CN219631271U - Polysilicon cold hydrogenation production system - Google Patents
Polysilicon cold hydrogenation production system Download PDFInfo
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- CN219631271U CN219631271U CN202320178077.2U CN202320178077U CN219631271U CN 219631271 U CN219631271 U CN 219631271U CN 202320178077 U CN202320178077 U CN 202320178077U CN 219631271 U CN219631271 U CN 219631271U
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- China
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- pipe
- heat exchanger
- polysilicon
- production system
- leaching
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 29
- 238000005984 hydrogenation reaction Methods 0.000 title claims abstract description 24
- 229910021420 polycrystalline silicon Inorganic materials 0.000 title claims abstract description 24
- 229920005591 polysilicon Polymers 0.000 title claims abstract description 23
- 238000005406 washing Methods 0.000 claims abstract description 49
- 239000007789 gas Substances 0.000 claims abstract description 38
- 238000011084 recovery Methods 0.000 claims abstract description 27
- 238000002386 leaching Methods 0.000 claims abstract description 25
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000005049 silicon tetrachloride Substances 0.000 claims abstract description 18
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 17
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 17
- 239000001257 hydrogen Substances 0.000 claims abstract description 16
- 239000006200 vaporizer Substances 0.000 claims abstract description 9
- 239000002002 slurry Substances 0.000 claims description 15
- 239000007788 liquid Substances 0.000 claims description 11
- 238000005201 scrubbing Methods 0.000 claims description 11
- 239000002893 slag Substances 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 230000001105 regulatory effect Effects 0.000 claims description 7
- 238000001816 cooling Methods 0.000 claims description 6
- 238000012856 packing Methods 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 235000013312 flour Nutrition 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 33
- 239000011863 silicon-based powder Substances 0.000 abstract description 33
- 239000000945 filler Substances 0.000 abstract description 14
- 238000004804 winding Methods 0.000 abstract description 10
- 230000007246 mechanism Effects 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 239000012535 impurity Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 229910001510 metal chloride Inorganic materials 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000005046 Chlorosilane Substances 0.000 description 3
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- 238000011143 downstream manufacturing Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 2
- 239000005052 trichlorosilane Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/10—Process efficiency
Landscapes
- Silicon Compounds (AREA)
Abstract
The utility model discloses a polysilicon cold hydrogenation production system, which relates to the technical field of polysilicon production and comprises a reactor, a winding heat exchanger, a plate-type washing tower, a filler washing tower and a heat recovery heat exchanger which are sequentially connected, wherein a silicon powder inlet pipe and a mixed gas inlet pipe are arranged on the reactor, an electric heater, the winding heat exchanger, a vaporizer, the heat recovery heat exchanger and a mixer are sequentially arranged on the mixed gas inlet pipe, a silicon tetrachloride inlet pipe and a hydrogen inlet pipe are arranged on the mixer, the lower part of the filler washing tower is connected with a leaching main pipe, the leaching main pipe is connected with a washing tower circulating pump, a first leaching pipe and a second leaching pipe, the first leaching pipe is connected with the upper end of the plate-type washing tower, and the second leaching pipe is connected with the upper end of the filler washing tower. The utility model has the advantages of reduced equipment investment, high heat recovery and reduced production cost.
Description
Technical Field
The utility model relates to the technical field of polysilicon production, in particular to a polysilicon cold hydrogenation production system.
Background
In the production process of the polysilicon, a large amount of byproducts are silicon tetrachloride in reaction products, the output ratio of the polysilicon to the silicon tetrachloride is about 1:15-1:20, and the silicon tetrachloride is basically treated in China at present and is recycled through a cold hydrogenation fluidized bed reactor.
