CN219800792U - Wet cleaning equipment for semiconductor wafer production - Google Patents
Wet cleaning equipment for semiconductor wafer production Download PDFInfo
- Publication number
- CN219800792U CN219800792U CN202321006806.2U CN202321006806U CN219800792U CN 219800792 U CN219800792 U CN 219800792U CN 202321006806 U CN202321006806 U CN 202321006806U CN 219800792 U CN219800792 U CN 219800792U
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- China
- Prior art keywords
- fixedly connected
- cleaning
- box
- semiconductor wafer
- wet cleaning
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- 238000004140 cleaning Methods 0.000 title claims abstract description 103
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 23
- 239000004065 semiconductor Substances 0.000 title claims abstract description 18
- 239000007788 liquid Substances 0.000 claims abstract description 38
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- 239000002699 waste material Substances 0.000 claims description 9
- 238000001802 infusion Methods 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 7
- 239000000243 solution Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 3
- 239000011550 stock solution Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model relates to the field of photovoltaic equipment and discloses wet cleaning equipment for semiconductor wafer production, which comprises a workbench, wherein a cleaning box is fixedly connected to the middle of the workbench, the top surface of the workbench is fixedly connected to the bottom surface of a support, a hydraulic rod is fixedly connected to the bottom surface of the middle of the support, the bottom end of a rotating shaft is fixedly connected to the top surface of a box cover, a cleaning box is arranged at the bottom of the box cover, and spring locks are fixedly connected to both sides of the middle of the cleaning box and the box cover. According to the utility model, the cleaning box can be driven to rotate in the cleaning liquid by the driving motor, the cleaning liquid is driven to roll and mix in the cleaning box, the surface of the wafer is flushed by the movement of the cleaning liquid, the effect of cleaning the wafer is achieved, the cleaning box is driven to ascend by driving the hydraulic rod, and the residual cleaning liquid on the surface of the wafer is spin-dried by the centrifugal force caused by the rotation of the cleaning box, so that the use is convenient, and meanwhile, the production efficiency can be improved.
Description
Technical Field
The utility model relates to the field of photovoltaic equipment, in particular to wet cleaning equipment for semiconductor wafer production.
Background
The wafer is a silicon wafer used for manufacturing a silicon semiconductor integrated circuit, the currently used wafer cleaning equipment has lower cleaning efficiency, cleaning liquid remained on the surface of the wafer cannot be dried after cleaning, and the cleaning production efficiency is lower.
Disclosure of Invention
The utility model aims to solve the defects in the prior art and provides wet cleaning equipment for semiconductor wafer production.
In order to achieve the above purpose, the present utility model adopts the following technical scheme: the utility model provides a semiconductor wafer production wet cleaning equipment, includes the workstation, the middle part fixedly connected with washs the case of workstation, the top surface fixedly connected with of workstation is in the bottom surface of support, the middle part bottom surface fixedly connected with hydraulic stem of support, the output fixedly connected with fixed block of hydraulic stem, the bottom surface fixedly connected with motor of fixed block, the output fixedly connected with axis of rotation of motor, the bottom fixedly connected with of axis of rotation is at the top surface of lid, the bottom of lid is provided with the cleaning box, the equal fixedly connected with spring lock catch in middle part both sides of cleaning box and lid, the inside fixedly connected with wafer draw-in groove of cleaning box, the bottom fixedly connected with fluid-discharge tube of washs the bottom of case, the top one side fixedly connected with transfer line of cleaning the case.
As a further description of the above technical solution:
the bottom of the cleaning box is provided with a waste liquid box.
As a further description of the above technical solution:
one end of the infusion tube is fixedly connected to the output end of the water pump, and the bottom surface of the water pump is fixedly connected to the top surface of the liquid storage barrel.
As a further description of the above technical solution:
the middle part of the top surface of the workbench is rotationally connected with a cover plate.
As a further description of the above technical solution:
one side of the middle part of the workbench is fixedly connected to one side of the hinge, and the other side of the hinge is fixedly connected with one side of the cover plate.
As a further description of the above technical solution:
the top one side fixedly connected with handle of apron, the apron is provided with two, two the through-hole has been seted up at the middle part of apron.
As a further description of the above technical solution:
the inner wall both sides of wasing the case all fixedly connected with backup pad, the bottom surface setting of apron is in the top surface of backup pad.
The utility model has the following beneficial effects:
1. according to the utility model, the cleaning box can be driven to rotate in the cleaning liquid by the driving motor, the cleaning liquid is driven to roll and mix in the cleaning box, the surface of the wafer is flushed by the movement of the cleaning liquid, the effect of cleaning the wafer is achieved, the cleaning box is driven to ascend by driving the hydraulic rod, and the residual cleaning liquid on the surface of the wafer is spin-dried by the centrifugal force caused by the rotation of the cleaning box, so that the use is convenient, and meanwhile, the production efficiency can be improved.
