CN219273778U - Surface attachment treatment device for graphite piece - Google Patents

Surface attachment treatment device for graphite piece Download PDF

Info

Publication number
CN219273778U
CN219273778U CN202320166630.0U CN202320166630U CN219273778U CN 219273778 U CN219273778 U CN 219273778U CN 202320166630 U CN202320166630 U CN 202320166630U CN 219273778 U CN219273778 U CN 219273778U
Authority
CN
China
Prior art keywords
graphite piece
processing
graphite
inlet pipe
treating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202320166630.0U
Other languages
Chinese (zh)
Inventor
饶威
浩瀚
赵新田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ningbo Hesheng New Material Co ltd
Original Assignee
Ningbo Hesheng New Material Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ningbo Hesheng New Material Co ltd filed Critical Ningbo Hesheng New Material Co ltd
Priority to CN202320166630.0U priority Critical patent/CN219273778U/en
Application granted granted Critical
Publication of CN219273778U publication Critical patent/CN219273778U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Carbon And Carbon Compounds (AREA)

Abstract

The application discloses a device for processing attachments on the surface of a graphite piece, which comprises a first processing assembly, a second processing assembly, a third processing assembly and a fourth processing assembly; the first processing component, the second processing component, the third processing component and the fourth processing component are sequentially arranged; the first treatment assembly is used for scraping attachments on the surface of the graphite piece, and the second treatment assembly is used for sweeping residual particles on the surface of the graphite piece; and after the first treatment assembly and the second treatment assembly are repeatedly treated at least once, the third treatment assembly is used for detecting whether the particles on the surface of the graphite piece are cleaned, the graphite piece which is not cleaned is returned to the second treatment assembly for treatment until the particles on the surface of the graphite piece are cleaned, and the fourth treatment assembly is used for enabling the graphite piece to be kept in an inert gas atmosphere. The processing device is simple to operate and convenient to use, and can efficiently process attachments on the surface of the graphite piece, so that the success of the re-processing of the silicon carbide epitaxial machine for the graphite piece is facilitated.

