CN219977309U

CN219977309U - Device for measuring flatness of monocrystalline silicon piece

Info

Publication number: CN219977309U
Application number: CN202321019776.9U
Authority: CN
Inventors: 张靖; 方艺霖; 何飞
Original assignee: Yangzhou Yongxiang New Energy Technology Co ltd
Current assignee: Yangzhou Yongxiang New Energy Technology Co ltd
Priority date: 2023-05-03
Filing date: 2023-05-03
Publication date: 2023-11-07
Anticipated expiration: 2033-05-03

Abstract

The utility model discloses a device for measuring the flatness of a monocrystalline silicon wafer, which belongs to the technical field of flatness measurement of monocrystalline silicon wafers, and comprises a base, wherein a clamping mechanism comprises a bidirectional screw rod arranged in a cavity, one end of the bidirectional screw rod is connected with a bearing arranged on the left side wall in the cavity, the other end of the bidirectional screw rod penetrates through the right side wall in the cavity and is connected with a rotating plate arranged outside, sliding blocks are sleeved on the left and right outer walls of the bidirectional screw rod, clamping plates are arranged at the tops of two groups of sliding blocks, a fixing plate is arranged at the top of the base, a dial indicator is slidably connected in front of the fixing plate, and an adjusting mechanism is arranged at the top of the fixing plate; the position of the dial indicator can be adjusted under the action of the adjusting mechanism, so that the position of the dial indicator can be adjusted according to monocrystalline silicon wafers with different sizes.

Description

Device for measuring flatness of monocrystalline silicon piece

Technical Field

The utility model relates to the technical field of flatness measurement of monocrystalline silicon wafers, in particular to a device for measuring flatness of monocrystalline silicon wafers.

Background

The monocrystalline silicon wafer is a silicon monocrystal, is a crystal with a basically complete lattice structure, has different properties in different directions, is a good semiconductor material, has important influence on the properties of the monocrystalline silicon wafer, and after production, the flatness of the monocrystalline silicon wafer needs to be measured by using a measuring device.

Disclosure of Invention

The utility model aims to provide a device for measuring the flatness of a monocrystalline silicon piece, which is used for solving the problems in the background art.

In order to achieve the above purpose, the present utility model provides the following technical solutions: the utility model provides a device for measuring monocrystalline silicon piece roughness, includes the base, the base top is equipped with rotary mechanism, the base top is equipped with the hydraulic stem, and hydraulic stem one end is connected and is equipped with places the board, places the inside cavity of having seted up of board, is equipped with clamping mechanism in the cavity, clamping mechanism includes the two-way lead screw that is equipped with in the cavity, two-way lead screw one end is connected with the bearing that the left side wall was equipped with in the cavity, and the two-way lead screw other end runs through the cavity in the right side wall and is connected with the rotor plate that the outside was equipped with, the outer wall all cup joints about the two-way lead screw has been equipped with the slider, and two sets of slider tops all are equipped with the clamping plate, the base top is equipped with the fixed plate, and fixed plate front side sliding connection is equipped with the amesdial, the fixed plate top is equipped with adjustment mechanism.

Further, the rotating mechanism comprises a rotating shaft, wherein the top of the base is connected with the rotating shaft through a bearing, a driven gear is arranged at the top of the rotating shaft, a motor is arranged at the top of the base, a driving gear meshed with the driven gear is connected with the output end of the motor, and the bottom of the hydraulic rod is connected with the top of the driven gear.

Further, a limiting groove is formed in the inner bottom of the cavity, and limiting blocks matched with the limiting groove are arranged at the bottoms of the two groups of sliding blocks.

Further, a chute is formed in the top of the placement plate, and the two groups of sliding blocks are in sliding connection with the chute.

Further, adjustment mechanism includes the sliding plate that fixed plate top sliding connection was equipped with, the sliding plate left side wall is connected with the amesdial right side wall, the fixed plate top is equipped with the fixed block, and the lateral wall is equipped with electric telescopic handle behind the fixed block, and electric telescopic handle one end is connected with the sliding plate front side wall.

Further, the guide groove is formed in the top of the fixed plate, and a guide block matched with the guide groove is arranged at the inner top of the sliding plate.

