CN219830758U - Immersion device for antitarnish test - Google Patents
Immersion device for antitarnish test Download PDFInfo
- Publication number
- CN219830758U CN219830758U CN202320599372.5U CN202320599372U CN219830758U CN 219830758 U CN219830758 U CN 219830758U CN 202320599372 U CN202320599372 U CN 202320599372U CN 219830758 U CN219830758 U CN 219830758U
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- China
- Prior art keywords
- soaking
- tank
- test
- antitarnish
- electromagnetic valve
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- 238000007654 immersion Methods 0.000 title claims description 11
- 238000002791 soaking Methods 0.000 claims abstract description 74
- 239000012085 test solution Substances 0.000 claims abstract description 42
- 230000009471 action Effects 0.000 claims abstract description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 20
- 238000000034 method Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- 238000007598 dipping method Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000010865 sewage Substances 0.000 description 1
Abstract
The utility model discloses a soaking device for an antitarnish test, which belongs to the technical field of test and comprises a base, a clamp, a soaking tank and a PLC (programmable logic controller), wherein a rotating motor is arranged on the base; the clamp is connected with the working end of the rotating motor and can rotate under the action of the rotating motor, and is used for fixing the wafer sample; the soaking pool is arranged on one side of the base and positioned below the clamp and is used for containing test solution; when the clamp rotates, the wafer sample can be driven to rotate and enter a soaking tank for soaking; the PLC is connected with the rotating motor, and the rotating speed of the rotating motor can be controlled, so that the rotating time of the wafer sample in the soaking tank is the soaking time. The device passes through the rotational speed of PLC controller control rotation motor for disk sample rotates a week and is 1min, and the rotation time in test solution is 10~15s, and the device has reduced working strength, reduces the experimental error because of the experimenter brings, improves the accuracy of test result.
Description
Technical Field
The utility model relates to the technical field of test and test, in particular to a soaking device for an antitarnish test.
Background
The procedure for the antitarnish test (GB 17168-2013) is: placing two disc-shaped samples with the diameter of 10+/-1 mm and the thickness of 0.5+0.1 mm into a soaking device, using 1000mL of solution, keeping the temperature at 23+/-2 ℃, and soaking the samples into the test solution for 10-15 s per minute for 72+/-1 h; and (3) replacing the test solution at 24+/-1 h and 48+/-1 h, taking out the sample from the soaking device after 72+/-1 h, thoroughly washing the sample with water, soaking the sample in ethanol, taking out the sample, and drying the sample by using sewage oil-free compressed air. The soaking time of the existing soaking device is not well controlled, and the solution is inconvenient to replace, so that the labor intensity of experimenters is high.
Disclosure of Invention
Based on the above, the utility model provides a soaking device for an antitarnish test, which controls the rotating speed of a rotating motor through a PLC (programmable logic controller) to enable a wafer sample to rotate for 1min for 10-15 s in a test solution, namely, immersing the sample in the test solution for 10-15 s per minute; the device can automatically control the soaking time of the wafer sample, reduce the working strength of experimenters, reduce experimental errors caused by the experimenters, and improve the accuracy of test results.
The technical scheme adopted by the utility model is as follows:
a soaking device for an antitarnish test comprising:
a base on which a rotation motor is provided;
the clamp is connected with the working end of the rotating motor and can rotate under the action of the rotating motor and is used for fixing the wafer sample;
the soaking tank is arranged on one side of the base and positioned below the clamp and is used for containing test solution; the clamp can drive the wafer sample to rotate when rotating, and the wafer sample enters a soaking tank for soaking;
and the PLC is connected with the rotating motor and can control the rotating speed of the rotating motor, so that the rotating time of the wafer sample in the soaking tank is soaking time.
In the soaking device disclosed by the utility model, the clamp comprises:
the connecting rod is connected with the working end of the rotating motor;
the fixing frame is arranged on the connecting rod, forms an L shape with the connecting rod and is used for fixing the wafer sample.
In the soaking device disclosed by the utility model, the length of the connecting rod is adjustable.
