CN219333731U

CN219333731U - Low-temperature plasma waste gas treatment device

Info

Publication number: CN219333731U
Application number: CN202223493713.5U
Authority: CN
Inventors: 钱黎明; 袁良谋; 杨春海; 陈开荣; 陆晓飞
Original assignee: Anhui Guoke Environmental Protection Equipment Manufacturing Co ltd
Current assignee: Anhui Guoke Environmental Protection Equipment Manufacturing Co ltd
Priority date: 2022-12-27
Filing date: 2022-12-27
Publication date: 2023-07-14
Anticipated expiration: 2032-12-27

Abstract

The utility model discloses a low-temperature plasma waste gas treatment device, which relates to the technical field of waste gas treatment and comprises the following components: the device comprises a plasma reaction device, a low-temperature plasma device, a pre-ionization plasma device, a condenser, a dust removal plate and a dust removal assembly; the utility model can effectively prevent dust accumulation and avoid the deterioration of the waste gas treatment effect of the plasma reaction device caused by dust influence.

Description

Low-temperature plasma waste gas treatment device

Technical Field

The utility model relates to the technical field of waste gas treatment, in particular to a low-temperature plasma waste gas treatment device.

Background

The waste gas is a toxic and harmful gas exhausted by human beings in the production and living processes, and mainly comprises various hydrocarbons, alcohols, aldehydes, acids, ketones, amines, sulfur oxides, nitrogen oxides, carbon oxides, halogens, compounds thereof and the like, and can seriously pollute the environment and influence the health of human bodies.

The current common methods for treating waste gas include an absorption method, an adsorption method, catalytic combustion, a biological method and the like, and the methods have the advantages of more equipment, complicated process and high energy consumption.

The low-temperature plasma technology is a hot spot technology in the field of gaseous pollutant treatment in recent years, and the plasma is a mixed state of electrons, positive and negative ions, excited atoms, atoms and free radicals, compared with the traditional air purification technology, the low-temperature plasma technology has the characteristics of short treatment flow, high efficiency, low energy consumption, less secondary pollution, wide application range and the like.

Chinese patent publication No. CN106861382B discloses a low-temperature plasma waste gas treatment device, which comprises a pretreatment device and a plasma reaction device; the pretreatment device comprises a pre-washing tank, a circulating water tank and a filtering tank body; the water outlet of the pre-washing tank is connected with the circulating water tank, and the air outlet is connected with the filtering tank body; the ion reaction device is connected with the filtering box body, gas flowing out of the filtering box body is subjected to secondary treatment through a demister, a dust removing plate and a condensing pipe in the plasma reaction device in sequence, and the times of collision of waste gas flowing out of the condensing pipe in the pre-ionization plasma device and the low-temperature plasma device are increased. The waste gas in the utility model can effectively remove the easily-dissolved gas and the dust of large particles in the waste gas through the pretreatment device; the waste gas passes through the pre-ionization plasma device and the low-temperature plasma device which are the same in shape and size and inclined in angle in the plasma reaction device, so that the number of times of plasma collision is increased, the waste gas treatment efficiency is improved, and the device has the characteristics of simple structure and low energy consumption.

However, when the utility model is used, the waste gas treated by the pretreatment device contains small-particle dust, and although the dust is removed by the dust removing plate when passing through the dust removing plate in the plasma reaction device, the dust accumulation on the dust removing plate is more, the dust removing effect is greatly reduced, the small-particle dust in the waste gas cannot be removed, and the waste gas treatment effect of the plasma reaction device is further reduced.

Disclosure of Invention

In order to solve the technical problems in the background technology, the utility model provides a low-temperature plasma waste gas treatment device.

A low temperature plasma exhaust gas treatment device comprising: the device comprises a plasma reaction device, a low-temperature plasma device, a pre-ionization plasma device, a condenser, a dust removal plate and a dust removal assembly;

a reaction cavity is arranged in the plasma reaction device, the two transverse ends of the reaction cavity are respectively provided with an air inlet pipe and an air outlet pipe, the air inlet pipe and the air outlet pipe are both communicated with the reaction cavity, a demister is arranged on the inner wall, close to the air inlet pipe, of the reaction cavity, an automatic gas concentration detector is arranged on the inner wall, close to the air outlet pipe, of the reaction cavity, a dust removing plate, a condenser, a pre-ionization plasma device and a low-temperature plasma device are sequentially arranged in the reaction cavity at intervals, and the dust removing plate is adjacent to the air inlet pipe and the low-temperature plasma device is adjacent to the air outlet pipe;

the deashing subassembly is located between intake pipe and the dust removal board, includes: the device comprises a rotating shaft, a fan impeller, an incomplete gear, a mounting frame, a dust scraping plate and a spring, wherein the rotating shaft is vertically rotatably mounted in a reaction cavity, the fan impeller and the incomplete gear are both fixed on the rotating shaft and are flush with an air inlet pipe, the mounting frame is slidably arranged in the reaction cavity, the mounting frame is provided with a rack face which can be meshed with the incomplete gear on one side close to the air inlet pipe, the dust scraping plate is mounted on the mounting frame and is attached to the dust removing plate, and the spring is arranged on one side of the mounting frame and is abutted against the side wall of the reaction cavity in the sliding direction of the mounting frame.