Description

Surface attachment treatment device for graphite piece
Technical Field
The application relates to the technical field of semiconductor processing auxiliary equipment, in particular to a device for processing attachments on the surface of a graphite piece.
Background
At present, silicon carbide is used as one of the third generation wide bandgap semiconductor materials, has the advantages of high temperature resistance, high mobility, high breakdown voltage and the like compared with silicon devices, and is an ideal material for manufacturing high-temperature, high-frequency, high-power, high-voltage and radiation-resistant electronic devices.
In the prior art, 4H-SiC is a crystal form required by a power electronic device, and the surface defect of an epitaxial wafer refers to a defect which can be observed under a microscope; defects mainly include falling object (falling fault), carrot defect (carrot defect), triangle defect (triangular defect), step aggregation defect (step bridging), and the like, wherein the falling object defect is a fatal defect of a power electronic device, and the falling object defect can cause the device to fail whenever the falling object defect exists at the device position regardless of the device type.
Through practical epitaxial growth experience analysis, the defect of the falling object is caused by falling of foreign matters in the epitaxial growth process. These foreign substances are mainly derived from SiC adhering matter adhering to the graphite member in the reaction chamber. Therefore, in the actual continuous mass production process, the horizontal silicon carbide epitaxial furnace needs to be maintained and cleaned by a cooling machine for about four to five days to ensure the stable quality of the epitaxial wafer due to the thicker and thicker deposition of the attachments on the graphite pieces in the growth chamber.
Therefore, how to provide a device capable of effectively treating the attachments on the surface of the graphite member is a problem to be solved by those skilled in the art.
Disclosure of Invention
An object of the application is to provide a convenient to use, can handle the attachment on graphite spare surface high-efficiently, and be favorable to the graphite spare to be used for the graphite spare surface attachment processing apparatus that the carborundum epitaxial furnace is successful of machine again.
In order to achieve the above purpose, the technical scheme adopted in the application is as follows: a device for processing attachments on the surface of a graphite piece comprises a first processing assembly, a second processing assembly, a third processing assembly and a fourth processing assembly; the first processing component, the second processing component, the third processing component and the fourth processing component are sequentially arranged; the first treatment assembly is used for scraping attachments on the surface of the graphite piece, and the second treatment assembly is used for sweeping residual particles on the surface of the graphite piece; and after the first processing component and the second processing component are repeatedly processed at least once, the third processing component is used for detecting whether the particulate matters on the surface of the graphite piece are cleaned, the graphite piece which is not cleaned is returned to the second processing component for processing until the particulate matters on the surface of the graphite piece are cleaned, and the fourth processing component is used for enabling the graphite piece to be kept in an inert gas atmosphere.
Preferably, the first processing assembly comprises a first processing box and a first fixing frame; the first treatment box is provided with a first feed inlet capable of being opened and closed, a first discharge outlet capable of being opened and closed and at least two first operation ports with gloves; the first fixing frame is arranged inside the first treatment box and used for fixing the graphite piece. The advantages are that: during treatment, the first feeding port is opened, so that the graphite piece is placed on the first fixing frame in the first treatment box, and the graphite piece is fixed through the first fixing frame; then, two hands of an operator respectively extend into the gloves in the two first operation openings, the attachments on the surface of the graphite piece are scraped through a special scraper (such as a silicon carbide ingot small square), and the graphite piece is taken out by opening the first discharge opening after the attachments are scraped cleanly.
Preferably, the first processing assembly further comprises a first air inlet pipe and a first ventilation pipe, the first air inlet pipe and the first ventilation pipe are both communicated with the first processing box, the first air inlet pipe is used for blowing particulate matters on the surface of the graphite piece, and the first ventilation pipe is used for exhausting gas in the first processing box. The advantages are that: and when one hand is used for scraping operation, the other hand is used for holding the first air inlet pipe to sweep the surface of the graphite piece so as to sweep away particles scraped by the scraper on the surface of the graphite piece. In addition, the first ventilation pipe is opened, so that the gas in the first treatment box can be discharged, the excessive air pressure in the first treatment box caused by continuous air inlet is prevented, and blown-off particles can be discharged.
Preferably, the gas pressure in the first gas inlet pipe is 0.5bar to 1.5bar. The advantages are that: because a large amount of attachments on the graphite piece can be scraped by the scraper, at the moment, if the air pressure of the first air inlet pipe is too high, the scraped particulate matters are diffused in the first treatment box, so that the sight of an operator can be influenced, and the scraping operation is not facilitated; if the air pressure of the first air inlet pipe is too low, the air cannot be blown cleanly, so that particles are scraped to be still attached to the graphite piece, and the scraping operation is affected. According to experiments, the air pressure of the first air inlet pipe is preferably 0.5bar to 1.5bar, and the air pressure is preferably 1 bar.
Preferably, the second processing assembly comprises a second processing box, a second fixing frame, a second air inlet pipe and a second ventilation pipe; the second treatment box is provided with a second feeding port capable of being opened and closed, a second discharging port capable of being opened and closed and at least two second operation ports with gloves; the second fixing frame is arranged in the second processing box and is used for fixing the graphite piece; the second air inlet pipe and the second air vent pipe are both communicated with the second treatment box, the second air inlet pipe is used for blowing and sweeping particulate matters on the surface of the graphite piece, and the second air vent pipe is used for discharging gas and dust impurities in the second treatment box. The advantages are that: during treatment, the second feeding port is opened, so that the graphite piece is placed on the second fixing frame in the second treatment box, and the graphite piece is fixed through the second fixing frame; and then opening the second air inlet pipe and the second air vent pipe, and operating the second air inlet pipe through the second operation port to purge the graphite piece so as to purge residual particulate matters on the surface of the graphite piece, and opening the second discharge port to take out the graphite piece after purging. In addition, the second ventilation pipe can exhaust gas in the second treatment box, prevent the second treatment box from being excessively high in air pressure caused by continuous air inlet, and can exhaust blown-off particles.