In the soaking device disclosed by the utility model, the fixing frame comprises a plurality of clamping plates, and the wafer sample is positioned between two adjacent clamping plates and is fastened by bolts.
In the soaking device disclosed by the utility model, a temperature sensor and a heater are arranged in the soaking tank, and the temperature sensor and the heater are connected with a PLC (programmable logic controller).
In the soaking device disclosed by the utility model, the bottom of the soaking tank is provided with the liquid discharge pipe, the liquid discharge pipe is provided with the first electromagnetic valve, and the first electromagnetic valve is connected with the PLC.
In the soaking device disclosed by the utility model, a test solution feeding pipe is further arranged on the soaking tank, and the test solution feeding pipe is connected with a test solution barrel; the test solution feeding pipe is provided with a second electromagnetic valve, and the second electromagnetic valve is connected with the PLC.
In the soaking device disclosed by the utility model, the soaking tank is also provided with a water inlet pipe, and the water inlet pipe is connected with the water storage tank; the water inlet pipe is provided with a third electromagnetic valve, and the third electromagnetic valve is connected with the PLC.
In the soaking device disclosed by the utility model, an ethanol pipe is further arranged on the soaking tank, and the ethanol pipe is connected with an ethanol storage tank; the ethanol pipe is provided with a fourth electromagnetic valve which is connected with the PLC.
Compared with the prior art, the utility model has the beneficial effects that:
the soaking device is simple in structure and convenient to operate, the rotating speed of the rotating motor is controlled through the PLC controller, the wafer sample rotates for 1min for one circle, and the rotating time in the test solution is 10-15 s, namely, the sample is soaked in the test solution for 10-15 s per minute; the device can automatically control the soaking time of the wafer sample, reduce the working strength of experimenters, reduce experimental errors caused by the experimenters, and improve the accuracy of test results.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the drawings required for the description of the embodiments will be briefly described below, and it is apparent that the drawings in the following description are only some embodiments of the present utility model, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic view of a soaking device for an antitarnish test;
fig. 2 is a schematic diagram of a soaking device for the tarnish resistance test.
Reference numerals:
10. a base; 11. a rotating motor;
20. a clamp; 21. a connecting rod; 22. a clamping plate;
30. a soaking pool; 31. a liquid discharge pipe; 32. a first electromagnetic valve; 33. a test solution feed tube; 34. a second electromagnetic valve; 35. a water inlet pipe; 36. a third electromagnetic valve; 37. an ethanol pipe; 38. and a fourth electromagnetic valve.
Detailed Description
In order that the above objects, features and advantages of the utility model will be readily understood, a more particular description of the utility model will be rendered by reference to the appended drawings. It is to be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the utility model. It should be further noted that, for convenience of description, only some, but not all of the structures related to the present utility model are shown in the drawings. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
The terms "comprising" and "having" and any variations thereof herein are intended to cover a non-exclusive inclusion. For example, a process, method, system, article, or apparatus that comprises a list of steps or elements is not limited to only those listed steps or elements but may include other steps or elements not listed or inherent to such process, method, article, or apparatus.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this utility model belongs. The terminology used in the description of the utility model herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the utility model. The term "and/or" as used herein includes any and all combinations of one or more of the associated listed items.
Reference in the specification to "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment may be included in at least one embodiment of the utility model. The appearances of such phrases in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments. Those of skill in the art will explicitly and implicitly appreciate that the embodiments described herein may be combined with other embodiments.
Referring to fig. 1-2, an embodiment of the present utility model provides a soaking device for an antitarnish test, including:
a base 10 on which a rotation motor 11 is provided.
The clamp 20 is connected with the working end of the rotating motor 11, can rotate under the action of the rotating motor 11 and is used for fixing the wafer sample.
The soaking tank 30 is arranged on one side of the base 10 and is positioned below the clamp 20 and used for containing test solution. The clamp 20 rotates to drive the wafer sample to rotate and enter the soaking tank 30 for soaking.
A PLC controller (not shown) is connected to the rotation motor 11, and controls the rotation speed of the rotation motor 11 so that the rotation time of the wafer sample in the soak tank 30 is the soak time.
