CN219273772U

CN219273772U - Cleaning device for etching machine middle cavity

Info

Publication number: CN219273772U
Application number: CN202223523454.6U
Authority: CN
Inventors: 钟耀轩; 陈文捷; 庄树举
Original assignee: Yuexin Semiconductor Technology Co ltd
Current assignee: Yuexin Semiconductor Technology Co ltd
Priority date: 2022-12-26
Filing date: 2022-12-26
Publication date: 2023-06-30
Anticipated expiration: 2032-12-26

Abstract

The utility model relates to an etching machine station auxiliary assembly technical field discloses a cleaning device for etching machine station intermediate chamber, including being used for bearing the cleaning main body of scraping cloth and locating gripping member in the cleaning main body, the gripping member including locating cleaning main body one end the intermediate baffle with the handle of intermediate baffle body coupling the cleaning main body is last and be close to intermediate baffle department is equipped with and is used for fixing the clamping piece of scraping cloth, the clamping piece including seting up cleaning main body is last holding chamber and with cleaning main body threaded connection just wears to establish the clamping lever in holding chamber, cleaning main body deviates from the one end of gripping member is equipped with the working portion, the working portion is the cambered surface of tapering. The utility model provides an improved clean efficiency and clean effect in artifical clean metal etching board holding chamber.

Description

Cleaning device for etching machine middle cavity

Technical Field

The application relates to the technical field of etching machine auxiliary equipment, in particular to a cleaning device for an etching machine middle cavity.

Background

In the semiconductor manufacturing process, a metal etching machine is used for etching a semiconductor target structure, when a containing cavity of a metal etching machine table is generally cleaned, polymers on the surface of a circular ring-shaped structure in the containing cavity are required to be cleaned, the polymers are generally attached to an aluminum oxide coating, so that the polymers generated during etching are required to be cleaned on the premise of not damaging the aluminum oxide coating during cleaning, and the polymers are generally difficult to be cleaned on the surface of the circular ring-shaped structure. Among the prior art, accessible third party mechanism pickling is clean, and the pickling can wash the coating off, need reattach aluminium oxide coating after wasing, and its cost is higher, does not adopt more, generally wash with scraping water distribution through the manual work, but because the ring-shaped structure surface has certain radian for the inhomogeneous of difficult power and brush when handheld scraping cloth, the clearance is comparatively laborious and inefficiency, and this kind of condition needs to change.

Disclosure of Invention

The application provides a cleaning device for etching machine middle cavity to improve the clean efficiency and the clean effect in clean metal etching machine holding chamber of manual work.

In order to achieve the aim of the utility model, the technical scheme adopted is as follows:

the utility model provides a cleaning device for etching board intermediate chamber body, is including being used for bearing the clean main part of scraping cloth and locating grip piece in the clean main part, grip piece including locating the intermediate baffle of clean main part one end with intermediate baffle body coupling's handle be close to on the clean main part intermediate baffle department is equipped with and is used for fixing the clamping piece of scraping cloth, the clamping piece is including seting up the holding chamber in the clean main part and with clean main part threaded connection just wears to establish the clamping lever in holding chamber, clean main part deviates from the one end of grip piece is equipped with the working portion, the working portion is the cambered surface of tapering.

The application is further configured to: a plurality of support columns are arranged between the middle partition plate and the cleaning main body, and the support columns are symmetrically arranged and are integrally connected with the middle partition plate and the cleaning main body respectively.

The application is further configured to: one end of the clamping rod is positioned between the cleaning main body and the middle partition plate, and the other end of the clamping rod penetrates through the accommodating cavity and is abutted to or kept at a certain distance from the cleaning main body.

The application is further configured to: the clamping rods are at least two and are symmetrically arranged between the cleaning main body and the middle partition plate.

The application is further configured to: the side edge profile of the middle partition plate horizontally coincides with the side edge profile of the working part or protrudes out of the side edge profile of the working part.

The application is further configured to: the handle comprises a bending part and a supporting part which are integrally connected, and one end of the bending part, which is away from the supporting part, is integrally connected with the middle partition plate.

The application is further configured to: the two ends of the bending part are integrally connected with clamping rings, and a sliding pipe which is connected with the bending part in a switching way is sleeved on the bending part and between the two clamping rings.

The application is further configured to: the support portion is maintained level with the intermediate deck panel.

The application is further configured to: and one end of the bending part, which is away from the supporting part, is integrally connected with an outer joint.

The application is further configured to: the accommodating cavity extends to two sides of the cleaning main body, and two ends of the middle partition plate are kept flush with the cleaning main body.

To sum up, compared with the prior art, the application discloses a cleaning device for etching board intermediate chamber, including clean main part and gripping member, scrape the cloth by clean main part support and carry on, carry out artifical the holding through intermediate baffle and the handle of gripping member, accomodate, adjust and fix the cloth of scraping through holding chamber and the clamping lever of gripping member, wherein, clean main part deviates from the one end of gripping member and is equipped with the working portion, and combine the cambered surface structure setting of working portion convergent, improved the clean efficiency and the clean effect in manual cleaning metal etching board holding chamber.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the description of the embodiments will be briefly introduced below, it being obvious that the drawings in the following description are only some embodiments of the present application, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.

FIG. 1 is a schematic view of a first configuration of a cleaning apparatus for an etching tool middle chamber according to the present embodiment;

fig. 2 is a schematic diagram of a second structure of a cleaning device for an etching apparatus middle chamber according to the present embodiment.

1. A cleaning main body; 11. a working section; 2. a grip; 3. a middle partition plate; 31. a support column; 4. a handle; 41. a turn-over portion; 42. a support part; 43. a clasp; 44. a sliding tube; 45. an outer joint; 5. a clamping member; 51. a receiving chamber; 52. and a clamping rod.

Detailed Description

Reference will now be made in detail to exemplary embodiments, examples of which are illustrated in the accompanying drawings. When the following description refers to the accompanying drawings, the same numbers in different drawings refer to the same or similar elements, unless otherwise indicated. The implementations described in the following exemplary examples are not representative of all implementations consistent with the present application. Rather, they are merely examples of apparatus and methods consistent with some aspects of the present application as detailed in the accompanying claims.

It should be noted that, in this document, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, the element defined by the phrase "comprising one … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element, and furthermore, elements having the same name in different embodiments of the present application may have the same meaning or may have different meanings, a particular meaning of which is to be determined by its interpretation in this particular embodiment or by further combining the context of this particular embodiment.

It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the present application.

In the following description, suffixes such as "module", "component", or "unit" for representing elements are used only for facilitating the description of the present application, and are not of specific significance per se. Thus, "module," "component," or "unit" may be used in combination.

In the description of the present application, it should be noted that the positional or positional relationship indicated by the terms such as "upper", "lower", "left", "right", "inner", "outer", etc. are based on the positional or positional relationship shown in the drawings, are merely for convenience of describing the present application and simplifying the description, and do not indicate or imply that the apparatus or element in question must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present application. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.

The technical solutions shown in the present application will be described in detail by specific examples. The following description of the embodiments is not intended to limit the priority of the embodiments.

Referring to fig. 1 and 2, the cleaning device for the middle cavity of the etching machine table comprises a cleaning main body 1 for bearing scraping cloth and a holding piece 2 arranged on the cleaning main body 1, wherein the holding piece 2 comprises a middle partition plate 3 arranged at one end of the cleaning main body 1 and a handle 4 integrally connected with the middle partition plate 3, a clamping piece 5 for fixing the scraping cloth is arranged on the cleaning main body 1 and near the middle partition plate 3, the clamping piece 5 comprises a containing cavity 51 arranged on the cleaning main body 1 and a clamping rod 52 in threaded connection with the cleaning main body 1 and penetrating through the containing cavity 51, one end of the cleaning main body 1, deviating from the holding piece 2, is provided with a working part 11, and the working part 11 is a tapered cambered surface.

In the specific implementation process, the scraping cloth is coated on the cleaning main body 1 and fixed through the clamping piece 5, is manually held through the handle 4 of the holding piece 2 and is separated by the middle partition board 3, so that the contact between hands and the scraping cloth and the contact between the hands and the scraping cloth and the liquid medicine immersed in the scraping cloth are avoided, after the scraping cloth on the side of the cleaning main body 1 is received in the accommodating cavity 51, the scraping cloth in the accommodating cavity 51 is approximated and fixed by the threads of the clamping rod 52, the contact area between the cleaning device and the cleaning device is increased by designing the working part 11 of the tapered cambered surface in combination with the cylindrical ring structure of the middle cavity of the etching machine table, and the contact area between the scraping cloth and the cylindrical ring structure is increased, so that the cleaning effect and the cleaning efficiency of the middle cavity of the etching machine table are improved.

Further, be equipped with a plurality of support column 31 between intermediate baffle 3 and cleaning main part 1, a plurality of support column 31 symmetrical arrangement and respectively with intermediate baffle 3 and cleaning main part 1 an organic whole be connected, through the design of support column 31 promptly for the space of keeping away of certain height has between intermediate baffle 3 and cleaning main part 1, further avoids the staff to contact with the wiping cloth and soaks like liquid medicine wherein.

In some embodiments, the support columns 31 may be provided as telescoping structures to increase structural flexibility and adjustability.

It should be noted that, one end of the clamping rod 52 is located between the cleaning main body 1 and the middle partition plate 3, and the other end passes through the accommodating cavity 51 and abuts against or keeps a certain distance from the cleaning main body 1, that is, by using the threaded connection relationship between the clamping rod 52 and the cleaning main body 1, the vertical distance between the clamping rod 52 and the accommodating cavity 51 is adjusted, so that the scraping cloth in the accommodating cavity 51 is conveniently approximated and fixed by the clamping rod 52.

Wherein, the clamping rods 52 are at least two and symmetrically arranged between the cleaning main body 1 and the middle partition plate 3, so that the effect of fixing the scraping cloth is ensured by uniformly arranging a plurality of clamping rods 52.

In this embodiment, the middle partition plate 3 is horizontally overlapped with the side contour of the working portion 11, so as to keep the structure clean, and avoid the middle partition plate 3 from touching the middle cavity of the etching machine by mistake.

In some embodiments, the side profile of the intermediate partition 3 protrudes beyond the side profile of the working portion 11 to enhance the insulating effect of the intermediate partition 3.

In the implementation process, the handle 4 includes the turn portion 41 and the supporting part 42 of body coupling, the one end that the turn portion 41 deviates from the supporting part 42 is connected with the intermediate baffle 3 an organic whole to improve the structural strength of handle 4, wherein, the both ends of turn portion 41 an organic whole are connected with snap ring 43, cover be equipped with on turn portion 41 and lie in between two snap rings 43 with turn portion 41 the slip pipe 44 of switching, realize cleaning device through holding slip pipe 44 and rotate clean purpose promptly, increase clean area, improve the cleaning performance and the clean efficiency of etching machine intermediate chamber.

Further, the support portion 41 is kept horizontal with the intermediate partition 3 to facilitate handling of the cleaning device.

In some embodiments, an external connector 45 is integrally connected to the end of the turn 41 facing away from the support 42 to facilitate the external connection of auxiliary equipment, such as an extension rod, via the external connector 45.

It should be noted that, the accommodating cavity 51 extends to two sides of the cleaning main body 1, so as to facilitate the purpose of accommodating the scraping cloth, wherein two ends of the middle partition plate 3 are kept flush with the cleaning main body 1, so that the middle partition plate 3 is prevented from mistakenly touching the middle cavity of the etching machine, and the safety is improved.

It should be noted that, in connection with fig. 2, the working portion 11 is designed as a tapered arc surface, that is, by using the shape design of the arc surface, which is narrow in front and wide in back, the working portion is matched with the cylindrical ring structure of the middle cavity of the etching machine, so as to increase the contact area between the scraping cloth and the cylindrical ring structure, thereby improving the cleaning effect and the cleaning efficiency of the middle cavity of the etching machine.

It can be appreciated that the specific function of the wiping cloth in this embodiment is available to those skilled in the art according to the prior art, and the structure and working principle of the wiping cloth will not be described herein.

To sum up, the application discloses a cleaning device for etching board intermediate chamber, including clean main part 1 and gripping member 2, by clean main part 1 support and carry on and scrape the cloth, carry out the manual work through intermediate baffle 3 and the handle 4 of gripping member 2 and hold, adjust and fixed the cloth of scraping through holding chamber 51 and clamping lever 52 of clamping member 5, wherein, clean main part 1 deviates from the one end of gripping member 2 and is equipped with work portion 11 to combine the cambered surface structure setting of work portion 11 tapering, improved the clean efficiency and the clean effect in manual cleaning metal etching board holding chamber.

The foregoing has outlined rather broadly the more detailed description of the present application, wherein specific examples have been provided to illustrate the principles and embodiments of the present application, the description of the examples being provided solely to assist in the understanding of the core concepts of the present application; meanwhile, those skilled in the art will have variations in the specific embodiments and application scope in light of the ideas of the present application, and the present description should not be construed as limiting the present application in view of the above.

Claims

1. A cleaning device for etching board intermediate chamber, its characterized in that: including being used for bearing the cleaning main part of scraping the cloth and locating gripping member on the cleaning main part, the gripping member including locating cleaning main part one end the intermediate baffle and with the handle of intermediate baffle body coupling the cleaning main part is last and be close to intermediate baffle department is equipped with and is used for fixing the clamping member of scraping the cloth, the clamping member including seting up cleaning main part last holding chamber and with cleaning main part threaded connection and pass the clamping lever in holding chamber, cleaning main part deviates from the one end of gripping member is equipped with the working portion, the working portion is the cambered surface of tapering.

2. The cleaning apparatus for an intermediate chamber of an etching tool according to claim 1, wherein a plurality of support columns are provided between the intermediate partition plate and the cleaning main body, and the plurality of support columns are symmetrically arranged and integrally connected with the intermediate partition plate and the cleaning main body, respectively.

3. The apparatus according to claim 1, wherein one end of the clamping rod is located between the cleaning main body and the middle partition plate, and the other end of the clamping rod passes through the accommodating cavity and abuts against or is kept at a certain distance from the cleaning main body.

4. The cleaning apparatus for an etching tool intermediate chamber according to claim 3, wherein at least two clamping rods are provided and symmetrically arranged between the cleaning main body and the intermediate partition plate.

5. The cleaning apparatus for an etching tool intermediate chamber according to claim 1, wherein the intermediate partition plate horizontally coincides with or protrudes from a side profile of the working portion.

6. The cleaning apparatus for an intermediate chamber of an etching tool as recited in claim 1, wherein said handle includes a turn portion and a support portion integrally connected, an end of said turn portion facing away from said support portion integrally connected with said intermediate diaphragm.

7. The cleaning device for an etching machine middle cavity according to claim 6, wherein two ends of the turning part are integrally connected with clamping rings, and a sliding tube connected with the turning part is sleeved on the turning part and between the two clamping rings.

8. The cleaning apparatus for an intermediate chamber of an etching tool as recited in claim 6, wherein said support portion is horizontally disposed with respect to said intermediate baffle.

9. The cleaning apparatus for an etching tool intermediate chamber according to claim 6, wherein an outer joint is integrally connected to an end of the bent portion facing away from the supporting portion.

10. The cleaning apparatus for an etching tool intermediate chamber according to claim 1, wherein the receiving chamber extends to both sides of the cleaning main body, and both ends of the intermediate partition plate are kept flush with the cleaning main body.