As further optimization of the scheme, the low-temperature plasma device, the pre-ionization plasma device and the condenser are arranged on the inner walls of the two longitudinal sides of the reaction cavity, and the peripheral edges of the low-temperature plasma device, the pre-ionization plasma device and the condenser are attached to the inner walls of the reaction cavity.

As the further optimization of above-mentioned scheme, the mounting bracket vertical arrangement has seted up the spout that can adapt the mounting bracket activity on the inner wall of reaction chamber top end both sides, and spout direction and intake pipe axial are perpendicular, and the one end of spout is located to the spring.

As a further optimization of the scheme, the number of the incomplete gears is two, the incomplete gears are symmetrically arranged at two ends of the rotating shaft relative to the fan blade wheel, and corresponding rack surfaces are arranged on the side surfaces of the top end and the bottom end of the mounting frame.

As a further optimization of the scheme, a plurality of vertically arranged dust scraping plates are arranged on one side of the mounting frame, which is close to the dust removing plates, and the dust scraping plates are arranged at intervals.

As a further refinement of the above-described solution, the dust-collecting plate is provided with a flexible buffer layer on the side which is in contact with the dust-collecting plate.

According to the low-temperature plasma waste gas treatment device provided by the utility model, the fan impeller is blown by the flow of waste gas, so that the incomplete gear is driven, the mounting frame is driven to slide by meshing with the rack surface, and when the incomplete gear rotates to the position that the notch is opposite to the rack surface, the mounting frame is reset under the action of the spring, so that the dust scraping plate can wipe the dust collection plate back and forth, the dust collection effect is prevented from being reduced, and the waste gas treatment effect of the plasma reaction device is not further deteriorated.

Drawings

FIG. 1 is a schematic view illustrating a first angle of an internal structure of a low temperature plasma exhaust gas treatment device according to the present utility model;

fig. 2 is a second angular schematic view of an internal structure of a low-temperature plasma exhaust gas treatment device according to the present utility model.

Detailed Description

The low temperature plasma exhaust gas treatment device according to the present embodiment, referring to fig. 1 and 2, includes: the device comprises a plasma reaction device 1, a low-temperature plasma device 2, a pre-ionization plasma device 3, a condenser 4, a dust removal plate 5 and a dust removal component.

Wherein, be equipped with reaction chamber 101 in plasma reaction device 1, reaction chamber 101 transversely both ends are provided with intake pipe 6, outlet duct 7 respectively, and intake pipe 6 and outlet duct 7 all communicate with reaction chamber 101, and reaction chamber 101 is provided with defroster 8 on being close to the inner wall of intake pipe 6, and reaction chamber 101 is provided with gas concentration automated inspection appearance 9 on being close to the inner wall of outlet duct 7.

The dust collecting plate 5, the condenser 4, the pre-ionization plasma device 3 and the low-temperature plasma device 2 are sequentially arranged in the reaction cavity 101 at intervals, the dust collecting plate 5 is adjacent to the air inlet pipe 6, the low-temperature plasma device 2 is adjacent to the air outlet pipe 7, more specifically, the low-temperature plasma device 2, the pre-ionization plasma device 3 and the condenser 4 are arranged on two longitudinal side inner walls of the reaction cavity 101, and the peripheral edges of the low-temperature plasma device 2, the pre-ionization plasma device 3 and the condenser 4 are attached to the inner wall of the reaction cavity 101.

The deashing subassembly is located between intake pipe 6 and the dust collecting plate 5, includes: the device comprises a rotating shaft 10, a fan blade wheel 11, an incomplete gear 12, a mounting frame 13, a dust scraping plate 14 and a spring 15.

The rotating shaft 10 is vertically rotatably arranged in the reaction cavity 101, the fan impeller 11 and the incomplete gear 12 are both fixed on the rotating shaft 10, the fan impeller 11 is flush with the air inlet pipe 6, and further, the incomplete gears 12 are two and are symmetrically arranged at two ends of the rotating shaft 10 relative to the fan impeller 11.

The mounting bracket 13 is vertically arranged and slidably mounted in the reaction cavity 101, sliding grooves capable of being matched with the movement of the mounting bracket 13 are formed in the inner walls of the two sides of the top and the bottom of the reaction cavity 101, the sliding grooves are perpendicular to the air inlet pipe 6 in the axial direction, a rack surface 16 capable of being meshed with the incomplete gear 12 is arranged on one side, close to the air inlet pipe 6, of the mounting bracket 13, and correspondingly, the rack surfaces 16 are arranged on the side surfaces of the two ends of the top and the bottom of the mounting bracket 13.