Preferably, the second treatment box is provided with a preformed hole door which can be opened and closed. The advantages are that: and after the purging is finished each time, closing the second air inlet pipe and the second ventilation pipe, cleaning particles attached to the inner wall of the second treatment box by using dust-free cloth, and taking out the waste dust-free cloth after opening the preformed hole door.
Preferably, the gas pressure in the second gas inlet pipe is 4bar to 6bar. The advantages are that: according to experiments, the purging effect is optimal when the gas pressure in the second gas inlet pipe is 4bar to 6bar and when the gas pressure in the second gas inlet pipe is 5bar.
Preferably, the third processing component comprises a third processing box, a third fixing frame, a third air inlet pipe, a third air through pipe and a particulate matter detector; the third treatment box is provided with a third feeding port capable of being opened and closed, a third discharging port capable of being opened and closed and at least two third operation ports with gloves; the third fixing frame is arranged in the third processing box and used for fixing the graphite piece; the third air inlet pipe is used for blowing the graphite piece, and the third air outlet pipe is used for discharging the gas in the third treatment box; the particle detector is arranged in the third processing box and is used for detecting the content of particles in the third processing box. The advantages are that: during treatment, the graphite piece is placed on the third fixing frame in the third treatment box by opening the third discharge hole, and the graphite piece is fixed through the third fixing frame; and then opening the third air inlet pipe and the third air outlet pipe, blowing the graphite piece through the third air inlet pipe, and discharging the gas in the third treatment box through the third air outlet pipe. It can be understood that the more the residual particulate matters of the graphite piece are, the more the particulate matters are diffused in the third treatment tank after being purged by the third air inlet pipe; therefore, the particle content in the third processing box is detected by opening the particle detector, so that the content of residual particles on the graphite piece is fed back; when the detected content of the particles exceeds a standard value, the residual particles on the surface of the graphite piece are not completely purged; and when the detected content of the particles is lower than or equal to the standard value, the residual particles on the surface of the graphite piece are completely purged.
Preferably, the gas pressure in the third gas inlet pipe is 7bar to 9bar. The advantages are that: according to experiments, it has been found that the gas pressure in the third inlet pipe is preferably between 7bar and 9bar, and that the gas pressure is preferably 8 bar.
Preferably, the fourth processing component comprises a fourth processing box, a fourth air inlet pipe, a fourth air pipe and an inert gas pipeline; the fourth treatment box is provided with a fourth feeding port capable of being opened and closed, a fourth discharging port capable of being opened and closed and at least two fourth operation ports with gloves; the fourth air inlet pipe, the fourth air pipe and the inert gas pipeline are all communicated with the fourth treatment box. The advantages are that: during treatment, the graphite piece is placed into the fourth treatment box by opening the fourth feed inlet; and then opening the inert gas pipeline and the fourth air pipe to enable the interior of the fourth treatment box to be in inert gas atmosphere, keeping the graphite parts in the environment for a period of time until operators finish treating all the graphite parts, closing the inert gas pipeline, opening the fourth air inlet pipe, and opening the fourth discharge port after waiting for five minutes to take out the graphite parts.
Compared with the prior art, the beneficial effect of this application lies in: when the processing device is used for processing the attachments on the surface of the graphite piece, the graphite piece is only required to be put into the first processing assembly, and the attachments on the surface of the graphite piece are scraped clean through the first processing assembly; then placing the graphite piece into the second processing assembly, and sweeping residual particles on the surface of the graphite piece through the second processing assembly; after repeating the above operation at least once, putting the graphite piece into the third processing assembly, and detecting whether particles on the surface of the graphite piece are cleaned or not through the third processing assembly; and if the graphite piece is not cleaned, returning to the second processing assembly for processing again, if the graphite piece is cleaned, putting the graphite piece into the fourth processing assembly, and keeping the graphite piece in the inert gas atmosphere through the fourth processing assembly so as to protect the graphite piece from being influenced by air nitrogen and oxygen, taking out the graphite piece after a period of time, and resetting the epitaxial furnace after the graphite piece is loaded into the cavity to be successful. The whole cleaning process is simple to operate and convenient to use, and attachments on the surface of the graphite piece can be efficiently treated, so that the graphite piece is favorable for success of the repeated machine recovery of the silicon carbide epitaxial machine.
Drawings
Fig. 1 is a schematic diagram of a device for treating attachments on a surface of a graphite member.
Fig. 2 is a front view of a first treatment tank provided in the present application.
Fig. 3 is a left side view of the first processing tank of fig. 2 provided herein.
Fig. 4 is a right side view of the first processing tank of fig. 2 provided herein.
Fig. 5 is a perspective view of a first fixing frame provided in the present application.
Fig. 6 is a cross-sectional view of the first mount of fig. 5 provided herein.
In the figure: 1. a first processing assembly; 11. a first treatment tank; 111. a first feed port; 112. a first discharge port; 113. a first operation port; 12. a first fixing frame; 2. a second processing assembly; 3. a third processing assembly; 4. and a fourth processing component.
Detailed Description
