CN219950652U - Reaction device for dynamically treating chemical nickel wastewater - Google Patents
Reaction device for dynamically treating chemical nickel wastewater Download PDFInfo
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- CN219950652U CN219950652U CN202321360883.8U CN202321360883U CN219950652U CN 219950652 U CN219950652 U CN 219950652U CN 202321360883 U CN202321360883 U CN 202321360883U CN 219950652 U CN219950652 U CN 219950652U
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- 238000006243 chemical reaction Methods 0.000 title claims abstract description 117
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 81
- 239000000126 substance Substances 0.000 title claims abstract description 43
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 39
- 239000002351 wastewater Substances 0.000 title claims abstract description 36
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 97
- 239000002253 acid Substances 0.000 claims abstract description 45
- 238000010992 reflux Methods 0.000 claims abstract description 39
- 238000010521 absorption reaction Methods 0.000 claims abstract description 34
- 238000012544 monitoring process Methods 0.000 claims description 5
- 238000005260 corrosion Methods 0.000 claims description 4
- 230000007797 corrosion Effects 0.000 claims description 4
- 239000003344 environmental pollutant Substances 0.000 abstract description 8
- 231100000719 pollutant Toxicity 0.000 abstract description 8
- 239000007789 gas Substances 0.000 description 25
- 239000000243 solution Substances 0.000 description 8
- 239000003814 drug Substances 0.000 description 7
- XKMRRTOUMJRJIA-UHFFFAOYSA-N ammonia nh3 Chemical compound N.N XKMRRTOUMJRJIA-UHFFFAOYSA-N 0.000 description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- 230000009471 action Effects 0.000 description 4
- 238000009713 electroplating Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 3
- 239000005708 Sodium hypochlorite Substances 0.000 description 3
- 229910001453 nickel ion Inorganic materials 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 3
- 238000004065 wastewater treatment Methods 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000008139 complexing agent Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 239000002912 waste gas Substances 0.000 description 2
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 235000008733 Citrus aurantifolia Nutrition 0.000 description 1
- 235000011941 Tilia x europaea Nutrition 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000004571 lime Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- -1 organic matters Chemical compound 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- Removal Of Specific Substances (AREA)
Abstract
The utility model provides a reaction device for dynamically treating chemical nickel wastewater, which is characterized by comprising a reaction kettle and a gas absorption tank, wherein a water inlet pipe, a chemical adding pipe and an acid adding pipe are sequentially arranged on the top of the reaction kettle, which is close to one side of the gas absorption tank, in parallel; a water outlet pipe is arranged at the upper part of the kettle wall of one side of the reaction kettle far away from the gas absorption groove; a reflux water inlet pipe is arranged at the upper part of the kettle wall of the reaction kettle, which is close to one side of the gas absorption tank; a reflux water outlet pipe is arranged at the top of the reaction kettle at one side far away from the gas absorption tank; an air inlet pipe is arranged in the center of the top of the reaction kettle; the center of the bottom of the reaction kettle is provided with a vent pipeline; and a guide plate is arranged in the reaction kettle. The system can effectively solve the problems of incomplete reaction, easy secondary pollution, high operation cost and the like in the treatment of the chemical nickel wastewater while efficiently treating pollutants.
Description
Technical Field
The utility model relates to a reaction device, in particular to a reaction device for dynamically treating chemical nickel wastewater.
Background
Chemical nickel plating, also called electroless nickel plating, belongs to special electroplating, and refers to a process of reducing nickel ions into metallic nickel simple substance by using a reducing agent under high temperature condition and depositing the metallic nickel simple substance on the surface of a plated part, and is one of surface treatment technologies rapidly developed at home and abroad in recent years. The chemical nickel plating wastewater contains a large amount of nickel ions, organic matters, sodium hypophosphite, ammonia nitrogen, trace other metal impurities and the like, and has various pollutant types and complex components. Complexing agents such as ammonium citrate in the wastewater can also raise the ammonia nitrogen content in the wastewater, so that the wastewater treatment difficulty is further increased. Meanwhile, due to the fact that complexing agents exist in the chemical nickel wastewater, hydroxide cannot form precipitation with nickel ions, and therefore indexes of pollutants such as nickel, total phosphorus, ammonia nitrogen and the like in the effluent cannot meet discharge requirements of table 2 of electroplating pollutant discharge standards (GB 21900 2008).