The main flow process of cold hydrogenation is that silicon tetrachloride liquid and preheated hydrogen enter a fluidized bed reactor, are heated and vaporized to 170 ℃ by external steam, enter an electric heater according to a certain proportion, are heated to 600 ℃ and enter hydrogen to react with silicon powder, reaction gas contains about 25% of trichlorosilane, 75% of silicon tetrachloride and a small amount of silicon powder solid particles, silicon powder is separated by a cyclone separator, gas phase high-temperature gas (about 530 ℃) of part of silicon powder enters a venturi scrubber, a separation tank (the gas phase outlet temperature of the separation tank is 260 ℃) and a washing tower (the washing tower outlet temperature is 180 ℃) in sequence, and then the chlorosilane liquid is obtained by sequentially passing through a circulating water cooler, an intermediate heat exchanger and a terminal Freon deep cooler and then is sent to a downstream process.
The heating energy consumption in the method is higher, mainly an electric heater, the gas-phase leaching dedusting effect of the materials is poorer, the silicon powder content in the condensate is higher, the silicon powder in the gas phase at low temperature is easy to adhere to a heat exchanger tube bundle due to physical characteristics to influence the heat exchange effect, the consumption of the raw material silicon powder is larger, the silicon powder in the high-temperature gas phase of the materials is poor in controllability along with process fluctuation, the leached and washed silicon powder cannot be recycled due to the fact that the leached and washed silicon powder contains a large amount of chlorosilane, the silicon powder is neutralized and hydrolyzed through a slag-slurry process, and the primary investment cost of the device is higher. And a trace of chlorosilane gas remains in the hydrolyzed waste solid slag to pollute the environment. The silicon powder remained in the hydrogenation condensate is more in the downstream process, and the running period of equipment and devices is short.
The Chinese patent with the publication number of CN216273132U and the publication date of 2022.04.12 discloses a polysilicon cold hydrogenation production system which comprises a liquid-gas mixing mechanism, a fluidized bed reaction mechanism, a heat exchanger and a secondary silicon powder filtering component; the liquid-gas mixing mechanism is connected with the fluidized bed reaction mechanism and is used for mixing and heating silicon tetrachloride and high-pressure hydrogen and then delivering the silicon tetrachloride and the high-pressure hydrogen to the fluidized bed reaction mechanism; the fluidized bed reaction mechanism is used for receiving the silicon tetrachloride and the high-pressure hydrogen mixed by the liquid-gas mixing mechanism, and adding silicon powder into the silicon powder component for reaction to generate trichlorosilane; the heat exchanger is arranged at the output end of the liquid-gas mixing mechanism and is connected with the output end of the fluidized bed reaction mechanism after passing through heat exchanger equipment, and is used for heating the material gas output by the liquid-gas mixing mechanism; the second-level silica powder filtering component is connected with the output end of the fluidized bed reaction mechanism after passing through the heat exchange heat exchanger and is used for further treating the fine silica powder in the gas phase discharged by the fluidized bed reaction mechanism after passing through the heat exchange heat exchanger. However, the system still has the defects of large equipment investment, small heat recovery amount, high production cost and the like.
Disclosure of Invention
The utility model aims to solve the problems of large equipment investment, small heat recovery amount and high production cost, and provides a polysilicon cold hydrogenation production system. The utility model has the advantages of reduced equipment investment, high heat recovery and reduced production cost.
The utility model aims at realizing the following technical scheme:
the utility model provides a cold hydrogenation production system of polycrystalline silicon, includes reactor, wound heat exchanger, plate-type scrubbing tower, filler scrubbing tower and heat recovery heat exchanger that link to each other in proper order, be provided with silica flour on the reactor and advance pipe and gas mixture and advance the pipe, gas mixture advances to have set gradually electric heater, wound heat exchanger, vaporizer, heat recovery heat exchanger and blender on the pipe, be provided with silicon tetrachloride on the blender and advance pipe and hydrogen and advance the pipe, filler scrubbing tower below links to each other with the drip washing house steward, drip washing house steward links to each other with scrubbing tower circulating pump, first drip washing pipe and second drip washing pipe, first drip washing pipe links to each other with plate-type scrubbing tower upper end, the second drip washing pipe links to each other with filler scrubbing tower upper end.