The present application will be further described with reference to the specific embodiments, and it should be noted that, on the premise of no conflict, new embodiments may be formed by any combination of the embodiments or technical features described below.
In the description of the present application, it should be noted that, for the azimuth terms such as terms "center", "lateral", "longitudinal", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", etc., the azimuth and positional relationships are based on the azimuth or positional relationships shown in the drawings, it is merely for convenience of describing the present application and simplifying the description, and it is not to be construed as limiting the specific protection scope of the present application that the device or element referred to must have a specific azimuth configuration and operation, as indicated or implied.
It should be noted that the terms "first," "second," and the like in the description and in the claims of the present application are used for distinguishing between similar objects and not necessarily for describing a particular sequential or chronological order.
The terms "comprises" and "comprising," along with any variations thereof, in the description and claims of the present application are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements that are expressly listed or inherent to such process, method, article, or apparatus.
Referring to fig. 1, an embodiment of the present application provides a device for treating a surface attachment of a graphite member, including a first treating assembly 1, a second treating assembly 2, a third treating assembly 3, and a fourth treating assembly 4; the first processing assembly 1, the second processing assembly 2, the third processing assembly 3 and the fourth processing assembly 4 are sequentially arranged; the first treatment assembly 1 is used for scraping attachments on the surface of the graphite piece, and the second treatment assembly 2 is used for sweeping residual particles on the surface of the graphite piece; after the first processing component 1 and the second processing component 2 are processed at least once repeatedly, the third processing component 3 is used for detecting whether the particles on the surface of the graphite piece are cleaned, the graphite piece which is not cleaned is returned to the second processing component 2 for processing until the particles on the surface of the graphite piece are cleaned, and the fourth processing component 4 is used for keeping the graphite piece in an inert gas atmosphere.
As shown in fig. 1, when the processing device is used for processing the attachments on the surface of the graphite piece, the graphite piece is only required to be put into the first processing assembly 1, and the attachments on the surface of the graphite piece are scraped clean by the first processing assembly 1; then placing the graphite piece into a second processing assembly 2, and sweeping out residual particles on the surface of the graphite piece through the second processing assembly 2; after repeating the above operation at least once (preferably, repeating the above operation twice, three times or four times), placing the graphite piece into the third processing assembly 3, and detecting whether the particles on the surface of the graphite piece are cleaned by the third processing assembly 3; if the graphite piece is not cleaned, returning to the second processing assembly 2 for processing again, if the graphite piece is cleaned, putting the graphite piece into the fourth processing assembly 4, and keeping the graphite piece in the atmosphere of inert gas (such as helium, neon, argon and the like) through the fourth processing assembly 4 so as to protect the graphite piece from being influenced by air nitrogen and oxygen, taking out the graphite piece after a period of time, and then resetting the epitaxial furnace after the graphite piece is filled into a cavity. The whole cleaning process is simple to operate and convenient to use, and attachments on the surface of the graphite piece can be efficiently treated, so that the success of the re-machining of the graphite piece is facilitated.
Referring to fig. 2-6, in some embodiments of the present application, the first processing assembly 1 includes a first processing tank 11 and a first mount 12; the first treatment box 11 is provided with a first feed opening 111 capable of being opened and closed, a first discharge opening 112 capable of being opened and closed and at least two first operation openings 113 with gloves; the first fixing frame 12 is disposed inside the first processing box 11, and the first fixing frame 12 is used for fixing the graphite component. During treatment, the graphite piece is placed on the first fixing frame 12 in the first treatment box 11 by opening the first feeding hole 111, and the graphite piece is fixed by the first fixing frame 12; then, two hands of an operator respectively extend into the gloves in the two first operation ports 113, and a specially-made scraper (such as a silicon carbide ingot small square) is used for scraping attachments on the surface of the graphite piece, and the graphite piece is taken out by opening the first discharge port 112 after scraping.
The specific structure of the first fixing frame 12 is not limited in this application, and only one specific structure is provided below for reference: as shown in fig. 5 and 6, the first fixing frame 12 is provided with a positioning groove for adapting to the graphite piece, and the graphite piece can be positioned and fixed through the positioning groove. The positioning groove is preferably of a structure inclined to the front lower side, attachments on the surface of the graphite piece are convenient to scrape in the rear upper side and the front lower side in an inclined mode, and meanwhile, scraped particles fall off more easily under the action of gravity.
In some embodiments of the present application, the first processing assembly 1 further includes a first air inlet pipe and a first air vent pipe, the first air inlet pipe and the first air vent pipe are both communicated with the first processing box 11, the first air inlet pipe is used for blowing particulate matters on the surface of the graphite piece, and the first air vent pipe is used for exhausting gas in the first processing box 11. The first air inlet pipe is held by the other hand to sweep the surface of the graphite piece while scraping operation is carried out by the one hand, so that particles scraped by the scraper on the surface of the graphite piece are blown off. In addition, by opening the first ventilation pipe, the gas in the first processing tank 11 can be discharged, and the air pressure in the first processing tank 11 can be prevented from being excessively large due to continuous air intake, and the blown-off particulate matter can be discharged.