Although there are many well-established reaction devices for chemical nickel wastewater treatment, these systems still have problems during operation: (1) ZL2018214303573 discloses a treatment device for chemical nickel wastewater, wherein a first reaction tank, a second reaction tank and a water tank are arranged in the device, the treatment process is completed through three tank bodies, the treatment process of the device is complex, the occupied area is large, and the operation complexity and the operation cost are increased; (2) ZL2021217784327 discloses a centralized treatment device for industrial production nickel-containing wastewater, and the device can realize that the whole reaction process is completed in the same tank body, but a reflux system is not arranged in the tank body, so that the problems of incomplete reaction and incomplete reaction can exist; (3) Most of the existing reaction devices for treating the chemical nickel wastewater are not provided with an exhaust gas collecting system, but a small amount of toxic exhaust gas can be generated in the actual reaction process, and secondary pollution is easily caused if the reaction devices are not treated, so that the human health is affected. The system combines the water quality characteristics of the chemical nickel wastewater, and develops the reaction device capable of dynamically treating the chemical nickel wastewater through equipment development, medicament optimization and operation parameter adjustment. The system can effectively solve the problems of incomplete reaction, easy secondary pollution, high operation cost and the like in the treatment of the chemical nickel wastewater while efficiently treating pollutants.
Disclosure of Invention
In order to solve the technical problems, the utility model provides a reaction device for dynamically treating chemical nickel wastewater, which adopts the following technical scheme:
the reaction device for dynamically treating the chemical nickel wastewater is characterized by comprising a reaction kettle and a gas absorption tank, wherein a water inlet pipe, a chemical adding pipe and an acid adding pipe are sequentially arranged on the kettle top of one side, close to the gas absorption tank, of the reaction kettle in parallel; a water outlet pipe is arranged at the upper part of the kettle wall of one side of the reaction kettle far away from the gas absorption groove; a reflux water inlet pipe is arranged at the upper part of the kettle wall of the reaction kettle, which is close to one side of the gas absorption tank; a reflux water outlet pipe is arranged at the top of the reaction kettle at one side far away from the gas absorption tank; an air inlet pipe is arranged in the center of the top of the reaction kettle; the center of the bottom of the reaction kettle is provided with a vent pipeline; and a guide plate is arranged in the reaction kettle.
Further, the water inlet pipe is provided with a water inlet pump and a water inlet valve; the dosing pipe is provided with a dosing pump and a dosing valve; an acid adding pump and an acid adding valve are arranged on the acid adding pipe; the water inlet pump, the dosing pump and the acid adding pump are all overcurrent corrosion-resistant pump bodies; and the reflux water inlet pipe is provided with a reflux pump and a reflux valve.
Further, the water inlet pipe, the medicine adding pipe and the acid adding pipe are all deep into the reaction kettle body for 150-250mm, and the distance between the water inlet pipe and the wall of the reaction kettle is 100-200mm; the dosing pipe is adjacent to the water inlet pipe, and the parallel distance is 100-200mm; the acid adding pipe is adjacent to the chemical adding pipe, and the parallel distance is 100-200mm; the distance between the reflux water outlet pipe and the wall of the reaction kettle is 200-400mm, and the distance between the reflux water outlet pipe and the wall of the reaction kettle is 100-200mm.
Further, the pipe orifice of the water outlet pipe is 250-400mm away from the top of the reaction kettle; the height of the pipe orifice of the backflow water inlet pipe is 100-200mm lower than that of the pipe orifice of the water outlet pipe.