Compared with the prior art, the utility model has the beneficial effects that: the utility model can clamp and fix monocrystalline silicon pieces with different sizes under the action of the clamping mechanism, so that when the monocrystalline silicon pieces are driven to rotate to measure flatness, the monocrystalline silicon pieces cannot displace, and the measurement accuracy is improved; the position of the dial indicator can be adjusted under the action of the adjusting mechanism, so that the position of the dial indicator can be adjusted according to monocrystalline silicon wafers with different sizes.

Drawings

FIG. 1 is a schematic diagram of the structure of the present utility model;

FIG. 2 is a right side view of the structure of the present utility model;

FIG. 3 is a schematic view of the internal structure of the cavity of the present utility model.

In the figure: 1. a base; 2. a fixing plate; 3. a rotating mechanism; 30. a driven gear; 31. a rotating shaft; 32. a motor; 33. a drive gear; 4. a hydraulic rod; 5. placing a plate; 6. a clamping mechanism; 60. a clamping plate; 61. a two-way screw rod; 62. a slide block; 63. a rotating plate; 64. a limiting block; 65. a limit groove; 7. a chute; 8. a dial gauge; 9. an adjusting mechanism; 90. a sliding plate; 91. an electric telescopic rod; 92. a fixed block; 10. a cavity.

Detailed Description

The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.

Example 1:

referring to fig. 1-3, the present utility model provides a technical solution: the utility model provides a device for measuring monocrystalline silicon piece roughness, including base 1, base 1 top is equipped with rotary mechanism 3, base 1 top is equipped with hydraulic stem 4, hydraulic stem 4 one end is connected and is equipped with places board 5, place the inside cavity 10 of having seted up of board 5, be equipped with clamping mechanism 6 in the cavity 10, clamping mechanism 6 includes the two-way lead screw 61 that is equipped with in the cavity 10, two-way lead screw 61 one end is connected with the bearing that left side wall was equipped with in the cavity 10, the other end of two-way lead screw 61 runs through the interior right side wall of cavity 10 and is connected with the rotor plate 63 that the outside was equipped with, slider 62 has all been cup jointed to two-way lead screw 61 left and right sides outer wall, spacing groove 65 has been seted up in the cavity 10, two sets of slider 62 bottoms all are equipped with spacing groove 65 assorted stopper 64, make slider 62 remove more stably at two-way lead screw 61 outer wall under the effect of spacing groove 65 and stopper 64, place board 5 top and set up spout 7 sliding connection, make slider 62 remove more stably under the effect of spout 7, two sets of slider 62 top all are equipped with clamping plate 60, base 1 top is equipped with fixed plate 2, fixed plate 2 is equipped with dial indicator 2 top 8, it is equipped with adjustment mechanism to sideslip 1 top.

Referring to fig. 1, the rotating mechanism 3 includes a rotating shaft 31 connected to the top of the base 1 through a bearing, a driven gear 30 is disposed at the top of the rotating shaft 31, a motor 32 is disposed at the top of the base 1, a driving gear 33 meshed with the driven gear 30 is connected to an output end of the motor 32, and the bottom of the hydraulic rod 4 is connected to the top of the driven gear 30.

Referring to fig. 2, the adjusting mechanism 9 includes a sliding plate 90 slidably connected to the top of the fixed plate 2, the sliding plate 90 is in an L-shaped configuration, a guiding slot is formed in the top of the fixed plate 2, a guiding block matched with the guiding slot is arranged at the top of the sliding plate 90, the sliding plate 90 moves more stably at the top of the fixed plate 2 under the action of the guiding slot and the guiding block, the left side wall of the sliding plate 90 is connected with the right side wall of the dial indicator 8, a fixed block 92 is arranged at the top of the fixed plate 2, an electric telescopic rod 91 is arranged on the rear side wall of the fixed block 92, and one end of the electric telescopic rod 91 is connected with the front side wall of the sliding plate 90.