In some embodiments of the present application, the gas pressure in the first inlet pipe is 0.5bar-1.5bar. Since a large amount of attachments on the graphite piece can be scraped by the scraper, at the moment, if the air pressure of the first air inlet pipe is too high, the scraped particulate matters are scattered in the first treatment box 11, so that the sight of an operator is influenced, and the scraping operation is not facilitated; if the air pressure of the first air inlet pipe is too low, the air cannot be blown cleanly, so that particles are scraped to be still attached to the graphite piece, and the scraping operation is affected. According to experiments, it has been found that the air pressure of the first inlet pipe is preferably between 0.5bar and 1.5bar, and that the air pressure is preferably 1 bar.
In some embodiments of the present application, the second processing assembly 2 includes a second processing tank, a second mount, a second air inlet pipe, and a second ventilation pipe; the second treatment box is provided with a second feeding port capable of being opened and closed, a second discharging port capable of being opened and closed and at least two second operation ports with gloves; the second fixing frame is arranged in the second treatment box and is used for fixing the graphite piece; the second air inlet pipe and the second ventilation pipe are both communicated with the second treatment box, the second air inlet pipe is used for sweeping particulate matters on the surface of the graphite piece, and the second ventilation pipe is used for discharging gas and dust impurities in the second treatment box. During treatment, the graphite piece is placed on a second fixing frame in the second treatment box by opening the second feed inlet, and the graphite piece is fixed by the second fixing frame; and then opening a second air inlet pipe and a second air vent pipe, and operating the second air inlet pipe through a second operation port to purge the graphite piece so as to purge residual particulate matters on the surface of the graphite piece, and opening a second discharge port to take out the graphite piece after purging. In addition, the second ventilation pipe can exhaust gas and dust impurities in the second treatment box, so that excessive air pressure caused by continuous air inlet in the second treatment box is prevented, and blown-off particulate matters can be discharged.
In some embodiments of the present application, the second processing tank is provided with a preformed hole door that can be opened and closed. And after the purging is finished each time, closing the second air inlet pipe and the second air vent pipe, cleaning particles attached to the inner wall of the second treatment box by using dust-free cloth, and taking out the waste dust-free cloth after opening the preformed hole door.
In some embodiments of the present application, the gas pressure in the second inlet pipe is 4bar-6bar. According to experiments, the purging effect is optimal when the gas pressure in the second gas inlet pipe is 4bar to 6bar and when the gas pressure in the second gas inlet pipe is 5bar.
In some embodiments of the present application, the third processing assembly 3 includes a third processing tank, a third fixing frame, a third air inlet pipe, a third air vent pipe, and a particulate matter detector; the third treatment box is provided with a third feeding port capable of being opened and closed, a third discharging port capable of being opened and closed and at least two third operation ports with gloves; the third fixing frame is arranged in the third processing box and is used for fixing the graphite piece; the third air inlet pipe is used for blowing and sweeping the graphite piece, and the third air outlet pipe is used for discharging the gas in the third treatment box; the particle detector is arranged in the third processing box and is used for detecting the content of particles in the third processing box. During treatment, the graphite piece is placed on a third fixing frame in a third treatment box by opening a third discharge hole, and is fixed by the third fixing frame; and then opening a third air inlet pipe and a third air outlet pipe, blowing the graphite piece through the third air inlet pipe, and discharging the gas in the third treatment box through the third air outlet pipe. It can be understood that the more the residual particles of the graphite piece are, the more the particles are diffused in the third treatment tank after being purged by the third air inlet pipe; therefore, the particle content in the third processing box is detected by opening the particle detector, so that the content of residual particles on the graphite piece is fed back; when the detected content of the particles exceeds a standard value, the residual particles on the surface of the graphite piece are not purged completely; and when the detected content of the particles is lower than or equal to the standard value, the residual particles on the surface of the graphite piece are completely purged.
In some embodiments of the present application, the gas pressure in the third inlet pipe is 7bar-9bar. According to experiments, it has been found that the effect is optimal when the gas pressure in the third inlet conduit is between 7bar and 9bar and the gas pressure is 8 bar.
In some embodiments of the present application, the fourth processing assembly 4 includes a fourth processing tank, a fourth inlet pipe, a fourth outlet pipe, and an inert gas conduit; the fourth treatment box is provided with a fourth feeding port capable of being opened and closed, a fourth discharging port capable of being opened and closed and at least two fourth operation ports with gloves; the fourth air inlet pipe, the fourth air pipe and the inert gas pipeline are all communicated with the fourth treatment box. During treatment, the graphite piece can be placed into the fourth treatment box by opening the fourth feed inlet; and then opening an inert gas pipeline and a fourth air pipe to enable the inside of the fourth treatment box to be in inert gas atmosphere, keeping the graphite parts in the environment for a period of time until operators finish treating all the graphite parts, closing the inert gas pipeline, opening a fourth air inlet pipe, and opening a fourth discharge port after waiting for five minutes to take out the graphite parts.
It should be noted that, the specific structures of the first fixing frame 12, the second fixing frame and the third fixing frame may be the same or different, so long as the fixing of the graphite piece is satisfied. The first, second, third and fourth treatment tanks 11, 11 and fourth treatment tanks have the same structure, and are not shown in the drawings.
The foregoing has outlined the basic principles, main features and advantages of the present application. It will be appreciated by persons skilled in the art that the present application is not limited to the embodiments described above, and that the embodiments and descriptions described herein are merely illustrative of the principles of the present application, and that various changes and modifications may be made therein without departing from the spirit and scope of the application, which is defined by the appended claims. The scope of protection of the present application is defined by the appended claims and equivalents thereof.