Further, the air inlet pipe is communicated to the air absorption groove, and a breather valve is further arranged on the air inlet pipe.
Further, a vent valve is arranged on the vent pipeline.
Further, a pH meter is further arranged in the reaction kettle, and the pH meter can automatically control the start and stop of the acid adding pump according to the signal value of conversion monitoring.
Compared with the prior art, the utility model has the advantages that:
(1) The reflux system is additionally arranged in the reaction kettle, so that the reaction efficiency between the wastewater and the medicament is improved, and the wastewater treatment effect is further improved;
(2) The device ensures that harmful gases generated in the reaction process can be effectively collected and treated by adding the waste gas treatment system, thereby avoiding negative influence on the environment;
(3) The device can control the dosage of the medicament relatively accurately, reduce medicament waste and save medicament cost in the operation process;
(4) The device can ensure that the treated effluent stably reaches the standard, and the nickel, the total phosphorus and the ammonia nitrogen in the effluent all meet the discharge requirement of the table 2 of the discharge standard of electroplating pollutants (GB 21900 2008);
(5) The device is easy to realize automatic control or intelligent control through dynamic processing, is simple and convenient to operate, and reduces labor cost.
Drawings
FIG. 1 is a front view of the present utility model; fig. 2 is a top view of the present utility model.
The device comprises a 1-water inlet pump, a 2-water inlet valve, a 3-water inlet pipe, a 4-dosing pump, a 5-dosing valve, a 6-dosing pipe, a 7-acid adding pump, an 8-acid adding valve, a 9-acid adding pipe, a 10-backflow water inlet pipe, a 11-backflow water outlet pipe, a 12-backflow valve, a 13-gas absorption tank, a 14-backflow pump, a 15-breathing valve, a 16-air inlet pipe, a 17-pH meter, a 18-deflector, a 19-emptying valve, a 20-emptying pipeline, a 21-water outlet pipe and a 22-reaction kettle.
Detailed Description
The utility model is further illustrated and described below with reference to the drawings and detailed description.
As shown in fig. 1, the reaction device for dynamically treating chemical nickel wastewater provided by the utility model comprises a water inlet pump 1, a water inlet valve 2, a water inlet pipe 3, a dosing pump 4, a dosing valve 5, a dosing pipe 6, an acid adding pump 7, an acid adding valve 8, an acid adding pipe 9, a backflow water inlet pipe 10, a backflow water outlet pipe 11, a backflow valve 12, a gas absorption tank 13, a backflow pump 14, a breather valve 15, a gas inlet pipe 16, a pH meter 17, a guide plate 18, a vent valve 19, a vent pipeline 20, a water outlet pipe 21 and a reaction kettle 22.
The device comprises a reaction kettle 22 and a gas absorption tank 13, wherein a water inlet pipe 3, a dosing pipe 6 and an acid adding pipe 9 are sequentially arranged on the kettle top of one side, close to the gas absorption tank 13, of the reaction kettle 22 in parallel; a water outlet pipe 21 is arranged at the upper part of the kettle wall of the reaction kettle 22 at one side far away from the gas absorption groove 13; a reflux water inlet pipe 11 is arranged at the upper part of the kettle wall of the reaction kettle 22, which is close to one side of the gas absorption groove 13; a reflux water outlet pipe 11 is arranged at the top of the reaction kettle 22 at one side far away from the gas absorption tank 13; an air inlet pipe 16 is arranged in the center of the top of the reaction kettle 22; the center of the bottom of the reaction kettle 22 is provided with a vent pipeline 20; the reaction kettle 22 is internally provided with a guide plate 18.