The spring 15 is disposed at one end of the chute, specifically, disposed at one side of the mounting frame 13 and abutted against the side wall of the reaction chamber 101 in the sliding direction of the mounting frame 13

A plurality of vertically arranged dust scraping plates 14 are arranged on one side of the mounting frame 13, which is close to the dust removing plate 5, the dust scraping plates 14 are arranged at intervals and are attached to the dust removing plate 5, and in addition, flexible buffer layers are arranged on the side surfaces, attached to the dust removing plate 5, of the dust scraping plates 14.

When the low-temperature plasma waste gas treatment device provided by the embodiment is used, the fan impeller 11 is blown by the flow of waste gas, so that the incomplete gear 12 is driven, the mounting frame 13 is driven to slide by meshing with the rack surface 16, and when the incomplete gear 12 rotates to the position that the notch of the incomplete gear is opposite to the rack surface 16, the mounting frame 13 is reset under the action of the spring 15, so that the dust scraping plate 14 can wipe the dust removing plate 5 back and forth, and dust accumulation is avoided.

The foregoing is only a preferred embodiment of the present utility model, but the scope of the present utility model is not limited thereto, and any person skilled in the art, who is within the scope of the present utility model, should make equivalent substitutions or modifications according to the technical scheme of the present utility model and the inventive concept thereof, and should be covered by the scope of the present utility model.

Claims

1. A low temperature plasma exhaust gas treatment device, comprising: the device comprises a plasma reaction device (1), a low-temperature plasma device (2), a pre-ionization plasma device (3), a condenser (4), a dust removal plate (5) and a dust removal component;

a reaction cavity (101) is arranged in the plasma reaction device (1), air inlet pipes (6) and air outlet pipes (7) are respectively arranged at the two transverse ends of the reaction cavity (101), the air inlet pipes (6) and the air outlet pipes (7) are communicated with the reaction cavity (101), demisters (8) are arranged on the inner wall, close to the air inlet pipes (6), of the reaction cavity (101), a gas concentration automatic detector (9) is arranged on the inner wall, close to the air outlet pipes (7), of the reaction cavity (101), a dust removing plate (5), a condenser (4), a pre-ionization plasma device (3) and a low-temperature plasma device (2) are sequentially arranged in the reaction cavity (101) at intervals, and the dust removing plate (5) is adjacent to the air inlet pipes (6) and the low-temperature plasma device (2) is adjacent to the air outlet pipes (7);

the deashing subassembly is located between intake pipe (6) and dust removal board (5), includes: the device comprises a rotating shaft (10), a fan blade wheel (11), an incomplete gear (12), a mounting frame (13), a dust scraping plate (14) and a spring (15), wherein the rotating shaft (10) is vertically rotatably installed in a reaction cavity (101), the fan blade wheel (11) and the incomplete gear (12) are both fixed on the rotating shaft (10) and the fan blade wheel (11) is flush with an air inlet pipe (6), the mounting frame (13) is slidably arranged in the reaction cavity (101) and the mounting frame (13) is provided with a rack face (16) which can be meshed with the incomplete gear (12) on one side close to the air inlet pipe (6), the dust scraping plate (14) is installed on the mounting frame (13) and is attached to the dust removing plate (5), and the spring (15) is arranged on one side of the mounting frame (13) and is abutted against the side wall of the reaction cavity (101) which is positioned in the sliding direction of the mounting frame (13).

2. The low-temperature plasma exhaust gas treatment device according to claim 1, wherein the low-temperature plasma device (2), the pre-ionization plasma device (3) and the condenser (4) are disposed on inner walls of both sides in a longitudinal direction of the reaction chamber (101), and outer peripheral edges of the low-temperature plasma device (2), the pre-ionization plasma device (3) and the condenser (4) are bonded to inner walls of the reaction chamber (101).

3. The low-temperature plasma waste gas treatment device according to claim 2, wherein the mounting frame (13) is vertically arranged, sliding grooves which can be matched with the movement of the mounting frame (13) are formed in the inner walls of the two sides of the top and the bottom of the reaction cavity (101), the sliding groove direction is axially perpendicular to the air inlet pipe (6), and the spring (15) is arranged at one end of the sliding groove.

4. A low temperature plasma exhaust gas treatment device according to claim 3, characterized in that the number of the incomplete gears (12) is two, and the incomplete gears are symmetrically arranged at two ends of the rotating shaft (10) about the fan impeller (11), and the sides of the two ends of the top and bottom of the mounting frame (13) are provided with corresponding rack surfaces (16).

5. The low-temperature plasma exhaust gas treatment device according to claim 4, wherein a plurality of vertically arranged dust scraping plates (14) are arranged on one side of the mounting frame (13) close to the dust removing plate (5), and the dust scraping plates (14) are arranged at intervals.

6. The low-temperature plasma exhaust gas treatment device according to claim 5, wherein the dust-scraping plate (14) is provided with a flexible buffer layer on the side surface which is in contact with the dust-removing plate (5).