Preferably, the vaporizer adopts a U-shaped tube heat exchanger.
Preferably, the heat recovery heat exchanger is a tube array heat exchanger.
Preferably, a slag slurry outlet pipe is arranged below the plate type washing tower.
Preferably, the slurry outlet pipe is connected with a slurry buffer tank.
Preferably, the heat recovery heat exchanger is connected with the water-cooling heat exchanger through an air outlet pipe.
Preferably, the second leaching pipe is also connected with a product liquid inlet pipe.
Preferably, the first leaching pipe, the second leaching pipe and the product liquid inlet pipe are all provided with regulating valves.
The beneficial effects of this technical scheme are as follows:
1. according to the polysilicon cold hydrogenation production system provided by the utility model, silicon powder enters a reactor through a silicon powder inlet pipe, hydrogen and tetrachlorosilane are mixed by a mixer and then preheated by a heat recovery heat exchanger, gasified by a carburetor and then enter a winding heat exchanger for secondary heating, finally heated by an electric heater and then enter the reactor, silicon powder and mixed gas (mixed gas of hydrogen and silicon tetrachloride) react to obtain industrial gas, the industrial gas is cooled by the winding heat exchanger and then enters a plate-type washing tower to remove impurities such as silicon powder and metal chloride, and then enters a filler washing tower for secondary washing, and the industrial gas after secondary washing is cooled again by the heat recovery heat exchanger. The utility model has the advantages of reduced equipment investment, high heat recovery and reduced production cost.
2. According to the polysilicon cold hydrogenation production system provided by the utility model, impurities such as silicon powder and the like are discharged out of the plate-type washing tower through the slag slurry outlet pipe after being washed by the plate-type washing tower, and the impurities such as the silicon powder and the like are introduced into the slag slurry buffer tank.
3. According to the polysilicon cold hydrogenation production system provided by the utility model, the product liquid enters the filler washing tower to play a role in washing and a cooling effect.
4. According to the polysilicon cold hydrogenation production system provided by the utility model, the setting of the regulating valve is convenient for regulating the washing amount in the plate type washing tower and the filler washing tower.
Drawings
FIG. 1 is a schematic diagram of the structure of the present utility model;
wherein: 1. a reactor; 2. a wound heat exchanger; 3. a plate-type washing tower; 4. a packed scrubber; 5. a heat recovery heat exchanger; 6. feeding silicon powder into a tube; 7. a mixed gas inlet pipe; 8. an electric heater; 10. a vaporizer; 12. a mixer; 13. feeding silicon tetrachloride into a pipe; 14. a hydrogen inlet pipe; 15. a leaching main pipe; 16. a scrubber circulation pump; 17. a first leaching tube; 18. a second leaching tube; 19. a slag slurry outlet pipe; 20. an air outlet pipe; 21. a product liquid inlet pipe; 22. and (3) regulating the valve.
Detailed Description
The present utility model will be described in further detail with reference to examples, but embodiments of the present utility model are not limited thereto.
It is noted that when an element is referred to as being "mounted," "secured," or "disposed" on another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or intervening elements may also be present.
It should be noted that, in the embodiments of the present utility model, terms such as left, right, up, and down are merely relative concepts or references to normal use states of the product, and should not be construed as limiting.
Example 1
As shown in fig. 1, the polysilicon cold hydrogenation production system comprises a reactor 1, a winding heat exchanger 2, a plate type washing tower 3, a filler washing tower 4 and a heat recovery heat exchanger 5 which are sequentially connected, wherein a silicon powder inlet pipe 6 and a mixed gas inlet pipe 7 are arranged on the reactor 1, an electric heater 8, the winding heat exchanger 2, a vaporizer 10, the heat recovery heat exchanger 5 and a mixer 12 are sequentially arranged on the mixed gas inlet pipe 7, a silicon tetrachloride inlet pipe 13 and a hydrogen inlet pipe 14 are arranged on the mixer 12, the lower part of the filler washing tower 4 is connected with a leaching header pipe 15, the leaching header pipe 15 is connected with a washing tower circulating pump 16, a first leaching pipe 17 and a second leaching pipe 18, the first leaching pipe 17 is connected with the upper end of the plate type washing tower 3, and the second leaching pipe 18 is connected with the upper end of the filler washing tower 4. The silicon powder enters the reactor 1 through the silicon powder inlet pipe 6, hydrogen and tetrachlorosilane are mixed by the mixer 12 and then preheated by the heat recovery heat exchanger 5, gasified by the gasifier 10 and then enter the winding heat exchanger 2 for secondary heating, finally heated by the electric heater 8 and then enter the reactor 1, the silicon powder and mixed gas (mixed gas of hydrogen and tetrachlorosilane) react to obtain industrial gas, the industrial gas is cooled by the winding heat exchanger 2 and then enters the plate type washing tower 3 to remove impurities such as silicon powder and metal chloride and then enters the filler washing tower 4 for secondary washing, and the gas after secondary washing is cooled again by the heat recovery heat exchanger 5. The utility model has the advantages of reduced equipment investment, high heat recovery and reduced production cost.
Example 2
The difference between this embodiment and embodiment 1 is that: the vaporizer 10 adopts a U-shaped tube heat exchanger, and the heat recovery heat exchanger 5 adopts a shell and tube heat exchanger.
Wherein, a slag slurry outlet pipe 19 is arranged below the plate type washing tower 3.
Wherein the slurry outlet pipe 19 is connected with a slurry buffer tank. Impurities such as silicon powder and the like are discharged out of the plate type washing tower 3 through a slag slurry outlet pipe 19 after being washed by the plate type washing tower 3, and the impurities such as silicon powder and the like are introduced into a slag slurry buffer tank.
Wherein, the heat recovery heat exchanger 5 is connected with the water-cooling heat exchanger through an air outlet pipe 20.
Wherein the second leaching pipe 18 is also connected with a product liquid inlet pipe 21. The product liquid enters the packing washing tower 4 to play a role in washing and a role in cooling.
Wherein, the first leaching pipe 17, the second leaching pipe 18 and the product liquid inlet pipe 21 are all provided with regulating valves 22. The setting of the regulating valve 22 facilitates the regulation of the washing amounts in the plate washer 3 and the packed washer 4.
Silicon tetrachloride at 50 ℃ is sent into a mixer 12 from a silicon tetrachloride tank area through a silicon tetrachloride high-pressure pump, hydrogen at 60-70 ℃ is sent into the mixer 12 from a hydrogen buffer tank through a hydrogen compressor, the temperature of the mixed material is 43-53 ℃, the mixed material is heated to 141-151 ℃ through a heat recovery heat exchanger 5, then the mixed material is gasified into mixed gas (the temperature is 160-180 ℃) through a vaporizer 10, the mixed gas is heated again through a winding heat exchanger 2 (the temperature is 490-510 ℃) and then heated again through an electric heater 8 for three times (the temperature at the moment is 550-570 ℃) and then enters the reactor 1, the silicon powder reacts with the mixed gas to obtain chloride (the temperature at the moment is 550-560 ℃), the industrial gas containing the silicon powder and the metal chloride serves as a heat source of the winding heat exchanger 2, the chloride is cooled (the temperature at the moment is 190-210 ℃) and then enters a plate-type washing tower 3 to remove impurities such as the silicon powder and the metal chloride (the temperature at the moment is 150-170 ℃), the temperature at the moment enters the filler washing tower 4 again for washing and cooling (the temperature at the moment is 146-156 ℃)), and the industrial gas is cooled again serves as the heat source for the heat recovery heat exchanger 5-95 ℃).
Under the process flow, the high-temperature gas coming out of the top of the packing washing tower 4 can be reduced to 85 ℃ at the minimum. For a single set of system with 105t/h of designed silicon tetrachloride feeding amount, the steam consumption of the original process flow is about 8 tons/h, and the steam consumption can be reduced to 3 tons/h after the improved process flow is used. The 10 cold hydrogenation lines can save 5940 ten thousand yuan/year calculated by steam 150 yuan/ton. The circulating water load of the single system after transformation is 1700KW, and the circulating water load before transformation is 4245KW, so that the load of the circulating water system is greatly reduced.
The foregoing description is only a preferred embodiment of the present utility model, and is not intended to limit the present utility model in any way, and any simple modification, equivalent variation, etc. of the above embodiment according to the technical matter of the present utility model fall within the scope of the present utility model.
Claims (8)
1. A cold hydrogenation production system for polysilicon, which is characterized in that: including reactor (1), wound heat exchanger (2), plate-type scrubbing tower (3), packing scrubbing tower (4) and heat recovery heat exchanger (5) that link to each other in proper order, be provided with silica flour on reactor (1) and advance pipe (6) and gas mixture and advance pipe (7), electric heater (8), wound heat exchanger (2), vaporizer (10), heat recovery heat exchanger (5) and blender (12) have been set gradually on gas mixture advances pipe (7), be provided with silicon tetrachloride on blender (12) and advance pipe (13) and hydrogen and advance pipe (14), packing scrubbing tower (4) below links to each other with drip washing house steward (15), house steward (15) link to each other with wash tower circulating pump (16), first drip wash pipe (17) and second drip wash pipe (18), first drip wash pipe (17) link to each other with plate-type scrubbing tower (3) upper end, second drip wash pipe (18) link to each other with packing scrubbing tower (4) upper end.
2. A cold hydrogenation production system for polysilicon according to claim 1, wherein: the vaporizer (10) adopts a U-shaped tube heat exchanger.
3. A cold hydrogenation production system for polysilicon according to claim 2, wherein: the heat recovery heat exchangers (5) are all tube type heat exchangers.
4. A cold hydrogenation production system for polysilicon according to claim 3, wherein: a slag slurry outlet pipe (19) is arranged below the plate type washing tower (3).
5. A polysilicon cold hydrogenation production system according to claim 4, wherein: the slurry outlet pipe (19) is connected with the slurry buffer tank.
6. A polysilicon cold hydrogenation production system according to claim 5, wherein: the heat recovery heat exchanger (5) is connected with the water-cooling heat exchanger through an air outlet pipe (20).
7. A polysilicon cold hydrogenation production system according to claim 6, wherein: the second leaching pipe (18) is also connected with a product liquid inlet pipe (21).
8. A polysilicon cold hydrogenation production system according to claim 7, wherein: and regulating valves (22) are arranged on the first leaching pipe (17), the second leaching pipe (18) and the product liquid inlet pipe (21).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320178077.2U CN219631271U (en) | 2023-02-10 | 2023-02-10 | Polysilicon cold hydrogenation production system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320178077.2U CN219631271U (en) | 2023-02-10 | 2023-02-10 | Polysilicon cold hydrogenation production system |
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| Publication Number | Publication Date |
|---|---|
| CN219631271U true CN219631271U (en) | 2023-09-05 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202320178077.2U Active CN219631271U (en) | 2023-02-10 | 2023-02-10 | Polysilicon cold hydrogenation production system |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117550611A (en) * | 2023-11-07 | 2024-02-13 | 宁夏润阳硅材料科技有限公司 | Cold hydrogenation fluidization system with stable temperature and load |
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2023
- 2023-02-10 CN CN202320178077.2U patent/CN219631271U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117550611A (en) * | 2023-11-07 | 2024-02-13 | 宁夏润阳硅材料科技有限公司 | Cold hydrogenation fluidization system with stable temperature and load |
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