The water inlet pipe 3 is provided with a water inlet pump 7 and a water inlet valve 2; the dosing pipe 6 is provided with a dosing pump 4 and a dosing valve 5; the acid adding pipe 9 is provided with an acid adding pump 7 and an acid adding valve 8; the water inlet pump 1, the dosing pump 4 and the acid adding pump 7 are all overcurrent corrosion-resistant pump bodies; the reflux inlet pipe 10 is provided with a reflux pump 14 and a reflux valve 12. The water inlet pipe 3, the dosing pipe 6 and the acid adding pipe 9 are all deep into the reaction kettle 22 body for 150-250mm, and the distance between the water inlet pipe 3 and the wall of the reaction kettle 22 is 100-200mm; the dosing tube 6 is adjacent to the water inlet tube 3, and the parallel distance is 100-200mm; the acid adding pipe 9 is adjacent to the chemical adding pipe 6, and the parallel distance is 100-200mm; the distance between the reflux water outlet pipe 11 and the wall of the reaction kettle 22 is 200-400mm, and the distance between the reflux water outlet pipe 11 and the wall of the reaction kettle 22 is 100-200mm. The pipe orifice of the water outlet pipe 21 is 250-400mm away from the top of the reaction kettle 22; the height of the nozzle of the backflow water inlet pipe 10 is 100-200mm lower than that of the water outlet pipe 21. The air inlet pipe 16 is communicated with the air absorption groove 13, and the air inlet pipe 16 is also provided with a breather valve 15. The vent pipe 20 is provided with a vent valve 19. The reaction kettle 22 is also internally provided with a pH meter 17, and the pH meter 17 can automatically control the start and stop of the acid adding pump 7 according to the signal value of conversion monitoring.
The processing flow of the system is as follows: the waste water enters the reaction kettle 22 through the water inlet pipe 3 under the action of the water inlet pump 1, the water inlet valve 2 is used for controlling the water inlet amount, the sodium hypochlorite solution (5-10%) enters the reaction kettle 22 through the dosing pipe 6 under the action of the dosing pump 4, the dosing valve 5 is used for controlling the dosing amount, the acid liquor (5-28% hydrochloric acid or 5-50% sulfuric acid) enters the reaction kettle 22 through the acid adding pipe 9 under the action of the acid adding pump 7, the acid adding valve 8 is used for controlling the acid adding amount, the pH meter in the reaction kettle 22 can automatically control the start and stop of the acid adding pump 7 according to the conversion monitoring value, so that the pH value in the reaction kettle 22 is controlled within the range of 5.0-7.0. In the reaction process, the sodium hypochlorite solution can react with the complex in the chemical nickel wastewater so as to achieve the purpose of breaking the complex, and meanwhile, the sodium hypochlorite solution also performs oxidation reaction with the hypophosphorous in the chemical nickel wastewater so as to convert the hypophosphorous into the orthophosphorous. During the reaction, the reflux system is synchronously started, the mixed solution returns to the reaction kettle 22 again through the reflux water inlet pipe 10 and the reflux water outlet pipe 11 under the action of the reflux pump 14, and the reflux valve 12 is used for controlling the reflux quantity. The baffle 18 within the reactor 22 prevents internal shut-off during operation of the reflux system. The waste gas generated in the reaction process comprises hypochlorous acid, chlorine and the like, and gradually accumulates in the reaction kettle 22, when the pressure in the reaction kettle 22 rises to a certain value, the breather valve 15 is pushed to be opened slowly, and the gas enters the gas absorption tank 13 for treatment through the gas inlet pipe 16, wherein the absorption liquid of the gas absorption tank 13 can be alkali liquor, lime and the like.
The existing reaction device for treating the chemical nickel wastewater has the problems of complex treatment flow, large occupied area, incomplete reaction, easy secondary pollution and the like. The utility model combines the water quality characteristics of the chemical nickel wastewater, and develops the reaction device capable of dynamically treating the chemical nickel wastewater through equipment development, medicament optimization and operation parameter adjustment. The system can effectively solve the problems in the treatment of the chemical nickel wastewater while efficiently treating pollutants.
Examples
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present utility model more apparent, the technical solutions of the embodiments of the present utility model will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present utility model, and it is apparent that the described embodiments are only some embodiments of the present utility model, not all embodiments of the present utility model.
