CN220111796U - Micro-nano bubble semiconductor equipment cleaning device - Google Patents
Micro-nano bubble semiconductor equipment cleaning device Download PDFInfo
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- CN220111796U CN220111796U CN202321395261.9U CN202321395261U CN220111796U CN 220111796 U CN220111796 U CN 220111796U CN 202321395261 U CN202321395261 U CN 202321395261U CN 220111796 U CN220111796 U CN 220111796U
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- pipe
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- pressurizing
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 24
- 239000002101 nanobubble Substances 0.000 title claims abstract description 21
- 238000004140 cleaning Methods 0.000 title claims abstract description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 20
- 238000010008 shearing Methods 0.000 claims abstract description 18
- 238000010438 heat treatment Methods 0.000 claims abstract description 12
- 239000007788 liquid Substances 0.000 claims description 25
- 230000000712 assembly Effects 0.000 claims description 6
- 238000000429 assembly Methods 0.000 claims description 6
- 230000000694 effects Effects 0.000 abstract description 3
- 230000009286 beneficial effect Effects 0.000 abstract 1
- 238000011109 contamination Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 4
- 239000003344 environmental pollutant Substances 0.000 description 3
- 231100000719 pollutant Toxicity 0.000 description 3
- 238000005273 aeration Methods 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
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- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model relates to a micro-nano bubble semiconductor device cleaning device, which comprises a bubble generating device, a bubble shearing device and a pressurizing device, wherein the bubble generating device comprises a water storage cavity, a one-way valve, a pipeline type heating device and a pressurizing cavity, the inlet of the one-way valve is communicated with the water storage cavity, the inlet of the pipeline type heating device is connected with the outlet of the one-way valve, the pressurizing cavity is communicated with the outlet of the pipeline type heating device, the bottom of the pressurizing cavity is provided with a bubble output hole for outputting water in the pressurizing cavity, the bubble output hole is formed into a conical hole with a small upper end and a big lower end, and the bubble output hole is connected with a switching valve; the switching valve comprises at least 2 switching outlets, wherein at least one switching outlet is connected with the bubble shearing device, wherein at least one switching outlet is connected with the pressurizing device. The utility model has the beneficial effects that: the switching valve can be controlled according to the type of the semiconductor device or the degree of intractable contamination on the semiconductor, and the cleaning effect of the semiconductor device can be improved.
Description
Technical Field
The utility model relates to the technical field of part detection, in particular to a cleaning device for micro-nano bubble semiconductor equipment.
Background
In the industrial application field, nanoscale bubbles refer to fine bubbles of 1000nm or less in a liquid, and further, bubbles of 1 to 100 μm are called fine bubbles, and bubbles of 100 μm or more are called ordinary bubbles. In water, compared with common bubbles, micro-nano bubbles have the characteristics of long existence time, high surface energy, negatively charged surface, high gas-liquid mass transfer rate and capability of spontaneously generating free radicals. Therefore, nanoscale bubbles can be used in the cleaning of semiconductor devices, and at present, four methods for generating micro-nano bubbles are mainly adopted: ultrasonic cavitation, hydrodynamic cavitation, optical cavitation and particle cavitation, wherein hydrodynamic cavitation equipment is simple in requirement and is a common method for generating micro-nano bubbles.
The existing micro-nano bubble generating device is an integrated structure formed by mixing bubbles and forming bubbles, as disclosed by 201510779931.0, the nano bubble generator is divided into a high-speed rotor impeller, a micro-pore aeration head and an air access pipe, wherein the micro-pore aeration head is arranged at one end of an air outlet of the air access pipe, and the high-speed rotor impeller is arranged on the air access pipe. The diameters of the bubbles cannot be further controlled, and common pollutants and stubborn pollutants on the semiconductor device cannot be processed in a targeted manner, so that resources are wasted or the cleaning is not thorough.
Disclosure of Invention
The utility model aims to overcome the defects of the prior art, and provides a micro-nano bubble semiconductor device cleaning device which can be used for cleaning different pollutants on a semiconductor device respectively and improving the cleaning effect of the semiconductor device.
The utility model relates to a micro-nano bubble semiconductor device cleaning device, which comprises a bubble generating device, a bubble shearing device and a pressurizing device, wherein the bubble generating device comprises a water storage cavity, a one-way valve, a pipeline type heating device and a pressurizing cavity, an inlet of the one-way valve is communicated with the water storage cavity, an inlet of the pipeline type heating device is connected with an outlet of the one-way valve, the pressurizing cavity is communicated with an outlet of the pipeline type heating device, a bubble output hole for outputting water in the pressurizing cavity is formed in the bottom of the pressurizing cavity, the bubble output hole is formed into a conical hole with a small upper end and a big lower end, and the bubble output hole is connected with a switching valve;
the switching valve comprises at least 2 switching outlets, wherein at least one switching outlet is connected with the bubble shearing device, at least one switching outlet is connected with the pressurizing device, the pressurizing device comprises two pressurizing assemblies, one pressurizing assembly is connected with the bubble shearing device, and one pressurizing assembly is connected with the switching outlet.