During operation, the wafer sample is fixed on the clamp 20, the rotating motor 11 is started, the rotating motor 11 drives the clamp 20 to rotate, the rotating speed of the rotating motor 11 is controlled by the PLC controller, the wafer sample rotates for 1min for one circle, the rotating time in the test solution is 10-15 s, and the sample is immersed in the test solution for 10-15 s every minute. The device can automatically control the soaking time of the wafer sample, reduce the working strength of experimenters, reduce experimental errors caused by the experimenters, and improve the accuracy of test results.
In one embodiment, the clamp 20 includes a connecting rod 21 and a fixing frame, and the connecting rod 21 is connected to a working end of the rotating motor 11. The fixing frame is arranged on the connecting rod 21, forms an L shape with the connecting rod 21 and is used for fixing the wafer sample.
Specifically, the length of the connecting rod 21 is adjustable, and the position of the wafer sample in the soaking tank 30 can be adjusted.
Specifically, the holder includes a plurality of clamping plates 22, and the wafer sample is positioned between two adjacent clamping plates 22 and fastened by bolts.
In one embodiment, a temperature sensor and a heater are provided within the steeping vat 30, the temperature sensor and the heater being connected to the PLC controller. The temperature sensor is used to monitor the temperature of the test solution in the dipping tank 30, and the heater is used to heat the test solution in the dipping tank 30 so that the temperature of the test solution is maintained at 23 + -2 deg.c.
In one embodiment, the bottom of the soaking tank 30 is provided with a drain pipe 31, and the drain pipe 31 is provided with a first electromagnetic valve 32, and the first electromagnetic valve 32 is connected with the PLC. When the test solution needs to be replaced at 24+ -1 h and 48+ -1 h, the PLC controller opens the first electromagnetic valve 32 to discharge the test solution in the dipping tank 30.
Specifically, the soaking tank 30 is further provided with a test solution feeding pipe 33, and the test solution feeding pipe 33 is connected with a test solution barrel. The test solution feeding pipe 33 is provided with a second electromagnetic valve 34, and the second electromagnetic valve 34 is connected with the PLC. After the test solution in the soaking tank 30 is discharged, the PLC controller closes the first electromagnetic valve 32 and opens the second electromagnetic valve 34, so that fresh test solution can be placed in the soaking tank 30, and the liquid exchange is realized.
Specifically, the soaking tank 30 is further provided with a water inlet pipe 35, and the water inlet pipe 35 is connected with the water storage tank. The water inlet pipe 35 is provided with a third electromagnetic valve 36, and the third electromagnetic valve 36 is connected with the PLC. After the soaking is finished, the third electromagnetic valve 36 is opened, and the cleaning water in the water inlet pipe 35 enters the soaking tank 30 to clean the wafer sample.
Specifically, the soaking tank 30 is further provided with an ethanol pipe 37, and the ethanol pipe 37 is connected with an ethanol storage tank. The ethanol pipe 37 is provided with a fourth electromagnetic valve 38, and the fourth electromagnetic valve 38 is connected with the PLC. After the water washing is finished, the fourth electromagnetic valve 38 is opened, and the ethanol enters the soaking tank 30 to soak the wafer sample.
The working mode of the soaking device for the antitarnish test is as follows:
during operation, a wafer sample is fixed on the clamp 20, the rotating motor 11 is started, the rotating motor 11 drives the clamp 20 to rotate, the rotating speed of the rotating motor 11 is controlled by the PLC controller, the wafer sample rotates for 1min for one circle, the rotating time in a test solution is 10-15 s, namely, the sample is immersed in the test solution for 10-15 s per minute; when the test solution needs to be replaced in 24+/-1 h and 48+/-1 h, the PLC controller opens the first electromagnetic valve 32, so that the test solution in the soaking tank 30 can be discharged, then closes the first electromagnetic valve 32, opens the second electromagnetic valve 34, and can put fresh test solution into the soaking tank 30 to realize the replacement of the test solution; at 72+ -1 h, turning off the rotary motor 11 to enable the wafer sample to be positioned in the soaking tank 30, opening the first electromagnetic valve 32 to discharge the test solution in the soaking tank 30, opening the third electromagnetic valve 36, and enabling the cleaning water in the water inlet pipe 35 to enter the soaking tank 30 to clean the wafer sample; after the water washing is finished, the fourth electromagnetic valve 38 is opened, and the ethanol enters the soaking tank 30 to soak the wafer sample.