Working principle: when the flatness of the monocrystalline silicon piece needs to be measured, the monocrystalline silicon piece is placed on the placement plate 5, then a worker rotates the rotation plate 63 to drive the bidirectional screw rod 61 to rotate, the sliding block 62 moves on the outer wall of the bidirectional screw rod 61 under the action of the limiting groove 65 and the limiting block 64, the sliding block 62 drives the clamping plate 60 to move, the clamping plate 60 clamps and fixes the monocrystalline silicon piece, then the hydraulic rod 4 drives the placement plate 5 to move upwards, so that the monocrystalline silicon piece is driven to move to be in contact with the bottom of the dial indicator 8, then the motor 32 drives the driving gear 33 to rotate, the driving gear 33 drives the driven gear 30 to rotate, the driven gear 30 drives the rotating shaft 31 to rotate, the rotating shaft 31 drives the placement plate 5 to rotate, the placement plate 5 drives the monocrystalline silicon piece to rotate, accordingly, the dial indicator 8 can measure the flatness of the monocrystalline silicon piece, when the position of the dial indicator 8 needs to be adjusted according to the size of the monocrystalline silicon piece, the sliding plate 90 drives the dial indicator 8 to move under the action of the electric telescopic rod 91, and accordingly the position of the dial indicator 8 can be adjusted.

Although embodiments of the present utility model have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the utility model, the scope of which is defined in the appended claims and their equivalents.

Claims

1. The utility model provides a device for measuring monocrystalline silicon piece roughness, includes base (1), its characterized in that: the top of the base (1) is provided with a rotating mechanism (3), a hydraulic rod (4) is arranged above the base (1), one end of the hydraulic rod (4) is connected with a placing plate (5), a cavity (10) is formed in the placing plate (5), a clamping mechanism (6) is arranged in the cavity (10), the clamping mechanism (6) comprises a bidirectional screw rod (61) arranged in the cavity (10), one end of the bidirectional screw rod (61) is connected with a bearing arranged on the left side wall in the cavity (10), the other end of the bidirectional screw rod (61) penetrates through the inner right side wall of the cavity (10) and is connected with a rotating plate (63) arranged outside, sliding blocks (62) are sleeved on the left outer wall and the right outer wall of the bidirectional screw rod (61), clamping plates (60) are arranged at the tops of the two groups of sliding blocks (62), a fixing plate (2) is arranged at the top of the base (1), a dial indicator (8) is arranged in sliding connection with the front side of the fixing plate (2), and an adjusting mechanism (9) is arranged at the top of the fixing plate (2).

2. An apparatus for measuring flatness of a silicon wafer according to claim 1, wherein: the rotating mechanism (3) comprises a rotating shaft (31) which is arranged at the top of the base (1) in a connecting mode through a bearing, a driven gear (30) is arranged at the top of the rotating shaft (31), a motor (32) is arranged at the top of the base (1), a driving gear (33) meshed with the driven gear (30) is arranged at the output end of the motor (32) in a connecting mode, and the bottom of the hydraulic rod (4) is connected with the top of the driven gear (30).

3. An apparatus for measuring flatness of a silicon wafer according to claim 1, wherein: limiting grooves (65) are formed in the inner bottoms of the cavities (10), and limiting blocks (64) matched with the limiting grooves (65) are arranged at the bottoms of the two groups of sliding blocks (62).

4. An apparatus for measuring flatness of a silicon wafer according to claim 1, wherein: the top of the placing plate (5) is provided with a sliding groove (7), and two groups of sliding blocks (62) are in sliding connection with the sliding groove (7).

5. An apparatus for measuring flatness of a silicon wafer according to claim 1, wherein: adjustment mechanism (9) are including fixed plate (2) top sliding connection's sliding plate (90) that are equipped with, sliding plate (90) left side wall is connected with amesdial (8) right side wall, fixed plate (2) top is equipped with fixed block (92), and fixed block (92) back lateral wall is equipped with electric telescopic handle (91), and electric telescopic handle (91) one end is connected with sliding plate (90) preceding lateral wall.

6. An apparatus for measuring flatness of a silicon wafer according to claim 5, wherein: the top of the fixed plate (2) is provided with a guide groove, and the top of the sliding plate (90) is provided with a guide block matched with the guide groove.