Further, the supercharging assembly comprises a booster pump, an input pipe and an output pipe, wherein the input pipe and the output pipe are respectively connected with the booster pump, the output pipe comprises a first pipe body and a second pipe body which are connected with each other, the inner diameter of the first pipe body is larger than that of the second pipe body, the first pipe body is connected with the booster pump, and the second pipe body is connected with a nozzle.
Further, the bubble shearing device comprises a rotor impeller, a guide pipe, an air access pipe and a liquid access pipe, wherein the air access pipe is connected with the liquid access pipe on the inner wall of the guide pipe, the air access pipe is respectively communicated with the guide pipe, and the liquid access pipe is connected with the switching outlet.
Further, the rotor impeller comprises a rotating shaft and a plurality of blades connected to the rotating shaft, the blades are in one of a single plate shape, a circular arc shape or an airplane wing shape, and the rotating shaft is connected with the driving motor.
Further, a plurality of through holes are formed in the pipe walls of the air access pipe and the liquid access pipe, and the through holes are communicated with the guide pipe.
Further, a water inlet of the water storage cavity is connected with a gas-liquid mixing device for mixing gas and liquid with each other.
The utility model has the advantages that: the switching valve comprises at least 2 switching outlets, at least one switching outlet is connected with the bubble shearing device, at least one switching outlet is connected with the pressurizing device, the pressurizing device comprises two pressurizing assemblies, one pressurizing assembly is connected with the bubble shearing device, one pressurizing assembly is connected with the switching outlet, the switching valve can be controlled according to the type of a semiconductor device or the intractable degree of pollution on the semiconductor, the nano bubble flow is controlled to enter the bubble shearing device to further shear or directly enter the pressurizing device, and the cleaning effect of the semiconductor device can be improved.
The foregoing and other objects, features and advantages of the utility model will be apparent from the following more particular description of preferred embodiments, as illustrated in the accompanying drawings.
Drawings
In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings that are required in the embodiments or the description of the prior art will be briefly described, it being obvious that the drawings in the following description are only some embodiments of the utility model, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
Fig. 1 is a schematic diagram of the overall structure of a micro-nano bubble semiconductor device cleaning apparatus.
Fig. 2 is a schematic structural view of the bubble shearing device.
Fig. 3 is a schematic view of the structure of the pressurizing chamber.
Detailed Description
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
Referring to fig. 1, 2 and 3, in a preferred embodiment of the present utility model, a cleaning device for micro-nano bubble semiconductor equipment comprises a bubble generating device 1, a bubble shearing device 2 and a pressurizing device 3, wherein the bubble generating device 1 comprises a water storage cavity 11, a one-way valve 12, a pipeline type heating device 13 and a pressurizing cavity 14, an inlet of the one-way valve 12 is communicated with the water storage cavity 11, an inlet of the pipeline type heating device 13 is connected with an outlet of the one-way valve 12, the pressurizing cavity 14 is communicated with an outlet of the pipeline type heating device 13, a bubble output hole 141 for outputting water in the pressurizing cavity 14 is formed at the bottom of the pressurizing cavity 14, the bubble output hole 141 is formed into a conical hole with a small upper end and a big lower end, and the bubble output hole 141 is connected with a switching valve 4;
the switching valve 4 comprises at least 2 switching outlets 41, wherein at least one of the switching outlets 41 is connected to the bubble shearing device 2, wherein at least one of the switching outlets 41 is connected to the pressurizing device 3, wherein the pressurizing device 3 comprises two pressurizing assemblies 31, wherein one of the pressurizing assemblies 31 is connected to the bubble shearing device 2, wherein one of the pressurizing assemblies 31 is connected to the switching outlet 41.
In the above embodiment, the pressurizing assembly 31 includes the pressurizing pump 311, the input pipe 312 and the output pipe 313 are respectively connected to the pressurizing pump 311, the output pipe 313 includes a first pipe body 3131 and a second pipe body 3132 that are connected to each other, the inner diameter of the first pipe body 3131 is larger than the inner diameter of the second pipe body 3132, the first pipe body 3131 is connected to the pressurizing pump 311, and the second pipe body 3132 is connected to the nozzle 5.