Based on the above embodiments, the immersion device for antitarnish test according to the embodiments of the present utility model has the following advantages: the device has a simple structure and is convenient to operate, the rotating speed of the rotating motor 11 is controlled by the PLC controller, so that the wafer sample rotates for 1min for one circle, and the rotating time in the test solution is 10-15 s, namely, the sample is immersed in the test solution for 10-15 s per minute; the device can automatically control the soaking time of the wafer sample, reduce the working strength of experimenters, reduce experimental errors caused by the experimenters, and improve the accuracy of test results.
The above is only a preferred embodiment of the present utility model, and is not intended to limit the present utility model, but various modifications and variations can be made to the present utility model by those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present utility model should be included in the protection scope of the present utility model.
Claims (9)
1. An immersion apparatus for an antitarnish test comprising:
a base on which a rotation motor is provided;
the clamp is connected with the working end of the rotating motor and can rotate under the action of the rotating motor and is used for fixing the wafer sample;
the soaking tank is arranged on one side of the base and positioned below the clamp and is used for containing test solution; the clamp can drive the wafer sample to rotate when rotating, and the wafer sample enters a soaking tank for soaking;
and the PLC is connected with the rotating motor and can control the rotating speed of the rotating motor, so that the rotating time of the wafer sample in the soaking tank is soaking time.
2. The immersion device for an antitarnish test according to claim 1, wherein said jig comprises:
the connecting rod is connected with the working end of the rotating motor;
the fixing frame is arranged on the connecting rod, forms an L shape with the connecting rod and is used for fixing the wafer sample.
3. The immersion device for an antitarnish test according to claim 2, wherein the length of said connecting rod is adjustable.
4. The immersion device for an antitarnish test according to claim 2, wherein said holder includes a plurality of clamping plates, said wafer specimen being positioned between adjacent two of said clamping plates and being fastened by bolts.
5. The immersion device for the antitarnish test according to claim 1, wherein a temperature sensor and a heater are arranged in the immersion tank, and the temperature sensor and the heater are connected with a PLC.
6. The soaking device for antitarnish test according to claim 1, wherein a drain pipe is provided at the bottom of the soaking tank, a first electromagnetic valve is provided on the drain pipe, and the first electromagnetic valve is connected with a PLC controller.
7. The immersion apparatus for an antitarnish test according to claim 6, wherein a test solution feed pipe is further provided on the immersion tank, and the test solution feed pipe is connected to a test solution tank; the test solution feeding pipe is provided with a second electromagnetic valve, and the second electromagnetic valve is connected with the PLC.
8. The soaking device for the tarnish resistance test according to claim 1, wherein a water inlet pipe is further arranged on the soaking tank, and the water inlet pipe is connected with the water storage tank; the water inlet pipe is provided with a third electromagnetic valve, and the third electromagnetic valve is connected with the PLC.
9. The soaking device for the antitarnish test according to claim 1, wherein an ethanol pipe is further arranged on the soaking tank, and the ethanol pipe is connected with an ethanol storage tank; the ethanol pipe is provided with a fourth electromagnetic valve which is connected with the PLC.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320599372.5U CN219830758U (en) | 2023-03-24 | 2023-03-24 | Immersion device for antitarnish test |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320599372.5U CN219830758U (en) | 2023-03-24 | 2023-03-24 | Immersion device for antitarnish test |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN219830758U true CN219830758U (en) | 2023-10-13 |
Family
ID=88251905
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202320599372.5U Active CN219830758U (en) | 2023-03-24 | 2023-03-24 | Immersion device for antitarnish test |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN219830758U (en) |
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2023
- 2023-03-24 CN CN202320599372.5U patent/CN219830758U/en active Active
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