Claims (10)

1. The device for treating the attachments on the surface of the graphite piece is characterized by comprising a first treatment assembly, a second treatment assembly, a third treatment assembly and a fourth treatment assembly; the first processing component, the second processing component, the third processing component and the fourth processing component are sequentially arranged; the first treatment assembly is used for scraping attachments on the surface of the graphite piece, and the second treatment assembly is used for sweeping residual particles on the surface of the graphite piece; the third processing component is used for detecting whether particles on the surface of the graphite piece are cleaned, and the fourth processing component is used for enabling the graphite piece to be kept in an inert gas atmosphere.
2. The apparatus for treating surface attachments of a graphite article according to claim 1, wherein said first treating assembly comprises a first treating tank and a first fixing frame; the first treatment box is provided with a first feed inlet capable of being opened and closed, a first discharge outlet capable of being opened and closed and at least two first operation ports with gloves; the first fixing frame is arranged inside the first treatment box and used for fixing the graphite piece.
3. The apparatus according to claim 2, wherein the first processing unit further comprises a first air inlet pipe and a first air pipe, the first air inlet pipe and the first air pipe are both connected to the first processing tank, the first air inlet pipe is used for blowing particulate matters on the surface of the graphite piece, and the first air pipe is used for exhausting gas in the first processing tank.
4. A graphite member surface attachment treatment device according to claim 3, wherein the gas pressure in the first gas inlet pipe is 0.5bar to 1.5bar.
5. The apparatus for treating surface attachments of a graphite article according to claim 1, wherein said second treating assembly comprises a second treating tank, a second fixing frame, a second air inlet pipe and a second air vent pipe; the second treatment box is provided with a second feeding port capable of being opened and closed, a second discharging port capable of being opened and closed and at least two second operation ports with gloves; the second fixing frame is arranged in the second processing box and is used for fixing the graphite piece; the second air inlet pipe and the second air vent pipe are both communicated with the second treatment box, the second air inlet pipe is used for blowing and sweeping particulate matters on the surface of the graphite piece, and the second air vent pipe is used for discharging gas and dust impurities in the second treatment box.
6. The apparatus for treating surface deposits of graphite member according to claim 5, wherein the second treating tank is provided with a openable and closable preformed hole door.
7. The apparatus for treating surface deposits on a graphite member according to claim 5, wherein the gas pressure in said second gas inlet pipe is from 4bar to 6bar.
8. The device for treating surface attachments of graphite parts according to claim 1, wherein the third treating assembly comprises a third treating box, a third fixing frame, a third air inlet pipe, a third air outlet pipe and a particle detector; the third treatment box is provided with a third feeding port capable of being opened and closed, a third discharging port capable of being opened and closed and at least two third operation ports with gloves; the third fixing frame is arranged in the third processing box and used for fixing the graphite piece; the third air inlet pipe is used for blowing the graphite piece, and the third air outlet pipe is used for discharging the gas in the third treatment box; the particle detector is arranged in the third processing box and is used for detecting the content of particles in the third processing box.
9. The apparatus for treating surface deposits on a graphite member according to claim 8, wherein the gas pressure in said third gas inlet pipe is from 7bar to 9bar.
10. The apparatus for treating surface attachments of a graphite member according to claim 1, wherein the fourth treating unit comprises a fourth treating tank, a fourth air inlet pipe, a fourth air outlet pipe and an inert gas pipe; the fourth treatment box is provided with a fourth feeding port capable of being opened and closed, a fourth discharging port capable of being opened and closed and at least two fourth operation ports with gloves; the fourth air inlet pipe, the fourth air pipe and the inert gas pipeline are all communicated with the fourth treatment box.
CN202320166630.0U 2023-01-16 2023-01-16 Surface attachment treatment device for graphite piece Active CN219273778U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202320166630.0U CN219273778U (en) 2023-01-16 2023-01-16 Surface attachment treatment device for graphite piece