2. According to the utility model, waste liquid in the cleaning box can be discharged through the liquid discharge pipe, the water pump is driven, and cleaning liquid in the liquid storage barrel is conveyed into the cleaning box, so that the effect of convenient replacement is achieved, and the cover plate is closed, so that the problem that residual cleaning liquid can be thrown out of the cleaning box when a wafer is spin-dried, and the trouble is brought to workers can be avoided.
Drawings
FIG. 1 is a schematic diagram of an overall structure of a wet cleaning apparatus for semiconductor wafer production according to the present utility model;
FIG. 2 is a partial exploded view of a wet cleaning apparatus for semiconductor wafer production according to the present utility model;
fig. 3 is a schematic view of a part of a wet cleaning apparatus for semiconductor wafer production according to the present utility model.
Legend description:
1. a work table; 2. a cleaning box; 3. a bracket; 4. a fixed block; 5. a hydraulic rod; 6. a motor; 7. a rotating shaft; 8. a box cover; 9. a cleaning box; 10. a spring lock catch; 11. a cover plate; 12. a through hole; 13. a hinge; 14. a handle; 15. a liquid discharge pipe; 16. a waste liquid tank; 17. a liquid storage barrel; 18. a water pump; 19. an infusion tube; 20. a support plate; 21. wafer clamping groove.
Detailed Description
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
Referring to fig. 1-3, one embodiment provided by the present utility model is: the utility model provides a semiconductor wafer production wet cleaning equipment, including workstation 1, the middle part fixedly connected with washs case 2 of workstation 1, the top surface fixedly connected with of workstation 1 is in the bottom surface of support 3, the middle part bottom surface fixedly connected with hydraulic stem 5 of support 3, the output fixedly connected with fixed block 4 of hydraulic stem 5, the bottom surface fixedly connected with motor 6 of fixed block 4, the output fixedly connected with axis of rotation 7 of motor 6, the bottom fixedly connected with of axis of rotation 7 is at the top surface of lid 8, the bottom of lid 8 is provided with washs box 9, the equal fixedly connected with spring lock catch 10 in the middle part both sides of washs box 9 and lid 8, the inside fixedly connected with wafer draw-in groove 21 of washs the bottom fixedly connected with fluid-discharge tube 15 of case 2, the top one side fixedly connected with transfer line 19 of washs case 2.
When the cleaning box 9 is used, the spring lock catch 10 is opened, the cleaning box 9 can be taken down, a wafer to be cleaned is placed in the wafer clamping groove 21, the wafer is fixed in the cleaning box 9, the cleaning box 9 and the box cover 8 are fixed through the spring lock catch, the driving hydraulic rod 5 drives the cleaning box 9 to descend, the cleaning box 9 is placed in the cleaning box 2, the driving motor 6 drives the cleaning box 9 to rotate in cleaning liquid, the cleaning box 9 can rotate in the cleaning liquid to drive the cleaning liquid in the cleaning box 2 to roll and mix, the surface of the wafer is flushed through the movement of the cleaning liquid, the cleaning effect is improved, after the cleaning is finished, the driving hydraulic rod 5 drives the cleaning box 9 to ascend, and when the cleaning box 9 exposes the surface of the cleaning liquid, the cleaning box 9 can spin-dry the residual cleaning liquid on the surface of the wafer through the centrifugal force caused by the rotation, the use convenience is achieved, and the production efficiency is improved.
The bottom of wasing case 2 is provided with waste liquid case 16, the one end fixed connection of transfer line 19 is at the output of water pump 18, the bottom surface fixed connection of water pump 18 is at the top surface of stock solution bucket 17, the top surface middle part of workstation 1 rotates and is connected with apron 11, middle part one side fixed connection of workstation 1 is in one side of hinge 13, one side of the opposite side fixed connection apron 11 of hinge 13, the top one side fixedly connected with handle 14 of apron 11, apron 11 is provided with two, through-hole 12 has been seted up at the middle part of two apron 11, the equal fixedly connected with backup pad 20 in inner wall both sides of wasing case 2, the bottom surface setting of apron 11 is at the top surface of backup pad 20.
Through the fluid-discharge tube 15 of wasing 2 bottoms, can be with wasing the inside waste liquid of 2 to waste liquid incasement 16, because of the bottom connection at the input of water pump 18 of transfer line 19, so can drive water pump 18 carry the inside cleaning solution of stock solution bucket 17 to wasing 2 inside, reach the effect of being convenient for change, when driving motor 6 drives wash box 9 and spin-dry, can close the apron 11 at workstation 1 top, avoid the cleaning solution to be got rid of to wash 2 outsides, bring the trouble for the staff.