In the above embodiment, the bubble shearing device 2 includes the rotor impeller 21, the guide tube 22, the air inlet tube 23 and the liquid inlet tube 24 are connected to the inner wall of the guide tube 22, the air inlet tube 23 and the liquid inlet tube 24 are respectively communicated with the guide tube 22, and the liquid inlet tube 24 is connected to the switching outlet 41.
In the above embodiment, the rotor wheel 21 includes the rotation shaft 211 and the plurality of blades 212 connected to the rotation shaft 211, the blades 212 are one of a single plate shape, a circular arc shape, or a wing shape, and the rotation shaft 211 is connected to the driving motor.
In the above embodiment, the walls of the air inlet pipe 23 and the liquid inlet pipe 24 are provided with a plurality of through holes, and the through holes are communicated with the guide pipe 21. Through the opening of the through hole, the nano bubble flow and the air can be further mixed.
In the above embodiment, the water inlet of the water storage chamber 11 is connected with a gas-liquid mixing device for mixing gas and liquid with each other. In the practical implementation process, the gas-liquid mixing device adopts a gas-liquid mixer commonly used in the prior art, and the mixed liquid after gas-liquid mixing is discharged into the water storage cavity 11 for storage for standby.
The principles and embodiments of the present utility model have been described in detail with reference to specific examples, which are provided to facilitate understanding of the method and core ideas of the present utility model; meanwhile, as those skilled in the art will have variations in the scope of the specific embodiments according to the ideas of the present utility model, the present description should not be construed as limiting the present utility model in view of the above.
Claims (6)
1. The utility model provides a micro-nano bubble semiconductor device belt cleaning device which characterized in that: the device comprises a bubble generation device, a bubble shearing device and a pressurizing device, wherein the bubble generation device comprises a water storage cavity, a one-way valve, a pipeline type heating device and a pressurizing cavity, an inlet of the one-way valve is communicated with the water storage cavity, an inlet of the pipeline type heating device is connected with an outlet of the one-way valve, the pressurizing cavity is communicated with an outlet of the pipeline type heating device, a bubble output hole for outputting water in the pressurizing cavity is formed in the bottom of the pressurizing cavity, the bubble output hole is formed into a conical hole with a small upper end and a big lower end, and the bubble output hole is connected with a switching valve;
the switching valve comprises at least 2 switching outlets, wherein at least one switching outlet is connected with the bubble shearing device, at least one switching outlet is connected with the pressurizing device, the pressurizing device comprises two pressurizing assemblies, one pressurizing assembly is connected with the bubble shearing device, and one pressurizing assembly is connected with the switching outlet.
2. The micro-nano bubble semiconductor device cleaning apparatus according to claim 1, wherein: the supercharging assembly comprises a booster pump, an input pipe and an output pipe, wherein the input pipe and the output pipe are respectively connected with the booster pump, the output pipe comprises a first pipe body and a second pipe body which are connected with each other, the inner diameter of the first pipe body is larger than that of the second pipe body, the first pipe body is connected with the booster pump, and the second pipe body is connected with a nozzle.
3. The micro-nano bubble semiconductor device cleaning apparatus according to claim 1, wherein: the bubble shearing device comprises a rotor impeller, a guide pipe, an air access pipe and a liquid access pipe, wherein the air access pipe is connected with the liquid access pipe, the air access pipe is connected with the inner wall of the guide pipe, the liquid access pipe is respectively communicated with the guide pipe, and the liquid access pipe is connected with the switching outlet.
4. The micro-nano bubble semiconductor device cleaning apparatus according to claim 3, wherein: the rotor impeller comprises a rotating shaft and a plurality of blades connected to the rotating shaft, wherein the blades are in one of a single plate shape, an arc shape or a wing shape, and the rotating shaft is connected with a driving motor.
5. The micro-nano bubble semiconductor device cleaning apparatus according to claim 3, wherein: the air access pipe and the pipe wall of the liquid access pipe are provided with a plurality of through holes, and the through holes are communicated with the guide pipe.
6. The micro-nano bubble semiconductor device cleaning apparatus according to claim 1, wherein: the water inlet of the water storage cavity is connected with a gas-liquid mixing device for mixing gas and liquid with each other.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321395261.9U CN220111796U (en) | 2023-06-02 | 2023-06-02 | Micro-nano bubble semiconductor equipment cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321395261.9U CN220111796U (en) | 2023-06-02 | 2023-06-02 | Micro-nano bubble semiconductor equipment cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220111796U true CN220111796U (en) | 2023-12-01 |
Family
ID=88915604
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202321395261.9U Active CN220111796U (en) | 2023-06-02 | 2023-06-02 | Micro-nano bubble semiconductor equipment cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220111796U (en) |
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2023
- 2023-06-02 CN CN202321395261.9U patent/CN220111796U/en active Active
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