By adopting the technical scheme, the reaction device for dynamically treating the chemical nickel wastewater is manufactured in a trial way, and as shown in fig. 1 and 2, the treatment object is the chemical nickel wastewater.
The device comprises a reaction kettle 22 and a gas absorption tank 13, wherein a water inlet pipe 3, a dosing pipe 6 and an acid adding pipe 9 are sequentially arranged on the kettle top of one side, close to the gas absorption tank 13, of the reaction kettle 22 in parallel; a water outlet pipe 21 is arranged at the upper part of the kettle wall of the reaction kettle 22 at one side far away from the gas absorption groove 13; a reflux water inlet pipe 11 is arranged at the upper part of the kettle wall of the reaction kettle 22, which is close to one side of the gas absorption groove 13; a reflux water outlet pipe 11 is arranged at the top of the reaction kettle 22 at one side far away from the gas absorption tank 13; an air inlet pipe 16 is arranged in the center of the top of the reaction kettle 22; the center of the bottom of the reaction kettle 22 is provided with a vent pipeline 20; the reaction kettle 22 is internally provided with a guide plate 18.
The water inlet pipe 3 is provided with a water inlet pump 7 and a water inlet valve 2; the dosing pipe 6 is provided with a dosing pump 4 and a dosing valve 5; the acid adding pipe 9 is provided with an acid adding pump 7 and an acid adding valve 8; the water inlet pump 1, the dosing pump 4 and the acid adding pump 7 are all overcurrent corrosion-resistant pump bodies; the reflux inlet pipe 10 is provided with a reflux pump 14 and a reflux valve 12. The water inlet pipe 3, the dosing pipe 6 and the acid adding pipe 9 are all deep into the reaction kettle 22 body by 200mm, and the distance between the water inlet pipe 3 and the wall of the reaction kettle 22 is 150mm; the dosing tube 6 is adjacent to the water inlet tube 3, and the parallel interval is 150mm; the acid adding pipe 9 is adjacent to the chemical adding pipe 6, and the parallel interval is 150mm; the distance between the reflux water outlet pipe 11 and the wall of the reaction kettle 22 is 300mm, and the distance between the reflux water outlet pipe 11 and the wall of the reaction kettle 22 is 150mm. The pipe orifice of the water outlet pipe 21 is 300mm away from the top of the reaction kettle 22; the height of the nozzle of the backflow water inlet pipe 10 is 150mm lower than that of the water outlet pipe 21. The air inlet pipe 16 is communicated with the air absorption groove 13, and the air inlet pipe 16 is also provided with a breather valve 15. The vent pipe 20 is provided with a vent valve 19. The reaction kettle 22 is also internally provided with a pH meter 17, and the pH meter 17 can automatically control the start and stop of the acid adding pump 7 according to the signal value of conversion monitoring.
When the device is used for treating chemical nickel wastewater, the quality of inlet water is shown in table 1, and the dynamic quality of outlet water is shown in table 2, so that the heavy metal removal rate reaches more than 99.9% after the treatment by the reaction device provided by the utility model, and the total nickel, total phosphorus and ammonia nitrogen in precipitated outlet water all meet the discharge requirements of the table 2 of the discharge standard of electroplating pollutants (GB 21900 2008).