Working principle: when the cleaning box 9 is used, the spring lock catch 10 is opened, the cleaning box 9 can be taken down, a wafer to be cleaned is placed in the wafer clamping groove 21, the wafer is fixed in the cleaning box 9, the cleaning box 9 and the box cover 8 are fixed through the spring lock catch, the driving hydraulic rod 5 drives the cleaning box 9 to descend, the cleaning box 9 is placed in the cleaning box 2, the driving motor 6 drives the cleaning box 9 to rotate in cleaning liquid, the cleaning box 9 can rotate in the cleaning liquid to drive the cleaning liquid in the cleaning box 2 to roll and mix, the surface of the wafer is flushed through the movement of the cleaning liquid, the cleaning effect is improved, after the cleaning is finished, the driving hydraulic rod 5 drives the cleaning box 9 to ascend, and when the cleaning box 9 exposes the surface of the cleaning liquid, the cleaning box 9 can spin-dry the residual cleaning liquid on the surface of the wafer through the centrifugal force caused by the rotation, the use convenience is achieved, and the production efficiency is improved. Through the fluid-discharge tube 15 of wasing 2 bottoms, can be with wasing the inside waste liquid of 2 to waste liquid incasement 16, because of the bottom connection at the input of water pump 18 of transfer line 19, so can drive water pump 18 carry the inside cleaning solution of stock solution bucket 17 to wasing 2 inside, reach the effect of being convenient for change, when driving motor 6 drives wash box 9 and spin-dry, can close the apron 11 at workstation 1 top, avoid the cleaning solution to be got rid of to wash 2 outsides, bring the trouble for the staff.
Finally, it should be noted that: the foregoing description is only illustrative of the preferred embodiments of the present utility model, and although the present utility model has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments described, or equivalents may be substituted for elements thereof, and any modifications, equivalents, improvements or changes may be made without departing from the spirit and principles of the present utility model.
Claims (7)
1. The wet cleaning equipment for semiconductor wafer production comprises a workbench (1), and is characterized in that: the utility model discloses a cleaning box for the medical equipment, including workstation (1), top surface fixedly connected with washs case (2) in the middle part of workstation (1), the bottom surface at support (3) of top surface fixedly connected with, the middle part bottom surface fixedly connected with hydraulic stem (5) of support (3), the output fixedly connected with fixed block (4) of hydraulic stem (5), the bottom surface fixedly connected with motor (6) of fixed block (4), the output fixedly connected with axis of rotation (7) of motor (6), the bottom fixedly connected with of axis of rotation (7) is at the top surface of lid (8), the bottom of lid (8) is provided with washs box (9), equal fixedly connected with spring lock catch (10) in the middle part both sides of washs box (9) and lid (8), the inside fixedly connected with wafer draw-in groove (21) of wasing the bottom fixedly connected with fluid-discharge tube (15) of case (2), top one side fixedly connected with transfer line (19) of wasing case (2).
2. The semiconductor wafer manufacturing wet cleaning apparatus of claim 1, wherein: the bottom of the cleaning box (2) is provided with a waste liquid box (16).
3. The semiconductor wafer manufacturing wet cleaning apparatus of claim 1, wherein: one end of the infusion tube (19) is fixedly connected with the output end of the water pump (18), and the bottom surface of the water pump (18) is fixedly connected with the top surface of the liquid storage barrel (17).
4. The semiconductor wafer manufacturing wet cleaning apparatus of claim 1, wherein: the middle part of the top surface of the workbench (1) is rotationally connected with a cover plate (11).
5. The semiconductor wafer manufacturing wet cleaning apparatus according to claim 4, wherein: one side of the middle part of the workbench (1) is fixedly connected to one side of the hinge (13), and the other side of the hinge (13) is fixedly connected to one side of the cover plate (11).
6. The semiconductor wafer manufacturing wet cleaning apparatus according to claim 4, wherein: the novel cover plate is characterized in that handles (14) are fixedly connected to one side of the top of the cover plate (11), two cover plates (11) are arranged, and through holes (12) are formed in the middle of the two cover plates (11).
7. The semiconductor wafer manufacturing wet cleaning apparatus of claim 6, wherein: the inner wall both sides of wasing case (2) are all fixedly connected with backup pad (20), the bottom surface setting of apron (11) is in the top surface of backup pad (20).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321006806.2U CN219800792U (en) | 2023-04-28 | 2023-04-28 | Wet cleaning equipment for semiconductor wafer production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321006806.2U CN219800792U (en) | 2023-04-28 | 2023-04-28 | Wet cleaning equipment for semiconductor wafer production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN219800792U true CN219800792U (en) | 2023-10-03 |
Family
ID=88187900
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202321006806.2U Active CN219800792U (en) | 2023-04-28 | 2023-04-28 | Wet cleaning equipment for semiconductor wafer production |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN219800792U (en) |
-
2023
- 2023-04-28 CN CN202321006806.2U patent/CN219800792U/en active Active
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