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202320166630.0U CN219273778U (en) 2023-01-16 2023-01-16 Surface attachment treatment device for graphite piece

Publications (1)

Publication Number Publication Date
CN219273778U true CN219273778U (en) 2023-06-30

Family

ID=86909705

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202320166630.0U Active CN219273778U (en) 2023-01-16 2023-01-16 Surface attachment treatment device for graphite piece

Country Status (1)

Country Link
CN (1) CN219273778U (en)

Similar Documents

Publication Publication Date Title
US7578889B2 (en) Methodology for cleaning of surface metal contamination from electrode assemblies
US6096100A (en) Method for processing wafers and cleaning wafer-handling implements
KR19980070821A (en) Cleaning device and cleaning method
KR102074472B1 (en) Substrate carrier deterioration detection and repair
KR101462241B1 (en) Apparatus for purging process gases from front-opening unified pod for wafers
TWI523702B (en) Washing method, washing apparatus for polycrystalline silicon and method of producing polycrystalline silicon
JP2009078961A (en) Clean bench
ES2448540T3 (en) Procedure for the treatment of silicon material
CN219273778U (en) Surface attachment treatment device for graphite piece
Sheehy et al. Assessment of arsenic exposures and controls in gallium arsenide production
US5697839A (en) Ventilation hood for wet-clean process chamber
JPH07242494A (en) Method for washing silicon piece
JP3200291B2 (en) Cleaning equipment
TWI828845B (en) Polycrystalline silicon bulk, its packaging body and manufacturing method thereof
Okano et al. Particle generation of ceramic emitters for cleanroom air ionizers
CN213779610U (en) Sampling device
JP7439326B1 (en) sampling box
KR101698676B1 (en) Device for chamber residual gas exhaust hood
CN113371716B (en) Pollution prevention method for base plate
JP7217720B2 (en) Base plate contamination prevention method
JP2000131309A (en) Sampling device for ultra pure water
JP2001354489A (en) Device and method for cleaning single crystal pulling apparatus
JP4471460B2 (en) Method for reducing heavy metal contamination in epitaxial growth equipment
TW202329228A (en) Dry ice cleaning device for semiconductor wafer and cleaning method for semiconductor wafer
WO1999022403A1 (en) Process and apparatus for preparation of epitaxial silicon layers free of grown-in defects

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant