prepared to indium phosphide wafer coarse polishing liquid |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220143265U (en) |
-
2023
- 2023-06-09 CN CN202321473579.4U patent/CN220143265U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN213467624U (en) | Polyester resin mixing and stirring tank | |
| CN220143265U (en) | Barrel is prepared to indium phosphide wafer coarse polishing liquid | |
| CN208615048U (en) | A kind of concrete central mix plant based on the adjustable ratio of artificial intelligence | |
| CN208786237U (en) | A kind of CIP cleaning device | |
| CN207901410U8 (en) | Convenient for the cement agitating tank of cleaning | |
| CN208194353U (en) | Automatic feeding device is used in a kind of production of liquid detergent | |
| CN212999756U (en) | Automatic feeding machine for producing detergent | |
| CN210676269U (en) | Cleaning equipment of industrial tank | |
| CN211563827U (en) | Concrete cleaning equipment | |
| CN210293419U (en) | Many liquid feed additive batching weighing device | |
| CN208894071U (en) | A kind of paint mixing device with self-cleaning function | |
| CN113975996A (en) | Stirring mixer outside barrel and cleaning device and system thereof | |
| CN218452090U (en) | Antiseptic solution raw materials filling device | |
| CN203994177U (en) | Automation member color casting machine | |
| CN218654046U (en) | A mixing arrangement for washing liquid production | |
| CN221095880U (en) | Concrete guniting device | |
| CN218459275U (en) | Automatic feeding mechanism | |
| CN210846059U (en) | Lotion mixes machine | |
| CN215540178U (en) | Solid phosphorus material thick liquid making devices | |
| CN218614713U (en) | Concrete processing equipment | |
| CN213101841U (en) | Agitating unit is used in production of gold potassium citrate | |
| CN218795894U (en) | Chemical industry reation kettle convenient to wash | |
| CN210079380U (en) | Rice fertilizer mixer | |
| CN210229860U (en) | Water-reducing agent agitator tank convenient to sample test | |
| CN217651235U (en) | Compound enzyme hydrolysis Chinese herbal medicine processing apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |