CN219609434U - Photomask for preparing metal mask plate - Google Patents
Photomask for preparing metal mask plate Download PDFInfo
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- CN219609434U CN219609434U CN202321237939.0U CN202321237939U CN219609434U CN 219609434 U CN219609434 U CN 219609434U CN 202321237939 U CN202321237939 U CN 202321237939U CN 219609434 U CN219609434 U CN 219609434U
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Abstract
The utility model discloses a photomask for preparing a metal mask plate, which relates to the field of mask plate preparation and comprises a body, wherein the body comprises an effective area and a transition area arranged outside the effective area; an inner etching line connecting the effective area and the transition area is formed on the inner side of the transition area, and an outer etching line is formed on the outer side of the transition area; wherein the width of the inner etching line is larger than the width of the outer etching line. The width of the inner etching line generated on the metal foil by the photomask is larger than that of the outer etching line, and the inner etching line on the metal foil close to the effective area is etched first, so that the effective area of the metal foil is not easily scratched by the transition area.
Description
Technical Field
The utility model relates to the technical field of mask plate preparation, in particular to a photomask for preparing a metal mask plate.
Background
The OLED is an organic light emitting diode, and has advantages of light weight, wide viewing angle, fast response time, low temperature resistance, high luminous efficiency, etc., compared with a liquid crystal display, and is regarded as a next generation new display technology. The organic electroluminescent film is generally prepared by vacuum thermal evaporation technology, namely, an organic semiconductor material is heated in a vacuum environment, the material is sublimated by heating, an organic film device stack structure with a designed shape is formed on the surface of a substrate through a metal mask plate with a special sub-pixel pattern, the organic film device stack structure is subjected to continuous deposition of various materials to form a film, and an anode and a cathode are respectively plated at two ends of the stack structure, so that the OLED light-emitting device structure with a plurality of layers of films can be formed. During the evaporation process, a metal mask is required to deposit the light emitting layer of the OLED device.
The existing mask plate manufacturing methods include etching method, electroforming method and the like. Among them, the etching method is most widely used for manufacturing precision metal mask plates. When the method is used for manufacturing the metal mask plate, the pattern on the photomask is formed on the metal foil through an etching process, so the photomask is an important tool for manufacturing the mask plate through the etching process.
The effective area of the photomask is provided with a pattern to be generated on the metal foil, and the pattern is formed by arranging a plurality of light-transmitting through holes. After the pattern is generated on the metal foil (i.e. the effective area of the metal foil is formed), the metal foil with the pattern needs to be separated to obtain the finished metal mask plate. In order to facilitate separation of the metal mask plate and the metal foil, a transition region is generally arranged at the outer side of the effective region of the photomask in the related art, and the transition region is also formed at the outer side of the effective region of the metal foil when the metal mask plate is manufactured, and the metal foil and the metal mask plate with patterns can be separated after the transition region of the metal foil is etched. However, in the process of etching the transition region of the metal foil, the transition region of the metal foil can swing due to the flowing of etching liquid, and one side of the transition region, which is close to the effective region of the metal foil, is very easy to scratch the effective region during swinging, so that the yield of the finished metal mask plate is low.
Disclosure of Invention
The present utility model aims to solve one of the technical problems in the related art to a certain extent. Therefore, the utility model provides the photomask for preparing the metal mask plate, and the prepared metal mask plate has high yield.
In order to achieve the above purpose, the utility model adopts the following technical scheme:
the photomask for preparing the metal mask plate comprises a body, wherein the body comprises an effective area and a transition area arranged outside the effective area; an inner etching line connecting the effective area and the transition area is formed on the inner side of the transition area, and an outer etching line is formed on the outer side of the transition area; wherein the width of the inner etching line is larger than the width of the outer etching line.
The photomask disclosed by the utility model is used for preparing a metal mask plate. The preparation method of the metal mask plate comprises the following steps:
s1, selecting a metal foil, treating the surface of the metal foil, and removing pollutants and an oxide layer on the surface of the metal foil to obtain a metal foil with a clean surface;
s2, applying photoresist; applying photoresist on opposite sides of the surface-treated metal foil;
s3, exposing; placing the metal foil with the photoresist on an exposure machine, and projecting a pattern to be manufactured on the photoresist by light irradiated by the exposure machine through the photomask;
s4, developing; developing the exposed metal foil with the photoresist, and accurately manufacturing a required pattern on the photoresist; when the photoresist is negative photoresist, the exposed metal foil with the negative photoresist is soaked in a developing solution, the part which is subjected to the photoreaction is solidified and remains, the part which is not subjected to the photoreaction is dissolved by the developing solution, and the projected pattern appears on the remaining negative photoresist; when the photoresist is positive photoresist, the exposed metal foil with the positive photoresist is soaked in a developing solution, the part which is not subjected to photoreaction is solidified and remained, the part which is subjected to photoreaction is dissolved by the developing solution, and the projected pattern appears on the remained positive photoresist;
s5, wet etching; etching the metal foil, wherein the part of the metal foil which is not covered by the photoresist is contacted with etching liquid and etched, and after etching, the pattern on the photoresist is etched on the metal foil to form a corresponding through hole pattern;
s6, photoresist is removed.
The mask is a critical tool for the fabrication of metal masks. In the utility model, the main body of the photomask comprises an effective area with patterns and a transition area arranged outside the effective area, after the exposure step of S3, the effective area and the transition area on the photomask are formed on a metal foil with photoresist, namely the effective area and the transition area are also formed on the metal foil, and the effective area of the metal foil is the metal mask plate to be manufactured. The size of the metal foil is larger than the size of the metal mask plate to be manufactured, so that the metal foil comprises redundant inactive areas in addition to active areas and transition areas. The invalid region is formed on the outer side of the transition region, and after the transition region is separated from the metal foil by etching, the effective region is naturally separated from the metal foil, so that the finished metal mask plate can be obtained.
In the photomask provided by the utility model, the inner etching line and the outer etching line are respectively formed on the inner side and the outer side of the transition region, so that the transition region with the inner etching line and the outer etching line is also formed on the metal foil with the photoresist after exposure. The inner etched line is connected with the effective area of the metal foil, and the outer etched line is connected with the ineffective area of the metal foil. It should be noted that, the length of the inner etched line should be consistent with the length of the inner edge of the transition region, and the length of the outer etched line should be consistent with the length of the outer edge of the transition region, so that the transition region can be separated from the metal foil by etching the inner etched line and the outer etched line of the metal foil with photoresist.
In addition, the width of the inner etching line is larger than that of the outer etching line, so that the etching line formed on the metal foil is also larger than that of the outer etching line. When etching the metal foil, the inner etched line area is wider than the outer etched line area, the exchange ratio of ions in the etching solution to the inner etched line is faster than the exchange ratio with the outer etched line, and the inner etched line with a large width is etched preferentially. The inner etched line side of the transition region is separated from the active region, and the outer etched line side is still connected with the inactive region of the metal foil, and the transition region is separated from the active region but not from the inactive region. Under the interference of the ineffective area, the transition area cannot scratch the effective area due to the flowing of the etching liquid, so that the edge of the effective area is prevented from being damaged. And the width of the inner etching line is increased, so that a larger gap exists between the transition area and the effective area after the inner etching line is etched, the edge of the transition area is further prevented from being contacted with the edge of the effective area, and the yield of metal mask plate production is improved.
Optionally, the width of the inner etching line is 80-150 μm, and the width of the outer etching line is 10-50 μm. The width of the outer etching line is smaller than that of the inner etching line, the inner etching line can be etched first, the gap between the transition area and the effective area after etching is also increased, the effective area is not easily scratched by the transition area, and the yield of the manufactured metal mask plate is improved.
Optionally, the transition region is further formed with a separation etching line, and two ends of the separation etching line are respectively connected with the outer etching line and the inner etching line. The dividing etching line divides the transition area into a plurality of small areas, and the small areas can be completely separated from the metal foil by only etching the dividing etching line without etching the whole transition area, so that the transition area is faster to separate from the metal foil. It should be noted that, the dividing etching line refers to an etching line intersecting both the outer etching line and the inner etching line, and not to an etching line along a certain direction, and any etching line having two ends connected to the outer etching line and the inner etching line and dividing the transition region into a plurality of small regions is included in the scope of the present utility model.
Optionally, the transition region is configured as a racetrack ring, and the inner etched line and the outer etched line enclose the transition region. The two ends of the transition area are provided with arc structures, and the inner etching line and the outer etching line are intersected at the two ends of the transition area and enclose to form a closed transition area.
Optionally, the transition region is configured as a rectangle, and the inner etching line and the outer etching line are disposed in parallel. The two ends of the transition area are provided with rectangular structures, and the ends of the inner etching line and the outer etching line are connected through the longitudinal etching line and are enclosed to form a closed transition area. In addition, when the length of the transition area is equal to that of the metal foil, only the inner etching line and the outer etching line which are parallel can exist, and the transition area is not required to be enclosed into a closed area to be etched.
Optionally, the effective area and the transition area are integrally formed. The photomask is integrally formed, and the effective area and the transition area are made of the same material. Of course, the transition zone may also be fixed outside the active zone by welding or the like.
Optionally, the effective area is configured as a rectangle, and the transition areas are arranged at two sides of the effective area. And when the photomask is used for manufacturing the metal mask plate, rectangular effective areas are formed on the metal foil with the photoresist, transition areas are arranged on two sides of the effective areas, and the rectangular metal mask plate is obtained after the transition areas are etched.
Optionally, the effective area is configured as a circle, and the transition area is disposed along a circumferential direction of the effective area. The transition zone is arranged around the active zone, i.e. the transition zone is configured as a ring. And (3) manufacturing a metal mask plate by using the photomask, and etching the transition region to obtain the round metal mask plate from the metal foil.
1. The photomask provided by the utility model is provided with the effective area and the transition area, and the effective area and the transition area which are the same as those on the photomask can be formed on the metal foil with the photoresist when the photomask is used for producing a metal mask plate. In addition, the size of the metal foil is larger than that of the metal mask plate to be manufactured, so that the metal foil is also provided with an ineffective area positioned outside the transition area, namely the transition area on the metal foil is positioned between the effective area and the ineffective area, the effective area and the ineffective area of the metal foil can be separated by etching the transition area positioned in the middle, and the effective area is the metal mask plate to be manufactured.
2. The transition area on the photomask is provided with an inner etching line and an outer etching line, so that the outer etching line and the inner etching line can be formed on the metal foil with the photoresist, the inner etching line is connected with the effective area of the metal foil, and the outer etching line is connected with the ineffective area of the metal foil. Etching the inner and outer etch lines away to separate the transition region from the metal foil. The width of the inner etching line is larger than that of the outer etching line, so that after the inner etching line is etched, the distance between the inner etching line and the effective area of the metal foil is larger, and the transition area is not easy to scratch and rub to the effective area under the flowing of etching liquid.
3. Because the width of the inner etching line is larger than that of the outer etching line, the probability of the ion reaction between the inner etching line and the etching solution is larger, so that the inner etching line is etched preferentially, when one side of the etching line in the transition region is separated from the effective region, one side of the outer etching line is still connected with the ineffective region, the transition region cannot contact the effective region under the interference of the ineffective region, and the yield of the manufactured metal mask plate is improved.
These features and advantages of the present utility model will be disclosed in more detail in the following detailed description and the accompanying drawings. The best mode or means of the present utility model will be described in detail with reference to the accompanying drawings, but is not limited to the technical scheme of the present utility model. In addition, these features, elements, and components are shown in plural in each of the following and drawings, and are labeled with different symbols or numerals for convenience of description, but each denote a component of the same or similar construction or function.
Drawings
The utility model is further described below with reference to the accompanying drawings:
FIG. 1 is a diagram showing the combination of a mask and a metal foil in example 1 of the present utility model;
FIG. 2 is a schematic diagram of a mask according to embodiment 1 of the present utility model;
FIG. 3 is a schematic diagram of the structure shown at A in FIG. 2;
FIG. 4 is a diagram showing the combination of a mask and a metal foil in example 2 of the present utility model;
fig. 5 is a schematic diagram of a photomask according to embodiment 2 of the present utility model.
1, a photomask; 11. a body; 111. an effective area; 112. a transition zone; 1121. an inner etching line; 1122. an outer etch line; 1123. dividing the etching line; 2. and (5) a metal foil.
Detailed Description
Embodiments of the present utility model are described in detail below, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to like or similar elements or elements having like or similar functions throughout. The examples in the embodiments are intended to illustrate the present utility model and are not to be construed as limiting the present utility model.
Reference in the specification to "one embodiment" or "an example" means that a particular feature, structure, or characteristic described in connection with the embodiment itself can be included in at least one embodiment of the present patent disclosure. The appearances of the phrase "in one embodiment" in various places in the specification are not necessarily all referring to the same embodiment.
Example 1:
as shown in fig. 1 and 2, the present embodiment provides a photomask 1 manufactured by a drawing machine, which is used for manufacturing a metal mask plate, the photomask 1 includes a rectangular body 11 made of metal, however, in other embodiments, the body 11 may be circular, irregular, or other shapes, depending on the shape of the metal mask plate to be manufactured, and the present utility model is not limited thereto.
As shown in fig. 2, the main body 11 includes a rectangular effective area 111, and two sides of the effective area 111 are provided with a runway-shaped transition area 112, and the transition area 112 and the effective area 111 are integrally formed. A pattern to be formed on the metal mask plate is distributed in the effective area 111, and the pattern is formed by arranging a plurality of light-transmitting through holes. Of course, in other embodiments, the transition region 112 may be fixedly connected to the active region 111 by welding or the like. As shown in fig. 3, an inner etched line 1121 having a length equal to that of the inner edge of the transition region 112 is formed inside the transition region 112, the inner etched line 1121 bordering the effective region 111; the outer side of the transition region 112 forms an outer etch line 1122 equal in length to the outer edge of the transition region 112. The width of the inner etch line 1121 is greater than the width of the outer etch line 1122, specifically, the width of the inner etch line 1121 is 80 to 150 μm and the width of the outer etch line 1122 is 10 to 50 μm. The inner etched line 1121 and the outer etched line 1122 have arc-shaped ends and straight lines parallel to each other in the middle, and form a closed transition region 112. In the present embodiment, a plurality of dividing etching lines 1123 are formed between the inner etching lines 1121 and the outer etching lines 1122, and both ends of the dividing etching lines are connected to the inner etching lines 1121 and the outer etching lines 1122, respectively, to divide the transition region 112 into a plurality of small regions.
The mask 1 is used in the exposure process of producing the metal mask, and the same effective area 111 and transition area 112 as the mask 1 are produced on the metal foil 2, namely the metal mask to be produced is produced on the effective area 111 of the metal foil 2. In addition, the metal foil 2 has an inactive area to be separated, and the transition area 112 is located between the active area 111 and the inactive area. The transition region 112 formed on the metal foil 2 also has an inner etched line 1121 and an outer etched line 1122, the inner etched line 1121 bordering the active region 111 of the metal foil 2 and the outer etched line 1122 bordering the inactive region of the metal foil 2. After the transition region 112 surrounded by the outer etching line 1122 and the inner etching line 1121 is etched, the effective region 111 of the metal foil 2 naturally breaks away from the metal foil 2, and thus the metal mask plate can be manufactured.
Since the width of the inner etching line 1121 is greater than that of the outer etching line 1122, when the metal foil 2 is etched, the inner etching line 1121 is etched first, one side of the inner etching line 1121 of the transition region 112 is separated from the effective region 111 first, the outer etching line 1122 connects the transition region 112 and the ineffective region, and the transition region 112 is not scratched to the effective region 111 under the limitation of the ineffective region, so that the yield of the manufactured metal mask plate is improved.
A separation etching line 1123 is also formed between the inner etching line 1121 and the outer etching line 1122 of the metal foil 2, and the separation etching line 1123 divides the transition region 112 into a plurality of small regions, so that when the metal foil 2 is etched, only the separation etching line 1123 is needed to be etched in the transition region 112, and the transition region 112 can be separated from the metal foil 2 without etching all the transition region 112, thereby accelerating the etching efficiency.
Example 2:
as shown in fig. 4 and 5, the present embodiment provides a photomask 1 for manufacturing a metal mask, where the photomask 1 includes a circular body 11 made of metal, and of course, in other embodiments, the body 11 may have other shapes such as a special shape, depending on the shape of the metal mask to be manufactured, and this is not a limitation of the present patent.
The body 11 includes a circular effective area 111, and a circular transition area 112 is disposed in the circumferential direction of the effective area 111, and the transition area 112 is disposed around the effective area 111. The transition region 112 is integrally formed with the active region 111. A pattern to be formed on the metal mask plate is distributed in the effective area 111, and the pattern is formed by arranging a plurality of light-transmitting through holes. Of course, in other embodiments, the transition region 112 may be fixedly connected to the active region 111 by welding or the like.
Other structures of this embodiment are substantially the same as those of embodiment 1, and will not be described here again.
The mask 1 of the present utility model has an effective region 111 and a transition region 112, and the same effective region 111 and transition region 112 as those of the mask 1 can be formed on the metal foil 2 when the mask is used for producing a metal mask. In addition, the size of the metal foil 2 is larger than that of the metal mask plate to be manufactured, so that the metal foil 2 is also provided with an ineffective area positioned outside the transition area 112, namely, the transition area 112 on the metal foil 2 is positioned between the effective area 111 and the ineffective area, and the effective area 111 and the ineffective area of the metal foil 2 can be separated by etching the transition area 112 positioned in the middle, namely, the metal mask plate to be manufactured is arranged in the effective area 111.
The above is only a specific embodiment of the present utility model, but the scope of the present utility model is not limited thereto, and it should be understood by those skilled in the art that the present utility model includes but is not limited to the accompanying drawings and the description of the above specific embodiment. Any modifications which do not depart from the functional and structural principles of the present utility model are intended to be included within the scope of the appended claims.
Claims (8)
1. The photomask for preparing the metal mask plate comprises a body, and is characterized in that the body comprises an effective area and a transition area arranged outside the effective area; an inner etching line connecting the effective area and the transition area is formed on the inner side of the transition area, and an outer etching line is formed on the outer side of the transition area; wherein the width of the inner etching line is larger than the width of the outer etching line.
2. The photomask of claim 1 wherein the inner etch line has a width of 80-150 μm and the outer etch line has a width of 10-50 μm.
3. The mask of claim 1 wherein the transition region is further formed with separate etch lines, the separate etch lines being connected at both ends to the outer etch line and the inner etch line, respectively.
4. The mask of any one of claims 1-3 wherein the transition region is configured as a racetrack ring, the inner and outer etched lines circumscribing the transition region.
5. The mask of any one of claims 1-3 wherein the transition region is rectangular in configuration, the inner and outer etch lines being disposed in parallel.
6. A photomask according to any of claims 1 to 3 wherein the active region is integrally formed with the transition region.
7. A photomask according to any of claims 1 to 3, wherein the active area is rectangular in configuration and the transition areas are provided on both sides of the active area.
8. A photomask according to any of claims 1 to 3, wherein the active region is circular in configuration and the transition region is disposed circumferentially of the active region.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321237939.0U CN219609434U (en) | 2023-05-19 | 2023-05-19 | Photomask for preparing metal mask plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321237939.0U CN219609434U (en) | 2023-05-19 | 2023-05-19 | Photomask for preparing metal mask plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN219609434U true CN219609434U (en) | 2023-08-29 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202321237939.0U Active CN219609434U (en) | 2023-05-19 | 2023-05-19 | Photomask for preparing metal mask plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN219609434U (en) |
-
2023
- 2023-05-19 CN CN202321237939.0U patent/CN219609434U/en active Active
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