TABLE 1 mean value of water quality of incoming water
| Ni(mg/L) | TP(mg/L) | NH 3 -N(mg/L) | pH |
| 481 | 639.5 | 650 | 2.1 |
TABLE 2 Water dynamic data
| Name of the name | Sample 1 | Sample 2 | Sample 3 | Sample 4 |
| Total nickel in effluent (mg/L) | 0.04 | 0.03 | 0.14 | 0.00 |
| Total phosphorus in effluent (mg/L) | 2.10 | 3.10 | 1.35 | 0.58 |
| Ammonia nitrogen in effluent (mg/L) | 0.00 | 0.00 | 0.00 | 0.00 |
The above examples are only intended to illustrate one embodiment of the present utility model, not to limit it. It should be noted that: modifications of the technical solutions described in the above embodiments or equivalent substitutions of some or all of the technical features thereof may be made by those skilled in the art; these modifications or substitutions do not depart from the essence of the corresponding technical solutions from the protection scope of the technical solutions of the present utility model. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
Claims (7)
1. The reaction device for dynamically treating the chemical nickel wastewater is characterized by comprising a reaction kettle and a gas absorption tank, wherein a water inlet pipe, a chemical adding pipe and an acid adding pipe are sequentially arranged on the kettle top of one side, close to the gas absorption tank, of the reaction kettle in parallel; a water outlet pipe is arranged at the upper part of the kettle wall of one side of the reaction kettle far away from the gas absorption groove; a reflux water inlet pipe is arranged at the upper part of the kettle wall of the reaction kettle, which is close to one side of the gas absorption tank; a reflux water outlet pipe is arranged at the top of the reaction kettle at one side far away from the gas absorption tank; an air inlet pipe is arranged in the center of the top of the reaction kettle; the center of the bottom of the reaction kettle is provided with a vent pipeline; and a guide plate is arranged in the reaction kettle.
2. The reaction device for dynamically treating chemical nickel wastewater according to claim 1, wherein a water inlet pump and a water inlet valve are arranged on the water inlet pipe; the dosing pipe is provided with a dosing pump and a dosing valve; an acid adding pump and an acid adding valve are arranged on the acid adding pipe; the water inlet pump, the dosing pump and the acid adding pump are all overcurrent corrosion-resistant pump bodies; and the reflux water inlet pipe is provided with a reflux pump and a reflux valve.
3. The reaction device for dynamically treating chemical nickel wastewater according to claim 1, wherein the water inlet pipe, the chemical adding pipe and the acid adding pipe are all deep into the reaction kettle body by 150-250mm, and the distance between the water inlet pipe and the wall of the reaction kettle is 100-200mm; the dosing pipe is adjacent to the water inlet pipe, and the parallel distance is 100-200mm; the acid adding pipe is adjacent to the chemical adding pipe, and the parallel distance is 100-200mm; the distance between the reflux water outlet pipe and the wall of the reaction kettle is 200-400mm, and the distance between the reflux water outlet pipe and the wall of the reaction kettle is 100-200mm.
4. The reaction device for dynamically treating chemical nickel wastewater according to claim 1, wherein the orifice of the water outlet pipe is 250-400mm away from the top of the reaction kettle; the height of the pipe orifice of the backflow water inlet pipe is 100-200mm lower than that of the pipe orifice of the water outlet pipe.
5. The reaction device for dynamically treating chemical nickel wastewater according to claim 1, wherein the air inlet pipe is communicated with the gas absorption tank, and a breather valve is further arranged on the air inlet pipe.
6. The reaction device for dynamically treating chemical nickel wastewater according to claim 1, wherein a vent valve is arranged on the vent pipeline.
7. The reaction device for dynamically treating chemical nickel wastewater according to claim 1, wherein a pH meter is further arranged in the reaction kettle, and the pH meter can automatically control the start and stop of an acid adding pump according to a signal value of conversion monitoring.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321360883.8U CN219950652U (en) | 2023-05-31 | 2023-05-31 | Reaction device for dynamically treating chemical nickel wastewater |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321360883.8U CN219950652U (en) | 2023-05-31 | 2023-05-31 | Reaction device for dynamically treating chemical nickel wastewater |
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| Publication Number | Publication Date |
|---|---|
| CN219950652U true CN219950652U (en) | 2023-11-03 |
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| CN202321360883.8U Active CN219950652U (en) | 2023-05-31 | 2023-05-31 | Reaction device for dynamically treating chemical nickel wastewater |
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| Country | Link |
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| CN (1) | CN219950652U (en) |
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